Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.

Abstract: The present invention provides crosslinked polymeric networks that are reversibly crosslinked upon exposure to light of a suitable wavelength. In one embodiment photocrosslinkable branched hydrophilic polymers containing photochromic groups are synthesized. Cinnamylidene groups and derivatives of cinnamylidene are preferably used as the photochromic agents or photocrosslinking agents.

Abstract: A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.

Abstract: Disclosed is a composition for preparing a thermal ink jet printhead which comprises a mixture of (A) a polymer, some monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution measured in milliequivalents photosensitivity-imparting group per gram either (1) a polymer having a second degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution measured in milliequivalents of photosensitivity-imparting group per gram which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degr

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.

Abstract: A dental cement system containing a photocurable ionomer, reactive powder and water undergoes both a conventional setting reaction and a photocuring reaction.The cement system can provide a long working time and can be cured on demand by exposure to an appropriate source of radiant energy. The surface of the cement cured in this manner is then hard enough to allow subsequent clinical procedures to be performed, while the ongoing chemical-cure "setting" reaction hardens the remainder of the cement.

Abstract: Polyketone polymers are cured by exposure to high energy radiation. Radiation sources include gamma radiation sources such as Co.sup.60 emitters as well as e-beam, ion and other commercially used sources of high energy radiation. The materials so produced are high molecular weight crosslinked polyketone polymers which exhibit enhanced mechanical and tribological properties.

Abstract: A method for irradiating and modifying high molecular weight organic polymers with high energy radiation so that the radiation impinges only in a distinct pattern which is less than the width of the polymer so as to cause controlled chain scission and continuity in molecular weight distribution. The method improves the flow rate and millability of the polymers.

Abstract: A photocurable resin composition comprising a propenyl ether group-containing compound (A) having propenyl ether groups of the following formula (1) and having a number-average molecular weight of not less than 500, and a cationic photopolymerization initiator (B).CH.sub.3 --CH.dbd.CH--O-- (1)The object is to provide a photocurable resin composition which cures at a higher speed than a vinyl ether compound on exposure to light irradiation, and has improved flow characteristics, physical property of cured resin, and adhesion to metal.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with (i) a formaldehyde source, and (ii) an unsaturated acid in the presence of an acid catalyst, thereby forming a curable polymer with unsaturated ester groups. Also disclosed is a process for preparing an ink jet printhead with the above polymer.

Abstract: A method for the anionic photoinitiation of polymerization or crosslinking of a substrate by irradiating a mixture of a substrate and a photoinitiator, where the photoinitiator is an inorganic transition metal complex which releases on irradiation a polymerization initiating substance consisting essentially of an anionically charged nucleophile that initiates the polymerization or crosslinking reaction, under conditions that allow the anion to initiate polymerization. FIG. 3 is plot of percentage polymerization of ethyl .alpha.-cyanoacrylate containing different concentration of Reineckate's anion.

Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups as specified in the claims, B is one of several groups as specified in the claims, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.

Abstract: A method is disclosed for modifying a fluoropolymer including the following steps: providing a fluoropolymer surface, adding a solution including a a reactive species to the fluoropolymer surface, and exposing the reduced fluoropolymer surface to ultraviolet radiation in the presence of ozone or oxygen. The method reduces the discoloration of the fluoropolymer.

Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.

Abstract: The invention herein is curable adhesive and sealant compositions and a non-aqueous solvent free process for producing such compositions which comprise a mono-ol, tackifying resin, and a monohydroxylated epoxidized polydiene polymer which is comprised of at least two polymerizable ethylenically unsaturated hydrocarbon monomers wherein at least one is a diene monomer which yields unsaturation suitable for epoxidation and wherein the polymer contains from 0.1 to 7.0 milliequivalents of epoxy per gram of polymer. The process involves mixing the components together with a photoinitiator which is selected from the group consisting of diaryl, especially diaryliodonium, salts characterized by the general formula: ##STR1## where Y is ##STR2## where R is hydrogen, aryl, alkyl, or an alkylhalide; n is an integer of at least 1, Z is I, Cl, or Br, preferably I, and X is a complex metal halide anion or a complex halide anion of a strong protonic acid.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, with an acetyl halide and dimethoxymethane in the presence of a halogen-containing Lewis acid catalyst and methanol, thereby forming a haloalkylated polymer. In a specific embodiment, the haloalkylated polymer is then reacted further to replace at least some of the haloalkyl groups with photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer.

Abstract: A tetraphenol compound represented by the formula (I): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 represent hydrogen 1,2-naphthoquinonediazide-4-sulfonyl or 1,2-naphthoquinonediazide-5-sulfonyl and a method for producing the compound are provided, and the compound can be used as a photosensitizer for a positive resist which exhibits superior properties.

Abstract: Radiation-sensitive organo-halogen compounds that have a photo-labile halomethyl-1,3,5-triazine moiety and a polymeric moiety within the same molecule. The compounds of this invention are comprised of a polymeric moiety having attached or incorporated within its structure at least one 1,3,5-triazine nucleus, said triazine nucleus having at least one halomethyl substituent attached to a carbon atom of the triazine nucleus. These compounds are capable of being stimulated by actinic radiation at wavelengths of from about 250 to about 900 nanometers to generate free radicals and/or acids. The compounds of this invention are useful as photoinitiators in free radical polymerization reactions, oxidation-reduction reactions, or reactions sensitive to acid, and they also exhibit the capability to crosslink upon exposure to light.

Abstract: A process is provided comprising crosslinking of a derivative of a linear alternating copolymer of carbon monoxide and one or more olefinically unsaturated compounds, which copolymer has a ratio of weight average molecular weight to number average molecular weight of more than 1, and which derivative is obtainable by treating the linear alternating copolymer with formaldehyde and/or a precursor of formaldehyde, a thermoset resin obtainable by such process and a coating based on such thermoset resin.

Abstract: Polyketone polymers are cured by exposure to high energy radiation. Radiation sources include gamma radiation sources such as Co.sup.60 emitters as well as e-beam, ion and other commercially used sources of high energy radiation. The materials so produced are high molecular weight crosslinked polyketone polymers which exhibit enhanced mechanical and tribological properties.

Abstract: Polyketone polymers are cured by exposure to high energy radiation. Radiation sources include gamma radiation sources such as Co.sup.60 emitters as well as e-beam, ion and other commercially used sources of high energy radiation. The materials so produced are high molecular weight crosslinked polyketone polymers which exhibit enhanced mechanical and tribological properties.

Abstract: A conjugate polymer with fluorescent dye molecules built in as fluorescent centers is used in light emitting devices with improved fluorescent efficiency. In a first example, fluorescent dyes are introduced into a conjugated polymer precursor by a nucleophilic substitution reaction. In a second example, the fluorescent dye molecules are introduced into a conjugated polymer precursor by an ion-exchange reaction. In both examples, the conjugated polymer precursors with dye molecules attached are converted to the conjugated polymer with built-in fluorescent centers.

Abstract: A class of unsaturated resins which are suitable for use in radiation curable coatings has been developed. The resins comprise N-vinyl-N-acyl oligomers made by reacting a secondary N-vinylamide with a polyisocyanate monomer which is reacted with at least one mono- or polyhydric alcohol to form a urethane linkage.

Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.

Abstract: The invention relates to a method for synthesis of poly(L-leucine). Without any initiator and solvent poly(L-leucine) has been made from L-leucine-N-carboxy anhydride as starting material in the solid state by irradiation with gamma ray. There is only one step in the entire synthetic processing, and the polymerization yield is 100% and the process is a very simple, safe and convenient method. The poly(L-leucine) is one of the best materials for temporary wound dressing.

Abstract: The invention relates to photosensitive compositions comprisingA) from 40 to 80% by weight of at least one liquid epoxy resin having an epoxy functionality of equal to or greater than 2,B) from 0.1 to 10% by weight of at least one cationic photoinitiator for component A),C) from 5 to 40% by weight of at least one liquid cycloaliphatic or aromatic diacrylate,D) from 0 to 15% by weight of at least one liquid poly(meth-)acrylate having a (meth-)acrylate functionality of greater than 2, the proportion of component D) constituting a maximum of 50% by weight of the total (meth-)acrylate content,E) from 0.1 to 10% by weight of at least one radical photoinitiator for component C) and, where appropriate, D) andF) from 5 to 40% by weight of at least one OH-terminated polyether, polyester or polyurethane,which are especially suitable, for example, for the manufacture of photopolymerized layers, especially of three-dimensional objects.

Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.

Abstract: Polyamide, polyurea, polyhydrazide, and polyurethane materials having substantially modified surfaces which are antimicrobial are disclosed. The disclosure also relates to selective ultraviolet (UV) photon irradiation, high energy electron irradiation low energy electron irradiation for preparing such antimicrobial, polymeric materials. The disclosure further provides methods for controlling microorganisms, and products made from the antimicrobial, polymeric materials of this invention.

Abstract: A method for the crosslinking of polymeric electrolytes is presented. The method achieves crosslinking by means of ultraviolet radiation. The resulting crosslinked polymers are stable and useful as solid state battery electrolytes.

Abstract: The invention relates generally to polymers exhibiting second order nonlinear optical properties, and characterized by high thermal stability. Disclosed are polymers prepared by a polycondensation reaction between an aromatic dianhydride and a compound selected from the group consisting of a di(alkylamino)amine and an aromatic diamine. Most preferred are polymers that are the products of a polycondensation reaction between 1,2,4,5-benzenetetracarboxylic dianhydride and nitro(N,N-diethylamino)stilbene, wherein the polymer is imidized by further heat treatment.

Abstract: A photosensitive polymer composition comprising, in admixture, a polymer predominantly comprising a recurring unit of the formula (I): ##STR1## wherein x is a tri- or tetravalent organic group, Y is a divalent organic group, and n is equal to 1 or 2 and a compound having a urea bond of the formula (II): ##STR2## wherein R.sup.1 is a group having a functional group capable of forming a dimer or polymer upon exposure to radiation, R.sup.2 and R.sup.3 are independently a hydrogen atom or a monovalent organic group is shelf stable and applicable as relatively thick coatings having sufficient photosensitivity to form semiconductor element surface protective films.

Abstract: The color of a polymer, particularly polytetrahydrofuran, is improved by subjecting the polymer to microwave energy of such magnitude and frequency so as to cause a decrease in the APHA color number.

Abstract: A method and agent for improving polyurethane binder compositions are provided. The method comprises introducing into the polyurethane backbone a diol residue including a double bond therein. Preferably the double bond is positioned in a moiety pendant from the polyurethane backbone. In preferred compounds, the double bond-containing residue is introduced in sufficient quantities to provide at least one double bond every 2,000-3,000 molecular weight units of polymer. Preferred agents include acrylate-, methacrylate-, acrylamide-, norbornenyl-, and cyclohexenyl-groups. Preferred compositions, both cured and uncured, are provided. Also, use of such a composition in magnetic recording media is described.

Abstract: A class of unsaturated polyanhydrides having double bonds available for secondary polymerization is disclosed. A crosslinked material having improved or different physical and mechanical properties can be prepared from these polyanhydrides, via secondary polymerization. The synthesis and characteristics of one unsaturated polyanhydride based on fumaric acid and its copolymers with aliphatic and aromatic diacids, prepared by either the melt-polycondensation method or by solution polymerization, is described in detail.These polymers are well suited for use in controlled release drug delivery devices. The polymers can also be used as a bioerodible bone cement where the polymer is first cast as a solution onto a bone fracture and then crosslinked by radiation or radical polymerization to yield a strong, adhesive material.

Abstract: A photosensitive composition comprising:(a) a polymer(b) 1 to 20% by weight, based on the weight of polymer (a), of a compound having a terminal ethylenically unsaturated group;(c) 0.1 to 20% by weight, based on the weight of polymer (a), of an oxime ester compound(d) 0.01 to 10% by weight, based on the weight of polymer (a), of a coumarin compound having a wave length of the absorption peak of 330 to 550 nm; has high photosensitivity to an actinic light of a wave length of 400 to 500 nm and is capable of forming heat-resistant images, patterns or films.

Abstract: A process for producing oxymethylene copolymers and terpolymers is disclosed which involves the non-linear addition of gaseous formaldehyde to a cyclic ether having at least two adjacent carbon atoms (1) and, in the case of a terpolymer, to a mixture of at least one (1) and one monoethylenically unsaturated aliphatic diol formal having at least four carbon atoms in its main chain (2), or to a mixture of (1) with a (2), in the presence of a polymerization initiator at a rate controlled so as to conform to a rate determined by kinetic equations that describe the rate of decomposition of trioxane to formaldehyde during conventional copolymerization of trioxane with a cyclic ether. The process and kinetic equations of the invention are applicable to batch reactions, single stream continuous reactions and dual stream continuous reactions.

Abstract: Oligomeric condensation products of certain diketones and phenols can be end-capped with a vinylbenzyl moiety and certain other moieties, especially alkyl groups, to afford thermosetting resins particularly valuable in making laminated circuit boards. Resins prepared by the reaction of 1 molar proportion of diacetylbenzene with from 3.5 to 4.0 molar proportions of phenol and end-capped with from 50 to 100% vinylbenzyl groups with the remainder being alkyls of 1 through 11 carbon atoms are particularly useful.

Abstract: The invention relates to a process for crosslinking aromatic polymers containing radiation-sensitive methylene groups (--CH.sub.2 --) by exposing the polymers to ionizing radiation thereby causing crosslinking of the polymers through the methylene groups. Crosslinked polymers are resistant to most organic solvents such as acetone, alcohols, hydrocarbons, methylene, chloride, chloroform, and other halogenated hydrocarbon, to common fuels and to hydraulic fluids in contrast to readily soluble uncrosslinked polymers. In addition, the degree of crosslinking of the polymers depends upon the percentage of the connecting groups which are methylene which ranges from 5 to 50% and preferably from 25 to 50% of the connecting groups and is also controlled by the level of irradiation which ranges from 25 to 1000 Mrads and preferably from 25 to 250 Mrads. The temperature of the reaction conditions ranges from 25.degree. to 200.degree. C. and preferably at or slightly above the glass transition temperature of the polymer.

Abstract: The resins resulting from converting dicyclopentadiene-phenol adducts to their corresponding vinylbenzyl ethers are an excellent matrix in which to embed fibers to produce a composite. Such resins, especially as a blend of materials with varying molecular weight distribution, are amorphous materials whose glass transition temperature is well under the curing temperature, and whose solubility permits solutions with high solids content so as to afford coatings with high resin content. The extensively crosslinked polymer resulting from therma, photochemical, or free radical initiated polymerization has excellent thermal and electrical properties for use in multilayer circuit boards.

Abstract: Positive acting electron beam resist materials are described. The material comprises a polymer having fundamental units of the general formula ##STR1## in which R.sub.1, R.sub.2 and R.sub.3 independently represent hydrogen or a hydrocarbon group having from 1 to 6 carbon atoms, and R.sub.4 represents an organic residue having from 1 to 20 carbon atoms. The polymer may be used, as the resist material, as it is or by mixing with other type of resin.

Abstract: Homopolyimides and copolyimides which contain structural elements of the formula I ##STR1## in which R.sup.1 and R.sup.2 are halogen, nitro, aryl, aryloxy, alkyl or alkoxy, m is 0 or a number from 1 to 4, n is 0 or a number from 1 to 3 and p is 0, 1 or 2, the free carbonyl groups are bonded in the ortho-position relative to one another and R is a divalent aromatic radical which is substituted by at least one alkyl group or aralkyl group, are autophotocrosslinkable. They are suitable for the production of protective films and photographic relief images.

Abstract: Linear polyether resins containing 100 to 10 mol % of the repeating structural unit of formula I ##STR1## and 90 to 0 mol % of the repeating structural unit of formula II ##STR2## wherein A is a linear unsubstituted or methyl-substituted alkylene group containing 4 to 100 carbon atoms in the linear alkylene chain, X denotes bridge members as defined in claim 1 and Y is an aromatic radical of a divalent phenol as defined in claim 1, are self-crosslinkable and can be crosslinked by heating to a temperature of not less than 250.degree. C. or by irradiation with energy-rich electromagnetic rays, affording products which are insoluble in organic solvents and which have high glass transition temperatures.

Abstract: A layer of a liquid composition containing a residue that is polymerizable on contact with a gaseous polymerizing agent and a photocurable residue, which residues may be on the same or different molecules, is contained with a gaseous polymerizing agent so that the layer solidifies but remains photocurable. Subsequently the solidified layer is exposed to actinic radiation in a predetermined pattern and those parts of the layer that are not photocured are removed by treatment with a suitable solvent.Typical polymerizable residues include cyanoacrylates that polymerize on exposure to water vapor, ammonia, or an amine. Typical photocurable residues include acrylates, and methacrylates.The process is suitable for the manufacture of printing plates and printed circuits.

Abstract: Homopolyimides and copolyimides which contain structural elements of the formula I ##STR1## in which R.sup.1 and R.sup.2 are halogen, nitro, aryl, aryloxy, alkyl or alkoxy, m is 0 or a number from 1 to 4, n is 0 or a number from 1 to 3 and p is 0, 1 or 2, the free carbonyl groups are bonded in the ortho-position relative to one another and R is a divalent aromatic radical which is substituted by at least one alkyl group or aralkyl group, are autophotocross-linkable. They are suitable for the production of protective films and photographic relief images.