Processes Of Preparing A Solid Polymer From A Heterocyclic Chalogen Monomer; Or Compsitions Therefore Patents (Class 522/168)
  • Publication number: 20130096225
    Abstract: An inkjet printing method includes the steps of a) providing a white inkjet ink and at least one colour inkjet ink to an inkjet printer; and b) jetting the white inkjet ink at a higher temperature than the colour inkjet ink onto an ink-receiver. The difference in jetting temperature between the white inkjet ink and the colour inkjet ink is at least 5° C. Inkjet ink sets and inkjet printers are also disclosed.
    Type: Application
    Filed: December 7, 2012
    Publication date: April 18, 2013
    Applicant: AGFA GRAPHICS NV
    Inventor: AGFA GRAPHICS NV
  • Patent number: 8420296
    Abstract: Disclosed is a photosensitive resin composition for a color filter protective layer including a cross-linkable alkali soluble resin including a repeating unit represented by the following Chemical Formula 1, a reactive unsaturated compound, a photopolymerization initiator, and a solvent. In Chemical Formulae 1 to 3, R1 to R6 and A1 to A3 are the same as in the detailed description.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Hyun Kim, Se-Young Choi, Nam-Gwang Kim, Eui-June Jeong, Chang-Min Lee
  • Publication number: 20130089582
    Abstract: The present invention relates to the use of polymeric photoinitiators based on polyalkyletherurethane backbones in the production of hydrophilic gels, in particular hydrogels. The invention relates to methods for manufacturing hydrophilic gels using said polymeric photoinitiators, and the hydrophilic gels thus obtained.
    Type: Application
    Filed: June 22, 2011
    Publication date: April 11, 2013
    Applicant: Coloplast A/S
    Inventors: Christian B. Nielsen, Niels Joergen Madsen
  • Patent number: 8383695
    Abstract: The present invention relates to a phenoxy resin for an optical material obtained by subjecting at least one selected from specific difunctional epoxy resins and at least one selected from specific difunctional phenols to polyaddition reaction, wherein a film comprising the above phenoxy resin has a refractive index of 1.580 or less at 25° C. and a wavelength of 830 nm, a resin composition for an optical material containing the above phenoxy resin, a resin film for an optical material comprising the above resin composition and an optical waveguide produced by using the above resin composition and/or the above resin film.
    Type: Grant
    Filed: March 15, 2007
    Date of Patent: February 26, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tatsuya Makino, Atsushi Takahashi, Toshihiko Takasaki, Tomoaki Shibata, Masami Ochiai
  • Patent number: 8362148
    Abstract: The present invention provides a curable composition comprising: (a) a resin composition being liquid at 23° C. and comprising monomers or oligomers or a mixture of monomers and oligomers polymerizable by a ring-opening reaction; (b) an impact modifier containing one or more block copolymers having at least one block composed of methyl methacrylate and (c) one or more polymerization initiators. The curable resin composition can be used for curable coatings per se and in specific for stereolithography and other applications such as three dimensional printing applications where a 3D object is formed.
    Type: Grant
    Filed: March 12, 2008
    Date of Patent: January 29, 2013
    Assignee: 3D Systems, Inc.
    Inventors: Loic Messe, Carole Chapelat
  • Patent number: 8362151
    Abstract: The present invention provides novel hybrid polymer useful for alignment layers for inducing alignment of a liquid crystal medium. Hybrid polymers of this invention are prepared from a) at least one component selected from the group consisting of oligomer(s) and polymer(s) within the class of polyimides, poly(amic acids) and esters thereof wherein the at least one component comprises at least one initiator generating moiety, and b) at least one component selected from the group consisting of addition monomer(s) and addition polymer(s), wherein the two components are covalently bonded to form a copolymer. The invention further describes liquid crystal elements such as all liquid crystal display products or modes, liquid crystal devices and liquid crystal optical films comprising the novel hybrid polymer alignment layers.
    Type: Grant
    Filed: December 15, 2009
    Date of Patent: January 29, 2013
    Assignee: Elsicon, Inc.
    Inventors: Chunhong Li, Wayne Gibbons
  • Patent number: 8353582
    Abstract: An ultraviolet curable inkjet recording ink of the present invention includes at least a colorant, a light-curable compound, a photopolymerization initiator, and at least one fluorine surfactant represented by the following formulae (1) or (2) as a surface tension regulator: where Rf is selected from CH2CF3 and CH2CF2CF3; n represents a value of 5 to 20; and each R1 represents a functional group capable of initiating an ultraviolet curing reaction and one of the two R1s in (1) may be hydrogen; where Rf is selected from CH2CF3 and CH2CF2CF3; l represents a value of 1 to 20; k and m each represent a value of 1 to 8; each R2 represents a functional group capable of initiating an ultraviolet curing reaction and one of the two R2s in (2) may be hydrogen; and R3 is selected from hydrogen and methyl.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: January 15, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Hisashi Habashi, Michihiko Namba, Kiyofumi Nagal
  • Publication number: 20130010039
    Abstract: The present invention provides a photocurable ink composition for ink jet recording with excellent curability. The photocurable ink composition for ink jet recording includes polymerizable compounds, a photopolymerization initiator, and a colorant, wherein the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by general formula (I): CH2?CR1—COOR2—O—CH?CH—R3??(I) (wherein R1 is a hydrogen atom or a methyl group, R2 is a divalent organic residue having 2 to 20 carbon atoms, and R3 is a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms) and phenoxyethyl (meth)acrylate.
    Type: Application
    Filed: July 9, 2012
    Publication date: January 10, 2013
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Hiroaki Kida, Hiroshi Fukumoto, Toru Saito, Keitaro Nakano, Hiroki Nakane
  • Patent number: 8337961
    Abstract: The present invention relates to an acrylic pressure-sensitive adhesive composition which comprises a (meth)acrylic copolymer comprising an alkyl(meth)acrylic acid ester monomer, in which alkyl has 2 to 14 carbon atoms, and a (meth)acrylic acid ester monomer containing a copolymerizable photo-initiator group, wherein it has a gel fraction of 10 to 55% and a swelling ratio of 30 to 110, and a sol (uncross-linked polymer) eluted in final pressure-sensitive adhesive with a solvent (ethyl acetate) has a weight average molecular weight of 600,000 or more; and a polarizing plate and a liquid crystal display device, comprising the same. The polarizing plate according to the present invention has an excellent adhesion durability under a high temperature or a high temperature and humidity condition, has an excellent low light leakage property by effectively providing stress release property, and may greatly improve productivity for polarizing plates, by using photo-curing.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: December 25, 2012
    Assignee: LG Chem, Ltd.
    Inventors: No Ma Kim, Jeong Min Ha, Min Ki Lee, Suk Ky Chang
  • Publication number: 20120308741
    Abstract: The present invention relates to an aqueous alkali-developable photosensitive polyimide precursor resin composition that is appropriate for highly heat-resistant transparent protection layers and insulation layers for liquid crystal display devices.
    Type: Application
    Filed: May 30, 2012
    Publication date: December 6, 2012
    Inventors: Dong-Seok KIM, Yong-sik Ahn, Kyung-jun Kim, Mi-hie Yi
  • Patent number: 8314162
    Abstract: The invention relates to an initiator system comprising a diarylalkylamine compound and a sensitizing agent. The invention also relates to a hardenable composition comprising the initiator system. The invention further relates to the use of the initiator system for initiating the hardening process of a hardenable composition being selected from cationically curing composition(s) and/or radically curing composition(s) or a mixture thereof. The initiator system and the hardening composition can be used in various fields, including the dental and orthodontic area.
    Type: Grant
    Filed: May 28, 2009
    Date of Patent: November 20, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Bettina Hailand, Adrian S. Eckert, Karsten Dede
  • Patent number: 8304469
    Abstract: A highly heat-conductive epoxy resin composition, which comprises epoxy resin in a liquid state at room temperature, a latent curing agent, a highly heat-conductive filler, and a non-ionic surfactant, where preferably the latent curing agent is mixed with a portion of the epoxy resin in a liquid state at room temperature to form a master batch, can keep a relatively low viscosity, even if a large amount of the filler is contained, and can be cured at a relatively low temperature for a short time, and has a distinguished storage stability as one-component composition.
    Type: Grant
    Filed: June 2, 2009
    Date of Patent: November 6, 2012
    Assignee: Yokohama Rubber Co., Ltd.
    Inventors: Kazushi Kimura, Takahiro Okamatsu
  • Patent number: 8299142
    Abstract: The present invention provides an ink composition having excellent ink ejection stability and stretching property, curable with a high sensitivity by irradiation of radiation rays, and capable of forming an image excellent in rubfastness and blocking resistance, an inkjet recording method using the ink composition, and a printed article. The ink composition includes (a) a polymer having a siloxane structure and a polymerizable group on a side chain thereof, (b) a polymerizable compound, and (c) a photopolymerization initiator, and the inkjet recording method includes a step of ejecting the ink composition onto a recording medium to be recorded with an inkjet recording apparatus and a step of curing the ink composition by irradiating active radiation rays on the ejected ink composition.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: October 30, 2012
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Yokoi
  • Patent number: 8293809
    Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.
    Type: Grant
    Filed: December 11, 2008
    Date of Patent: October 23, 2012
    Assignee: Kyoto University
    Inventors: Yoshihiro Matano, Hiroshi Imahori
  • Patent number: 8293448
    Abstract: Provided is a resin composition for stereolithography that absorbs little water and moisture over time in uncured state, maintains a low moisture absorption rate even under high humidity, and has high curing sensitivity, from which a stereolithography product excellent in the properties, such as dimensional accuracy, mechanical properties, and dimensional stability can be smoothly produced for reduced light irradiation time. The resin composition for stereolithography comprising an oxetane compound expressed by the general formula (I) below: wherein R1 denotes an alkyl group having 1 to 5 carbon atoms, and R2 denotes an alkylene group having 2 to 10 carbon atoms that may contain an ether bond, in the proportion of from 3 to 60 mass % based on the total mass of the resin composition for stereolithography.
    Type: Grant
    Filed: June 15, 2007
    Date of Patent: October 23, 2012
    Assignees: CMET Inc., Ube Industries, Ltd.
    Inventors: Takashi Ito, Tsuneo Hagiwara, Kenji Hirotsu, Tadashi Murakami
  • Publication number: 20120259031
    Abstract: Disclosed is a photocurable resin composition for additive fabrication comprising a polymerizable component that is polymerizable by free-radical polymerization, cat ionic polymerization, or both free-radical polymerization and cationic polymerization, and a photoinitiating system capable of initiating the free-radical polymerization, cationic polymerization, or both free-radical polymerization and cationic polymerization. The photocurable resin composition is a liquid at about 25° C., and is capable of curing to provide a solid upon irradiation with light emitted from a light emitting diode (LED), wherein the light has a wavelength of from about 100 nm to about 900 nm. Also disclosed is a three-dimensional article prepared from the photocurable resin composition for additive fabrication, and a process for preparing three-dimensional articles by additive fabrication.
    Type: Application
    Filed: December 16, 2010
    Publication date: October 11, 2012
    Applicant: DSM IP ASSETS, B.V.
    Inventors: Ken Dake, Jigeng Xu, Timothy Bishop
  • Patent number: 8263681
    Abstract: The invention features a dental composition containing a polycyclic aromatic compound, such as 2-ethyl 9,10-dimethoxy anthracene (EDMOA), in an amount that provides the composition with fluorescence mimicking that of natural teeth.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: September 11, 2012
    Assignee: 3M Innovative Properties Company
    Inventors: Bradley D. Craig, Gregory A. Kobussen
  • Patent number: 8262391
    Abstract: The invention concerns dental compositions. Said composition comprises (1) a silicone crosslinkable and/or polymerizable by cationic process; (2) an efficient amount of at least an initiator such as an organometallic complex borate; and (3) a dental filler present in the composition in a proportion of at least 10 wt. % relative to the composition total weight. Said dental compositions are useful for making dental prostheses or for dental restoration.
    Type: Grant
    Filed: March 8, 2006
    Date of Patent: September 11, 2012
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Publication number: 20120213969
    Abstract: A functionally graded shape memory polymer (SMP) that has a range of transition temperatures that are spatially distributed in a gradient fashion within one single article. The SMP is formed by post-curing a pre-cured glassy SMP in a linear temperature gradient that imposes different vitrification temperature limits at different positions along the gradient. Utilizing indentation-based surface shape memory coupled with optical measurements of photoelastic response, the capability of this material to respond over a wide range of thermal triggers is correlated with the graded glass transition behavior. This new class of SMP offers great potential for such applications as passive temperature sensing and precise control of shape evolution during a thermally triggered shape recovery.
    Type: Application
    Filed: February 21, 2012
    Publication date: August 23, 2012
    Applicant: SYRACUSE UNIVERSITY
    Inventors: Patrick Mather, Pine Yang, Xiaofan Luo, Andrew M. DiOrio
  • Patent number: 8236872
    Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
    Type: Grant
    Filed: April 22, 2011
    Date of Patent: August 7, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 8197033
    Abstract: The present invention relates to a curable resin composition comprising a cyclic aliphatic multifunctional epoxy resin, a cyclic aliphatic difunctional epoxy resin having formula B in the specification, and, optionally, a photoinitiator, a process for manufacturing an ink jet printhead comprising a polymeric material layer defining ink passage ways formed by curing said curable resin composition, and ink-jet print head comprising a polymeric material layer defining ink passage ways formed by curing said curable resin composition.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: June 12, 2012
    Assignee: Telecom Italia S.p.A.
    Inventors: Davide Ciampini, Fulvio Cominetti, Luigina Gino
  • Publication number: 20120092426
    Abstract: A curable phase change ink composition that includes an ink vehicle including at least one isosorbide monomer having at least one functional group. Also described is an ink printing device that includes a curable phase change ink composition for printing onto a substrate, an ink jetting device, and a curing device providing radiation that cures the curable phase change ink composition. The curable phase change ink composition of the ink printing device includes an ink vehicle including at least one isosorbide monomer having at least one functional group.
    Type: Application
    Filed: October 18, 2010
    Publication date: April 19, 2012
    Applicant: XEROX CORPORATION
    Inventors: Naveen CHOPRA, Guerino Sacripante, Michelle N. Chrétien, Barkev Keoshkerian
  • Patent number: 8129447
    Abstract: The invention provides an ink composition including (i) a sensitizing dye having a polymerizable group as a substituent, (ii) a polymerization initiator and (iii) a polymerizable compound having an ethylenically unsaturated bond. The invention also provides an inkjet recording method and a polymerizable compound useful as a sensitizing dye. The sensitizing dye (i) is represented by Formula (I) or (II) below. In the formulae, X represents O, S, NRa, or NRb, n1 and n2 each represent 0 or 1, Ra, Rb, and R1 to R18 each represent a hydrogen atom or a monovalent substituent, and one polymerizable group is present in the molecule.
    Type: Grant
    Filed: September 9, 2008
    Date of Patent: March 6, 2012
    Assignee: Fujifilm Corporation
    Inventors: Tokihiko Matsumura, Tsutomu Umebayashi
  • Patent number: 8110613
    Abstract: Provided is a method for efficiently producing a cationically curable condensed silicon compound. There was an unsolved problem that, in a condensation reaction, an oxetanyl group is subjected to ring-opening under an acidic condition, while gelation is easily caused under an alkaline condition. It was found that a silicon compound (C) having an oxetanyl group can be obtained without causing gelation even at a high concentration by the present method including a first step of separately subjecting a silicon compound (A) having four siloxane bond-forming groups and a silicon compound (B) having an oxetanyl group to alcohol exchange reaction with 1-propanol and a second step of subjecting silicon compounds (AP) and (BP) undergone the first step to hydrolytic copolycondensation under an alkaline condition at a specific ratio.
    Type: Grant
    Filed: December 14, 2009
    Date of Patent: February 7, 2012
    Assignee: Toagosei Co., Ltd.
    Inventors: Sayaka Oike, Akinori Kitamura, Hiroshi Suzuki
  • Publication number: 20120016052
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Application
    Filed: May 17, 2011
    Publication date: January 19, 2012
    Applicant: The Regents of the University of Colorado, a body corporate
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Patent number: 8097399
    Abstract: An optical moulding process is disclosed comprising the sequential steps of: (a)(y) forming a layer of a photocurable composition; and (bXz) irradiating selected areas of the composition in the layer with radiation from a radiation source, thereby curing the composition in said selected areas and repeating the steps a) and b) on top of an earlier cured layer to form a three dimensional structure, wherein the radiation source used in step b) is a non-coherent source of radiation and wherein the photocurable composition comprises at least two curable components: (i) 45%-95% (and preferably at least 50%, more preferably at least 60%, e.g.
    Type: Grant
    Filed: March 21, 2005
    Date of Patent: January 17, 2012
    Assignee: 3D Systems, Inc.
    Inventors: Ranjana Patel, Michael Rhodes, Yong Zhao
  • Publication number: 20120010315
    Abstract: Provided is an acrylate having a high refractive index, which is represented by Chemical Formula (1) or (2), and a method for preparing the same. Since the acrylate has a refractive index, it may be widely applicable to components of display devices such as prism sheet and may be prepared simply, effectively and economically.
    Type: Application
    Filed: July 9, 2010
    Publication date: January 12, 2012
    Applicant: IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Hak-June RHEE, Jeong-Eun BAE
  • Publication number: 20120002138
    Abstract: The present invention relates to a pattern forming ink composition, and more particularly, to a pattern forming ink composition having high yellowing resistance, wherein the pattern forming ink composition including an acrylate-based resin having a ring structure (A), a compound having at least one ethylenically unsaturated double bond (B) and a photoinitiator (C). The pattern forming ink is printed as a reflection pattern on a light guide plate to scatter and reflect the light incident to the reflection pattern towards a light emitting surface of the light guide plate.
    Type: Application
    Filed: June 24, 2011
    Publication date: January 5, 2012
    Inventors: Chih-Hung Lin, Chia Hui Yu
  • Patent number: 8084512
    Abstract: The present invention relates to a water soluble photosensitive polyimide polymer, preparation thereof and a photoresist composition containing the same. The water soluble photosensitive polyimide polymer is characterized by having repeat units represented by the following formula (I): the other symbols are defined in the specification].
    Type: Grant
    Filed: April 10, 2009
    Date of Patent: December 27, 2011
    Assignee: Chang Chun Plastics Co., Ltd.
    Inventors: Jen Fu Wang, Sheng Yen Wu, An Pang Tu, Kuen Yuan Hwang
  • Patent number: 8076392
    Abstract: An ink composition containing at least a polymerizable composition, a pigment, and a polymer represented by General Formula (1): where R1 represents an (m+n)-valent organic linking group, R2 represents a single bond or divalent organic linking group; A1 represents a monovalent organic group having a pigment adsorption structure that contains at least one selected from organic pigment structure, heterocyclic structure, acidic group, group having a basic nitrogen atom, urea group, urethane group, group having a coordinating oxygen atom, hydrocarbon group having 4 or more carbon atoms, alkoxysilyl group, epoxy group, isocyanate group, and hydroxyl group; the n groups A1 and bonds or groups R2 may independently be the same or different; “m” is 1 to 8, “n” is 2 to 9, and m+n is 3 to 10; P1 represents a polymer skeleton; and the m skeletons P1 may be the same or different.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: December 13, 2011
    Assignee: Fujifilm Corporation
    Inventors: Norihide Shimohara, Hisato Nagase, Hidenori Takahashi
  • Publication number: 20110262711
    Abstract: Curable, phase-change compositions and inks used for printing three-dimensional objects including a curable monomer, a photoinitiator, a wax and a gellant, where the composition of the cured formulation has a room temperature modulus of from about 0.01 to about 5 Gpa. The curable monomer includes acrylic monomer, polybutadiene adducted with maleic anhydride, aliphatic urethane acrylate, polyester acrylate, 3-acryloxypropyltrimethoxysilane, or acryloxypropyl t-structured siloxane.
    Type: Application
    Filed: April 22, 2010
    Publication date: October 27, 2011
    Applicant: XEROX CORPORATION
    Inventors: Naveen CHOPRA, Michelle N. Chretien, Barkev Keoshkerian
  • Patent number: 8034262
    Abstract: An optical element comprising: a first monomer polymerized while in the presence of a second monomer to form a first polymer intermixed with the second monomer, the first polymer having a spatially varying degree of cure that provides a predetermined refractive index profile; and the second monomer polymerized in the presence of the first polymer to form a second polymer intermixed with the first polymer, the second polymer stabilizing the refractive index profile.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: October 11, 2011
    Assignee: Ophthonix, Inc.
    Inventors: Shui T. Lai, Donald G. Bruns, Lawrence H. Sverdrup, Gomaa Abdel-Sadek
  • Patent number: 8025833
    Abstract: A curable composition for nanoimprints which comprises a polycyclic aromatic structure-having polymerizable monomer and a photopolymerization initiator is excellent in mold releasability, etching resistance and solvent resistance and capable of forming patterns.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: September 27, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Akinori Fujita, Tadashi Oomatsu, Akiyoshi Goto
  • Patent number: 7999013
    Abstract: Hydrophobic coating compositions are provided as are processes to coat articles with the compositions. Extremely hydrophobic coatings are provided by the compositions. Durable, weatherable and scratch-resistant coatings are provided by compositions comprising a trifluoromethyl-containing component and a hardenable material. Weatherable coatings are also provided by compositions comprising a mobile non-volatile fluorinated component and a hardenable material. Processes are also provided for forming hydrophobic coatings on articles.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: August 16, 2011
    Assignee: Cytonix, LLC
    Inventor: James F. Brown
  • Patent number: 7998543
    Abstract: A novel dioxetane compound is provided having a cationically polymerizable oxetane group, which compound is excellent in compatibility with a liquid crystalline compound and a non-liquid crystalline compound. An optical film is also provided with excellent liquid crystal orientation retention properties and mechanical strength, produced by aligning a composition of the dioxetane compound and a cationically polymerizable compound in a liquid crystal orientation and fixing the liquid crystal orientation by polymerization. Further, a liquid crystal display device is provided with the optical film.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: August 16, 2011
    Assignee: Nippon Oil Corporation
    Inventors: Takashi Seki, Takeshi Kataoka, Hitoshi Mazaki, Hirofumi Aizono
  • Patent number: 7999014
    Abstract: A flame retardant suitable for manufacturing a polymer composition is provided. The polymer composition is used for forming a cured film in which a balance among flame retardancy, adhesion, chemical resistance, heat resistance, and elasticity, and so on, is provided. A flame-retardant polymer composition with an excellent balance among the above properties is also provided. The flame retardant of the invention has a structure of Formula (1), (2), or (3): (in which, R1 is hydrogen or methyl, R2 is C2-20 alkylene or C2-20 alkylene in which any —CH2— is replaced by —O—, R3 and R4 are C1-20 alkyl, phenyl, and phenyl substituted by C1-5 alkyl or phenyl, R3 and R4 may also be an integrally-formed cyclic group, and p and q are 0 or 1).
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: August 16, 2011
    Assignee: JNC Corporation
    Inventors: Ryota Mineo, Tomohiro Eto, Yosihiro Deyama, Hiroyuki Satou
  • Publication number: 20110195249
    Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
    Type: Application
    Filed: April 22, 2011
    Publication date: August 11, 2011
    Inventors: Cheong Hun SONG, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 7994232
    Abstract: The invention provides a photo-curable composition that addresses degradation in dispersibility caused by the use of a pigment, and has good color tone and high light fastness. The photo-curable composition includes: a polymerizable compound; a polymerization initiator; and a dye represented by Formula (1): in which, A1, A2 and A3 each represent a monovalent group, and Z represents a nitrogen atom, an oxygen atom, a sulfur atom, or a monovalent group-bonded carbon atom, the dye represented by Formula (1) having two azo groups in a molecule thereof.
    Type: Grant
    Filed: August 12, 2008
    Date of Patent: August 9, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Hideo Hanawa, Yoshiharu Yabuki
  • Publication number: 20110172324
    Abstract: The present invention relates to a novel water soluble polyimide resin, which contains a hydrophilic functional group such as —OH, —COOH to increase the solubility of the polyimide resin in alkali aqueous solution, and is suitable for using as an insulation film in electronic and photoelectric products. The present invention also relates to preparation and use of the above polyimide.
    Type: Application
    Filed: January 12, 2011
    Publication date: July 14, 2011
    Inventors: Kuen Yuan HWANG, An Pang Tu, Sheng Yen Wu, Gai Chi Chen, Ching Jui Huang, Jen Fu Wang
  • Patent number: 7977401
    Abstract: An ultraviolet curable resin composition, which comprises a cationic photopolymerization initiator (B) and a urethane prepolymer (A) having a structure represented by the general formula (1); (wherein R1 and R2 each independently represent an alkylene group, R3, R4 and R5 each independently represent an alkyl group or hydrogen atom, R6 and R7 each independently represent an alkylene group having 2 to 4 carbon atoms, a represents 0 or 1, and b and c each independently represent an integer of 0 to 10).
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: July 12, 2011
    Assignee: DIC Corporation
    Inventors: Kouichi Yokota, Koujirou Tanaka, Kai-Uwe Gaudl, Artur Lachowicz
  • Patent number: 7977402
    Abstract: Radiation curable ink compositions for impulse printheads are described. The compositions include a photoinitiator system, containing both a photocation polymerization initiator and a free-radical photoinitiator, an acrylate ester of a carboxylic acid ester, and at least one radiation curable material.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: July 12, 2011
    Assignee: Collins Ink Corporation
    Inventors: Sudhakar Madhusoodhanan, Devdatt S. Nagvekar
  • Publication number: 20110160330
    Abstract: An object of the present invention is to provide a silsesquioxane compound that is capable of producing a coating film with excellent heat resistance and scratch resistance, and that has excellent compatibility with general polymerizable unsaturated compounds as well as polymerizable unsaturated compounds with high polarity. The present invention provides a silsesquioxane compound comprising organic groups each directly bonded to a silicon atom of the compound, at least one of the organic groups being an organic group having one or more secondary hydroxyl groups and one (meth)acryloyloxy group.
    Type: Application
    Filed: August 12, 2009
    Publication date: June 30, 2011
    Inventors: Akinori Nagai, Masami Kobata, Osamu Isozaki
  • Publication number: 20110152397
    Abstract: A radiation curable solid ink composition comprising at least one curable wax that is curable by free radical polymerization; at least one monomer, oligomer, or prepolymer; at least one non-curable wax; at least one free-radical photoinitiator or photoinitiating moiety; and a colorant; wherein the components form a curable ink composition that is a solid at a first temperature of from about 20 to about 25° C.; and wherein the components form a liquid composition at a second temperature of greater than about 40° C.
    Type: Application
    Filed: December 18, 2009
    Publication date: June 23, 2011
    Applicant: Xerox Corporation
    Inventors: Marcel P. Breton, Michelle N. Chrétien, Peter G. Odell, Christopher Wagner
  • Patent number: 7947336
    Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: May 24, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura
  • Patent number: 7935776
    Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: May 3, 2011
    Assignee: AGI Corporation
    Inventors: Wei Hsiang Huang, Ying Jen Chen, Jui Ming Chang, Chun Hung Kuo, Hong Ye Lin, Li Chung Chang
  • Patent number: 7927711
    Abstract: This invention relates to a durable layer for in-mold decoration. The durable layer is formed from a composition comprising (i) a thermally crosslinkable and photochemically or radically graftable polymer, (ii) a non-ethylenical thermal crosslinker, and (iii) a radiation curable multifunctional monomer or oligomer. The durable layer of the present invention has excellent surface quality with a wider geometric tolerance and can be formed at low cost.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: April 19, 2011
    Assignee: SiPix Chemical Inc.
    Inventors: Xiaojia Wang, Haiyan Gu, Fei Wang, HongMei Zang, Tina Wu, Xin Huo, Rong-Chang Liang
  • Patent number: 7919140
    Abstract: The present invention relates to a process for producing a pressure-sensitive adhesive layer, which includes irradiating a photopolymerizable acrylic pressure-sensitive adhesive composition layer provided between two films with an active energy beam to polymerize the photopolymerizable acrylic pressure-sensitive adhesive composition layer, in which the polymerization is performed while a layer of a composition for preventing polymerization inhibition which is curable with an active energy beam in the atmosphere is provided on a side surface of the photopolymerizable acrylic pressure-sensitive adhesive composition layer. According to the process for producing a pressure-sensitive adhesive layer of the present invention, owing to the construction as discussed above, it is possible to reuse a film.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: April 5, 2011
    Assignee: Nitto Denko Corporation
    Inventors: Kazuhisa Maeda, Isao Hirose, Kunio Nagasaki
  • Patent number: 7915524
    Abstract: A sealing agent for a photoelectric conversion device which comprises one or more of a compound having a glycidyl structure, a compound having a cyclohexene oxide structure, a compound having an oxetane structure and a compound having a vinyl ether structure, and a cationic polymerization initiator; a photoelectric conversion device using the sealing agent; and a solar cell comprising the photoelectric conversion device. The sealing agent for a photoelectric conversion device can be used for pasting together upper and lower electroconductive glass substrates at an ordinary temperature in the manufacture of a photoelectric conversion device, and is excellent with respect to adhesion strength and the reliability in moisture resistance.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: March 29, 2011
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Teruhisa Inoue, Koichiro Shigaki, Masaaki Ikeda
  • Patent number: 7910631
    Abstract: A photosensitive resin composition which is excellent in flame resistance, resolution and flexibility, and substantially free from deposition of components thereof to prevent contamination of a product. The photosensitive resin composition comprises: (A) a cyclic phosphazene compound represented by the following general formula (1): wherein at least one of the Rs is an organic group having the urethane(meth)acrylate structure represented by the following general formula (2) and n is a positive number of 2 to 5: wherein R1 is a hydrogen atom or a methyl group; (B) a carboxyl-containing linear polymer obtained by polymerizing an ethylenically unsaturated compound through addition polymerization; (C) an epoxy resin; (D) an ethylenically unsaturated group-containing polymerizable compound; and (E) a photopolymerization initiator; wherein the cyclic phosphazene compound (A) is present in a proportion of 5 to 30 wt % based on the total weight of the composition.
    Type: Grant
    Filed: October 16, 2008
    Date of Patent: March 22, 2011
    Assignee: Nitto Denko Corporation
    Inventors: Hirofumi Fujii, Katsutoshi Hirashima, Masaki Mizutani, Kyouyuu Jo
  • Patent number: RE42593
    Abstract: A photocurable resin composition suitable for photo-fabrication. The resin composition capable of being promptly cured by photo-irradiation, thereby reducing fabricating time and providing cured products having excellent mechanical strength and minimized shrinkage during curing to ensure high dimensional accuracy. The composition includes (A) an oxetane compound, (B) an epoxy compound, and (C) a cationic photo-initiator.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: August 2, 2011
    Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Tetsuya Yamamura, Tsuyoshi Watanabe, Akira Takeuchi, Takashi Ukachi