Abstract: Provided is an ultraviolet-curable ink jet ink composition with excellent curability and storage stability, the composition containing a monomer A represented by Formula (I): CH2?CR1—COOR2—O—CH?CH—R3 (wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C2-C20 divalent organic residue, and R3 represents a hydrogen atom or a C1-C11 monovalent organic residue); a (meth)acrylated amine compound; a hindered amine compound other than the (meth)acrylated amine compound; and a photopolymerization initiator.

Abstract: To provide a method for producing a coating film, containing: coating a base with a coating material containing a photocurable resin, a photopolymerization initiator, and a solvent; leaving the coated base to stand for longer than 0 minutes but 20 minutes or shorter at 50° C. or lower; and then applying ultraviolet rays to the coated base to thereby produce a coating film on the base.

Abstract: The present invention is drawn to a method for manufacturing antistatic UV-cured hard-coatings on optical articles, comprising (a) coating an organic or mineral optical substrate with an essentially anhydrous solution containing from 20% to 90% by weight, relative to the total dry matter of the solution, of at least one non hydrolyzed epoxyalkyltrialkoxysilane and at least 3.2% by weight, relative to the total dry matter of the solution, of at least one photoinitiator selected from the group consisting of triarylsulfonium salts, diaryliodonium salts, and mixtures thereof, (b) curing the resulting coating by irradiation with UV-radiation, said method not comprising any hydrolysis step before the UV curing step.

Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.

Abstract: Present embodiments are directed to an adhesive and method for assembling a chip package. The adhesive may be used to couple a chip to a substrate, and the adhesive may include an epoxy-based dielectric material, an epoxy resin, a photoacid generator, an antioxidant, and a cold catalyst corresponding to the photoacid generator.

Abstract: An active-energy-ray-curable inkjet ink composition which contains at least two polymerizable monomers each having an unsaturated bond, wherein the maximum value of the difference in electric charge of carbon atoms that constitute the unsaturated bond in each of the at least two polymerizable monomers is 0.24 to 0.46 inclusive and the total content of ions of the elements Fe, Co, Ca, Na, Mg, Al, Ti, Sn and Zn is 5.0 to 100 ppm inclusive, or the difference in e value of the unsaturated double bond moiety in each of the at least two polymerizable monomers is 2.8 to 6 inclusive, and wherein a compound which is unpolymerizable and has a substituent capable of reacting with a nucleophilic agent or an acidic compound is contained.

Abstract: Monomers and polymers used in making spectacle lenses are disclosed. A thermal curing process is disclosed that includes a latent thermal cationic acid generator and optionally a cationic photoinitiator.

Abstract: The invention provides an ink composition including a sensitizer represented by the following Formula (I), a photopolymerization initiator, and a polymerizable compound having an ethylenic unsaturated bond. In the Formula (I), R1, R6 and R8 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a linear or branched alkyl group which may be substituted, or an alkoxy group which may be substituted. R2, R4, R5 and R7 each independently represent a hydrogen atom, a halogen atom, or a cyano group. R3 represents a hydrogen atom, a linear or branched alkyl group which may be substituted, or a cycloalkyl group which may be substituted.

Abstract: Disclosed herein are surface-modified membranes and other surface-modified substrates exhibiting switchable oleophobicity and oleophilicity in aqueous media. These membranes and substrates may be used for variety of applications, including controllable oil/water separation processes, oil spill cleanup, and oil/water purification. Also provided are the making and processing of such surface-modified membranes and other surface-modified substrates.

Abstract: The present disclosure relates to a thermally resistant optical siloxane resin composition including siloxane containing photo-cationically polymerizable epoxy group, a photo initiator, and an antioxidant.

Abstract: The invention relates to dental compositions which can be used to produce dental prostheses and for dental restoration.

Abstract: Photocurable composition curable by ultraviolet (UV) radiation comprising: A) at least one organosiloxane component A of the following formula (I): whereby Pa and Pb are each independently selected from a cationically polymerizable group, x+y is an integer ?1, Sp and Sp? are each independently selected from a cycloaliphatic hydrocarbon group and an aliphatic linear or branched hydrocarbon group, R1 and R2 are each independently linear or branched aliphatic or cycloaliphatic, alkoxy, aromatic or hetero aromatic groups; B) at least one second organosiloxane component B of the following formula (II): whereby n is an integer ranging from 7 to 300, x+y is an integer ?1, Pa and Pb are each independently selected from a cationically polymerizable group, Sp and Sp? are each independently selected from a cycloaliphatic hydrocarbon group and aliphatic linear or branched hydrocarbon group, R1, R2, R3, R4 are each independently linear or branched aliphatic or cycloaliphatic, alkoxy, aromatic or hetero aromatic group; C)

Abstract: A pre-adhesive composition is described comprising an acid- and epoxy-functional (meth)acryloyl copolymer, which when crosslinked with or without using an ionic photoacid generator (PAG) provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles having desirable properties.

Abstract: Provided is a method for disassembling a bonded body, whereby the bonded body can be easily disassembled and peeled. The method for disassembling a bonded body formed by bonding substrates with an adhesive comprises irradiating light having a wavelength of 280 nm or more such that irradiation energy is 1000-5000000 mJ/cm2 at a wavelength of 365 nm while heating the bonded body to 150° C.-300° C.

Abstract: A composition including an actinic radiation or thermally curable polyorganosiloxane ionomer having one or more reactive groups, for example, vinyl, acrylate, epoxy groups.

Abstract: Provided are an actinic energy radiation curable ink, which can achieve a high fineness and natural glossiness when recording is carried out onto a non-absorptive recording medium such as a film or a laminated paper or a slightly absorptive recording medium such as a coated paper; and an actinic energy radiation curable inkjet recording method. This actinic energy radiation curable ink, which is to be used in inkjet recording, is characterized by: said actinic energy radiation curable ink undergoing reversible sol/gel phase transition depending on temperature; said actinic energy radiation curable ink containing from 1% or more by mass to less than 10% by mass of a gelling agent; and, at temperature Tm (° C.) that is separately defined, the storage elastic modulus (G?) of the actinic energy radiation curable ink being from 0.1 or more Pa to less than 1000 Pa and the storage elastic modulus (G?) being smaller than the loss elastic modulus (G?) thereof.

Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.

Abstract: Disclosed are photopolymerizable compositions suitable for uses such as dental composite resins, and that comprise (A) a radical-polymerizable monomer, (B) a photopolymerization initiator that comprises (B1) an ?-diketone compound, (B2) a photoacid generating agent, (B3) an aromatic amine compound, and (C) an organic filler containing a phthalate ester fluorescent agent.

Abstract: Environmentally friendly thick film layers for a micro-fluid ejection head and micro-fluid ejection heads are disclosed. The environmentally friendly thick film layer includes a negative photoresist layer derived from a composition comprising a multi-functional epoxy compound, a low molecular weight polymeric difunctional epoxy compound, a monomeric difunctional epoxy compound, a methide-based photoacid generator that does not contain antimony, a chromophore and an aryl ketone solvent. Optionally the photoresist layer contains an adhesion enhancer. The negative photoresist layer is environmentally friendly and provides good resolution, well defined critical dimensions, straight side walls, and a large processing window.

Abstract: Provided are a salt compound, cationic polymerization initiator and cationically polymerizable composition, which have a superior acid-generating capacity and high sensitivity, and are free from coloration. The salt compound is represented by the following general Formula (1): (wherein, R01 to R05 each independently represents a group selected from a hydrogen atom, a fluorine atom and —YR group, one of the R01 to R05 being a —YR group and at least two of the R01 to R05 being fluorine atoms; Y represents an oxygen atom or a sulfur atom; R represents a C1-C4 alkyl group; Ctp+ represents a p-valent cation, the p being 1 or 2; and n represents a coefficient required for maintaining electrical neutrality).

Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component comprising a polyglycidyl epoxy compound (ii) a free radically active component (iii) a cationic photoinitiator (v) a free radical photoinitiator and optionally (iv) one or more optional components. The photocurable composition can be cured using rapid prototyping techniques to form clear, colorless three-dimensional articles having excellent mechanical properties.

Abstract: Provided is an ultraviolet-curable silicone composition including: (A) a non-terminal epoxy group-containing organopolysiloxane, (B) an organopolysiloxane containing epoxy groups at the two terminals of the molecular chain, and an onium salt photoinitiator capable of generating cations upon irradiation with ultraviolet light. The silicone composition of the present invention yields a cured film that exhibits excellent ultraviolet-curability and can be readily peeled from a pressure-sensitively adhesive material. In particular, the silicone composition yields a cured film that exhibits a tight release force relative to pressure-sensitive adhesives such as acrylic-based pressure-sensitive adhesives, and also exhibits minimal fluctuation in the release force.

Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.

Abstract: The invention relates to a radiation curable composition for taking a dental impression comprising (A) a cationically hardenable compound comprising at least one aziridine moiety, and (B) a radiation sensitive starter, the radiation sensitive starter comprising an onium salt, a ferrocenium salt, a combination or mixture thereof.

Abstract: A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.

Abstract: A composite epoxy resin consisting in a SU-8 epoxy resin, a solvent, with or without photoinitiator and carbon nanotubes in powder. When the resin is combined with the carbon nanotubes, the mechanical, thermal and electrical properties of the nanocomposite are enhanced. That offers a wide range of composites which can be used with different micro-fabrication techniques, such as: lamination, spin-coating, spraying and screening for assembly, interconnect and packaging applications.

Abstract: A pre-adhesive composition is described comprising an acid- and epoxy-functional (meth)acryloyl copolymer, which when crosslinked using an ionic photoacid generator (PAG) provides a pressure-sensitive adhesive and pressure-sensitive adhesive articles having desirable properties.

Abstract: Provided are inorganic-organic block copolymers that self assemble without the addition of a precursor. The inorganic block of the polymers includes silicon and the organic block may be any organic polymer. The inorganic-organic block copolymers self assemble to form a material in which the inorganic polymer block may be crosslinked to produce an organosilicate and/or silica matrix, and further thermal curing of the matrix results in the formation of a porous nanostructured film.

Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.

Abstract: A photosensitive resin composition is provided that is highly safe, provides a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability. According to a photosensitive resin composition including, in addition to an onium fluorinated alkyl fluorophosphate based cation polymerization initiator having a specific structure, a specified solvent or a specified sensitizing agent as essential components, a coating film having superior uniformity, can improve the curing density of the cured resin pattern, and also is capable of forming a micro resist pattern having a large film thickness and a high aspect ratio with high sensitivity and high resolving ability.

Abstract: Liquid radiation curable resins for additive fabrication comprising an R-substituted aromatic thioetber triaryl sulfonmm tetrakis(pentafluorophenyl)borate cationic photoinitiator is disclosed. A process for using the liquid radiation curable resins for additive fabrication and three-dimensional articles made from the liquid radiation curable resins for additive fabrication are also disclosed.

Abstract: An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X? represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by —S—, —O—, —SO—, —SO2—, or —CO—.

Abstract: A salt represented by the formula (I-BB): wherein Q1 and Q2 each independently represent a fluorine atom etc., X1 represents a single bond etc., Y1 represents a C1-C36 aliphatic hydrocarbon group etc., A1 and A2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., Ar1 represents a (m4+1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, B1 represents a single bond etc., B2 represents a C4-C36 alicyclic hydrocarbon group which has one or more —OXa groups and which is not capable of being eliminated by the action of an acid etc., and Xa represents a hydrogen atom or a group capable of being eliminated by the action of an acid, m1 and m2 independently each represents an integer of 0 to 2, m3 represents an integer of 1 to 3, with the proviso that m1 plus m2 plus m3 equals 3, and m4 represents an integer of 1 to 3.

Abstract: Provided is a photocurable pressure-sensitive adhesive composition which does not cause oozing under ordinary temperature and pressure conditions and exhibits sufficient initial tack via drying and crosslinking. The photocurable pressure-sensitive adhesive composition is easily curable by light irradiation and can form a curable pressure-sensitive adhesive layer having high peel resistance. Also provided are a photocurable pressure-sensitive adhesive layer and a photocurable pressure-sensitive adhesive sheet. A photocurable pressure-sensitive adhesive composition is prepared which comprises a graft polymer obtained by grafting a chain that contains a monomer bearing a cyclic ether group onto a (meth)acrylic polymer that contains 0.2 to 10% by weight of hydroxyalkyl(meth)acrylamide monomer units, and a cationic photopolymerization initiator. A photocurable pressure-sensitive adhesive layer using such composition and a photocurable pressure-sensitive adhesive sheet are also prepared.

Abstract: A hardmask composition includes a solvent and an organosilicon copolymer. The organosilicon copolymer may be represented by Formula A: (SiO1.5—Y—SiO1.5)x(R3SiO1.5)y??(A) wherein x and y may satisfy the following relations: x is about 0.05 to about 0.9, y is about 0.05 to about 0.9, and x+y=1, R3 may be a C1-C12 alkyl group, and Y may be a linking group including a substituted or unsubstituted, linear or branched C1-C20 alkyl group, a C1-C20 group containing a chain that includes an aromatic ring, a heterocyclic ring, a urea group or an isocyanurate group, or a C2-C20 group containing one or more multiple bonds.

Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.

Abstract: Provided is a photo-curable transparent resin in which an oxetane monomer for promotion of photo-curing, control of viscosity, and improvement of physical properties is mixed with a photo-cationically polymerizable cyclo-aliphatic epoxy group-containing oligosiloxane resin prepared by a sol-gel reaction. The photo-cationically polymerizable photo-curable transparent resin added with the oxetane monomer provides a cured product having high curing density and retaining excellent mechanical properties, thermal-mechanical properties, and electrical properties.

Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.5, preferably greater than 0.5, more preferable greater than 0.8 as measured at 20° C. resulting from a first curing stage, and improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 300,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.

Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.

Abstract: A light-curing resin composition includes an epoxy resin having two or more epoxy groups in one molecule; a photopolymerization initiator including an anion component and a cation component; and an aralkyl compound having an alcoholic hydroxyl group.

Abstract: The invention features a hardenable dental composition, e.g., polymerizable dental restoratives, adhesives, etc., that contain a color-stable amine electron donor in an initiation system for initiating polymerization of the composition.

Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.

Abstract: Disclosed are a polymer for a chemically amplified resist represented as and a resist composition using the same. In the above Chemical formula 1, X represents vinyl ether derivatives or olefin derivatives, at least one of R1, R2, R3, and R4 is an alkyl group with 1 to 30 carbon atoms containing at least one functional group of a hydrogen atom, an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitryl group (—CN), and an aldehyde group, l, m, n, o and p respectively represent repeating units, l represents a real number of 0.05 to 0.5, m and n respectively represent real numbers of 0.1 to 0.7, o and p respectively represent real numbers of 0 to 0.7, and a sum of l, m, n, o and p is 1.

Abstract: A curable composition comprises: an epoxy silane represented by formula X—Si(OR1)(OR2)(OR3) wherein R1-R3 represent C1 to C4 alkyl groups, and X represents an organic group having at least one oxirane ring; a fluorinated silane represented by formula; wherein: Rf represents a perfluoroalkyl group having from 3 to 5 carbon atoms, R4 represents H or a C1 to C4 alkyl group, and R5-R7 represent C1 to C4 alkyl groups; and a photoacid. Use of the curable composition to coat a phototool, thereby providing a protective coating on the phototool is also disclosed.

Abstract: A photocurable pressure-sensitive adhesive composition, a photocurable pressure-sensitive adhesive layer, and a photocurable pressure-sensitive adhesive sheet including a support and such a photocurable pressure-sensitive adhesive layer formed on at least one side of the support are provided. The photocurable pressure-sensitive adhesive composition can form an adhesive layer that has sufficient initial adhesive strength through the process of drying and cross-linking without having any adhesive protruding at normal temperatures and pressures, hardens easily with light irradiation, and has a high peeling resistance. The photocurable adhesive composition contains a graft polymer that graft-polymerizes a monomer containing a cyclic ether group to a (meth)acrylic polymer and a cationic photopolymerization initiator. The photocurable adhesive layer and the photocurable adhesive sheet are prepared by using said photocurable adhesive composition.

Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.

Abstract: The present invention relates to oxonium salts having [(Ro)3O]+ cations and sulfonium salts having [(Ro)3S]+ cations, where Ro denotes straight-chain or branched alkyl groups having 1-8 C atoms or phenyl which is unsubstituted or substituted by Ro, ORo, N(Ro)2, CN or halogen, and anions selected from the group of [PFx(CyF2y+1?xHz)6?x]? anions, where 2?x?5, 1?y?8 and 0?z?2y+1, or anions selected from the group of [BFn(CN)4?n]? anions, where n=0, 1, 2 or 3, or anions selected from the group of [(Rf1SO2)2N]? anions or anions selected from the group of [BFWRf24?w]? anions, to processes for the preparation thereof, and to the use thereof, in particular for the preparation of ionic liquids.

Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino

Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.

Abstract: The use of at least one diazonium salt bearing an initiator function, for forming an undercoat obtained by grafting a graft derived from the diazonium salt and bearing an initiator function at the surface of a conductive or semiconductive material on the undercoat, and for forming on the undercoat a polymeric layer obtained by polymerization, in particular free radical polymerization, in situ of at least one monomer, initiated from the initiator function.