Specified Rate-affecting Material Contains Onium Group Patents (Class 522/31)
  • Patent number: 6880296
    Abstract: A visible light photopolymerizable composition comprising a) an aryliodonium salt and b) a titanocene derivate. These compositions can be used together with an epoxide resin as a dental composition.
    Type: Grant
    Filed: November 7, 2000
    Date of Patent: April 19, 2005
    Assignee: S & C Polymer Silicon- und Composite-Spezialitaten GmbH
    Inventors: Juergen Engelbrecht, Gunther Groeger, Wolfram Ziegler
  • Patent number: 6875795
    Abstract: The invention provides a silicone composition curable by ultraviolet irradiation to give a cured film on a substrate surface exhibiting surface releasability against sticky surfaces. Advantageously, peeling works of a sticky surface from the cured surface of the inventive composition can be carried out with no or little generation of peeling noises which deteriolate the working environment. The composition comprises three different types of organopolysiloxane compounds of which the first is a so-called MQ siloxane, the second is a linear or cyclic diorganopolysiloxane having epoxy-containing substituents on the silicon atoms other than the chain terminal silicon atoms and the third is a straight or branched linear organopolysiloxane compound substituted by an epoxy-containing substituent on each of the chain terminal silicon atoms in a specified weight proportion of these three. The composition contains an onium salt compound as a photoreaction initiator to promote the ultraviolet-induced curing.
    Type: Grant
    Filed: June 16, 2003
    Date of Patent: April 5, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Shinji Irifune
  • Patent number: 6867244
    Abstract: Photoactivatable coating composition comprising at least one photoinitiator and a base-catalysed polymerisable or curable organic material comprising at least one polyisocyanate and at least one compound containing isocyanate reactive groups, wherein the isocyanate reactive groups comprise at least one thiol group and the photoinitiator is a photolatent base. Preference is given to a coating composition wherein the photolatent base is selected from the group of N-substituted 4-(ortho-nitrophenyl)dihydropyridine, a quaternary organo-boron photoinitiator, and an ?-amino acetophenone. The composition additionally may comprise an organic acid, a metal complex and/or a metal salt as a cocatalyst and/or a sensitiser selected from the group of thioxanthones, oxazines, rhodamines, and preferably from the group of benzophenone and derivatives thereof.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: March 15, 2005
    Assignee: Akzo Nobel N.V.
    Inventors: Huig Klinkenberg, Josephus Christiaan Van Oorschot
  • Patent number: 6867242
    Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: March 15, 2005
    Assignee: Rhodia Chimie
    Inventors: Jean-Marc Frances, Olivier Loubet
  • Patent number: 6863701
    Abstract: Compositions that can be photopolymerized by a cationic initiator at an accelerated rate include at least one epoxy monomer, at least one cationic photoinitiator, and a photosensitizer/accelerator. The accelerator is a phenolic resole, or a compound having a structure according to the formula R1(CR2R3OH)n, wherein R1 is selected from phenyl, polycyclic aryl, and polycyclic heteroaryl, each optionally substituted with one or more electron donating group substituted phenyl; R2 and R3 are independently selected from hydrogen, alkyl, aryl, alkylaryl, substituted alkyl, substituted aryl and substituted alkylaryl; and n is an integer from 1 to 10.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: March 8, 2005
    Assignee: Rensselaer Polytechnic Institute
    Inventor: James Vincent Crivello
  • Patent number: 6864311
    Abstract: The invention aims at improving such compositions by proposing a non-toxic diluent harmless to reactivity and by making these compositions translucent, free from metallic impurities and capable of constituting light-polymerisable varnish with good properties of ductility for leveling and surface coating. This aim is achieved by the invention which proposes a composition comprising an organic polymerisable matrix A, containing cyclo-aliphatic epoxide resins or not, acrylates, alkenyl-ethers or polyols, a silicon diluent B with viscosity less than 100 MPa's, a radical and/or cationic (onium salt) photoinitiator C, optionally a light-sensitising material D, a pigment E and another additive F; provided that when A is a cyclo-aliphatic epoxide resin, B has a metal concentration not more than 100 ppm. The invention also concerns the use of the silicon diluent B for preparing a composition crosslinkable by cationic and/or radical process, under UV radiation, in the presence of a photoinitiator (ink or varnish).
    Type: Grant
    Filed: April 1, 2003
    Date of Patent: March 8, 2005
    Assignee: Rhodia Chimie
    Inventors: Stefan Breunig, Jean-Marc Frances
  • Patent number: 6861455
    Abstract: A composition for a bulkhead of a thin display panel which is a mixed composition comprising a powder of glass or ceramic for molding a bulkhead of a thin display panel or a part thereof and a binder being an organic additive, wherein the above organic additive contains 15 to 50% by weight of a resin composition which generates heat energy by irradiation with an energy ray and which can be cured by energy coming from an energy ray source or the resulting heat energy. To provide a composition for a bulkhead which is used for molding a bulkhead constituting a discharge display cell of a thin display panel or mending a broken part thereof and which is improved in curability.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: March 1, 2005
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventor: Noriya Hayashi
  • Patent number: 6858260
    Abstract: A radiation curable, flexible, paintable composition produced from epoxy compounds and one or more polyol(s) has enhanced durability, thick and thin film adhesion, resistance to mold growth and dimensional changes while reducing solvent emissions. The composition can reduce, if not eliminate, runs and drips during the thermal bake cycles which are associated with using conventional compositions in automotive applications.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: February 22, 2005
    Assignee: Denovus LLC
    Inventors: Donald W. Taylor, Todd W. Scrivens, Laurie Denise Lovshe, Jeffrey T. Pachl
  • Patent number: 6852767
    Abstract: A photo-curing ink composition comprises a photocation-polymerizable substance, a photocation polymerization initiator, and a surfactant having a functional group. The surfactant is selected and the amount thereof is adjusted so that the acid value per 100 g of the ink composition is not more than 150 mg KOH. The surfactant is selected and the amount thereof is adjusted so that the amine value per 100 g of the ink composition is not more than 23 mg KOH. The ink composition is excellent in dispersion performance, storage stability, and curing performance.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: February 8, 2005
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Minobu Maeda
  • Patent number: 6831115
    Abstract: Modified polyolefins are produced by reacting a functionalized polyolefin with one or more ethylenically unsaturated compounds having a functional group reactive with the functional group on the polyolefin. These modified polyolefins may then polymerize in the presence of a photoinitiator upon exposure to ultraviolet radiation and also have the capability of copolymerizing in the presence of a photoinitiator with other ethylenically unsaturated crosslinking agents upon exposure to ultraviolet radiation. These modified polyolefins may also contain pendant carboxyl groups, which have the propensity to form hydrophilic salts with amines, and therefore may be rendered water-dispersible. The modified polyolefins of the present invention significantly improve the adhesion of paints, inks, and adhesives to various plastic and metal substrates.
    Type: Grant
    Filed: February 6, 2002
    Date of Patent: December 14, 2004
    Assignee: Eastman Chemical Company
    Inventors: Kevin Alan Williams, Michael Bellas, Charlie Carroll Freeman, Jr., Lisa Kay Templeton
  • Patent number: 6818379
    Abstract: The present invention provides a sulfonium salt represented by the following formula (I): wherein Q1, Q2 and Q3 each independently represent hydrogen, hydroxy, alkyl having 1 to 6 carbon atoms, or alkoxy having 1 to 6 carbon atoms, but all of Q1, Q2 and Q3 are not the same; and Q4 and Q5 each independently represent perfluoroalkyl having 1 to 8 carbon atoms. The present invention also provides a chemical amplifying type positive resist composition having the sulfonium salt above and a resin which contains a structural unit having a group that is unstable to acid and which is insoluble or slightly soluble by itself in an aqueous alkali, but becomes soluble in the aqueous alkali by an action of acid. The present invention further provides a polymerization initiator composition having the sulfonium salt above and a sensitizer.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: November 16, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Akira Kamabuchi, Kaoru Araki
  • Patent number: 6803081
    Abstract: Radiation curable adhesive comprising an epoxidized block copolymer, a saturated block copolymer and/or a rosin derived alcohol, and a photoinitiator. The adhesives find particular use in the tape and label industry.
    Type: Grant
    Filed: June 26, 2001
    Date of Patent: October 12, 2004
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventor: Charles W. Paul
  • Publication number: 20040186195
    Abstract: A photopolymerization initiator comprising (A) a photo acid-generating compound such as diaryliodonium salt (e.g., diphenyl iodonium, bis(p-chlorophenyl)iodonium, etc.), (B) a photo oxidation radical-generating compound such as diarylketone compound, &agr;-diketone compound or ketocoumarin compound, and (C) a fused polycyclic aromatic compound such as 1,4-dimethylnaphthalene, 1-methylanthracene, 9-methylanthracene, 9,10-dimethylanthracene or 9,10-diethylanthracene. The photopolymerization initiator makes it possible to efficiently polymerize the cationically polymerizable monomer by the irradiation with visible light.
    Type: Application
    Filed: December 18, 2003
    Publication date: September 23, 2004
    Inventors: Takeshi Suzuki, Hideki Kazama
  • Publication number: 20040180981
    Abstract: The present invention provides network polymers obtained by curing compositions that comprise an ester with at least two terminal epoxy groups. Preferred esters include those represented by the formula (1), wherein each R1 independently represents a substituted or unsubstituted homoaliphatic or hctcroaliphatic group; A represents a substituted or unsubstituted homoalkylene, hetemalkylene, arylene, or hetematylene segment; and n represents an integer equal to or greater than 2.
    Type: Application
    Filed: March 11, 2004
    Publication date: September 16, 2004
    Inventors: Leonardo C Lopez, Jimmy D Earls, Jerry E White, Zenon Lysenko
  • Patent number: 6787281
    Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). wherein R1 is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar1 is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R2, R3 and R4 are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R5 and R6 are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.
    Type: Grant
    Filed: May 24, 2002
    Date of Patent: September 7, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ting Tao, Jianbing Huang
  • Patent number: 6783918
    Abstract: A radiation curable resin formulation suitable for planarizing an ink jet heater chip. The resin formulation includes a multifunctional epoxy component, a difunctional epoxy component, a silane coupling agent, an aryl sulfonium salt photoinitiator, and a non-photoreactive solvent. The resin formulation is substantially devoid of acrylate polymer components. Radiation curable resins according to the invention exhibit enhanced adhesion with the nozzle plate adhesive thereby reducing the incidence of delamination between the nozzle plate and a semiconductor chip containing the resin layer. Another advantage is that the resin layer, according to the invention, reduces pigment flocculation on the surface of the resin layer when using pigment-based ink jet inks.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: August 31, 2004
    Assignee: Lexmark International, Inc.
    Inventors: Girish S. Patil, Brian C. Hart
  • Patent number: 6784222
    Abstract: An electroconductive coating composition which function as a sealer/primer includes (a) a radiation curable, polymerizable compound, (b) a photoinitiator and (c) a conductive pigment. The conductive pigment may be a mixture of pigment including a blend of conductive pigments as well as conductive pigment. Conductivity enhancers may, also, be added. The polymerizable compound is, preferably, a U curable acrylate functional compound which may be monofunctional or polyfunctional. The composition is particularly useful for sealing and priming SMC panels.
    Type: Grant
    Filed: March 6, 2002
    Date of Patent: August 31, 2004
    Inventors: Frank David Zychowski, Joseph C. Sgro
  • Publication number: 20040162362
    Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)-Q−-X2(Z2)-R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S=Z3, S=Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ═O, ═NC≡N, ═C(C≡N)2, ═NS (=Z)2R6 or ═C[S(=Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame.
    Type: Application
    Filed: February 14, 2003
    Publication date: August 19, 2004
    Inventors: Michel Armand, Christophe Michot, Yurii Yagupolskii, Lev Yagupolskii, Andrej Bezdudny, Natalya Kondratenko
  • Patent number: 6777160
    Abstract: A positive-working resist composition comprising (A) a specific resin which has an aliphatic cyclic hydrocarbon group and enhances in the dissolution rate in an alkaline developing solution by an action of an acid, and (B) a specific compound generating an acid by irradiation of actinic ray or radiation. The composition is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF eximer laser beams.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: August 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kenichiro Sato, Kunihiko Kodama
  • Publication number: 20040152009
    Abstract: The present invention provides a sulfonate of the formula (I): 1
    Type: Application
    Filed: August 25, 2003
    Publication date: August 5, 2004
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Satoshi Yamaguchi, Yasunori Uetani, Hiroshi Moriuma
  • Patent number: 6767577
    Abstract: The present invention discloses an ultraviolet light curable electroluminescent composition and method for making such a composition that may be used to produce an electroluminescent active layer. An active layer is a layer that when incorporated in a suitable device emits light when a voltage is applied. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the active layer after curing. It is an advantage of the present invention that the deposition of the dielectric layer in such a device is optional when the disclosed electroluminescent composition is used to deposit the active layer.
    Type: Grant
    Filed: April 4, 2002
    Date of Patent: July 27, 2004
    Assignee: Allied PhotoChemical, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6765036
    Abstract: Photopolymerizable compositions comprise a cationically polymerizable resin and a photoinitiator system comprising: (i) an iodonium salt; (ii) a visible light sensitizer; and (iii) an electron donor compound having an oxidation potential less than that of 1,4-dimethoxybenzene when measured versus a saturated calomel electrode, wherein the photoinitiator system has a photoinduced potential of less than that of 3-dimethylaminobenzoic acid in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. The compositions polymerize on exposure to light in the visible spectrum and are useful in a variety of applications, including dental adhesives and dental composites.
    Type: Grant
    Filed: January 15, 2002
    Date of Patent: July 20, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Karsten Dede, Thomas Klettke, Thomas Luchterhandt, Joel D. Oxman
  • Publication number: 20040137369
    Abstract: A polymerizable composition containing: (A) a binder polymer; (B) a compound having a polymerizable unsaturated group; and (C) a compound which has a triarylsulfonium salt structure and in which a sum of Hammett's a constants of all substituents bonded to the aryl skeleton is larger than 0.46.
    Type: Application
    Filed: December 18, 2003
    Publication date: July 15, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Kazuto Shimada
  • Publication number: 20040132853
    Abstract: A photocationic polymerization initiator comprising (A) a photo acid-generating compound and (B) a fused polycyclic aromatic compound, wherein said fused polycyclic aromatic compound has a molecular structure in which a fused aromatic ring is further condensed with a non-aromatic ring, and at least one of the atoms constituting said non-aromatic ring directly bonded to a common atom in the fused aromatic ring and the non-aromatic ring, is a saturated carbon atom, said saturated carbon atom having at least one hydrogen atom. Upon blending the photopolymerizable monomer with the photocationic polymerization initiator, there is obtained a photocationically polymerizable composition having a high sensitivity for the visible light rays, which is useful for dental applications, exhibiting a sufficiently high curing rate and offering sufficient depth of curing upon the irradiation with light for only a short period of time.
    Type: Application
    Filed: November 12, 2003
    Publication date: July 8, 2004
    Inventors: Takeshi Suzuki, Hideki Kazama
  • Publication number: 20040122122
    Abstract: Novel catalyst systems in cationically curable compositions provide colorless cationically cured compositions with improved degree of cure and thermal stability. The curable composition comprises at least one cationically curable monomer and a curing agent comprising Photocurative A or Photocurative B. Photocurative A comprises an effective amount of an accelerating photochemically active salt comprising a photochemically active cation and an accelerating anion, and an effective amount of an inhibiting non-photochemically active salt comprising a non-photochemically active cation and an inhibiting anion. Photocurative B comprises an effective amount of an inhibiting photochemically active salt comprising a photochemically active cation and an inhibiting anion, and an effective amount of an accelerating non-photochemically active salt comprising a non-photochemically active cation and an accelerating anion.
    Type: Application
    Filed: December 23, 2002
    Publication date: June 24, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Michael C. Palazzotto, Stefan H. Gryska
  • Publication number: 20040116548
    Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.
    Type: Application
    Filed: December 12, 2002
    Publication date: June 17, 2004
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: C. Grant Willson, Nicholas A. Stacey
  • Patent number: 6750267
    Abstract: Disclosed herein are radiation-curable polymers, a method of preparing radiation-curable polymers and compositions containing radiation-curable polymers. Radiation-curable polymers and compositions containing radiation-curable polymers are useful as coatings and adhesives.
    Type: Grant
    Filed: December 24, 2001
    Date of Patent: June 15, 2004
    Assignees: University of Massachusetts Lowell, Dow Corning Corporation
    Inventors: Rudolf Faust, Savvas Hadjikyriacou, Toshio Suzuki, Maneesh Bahadur
  • Patent number: 6746722
    Abstract: A fluorine-containing phenylmaleimide derivative having a specific structure. A polymer obtained by polymerizing monomers containing the derivative. A polymer containing a specific structural unit and having a weight-average molecular weight of 2,000 to 200,000. A chemically amplified resist composition containing the polymer and a photo acid generator, wherein the proportion of the polymer relative to the total of the polymer and the photo acid generator is 70 to 99.8% by mass. A method for pattern formation, which comprises coating the above composition on a to-be-processed substrate, exposing with a light of 180 nm or less wavelength, and conducting baking and development.
    Type: Grant
    Filed: July 22, 2002
    Date of Patent: June 8, 2004
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichiro Nakano
  • Patent number: 6737169
    Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.
    Type: Grant
    Filed: January 30, 2002
    Date of Patent: May 18, 2004
    Assignee: JSR Corporation
    Inventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi
  • Patent number: 6723483
    Abstract: A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R1 and R2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R1 and R2 are a lower alkyl group, R3s are each independently an alkyl group, n is an integer of 0 to 3, i is an integer of 1 to 3, j is an integer of 0 to 2, provided that i+j=3, Y− is an anion derived from a sulfonic acid shown by the general formula [2] R4—SO3H  [2] [wherein R4 is an alkyl group or an aryl group which may have as a substituent an alkyl group]). (wherein X is a phenyl group which has a substituent at an ortho- and/or a meta-position, m is an integer of 1 to 3, q is an integer of 0 to 2, provided that m+q=3, p is 1 or 2 and Zp− is an anion derived from a carboxylic acid).
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 20, 2004
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Keiji Oono, Kazuhito Fukasawa, Kazunori Sakamoto, Fumiyoshi Urano, Motoshige Sumino, Shigeaki Imazeki
  • Patent number: 6723814
    Abstract: Membranes made from amphiphilic copolymers are disclosed. The amphiphilic copolymers can be ABA copolymers, where one of A and B is hydrophilic and the other is hydrophobic. The copolymers may be crosslinked to form more stable structures. Crosslinking can be accomplished using a variety of methods, including end to end polymerization of copolymers having terminal unsaturated groups. Molecules such as membrane proteins can be incorporated into the membrane to allow the transport there through of selected components.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: April 20, 2004
    Assignee: BioCure, Inc.
    Inventors: Wolfgang Meier, Corinne Nardin, Mathias Winterhalter
  • Patent number: 6716893
    Abstract: The present invention discloses an ultraviolet light curable ferromagnetic composition and method for making such a composition that may be used to produce a ferromagnetic coating on a suitable substrate. These coatings may be used to produce printed capacitors and inductors. The disclosed composition does not contain any significant amount of volatile organic solvents that do not become incorporated in the active layer after curing.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: April 6, 2004
    Assignee: UV Specialties, Inc.
    Inventor: Roy C. Krohn
  • Patent number: 6713526
    Abstract: A curable slurry for forming ceramic microstructures on a substrate using a mold. The slurry is a mixture of a ceramic powder, a fugitive binder, and a diluent. The ceramic powder has a low softening temperature in a range of about 400° C. to 600° C. and a coefficient of thermal expansion closely matched to that of the substrate. The fugitive binder is capable of radiation curing, electron beam curing, or thermal curing. The diluent promotes release properties with the mold after curing the binder or quick and complete burn out of the binder during debinding.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: March 30, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Kenneth R. Dillon, Kyung H. Moh, Thomas Edward Wood, Raymond C. Chiu, Vincent Wen-Shiuan King, Richard P. Rusin
  • Patent number: 6709804
    Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: March 23, 2004
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Patent number: 6706403
    Abstract: A process, system, and materials for lamination of anti-reflective glass to the screen of a CRT display, including a polymerizable adhesive and laminated articles are described. The photopolymerizable adhesive composition including, in certain embodiments, an epoxy resin and a photosensitive initiating system are disclosed.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: March 16, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Peter M. Olofson, Kent W. Morris, Michael C. Palazzotto
  • Patent number: 6703181
    Abstract: There is provided a photosensitive composition suitable for a resist material. This photosensitive composition has a high sensitivity and a high resolution with respect to a light source having a short wavelength, does not cause a phase separation in a film state, and makes it possible to stably form fine resist patterns. The photosensitive composition contains a polymer obtained by protecting an alkali-soluble group of an alkali-soluble polymer by a group which is unstable with respect to an acid, a compound which generates an acid upon being irradiated with light, at least one compound which is selected from the group consisting of an imidazole compound, an alanine compound, an adenine compound, an adenosine compound, and a quaternary ammonium salt compound, and which increases miscibility in a resist film, and a phenol compound.
    Type: Grant
    Filed: September 9, 1996
    Date of Patent: March 9, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takao Hayashi, Yasunobu Onishi, Kazuo Sato, Kenji Chiba, Masataka Miyamura
  • Patent number: 6696506
    Abstract: A cationic photocatalyst composition and a photocurable composition utilizing cationic polymerization are provided which can present sufficient open time and adhesion. The cationic photocatalyst composition contains a photosensitive onium salt and a compound represented by the following formula (1). The photocurable composition contains the cationic photocatalyst composition and an epoxy compound having at least one epoxy group per molecule. Formula (1) [Compound B] (wherein R and R′ are suitably selected from hydrogen, halogen, saturated hydrocarbon groups, unsaturated hydrocarbon groups, substituting groups comprising any suitable combination of elements such as carbon, hydrogen, oxygen, nitrogen and sulfur; and l and n each is an integer of 2 or larger).
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: February 24, 2004
    Assignee: Sekisui Chemical Co., Ltd.
    Inventor: Hiroji Fukui
  • Publication number: 20040024080
    Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.
    Type: Application
    Filed: July 31, 2003
    Publication date: February 5, 2004
    Applicant: DSM N.V.
    Inventors: Lin Jibing, Montgomery I. Eva, Snowwhite E. Paul, Petisce R. James, Kotesky Anton
  • Publication number: 20040014833
    Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated colour forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a colour changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerisation and/or crosslinking or colour change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or colour changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.
    Type: Application
    Filed: June 20, 2003
    Publication date: January 22, 2004
    Inventor: Grant Bradley
  • Patent number: 6680347
    Abstract: A process for making a self-dispersible, radiation curable coating composition involving: (a) providing a cationic oligomer; (b) providing an epoxy functional monomer; (c) providing a surfactant component; (d) providing a transfer agent; (e) providing a photoinitiator; and (f) mixing (a)-(e) to form the coating composition.
    Type: Grant
    Filed: September 15, 2000
    Date of Patent: January 20, 2004
    Assignee: Cognis Corporation
    Inventors: Marie-Esther Saint Victor, Grannis S. Johnson
  • Patent number: 6677390
    Abstract: An iodonium salt compound which is colored little, can be easily synthesized in high yield, is highly sensitive to irradiation with actinic energy rays such as light, electronic beams, or X-rays, is highly soluble in monomers, and is lowly toxic; and a photocurable composition which can cure in a short time even when the counter anion is a hexafluorophosphonate, tetrafluoroborate, etc., regardless of whether it is clear or pigmented, and which gives a cured object having excellent properties. The photocurable composition is prepared by compounding an iodonium salt compound represented by the general formula (I) with a cationically polymerizable compound, a sensitizer, etc.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: January 13, 2004
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Eiji Takahashi, Akihiro Shirai, Hiroshi Takahashi, Shinichi Kimizuka
  • Publication number: 20040006150
    Abstract: The present invention is directed to a photocurable composition for use as an encapsulant, for underfill or attachment adhesives, capable of curing at wavelengths greater than 290 nm. Reaction products of these photocurable compositions have a low level of extractable halide ion, such as less than 100 ppm. In use, the photocurable composition may be applied, for instance, over the wire bonds that electrically connect a semiconductor device to a substrate to maintain a fixed positional relationship and protect the integrity of the electrical connection from vibrational and shock disturbances, as well as from interference from environmental contaminants.
    Type: Application
    Filed: June 24, 2002
    Publication date: January 8, 2004
    Applicant: HENKEL LOCTITE CORPORATION
    Inventors: Helen M. Murray, Jonathan P. Wigham, John E. Cahill, Aisling Lakes, Matthew J. Holloway, Eadaoin D. Ledwidge, Mary B. Ward
  • Publication number: 20040002556
    Abstract: The invention is the method of preparing macromer for use in making ophthalmic lenses comprising combining two or more monomers and using a macromer-forming catalyst, wherein the macromer-forming catalyst comprises triethylamine or bismuth.
    Type: Application
    Filed: June 25, 2002
    Publication date: January 1, 2004
    Inventors: Frank F. Molock, Annie C. Maiden, Xiaoping Lin, Carrie L. Caison, Michael R. Clark, Robert Love
  • Publication number: 20030232900
    Abstract: The invention provides a silicone composition curable by ultraviolet irradiation to give a cured film on a substrate surface exhibiting surface releasability against sticky surfaces. Advantageously, peeling works of a sticky surface from the cured surface of the inventive composition can be carried out with no or little generation of peeling noises which deteriolate the working environment. The composition comprises three different types of organopolysiloxane compounds of which the first is a so-called MQ siloxane, the second is a linear or cyclic diorganopolysiloxane having epoxy-containing substituents on the silicon atoms other than the chain terminal silicon atoms and the third is a straight or branched linear organopolysiloxane compound substituted by an epoxy-containing substituent on each of the chain terminal silicon atoms in a specified weight proportion of these three. The composition contains an onium salt compound as a photoreaction initiator to promote the ultraviolet-induced curing.
    Type: Application
    Filed: June 16, 2003
    Publication date: December 18, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Shinji Irifune
  • Publication number: 20030224284
    Abstract: A radiation-sensitive patterning composition comprising:
    Type: Application
    Filed: May 30, 2002
    Publication date: December 4, 2003
    Inventor: Ting Tao
  • Publication number: 20030212162
    Abstract: A polymerizable composition comprising a polymerization initiator (A) represented by the formula (1) and a radical-polymerizable compound (B):
    Type: Application
    Filed: November 22, 2002
    Publication date: November 13, 2003
    Inventors: Takahiko Uesugi, Masashi Arishima, Tadao Yagi
  • Patent number: 6635683
    Abstract: A memberane sensitive to anions is obtained by forming into a membrane either a composition comprising an onium salt compound such as trioctylmethylammonium chloride or tetraoctylammonium bromide, and an aromatic boric diester compound such as (p-alkyloxy)phenyl borate, or a composition which comprises these two ingredients and a membrane-forming polymer such as polyvinyl chloride or polystyrene, and may further contain a fat-soluble anion salt such as tetraphenyl borate. This membrane can yield an ion-selective electrode which permits hydrogencarbonate ions contained in body fluids to be rapidly determined with high sensitivity and high selectivity and which has a long life.
    Type: Grant
    Filed: January 26, 2001
    Date of Patent: October 21, 2003
    Assignee: Tokuyama Corporation
    Inventors: Hiroaki Taira, Kazuya Ibaragi, Hiromasa Yamamoto, Hiroyuki Yanagi
  • Publication number: 20030195269
    Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)-Q−-X2(Z2)-R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S=Z3, S=Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ═O, ═NC≡N, ═C(C≡N)2, ═NS (=Z)2R6 or ═C[S(=Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame.
    Type: Application
    Filed: February 14, 2003
    Publication date: October 16, 2003
    Inventors: Michel Armand, Christophe Michot, Yurii Yagupolskii, Lev Yagupolskii, Andrej Bezdudny, Natalya Kondratenko
  • Publication number: 20030194650
    Abstract: A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubility in an alkali developer and (B) an acid generator capable of generating an acid upon irradiation of an actinic ray or radiation, and the acid generator of (B) is a compound selected from a sulfonium salt containing no aromatic ring and a compound having a phenacylsulfonium salt structure.
    Type: Application
    Filed: December 12, 2002
    Publication date: October 16, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Shinichi Kanna, Kazuyoshi Mizutani, Kunihiko Kodama, Tomoya Sasaki
  • Patent number: 6630242
    Abstract: A radiation-curable fiber optic coating composition for an inner primary coating includes a coloring agent, preferably a dye or a dye precursor, compatible with the fiber of the fiber optic and capable of imparting a pre-selected color to the inner primary coating, or another coating. The coloring agent can be a reactive dye. Any of the dyes preferably is stabilized by a stabiliser in the colored coating layer, or, preferably, in a more exterior layer.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: October 7, 2003
    Assignee: DSM N.V.
    Inventors: Jibing Lin, Eva I. Montgomery, Paul E. Snowwhite, Jr., James R. Petisce, Anton Kotesky