Specified Rate-affecting Material Contains Onium Group Patents (Class 522/31)
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Publication number: 20090258961Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV-and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.Type: ApplicationFiled: March 9, 2009Publication date: October 15, 2009Inventor: Jean-Marc FRANCES
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Publication number: 20090246540Abstract: An ultraviolet-curable silicone composition for a release paper including (A) 100 parts by mass of a specific organopolysiloxane having a polymerization degree of 8 to 20 and containing one epoxy group, and (C) an effective quantity of an onium salt photoinitiator. In a preferred embodiment, the composition further includes (B) 10 to 1,000 parts by mass of at least one specific organopolysiloxane containing a plurality of epoxy groups. In another preferred embodiment, the composition has a viscosity of not more than 100 mPa·s. The composition has a peel strength that exhibits a positive dependency on the peel speed when peeled from a hot-melt pressure-sensitive adhesive, and can therefore be used to produce a release paper capable of reducing peeling noise. Further, because the composition has a low viscosity, it exhibits excellent wetting of substrates having significant unevenness, even in a solventless form.Type: ApplicationFiled: March 30, 2009Publication date: October 1, 2009Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Shinji IRIFUNE, Akinari Itagaki
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Patent number: 7579390Abstract: There is proposed an inkjet ink composition comprising a pigment component to which a resin having a basic terminal is adsorbed, a photo-acid generating agent containing an onium salt, and at least one kind of solvent which can be polymerized under the presence of an acid. The content of multivalent salt included in the onium salt is not more than 20% by weight based on a total weight of onium salt, and the content of the pigment component is confined within the range of 3 to 41% by weight based on the ink composition.Type: GrantFiled: March 8, 2005Date of Patent: August 25, 2009Assignee: Toshiba Tec Kabushiki KaishaInventors: Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Ryozo Akiyama, Masahi Hiroki
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Publication number: 20090197090Abstract: Disclosed herein is a composition, including a fluorine-based polymer or a perfluoropolyether (PFPE) derivative and a PFPE-miscible polymer, an anti-oxide film and electronic component including the same, and methods of forming an anti-oxide film and an electronic component. Use of the composition may achieve formation of an anti-oxide film through a solution process and electronic components using a metal having increased conductivity and decreased production costs.Type: ApplicationFiled: June 13, 2008Publication date: August 6, 2009Inventors: Jung Seok Hahn, Jong Baek Seon, Euk Che Hwang, Jong Ho Lee, Min Ho O
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Publication number: 20090184417Abstract: Disclosed are photosensitizers that include a polyol moiety covalently bonded to a fused aromatic moiety. Also disclosed is a method for improving UV laser ablation performance of a coating, such as a cationic UV curable coating, by incorporating an oxalyl-containing additive into the cationic UV curable or other coating. Oxalyl-containing sensitizers having the formula Q-O—C(O)—C(O)—O—R1, wherein Q represents a fused aromatic moiety and R1 is an alkyl or aryl group, are also disclosed, as are oxalyl-containing oxetane resins, oxalyl-containing polyester polyols, and cationic UV curable coating formulations that include oxalyl-containing additives.Type: ApplicationFiled: April 21, 2007Publication date: July 23, 2009Inventors: Dean C. Webster, Zhigang Chen
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Patent number: 7563559Abstract: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.Type: GrantFiled: July 3, 2007Date of Patent: July 21, 2009Assignee: FormFactor, Inc.Inventor: Treliant Fang
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Patent number: 7563832Abstract: A photocurable resin composition comprises a cationic polymerizable compound (A), an acrylic resin (B) and a cationic photopolymerization initiator (C), in which the acrylic resin (B) has a cationic polymerizable functional group, and the content of the component (A) is 30 to 95 parts by mass and the content of the component (B) is 5 to 70 parts by mass, based on 100 parts by mass of the total amount of the components (A) and (B). In addition, the functional group of the acrylic resin (B) preferably contains at least one of a cyclic ether group, a vinyloxy group, an acid adduct of a vinyloxy group, and an active hydrogen group, with the active hydrogen group preferably being a hydroxyl group. The photocurable resin composition has sufficient curability and sufficient adhesiveness to rigid plastics such as polycarbonate and PET having poor adhesive property.Type: GrantFiled: July 21, 2005Date of Patent: July 21, 2009Assignee: Mitsui Chemicals, Inc.Inventors: Yuichi Ito, Satoru Suda, Yasushi Mizuta
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Patent number: 7560219Abstract: Sulfonium salt photoinitiator compositions, precursors useful in the preparation of such photoinitiators and the use of these photoinitiators in, e.g., UV curable adhesives, UV curable sealants, UV curable coating compositions, such as printing inks and varnishes, and UV curable encapsulants.Type: GrantFiled: April 26, 2007Date of Patent: July 14, 2009Assignee: Henkel AG & Co. KGaAInventors: Yuxia Liu, Donald E. Herr
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Patent number: 7556908Abstract: The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of structural units of the formulas (II), (O/II), (IV) and (V) and (B) an acid generator. The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.Type: GrantFiled: April 21, 2005Date of Patent: July 7, 2009Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Isao Yoshida, Takayuki Miyagawa
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Patent number: 7544721Abstract: A photosensitive adhesive composition of the polymerizable resin type, the hardening of which occurs by polymerization and/or reticulation, includes:—initiators for at least one chain polymerization reaction to guarantee the hardening of the composition and a sufficient quantity of at least one bifunctional monomer, including a photolabile center with at least one photolabile entity and at least two polymerizable units, connected by covalent skeletons to the photolabile center and located away from the cleavage sites of the photolabile center, such that the composition loses the integrity and adhesivity thereof under the influence of a reticulating radiation causing the cleavage of the photolabile sites. The composition is particularly of application in dentistry.Type: GrantFiled: April 2, 2003Date of Patent: June 9, 2009Assignee: Produits Dentaires Pierre RollandInventors: Vincent Gaud, Yves Gnanou, Jean-Pierre Desvergne, Francis Dieras, Alexandrine Roubiere
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Publication number: 20090142606Abstract: A process for the polymerization and/or crosslinking of an organic coating composition is provided. The process involves employing an organic coating composition which can crosslink and/or polymerize under irradiation with short-wave ultraviolet (UV C) radiation with a wavelength of between 200 and 280 nm.Type: ApplicationFiled: September 13, 2006Publication date: June 4, 2009Applicant: Bluestar Silicones FranceInventor: Christian Mirou
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Patent number: 7541131Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.Type: GrantFiled: February 17, 2006Date of Patent: June 2, 2009Assignee: FUJIFILM CorporationInventor: Yasutomo Kawanishi
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Publication number: 20090137695Abstract: An active ray curable ink-jet ink comprising at least an organic pigment, a polymer dispersant, a photo-initiator and a cationic polymerizable compound, wherein the active ray curable ink-jet ink incorporates a quaternary ammonium salt and a content of the quaternary ammonium salt is not less than 5 ppm and not more than 500 ppm.Type: ApplicationFiled: August 11, 2006Publication date: May 28, 2009Applicant: KONICA MINOLTA MEDECAL & GRAPHIC, INC.Inventor: Toshiyuki Takabayashi
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Patent number: 7534820Abstract: The present invention provides a novel photocurable composition containing an organic polymer having an epoxy group and/or oxetane group-containing silicon group at an end and a cationic photoinitiator. For example, the photocurable composition contains an organic polymer (A) having an epoxy group and/or oxetane group-containing silicon group at an end, and a cationic photoinitiator (B), the organic polymer (A) being produced by addition reaction between an organic polymer terminated with an unsaturated group and a hydrosilane compound having an epoxy group and/or an oxetane group.Type: GrantFiled: March 13, 2006Date of Patent: May 19, 2009Assignee: Kaneka CorporationInventors: Yoshiyuki Kohno, Hiroshi Ando
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Patent number: 7524614Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.Type: GrantFiled: May 26, 2006Date of Patent: April 28, 2009Assignee: Eastman Kodak CompanyInventors: Ting Tao, Scott A. Beckley
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Patent number: 7524610Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.Type: GrantFiled: June 26, 2007Date of Patent: April 28, 2009Assignee: Samsung Electronics Co., LtdInventors: Kyu-sik Kim, Jin-baek Kim, Young-ung Ha, Byung-ha Park, Ji-young Park, Su-min Kim
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Publication number: 20090071602Abstract: The present invention relates to a polymerizable composition comprising a cycloaliphatic epoxide compound, a monovalent alcohol, a photopolymerization initiator, wherein the molar ratio of the epoxide groups of the cycloaliphatic epoxide to the hydroxyl groups of the monovalent alcohol is 0.9:1.0 to 4.0:1.0 and the hydroxyl functionality of all organic compounds of the polymerizable composition having OH group(s) is in the range of 1.0 to 1.25.Type: ApplicationFiled: September 12, 2008Publication date: March 19, 2009Inventor: Hans-Joachim Weippert
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Publication number: 20090076180Abstract: The present invention is to provide a latent curing type epoxy resin composition which comprises (A) 100 parts by weight of an epoxy resin, (B) 5 to 25 parts by weight of a cation polymerization photo initiator, and (C) 5 to 35 parts by weight of at least one heatset anion curing agent selected from the group consisting of an epoxy adduct with an amine compound, a urea adduct with an amine compound and a compound in which an isocyanate compound is added to a hydroxyl group of an epoxy adduct with an amine compound.Type: ApplicationFiled: September 2, 2008Publication date: March 19, 2009Inventor: Kazuki Iwaya
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Patent number: 7498123Abstract: Disclosed are novel aminium, diimonium, and polymethine borate dyes that have at least one absorption maximum in the infrared spectral region between about 700 and 2000 nm and that are useful as infrared absorbers, the anionic borate moiety having the formula: [BXaYb]?, in which a and b are integers with a ranging from 0 to 3 and b ranging from 1 to 4 and a+b=4; X, which may be identical or different, are each a halogen atom, an OH functional group, or a C1 to C20 alkyl or alicyclic radical, and Y, which may be identical or different, are each a phenyl radical, at least one Y substituted by at least one element or electron-withdrawing substituent such as a perfluoroalkyl group, or by one or more halogen atoms, or an aryl radical containing at least two aromatic ring members, which may also be further substituted. Such dyes may be incorporated into films or bulk materials to form light filters for electromagnetic radiation, including laser radiation.Type: GrantFiled: March 3, 2005Date of Patent: March 3, 2009Assignee: Exciton, Inc.Inventor: Paul A. Cahill
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Publication number: 20090047441Abstract: A radiation or thermal curable coating composition contains a cycloaliphatic epoxide resin, a carbinol functional silicone resin or an anhydride functional silicone resin, and a thermal or photoactivated acid catalyst. An organic polyol may also be included in the composition as an optional component. The composition is useful as a radiation curable coating, as an adhesive, a photodefinable coating, or as a thermal cure coating. The cycloaliphatic epoxide resin adds toughness and adhesion to the composition, whereas either of the carbinol functional silicone resin or the anhydride functional silicone resin provides the composition with water resistance, weatherability, thermal stability, and flexibility.Type: ApplicationFiled: October 20, 2005Publication date: February 19, 2009Inventors: Glenn Viaplana Gordon, John Bernard Horstman, Randall Gene Schmidt, Gary Michael Wieber, Arthur James Tselepis
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Patent number: 7491482Abstract: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.Type: GrantFiled: December 4, 2006Date of Patent: February 17, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, M. Dalil Rahman
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Publication number: 20090041945Abstract: An active ray curable composition comprising a compound represented by Formula (X):Type: ApplicationFiled: March 15, 2006Publication date: February 12, 2009Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.Inventors: Kimihiko Ookubo, Norio Miura, Takeshi Kurata
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Patent number: 7482107Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.Type: GrantFiled: March 23, 2006Date of Patent: January 27, 2009Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
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Actinic ray curable composition, and actinic ray curable ink and image forming method by use thereof
Patent number: 7473718Abstract: An actinic ray curable composition is disclosed, comprising and oxetane ring-containing compound and an epoxy compound, in which the oxetane ring-containing compound comprises a compound containing a single oxetane ring and a compound containing at least two oxetane rings, and the compound containing a single oxetane ring accounting for 1% to 20% by weight if the composition. There are also disclosed an ink for use in ink jet printing and an image forming method by use thereof.Type: GrantFiled: June 17, 2005Date of Patent: January 6, 2009Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Wataru Ishikawa -
Patent number: 7473720Abstract: There is provided an inkjet ink comprising a photo-acid generating agent which is capable of generating an acid as it is irradiated with light, a color component, and an acid-polymerizable compound which can be polymerized in the presence of an acid, wherein at least 40% of the acid-polymerizable solvent is a vinyl ether compound represented by the following general formula (1): R13—R14—(R13)p (wherein R13(s) is a group selected from the group consisting of a vinyl ether group, a group having a vinyl ether skeleton, an alkoxy group, substituted hydroxyl group and hydroxyl group wherein at least one of R13(s) is vinyl ether group or a group having a vinyl ether skeleton, R14 is a group comprising a substituted or unsubstituted cyclic skeleton and having a valence of (p+1), and p is a positive integer including zero).Type: GrantFiled: December 7, 2006Date of Patent: January 6, 2009Assignee: Toshiba Tec Kabushiki KaishaInventors: Ryozo Akiyama, Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Hiroshi Kiyomoto, Yukiko Kawakami
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Patent number: 7465758Abstract: Polymerizable compositions and methods are provided that include an ethylenically unsaturated compound and an arylsulfinate salt. The polymerizable compositions are useful as hardenable dental compositions.Type: GrantFiled: July 16, 2007Date of Patent: December 16, 2008Assignee: 3M Innovative Properties CompanyInventors: Afshin Falsafi, Rajdeep S. Kalgutkar, Joel D. Oxman
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Patent number: 7455887Abstract: Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.Type: GrantFiled: November 3, 2004Date of Patent: November 25, 2008Assignee: Konica Minolta Medical & Graphic Inc.Inventor: Toshiyuki Takabayashi
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Patent number: 7456230Abstract: The present invention provides a cationically photocurable epoxy resin composition, which contains (a) an epoxy resin component comprising an alicyclic epoxy resin and an aromatic-ring containing epoxy resin, (b) a cationic photoinitiator component, and (c) a filler selected from oxides, hydroxides and carbonates containing a Group II element. This composition exhibits improved adhesive strength to a glass such as an alkali glass, particularly a sodium-containing glass, or a metal.Type: GrantFiled: May 7, 2003Date of Patent: November 25, 2008Assignee: Henkel CorporationInventors: Yoke Ai Gan, Chunfu Chen, Kazuyo Terada
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Patent number: 7452673Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.Type: GrantFiled: January 16, 2007Date of Patent: November 18, 2008Assignee: Affymetrix, Inc.Inventors: Glenn H. McGall, Andrea Cupoletti
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Patent number: 7449573Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.Type: GrantFiled: February 14, 2005Date of Patent: November 11, 2008Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Kenji Wada, Kaoru Iwato
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Publication number: 20080275153Abstract: The present invention relates to an ultraviolet curable resin of the present invention which is prepared from alkyl(meth)acrylates, glycidyl(meth)acrylate, and substituted or unsubstituted acrylic acid, wherein the resin contains terminal vinyl group in amount of at least 50 wt % based on the resin and its glass transition temperature (Tg) is in a range of from 40˜100° C. The present invention also relates to a resin composition containing the ultraviolet curable resin.Type: ApplicationFiled: August 16, 2007Publication date: November 6, 2008Applicant: CHANG CHUN PLASTICS CO., LTD.Inventors: Kuen-Yuan Hwang, An-Pang Tu, Ping-Chieh Wang, Chie-Wei Yang
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Publication number: 20080268169Abstract: We have found that the use of a multifunctional oxetane containing two or more oxetane groups as the, or part of the, polymerisable component of a cationically initiated energy-curable coating composition with a thioxanthonium photoinitiator gives a coating composition which is useful for a variety of printing processes, including flexographic printing.Type: ApplicationFiled: November 23, 2005Publication date: October 30, 2008Applicant: SUN CHEMICAL CORPORATIONInventors: Stephen Stuart Standing, Mark William Walkling, Shaun Lawrence Herlihy, James Robert Tucker
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Publication number: 20080260960Abstract: Curcumin and curcuminoid compounds as photosensitizers for onium salt photoinitiators in cationic photopolymerization reactions are presented.Type: ApplicationFiled: June 16, 2006Publication date: October 23, 2008Applicant: Rensselaer Polytechnic InstituteInventors: James Crivello, Umut Bulut
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Patent number: 7439302Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.Type: GrantFiled: August 2, 2005Date of Patent: October 21, 2008Assignee: International Business Machines CorporationInventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
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Patent number: 7429622Abstract: An active ray curable ink-jet ink composition comprising a photo-induced acid generating agent containing an onium salt which does not generate benzene under active ray radiation, and a photopolymerizable compound containing a compound having an oxetane ring in the molecule.Type: GrantFiled: November 2, 2006Date of Patent: September 30, 2008Assignee: Konica Minolta Medical & Graphic, Inc.Inventors: Norio Miura, Masato Nishizeki, Kimihiko Okubo
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Publication number: 20080226916Abstract: Radiation curable coatings for use as a Primary Coating for optical fibers, optical fibers coated with said coatings and methods for the preparation of coated optical fibers. The radiation curable coating comprises at least one (meth)acrylate functional oligomer and a photoinitiator, wherein the urethane-(meth)acrylate oligomer CA/CR comprises (meth)acrylate groups, at least one polyol backbone and urethane groups, wherein about 15% or more of the urethane groups are derived from one or both of 2,4- and 2,6-toluene diisocyanate, wherein at least 15% of the urethane groups are derived from a cyclic or branched aliphatic isocyanate, and wherein said (meth)acrylate functional oligomer has a number average molecular weight of from at least about 4000 g/mol to less than or equal to about 15,000 g/mol; and wherein a cured film of the radiation curable Primary Coating composition has a modulus of less than or equal to about 1.2 MPa.Type: ApplicationFiled: December 13, 2007Publication date: September 18, 2008Inventors: Paulus Antonius Maria STEEMAN, Xiansong Wu, Steven R. Schmid, Edward J. Murphy, John M. Zimmerman, Anthony Joseph Tortorello
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Patent number: 7417075Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.Type: GrantFiled: August 22, 2005Date of Patent: August 26, 2008Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Nobumasa Sasa
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Patent number: 7405308Abstract: Triarylsulfonium salts of formula I or II are useful as initiators for cationic photopolymerizations: wherein Ar1 and Ar2 are independently polycyclic aryl, substituted aryl, heteroaryl, substituted heteroaryl, or aryl or heteroaryl, pendant from a polymer chain; and MtXn? is a complex anion selected from PF6?, SbF6?, AsF6?, GaF6?, BF4?, (C6F5)4B? and CF3SO2)3C?.Type: GrantFiled: November 16, 2004Date of Patent: July 29, 2008Assignee: Rensselaer Polytechnic InstitueInventor: James V. Crivello
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Publication number: 20080176086Abstract: Provided is an ultraviolet-curable silicone composition including: (A) a non-terminal epoxy group-containing organopolysiloxane, (B) an organopolysiloxane containing epoxy groups at the two terminals of the molecular chain, and an onium salt photoinitiator capable of generating cations upon irradiation with ultraviolet light. The silicone composition of the present invention yields a cured film that exhibits excellent ultraviolet-curability and can be readily peeled from a pressure-sensitively adhesive material. In particular, the silicone composition yields a cured film that exhibits a tight release force relative to pressure-sensitive adhesives such as acrylic-based pressure-sensitive adhesives, and also exhibits minimal fluctuation in the release force.Type: ApplicationFiled: January 17, 2008Publication date: July 24, 2008Applicant: Shin-Etsu Chemical Co., Ltd.Inventor: Shinji IRIFUNE
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Patent number: 7393627Abstract: Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (ie., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication.Type: GrantFiled: March 16, 2005Date of Patent: July 1, 2008Assignee: Cornell Research Foundation, Inc.Inventors: Christopher K. Ober, Ramakrishnan Ayothi, Kyung-Min Kim, Xiang-Qian Liu
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Patent number: 7388039Abstract: Modified polyolefins are produced by reacting a functionalized polyolefin with one or more ethylenically unsaturated compounds having a functional group reactive with the functional group on the polyolefin. These modified polyolefins may then polymerize in the presence of a photoinitiator upon exposure to ultraviolet radiation and also have the capability of copolymerizing in the presence of a photoinitiator with other ethylenically unsaturated crosslinking agents upon exposure to ultraviolet radiation. These modified polyolefins may also contain pendant carboxyl groups, which have the propensity to form hydrophilic salts with amines, and therefore may be rendered water-dispersible. The modified polyolefins of the present invention significantly improve the adhesion of paints, inks, and adhesives to various plastic and metal substrates.Type: GrantFiled: July 14, 2004Date of Patent: June 17, 2008Assignee: Eastman Chemical CompanyInventors: Kevin Alan Williams, Michael Bellas, Charlie Carroll Freeman, Jr., Lisa Kay Templeton
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Publication number: 20080139687Abstract: The present invention relates to vinyl ether or acrylate terminated block resins, compositions incorporating same and methods for preparing same. In particular, the compositions of the present invention may contain a vinyl ether or acrylate terminated block resin, such as a polyurethane block copolymer, a reactive diluent having vinyl ether or 1-alkenyl ether and (meth)acrylate functionality and a curing initiator. The compositions may be exposed to an energy source, e.g., photoradiation, to impart tack-free surface cure.Type: ApplicationFiled: November 10, 2005Publication date: June 12, 2008Applicant: Henkel CorporationInventors: John G. Woods, Joel D. Schall, Steven T. Nakos, Anthony F. Jacobine
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Patent number: 7378455Abstract: A curable method useful for encapsulating solid state devices includes (A) an epoxy resin; (B) an effective amount of a cure catalyst comprising (B1) a first latent cationic cure catalyst comprising a diaryl iodonium hexafluoroantimonate salt; (B2) a second latent cationic cure catalyst comprising (B2a) a diaryl iodonium cation, and (B2b) an anion selected from perchlorate, imidodisulfurylfluoride anion, unsubstituted and substituted (C1-C12)-hydrocarbylsulfonates, (C2-C12)-perfluoroalkanoates, tetrafluoroborate, unsubstituted and substituted tetra-(C1-C12)-hydrocarbylborates, hexafluorophosphate, hexafluoroarsenate, tris(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfuryl)imide anion, and combinations thereof; and (B3) a cure co-catalyst selected from free-radical generating aromatic compounds, peroxy compounds, copper (II) salts of aliphatic carboxylic acids, copper (II) salts of aromatic carboxylic acids, copper (II) acetylacetonate, and combinationsType: GrantFiled: June 30, 2005Date of Patent: May 27, 2008Assignee: General Electric CompanyInventors: Qiwei Lu, Michael O'Brien, Michael Vallance
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Publication number: 20080107821Abstract: A polymerizable actinic radiation curable composition comprising a photo-acid generating compound and an epoxy compound represented by Formula (1): wherein X represents a divalent group selected form the group consisting of —O—, —S—, —SO—, —SO2—, —CBr2—, —C(CBr3)2—, and —C(CF3)2—; R1 to R18 each independently represent a hydrogen atom, a halogen atom, a hydrocarbon group having 1-8 carbon atoms, provided that the hydrocarbon group may contain an oxygen atom or a halogen atom, or a substituted or unsubstituted alkoxy group having 1-8 carbon atoms.Type: ApplicationFiled: November 29, 2005Publication date: May 8, 2008Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.Inventors: Nobumasa Sasa, Norio Miura, Kimihiko Ookubo, Takeshi Kurata
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Patent number: 7368484Abstract: The present invention relates to novel polymeric compositions that exhibit Reverse Thermal Gelation (RTG) properties for use as Support Materials (SM) in the manufacture of three-dimensional objects. These polymers are Temperature Sensitive Polymers that respond with a significant change of properties to a small change in temperature. Temperature Sensitive Polymers exhibit cloud point (CP) or lower critical solution temperature (LCST) in aqueous solutions. Water-soluble Temperature Sensitive Polymers are chosen to give low viscosity liquid at low temperature when dissolved in water and by that to permit easy dispensing at low temperature. Raising the temperature above their gelation temperature (Tgel) will result in solidification of the composition. At its gel position the material has favorable characteristics as a support and building material. The gel layers have the appropriate toughness and dimensional stability to support the model layers during the building process.Type: GrantFiled: October 10, 2006Date of Patent: May 6, 2008Assignee: Objet Geometries Ltd.Inventor: Avraham Levy
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Patent number: 7365106Abstract: A cationically curable composition for dental use containing a cationic polymerization initiator (I) and cationically polymerizable monomers (II), the cationically polymerizable monomers (II) containing an oxetane compound and an epoxy compound or an alkenyl ether compound at a ratio of amounts that satisfy the conditions expressed by the following formula, (a×A):(b×B)=91:9 to 45:55 wherein A is a mol number of the oxetane compound, “a” is an average number of the oxetane functional group contained in one molecule of the oxetane compound, B is a mol number of the epoxy compound or the alkenyl ether compound, and “b” is an average number of the epoxy functional group contained in one molecule of the epoxy compound or an average number of the alkenyl ether functional group contained in one molecule of the alkenyl ether compound.Type: GrantFiled: April 26, 2005Date of Patent: April 29, 2008Assignees: Tokuyama Corporation, Tokuyama Dental CorporationInventors: Takeshi Suzuki, Hideki Kazama
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Patent number: 7365103Abstract: A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.Type: GrantFiled: December 12, 2002Date of Patent: April 29, 2008Assignee: Board of Regents, The University of Texas SystemInventors: C. Grant Willson, Nicholas A. Stacey
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Patent number: 7354628Abstract: The invention relates to a lubricant for medical devices. The inventive lubricant uses silicone epoxy and vinyl ether that both rapidly cure when exposed to ultraviolet light or an intense electron beam. The lubricants formulated with these components in combination with a secondary silicone component and a photoinitator offer improved performance when compared to lubricants formulated from the prior art method of using a RTV+silicone fluid materials. The speed of the UV/EB cure of the new components makes lubricants formed from them more compatible with high speed manufacturing processes by eliminating the delay of prior art lengthy cure steps.Type: GrantFiled: July 24, 2003Date of Patent: April 8, 2008Assignee: Covidien AGInventor: Gregory Alan Steube
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Publication number: 20080045619Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.Type: ApplicationFiled: February 28, 2007Publication date: February 21, 2008Applicant: SHAWCOR LTD.Inventors: Peter Jackson, Eileen Wan
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Patent number: RE40847Abstract: Radiation curable ink compositions for ink jet contain radiation curable monomers containing vinylether and acrylate functions.Type: GrantFiled: March 19, 2003Date of Patent: July 14, 2009Assignee: Agfa-GevaertInventors: Luc Vanmaele, Emiel Verdonck