Specified Rate-affecting Material Contains Onium Group Patents (Class 522/31)
  • Publication number: 20090258961
    Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV-and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.
    Type: Application
    Filed: March 9, 2009
    Publication date: October 15, 2009
    Inventor: Jean-Marc FRANCES
  • Publication number: 20090246540
    Abstract: An ultraviolet-curable silicone composition for a release paper including (A) 100 parts by mass of a specific organopolysiloxane having a polymerization degree of 8 to 20 and containing one epoxy group, and (C) an effective quantity of an onium salt photoinitiator. In a preferred embodiment, the composition further includes (B) 10 to 1,000 parts by mass of at least one specific organopolysiloxane containing a plurality of epoxy groups. In another preferred embodiment, the composition has a viscosity of not more than 100 mPa·s. The composition has a peel strength that exhibits a positive dependency on the peel speed when peeled from a hot-melt pressure-sensitive adhesive, and can therefore be used to produce a release paper capable of reducing peeling noise. Further, because the composition has a low viscosity, it exhibits excellent wetting of substrates having significant unevenness, even in a solventless form.
    Type: Application
    Filed: March 30, 2009
    Publication date: October 1, 2009
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shinji IRIFUNE, Akinari Itagaki
  • Patent number: 7579390
    Abstract: There is proposed an inkjet ink composition comprising a pigment component to which a resin having a basic terminal is adsorbed, a photo-acid generating agent containing an onium salt, and at least one kind of solvent which can be polymerized under the presence of an acid. The content of multivalent salt included in the onium salt is not more than 20% by weight based on a total weight of onium salt, and the content of the pigment component is confined within the range of 3 to 41% by weight based on the ink composition.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: August 25, 2009
    Assignee: Toshiba Tec Kabushiki Kaisha
    Inventors: Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Ryozo Akiyama, Masahi Hiroki
  • Publication number: 20090197090
    Abstract: Disclosed herein is a composition, including a fluorine-based polymer or a perfluoropolyether (PFPE) derivative and a PFPE-miscible polymer, an anti-oxide film and electronic component including the same, and methods of forming an anti-oxide film and an electronic component. Use of the composition may achieve formation of an anti-oxide film through a solution process and electronic components using a metal having increased conductivity and decreased production costs.
    Type: Application
    Filed: June 13, 2008
    Publication date: August 6, 2009
    Inventors: Jung Seok Hahn, Jong Baek Seon, Euk Che Hwang, Jong Ho Lee, Min Ho O
  • Publication number: 20090184417
    Abstract: Disclosed are photosensitizers that include a polyol moiety covalently bonded to a fused aromatic moiety. Also disclosed is a method for improving UV laser ablation performance of a coating, such as a cationic UV curable coating, by incorporating an oxalyl-containing additive into the cationic UV curable or other coating. Oxalyl-containing sensitizers having the formula Q-O—C(O)—C(O)—O—R1, wherein Q represents a fused aromatic moiety and R1 is an alkyl or aryl group, are also disclosed, as are oxalyl-containing oxetane resins, oxalyl-containing polyester polyols, and cationic UV curable coating formulations that include oxalyl-containing additives.
    Type: Application
    Filed: April 21, 2007
    Publication date: July 23, 2009
    Inventors: Dean C. Webster, Zhigang Chen
  • Patent number: 7563559
    Abstract: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.
    Type: Grant
    Filed: July 3, 2007
    Date of Patent: July 21, 2009
    Assignee: FormFactor, Inc.
    Inventor: Treliant Fang
  • Patent number: 7563832
    Abstract: A photocurable resin composition comprises a cationic polymerizable compound (A), an acrylic resin (B) and a cationic photopolymerization initiator (C), in which the acrylic resin (B) has a cationic polymerizable functional group, and the content of the component (A) is 30 to 95 parts by mass and the content of the component (B) is 5 to 70 parts by mass, based on 100 parts by mass of the total amount of the components (A) and (B). In addition, the functional group of the acrylic resin (B) preferably contains at least one of a cyclic ether group, a vinyloxy group, an acid adduct of a vinyloxy group, and an active hydrogen group, with the active hydrogen group preferably being a hydroxyl group. The photocurable resin composition has sufficient curability and sufficient adhesiveness to rigid plastics such as polycarbonate and PET having poor adhesive property.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: July 21, 2009
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yuichi Ito, Satoru Suda, Yasushi Mizuta
  • Patent number: 7560219
    Abstract: Sulfonium salt photoinitiator compositions, precursors useful in the preparation of such photoinitiators and the use of these photoinitiators in, e.g., UV curable adhesives, UV curable sealants, UV curable coating compositions, such as printing inks and varnishes, and UV curable encapsulants.
    Type: Grant
    Filed: April 26, 2007
    Date of Patent: July 14, 2009
    Assignee: Henkel AG & Co. KGaA
    Inventors: Yuxia Liu, Donald E. Herr
  • Patent number: 7556908
    Abstract: The present invention provides a chemically amplified positive resist composition comprising (A) a resin which comprises (i) a structural unit of the formula (I) and (ii) at least one structural unit selected from the group consisting of structural units of the formulas (II), (O/II), (IV) and (V) and (B) an acid generator. The present invention further provides a novel monomers useful for the resist composition, and process for the monomers and the compositions.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: July 7, 2009
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Isao Yoshida, Takayuki Miyagawa
  • Patent number: 7544721
    Abstract: A photosensitive adhesive composition of the polymerizable resin type, the hardening of which occurs by polymerization and/or reticulation, includes:—initiators for at least one chain polymerization reaction to guarantee the hardening of the composition and a sufficient quantity of at least one bifunctional monomer, including a photolabile center with at least one photolabile entity and at least two polymerizable units, connected by covalent skeletons to the photolabile center and located away from the cleavage sites of the photolabile center, such that the composition loses the integrity and adhesivity thereof under the influence of a reticulating radiation causing the cleavage of the photolabile sites. The composition is particularly of application in dentistry.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: June 9, 2009
    Assignee: Produits Dentaires Pierre Rolland
    Inventors: Vincent Gaud, Yves Gnanou, Jean-Pierre Desvergne, Francis Dieras, Alexandrine Roubiere
  • Publication number: 20090142606
    Abstract: A process for the polymerization and/or crosslinking of an organic coating composition is provided. The process involves employing an organic coating composition which can crosslink and/or polymerize under irradiation with short-wave ultraviolet (UV C) radiation with a wavelength of between 200 and 280 nm.
    Type: Application
    Filed: September 13, 2006
    Publication date: June 4, 2009
    Applicant: Bluestar Silicones France
    Inventor: Christian Mirou
  • Patent number: 7541131
    Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: June 2, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Yasutomo Kawanishi
  • Publication number: 20090137695
    Abstract: An active ray curable ink-jet ink comprising at least an organic pigment, a polymer dispersant, a photo-initiator and a cationic polymerizable compound, wherein the active ray curable ink-jet ink incorporates a quaternary ammonium salt and a content of the quaternary ammonium salt is not less than 5 ppm and not more than 500 ppm.
    Type: Application
    Filed: August 11, 2006
    Publication date: May 28, 2009
    Applicant: KONICA MINOLTA MEDECAL & GRAPHIC, INC.
    Inventor: Toshiyuki Takabayashi
  • Patent number: 7534820
    Abstract: The present invention provides a novel photocurable composition containing an organic polymer having an epoxy group and/or oxetane group-containing silicon group at an end and a cationic photoinitiator. For example, the photocurable composition contains an organic polymer (A) having an epoxy group and/or oxetane group-containing silicon group at an end, and a cationic photoinitiator (B), the organic polymer (A) being produced by addition reaction between an organic polymer terminated with an unsaturated group and a hydrosilane compound having an epoxy group and/or an oxetane group.
    Type: Grant
    Filed: March 13, 2006
    Date of Patent: May 19, 2009
    Assignee: Kaneka Corporation
    Inventors: Yoshiyuki Kohno, Hiroshi Ando
  • Patent number: 7524614
    Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: April 28, 2009
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley
  • Patent number: 7524610
    Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: April 28, 2009
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Kyu-sik Kim, Jin-baek Kim, Young-ung Ha, Byung-ha Park, Ji-young Park, Su-min Kim
  • Publication number: 20090071602
    Abstract: The present invention relates to a polymerizable composition comprising a cycloaliphatic epoxide compound, a monovalent alcohol, a photopolymerization initiator, wherein the molar ratio of the epoxide groups of the cycloaliphatic epoxide to the hydroxyl groups of the monovalent alcohol is 0.9:1.0 to 4.0:1.0 and the hydroxyl functionality of all organic compounds of the polymerizable composition having OH group(s) is in the range of 1.0 to 1.25.
    Type: Application
    Filed: September 12, 2008
    Publication date: March 19, 2009
    Inventor: Hans-Joachim Weippert
  • Publication number: 20090076180
    Abstract: The present invention is to provide a latent curing type epoxy resin composition which comprises (A) 100 parts by weight of an epoxy resin, (B) 5 to 25 parts by weight of a cation polymerization photo initiator, and (C) 5 to 35 parts by weight of at least one heatset anion curing agent selected from the group consisting of an epoxy adduct with an amine compound, a urea adduct with an amine compound and a compound in which an isocyanate compound is added to a hydroxyl group of an epoxy adduct with an amine compound.
    Type: Application
    Filed: September 2, 2008
    Publication date: March 19, 2009
    Inventor: Kazuki Iwaya
  • Patent number: 7498123
    Abstract: Disclosed are novel aminium, diimonium, and polymethine borate dyes that have at least one absorption maximum in the infrared spectral region between about 700 and 2000 nm and that are useful as infrared absorbers, the anionic borate moiety having the formula: [BXaYb]?, in which a and b are integers with a ranging from 0 to 3 and b ranging from 1 to 4 and a+b=4; X, which may be identical or different, are each a halogen atom, an OH functional group, or a C1 to C20 alkyl or alicyclic radical, and Y, which may be identical or different, are each a phenyl radical, at least one Y substituted by at least one element or electron-withdrawing substituent such as a perfluoroalkyl group, or by one or more halogen atoms, or an aryl radical containing at least two aromatic ring members, which may also be further substituted. Such dyes may be incorporated into films or bulk materials to form light filters for electromagnetic radiation, including laser radiation.
    Type: Grant
    Filed: March 3, 2005
    Date of Patent: March 3, 2009
    Assignee: Exciton, Inc.
    Inventor: Paul A. Cahill
  • Publication number: 20090047441
    Abstract: A radiation or thermal curable coating composition contains a cycloaliphatic epoxide resin, a carbinol functional silicone resin or an anhydride functional silicone resin, and a thermal or photoactivated acid catalyst. An organic polyol may also be included in the composition as an optional component. The composition is useful as a radiation curable coating, as an adhesive, a photodefinable coating, or as a thermal cure coating. The cycloaliphatic epoxide resin adds toughness and adhesion to the composition, whereas either of the carbinol functional silicone resin or the anhydride functional silicone resin provides the composition with water resistance, weatherability, thermal stability, and flexibility.
    Type: Application
    Filed: October 20, 2005
    Publication date: February 19, 2009
    Inventors: Glenn Viaplana Gordon, John Bernard Horstman, Randall Gene Schmidt, Gary Michael Wieber, Arthur James Tselepis
  • Patent number: 7491482
    Abstract: The present application relates to a compound of formula AiXi where Ai is an organic onium cation; and Xi is an anion of the formula X—CF2CF2OCF2CF2—SO3?. The compounds are useful as photoactive materials.
    Type: Grant
    Filed: December 4, 2006
    Date of Patent: February 17, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Munirathna Padmanaban, Srinivasan Chakrapani, M. Dalil Rahman
  • Publication number: 20090041945
    Abstract: An active ray curable composition comprising a compound represented by Formula (X):
    Type: Application
    Filed: March 15, 2006
    Publication date: February 12, 2009
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventors: Kimihiko Ookubo, Norio Miura, Takeshi Kurata
  • Patent number: 7482107
    Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
    Type: Grant
    Filed: March 23, 2006
    Date of Patent: January 27, 2009
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
  • Patent number: 7473718
    Abstract: An actinic ray curable composition is disclosed, comprising and oxetane ring-containing compound and an epoxy compound, in which the oxetane ring-containing compound comprises a compound containing a single oxetane ring and a compound containing at least two oxetane rings, and the compound containing a single oxetane ring accounting for 1% to 20% by weight if the composition. There are also disclosed an ink for use in ink jet printing and an image forming method by use thereof.
    Type: Grant
    Filed: June 17, 2005
    Date of Patent: January 6, 2009
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Wataru Ishikawa
  • Patent number: 7473720
    Abstract: There is provided an inkjet ink comprising a photo-acid generating agent which is capable of generating an acid as it is irradiated with light, a color component, and an acid-polymerizable compound which can be polymerized in the presence of an acid, wherein at least 40% of the acid-polymerizable solvent is a vinyl ether compound represented by the following general formula (1): R13—R14—(R13)p (wherein R13(s) is a group selected from the group consisting of a vinyl ether group, a group having a vinyl ether skeleton, an alkoxy group, substituted hydroxyl group and hydroxyl group wherein at least one of R13(s) is vinyl ether group or a group having a vinyl ether skeleton, R14 is a group comprising a substituted or unsubstituted cyclic skeleton and having a valence of (p+1), and p is a positive integer including zero).
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: January 6, 2009
    Assignee: Toshiba Tec Kabushiki Kaisha
    Inventors: Ryozo Akiyama, Toru Ushirogouchi, Kazuhiko Ohtsu, Mitsuru Ishibashi, Hiroshi Kiyomoto, Yukiko Kawakami
  • Patent number: 7465758
    Abstract: Polymerizable compositions and methods are provided that include an ethylenically unsaturated compound and an arylsulfinate salt. The polymerizable compositions are useful as hardenable dental compositions.
    Type: Grant
    Filed: July 16, 2007
    Date of Patent: December 16, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Afshin Falsafi, Rajdeep S. Kalgutkar, Joel D. Oxman
  • Patent number: 7455887
    Abstract: Disclosed is an actinic ray curable ink-jet ink composition containing a photopolymerizable compound, a sulfonium salt (compound A) as a photoinitiator, which does not release benzene on actinic ray exposure, and a compound (compound B) as a sensitizing agent selected from the group consisting of (i) a polycyclic aromatic compound having a hydroxyl group, a substituted or unsubstituted aralkyloxy group or a substituted or unsubstituted alkoxy group, (ii) a carbazole derivative, and (iii) a thioxanthone derivative.
    Type: Grant
    Filed: November 3, 2004
    Date of Patent: November 25, 2008
    Assignee: Konica Minolta Medical & Graphic Inc.
    Inventor: Toshiyuki Takabayashi
  • Patent number: 7456230
    Abstract: The present invention provides a cationically photocurable epoxy resin composition, which contains (a) an epoxy resin component comprising an alicyclic epoxy resin and an aromatic-ring containing epoxy resin, (b) a cationic photoinitiator component, and (c) a filler selected from oxides, hydroxides and carbonates containing a Group II element. This composition exhibits improved adhesive strength to a glass such as an alkali glass, particularly a sodium-containing glass, or a metal.
    Type: Grant
    Filed: May 7, 2003
    Date of Patent: November 25, 2008
    Assignee: Henkel Corporation
    Inventors: Yoke Ai Gan, Chunfu Chen, Kazuyo Terada
  • Patent number: 7452673
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: November 18, 2008
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cupoletti
  • Patent number: 7449573
    Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: November 11, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Kenji Wada, Kaoru Iwato
  • Publication number: 20080275153
    Abstract: The present invention relates to an ultraviolet curable resin of the present invention which is prepared from alkyl(meth)acrylates, glycidyl(meth)acrylate, and substituted or unsubstituted acrylic acid, wherein the resin contains terminal vinyl group in amount of at least 50 wt % based on the resin and its glass transition temperature (Tg) is in a range of from 40˜100° C. The present invention also relates to a resin composition containing the ultraviolet curable resin.
    Type: Application
    Filed: August 16, 2007
    Publication date: November 6, 2008
    Applicant: CHANG CHUN PLASTICS CO., LTD.
    Inventors: Kuen-Yuan Hwang, An-Pang Tu, Ping-Chieh Wang, Chie-Wei Yang
  • Publication number: 20080268169
    Abstract: We have found that the use of a multifunctional oxetane containing two or more oxetane groups as the, or part of the, polymerisable component of a cationically initiated energy-curable coating composition with a thioxanthonium photoinitiator gives a coating composition which is useful for a variety of printing processes, including flexographic printing.
    Type: Application
    Filed: November 23, 2005
    Publication date: October 30, 2008
    Applicant: SUN CHEMICAL CORPORATION
    Inventors: Stephen Stuart Standing, Mark William Walkling, Shaun Lawrence Herlihy, James Robert Tucker
  • Publication number: 20080260960
    Abstract: Curcumin and curcuminoid compounds as photosensitizers for onium salt photoinitiators in cationic photopolymerization reactions are presented.
    Type: Application
    Filed: June 16, 2006
    Publication date: October 23, 2008
    Applicant: Rensselaer Polytechnic Institute
    Inventors: James Crivello, Umut Bulut
  • Patent number: 7439302
    Abstract: A new underlayer composition that exhibits high etch resistance and improved optical properties is disclosed. The underlayer composition comprises a vinyl or acrylate polymer, such as a methacrylate polymer, the polymer comprising at least one substituted or unsubstituted naphthalene or naphthol moiety, including mixtures thereof. Examples of the polymer of this invention include: where each R1 is independently selected from an organic moiety or a halogen; each A is independently a single bond or an organic moiety; R2 is hydrogen or a methyl group; and each X, Y and Z is an integer of 0 to 7, and Y+Z is 7 or less. The organic moiety mentioned above may be a substituted or unsubstituted hydrocarbon selected from the group consisting of a linear or branched alkyl, halogenated linear or branched alkyl, aryl, halogenated aryl, cyclic alkyl, and halogenated cyclic alkyl, and any combination thereof.
    Type: Grant
    Filed: August 2, 2005
    Date of Patent: October 21, 2008
    Assignee: International Business Machines Corporation
    Inventors: Wu-Song Huang, Sean D. Burns, Mahmoud Khojasteh
  • Patent number: 7429622
    Abstract: An active ray curable ink-jet ink composition comprising a photo-induced acid generating agent containing an onium salt which does not generate benzene under active ray radiation, and a photopolymerizable compound containing a compound having an oxetane ring in the molecule.
    Type: Grant
    Filed: November 2, 2006
    Date of Patent: September 30, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Norio Miura, Masato Nishizeki, Kimihiko Okubo
  • Publication number: 20080226916
    Abstract: Radiation curable coatings for use as a Primary Coating for optical fibers, optical fibers coated with said coatings and methods for the preparation of coated optical fibers. The radiation curable coating comprises at least one (meth)acrylate functional oligomer and a photoinitiator, wherein the urethane-(meth)acrylate oligomer CA/CR comprises (meth)acrylate groups, at least one polyol backbone and urethane groups, wherein about 15% or more of the urethane groups are derived from one or both of 2,4- and 2,6-toluene diisocyanate, wherein at least 15% of the urethane groups are derived from a cyclic or branched aliphatic isocyanate, and wherein said (meth)acrylate functional oligomer has a number average molecular weight of from at least about 4000 g/mol to less than or equal to about 15,000 g/mol; and wherein a cured film of the radiation curable Primary Coating composition has a modulus of less than or equal to about 1.2 MPa.
    Type: Application
    Filed: December 13, 2007
    Publication date: September 18, 2008
    Inventors: Paulus Antonius Maria STEEMAN, Xiansong Wu, Steven R. Schmid, Edward J. Murphy, John M. Zimmerman, Anthony Joseph Tortorello
  • Patent number: 7417075
    Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: August 26, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Patent number: 7405308
    Abstract: Triarylsulfonium salts of formula I or II are useful as initiators for cationic photopolymerizations: wherein Ar1 and Ar2 are independently polycyclic aryl, substituted aryl, heteroaryl, substituted heteroaryl, or aryl or heteroaryl, pendant from a polymer chain; and MtXn? is a complex anion selected from PF6?, SbF6?, AsF6?, GaF6?, BF4?, (C6F5)4B? and CF3SO2)3C?.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: July 29, 2008
    Assignee: Rensselaer Polytechnic Institue
    Inventor: James V. Crivello
  • Publication number: 20080176086
    Abstract: Provided is an ultraviolet-curable silicone composition including: (A) a non-terminal epoxy group-containing organopolysiloxane, (B) an organopolysiloxane containing epoxy groups at the two terminals of the molecular chain, and an onium salt photoinitiator capable of generating cations upon irradiation with ultraviolet light. The silicone composition of the present invention yields a cured film that exhibits excellent ultraviolet-curability and can be readily peeled from a pressure-sensitively adhesive material. In particular, the silicone composition yields a cured film that exhibits a tight release force relative to pressure-sensitive adhesives such as acrylic-based pressure-sensitive adhesives, and also exhibits minimal fluctuation in the release force.
    Type: Application
    Filed: January 17, 2008
    Publication date: July 24, 2008
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Shinji IRIFUNE
  • Patent number: 7393627
    Abstract: Novel classes of ionic photoacid generator (PAGs) compounds having relatively environmentally friendly anions with no perfluorooctyl sulfonate (no-PFOS) are provided and photoresist composition that comprise such compounds. The new PAGs produce a photoacid having a short or no perfluoro alkyl chain (ie., no-PFOS) attached to a variety of functional groups. The PAGs of the invention are useful as photoactive component in the chemically amplified resist compositions used for microfabrication.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: July 1, 2008
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Christopher K. Ober, Ramakrishnan Ayothi, Kyung-Min Kim, Xiang-Qian Liu
  • Patent number: 7388039
    Abstract: Modified polyolefins are produced by reacting a functionalized polyolefin with one or more ethylenically unsaturated compounds having a functional group reactive with the functional group on the polyolefin. These modified polyolefins may then polymerize in the presence of a photoinitiator upon exposure to ultraviolet radiation and also have the capability of copolymerizing in the presence of a photoinitiator with other ethylenically unsaturated crosslinking agents upon exposure to ultraviolet radiation. These modified polyolefins may also contain pendant carboxyl groups, which have the propensity to form hydrophilic salts with amines, and therefore may be rendered water-dispersible. The modified polyolefins of the present invention significantly improve the adhesion of paints, inks, and adhesives to various plastic and metal substrates.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: June 17, 2008
    Assignee: Eastman Chemical Company
    Inventors: Kevin Alan Williams, Michael Bellas, Charlie Carroll Freeman, Jr., Lisa Kay Templeton
  • Publication number: 20080139687
    Abstract: The present invention relates to vinyl ether or acrylate terminated block resins, compositions incorporating same and methods for preparing same. In particular, the compositions of the present invention may contain a vinyl ether or acrylate terminated block resin, such as a polyurethane block copolymer, a reactive diluent having vinyl ether or 1-alkenyl ether and (meth)acrylate functionality and a curing initiator. The compositions may be exposed to an energy source, e.g., photoradiation, to impart tack-free surface cure.
    Type: Application
    Filed: November 10, 2005
    Publication date: June 12, 2008
    Applicant: Henkel Corporation
    Inventors: John G. Woods, Joel D. Schall, Steven T. Nakos, Anthony F. Jacobine
  • Patent number: 7378455
    Abstract: A curable method useful for encapsulating solid state devices includes (A) an epoxy resin; (B) an effective amount of a cure catalyst comprising (B1) a first latent cationic cure catalyst comprising a diaryl iodonium hexafluoroantimonate salt; (B2) a second latent cationic cure catalyst comprising (B2a) a diaryl iodonium cation, and (B2b) an anion selected from perchlorate, imidodisulfurylfluoride anion, unsubstituted and substituted (C1-C12)-hydrocarbylsulfonates, (C2-C12)-perfluoroalkanoates, tetrafluoroborate, unsubstituted and substituted tetra-(C1-C12)-hydrocarbylborates, hexafluorophosphate, hexafluoroarsenate, tris(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfonyl)methyl anion, bis(trifluoromethylsulfuryl)imide anion, and combinations thereof; and (B3) a cure co-catalyst selected from free-radical generating aromatic compounds, peroxy compounds, copper (II) salts of aliphatic carboxylic acids, copper (II) salts of aromatic carboxylic acids, copper (II) acetylacetonate, and combinations
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: May 27, 2008
    Assignee: General Electric Company
    Inventors: Qiwei Lu, Michael O'Brien, Michael Vallance
  • Publication number: 20080107821
    Abstract: A polymerizable actinic radiation curable composition comprising a photo-acid generating compound and an epoxy compound represented by Formula (1): wherein X represents a divalent group selected form the group consisting of —O—, —S—, —SO—, —SO2—, —CBr2—, —C(CBr3)2—, and —C(CF3)2—; R1 to R18 each independently represent a hydrogen atom, a halogen atom, a hydrocarbon group having 1-8 carbon atoms, provided that the hydrocarbon group may contain an oxygen atom or a halogen atom, or a substituted or unsubstituted alkoxy group having 1-8 carbon atoms.
    Type: Application
    Filed: November 29, 2005
    Publication date: May 8, 2008
    Applicant: KONICA MINOLTA MEDICAL & GRAPHIC, INC.
    Inventors: Nobumasa Sasa, Norio Miura, Kimihiko Ookubo, Takeshi Kurata
  • Patent number: 7368484
    Abstract: The present invention relates to novel polymeric compositions that exhibit Reverse Thermal Gelation (RTG) properties for use as Support Materials (SM) in the manufacture of three-dimensional objects. These polymers are Temperature Sensitive Polymers that respond with a significant change of properties to a small change in temperature. Temperature Sensitive Polymers exhibit cloud point (CP) or lower critical solution temperature (LCST) in aqueous solutions. Water-soluble Temperature Sensitive Polymers are chosen to give low viscosity liquid at low temperature when dissolved in water and by that to permit easy dispensing at low temperature. Raising the temperature above their gelation temperature (Tgel) will result in solidification of the composition. At its gel position the material has favorable characteristics as a support and building material. The gel layers have the appropriate toughness and dimensional stability to support the model layers during the building process.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: May 6, 2008
    Assignee: Objet Geometries Ltd.
    Inventor: Avraham Levy
  • Patent number: 7365106
    Abstract: A cationically curable composition for dental use containing a cationic polymerization initiator (I) and cationically polymerizable monomers (II), the cationically polymerizable monomers (II) containing an oxetane compound and an epoxy compound or an alkenyl ether compound at a ratio of amounts that satisfy the conditions expressed by the following formula, (a×A):(b×B)=91:9 to 45:55 wherein A is a mol number of the oxetane compound, “a” is an average number of the oxetane functional group contained in one molecule of the oxetane compound, B is a mol number of the epoxy compound or the alkenyl ether compound, and “b” is an average number of the epoxy functional group contained in one molecule of the epoxy compound or an average number of the alkenyl ether functional group contained in one molecule of the alkenyl ether compound.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: April 29, 2008
    Assignees: Tokuyama Corporation, Tokuyama Dental Corporation
    Inventors: Takeshi Suzuki, Hideki Kazama
  • Patent number: 7365103
    Abstract: A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: April 29, 2008
    Assignee: Board of Regents, The University of Texas System
    Inventors: C. Grant Willson, Nicholas A. Stacey
  • Patent number: 7354628
    Abstract: The invention relates to a lubricant for medical devices. The inventive lubricant uses silicone epoxy and vinyl ether that both rapidly cure when exposed to ultraviolet light or an intense electron beam. The lubricants formulated with these components in combination with a secondary silicone component and a photoinitator offer improved performance when compared to lubricants formulated from the prior art method of using a RTV+silicone fluid materials. The speed of the UV/EB cure of the new components makes lubricants formed from them more compatible with high speed manufacturing processes by eliminating the delay of prior art lengthy cure steps.
    Type: Grant
    Filed: July 24, 2003
    Date of Patent: April 8, 2008
    Assignee: Covidien AG
    Inventor: Gregory Alan Steube
  • Publication number: 20080045619
    Abstract: A photo-crosslinkable polyolefin composition comprises a polyolefin, a source of functionality receptive to crosslinking by UV radiation, a cationic photoinitiator and optionally includes a free-radical photoinitiator, a crosslinking accelerator or sensitizer, and other additives such as compatibilizers, inorganic fillers, nanofillers, glass, polymeric and ceramic microspheres, glass fibres, flame retardants, antioxidants, stabilizers, processing aids, foaming agents and pigments. A method for manufacturing a UV-crosslinked polyolefin article comprises forming an article by extruding, moulding or otherwise forming the UV-crosslinkable polyolefin composition and subjecting the article to UV radiation on-line with the extrusion, moulding or other forming operation.
    Type: Application
    Filed: February 28, 2007
    Publication date: February 21, 2008
    Applicant: SHAWCOR LTD.
    Inventors: Peter Jackson, Eileen Wan
  • Patent number: RE40847
    Abstract: Radiation curable ink compositions for ink jet contain radiation curable monomers containing vinylether and acrylate functions.
    Type: Grant
    Filed: March 19, 2003
    Date of Patent: July 14, 2009
    Assignee: Agfa-Gevaert
    Inventors: Luc Vanmaele, Emiel Verdonck