Specified Rate-affecting Material Contains Onium Group Patents (Class 522/31)
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Patent number: 8030368Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated color forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a color changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerization and/or crosslinking or color change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or color changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.Type: GrantFiled: December 22, 2006Date of Patent: October 4, 2011Assignee: Lintfield LimitedInventor: Grant Bradley
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Publication number: 20110229821Abstract: The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with an acid released by a photoacid generator (PAG).Type: ApplicationFiled: September 15, 2008Publication date: September 22, 2011Applicants: Centre National De La Recherche Scientifique-CNRS, Universite Montpellier 2, Ecole National Se Superieure DE ChimieInventors: Olivier Dautel, Joel Moreau, Jean-Pierre Lere-Porte
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Patent number: 8012672Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.Type: GrantFiled: September 24, 2007Date of Patent: September 6, 2011Assignee: BASF SEInventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
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Patent number: 8008366Abstract: A process for producing a cured coating is provided that includes a step of forming on a substrate layer of a curable composition that includes at least one compound represented by Formula (I) and a step of curing the layer of the curable composition by irradiation with electron beam. In formula (I) , Q1 denoted a cyano group or a —COX2 group, X1 denoted a hydrogen atom, organic residue, or polymer chain bonded to carbon atom CA via a heteroatom, or a halogen atom, X2 denoted a hydrogen atom, organic residue, or polymer chain boned to the carbonyl group via a heteroatom, or a halogen atom, Ra and Rb independently denote a hydrogen atom, a halogen atom, a cyano group, or an organic residue, and X1 and X2, Ra and Rb, and X1 and Ra or Rb may be bonded to each other to form a cyclic structure. There is also provided an electron beam-curable composition that includes a compound represented by Formula (I).Type: GrantFiled: February 7, 2008Date of Patent: August 30, 2011Assignee: FUJIFILM CorporationInventor: Kazuto Kunita
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Publication number: 20110195249Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.Type: ApplicationFiled: April 22, 2011Publication date: August 11, 2011Inventors: Cheong Hun SONG, Hiroshi Ogawa, Tatsuhiro Suwa
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Patent number: 7989517Abstract: Disclosed is an actinic ray curable composition comprising a cationically polymerizable compound, an onium salt, and a compound represented by formula 1, R1{(CR2R3)mOH}n??Formula 1 wherein R1 represents a condensed ring group; R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; m represents an integer of from 2 to 4; and n represents an integer of from 1 to 10.Type: GrantFiled: November 16, 2006Date of Patent: August 2, 2011Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Nobumasa Sasa
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Patent number: 7977401Abstract: An ultraviolet curable resin composition, which comprises a cationic photopolymerization initiator (B) and a urethane prepolymer (A) having a structure represented by the general formula (1); (wherein R1 and R2 each independently represent an alkylene group, R3, R4 and R5 each independently represent an alkyl group or hydrogen atom, R6 and R7 each independently represent an alkylene group having 2 to 4 carbon atoms, a represents 0 or 1, and b and c each independently represent an integer of 0 to 10).Type: GrantFiled: March 29, 2007Date of Patent: July 12, 2011Assignee: DIC CorporationInventors: Kouichi Yokota, Koujirou Tanaka, Kai-Uwe Gaudl, Artur Lachowicz
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Patent number: 7964248Abstract: The present invention is directed to a photoinitiator composition comprising two different cationic photoinitiators and a photocurable composition comprising said photoinitiator composition. Moreover, the present invention relates to the use of the photoinitiator composition and the photocurable composition. Furthermore, the present invention relates to a process for producing a three dimensional article.Type: GrantFiled: April 9, 2008Date of Patent: June 21, 2011Assignee: Huntsman Advanced Materials Americas LLCInventors: John Wai Fong, Carole Chapelat, Loic Messe, Ranjana Patel, Laurence Messe
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Patent number: 7964654Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.Type: GrantFiled: September 14, 2010Date of Patent: June 21, 2011Assignee: Affymetrix, Inc.Inventors: Glenn H. McGall, Andrea Cuppoletti
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Patent number: 7943680Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.Type: GrantFiled: February 10, 2006Date of Patent: May 17, 2011Assignee: The Regents of the University of ColoradoInventors: Christopher N. Bowman, Timothy F. Scott
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Patent number: 7935739Abstract: An object of the present invention is to provide a cationic curable composition which has low viscosity, can be rapidly photo-cured even in the air, has good adhesion to a substrate such as glass or resin, and is excellent in glass cleaner resistance and water resistance; an ink jet ink, a gravure ink and a hard coating material which comprise the composition; and cured products thereof. A cationic curable composition comprising: (A) 1 to 100 parts by weight of a phenol derivative having 3 or more aromatic rings per molecule, wherein the aromatic ring has a structure in which some or all of hydrogen atoms of phenolic hydroxyl groups of the aromatic ring are substituted by polymerizable functional groups; (B) 1 to 500 parts by weight of a cationic polymerizable compound; and (C) 0.05 to 20 parts by weight of a photo- and/or thermo-cationic initiator is provided.Type: GrantFiled: February 15, 2006Date of Patent: May 3, 2011Assignee: Asahi Kasei Chemicals CorporationInventors: Atsushi Shimizu, Masao Kondo, Kuon Miyazaki
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Patent number: 7914965Abstract: A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.Type: GrantFiled: September 20, 2005Date of Patent: March 29, 2011Assignee: FUJIFILM CorporationInventors: Hyou Takahashi, Kenji Wada
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Patent number: 7910312Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: July 16, 2010Date of Patent: March 22, 2011Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Patent number: 7906060Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.Type: GrantFiled: April 18, 2008Date of Patent: March 15, 2011Assignee: Board of Regents, The University of Texas SystemInventors: Carlton Grant Willson, Nicholas A. Stacey
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Publication number: 20110060068Abstract: The present invention relates to the use of alkoxysilane components in the presence of acid-generating photoinitiators in radiation-curable, free-radically crosslinkable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.Type: ApplicationFiled: February 5, 2009Publication date: March 10, 2011Applicant: Evonik Degussa GmbHInventor: Emmanouil Spyrou
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Patent number: 7893126Abstract: An active ray curable ink-jet ink comprising at least one type of a photo acid generating compound, a cationic polymerizable compound and a pigment, wherein the active ray curable ink-jet ink contains a fatty acid amine salt comprising a fatty acid having a carbon number of 6-18 and a primary, a secondary or a tertiary amine having a carbon number of 4-12 in an amount of 0.01-0.70 weight % based on the total weight of the ink-jet ink.Type: GrantFiled: October 29, 2007Date of Patent: February 22, 2011Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Toshiyuki Takabayashi
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Patent number: 7893129Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV- and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.Type: GrantFiled: March 9, 2009Date of Patent: February 22, 2011Assignee: Bluestar Silicones France SASInventor: Jean-Marc Frances
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Patent number: 7893130Abstract: Dental compositions are described which are photocurable by radiation with a wavelength greater than 390 nm. The compositions include a cationically active compound, a dental filler, optionally a dispersant, a cationic photoinitiator and a photosensitizer which is a thioxanthone salt substituted by at least one group containing an ammonium function. The composition has the advantage of remedying the color stability problems of finished dental products after crosslinking.Type: GrantFiled: May 10, 2005Date of Patent: February 22, 2011Assignee: Bluestar Silicones France SASInventor: Jean-Marc Frances
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Publication number: 20110028583Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.5, preferably greater than 0.5, more preferable greater than 0.8 as measured at 20° C. resulting from a first curing stage, and improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 300,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.Type: ApplicationFiled: August 3, 2009Publication date: February 3, 2011Applicant: Morgan Adhesives CompanyInventors: Timothy Michael Smith, Gary Allan McMaster
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Publication number: 20110021654Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.Type: ApplicationFiled: December 11, 2008Publication date: January 27, 2011Applicant: KYOTO UNIVERSITYInventors: Yoshihiro Matano, Hiroshi Imahori
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Patent number: 7862996Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.Type: GrantFiled: December 28, 2006Date of Patent: January 4, 2011Assignee: Affymetrix, Inc.Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
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Patent number: 7863344Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.Type: GrantFiled: November 3, 2008Date of Patent: January 4, 2011Assignee: Affymetrix, Inc.Inventors: Glenn H. McGall, Andrea Cuppoletti
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Publication number: 20100304284Abstract: The invention relates to a cationic photocurable composition comprising at least one cationically polymerizable compound, at least one onium salt photoinitiator, at least a moisture scavenger, and at least a stabilizer selected from the group consisting of sterically hindered nitroxyl stabilizers, sterically hindered phenolic antioxidants, organic phosphorous stabilizers and mixtures thereof.Type: ApplicationFiled: October 15, 2007Publication date: December 2, 2010Inventor: Karsten Rinker
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Publication number: 20100292358Abstract: The present invention relates to a resin composition for optical components, the resin composition being an ultraviolet-curable transparent resin composition to be used as a material for an optical component, in which the resin component includes the following component (A) as a main component and the following component (B) being a photo-cationic polymerization initiator: (A) an epoxy resin having two or more epoxy groups in one molecule thereof; and (B) an onium salt containing a hexafluorophosphate ion as an anion component.Type: ApplicationFiled: May 13, 2010Publication date: November 18, 2010Applicant: NITTO DENKO CORPORATIONInventors: Hiroshi NORO, Akiko NAKAHASHI, Hisataka ITO
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Patent number: 7833691Abstract: The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides a heterocycle-containing onium salt shown in the specification.Type: GrantFiled: November 20, 2007Date of Patent: November 16, 2010Assignee: Wako Pure Chemical Industries, Ltd.Inventors: Masami Ishihara, Yoji Urano, Masahiro Takahashi
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Patent number: 7833690Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.Type: GrantFiled: October 6, 2006Date of Patent: November 16, 2010Assignee: The University of North Carolina at CharlotteInventors: Kenneth E. Gonsalves, Mingxing Wang
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Patent number: 7816422Abstract: The present invention provides a curable composition comprising a compound having a partial structure represented by the following formula (I) and a partial structure represented by the following formula (II): wherein in formula (I), A represents a group capable of forming a four- or more-membered bivalent alicyclic alkyl group with neighboring carbon atoms; and in formula (II), R1 represents an alkylene, a cycloalkylene, or an arylene group, and n represents an integer of 1 or more.Type: GrantFiled: September 19, 2006Date of Patent: October 19, 2010Assignee: FUJIFILM CorporationInventor: Kotaro Watanabe
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Patent number: 7807090Abstract: The invention relates to a mold for making a composite material part, the mold being coated in a stripping composition. The stripping composition comprises: 100 parts by weight of a base ingredient consisting in epoxy polydimethylsiloxane; 0.5 to 10 parts by weight of a polymerization agent for polymerizing the base ingredient and constituted by a diaryliodonium salt; not more than 30 parts by weight of an anti-adhesion modulator constituted by a silicone polymer; and not more than 40 parts by weight of an anti-stick agent making the composition less tacky prior to polymerization and constituted by at least one vinyl ether compound.Type: GrantFiled: October 29, 2003Date of Patent: October 5, 2010Assignee: EurocopterInventors: Patrick Boschet, Emmanuel Piel
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Patent number: 7807230Abstract: Curcumin and curcuminoid compounds as photosensitizers for onium salt photoinitiators in cationic photopolymerization reactions are presented.Type: GrantFiled: June 16, 2006Date of Patent: October 5, 2010Assignee: Rensselaer Polytechnic InstituteInventors: James Crivello, Umut Bulut
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Patent number: 7799505Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.Type: GrantFiled: October 23, 2007Date of Patent: September 21, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Tomotaka Tsuchimura, Hiroshi Saegusa, Hideaki Tsubaki
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Patent number: 7795323Abstract: An active ray curable ink-jet ink comprising at least an organic pigment, a polymer dispersant, a photo-initiator and a cationic polymerizable compound, wherein the active ray curable ink-jet ink incorporates a quaternary ammonium salt and a content of the quaternary ammonium salt is not less than 5 ppm and not more than 500 ppm.Type: GrantFiled: August 11, 2006Date of Patent: September 14, 2010Assignee: Konica Minolta Medical & Graphic, Inc.Inventor: Toshiyuki Takabayashi
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Patent number: 7776512Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.Type: GrantFiled: January 29, 2009Date of Patent: August 17, 2010Assignee: FUJIFILM CorporationInventors: Kunihiko Kodama, Toshiaki Aoai
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Patent number: 7740482Abstract: Stable and substantially filled cationic dental compositions are described which include: (1) at least one cationically reactive compound (A); (2) at least one dental filler (B); (3) optionally, at least one dispersant (C) composed of at least one organic polymer or copolymer; (4) at least one cationic photoinitiator (D); and (5) optionally, at least one photosensitizer (E). The dental filler (B) is treated with at least one organosilicon coupling agent (F), and at least one compound (G). The organosilicon coupling agent (F) has at least one reactive function (rfA) directly linked to a silicon atom forming after activation of a chemical bond with the dental filler, and at least one reactive function (rfB) not directly linked to a silicon atom, forming after activation, a chemical bond with a reactive function (rfC) of the compound (G).Type: GrantFiled: May 2, 2008Date of Patent: June 22, 2010Assignee: Bluestar Silicones FranceInventors: Jean-Marc Frances, Martial Deruelle, Yves Giraud
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Publication number: 20100129563Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitisers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.Type: ApplicationFiled: May 9, 2008Publication date: May 27, 2010Applicant: Sun Chemical B.V.Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
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Patent number: 7718111Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.Type: GrantFiled: April 11, 2007Date of Patent: May 18, 2010Assignee: Huntsman Advanced Materials Americas Inc.Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
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Patent number: 7714037Abstract: A photoinitiated cationically curable composition is provided, including at least one substantially saturated epoxy component comprising at least two glycidyl ether groups; at least one acrylonitrile/butadiene copolymer; and at least one cationic photoinitiator. The compositions exhibit excellent strength properties as well as reduced color formation upon curing, particularly after post-curing thermal treatments. Methods of bonding substrates with such compositions and articles prepared therefrom are also provided through the invention.Type: GrantFiled: December 15, 2006Date of Patent: May 11, 2010Assignee: Henkel CorporationInventor: Philip T. Klemarczyk
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Patent number: 7709553Abstract: The invention provides a cation polymerizable resin composition excellent in curing properties and corrosion resistance with less resin coloration and less cure shrinkage, which is a material suitable as a surface protective material for optical disk. Specifically, the cation polymerizable resin composition comprises an epoxy compound (A) as an essential ingredient represented by formula 1 wherein R1 and R2 each represent a saturated or unsaturated carbon atom, and R3 represents a hydrogen atom or a saturated or unsaturated carbon atom, a cation polymerizable compound (B) other than the epoxy compound represented by formula 1, a photo cation polymerization initiator (C) and a photo radical polymerization initiator (D).Type: GrantFiled: April 16, 2004Date of Patent: May 4, 2010Assignee: Mitsui Chemicals, Inc.Inventors: Yuichi Ito, Satoru Suda, Yasushi Mizuta, Katsunori Nishiura, Toshikazu Gomi
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Patent number: 7709548Abstract: A monosulfonium salt in which very little unreacted raw material remains, which has a purity of at least 96%, and which has one sulfonio group in its molecule is manufactured without a refining step. After (a) an aryl compound, (b) a sulfoxide compound, (c) a dehydrating agent, and (d) a BF4, PF6, AsF6, or SbF6 salt of an alkali metal or an alkaline earth metal are introduced into a reaction system, (e) an inorganic acid is added, so that the aryl compound (a) and the sulfoxide compound (b) are subjected to dehydration condensation.Type: GrantFiled: December 17, 2007Date of Patent: May 4, 2010Assignee: San-Apro LimitedInventors: Masashi Date, Hideki Kimura, Shinji Yamashita, Jiro Yamamoto
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Patent number: 7709547Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.Type: GrantFiled: November 21, 2006Date of Patent: May 4, 2010Assignee: FUJIFILM CorporationInventors: Kazuhiro Yokoi, Ippei Nakamura, Kenji Wada
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Patent number: 7709554Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.Type: GrantFiled: November 16, 2006Date of Patent: May 4, 2010Assignee: Canon Kabushiki KaishaInventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura
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Publication number: 20100105792Abstract: The invention relates to a process for preparing binders which contain 1) allophanate groups, 2) groups that react with ethylenically unsaturated compounds with polymerization on exposure to actinic radiation (radiation-curing groups) and 3) optionally NCO-reactive groups, by reacting at temperatures ?130° C. A) one or more NCO-functional compounds containing uretdione groups with B) one or more compounds that contain isocyanate-reactive groups and groups that react with ethylenically unsaturated compounds with polymerization on exposure to actinic radiation (radiation-curing groups), and then C) with one or more saturated, hydroxyl-containing compounds other than B), at least one of these compounds having an OH functionality of ?2, in the presence of D) a catalyst containing one or more ammonium salts or phosphonium salts of aliphatic or cycloaliphatic carboxylic acids, the reaction with compounds C) taking place at least proportionally with the formation of allophanate groups.Type: ApplicationFiled: January 4, 2010Publication date: April 29, 2010Inventors: Jan Weikard, Christoph Gürtler, Wolfgang Fischer, Jörg Schmitt, Holger Mundstock
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Patent number: 7690301Abstract: An ink composition including a cationically polymerizable compound (a), a compound (b) that generates acid by irradiation with a radiation ray, and a basic compound (c) that becomes less basic by irradiation with a radiation ray. Also, an inkjet recording method and a printed material using the ink composition, as well as a planographic printing plate obtained by using the ink composition and a method of producing the planographic printing plate are disclosed.Type: GrantFiled: February 8, 2006Date of Patent: April 6, 2010Assignee: FUJIFILM CorporationInventor: Toshiaki Aoai
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Patent number: 7682477Abstract: The invention relates to a radiation crosslinkable hot melt pressure sensitive adhesive comprised of a radiation crosslinkable polymer as component (A) based on epoxidized polyolefins, wherein the epoxy groups are not consolidated in blocks; a tackifying resin possessing no epoxy groups as component (B); optionally a low molecular weight oligomer as component (C) that possesses reactive groups that can react with the epoxy groups of component (A); and an additive comprising a photo initiator as component (D).Type: GrantFiled: August 9, 2007Date of Patent: March 23, 2010Assignee: Henkel Kommanditgesellschaft auf Aktien (Henkel KGAA)Inventors: Thomas Moeller, Holger Toenniessen
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Patent number: 7671107Abstract: It has been discovered that an initiation reaction is efficiently progressed to a propagation reaction by adding a compound that potentially or directly generates a carbocation to the polymerization system of a cationic ring-opening polymerizable compound, and thus the activation of polymerization is rendered. Namely, the present invention relates to a cationic polymerizable resin composition which is characterized by comprising (A) a compound having at least one functional group capable of cationic ring-opening polymerization in one molecular chain, (B) a cationic polymerization initiator, and (C) a compound to generate a carbocation by the action of active species generated from (B) the cationic polymerization initiator by electromagnetic wave or particle beam.Type: GrantFiled: November 25, 2004Date of Patent: March 2, 2010Assignee: Mitsui Chemicals, Inc.Inventors: Yuichi Ito, Yasushi Mizuta
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Patent number: 7648767Abstract: A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.Type: GrantFiled: June 1, 2005Date of Patent: January 19, 2010Assignee: Dow Corning CorporationInventors: Peng Fei Fu, Lingjie Jay Guo, Xing Cheng
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Publication number: 20090318578Abstract: An ultraviolet-curable resin composition comprises: (A) at least one silane having a hydrolysable group and at least one group containing a cyclic ether; (B) at least one material containing one or more cyclic ether groups, which is not an alkoxysilane and is different from the silane (A); (C) a cationic photoinitiator; (D) optionally an organic solvent, such as propylene carbonate; and (E) optionally other conventional additives.Type: ApplicationFiled: November 23, 2007Publication date: December 24, 2009Applicant: Eques CoatingsInventors: Dennis John Versteeg, Anne Ference Karel Victor Biezemans
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Publication number: 20090295003Abstract: The present invention relates to a resin composition for optical components, which is an ultraviolet-curable transparent resin composition used as a material for an optical component, in which the resin composition includes (A) an epoxy resin having two or more epoxy groups in one molecule thereof, (B) an oxetane compound having one or more oxetanyl groups in one molecule thereof and (C) a photo-acid generator, and in which the component (C) is contained in an amount of 0.01 to 2.0 parts by weight based on 100 parts by weight of a total amount of the components (A) and (B). The present invention also relates to an optical component obtained by using the resin composition for optical components, and a production method thereof.Type: ApplicationFiled: May 29, 2009Publication date: December 3, 2009Applicant: NITTO DENKO DENKO CORPORATIONInventors: Hiroshi NORO, Akiko NAKAHASHI, Hisataka ITO
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Patent number: 7618683Abstract: An ink composition is provided that includes (A) an acid-generating compound having an anion represented by any one of Formulae (I) to (XI), (B) a cationically polymerizable compound, and (C) a colorant. (In the formulae, R1 to R3 independently denote a monovalent organic group, Rb1 to Rb3, Rf1, and Rf2 independently denote a perfluoroalkyl group, a perfluoroaryl group, or an aryl group substituted with at least one fluorine atom or perfluoroalkyl group, X1 to X3 independently denote a monovalent organic group, and Y1 denotes a hydrogen atom or a monovalent organic group.Type: GrantFiled: January 5, 2007Date of Patent: November 17, 2009Assignee: FUJIFILM CorporationInventor: Tomotaka Tsuchimura
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Patent number: 7615258Abstract: A method of reducing unreacted monomer in a water-soluble or water swellable polymer comprising the steps, i) applying an ultraviolet initiator to the surface of the polymer and ii) irradiating the polymer with ultraviolet light, wherein the ultraviolet initiator is dissolved or dispersed in a liquid medium and in which the liquid medium comprises an organic compound. The method is useful for reducing in the amount of unreacted acrylamide in polyacrylamide. Also claimed is a liquid initiator composition comprising, i) an ultraviolet initiator, and ii) a liquid medium comprising an organic compound. The initiator system is useful for applying to the surface of a polymer, such as polyacrylamide, in the removal of unreacted monomer, such as acrylamide.Type: GrantFiled: July 8, 2005Date of Patent: November 10, 2009Assignee: Ciba Specialty Chemicals Water Treatments Ltd.Inventors: Gareth Ian Naylor, Anne Flisher
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Patent number: RE40967Abstract: A curable slurry for forming ceramic microstructures on a substrate using a mold. The slurry is a mixture of a ceramic powder, a fugitive binder, and a diluent. The ceramic powder has a low softening temperature in a range of about 400° C. to 600° C. and a coefficient of thermal expansion closely matched to that of the substrate. The fugitive binder is capable of radiation curing, electron beam curing, or thermal curing. The diluent promotes release properties with the mold after curing the binder or quick and complete burn out of the binder during debinding.Type: GrantFiled: March 29, 2006Date of Patent: November 10, 2009Assignee: 3M Innovative Properties CompanyInventors: Kenneth R. Dillon, Kyung H. Moh, Thomas E. Wood, Raymond C. Chiu, Vincent W. King, Richard P. Rusin