Specified Rate-affecting Material Contains Onium Group Patents (Class 522/31)
  • Patent number: 8030368
    Abstract: Photoinitiated reactions especially in photopolymer technology, as well as photoinitiated color forming reactions are achievable by applying a reactive substrate selected from a polymerisable and/or crosslinkable composition and a color changing substance to a support, activating a latent photoinitiator applied with the reactive substance and subsequently exposing the reactive substrate with the resulting photoinitiator therein to photoreaction conditions wherein actinic radiation causes the substrate to undergo polymerization and/or crosslinking or color change respectively, the substrate being locally modified in its constitution as a result of its exposure to actinic radiation at least one stage of the method, so that the resulting polymerised and/or crosslinked composition or color changed substance corresponds in its distribution on the support to the locations of the modification of the substrate.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: October 4, 2011
    Assignee: Lintfield Limited
    Inventor: Grant Bradley
  • Publication number: 20110229821
    Abstract: The invention relates to a process for the hydrolysis-polycondensation of a sterically hindered crosslinkable chromophore, characterized in that the hydrolysis-polycondensation is catalyzed with an acid released by a photoacid generator (PAG).
    Type: Application
    Filed: September 15, 2008
    Publication date: September 22, 2011
    Applicants: Centre National De La Recherche Scientifique-CNRS, Universite Montpellier 2, Ecole National Se Superieure DE Chimie
    Inventors: Olivier Dautel, Joel Moreau, Jean-Pierre Lere-Porte
  • Patent number: 8012672
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: September 6, 2011
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Patent number: 8008366
    Abstract: A process for producing a cured coating is provided that includes a step of forming on a substrate layer of a curable composition that includes at least one compound represented by Formula (I) and a step of curing the layer of the curable composition by irradiation with electron beam. In formula (I) , Q1 denoted a cyano group or a —COX2 group, X1 denoted a hydrogen atom, organic residue, or polymer chain bonded to carbon atom CA via a heteroatom, or a halogen atom, X2 denoted a hydrogen atom, organic residue, or polymer chain boned to the carbonyl group via a heteroatom, or a halogen atom, Ra and Rb independently denote a hydrogen atom, a halogen atom, a cyano group, or an organic residue, and X1 and X2, Ra and Rb, and X1 and Ra or Rb may be bonded to each other to form a cyclic structure. There is also provided an electron beam-curable composition that includes a compound represented by Formula (I).
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: August 30, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Kazuto Kunita
  • Publication number: 20110195249
    Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
    Type: Application
    Filed: April 22, 2011
    Publication date: August 11, 2011
    Inventors: Cheong Hun SONG, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 7989517
    Abstract: Disclosed is an actinic ray curable composition comprising a cationically polymerizable compound, an onium salt, and a compound represented by formula 1, R1{(CR2R3)mOH}n??Formula 1 wherein R1 represents a condensed ring group; R2 and R3 independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group; m represents an integer of from 2 to 4; and n represents an integer of from 1 to 10.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: August 2, 2011
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Patent number: 7977401
    Abstract: An ultraviolet curable resin composition, which comprises a cationic photopolymerization initiator (B) and a urethane prepolymer (A) having a structure represented by the general formula (1); (wherein R1 and R2 each independently represent an alkylene group, R3, R4 and R5 each independently represent an alkyl group or hydrogen atom, R6 and R7 each independently represent an alkylene group having 2 to 4 carbon atoms, a represents 0 or 1, and b and c each independently represent an integer of 0 to 10).
    Type: Grant
    Filed: March 29, 2007
    Date of Patent: July 12, 2011
    Assignee: DIC Corporation
    Inventors: Kouichi Yokota, Koujirou Tanaka, Kai-Uwe Gaudl, Artur Lachowicz
  • Patent number: 7964248
    Abstract: The present invention is directed to a photoinitiator composition comprising two different cationic photoinitiators and a photocurable composition comprising said photoinitiator composition. Moreover, the present invention relates to the use of the photoinitiator composition and the photocurable composition. Furthermore, the present invention relates to a process for producing a three dimensional article.
    Type: Grant
    Filed: April 9, 2008
    Date of Patent: June 21, 2011
    Assignee: Huntsman Advanced Materials Americas LLC
    Inventors: John Wai Fong, Carole Chapelat, Loic Messe, Ranjana Patel, Laurence Messe
  • Patent number: 7964654
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: June 21, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Patent number: 7943680
    Abstract: The invention provides methods for inducing reversible chain cleavage of polymer chains in a crosslinked polymeric material. Reversible cleavage of the polymer backbone is capable of relieving stress in the polymeric material as the bonds reform in a less stressed state. The invention also provides methods for making polymeric materials capable of reversible chain cleavage, materials made by the methods of the invention, and linear monomers containing reversible chain cleavage groups which are useful in the materials and methods of the invention.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: May 17, 2011
    Assignee: The Regents of the University of Colorado
    Inventors: Christopher N. Bowman, Timothy F. Scott
  • Patent number: 7935739
    Abstract: An object of the present invention is to provide a cationic curable composition which has low viscosity, can be rapidly photo-cured even in the air, has good adhesion to a substrate such as glass or resin, and is excellent in glass cleaner resistance and water resistance; an ink jet ink, a gravure ink and a hard coating material which comprise the composition; and cured products thereof. A cationic curable composition comprising: (A) 1 to 100 parts by weight of a phenol derivative having 3 or more aromatic rings per molecule, wherein the aromatic ring has a structure in which some or all of hydrogen atoms of phenolic hydroxyl groups of the aromatic ring are substituted by polymerizable functional groups; (B) 1 to 500 parts by weight of a cationic polymerizable compound; and (C) 0.05 to 20 parts by weight of a photo- and/or thermo-cationic initiator is provided.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: May 3, 2011
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Atsushi Shimizu, Masao Kondo, Kuon Miyazaki
  • Patent number: 7914965
    Abstract: A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
    Type: Grant
    Filed: September 20, 2005
    Date of Patent: March 29, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Hyou Takahashi, Kenji Wada
  • Patent number: 7910312
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7906060
    Abstract: The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ether component, and an initiator component that produces an acid in response to radiation. The bis vinyl ether component is reactive to the acid and polymerizes in response thereto.
    Type: Grant
    Filed: April 18, 2008
    Date of Patent: March 15, 2011
    Assignee: Board of Regents, The University of Texas System
    Inventors: Carlton Grant Willson, Nicholas A. Stacey
  • Publication number: 20110060068
    Abstract: The present invention relates to the use of alkoxysilane components in the presence of acid-generating photoinitiators in radiation-curable, free-radically crosslinkable formulations which in the cured state offer a particular degree of corrosion control for metallic substrates.
    Type: Application
    Filed: February 5, 2009
    Publication date: March 10, 2011
    Applicant: Evonik Degussa GmbH
    Inventor: Emmanouil Spyrou
  • Patent number: 7893126
    Abstract: An active ray curable ink-jet ink comprising at least one type of a photo acid generating compound, a cationic polymerizable compound and a pigment, wherein the active ray curable ink-jet ink contains a fatty acid amine salt comprising a fatty acid having a carbon number of 6-18 and a primary, a secondary or a tertiary amine having a carbon number of 4-12 in an amount of 0.01-0.70 weight % based on the total weight of the ink-jet ink.
    Type: Grant
    Filed: October 29, 2007
    Date of Patent: February 22, 2011
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Toshiyuki Takabayashi
  • Patent number: 7893129
    Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV- and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Patent number: 7893130
    Abstract: Dental compositions are described which are photocurable by radiation with a wavelength greater than 390 nm. The compositions include a cationically active compound, a dental filler, optionally a dispersant, a cationic photoinitiator and a photosensitizer which is a thioxanthone salt substituted by at least one group containing an ammonium function. The composition has the advantage of remedying the color stability problems of finished dental products after crosslinking.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Publication number: 20110028583
    Abstract: The present invention is directed to an adhesive composition comprising a crosslinkable acrylic copolymer, a multi-functionalized crosslinkable oligomer and a photoinitiator wherein the composition exhibits excellent wet out characteristics as reflected in a tan delta value of at least 0.5, preferably greater than 0.5, more preferable greater than 0.8 as measured at 20° C. resulting from a first curing stage, and improved stiffness and temperature resistance as reflected in a storage elastic modulus of at least 300,000 Pa at 20° C. and a shear adhesion failure temperature of at least 425° F. (218.3° C.) at 1 Kg/in2 (0.155 Kg/cm2), respectively, which result from a second sequential curing stage.
    Type: Application
    Filed: August 3, 2009
    Publication date: February 3, 2011
    Applicant: Morgan Adhesives Company
    Inventors: Timothy Michael Smith, Gary Allan McMaster
  • Publication number: 20110021654
    Abstract: An object of the present invention is to provide a novel cationic photopolymerization initiator that efficiently absorbs light and generates protons. As a means of achieving the object above, a preferred cationic photopolymerization initiator of the present invention includes an initiator comprising a bismuthonium salt represented by the following general formula (II): Wherein R11, R12, and R13 may be the same or different and are each an optionally substituted monocyclic aryl group or an optionally substituted monocyclic heteroaryl group, R14 is an optionally substituted fused polycyclic aromatic group or an optionally substituted fused polycyclic heterocyclic group, and X? is an anion associated with a cation.
    Type: Application
    Filed: December 11, 2008
    Publication date: January 27, 2011
    Applicant: KYOTO UNIVERSITY
    Inventors: Yoshihiro Matano, Hiroshi Imahori
  • Patent number: 7862996
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7863344
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Publication number: 20100304284
    Abstract: The invention relates to a cationic photocurable composition comprising at least one cationically polymerizable compound, at least one onium salt photoinitiator, at least a moisture scavenger, and at least a stabilizer selected from the group consisting of sterically hindered nitroxyl stabilizers, sterically hindered phenolic antioxidants, organic phosphorous stabilizers and mixtures thereof.
    Type: Application
    Filed: October 15, 2007
    Publication date: December 2, 2010
    Inventor: Karsten Rinker
  • Publication number: 20100292358
    Abstract: The present invention relates to a resin composition for optical components, the resin composition being an ultraviolet-curable transparent resin composition to be used as a material for an optical component, in which the resin component includes the following component (A) as a main component and the following component (B) being a photo-cationic polymerization initiator: (A) an epoxy resin having two or more epoxy groups in one molecule thereof; and (B) an onium salt containing a hexafluorophosphate ion as an anion component.
    Type: Application
    Filed: May 13, 2010
    Publication date: November 18, 2010
    Applicant: NITTO DENKO CORPORATION
    Inventors: Hiroshi NORO, Akiko NAKAHASHI, Hisataka ITO
  • Patent number: 7833691
    Abstract: The present invention relates to a heterocycle-containing onium salt useful as, for example, a cationic photopolymerization initiator and an acid generator for a chemically amplified resist, and provides a heterocycle-containing onium salt shown in the specification.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: November 16, 2010
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Masami Ishihara, Yoji Urano, Masahiro Takahashi
  • Patent number: 7833690
    Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: November 16, 2010
    Assignee: The University of North Carolina at Charlotte
    Inventors: Kenneth E. Gonsalves, Mingxing Wang
  • Patent number: 7816422
    Abstract: The present invention provides a curable composition comprising a compound having a partial structure represented by the following formula (I) and a partial structure represented by the following formula (II): wherein in formula (I), A represents a group capable of forming a four- or more-membered bivalent alicyclic alkyl group with neighboring carbon atoms; and in formula (II), R1 represents an alkylene, a cycloalkylene, or an arylene group, and n represents an integer of 1 or more.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: October 19, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Kotaro Watanabe
  • Patent number: 7807090
    Abstract: The invention relates to a mold for making a composite material part, the mold being coated in a stripping composition. The stripping composition comprises: 100 parts by weight of a base ingredient consisting in epoxy polydimethylsiloxane; 0.5 to 10 parts by weight of a polymerization agent for polymerizing the base ingredient and constituted by a diaryliodonium salt; not more than 30 parts by weight of an anti-adhesion modulator constituted by a silicone polymer; and not more than 40 parts by weight of an anti-stick agent making the composition less tacky prior to polymerization and constituted by at least one vinyl ether compound.
    Type: Grant
    Filed: October 29, 2003
    Date of Patent: October 5, 2010
    Assignee: Eurocopter
    Inventors: Patrick Boschet, Emmanuel Piel
  • Patent number: 7807230
    Abstract: Curcumin and curcuminoid compounds as photosensitizers for onium salt photoinitiators in cationic photopolymerization reactions are presented.
    Type: Grant
    Filed: June 16, 2006
    Date of Patent: October 5, 2010
    Assignee: Rensselaer Polytechnic Institute
    Inventors: James Crivello, Umut Bulut
  • Patent number: 7799505
    Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 21, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Tomotaka Tsuchimura, Hiroshi Saegusa, Hideaki Tsubaki
  • Patent number: 7795323
    Abstract: An active ray curable ink-jet ink comprising at least an organic pigment, a polymer dispersant, a photo-initiator and a cationic polymerizable compound, wherein the active ray curable ink-jet ink incorporates a quaternary ammonium salt and a content of the quaternary ammonium salt is not less than 5 ppm and not more than 500 ppm.
    Type: Grant
    Filed: August 11, 2006
    Date of Patent: September 14, 2010
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Toshiyuki Takabayashi
  • Patent number: 7776512
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: August 17, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • Patent number: 7740482
    Abstract: Stable and substantially filled cationic dental compositions are described which include: (1) at least one cationically reactive compound (A); (2) at least one dental filler (B); (3) optionally, at least one dispersant (C) composed of at least one organic polymer or copolymer; (4) at least one cationic photoinitiator (D); and (5) optionally, at least one photosensitizer (E). The dental filler (B) is treated with at least one organosilicon coupling agent (F), and at least one compound (G). The organosilicon coupling agent (F) has at least one reactive function (rfA) directly linked to a silicon atom forming after activation of a chemical bond with the dental filler, and at least one reactive function (rfB) not directly linked to a silicon atom, forming after activation, a chemical bond with a reactive function (rfC) of the compound (G).
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: June 22, 2010
    Assignee: Bluestar Silicones France
    Inventors: Jean-Marc Frances, Martial Deruelle, Yves Giraud
  • Publication number: 20100129563
    Abstract: Polycyclic aromatic compounds of formula (I) having at least two conjugated aromatic rings at least one of which has a substituent comprising a cyclic carbonate group can be used as sensitisers for cationic photoinitiators, especially iodonium compounds, and may also function as monomers in cationically initiated radiation curable compositions, especially coating compositions, such as printing inks and varnishes.
    Type: Application
    Filed: May 9, 2008
    Publication date: May 27, 2010
    Applicant: Sun Chemical B.V.
    Inventors: Shaun Lawrence Herlihy, Robert Stephen Davidson
  • Patent number: 7718111
    Abstract: A photocurable composition comprising cationically curable compound, an acrylate-containing compound; a hydroxyl-containing compound; a cationic photoinitiator; and a free radical photoinitiator; wherein said composition has less than 0.54 equivalents of cationically curable groups, less than 0.10 equivalents of acrylate groups and less than 0.10 equivalents of hydroxyl 0groups per 100 grams of said composition.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: May 18, 2010
    Assignee: Huntsman Advanced Materials Americas Inc.
    Inventors: David L. Johnson, Frank Tran, John Fong, Richard Leyden, Ranjana Patel
  • Patent number: 7714037
    Abstract: A photoinitiated cationically curable composition is provided, including at least one substantially saturated epoxy component comprising at least two glycidyl ether groups; at least one acrylonitrile/butadiene copolymer; and at least one cationic photoinitiator. The compositions exhibit excellent strength properties as well as reduced color formation upon curing, particularly after post-curing thermal treatments. Methods of bonding substrates with such compositions and articles prepared therefrom are also provided through the invention.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: May 11, 2010
    Assignee: Henkel Corporation
    Inventor: Philip T. Klemarczyk
  • Patent number: 7709553
    Abstract: The invention provides a cation polymerizable resin composition excellent in curing properties and corrosion resistance with less resin coloration and less cure shrinkage, which is a material suitable as a surface protective material for optical disk. Specifically, the cation polymerizable resin composition comprises an epoxy compound (A) as an essential ingredient represented by formula 1 wherein R1 and R2 each represent a saturated or unsaturated carbon atom, and R3 represents a hydrogen atom or a saturated or unsaturated carbon atom, a cation polymerizable compound (B) other than the epoxy compound represented by formula 1, a photo cation polymerization initiator (C) and a photo radical polymerization initiator (D).
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: May 4, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yuichi Ito, Satoru Suda, Yasushi Mizuta, Katsunori Nishiura, Toshikazu Gomi
  • Patent number: 7709548
    Abstract: A monosulfonium salt in which very little unreacted raw material remains, which has a purity of at least 96%, and which has one sulfonio group in its molecule is manufactured without a refining step. After (a) an aryl compound, (b) a sulfoxide compound, (c) a dehydrating agent, and (d) a BF4, PF6, AsF6, or SbF6 salt of an alkali metal or an alkaline earth metal are introduced into a reaction system, (e) an inorganic acid is added, so that the aryl compound (a) and the sulfoxide compound (b) are subjected to dehydration condensation.
    Type: Grant
    Filed: December 17, 2007
    Date of Patent: May 4, 2010
    Assignee: San-Apro Limited
    Inventors: Masashi Date, Hideki Kimura, Shinji Yamashita, Jiro Yamamoto
  • Patent number: 7709547
    Abstract: The present invention provides an ink composition, and inkjet recording method, a printed material, a production method of a planographic printing plate, and a planographic printing plate. The ink composition of the present invention contains a cationically polymerizable compound, a compound that generates an acid when irradiated with a radiation ray, and an onium salt compound that generates an organic acid compound having a basic nitrogen atom when irradiated with a radiation ray.
    Type: Grant
    Filed: November 21, 2006
    Date of Patent: May 4, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kazuhiro Yokoi, Ippei Nakamura, Kenji Wada
  • Patent number: 7709554
    Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.
    Type: Grant
    Filed: November 16, 2006
    Date of Patent: May 4, 2010
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura
  • Publication number: 20100105792
    Abstract: The invention relates to a process for preparing binders which contain 1) allophanate groups, 2) groups that react with ethylenically unsaturated compounds with polymerization on exposure to actinic radiation (radiation-curing groups) and 3) optionally NCO-reactive groups, by reacting at temperatures ?130° C. A) one or more NCO-functional compounds containing uretdione groups with B) one or more compounds that contain isocyanate-reactive groups and groups that react with ethylenically unsaturated compounds with polymerization on exposure to actinic radiation (radiation-curing groups), and then C) with one or more saturated, hydroxyl-containing compounds other than B), at least one of these compounds having an OH functionality of ?2, in the presence of D) a catalyst containing one or more ammonium salts or phosphonium salts of aliphatic or cycloaliphatic carboxylic acids, the reaction with compounds C) taking place at least proportionally with the formation of allophanate groups.
    Type: Application
    Filed: January 4, 2010
    Publication date: April 29, 2010
    Inventors: Jan Weikard, Christoph Gürtler, Wolfgang Fischer, Jörg Schmitt, Holger Mundstock
  • Patent number: 7690301
    Abstract: An ink composition including a cationically polymerizable compound (a), a compound (b) that generates acid by irradiation with a radiation ray, and a basic compound (c) that becomes less basic by irradiation with a radiation ray. Also, an inkjet recording method and a printed material using the ink composition, as well as a planographic printing plate obtained by using the ink composition and a method of producing the planographic printing plate are disclosed.
    Type: Grant
    Filed: February 8, 2006
    Date of Patent: April 6, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Toshiaki Aoai
  • Patent number: 7682477
    Abstract: The invention relates to a radiation crosslinkable hot melt pressure sensitive adhesive comprised of a radiation crosslinkable polymer as component (A) based on epoxidized polyolefins, wherein the epoxy groups are not consolidated in blocks; a tackifying resin possessing no epoxy groups as component (B); optionally a low molecular weight oligomer as component (C) that possesses reactive groups that can react with the epoxy groups of component (A); and an additive comprising a photo initiator as component (D).
    Type: Grant
    Filed: August 9, 2007
    Date of Patent: March 23, 2010
    Assignee: Henkel Kommanditgesellschaft auf Aktien (Henkel KGAA)
    Inventors: Thomas Moeller, Holger Toenniessen
  • Patent number: 7671107
    Abstract: It has been discovered that an initiation reaction is efficiently progressed to a propagation reaction by adding a compound that potentially or directly generates a carbocation to the polymerization system of a cationic ring-opening polymerizable compound, and thus the activation of polymerization is rendered. Namely, the present invention relates to a cationic polymerizable resin composition which is characterized by comprising (A) a compound having at least one functional group capable of cationic ring-opening polymerization in one molecular chain, (B) a cationic polymerization initiator, and (C) a compound to generate a carbocation by the action of active species generated from (B) the cationic polymerization initiator by electromagnetic wave or particle beam.
    Type: Grant
    Filed: November 25, 2004
    Date of Patent: March 2, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Yuichi Ito, Yasushi Mizuta
  • Patent number: 7648767
    Abstract: A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: January 19, 2010
    Assignee: Dow Corning Corporation
    Inventors: Peng Fei Fu, Lingjie Jay Guo, Xing Cheng
  • Publication number: 20090318578
    Abstract: An ultraviolet-curable resin composition comprises: (A) at least one silane having a hydrolysable group and at least one group containing a cyclic ether; (B) at least one material containing one or more cyclic ether groups, which is not an alkoxysilane and is different from the silane (A); (C) a cationic photoinitiator; (D) optionally an organic solvent, such as propylene carbonate; and (E) optionally other conventional additives.
    Type: Application
    Filed: November 23, 2007
    Publication date: December 24, 2009
    Applicant: Eques Coatings
    Inventors: Dennis John Versteeg, Anne Ference Karel Victor Biezemans
  • Publication number: 20090295003
    Abstract: The present invention relates to a resin composition for optical components, which is an ultraviolet-curable transparent resin composition used as a material for an optical component, in which the resin composition includes (A) an epoxy resin having two or more epoxy groups in one molecule thereof, (B) an oxetane compound having one or more oxetanyl groups in one molecule thereof and (C) a photo-acid generator, and in which the component (C) is contained in an amount of 0.01 to 2.0 parts by weight based on 100 parts by weight of a total amount of the components (A) and (B). The present invention also relates to an optical component obtained by using the resin composition for optical components, and a production method thereof.
    Type: Application
    Filed: May 29, 2009
    Publication date: December 3, 2009
    Applicant: NITTO DENKO DENKO CORPORATION
    Inventors: Hiroshi NORO, Akiko NAKAHASHI, Hisataka ITO
  • Patent number: 7618683
    Abstract: An ink composition is provided that includes (A) an acid-generating compound having an anion represented by any one of Formulae (I) to (XI), (B) a cationically polymerizable compound, and (C) a colorant. (In the formulae, R1 to R3 independently denote a monovalent organic group, Rb1 to Rb3, Rf1, and Rf2 independently denote a perfluoroalkyl group, a perfluoroaryl group, or an aryl group substituted with at least one fluorine atom or perfluoroalkyl group, X1 to X3 independently denote a monovalent organic group, and Y1 denotes a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: November 17, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Tomotaka Tsuchimura
  • Patent number: 7615258
    Abstract: A method of reducing unreacted monomer in a water-soluble or water swellable polymer comprising the steps, i) applying an ultraviolet initiator to the surface of the polymer and ii) irradiating the polymer with ultraviolet light, wherein the ultraviolet initiator is dissolved or dispersed in a liquid medium and in which the liquid medium comprises an organic compound. The method is useful for reducing in the amount of unreacted acrylamide in polyacrylamide. Also claimed is a liquid initiator composition comprising, i) an ultraviolet initiator, and ii) a liquid medium comprising an organic compound. The initiator system is useful for applying to the surface of a polymer, such as polyacrylamide, in the removal of unreacted monomer, such as acrylamide.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: November 10, 2009
    Assignee: Ciba Specialty Chemicals Water Treatments Ltd.
    Inventors: Gareth Ian Naylor, Anne Flisher
  • Patent number: RE40967
    Abstract: A curable slurry for forming ceramic microstructures on a substrate using a mold. The slurry is a mixture of a ceramic powder, a fugitive binder, and a diluent. The ceramic powder has a low softening temperature in a range of about 400° C. to 600° C. and a coefficient of thermal expansion closely matched to that of the substrate. The fugitive binder is capable of radiation curing, electron beam curing, or thermal curing. The diluent promotes release properties with the mold after curing the binder or quick and complete burn out of the binder during debinding.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: November 10, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Kenneth R. Dillon, Kyung H. Moh, Thomas E. Wood, Raymond C. Chiu, Vincent W. King, Richard P. Rusin