Abstract: High purity fluoropolymers are obtained by the emulsion polymerization process, removing essentially all ions and coagulating the polymer essentially without adding ions. These polymers are useful in the field of electronic devices.

Abstract: A novel fluoropolymer which can be an optical resin material having a low refractive index and excellent heat resistance, and a novel fluorinated diene compound having two unsaturated bonds, capable of presenting such a fluoropolymer, are presented. Further, by virtue of the low refractive index and excellent heat resistance, the polymer presents a high performance optical transmitter and a plastic optical fiber. A fluorinated diene compound represented by CF2?CFCF(ORf)CF2OCF?CF2 (wherein Rf is a perfluoroalkyl group such as a trifluoromethyl group), and a fluoropolymer thereof. Further, an optical transmitter made by using such a fluoropolymer, and a plastic optical fiber having a core comprising such a fluoropolymer and a fluorinated low molecular weight compound contained therein as a refractive index-increasing agent.

Abstract: Disclosed are block copolymers and end-functionalized polymers containing in their backbones at least one fluoro alkyl (meth)acrylate mer unit comprising —C6F13, —C4F9, or —C3F7.

Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.

Abstract: A vulcanizable fluorine-containing elastomer composition having excellent stability in molding and kneading property, from which a vulcanized article having a small compression set can be produced in a short period of time. The vulcanizable fluorine-containing elastomer composition comprises a vulcanization agent, a vulcanization aid and a fluorine-containing elastomer having C—H bond in its polymer chain, and an optimum vulcanization time T90 (min) of the composition and a compression set CS (%) of the vulcanized article satisfy the following equations (I) and (II): Equation (I): in case of 50,000?MW?200,000, CS??3.45 Ln(T90)+22.8?4×10?5×MW Equation (II): in case of 200,000<MW, CS??3.45 Ln(T90)+14.8.

Abstract: A fluoropolymer having repeating units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the following formula: CF2?CR1-Q-CR2?CH2??(1) wherein each of R1 and R2 which are independent of each other, is a hydrogen atom, a fluorine atom, an alkyl group having at most 3 carbon atoms, or a fluoroalkyl group having at most 3 carbon atoms, and Q is a bivalent organic group having a functional group bonded thereto, and a production method which comprises subjecting the above diene to radical polymerization. The polymer has a high Tg and a functional group concentration sufficient to exhibit the characteristics thereof.

Abstract: Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer derived from at least one polycyclic ethylenically unsaturated compound and at least one compound having at least one fluorine atom covalently attached to an ethylenically unsaturated carbon atom; and (b) at least one photoactive component. In other embodiments, the photoresists comprise a fluorine-containing copolymer derived from at least one polycyclic ethylenically unsaturated compound having at least one atom or group covalently attached to a carbon atom contained within a ring structure and separated from each ethylenically unsaturated carbon atom of the ethylenically unsaturated compound by at least one covalently attached carbon atom, wherein the atom or group is selected from the group consisting of fluorine perfluoroalkyl and perfluoroalkoxy.

Abstract: Photoresist monomers of following Formula 1, photoresist polymers thereof, and photoresist compositions containing the same. The photoresist polymers include a repeating unit comprising the photoresist monomer of Formula 1 as a comonomer and the photoresist compositions containing the same have excellent etching resistance, heat resistance and adhesiveness to a wafer, and are developable in aqueous tetramethylammonium hydroxide (TMAH) solutions. In addition, the photoresist compositions have a low light absorbance at 157 nm wavelength, and thus are suitable for a photolithography process using ultraviolet light sources such as VUV (157 nm) in fabricating a minute circuit for a high integration semiconductor device. wherein Y1, Y2, Y3, Y4, Y5, Y6, Z1, Z2 and m are defined in the specification.

Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to HFPI of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer being polymerized and isolated in the absence of added alkali metal salts, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups/106 carbon atoms can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.

Abstract: The invention concerns fluorofunctional statistical polymers of formula (V1), wherein: X, Y and Z represent a hydrogen atom and exhibiting in particular low glass transition temperatures obtained in particular from a B monomer of formula (I): F2C═CF—RF—SO2F, wherein: RF represents one or several vinylidene fluoride units and/or a hexafluoropropene unit and/or a chlorotrifluoroerthylene unit. The crosslinkable fluorosulphonated elastomers thus obtained are advantageously usable for making membranes, polymeric electrolytes, ionomers, membranes for fuel cells in particular hydrogen or methanol fuel cells, for obtaining gaskets and O-rings, rubber hose, pipes, pump bodies, diaphragms, piston heads (used in aeronautics, oil, automotive, mining and nuclear industries) and for plastics processes (as processing aids).

Abstract: Use of amorphous perfluorinated polymers for preparing transparent films at 157 nm, said perfluorinated polymers being free from unstable ionic end groups COF, COOH or their amidic derivatives, esters or salts, said polymers formed by cyclic units deriving from perfluorodioxoles of formula: 1

Abstract: The present invention relates to a partially-crystalline copolymer comprising tetrafluoroethylene, hexafluoropropylene in an amount corresponding to HFPI of from about 2.8 to 5.3, and preferably from about 0.2% to 3% by weight of perfluoro(alkyl vinyl ether), said copolymer being polymerized and isolated in the absence of added alkali metal salts, having a melt flow rate of within the range of about 30±3 g/10 min, and having no more than about 50 unstable endgroups can be extruded at high speed onto conductor over a broad polymer melt temperature range to give insulated wire of high quality.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 140 to 186 nanometers.

Abstract: A formulation based on the PTFE, homopolymer or modified, comprising: 1) latex of said PTFE having a particle diameter between 5 and 100 nm, comprising an anionic fluorinated surfactant in an amount in the range 2-25% by weight based on the PTFE; 2) non ionic fluorinated surfactant added to the PTFE latex in an amount in the range 18-60% by weight based on the PTFE.

Abstract: A fuser member comprising a core and a layer overlying the core, the layer including a cured fluorocarbon random copolymer having subunits of: —CH2CF2)x—, —(CF2CF(CF3)y—, or —(CF2CF2)z—, wherein x is from 30 to 90 mole percent, y is from 10 to 70 mole percent, z is from 0 to 34 mole percent; and x+y+z equals 100 mole percent; the layer further including particulate filler having zinc oxide and yellow iron oxide.

Abstract: Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslinker, or (B) a polymer containing: (i) saturated polycyclic moieties, and (ii) aromatic moieties for compositions requiring a separate crosslinker. The compositions provide outstanding optical, mechanical and etch selectivity properties. The compositions are especially useful in lithographic processes using radiation less than 200 nm in wavelength to configure underlying material layers.

Abstract: Fluoropolymers are prepared by a process comprising polymerizing at least one fluoromonomer in an aqueous reaction medium containing monomer, a radical initiator and a 3-allyloxy-2-hydroxy-1-propanesulfonic acid salt as surfactant. The medium may optionally contain one or more of an antifoulant, a buffering agent and a chain-transfer agent.

Abstract: A fluoropolymer having a reduced amount of polar end groups. The fluoropolymer is produced by free radical polymerization of fluorinated monomers and the initiation of the polymerization is carried out in the presence of a chloride salt. Polar end groups include hydroxy groups and ionized or ionizable end groups. Examples of ionized or ionizable end groups include acid groups and salts thereof such as sulfonic acid and salts thereof, —CH2—OSO3H groups, sulfates and carbonyl containing end groups such as carboxylic and carboxylate groups. Due to the presence of chloride salt at the initiation of the free radical polymerization, CF2Cl end groups are formed instead of the polar end groups. As a result, a fluoropolymer is obtained that has improved processibility and heat resistance.

Abstract: Melt-fabricable, tough copolymer of tetrafluoroethylene and fluorinated vinyl ether is produced in a suspension polymerization process by copolymerizing tetrafluoroethylene and fluorinated vinyl ether in a pressurized, agitated reaction vessel which contains aqueous medium, free radical initiator, and a telogen, the aqueous medium being essentially free of fluorine containing organic solvent. The contents of the reaction vessel are agitated during polymerization sufficiently to coagulate copolymer of tetrafluoroethylene and fluorinated vinyl ether. The melt-fabricable, tough copolymer having a melt viscosity of less than about 1×106 Pa·S is isolated directly from the reaction vessel.

Abstract: Tetrafluoroethylene (TFE) thermoprocessable copolymer microspheres having a substantially spherical shape for at least 95% by weight, the average size of the microspheres being in the range 25 &mgr;m and 2 mm, the bulk density being in the range 0.5 and 1.1 g/cm3.

Abstract: The present invention provides a fluoropolymer that is melt-processible and thermoplastic and that has a melting point between 100° C. and 320° C.

Abstract: The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: 1

Abstract: A purification process of thermoprocessable tetrafluoroethylene (TFE) copolymers comprising the following steps:

Abstract: A method for forming a fluoropolymer comprises providing a reaction mixture comprising carbon dioxide, at least one fluoromonomer, and an initiator; and reacting the at least one fluoromonomer in the reaction mixture to form a fluoropolymer. The fluoropolymer has a multimodal molecular weight distribution.

Abstract: A trifluorostyrene and substituted vinyl compound based partially fluorinated copolymer, an ionic conductive polymer membrane including the same, and a fuel cell adopting the ionic conductive polymer membrane, wherein the partially fluorinated copolymer has formula (1): where each of R1, R2 and R3 is F, H or CH3; X is a hydroxy group or a trifluoromethyl group; m is an integer greater than zero; n is an integer greater than zero; and p, q and r are zero or integers greater than zero.

Abstract: Disclosed are partially fluorinated and fully fluorinated polymers that are substantially transparent to ultraviolet radiation at wavelengths from 187 to 260 nanometers.

Abstract: Semicrystalline sulphonic fluorinated ionomers having an equivalent weight higher than 700 g/eq, up to 1,700, comprising: (A) monomeric units deriving from one or more fluorinated monomers containing at least one ethylene unsaturation; (B) fluorinated monomeric units containing sulphonyl groups —SO2F in such amount to give the above equivalent weight, deriving from F2C═CF—O—(CF2)q—SO2F, q being an integer equal to 2 or 3; and having the following properties for a TFE/(B) copolymer: hydration, expressed in % of H2O at 100° C. absorbed by the film prepared from the ionomer and after tranformation from the —SO2F form into the —SO3H form, having the following values: at   750 EW higher than 55%, pref.

Abstract: To provide a polymer having a main chain of a fluorinated alicyclic structure, which has a high Tg and which has a functional group concentration sufficient to exhibit the characteristics, and a process for its production.

Abstract: Emulsifier free fluoropolymer manufacturing method in which (a) a chain transfer agent, or a mixture of chain transfer agents are used wherein the chain transfer agents do not yield more than 0.4 weight % relative to the monomer feed of water soluble fluorinated compounds, or (b) a chain transfer agent or a mixture of chain transfer agents selected from alkanes, dialkyl ethers, hydrofluoroethers and/or hydrofluorocarbons.

Abstract: A novel polymer useful as an optical resin material excellent in heat resistance, a novel monomer for obtaining the polymer, etc., are provided. A fluorinated diene represented by CF2═CF(CF2)nC(CF3)ROCF═CF2 (wherein R is a fluorine atom or a trifluoromethyl group, and n is an integer of from 1 to 3), and a polymer thereof.

Abstract: A fluorocopolymer which comprises (A) polymerized units based on tetrafluoroethylene, (B) polymerized units based on ethylene and (C) polymerized units based on a compound represented by CH2═CX(CF2)2Y (wherein each of X and Y which are independent of each other, is a hydrogen atom or a fluorine atom), wherein the molar ratio of (A)/(B) is from 20/80 to 80/20, and the molar ratio of (C)/((A)+(B)) is from 1/1000 to 15/100, and which has a volume flow rate of from 1 to 1000 mm3/sec. The fluorocopolymer has a low fuel permeability coefficient and is excellent in the fuel barrier properties.

Abstract: Fluorine-modified comb polymers based on acryloyldimethyltaurine The invention provides water-soluble or water-swellable copolymers obtainable by free-radical copolymerization of

Abstract: A chemical amplification photoresist monomer, a photoresist polymer prepared thereof, and a photoresist composition using the polymer. More specifically, a chemical amplification photoresist polymer comprising a fluorine-containing monomer represented by Chemical Formula 1, and a composition comprising the polymer. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, it is very useful for forming ultramicro pattern in the process using a light source of far ultraviolet, especially of VUV (157 nm). In the Formula, R1, R2, R3 and R4 is defined in the specification.

Abstract: New and novel copolymers of vinylidene fluoride and hexafluoropropylene containing up to 24% by weight hexafluoropropylene having lower DSC melting temperatures at 8 weight percent or greater nominal HFP content, and having improved solution clarity and fluidity, longer gel times and lower extractables than prior art vinylidene fluoride-hexafluoropropylene copolymers of comparable HFP content whose syntheses are disclosed in sufficient detail to duplicate, to novel compositions of matter and articles of manufacture containing such copolymers, processes for the preparation and use of the copolymers, of the compositions of matter containing such copolymers and of the articles of manufacture containing such copolymers are disclosed. Improved electrochemical cells based on the new and novel copolymers are particularly disclosed.

Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.

Abstract: A tetrafluoroethylene (TFE)/perfluoro (alkyl vinyl ether) (PVE) copolymer and a method for producing the copolymer, wherein the molar ratio of polymerized units based on TFE/polymerized units based on PVE is in the range of from 98.1/1.9 to 95.0/5.0, and its melt flow rate at 372° C. is from 35 to 60 g/10 min., and a weight-average molecular weight/a number-average molecular weight is from 1 to 1.7. The copolymer of TFE/PVE is excellent in the mechanical properties and the injection molding properties.

Abstract: A base resistant, substantially amorphous fluoroelastomer comprising (1) 10-40 mole percent ethylene units, (2) 32-60 mole percent tetrafluoroethylene units, (3) 20-40 mole percent perfluoro ether units selected from the group consisting of perfluoro(alkyl vinyl ethers), perfluoro(alkyl alkenyl ethers) and perfluoro(alkoxy alkenyl ethers), and (4) 0.1 to 15 mole percent of a cure site monomer selected from the group consisting of i) 3,3,3-trifluoropropene-1, ii) trifluoroethylene, iii) 1,2,3,3,3-pentafluoropropylene, iv) 1,1,3,3,3-pentafluoropropylene, and v) 2,3,3,3-tetrafluoropropene. Such fluoroelastomers may be vulcanized with polyhydroxy curatives. The resulting vulcanized fluoroelastomer compositions are resistant to attack by amines, strong bases and hydrogen sulfide and possess a combination of good low temperature and high temperature properties and they are resistant to oil swell.

Abstract: Tetrafluoroethylene (TFE) thermoprocessable copolymer microspheres having a substantially spherical shape for at least 95% by weight, the average size of the microspheres being in the range 25 &mgr;m and 2 mm, the bulk density being in the range 0.5 and 1.1 g/cm3.

Abstract: The invention relates to a continuous process for the manufacture of PVDF homopolymer or copolymer. The optional comonomer comprises a vinyl group polymerized by free radicals, and comprises at least one fluorine atom, a fluoroalkyl group or a fluoroalkoxy group, directly attached to this vinyl group. The invention also relates to PVDF homopolymers made by processes of the invention. The invention further relates to a process for deoxygenating a flow.

Abstract: A method for forming a fluoropolymer comprises providing a reaction mixture comprising carbon dioxide, at least one fluoromonomer, and an initiator; and reacting the at least one fluoromonomer in the reaction mixture to form a fluoropolymer. The fluoropolymer has a multimodal molecular weight distribution.

Abstract: A process for making a vinylidene fluoride-co-trifluoroethylene networked polymer comprising the steps of: providing a poly(vinylidene fluoride-co-trifluoroethylene) copolymer; mixing the copolymer with a peroxide and a coagent to form a curing mixture; and processing the curing mixture such that the peroxide, in combination with the coagent, crosslinks the copolymer to form a networked polymer.

Abstract: A fluorocopolymer which comprises (A) polymerized units based on tetrafluoroethylene, (B) polymerized units based on ethylene and (C) polymerized units based on itaconic anhydride or citraconic anhydride, wherein the molar ratio of (A)/(B) is from 20/80 to 80/20, and the molar ratio of (C)/((A)+(B)) is from 1/10000 to 5/100, and which has a volume flow rate of from 1 to 1000 mm3/sec. The fluorocopolymer is excellent in the fuel barrier properties and in the adhesive properties to a non-fluorinated polymer.

Abstract: Described herein are monomers of the formula

Abstract: Melt-processible, thermoplastic poly(tetrafluoroethylene) (PTFE) compositions are disclosed and methods for making and processing same. Additionally, products comprising these compositions are described.

Abstract: Emulsion polymerization of liquid fluorinated monomers which have a boiling point above 50° C. and low water-solubility is markedly more efficient if the monomer is pre-emulsified with a nontelogenic fluorinated emulsifier in water.

Abstract: A fluoropolymer having a reduced amount of polar end groups. The fluoropolymer is produced by free radical polymerization of fluorinated monomers and the initiation of the polymerization is carried out in the presence of a chloride salt. Polar end groups include hydroxy groups and ionized or ionizable end groups. Examples of ionized or ionizable end groups include acid groups and salts thereof such as sulfonic acid and salts thereof, —CH2—OSO3H groups, sulfates and carbonyl containing end groups such as carboxylic and carboxylate groups. Due to the presence of chloride salt at the initiation of the free radical polymerization, CF2Cl end groups are formed instead of the polar end groups. As a result, a fluoropolymer is obtained that has improved processibility and heat resistance.

Abstract: The invention is a PVDF (polyvinylidene fluoride) homopolymer or copolymer, the comonomer being chosen from compounds containing a vinyl group capable of being opened by the action of free radicals in order to be polymerized and which contains, directly attached to this vinyl group, at least one fluorine atom, a fluoroalkyl group or a fluoroalkoxy group such that:

Abstract: To provide a suitable material having improved impermeability to liquid chemicals and cracking resistance while retaining excellent heat resistance and processability inherent in FEP-based fluororesins, a molded article of which is useful in the field of semiconductor production apparatus and the like. The present invention provides a fluorine-containing resin material comprising a fluorine-containing copolymer comprising 85 to 95.5% by mole of a repeating unit derived from tetrafluoroethylene, 5 to 10% by mole of a repeating unit derived from hexafluoropropylene and 0.

Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.

Abstract: Compounds corresponding to formula (I)