From Monomer Containing Sulfur Atom As Part Of A Heterocyclic Ring Patents (Class 526/256)
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Publication number: 20090167166Abstract: The present invention relates to compounds according to formula (1) and/or according to formulae (4) to (10) and their use in organic electroluminescent devices, in particular as a matrix material in phosphorescent devices.Type: ApplicationFiled: May 21, 2007Publication date: July 2, 2009Applicant: MERCK PATENT GMBHInventors: Ingrid Bach, Arne Buesing, Susanne Heun, Philipp Stoessel, Michael Holbach, Jonas Kroeber, Amir Hossain Parham
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Publication number: 20090171048Abstract: The present invention discloses a soluble polythiophene derivative containing highly coplanar repeating units. The coplanar characteristic of the TPT (thiophene-phenylene-thiophene) units improves the degree of intramolecular conjugation and intermolecular ?-? interaction. The polythiophene derivative exhibits good carrier mobility and is suitable for use in optoelectronic devices such as organic thin film transistors (OTFTs), organic light-emitting diodes (OLEDs), and organic solar cells (OSCs).Type: ApplicationFiled: May 30, 2008Publication date: July 2, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Shu-Hua Chan, Teng-Chih Chao, Bao-Tsan Ko, Chih-Ping Chen, Chin-Sheng Lin, Yi-Ling Chen
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Patent number: 7553881Abstract: Dental material which contains at least one compound of the formula [PG]m—R1—Z—SP—Y—R2—[WG]p, in which m=1, 2 or 3; p=1, 2 or 3; R1=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR?, CONH CONR?, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof R2=is absent, a linear or branched C1 to C20 alkylene radical which can be interrupted one or more times by O, S, NH, SiR?, CONH CONR?, COO and/or OCONH, a substituted or unsubstituted, aromatic C6 to C14 radical or a combination thereof; PG=a radically polymerizable group; SP=a polymeric spacer which is selected from polyethylene glycol, polypropylene glycol, polyglycerol, polyalkyloxazoline, polyethyleneimine, polyacrylic acid, polymethacrylic acid, polyvinyl alcohol, polyvinyl acetate, poly-(2-hydroxyethyl)acrylate, poly-(2-hydroxyethyl)methacrylate groups, hydrophilic polypeptide groups and copolymers of the corresponding monomers; WG=antimicrobType: GrantFiled: August 11, 2006Date of Patent: June 30, 2009Assignee: Ivoclar Vivadent AGInventors: Ulrich Salz, Jörg Zimmermann, Dirk Poppe, Volker Rheinberger, Jörg Tiller, Christian Waschinski
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Patent number: 7550546Abstract: A norbornene-based polymer contains at least one kind of a repeating unit represented by the following formula (I): wherein R1 and R2 each represent a hydrogen atom, an alkyl group which may possess a substituent group or an aryl group which may possess a substituent group, L and L? each represent a bivalent linking group or a single bond, and A and A? each represent an aromatic group.Type: GrantFiled: July 26, 2007Date of Patent: June 23, 2009Assignee: Fujifilm CorporationInventors: Saisuke Watanabe, Yutaka Nozoe, Seiya Sakurai, Kiyoshi Takeuchi
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Publication number: 20090156765Abstract: A composition includes a coupling agent composition and a polymer precursor. The coupling agent includes a first cycloolefin substituted with at least one anhydride group and the coupling agent is capable of bonding to a filler having a corresponding binding site. The polymer precursor includes a second cycloolefin. An associated article and a method are also provided.Type: ApplicationFiled: December 18, 2007Publication date: June 18, 2009Applicant: GENERAL ELECTRIC COMPANYInventors: Rainer Koeniger, Chad M. Denton
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Publication number: 20090140219Abstract: Monomeric, oligomeric and polymeric electrically conductive compounds and methods of making the compounds having a repeating unit having formula P1, as follows: where X is S or Se, Y is S or Se, wherein one or both of X and Y is Se, R is a substituent group capable of bonding to the ring structure. R may include hydrogen or isotopes thereof, hydroxyl, alkyl, including C1 to C20 primary, secondary or tertiary alkyl groups, arylalkyl, alkenyl, perfluoroalkyl, perfluororaryl, aryl, alkoxy, cycloalkyl, cycloalkenyl, alkanoyl, alkylthio, aryloxy, alkylthioalkyl, alkynyl, alkylaryl, arylalkyl, amido, alkylsulfinyl, alkoxyalkyl, alkylsulfonyl, aryl, arylamino, diarylamino, alkylamino, dialkylamino, arylarylamino, arylthio, heteroaryl, arylsulfinyl, alkoxycarbonyl, arylsulfonyl, carboxyl, halogen, nitro, cyano, sulfonic acid, or alkyl or phenyl substituted with one or more sulfonic acid, phosphoric acid, carboxylic acid, halo, amino, nitro, hydroxyl, cyano or epoxy moieties.Type: ApplicationFiled: January 14, 2009Publication date: June 4, 2009Applicant: AIR PRODUCTS AND CHEMICALS, INC.Inventor: Steffen Zahn
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Patent number: 7541736Abstract: A thieno[3,2-b]indole-based polymer and an organo-electroluminescent device in which the polymer is introduced into an organic layer are provided. The thieno[3,2-b]indole-based polymer may be easily prepared and has blue light-emitting characteristic. The organo-electroluminescent device adopting the organic layer using the thieno[3,2-b]indole-based polymer has improved color purity, efficiency, and luminance characteristics.Type: GrantFiled: January 19, 2005Date of Patent: June 2, 2009Assignee: Samsung Mobile Display Co., Ltd.Inventors: Byung-Hee Sohn, Hyun-Ju Lim
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Patent number: 7541131Abstract: The invention provides a resist composition for use in the production process of a semiconductor such as IC, in the production of a circuit substrate of liquid crystal, thermal head and the like or in other photofabrication processes, a compound for use in the resist composition and a pattern forming method using the resist composition, which are a resist composition comprising (A) a sulfonium salt represented by the following formula (I); and a pattern forming method using the resist composition: wherein R1 represents an alkyl group or an aryl group, R2 to R9 each independently represents a hydrogen atom or a substituent and may combine with each other to form a ring, Z represents an electron-withdrawing divalent linking group, Xn? represents an n-valent anion, n represents an integer of 1 to 3, and m represents the number of anions necessary for neutralizing the electric charge.Type: GrantFiled: February 17, 2006Date of Patent: June 2, 2009Assignee: FUJIFILM CorporationInventor: Yasutomo Kawanishi
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Patent number: 7537879Abstract: The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.Type: GrantFiled: November 22, 2004Date of Patent: May 26, 2009Assignee: AZ Electronic Materials USA Corp.Inventors: Francis M. Houlihan, Ralph R. Dammel, Andrew R. Romano, Munirathna Padmanaban, M. Dalil Rahman
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Publication number: 20090120495Abstract: Disclosed herein are an alternating copolymer of phenylene vinylene and oligoarylene vinylene, a preparation method thereof, and an organic thin film transistor including the same. The organic thin film transistor maintains low off-state leakage current and realizes a high on/off current ratio and high charge mobility because the organic active layer thereof is formed of an alternating copolymer of phenylene vinylene and oligoarylene vinylene.Type: ApplicationFiled: April 18, 2008Publication date: May 14, 2009Inventors: Jeong II Park, Kook Min Han, Sang Yoon Lee, Eun Jeong Jeong
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Publication number: 20090095343Abstract: The synthesis, characterization, optical and electrochemical properties of a regioregular copolymer, poly(3-octylthiophene-2,5-diyl-co-3-decyloxythiophene-2,5-diyl) (POT-co-DOT), and an alternating regioregular copolymer poly{(9,9-dioctylfluorene)-2,7-diyl-alt-[4,7-bis(3-decyloxythien-2-yl)-2,1,3-benzothiadiazole]-5?,5?-diyl} (PF-co-DTB) is disclosed. The incorporation of 3-alkoxythiophene units onto the conjugated backbones enhances the electron-donating property of the polymer and lowers its bandgap. The fabrication and performance of photovoltaic cells with bulk heterojunction architecture based on blends of these copolymers with PCBM are also described.Type: ApplicationFiled: September 15, 2008Publication date: April 16, 2009Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Qibing Pei, Yang Yang, Chenjun Shi
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Publication number: 20090065766Abstract: A polymer has a structure represented by: wherein each R is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each M is an optional, conjugated moiety, a represents a number that is at least 1, b represents a number from 0 to 20, n represents a number from 2 to 5000, each X is independently selected from S, Se, O, and NR?, where each R? is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each Z is independently one of an optionally substituted hydrocarbon, a hetero-containing group, and a halogen, d represents a number which is at least 1, and e represents a number from zero to 2.Type: ApplicationFiled: September 6, 2007Publication date: March 12, 2009Inventor: Yuning Li
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Publication number: 20090065770Abstract: It is an object of the present invention to provide a fused ring compound which can exhibit sufficient charge transport properties and which has excellent solubility in a solvent. The fused ring compound according to the present invention is represented by the following general formula (1), wherein R11 and R12 each independently represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, an alkoxy group, an alkylthio group, an alkylamino group, an alkoxycarbonyl group, an optionally substituted aryl group having 6 to 60 carbon atoms, an optionally substituted heterocyclic group having 4 to 60 carbon atoms, or a cyano group, provided that at least one of R11 and R12 is not a hydrogen atom; R13 and R14 each independently represent a monovalent group, and n and m each independently denote an integer of 0 to 2; and Y11 and Y12 are each independently a divalent group comprising a sulfur atom, an oxygen atom, a nitrogen atom, a selenium atom or a tellurium atom.Type: ApplicationFiled: February 2, 2007Publication date: March 12, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masahiro Miura, Tetsuya Satoh, Hiroyuki Watanabe, Masato Ueda
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Publication number: 20090069503Abstract: An object of the present invention is to provide a novel sulfur-containing cyclic olefin resin having high transparency and high refractive index and being expected to utilization to optical materials such as various plastic lenses represented by a condensing lens, prism sheets, antireflective films, transparent coating materials such as an optical fiber coating material, optical films and the like, and its production method. The present invention relates to a sulfur-containing cyclic olefin resin comprising a unit represented by the following general formula (1) and having a weight average molecular weight of from 1,000 to 1,000,000.Type: ApplicationFiled: May 15, 2006Publication date: March 12, 2009Applicant: TOSOH CORPORATIONInventors: Takashi Okada, Toshihide Yamamoto, Hiroshi Yamakawa
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Patent number: 7501457Abstract: Dental materials and associated methods are described based on multicyclic allyl sulphides with general Formula (I): in which R1 is H or a C1-C10 alkyl radical; R2 is H or a C1-C10 alkyl radical; R3 is absent or is a C1-C20 alkylene radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, a bicyclic C6-C12 radical, a C6-C14 arylene or C7-C20 alkylene arylene radical; R4 is an n-times substituted aliphatic C2 to C20 hydrocarbon radical which can be interrupted by O or S, a cycloaliphatic C4-C12 radical, an aromatic C6-C14 radical, an aliphatic-aromatic C7-C20 radical or a heterocyclic radical which can contain 4 to 20 carbon atoms and 1 to 6 heteroatoms which are selected from N, O, P and/or S atoms, or which is formed exclusively by these heteroatoms; R5 is absent or is a C1-C10 alkylene radical; X is absent or is O, S, —O—CO— or —O—CO—NH—; Y is absent or is O, S, —O—CO— or —O—CO—NH—; m is 0 or 1 and n is an integer from 3 to 6.Type: GrantFiled: July 7, 2006Date of Patent: March 10, 2009Assignee: Ivoclar Vivadent AGInventors: Jörg Angermann, Peter Burtscher, Urs Karl Fischer, Norbert Moszner, Volker M. Rheinberger
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Publication number: 20090058289Abstract: The present invention relates to triaylamines which are substituted by defined groups. These compounds can be used for producing organic electroluminescent devices.Type: ApplicationFiled: March 3, 2007Publication date: March 5, 2009Applicant: MERCK PATENT GMBHInventors: Philipp Stoessel, Holger Heil, Arne Buesing
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Patent number: 7495054Abstract: The invention features compositions comprising at least one monomer that comprises a cyclic dithiane moiety attached to a (meth)acryloyl moiety. The composition may optionally contain additional polymerizable compounds, such as ethylenically unsaturated compounds, that are typically used in dental compositions.Type: GrantFiled: September 19, 2005Date of Patent: February 24, 2009Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Ahmed S. Abuelyaman, David J. Plaut, Babu N. Gaddam
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Publication number: 20090032774Abstract: Deaggregated substituted and unsubstituted polyparaphenylenes, polyparaphenylevevinyles, polyanilines, polyazines, polythiophenes, poly-p-phenylene sulfides, polyfuranes, polypyrroles, polyselenophene, polyacetylenes formed from soluble precursors and combinations thereof and copolymers thereof and methods of fabrication are described. The deaggregated polymer molecules when subsequently doped show higher electrical conductivity. Agents such as lithium chloride, m-cresol and nonylphenol are used to deaggregate the polymer molecules. The deaggregating agents can be added prior to or during doping the molecules.Type: ApplicationFiled: August 3, 2007Publication date: February 5, 2009Inventors: Marie Angelopoulos, Bruce K. Furman
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Publication number: 20090023604Abstract: There is provided a process for removing metal from solution wherein a solution comprising a metal is contacted with a scavenger support, whereby the scavenger support binds to at least some of the metal in solution thereby decreasing the amount of metal in solution, characterised in that the scavenger support comprises a functionalised support comprising pendant groups selected from 1,3-ketoesters or 1,3-ketoamides or mixtures thereof attached to a support wherein a number of the pendant groups are reacted with an amine. Scavenger supports comprising a functionalised support comprising pendant 1,3-ketoester or 1,3-ketoamide groups of formula 1: wherein R1 is an optionally substituted hydrocarbyl, perhalogenated hydrocarbyl or heterocyclyl group; X is O or NR2, wherein the free valence of O or NR2 is bonded to a support optionally via a linker; and R2 is hydrogen, an optionally substituted hydrocarbyl, or heterocyclyl group, wherein a number of the pendant groups are reacted with an amine are also provided.Type: ApplicationFiled: June 13, 2005Publication date: January 22, 2009Inventors: David Alan Pears, Kevin Edward Treacher, Mohammed Nisar
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Publication number: 20090014920Abstract: The invention relates to polymer filaments and methods for their production. In particular, although not exclusively, the invention relates to conducting polymer filaments and their production from solutions of polymerisable oxidizable monomer units.Type: ApplicationFiled: June 24, 2005Publication date: January 15, 2009Applicant: MASSEY UNIVERSITYInventors: Warwick John Belcher, Alan Graham MacDiarmid, David Leslie Officer, Simon Berners Hall
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Publication number: 20090009061Abstract: The object of the present invention is to provide a composition for conductive materials from which a conductive layer having a high carrier transport ability can be made, a conductive material formed of the composition and having a high carrier transport ability, a conductive layer formed using the conductive material as a main material, an electronic device provided with the conductive layer and having high reliability, and electronic equipment provided with the electronic device.Type: ApplicationFiled: July 27, 2005Publication date: January 8, 2009Inventors: Yuji Shinohara, Koichi Terao, Takashi Shinohara
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Publication number: 20080299293Abstract: A solvent system for a conjugated polymer that includes at least two different solvents, at least one first solvent and at least one second solvent wherein the second solvent comprises a heterocyclic ring to improve the characteristics of materials made therefrom. Use of the solvent system to improve the electronic and/or optoelectronic characteristics of materials that include conjugated polymers, such as polythiophenes, optionally including n-acceptors, which are cast from a composition that includes the solvent system. In some embodiments the improved characteristics include higher absorption of solar radiation, increased current densities and higher power conversion efficiencies. As a result, materials made with the present solvent systems are well-suited for use in a variety of electronic devices including, photovoltaic cells, light emitting diodes, and transistors.Type: ApplicationFiled: April 30, 2008Publication date: December 4, 2008Inventors: Elena Sheina, Darin Laird, Caton Goodman
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Publication number: 20080248220Abstract: A light emitting material comprising a conjugated polymer compound (A) containing an aromatic ring in the main chain and a compound (B) showing light emission from the triplet excited state, wherein an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, calculated by a computational chemical means, is 1.3 eV or more, or an energy difference between the vacuum level and the lowest unoccupied orbital (LUMO) level in the ground state, experimentally measured, is 2.2 eV or more, in the polymer compound (A), and either the following (Condition 1) or the following (Condition 2) or both of them are satisfied.Type: ApplicationFiled: September 10, 2004Publication date: October 9, 2008Inventors: Chizu Sekine, Nobuhiko Akino, Satoshi Mikami
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Water-Soluble Fluorescent Particle Comprising Entangled Fluorescent Polymer and Amphiphilic Molecule
Publication number: 20080242806Abstract: Water-soluble fluorescent particles are formed in a simple process. A mixture comprising a solvent, water, a fluorescent polymer dissolved in the solvent, and an amphiphilic molecule is provided. The fluorescent polymer comprises a hydrophobic segment. The amphiphilic molecule comprises hydrophilic and hydrophobic segments. The solvent is removed from the mixture to allow the fluorescent polymer and the amphiphilic molecule to entangle in the presence of water, thus forming the water-soluble fluorescent particles. In the formed particles, the hydrophilic segments of the amphiphilic molecule are entangled with one another, and the hydrophobic segments of the fluorescent polymer and amphiphilic molecule are entangled with one another. The amphiphilic molecule encapsulates the fluorescent polymer and at least some of the hydrophilic segments are exposed to render the particle soluble in water.Type: ApplicationFiled: August 30, 2006Publication date: October 2, 2008Inventors: Zhikuan Chen, Xu Li -
Publication number: 20080193797Abstract: The present invention relates to compounds of the formula (1) and to the use thereof in organic electroluminescent devices. The compounds of the formula (1) are used as host material or dopant in the emitting layer and/or as hole-transport material and/or as electron-transport material.Type: ApplicationFiled: July 26, 2006Publication date: August 14, 2008Applicant: Merck Patent GmbHInventors: Holger Heil, Arne Buesing, Philipp Stoessel, Horst Vestweber, Amir Hossain Parham
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Publication number: 20080194722Abstract: The invention features dental compositions comprising at least one hybrid monomer that comprises a cyclic allylic sulfide moiety attached to a (meth)acryloyl moiety. These two functional moieties are typically joined either directly to each via a chemical bond or through some chemical structure or spacer molecule. The composition may optionally contain additional polymerizable compounds, such as ethylenically unsaturated compounds, that are typically used in dental compositions.Type: ApplicationFiled: May 9, 2006Publication date: August 14, 2008Inventors: Ahmed S. Abuelyaman, Sumita B. Mitra, Kevin M. Lewandowski, David J. Plaut
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Publication number: 20080169451Abstract: The invention relates to the synthesis of polythiophene (PAT) copolymers, and their use as conductive polymers in final applications. Specifically, copolymers of PAT with (meth)acrylates, or amides are useful as additives in blends of different polymer matrices in many commercial applications.Type: ApplicationFiled: March 3, 2006Publication date: July 17, 2008Applicant: Arkema Inc.Inventors: Gary S. Silverman, Thomas P. Mc Andrew, Scott C. Schmidt, David A. Mountz, Mark A. Aubart, Nicholas J. Rodak
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Publication number: 20080145571Abstract: A polymer compound comprising a structure of the following formula (1): (wherein, A ring and B ring each independently represent an aromatic hydrocarbon ring optionally having a substituent, and C ring represents an alicyclic hydrocarbon ring containing no condensed aromatic compound and having at least one substituent. The alicyclic hydrocarbon may contain a hetero atom).Type: ApplicationFiled: December 21, 2005Publication date: June 19, 2008Applicant: Sumitomo Chemical Company, LimitedInventors: Shigeya Kobayashi, Satoshi Kobayashi
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Publication number: 20080139767Abstract: This disclosure is generally directed to a batch process of producing semi-conductive polymer nanodispersions in which a composition comprising a liquid and a polymer is at least partially dissolved in the liquid, resulting in dissolved polymer molecules in the composition, wherein the dissolution occurs in a dissolution vessel. The solubility of the dissolved polymer molecules in the composition is then increased to increase the concentration of dissolved polymer in the composition to a range from about 0.1% to about 30% based on a total weight of the polymer and the liquid, wherein increasing the solubility of the dissolved polymer in the composition occurs in a dissolution vessel. The dissolved polymer in the composition is then diluted with a diluent, wherein the dissolution of the dissolved polymer in the composition occurs by addition of the composition to the diluent in a precipitation vessel.Type: ApplicationFiled: December 12, 2006Publication date: June 12, 2008Applicant: Xerox CorporationInventor: Alan Edward John TOTH
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Publication number: 20080139768Abstract: The novel copolymer is disclosed. The copolymer comprises 1 to 99 mol % of at least one repetitive unit (P1) of the formula (1) and 99 to 1 mol % of at least one repetitive unit (P2) of the formula (2). In the formulae, R1 to R4 and L1 to L4 respectively represent a hydrogen atom, a deuterium atom, a halogen atom or any substituent; X and Y respectively represent an oxygen atom or sulfur atom, n1 represents any one of integers from 2 to 4, and 1 and m respectively represents the number of repetition of the repetitive unit, provided that at least one of R1 to R4 is not a fluorine atom (F) and at least one of L1 to L4 contains one or more fluorine atoms, any two groups selected from L1 to L4 may form a cyclic structure.Type: ApplicationFiled: June 22, 2005Publication date: June 12, 2008Applicant: FUJIFILM CorporationInventors: Hiroki Sasaki, Hidetoshi Tomita, Hirokazu Kyoto, Kozaburo Yamada
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Publication number: 20080130111Abstract: The present invention relates to conjugated polymers and a method for their synthesis. Furthermore, the present invention relates to electro-synthesis methods for producing polymers that include the use of at least one Lewis acid and at least one proton trap to form organic conjugated polymers having elevated refractive indices. In one embodiment, the present invention relates to an organic polymer having an elevated refractive index, the organic polymer formed by a process comprising the steps of: providing a solution of unsaturated organic monomer units and at least one acidic component; impeding saturation of the unsaturated organic-monomer units by at least one protic element in the solution; and polymerizing the unsaturated organic monomer units to form a conjugated organic polymer having a refractive index of at least about 2.3 for electromagnetic energy having a wavelength of about 700 nm.Type: ApplicationFiled: August 19, 2005Publication date: June 5, 2008Inventors: Stephen Z. Cheng, Matthew J. Graham, Frank W. Harris, Shi Jin
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Patent number: 7375172Abstract: A composition suitable for use as a planarizing underlayer in a multilayer lithographic process is disclosed. The inventive composition comprises a polymer containing heterocyclic aromatic moieties. In another aspect, the composition further comprises an acid generator. In yet another aspect, the composition further comprises a crosslinker. The inventive compositions provide planarizing underlayers having outstanding optical, mechanical and etch selectivity properties. The present invention also encompasses lithographic structures containing the underlayers prepared from the compositions of the present invention, methods of making such lithographic structures, and methods of using such lithographic structures to pattern underlying material layers on a substrate.Type: GrantFiled: July 6, 2005Date of Patent: May 20, 2008Assignee: International Business Machines CorporationInventors: Wu-Song S. Huang, Karen Temple, Pushkara R. Varanasi
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Patent number: 7371505Abstract: A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line edge roughness, and a method for forming a pattern using the same, are provided, which are a photosensitive composition containing (A) a resin having a repeating unit having a specific group, whose solubility in an alkaline developer increases by the action of an acid, and a method for forming a pattern using the same.Type: GrantFiled: June 28, 2005Date of Patent: May 13, 2008Assignee: FUJIFILM CorporationInventor: Kunihiko Kodama
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Publication number: 20080107997Abstract: There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.Type: ApplicationFiled: March 15, 2005Publication date: May 8, 2008Applicant: NISSAN CHEMICAL INDUSTRIES LTD.Inventors: Yoshiomi Hiroi, Takahiro Kishioka, Kelsuke Nakayama, Rikimaru Sakamoto
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Publication number: 20080026331Abstract: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, pattern edge roughness, pattern density dependency and exposure margin.Type: ApplicationFiled: July 26, 2007Publication date: January 31, 2008Inventors: Koji HASEGAWA, Tsunehiro NISHI, Takeshi KINSHO, Seiichiro TACHIBANA
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Publication number: 20080020290Abstract: There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.Type: ApplicationFiled: June 12, 2007Publication date: January 24, 2008Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Takanobu Takeda
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Patent number: 7321012Abstract: A method of manufacturing an intrinsically conductive polymer crosslinking at least a portion of an intrinsically conductive polymer precursor in the solid state, the swollen state, or combinations comprising at least one of the foregoing states, wherein the swollen state is characterized as being one wherein the intrinsically conductive polymer precursor increases in volume upon exposure to a solvent without completely dissolving in the solvent. In another embodiment, a method of manufacturing a pattern comprises casting a film of an intrinsically conductive polymer precursor on a substrate; and crosslinking at least a portion of the film by oxidation, wherein the crosslinking occurs in the solid state, the swollen state or combinations comprising at least one of the foregoing states.Type: GrantFiled: February 26, 2004Date of Patent: January 22, 2008Assignee: The University of ConnecticutInventor: Gregory A. Sotzing
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Patent number: 7288663Abstract: The present invention relates to a process for preparing compounds of the formula (I), where n is an integer from 2 to 5, R1 is H or a C1-C20-alkyl group which may be interrupted by one or more O or S atoms, silylene, phosphonoyl or phosphoryl groups and Ar is substituted or unsubstituted 1,4-phenylene, 2,7-fluorene or 2,5-thiophene, with Ar being able to be identical or different, semiconductive layers comprising these compounds and their use in semiconductor technology.Type: GrantFiled: October 16, 2003Date of Patent: October 30, 2007Assignee: H.C. Starck GmbHInventors: Stephen Kirchmeyer, Sergei Ponomarenko
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Patent number: 7279539Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.Type: GrantFiled: June 29, 2006Date of Patent: October 9, 2007Assignee: Fujifilm CorporationInventors: Atsushi Sugasaki, Kazuto Kunita
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Patent number: 7205362Abstract: The present invention relates to a process for controlled radical polymerization using an organosulfur reversible chain transfer agent which consists in preparing polymers having a molar weight of greater than 100 000 g/mol, with a polydispersity index of less than 1.2 for molar weights of less than 200 000 g/mol and of less than 1.4 for molar weights of greater than 200 000 g/mol, with a degree of conversion of monomer of greater than 75% and a polymerization time of less than 8 h, characterized by the control of the flux of initiator radicals in the polymerization medium. The control of the flux of initiator radicals can be achieved by the use of two appropriate polymerization temperatures T1 and T2 or by use of an initiator having a decomposition rate constant which is greater than that of azobisisobutyronitrile at the same temperature.Type: GrantFiled: December 12, 2003Date of Patent: April 17, 2007Assignee: bioMérieuxInventors: Amaud Favier, Marie-Therese Charreyre
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Patent number: 7189493Abstract: There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin.Type: GrantFiled: September 21, 2004Date of Patent: March 13, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Yuji Harada, Yoshio Kawai
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Patent number: 7132149Abstract: A data storage medium includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 15×106 pounds per square inch. The data storage medium resists hazing of the reflective layer at elevated temperatures.Type: GrantFiled: August 7, 2003Date of Patent: November 7, 2006Assignee: General Electric CompanyInventors: Keith M. Borst, Robert R. Gallucci, Charles D. Iacovangelo, Donald G. LeGrand
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Patent number: 7128959Abstract: A reflective article useful, for example, in automotive headlights includes a haze-prevention layer between a heat-resistant thermoplastic substrate and a reflective metal layer. The haze-prevention layer includes a metal having a tensile modulus of at least about 15×106 pounds per square inch. The article resists hazing of the reflective layer at elevated temperatures.Type: GrantFiled: August 7, 2003Date of Patent: October 31, 2006Assignee: General Electric CompanyInventors: Keith M. Borst, Robert R. Gallucci, Charles D. Iacovangelo, Donald G. LeGrand
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Patent number: 7105620Abstract: An aqueous dispersion of a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion; a preparation process therefor; its use for coating; a printing ink containing the aqueous dispersion; an electro-conductive layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion derived from an aqueous dispersion thereof; and an antistatic layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.Type: GrantFiled: May 12, 2004Date of Patent: September 12, 2006Assignee: Agfa GevaertInventors: Bert Groenendaal, Frank Louwet
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Patent number: 7105258Abstract: There is provided a charge transport material which can easily be coated to form a film, is less likely to be crystallized during or after film formation, has excellent charge transport capability, and high applicability to electronic devices. A charge transport monomer comprising conventional CBP with a specific substituent introduced thereinto is polymerized to prepare a polymer which is brought to a charge transport material comprising this polymer.Type: GrantFiled: November 9, 2004Date of Patent: September 12, 2006Assignees: Dai Nippon Printing Co., Ltd., Takasago International CorporationInventors: Satoshi Suzuki, Masato Okada, Yoshinobu Kashibuchi, Tohru Kobayashi
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Patent number: 7083893Abstract: Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). wherein X1, X2, R1, R2, m, n, a, b and c are as defined in the description.Type: GrantFiled: November 21, 2003Date of Patent: August 1, 2006Assignee: Hynix Semiconductor Inc.Inventor: Geun Su Lee
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Patent number: 7037993Abstract: A norbornene ring-opened polymer which in the molecule has repeating units represented by the formula (1): wherein R1 represents Q, R2 represents Q or C(?O)R5, R3 represents Q or C(?O)R6, and R4 represents Q or X—C(?O)R7 (wherein Q represents hydrogen, a C1-10 hydrocarbon group, etc.; R5, R6 and R7 each represents hydroxyl, C1-10 alkoxyl, etc., provided that R6 and R7 may be bonded to each other to constitute oxygen, NH, etc.; X represents methylene, etc., provided that when R2 is Q, then R3 is C(?O)R6 and R4 is X—C(?O)R7 and that when R4 is Q, then R2 is C(?O)R5, R3 is C(?O)R6, and the configuration of R2 and R3 is trans, and m is 0 or 1), the polymer having a weight-average molecular weight as determined by gel permeation chromatography of 1,000 to 1,000,000. Also provided is a hydrogenation product of the norbornene ring-opened polymer. The norbornene ring-opened polymer and the hydrogenation product are excellent in heat resistance, electrical properties, etc.Type: GrantFiled: April 7, 2003Date of Patent: May 2, 2006Assignee: Zeon CorporationInventors: Kazunori Taguchi, Seiji Okada, Yasuo Tsunogae
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Patent number: 6995223Abstract: An aqueous dispersion of a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion; a preparation process therefor; its use for coating; a printing ink containing the aqueous dispersion; an electro-conductive layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion derived from an aqueous dispersion thereof; and an antistatic layer containing a copolymer of at least one 3,4-alkylenedioxy-thiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.Type: GrantFiled: December 17, 2002Date of Patent: February 7, 2006Assignee: Agfa-GevaertInventors: Bert Groenendaal, Frank Louwet
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Patent number: 6960398Abstract: A charge transporting material provided by the present invention comprising a compound, a molecular structure of which has at least one repeating unit represented by the following formula (1): wherein, Ar is a non-substituted or substituted arylene group having 6 or more to 60 or less carbon atoms related to a conjugated bond or a non-substituted or substituted heterocyclic group having 4 or more to 60 or less carbon atoms related to a conjugated bond, and wherein, each R may be independently selected from the group consisting of hydrogen atom, alkyl group having 1 to 20 carbon atoms, alkoxyl group having 1 to 20 carbon atoms, alkylthio group having 1 to 20 carbon atoms, alkylsilyl group having 1 to 60 carbon atoms, alkylamino group having 1 to 40 carbon atoms, aryl group having 6 to 60 carbon atoms, aryloxyl group having 6 to 60 carbon atoms, arylalkyl group having 7 to 60 carbon atoms, arylalkoxyl group having 7 to 60 carbon atoms, arylalkenyl group having 8 to 60 carbon atoms, arylamino group having 6Type: GrantFiled: January 15, 2004Date of Patent: November 1, 2005Assignee: Dai Nippon Printing Co., LtdInventors: Junji Kido, Satoshi Suzuki, Kiyoshi Itoh
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Patent number: 6927298Abstract: A 3,4-alkylenedioxythiophenedioxide compound represented by formula (I): in which: A represents a C1-5-alkylene bridge; R represents an optionally substituted C1-24-alkyl, C3-18-cycloalkyl, C1-18-alkoxy or polyethylene oxide group (optionally with at least one substituent selected from the group consisting of an alcohol, amide, ether, ester or sulphonate group) or an optionally substituted aryl group; a polymer comprising monomeric units represented by formula (I); an aqueous dispersion of a polymer comprising monomeric units corresponding to at least one compound according to formula (I) and a polyanion; a chemical polymerization process for preparing the aqueous dispersion comprising the steps of: (i) providing a solution of a polyanion; (ii) adding a compound according to formula (I) and a thiophene or pyrrole compound to the solution provided in step (i); and (iii) adding an oxidizing or reducing system to the mixture provided in step (ii); a printable paste containing the aqueous dispersion; an electType: GrantFiled: August 27, 2003Date of Patent: August 9, 2005Assignee: Agfa-GevaertInventors: Bert Groenendaal, Frank Louwet, Hieronymus Andriessen