Sulfur-containing Ring Contains Additional Hetero Atom, I.e., N, O, Se, Te Patents (Class 526/257)
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Publication number: 20130157201Abstract: A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 represents a sulfur atom or an oxygen atom, R2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.Type: ApplicationFiled: November 16, 2012Publication date: June 20, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventor: TOKYO OHKA KOGYO CO., LTD.
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Publication number: 20130143055Abstract: The present invention is directed to phenothiazine-base macromonomer compounds and methods of making the same.Type: ApplicationFiled: September 23, 2011Publication date: June 6, 2013Applicant: BAYER HEALTHCARE LLCInventors: Jiangfeng Fei, Henry Arndt, Steven Fowler
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Publication number: 20130137842Abstract: An organic semiconductor compound may be represented by the above Chemical Formula 1 or Chemical Formula 2, and an organic thin film may include the organic semiconductor compound according to Chemical Formula 1 or 2.Type: ApplicationFiled: May 23, 2012Publication date: May 30, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Bang Lin Lee, Jeong il Park, Jong Won Chung
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Publication number: 20130137049Abstract: A method of producing a polymeric compound, including: copolymerizing a monomer containing an —SO2— containing cyclic group with a monomer containing an acid decomposable group which exhibits increased polarity by the action of acid, thereby obtaining the polymeric compound, provided that the polymeric compound comprises no structural unit derived from a monomer that generates acid upon exposure, wherein the copolymerizing is conducted in the presence of 0.001 to 1.0 mol % of a basic compound, based on the monomer containing an —SO2— containing cyclic group.Type: ApplicationFiled: November 21, 2012Publication date: May 30, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventor: Tokyo Ohka Kogyo Co., Ltd.
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Patent number: 8440385Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under the action of acid and generates acid upon exposure, the base component (A?) including a resin component (A1) having a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) which generates acid upon exposure and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group (wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof).Type: GrantFiled: December 27, 2010Date of Patent: May 14, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Masatoshi Arai
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Publication number: 20130115554Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R1 represents a sulfur atom or an oxygen atom; R2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.Type: ApplicationFiled: November 6, 2012Publication date: May 9, 2013Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventor: Tokyo Ohka Kogyo Co., Ltd.
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Publication number: 20130092912Abstract: The present invention provides, among other things, a copolymer comprising at least one donor monomer and at least one acceptor monomer. The polymer may optionally further comprise at least one additional comonomer. The polymers are useful as a charge-transport, semiconducting, electrochemical conducting, photoconducting, or light emitting material. Microelectronic devices comprising such polymers (e.g., as a heterojunction therein) are also described.Type: ApplicationFiled: June 8, 2011Publication date: April 18, 2013Inventor: Wei You
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Publication number: 20130095424Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.Type: ApplicationFiled: October 9, 2012Publication date: April 18, 2013Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventor: SUMITOMO CHEMICAL COMPANY, LIMITED
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Patent number: 8383735Abstract: A pre-cursor block copolymer for sulfonation which, prior to hydrogenation, has the general configuration A-B-A, A-B-A-B-A, (A-B-A)nX, (A-B)nX, A-D-B-D-A, A-B-D-B-A, (A-D-B)nX, (A-B-D)nX or mixtures thereof, wherein A, B and D blocks do not contain any significant levels of olefinic unsaturation. Each A and D block is a polymer block resistant to sulfonation, and each B block is a polymer block susceptible to sulfonation. Each A block is a segment of one or more polymerized para-substituted styrene monomers, each B block contains segments of one or more vinyl aromatic monomers selected from polymerized (i) unsubstituted styrene monomers, (ii) ortho-substituted styrene monomers, (iii) meta-substituted styrene monomers, (iv) alpha-methylstyrene, (v) 1,1-diphenylethylene, (vi) 1,2-diphenylethylene and (vii) mixtures thereof, and each D block contains polymers having a glass transition temperature less than 20° C. and a number average molecular weight of between 1,000 and 50,000.Type: GrantFiled: April 20, 2010Date of Patent: February 26, 2013Assignee: Kraton Polymers US LLCInventors: Carl Lesley Willis, Dale Lee Handlin, Jr., Scott Russell Trenor, Brian Douglas Mather
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Publication number: 20130045443Abstract: A polymer comprising: an anion part which generates acid upon exposure on at least one terminal of the main chain; and a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid, wherein the structural unit (a1) comprises two types of structural units, and a difference in an activation energy of the acid decomposable groups within the two types of structural units is at least 3.0 kJ/mol.Type: ApplicationFiled: August 6, 2012Publication date: February 21, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshiyuki Utsumi, Takahiro Dazai
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Publication number: 20130041123Abstract: Nitrogen-containing fused ring compound having at least one structural unit selected from the group consisting of a structural unit represented by the formula (1-1) and a structural unit represented by the formula (1-2).Type: ApplicationFiled: March 3, 2011Publication date: February 14, 2013Applicants: OSAKA UNIVERSITY, SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yutaka Ie, Masashi Ueta, Yoshio Aso, Masato Ueda
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Patent number: 8372315Abstract: A donor-acceptor (DA) ?-conjugated polymer with high charge transfer mobility has a plurality of D1kAD1k portions, where k is 1 or 2, D1 is a donor unit having at least one solubilizing side chain, and A is an acceptor unit, and the donor-acceptor (DA) ?-conjugated polymer has a plurality of D2m spacer sequences situated between the D1kAD1k portions, where m is 1 to 6 and D2 is a second donor unit where all atoms of the unit are coplanar in at least one conformation that the unit can assume. The DA ?-conjugated polymer can reflect a blue tinted green, deep green, or yellow tinted green color. The DA ?-conjugated polymers have space-charge limited (SCL) zero field hole mobilities of at least 1×10?6 cm2V?1s?1.Type: GrantFiled: May 26, 2010Date of Patent: February 12, 2013Assignee: University of Florida Research Foundation, Inc.Inventors: Pierre Marc Beaujuge, John R. Reynolds, Stefan Martin Ellinger
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Patent number: 8361636Abstract: A luminescent polymer comprising a triarylene repeat unit which comprises a triarylene of general formula (I) which is substituted or unsubstituted and an arylene repeat unit -[-Ar-]- that is different from the triarylene repeat unit wherein X, Y, and Z are each independently O, S, CR2, SiR2 or NR and each R is independently alkyl, aryl or H.Type: GrantFiled: October 15, 2007Date of Patent: January 29, 2013Assignee: Cambridge Display Technology LimitedInventors: Carl Towns, Richard O'Dell
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Patent number: 8362169Abstract: Provided are 1) a polymer which is excellent in a reactivity to acid and a heat stability and which is less swollen in developing, 2) a compound shown below which is a raw material for the above polymer and 3) a photoresist composition which contains the above polymer and which is improved in LWR and excellent in a heat resistance. (wherein n represents an integer of 0 to 2; R1 represents a hydrogen atom, methyl or the like; R2 to R10 each represent independently a hydrogen atom, a linear alkyl group, a branched alkyl group or the like; and A and B each represent independently an oxygen atom or a sulfur atom).Type: GrantFiled: February 20, 2009Date of Patent: January 29, 2013Assignee: Kuraray Co., Ltd.Inventors: Osamu Nakayama, Takashi Fukumoto
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Publication number: 20130022911Abstract: A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO2-containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO2NH2 and —CONH2 and a structural unit (a5) which generates acid upon exposure.Type: ApplicationFiled: July 18, 2012Publication date: January 24, 2013Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Yoshiyuki Utsumi, Takahiro Dazai
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Publication number: 20130012648Abstract: The invention provides a colored composition including a dye multimer having an alkali-soluble group as a dye, the dye multimer having a weight-average molecular weight (Mw) of from 5,000 to 20,000 and a dispersity (weight-average molecular weight (Mw)/number-average molecular weight (Mn)) of from 1.00 to 2.50.Type: ApplicationFiled: March 30, 2011Publication date: January 10, 2013Applicant: FUJIFILM CORPORATIONInventors: Yoshihiko Fujie, Masaru Yoshikawa, Shinichi Kanna, Kenta Ushijima
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Publication number: 20120329969Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.Type: ApplicationFiled: July 2, 2012Publication date: December 27, 2012Inventors: Tasuku MATSUMIYA, Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai, Kotaro Endo
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Publication number: 20120319052Abstract: The present invention relates to compounds of the formula (1) or (2) and to the use thereof in electronic devices, and to electronic devices which comprise these compounds. The invention furthermore relates to the preparation of the compounds of the formula (1) or (2) and to formulations comprising one or more compounds of the formula (1) or (2).Type: ApplicationFiled: January 21, 2011Publication date: December 20, 2012Applicant: Merck Patent GmbHInventors: Constanze Brocke, Christof Pflumm, Amir Hossain Parham, Rocco Fortte
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Patent number: 8329378Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid, and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) having an aromatic group, a structural unit (a5) represented by general formula (a5-1) shown below, and a structural unit (a1) containing an acid-dissociable, dissolution-inhibiting group. In the formula (a5-1), R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof.Type: GrantFiled: March 10, 2010Date of Patent: December 11, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono, Takahiro Dazai
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Publication number: 20120308928Abstract: A resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1)) containing an acid decomposable group that exhibits increased polarity under action of acid, and the amount of the structural unit (a0) is less than 50 mol %, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a divalent linking group; R2 represents a —SO2— containing cyclic group; and v represents 0 or 1.Type: ApplicationFiled: May 22, 2012Publication date: December 6, 2012Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki, Junichi Tsuchiya
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Publication number: 20120305082Abstract: The present invention relates to a pyrene-containing conductive polymer represented by formula 1 and an organic solar cell comprising the same as an organic photovoltaic material. The conductive polymer has improved hole mobility as a result of introducing a specific amount of pyrene either into a polymer, which consists only of a donor functional group comprising one or more aromatic monomers, or into a donor-acceptor type polymer comprising a repeating acceptor introduced into a donor functional group. Thus, the conductive polymer can be used as an organic photovoltaic material in organic photodiodes (OPDs), organic light-emitting diodes (OLEDs), organic thin-film transistors (OTFTs), organic solar cells and the like. In addition, an organic solar cell showing high power conversion efficiency (PCE) can be provided using an organic photovoltaic material comprising the pyrene-containing conductive polymer as an electron donor.Type: ApplicationFiled: October 13, 2010Publication date: December 6, 2012Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGYInventors: Sang Jin Moon, Jong Cheol Lee, Won Wook So, Won Suk Shin, Sang Kyu Lee, Sung Cheol Yoon, Dohoon Hwang, Chang Jin Lee
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Publication number: 20120305899Abstract: An object of the present invention is to provide a polymer compound providing high charge mobility. The polymer compound of the present invention has a repeating unit represented by the formula (1): wherein Ar1 and Ar2 are each an aromatic hydrocarbon ring, a heterocycle, or a fused ring of an aromatic hydrocarbon ring and a heterocycle; and R1, R2, R3 and R4 each represent a hydrogen atom, an alkyl group, an alkoxy group, an alkylthio group, an aryl group, an aryloxy group, an arylthio group, an arylalkyl group, an arylalkoxy group, an arylalkylthio group, a substituted silyl group, an unsubstituted or substituted carboxyl group, a monovalent heterocyclic group, a cyano group or a fluorine atom.Type: ApplicationFiled: December 22, 2010Publication date: December 6, 2012Applicants: NATIONAL UNIVERSITY OF CORPORATION HIROSHIMA UNIVERSITY, SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Kazuo Taki, Itaru Osaka, Kenji Kohiro, Kenichiro Ohya, Kunihito Miyake
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Publication number: 20120302712Abstract: Disclosed are a benzobis(thiadiazole)-based alternating copolymer, a method for preparing the same, and an organic electronic device including the same. The present disclosure provides a benzobis(thiadiazole)-based alternating copolymer represented by the chemical formula 1: wherein R1, R2 or R3 is hydrogen or C1-C20 linear, branched or cyclic alkyl, X is S, O, NR4, PR5, or HC?CH, wherein R4 or R5 is C1-C20 linear, branched or cyclic alkyl, Y is C, Si or N (in this case only one of R2 and R3 exists), and m is an integer from 1 to 3.Type: ApplicationFiled: November 14, 2011Publication date: November 29, 2012Applicants: HANNAM University Institute for Industry-Academia Cooperation, IUCF-HYU (Industry-University Cooperation Foundation Hanyang University)Inventors: Jea Gun Park, Kwang-sup Lee, Tae-dong Kim, Heong Sub Oh
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Publication number: 20120283377Abstract: Materials for organic electronic devices including organic photovoltaic devices. An oligomer or polymer comprising: wherein R1, R2, R3, and R4 are independently hydrogen or solubilizing groups. Monomers and ink compositions can be also prepared. The materials can be used in an OPV active layer and show excellent absorption properties with bathochromic shift.Type: ApplicationFiled: October 25, 2011Publication date: November 8, 2012Inventor: Christophe René Gaston GRENIER
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Publication number: 20120264052Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).Type: ApplicationFiled: April 6, 2012Publication date: October 18, 2012Applicant: TOKYO OHKA KOGYO CO., LTDInventors: Makiko Irie, Tomoyuki Hirano, Daichi Takaki
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Publication number: 20120232237Abstract: Compounds of Formula (I): (formula (I)) where: X1 and X2 are the same or different and each is independently Cl, Br, I, a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group; and, Y is O, S, Se, NR1, R1C—CR2 or R1C?CR2, wherein R1 and R2 are the same or different and are each independently H or an organic group, are useful as monomers to produce oligomers or polymers that are useful in organic electronic devices.Type: ApplicationFiled: November 3, 2010Publication date: September 13, 2012Inventors: Zhao Li, Jianfu Ding, Jianping Lu, Ye Tao
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Publication number: 20120219812Abstract: A helical-polyacetylene whose main chain has a helical structure includes a carbon double bond constituting the main chain and a side chain composed of an aromatic five- or six-membered ring that binds to one carbon atom of the carbon double bond. In the atoms constituting the five- or six-membered ring, two atoms binding to the atom that directly binds to the carbon atom of the main chain bind only any of five or six atoms constituting the five- or six-membered ring, and in the atoms constituting the five- or six-membered ring, at least one atom located most distant from the atom that directly binds to the carbon atom of the main chain is carbon.Type: ApplicationFiled: February 24, 2012Publication date: August 30, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Kunihiro Mitsutake, Takeyuki Sone, Koji Yano
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Publication number: 20120217448Abstract: The present invention provides a macromolecular compound by which the short-circuit current density and the photoelectric conversion efficiency are enhanced when the macromolecular compound is used in an organic layer contained in a photovoltaic cell. Specifically, the present invention provides a macromolecular compound having a structural unit represented by Formula (1): wherein Ar1 and Ar2 are the same as or different from each other and represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group; X1 and X2 are the same as or different from each other and represent —O—, —S—, —C(?O)—, —S(?O)—, —SO2—, —C(R50)(R51)—, —Si (R3)(R4)—, —N(R5)—, —B(R6)—, —P(R7)—, or —P(?O)(R8)—; wherein the macromolecular compound has a light absorbing terminal wavelength of 700 nm or more.Type: ApplicationFiled: October 29, 2010Publication date: August 30, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ken Yoshimura, Kenichiro Ohya
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Patent number: 8246990Abstract: The present invention relates to new hydrogel materials using water gellants that are comprised by hydrophilic polymers to which hydrogen bonding units are covalently attached. Optionally, the hydrogel contains additional ingredients or additives. These new reversible hydrogels can easily be fine-tuned in their mechanical performance and functionality and are especially suitable for cosmetic and biomedical applications.Type: GrantFiled: May 3, 2006Date of Patent: August 21, 2012Assignee: Suprapolix B.V.Inventors: Gaby Maria Leonarda Hoorne-Van Gemert, Henricus Marie Janssen, Egbert Willem Meijer, Anton Willem Bosman
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Publication number: 20120202151Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) (R2 represents a divalent linking group, and R3 represents a cyclic group containing —SO2— within the ring skeleton thereof) and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.Type: ApplicationFiled: April 24, 2012Publication date: August 9, 2012Inventors: Takahiro Dazai, Tomoyuki Hirano, Daiju Shiono, Tasuku Matsumiya
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Patent number: 8232041Abstract: A polymeric compound (A1) includes a structural unit (a0-1) represented by general formula (a0-1), a structural unit (a0-2) represented by general formula (a0-2), and a structural unit (a1-0-1) represented by general formula (a1-0-1), wherein relative to the combined total of all the structural units, the proportion of the structural unit (a0-1) is from 10 to 40 mol %, the proportion of the structural unit (a0-2) is from 5 to 20 mol %, and the proportion of the structural unit (a1-0-1) is from 10 to 55 mol %. [In the formulas, each of R1 and R independently represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms, or a halogenated alkyl group of 1 to 5 carbon atoms, R2, A and B each represents a divalent linking group, R3 represents a cyclic group containing —SO2— within the ring skeleton thereof, and R4 and X1 each represents an acid-dissociable, dissolution-inhibiting group.Type: GrantFiled: January 26, 2010Date of Patent: July 31, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Dazai, Tomoyuki Hirano, Tasuku Matsumiya, Daiju Shiono
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Patent number: 8227170Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(?O)—, —C(?O)—O—, a carbonate linkage (—O—C(?O)—O—), —S—, —S(?O)2—, —S(?O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(?O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).Type: GrantFiled: January 11, 2010Date of Patent: July 24, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori, Junichi Tsuchiya
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Publication number: 20120178021Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10?X10-A11?sX11-A12-??(a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.Type: ApplicationFiled: January 9, 2012Publication date: July 12, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hyungjoo KIM, Akira KAMABUCHI, Koji ICHIKAWA
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Publication number: 20120168727Abstract: An organic semiconductor compound including a structural unit represented by Chemical Formula 1.Type: ApplicationFiled: August 17, 2011Publication date: July 5, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Bang Lin Lee, Jeong il Park, Jong Won Chung
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Publication number: 20120168729Abstract: An example embodiment relates to an organic semiconductor compound, represented by Chemical Formula 1 herein, which may be polymerized and used in transistors and electronic devices. The organic semiconductor compound includes a base structure of four fused benzene rings with functional groups R1 to R3 connected to a first benzene ring and with functional groups R4 to R6 connected to a second benzene ring. The base structure's third and fourth benzene rings are connected to X1, X2 and X3, X4 respectfully. At least one of X1 and X2 is a sulfur atom. At least one of X3 and X4 is a sulfur atom. The base structure further includes functional groups R7 and R8.Type: ApplicationFiled: January 12, 2012Publication date: July 5, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jeong-il Park, Bang Lin Lee, Jong Won Chung
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Publication number: 20120138865Abstract: The invention relates to novel phenanthro[1,10,9,8-c,d,e,f,g]carbazole polymers, methods and materials for their preparation, their use as semiconductors in organic electronic (OE) devices, and to OE devices comprising these polymers.Type: ApplicationFiled: July 14, 2010Publication date: June 7, 2012Applicant: Merck Patent Gesellschaft Mit Beschrankter HaftungInventors: Nicolas Blouin, William Mitchell, Changsheng Wang, Steven Tierney
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Publication number: 20120135349Abstract: A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.Type: ApplicationFiled: November 21, 2011Publication date: May 31, 2012Applicant: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Koji Hasegawa
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Publication number: 20120122034Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.Type: ApplicationFiled: November 7, 2011Publication date: May 17, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Masahiko SHIMADA, Takashi NISHIMURA, Akira KAMABUCHI, Hyungjoo KIM, Mitsuyoshi OCHIAI
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Publication number: 20120115082Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.Type: ApplicationFiled: November 7, 2011Publication date: May 10, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Masahiko SHIMADA, Takashi NISHIMURA
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Patent number: 8154016Abstract: Disclosed herein is a composition containing hetero arylene or arylene showing a p-type semiconductor property in addition to thiophene showing a p-type semiconductor property and thiazole rings showing a n-type semiconductor property at a polymer main chain, an organic semiconductor polymer containing the composition, an organic active layer containing the organic semiconductor polymer, an organic thin film transistor (OTFT) containing the organic active layer, an electronic device containing the OTFT, and a method of preparing the same. The composition of example embodiments, which is used in an organic semiconductor polymer and contains thiazole rings, may exhibit increased solubility to an organic solvent, coplanarity, processability and an improved thin film property.Type: GrantFiled: May 9, 2011Date of Patent: April 10, 2012Assignee: Samsung Electronics Co., Ltd.Inventors: Bang Lin Lee, Eun Kyung Lee, Joo Young Kim, Kook Min Han
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Patent number: 8148484Abstract: Norbornene-based biocidal polymers having primary, secondary or tertiary amine or phosphine end groups, the parent monomers, processes for preparing the monomers and polymers, and their use.Type: GrantFiled: October 16, 2006Date of Patent: April 3, 2012Assignee: KE Kelit Kunststoffwerk GesmbHInventors: Xaver Norbert Gstrein, Wolfgang Kern, Karl Rametsteiner, Gerhard Seyfriedsberger, Franz Stelzer
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Publication number: 20120061630Abstract: A donor-acceptor (DA) ?-conjugated polymer with high charge transfer mobility has a plurality of D1kAD1k portions, where k is 1 or 2, D1 is a donor unit having at least one solubilizing side chain, and A is an acceptor unit, and the donor-acceptor (DA) ?-conjugated polymer has a plurality of D2m spacer sequences situated between the D1xAD1x portions, where m is 1 to 6 and D2 is a second donor unit where all atoms of the unit are coplanar in at least one conformation that the unit can assume. The DA ?-conjugated polymer can reflect a blue tinted green, deep green, or yellow tinted green color. The DA ?-conjugated polymers have space-charge limited (SCL) zero field hole mobilities of at least 1×10?6 cm2V?1s?1.Type: ApplicationFiled: May 26, 2010Publication date: March 15, 2012Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.Inventors: Pierre Marc Beaujuge, John R. Reynolds, Stefan Martin Ellinger
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Publication number: 20120041165Abstract: This invention relates to coloured polymer particles preferably with surface functionality for charge retention, a process for their preparation, the use of these particles for the preparation of an electrophoretic device, colour electrophoretic displays comprising such particle, and new water-soluble dyes.Type: ApplicationFiled: January 29, 2010Publication date: February 16, 2012Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRAENKTER HAFTUNGInventors: Nils Greinert, Louise Diane Farrand, Mark James, Ashley Nathan Smith, Mark John Goulding, Daniel Walker, Safyan Khan, Paul Reynolds, Susan Hawkins, Roy Hughes
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Patent number: 8105749Abstract: There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R? each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).Type: GrantFiled: June 11, 2010Date of Patent: January 31, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takahiro Dazai, Takayoshi Mori, Hiroaki Shimizu, Kyoko Ohshita
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CURABLE RESIN COMPOSITION FOR CEMENTED LENS, IMAGING LENS, AND METHOD FOR MANUFACTURING IMAGING LENS
Publication number: 20120019938Abstract: A curable resin composition for a cemented lens capable of manufacturing a cemented lens excellent in heat resistance in reflowing treatment at a temperature of 260° C. or higher and adhesion between lenses, and capable of reducing manufacturing costs of lenses and capable of lightening lenses, is provided. The curable resin composition for a cemented lens includes: (a) a compound represented by the following formula (I); and (b) a radical polymerization initiator. wherein R1 represents a hydrogen atom or an alkyl group; and Z1 represents a cyclic structure together with two carbon atoms and a sulfur atom.Type: ApplicationFiled: March 9, 2010Publication date: January 26, 2012Applicant: Fujifilm CorporationInventor: Satoru Yamada -
Publication number: 20120018715Abstract: The present invention relates to a 2,7-carbazole-containing polymer represented by formula 1 and an organic photovoltaic device comprising the conductive polymer as a photoelectric conversion material. The conductive polymer has high photon absorption efficiency and improved hole mobility and is prepared by introducing a specific amount of a carbazole compound either into a polymer, consisting only of a donor functional group containing one or more aromatic monomers, or into a donor-acceptor type polymer comprising a repeating acceptor group introduced into a donor functional group. The conductive polymer can be used as a photoelectric conversion material for organic thin film transistors (OTFTs) or organic light-emitting diodes (OLEDs). Furthermore, the invention provides an organic photovoltaic device comprising the carbazole-containing conductive polymer as an electron donor, and thus can achieve high photoelectric conversion efficiency in organic thin film solar cells.Type: ApplicationFiled: March 31, 2010Publication date: January 26, 2012Applicant: KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGYInventors: Sang Jin Moon, Won Suk Shin, Won Wook So, Hye Young Lee, Kyu Nam Kim, Sung Cheol Yoon, Chang Jin Lee
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Publication number: 20120009519Abstract: The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more —CH2— in the C2-C36 heterocyclic group can be replaced by —CO— or —O—, R2 is independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.Type: ApplicationFiled: July 1, 2011Publication date: January 12, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hyungjoo KIM, Akira KAMABUCHI, Yuichi MUKAI
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Publication number: 20110318690Abstract: The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, A1 represents a single bond or *—(CH2)m—CO—O— in which m represents an integer of 1 to 4 and * represents a binding position to —O—, B1 represents —O— or —S—, B2 represents —CH2—, —O— or —S— and W1 represents an optionally substituted aromatic ring, a resin comprising a structural unit derived from the compound and a photoresist composition comprising the resin.Type: ApplicationFiled: June 24, 2011Publication date: December 29, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yuko YAMASHITA, Hyungjoo KIM
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Publication number: 20110306742Abstract: This invention relates to coloured polymer particles preferably with surface functionality for charge retention, a process for their preparation, the use of these particles for the preparation of an electrophoretic device, colour electrophoretic displays comprising such particle, and new water-soluble dyes.Type: ApplicationFiled: January 29, 2010Publication date: December 15, 2011Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNGInventors: Louise Diane Farrand, Mark James, Matthias Koch, Ashley Nathan Smith, Jonathan Henry Wilson, Mark John Goulding, Daniel Walker
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Publication number: 20110290324Abstract: Photovoltaic cells with thiazole-containing polymers, as well as related components, systems, and methods, are disclosed.Type: ApplicationFiled: July 26, 2011Publication date: December 1, 2011Applicant: Konarka Technologies, Inc.Inventors: Russell Gaudiana, Richard Kingsborough, Xiaobo Shi, David Waller, Zhengguo Zhu