Interpolymerized With Hydrocarbon Monomer Patents (Class 526/272)
  • Publication number: 20100255228
    Abstract: An additive composition for imparting caustic removability to a hot melt adhesive comprises a low molecular weight ?,? ethylenically unsaturated anhydride-containing or acid-containing polymer. The polymer is selected from the group consisting of a low molecular weight carboxylic anhydride homo-polymer or the at least partial ester thereof, a low molecular weight carboxylic anhydride copolymer or the at least partial ester thereof, a low molecular weight carboxylic anhydride polyolefin, a low molecular weight carboxylic anhydride vinyl aromatic copolymer, and a low molecular weight carboxylic anhydride grafted copolymer, or the combination or mixtures thereof. A caustic removable hot melt adhesive composition comprises a hot melt adhesive additive and a conventional hot melt adhesive resin. A caustic removable adhesive label comprises a substrate and a caustic removable hot melt adhesive composition which includes an additive composition.
    Type: Application
    Filed: April 5, 2010
    Publication date: October 7, 2010
    Applicant: CRAY VALLEY TECHNOLOGY USA, LLC
    Inventors: WILLIAM R. DOUGHERTY, Alan J. Pape, Nestor P. Hansen, W. Paul Boggs, Charles C. Mateer
  • Publication number: 20100233100
    Abstract: An amphiphilic polymeric material which has a straight or branched chain polymer backbone and a multiplicity of side chains attached to the backbone, wherein the backbone is a copolymer of at least one ethylenically-unsaturated aliphatic hydrocarbon monomer and maleic anhydride, or is a terpolymer of maleic anhydride, ethylene, and a further ethylenically unsaturated monomer. A method of synthesising said polymeric material is also provided, together with chewing gum bases, compositions and emulsions comprising amphiphilic polymeric materials.
    Type: Application
    Filed: November 26, 2008
    Publication date: September 16, 2010
    Applicant: REVOLYMER LIMITED
    Inventors: Thomas Charles Castle, Roger B. Pettman, Terence Cosgrove
  • Patent number: 7790822
    Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: September 7, 2010
    Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
  • Publication number: 20100197872
    Abstract: The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated organic acid monomer having one or more double bonds, and a method of manufacturing the same.
    Type: Application
    Filed: March 28, 2008
    Publication date: August 5, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Byoung-Ho Jeon, Yoo-Young Jung, Ki-Su Ro, Kyung-Seop Noh, Bae-Kun Shin
  • Patent number: 7745561
    Abstract: The invention provides alternatives to traditional polycondensation processes for preparing copolymers. For example, in certain embodiments, the invention provides a process that includes an extrusion step and a solid state polymerization step to prepare high molecular weight block copolymer with a “hard block” contributed by a macrocyclic polyester oligomer (MPO) and a “soft block” contributed by a dihydroxyl-functionalized polymer, an oligoether, and/or a dimerized fatty acid (i.e. a polyol). The invention also provides new copolymer compositions made possible by the new processes—for example, copolymers of higher molecular weight, copolymers with higher weight ratio of soft block units to hard block units, copolymers made with higher molecular weight polyol, and copolymers with hard block units that are themselves random copolyesters of units contributed by a MPO and a cyclic ester.
    Type: Grant
    Filed: January 31, 2006
    Date of Patent: June 29, 2010
    Assignee: Cyclics Corporation
    Inventors: Steven R. Bahr, James Pawlson
  • Patent number: 7737249
    Abstract: The present invention relates to the formation of low volatile anhydride-containing aromatic vinyl polymers by polymerizing the half ester of the anhydride with a vinyl aromatic monomer followed by devolatilizing the half-ester and reforming the anhydride at elevated temperatures and reduced pressures.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: June 15, 2010
    Assignee: Cartilast Corporation
    Inventor: Eugene R. Moore
  • Publication number: 20100130706
    Abstract: The present invention provides a copolymer that includes at least one alkene monomer, at least one acrylate monomer and at least one the unsaturated acid anhydride monomer, and a method of preparing the same.
    Type: Application
    Filed: May 15, 2008
    Publication date: May 27, 2010
    Inventors: Byoung-Ho Jeon, Yoo-Young Jung, Ki-Su Ro, Kyung-Seop Noh, Bae-Kun Shin
  • Publication number: 20100098649
    Abstract: The present invention relates to the field of perfumery. More particularly, it concerns co-polymers, derived from a maleic anhydride derivative and a ethylenic derivative, comprising at least one ?-oxy or ?-thio carbonyl moiety capable of liberating an active molecule such as, for example, an ?,?-unsaturated ketone, aldehyde or carboxylic ester. The present invention concerns also the use of polymers or co-polymers in perfumery as well as the perfuming compositions or perfumed articles comprising the invention's compounds.
    Type: Application
    Filed: October 5, 2007
    Publication date: April 22, 2010
    Inventors: Damien Berthier, Andreas Herrmann
  • Publication number: 20100063231
    Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.
    Type: Application
    Filed: July 15, 2009
    Publication date: March 11, 2010
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
  • Publication number: 20090324835
    Abstract: Polymers comprising monomers having 2-cyano-3,3-diphenyl-prop-2-enoic acid moieties having the formula are disclosed. Compositions comprising said polymers and methods for increasing the UV-absorbing, water resistance, and photostabilizing properties of compositions comprising such polymers also are disclosed.
    Type: Application
    Filed: June 27, 2008
    Publication date: December 31, 2009
    Inventors: Craig A. Bonda, Anna Pavlovic, Jean Zhang
  • Publication number: 20090318649
    Abstract: The present invention discloses styrene-maleic anhydride copolymers preparations using solventless techniques. The solventless method resulted in reduced amounts of residues, such as unreacted styrene and/or maleic anhydride monomers, which makes the copolymers particularly suitable for bioapplications.
    Type: Application
    Filed: March 26, 2009
    Publication date: December 24, 2009
    Inventors: Mircea Dan Bucevschi, Monica Colt
  • Publication number: 20090305923
    Abstract: An interpolymer composition comprising monomer-derived units of (i) at least one of an aliphatic olefin containing from 2 to 30 carbon atoms and a vinyl aromatic monomer, and (ii) at least one alpha, beta-unsaturated acylating agent; wherein a portion of said acylating agent monomers is esterified and wherein a portion of said acylating agent monomers is condensed with at least one aromatic amine, provides good viscosity modification and dispersancy performance.
    Type: Application
    Filed: April 18, 2005
    Publication date: December 10, 2009
    Applicant: THE LUBRIZOL CORPORATION
    Inventors: Daniel C. Visger, David Price, Leonard E. Orzech, Patrick E. Mosier, Suzanne M. Patterson, Calvin A. James, Barton J. Schober, Christopher Friend, Michael J. Covitch, John K. Pudelski, Renee A. Eveland, Matthew D. Gieselman
  • Publication number: 20090292092
    Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.
    Type: Application
    Filed: July 15, 2009
    Publication date: November 26, 2009
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
  • Patent number: 7579420
    Abstract: A hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A process to prepare the hyperbranched polymer comprises contacting maleic anhydride with at least one terminally unsaturated acyclic aliphatic diene having at least 7 carbon atoms in the presence of an effective amount of a radical initiator in an aprotic solvent under dilute conditions.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: August 25, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
  • Patent number: 7579403
    Abstract: Stain resistant composition comprises a hyperbranched polymer having pendent olefinic groups and comprising polymer units derived from one or more terminally-unsaturated, acyclic aliphatic diene and polymer units derived from maleic anhydride. Optionally, the hyperbranched polymer may further comprise polymer units derived from one or more 1-alkenes and/or a chain transfer agent. A method to provide stain resistance to a substrate comprises applying the stain resistant composition to said substrate. Suitable substrates include textiles and hard surfaces.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: August 25, 2009
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Stephen Ernest Jacobson, Patricia Metzger Cotts
  • Publication number: 20090156765
    Abstract: A composition includes a coupling agent composition and a polymer precursor. The coupling agent includes a first cycloolefin substituted with at least one anhydride group and the coupling agent is capable of bonding to a filler having a corresponding binding site. The polymer precursor includes a second cycloolefin. An associated article and a method are also provided.
    Type: Application
    Filed: December 18, 2007
    Publication date: June 18, 2009
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Rainer Koeniger, Chad M. Denton
  • Patent number: 7547753
    Abstract: The invention relates to copolymers made from monoethylenically unsaturated monomers with acid groups and a further hydrophobic monomer component for the prevention of inorganic and organic deposits in water supply systems. The invention further relates to a method for production of the above.
    Type: Grant
    Filed: June 14, 2003
    Date of Patent: June 16, 2009
    Assignee: Ashland Licensing and Intellectual Property LLC
    Inventors: Joerg Issberner, Rainer Poeschmann, Christian Flocken
  • Publication number: 20090148777
    Abstract: A room temperature crosslinkable polymer system comprising an anhydride containing polymer and an oxyalkylene amine and a polymer electrolyte derived therefrom are prepared and employed as ion conducting materials for batteries such as lithium ion battery, solar cells and electrochromic devices is disclosed.
    Type: Application
    Filed: December 4, 2008
    Publication date: June 11, 2009
    Inventors: Zhiquang Song, Suruliappa G. Jeganathan, Jacqueline Lau, Rakesh Gupta
  • Publication number: 20090040618
    Abstract: An object of the present invention is to provide a light diffuser plate (1) which can illuminate the front side more brightly when incorporated in a surface light source (3) constituting a transmissive image display (2). The light diffuser plate of the present invention comprises a transparent resin and a light diffuser dispersed in the transparent resin, wherein the transparent resin is a transparent resin which has a light transmittance [T600] at a wavelength of 600 nm of 85% or more measured with respect to a thickness of a 2 mm thick plate-shaped specimen, and a ratio [T365/T600] of a light transmittance [T365] at a wavelength of 365 nm to the light transmittance [T600] is 0.90 to 0.99. The transparent resin is polystyrene or the like, an average particle diameter of the light diffuser is from 0.5 to 5 ?m, an absolute value [|?n|] of a difference in a refractive index between the light diffuser and the transparent resin is 0.05 or more, an amount of the light diffuser is from 0.
    Type: Application
    Filed: August 7, 2008
    Publication date: February 12, 2009
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hironobu Iyama
  • Publication number: 20090036625
    Abstract: The present invention discloses an amphiphilic polymer, comprising a polymer backbone, at least one hydrophobic side chain, and at least one hydrophilic side chain wherein one end of the hydrophobic side chain is bound to the polymer backbone and one end of the hydrophilic side chain is bound to the polymer backbone. The polymer backbone is derived from a homopolymer or copolymer of an anhydride. In addition, the present invention discloses a water-soluble polymer micell having the above described amphiphilic polymer and forming method and applications thereof.
    Type: Application
    Filed: August 1, 2007
    Publication date: February 5, 2009
    Applicant: CHUNG YUAN CHRISTIAN UNIVERSITY
    Inventors: Walter Hong-Shong Chang, Cheng-An J. Lin, Jimmy Kuan-Jung Li, Martin Oheim, Aleksey Yakovlev, Anne Feltz, Camilla Luccardini, Maria Teresa Fernandez-Arguelles, Ralph A. Sperling, Wolfgang J. Parak
  • Publication number: 20080299557
    Abstract: The present invention provides copolymers that facilitate nucleic acid analysis, compositions that comprise such copolymers, and methods for making or using such copolymers.
    Type: Application
    Filed: February 6, 2006
    Publication date: December 4, 2008
    Applicant: QIAGEN GmbH
    Inventors: Ralf Himmelreich, Roland Fabis, Christoph Erbacher, Sabine Werner, Bernd Springer
  • Publication number: 20080274073
    Abstract: The use of terpolymers, obtainable by free radical copolymerization of (a) at least one anhydride of a C3-C10-dicarboxylic acid, (b) at least one 1,1-di-(C1-C3-alkyl)-substituted C4-C8-olefin, (c) polyisobutene having an average molecular weight Mn in the range of from 200 to 10 000 g/mol and, if appropriate hydrolysis, for the preparation of aqueous emulsions or dispersions of hydrophobic substances with the use of not more than 2% by weight of further emulsifier, based on the total aqueous emulsion or dispersion.
    Type: Application
    Filed: October 5, 2006
    Publication date: November 6, 2008
    Applicant: BASF SE Patents, Trademarks and Licenses
    Inventors: Hubertus Peter Bell, Stephan Huffer, Matthias Kluglein
  • Publication number: 20080182918
    Abstract: The invention relates to a monolithic polymer material comprising alternating copolymers formed by a radical reaction between a maleic anhydride in the form of a base monomer and ethylene comonomers in the form of electron donors. The invention also relates to a method for preparing said monolithic material consisting in carrying out a radical polymerization reaction of a composition which comprises a base composition containing a maleic anhydride in the form of a base monomer associated with the ethylene comonomers in the form of electron donors and/or with other ethylene comonomers in the form of electron donors or receivers and a mixture of pore-forming solvents, wherein said base composition is optionally supplemented with a thermal initiator or photo initiator.
    Type: Application
    Filed: March 31, 2006
    Publication date: July 31, 2008
    Applicant: UNIVERSITE DES SCIENCES ET TECHNOLOGIES DE LILLE
    Inventors: Katarzyna Chuda, Xavier Coqueret
  • Patent number: 7312291
    Abstract: A new family of concrete admixture additives can be derived from reacting a mixture of olefins/cyclic olefins-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-olefins/cyclic olefins-maleic anhydride terpolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers. These reactions lead to formation of a kind of carboxylic salt containing polymer, which can be used alone in concrete. Only a small amount of this substance is needed to provide excellent water reduction, high concrete flowability and high early strength.
    Type: Grant
    Filed: September 4, 2003
    Date of Patent: December 25, 2007
    Assignee: Taiwan Gwan Chian Industrial Co., Ltd.
    Inventor: Theresa Tsai
  • Patent number: 7241847
    Abstract: A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.
    Type: Grant
    Filed: August 4, 2004
    Date of Patent: July 10, 2007
    Assignee: JSR Corporation
    Inventors: Noboru Oshima, Michitaka Kaizu, Satoshi Ebata, Takashi Imamura
  • Patent number: 7112633
    Abstract: The invention relates to a process for the preparation of compound(s) comprising at least one acrylate or methacrylate group, at least one linear carbonate group and at least one 5-membered cyclic carbonate group. The process comprises (A) a selective ring-opening step and (B) a (meth)acrylation step. The process is environment-friendly and compounds obtained are usable in radiation curable compositions, for example in radiation-curable inks.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: September 26, 2006
    Assignee: Surface Specialties, S.A.
    Inventor: Vincent Stone
  • Patent number: 7105602
    Abstract: The present invention provides a processing aid for thermoplastic resin having a weight average molecular weight of 10,000 to 300,000, which is obtained by polymerizing an alkyl (meth)acrylate, or an alkyl (meth)acrylate and another vinyl monomer copolymerizable therewith, in the presence of a mercaptan having an alkyl ester group with C4-20 alkyl group as a chain transfer agent, and/or an organic peroxide having a tertiary-butyl peroxy group as a polymerization initiator.
    Type: Grant
    Filed: April 14, 2000
    Date of Patent: September 12, 2006
    Assignee: Kaneka Corporation
    Inventors: Takenobu Sunagawa, Riichi Nishimura, Toshiyuki Mori, Akira Takaki
  • Patent number: 7071275
    Abstract: The invention describes polyisobutenyl derivatives of succinic acid obtainable by: i) reacting a polyisobutene which has a reactive end group content of at least 80% and whose molecular weight distribution is characterized by a maximum MP in the distribution curve in the range from 500 to 20 000 daltons and a ratio of weight average molecular weight to number average molecular weight MW/MN of below 1.4 with maleic acid or maleic anhydride; ii) reacting the polyisobutene-succinic acid derivative obtained in i) with at least one compound I which has at least one primary or secondary amino group and/or an OH group to form an amide or ester bond, and also a process for preparing them and their use as additives in lubricant compositions.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: July 4, 2006
    Assignee: BASF Aktiengesellschaft
    Inventors: Hans Peter Rath, Arno Lange, Helmut Mach
  • Patent number: 7067599
    Abstract: A copolymer comprising units derivable from (A) one or more olefins of defined chain length; and (B) one or more ethylenically unsaturated compounds different from (A). The copolymers are useful as cold flow improvers in fuel oils.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: June 27, 2006
    Assignee: Infineum International Ltd.
    Inventors: Robert Dryden Tack, Brid Dilworth, Dennis George Peiffer
  • Patent number: 7009011
    Abstract: A stable free radical process for preparing a polymer having acid anhydride functionality includes heating a mixture comprised of a stable free radical agent, maleic anhydride or derivative thereof, and at least one polymerizable electron donor monomer to initiate exothermic reaction and during exotherm of the reaction, adding additional amounts of stable free radical agent to control the reaction temperature. The mixture may also include a stable free radical initiator. In the mixture, the maleic anhydride or derivative thereof preferably comprises from about 10% to about 70%, molar basis, of a total amount of the maleic anhydride or derivative thereof and the at least one polymerizable electron donor monomer. Typically, the heating is to a temperature of from about 100° C. to about 160° C., and the rate of addition of the additional amounts of stable free radical agent is adjusted to control the reaction temperature to be about 160° C. or less.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: March 7, 2006
    Assignee: Xerox Corporation
    Inventor: Barkev Keoshkerian
  • Patent number: 6987155
    Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and l is 1 or 2.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: January 17, 2006
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Chi Hyeong Roh, Jae Chang Jung
  • Patent number: 6906011
    Abstract: This invention is directed to a new low molecular weight copolymer (The PIB/UAR copolymer) that may be prepared by reacting a low molecular weight polyisobutene (PIB) having less than about 32 carbon atoms with an unsaturated acidic reagent in the presence of a free radical initiator. No chain transfer agent is required to prepare the low molecular weight PIB/UAR copolymer. The PIB/UAR copolymer may be useful as is, or as an intermediate for (1) polysuccinimides, (2) detergents or dispersants for lube oil or fuels, (3) pour point depressants and (4) surface sizing agents for paper. The PIB/UAR copolymer may be used by itself or as the ester, amide, imide or metal salt derivative of the PIB/UAR copolymer. The PIB/UAR copolymer may be liquid at ambient temperature.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: June 14, 2005
    Assignee: Chevron Oronite Company LLC
    Inventors: James J. Harrison, William R. Ruhe, Jr., Kenneth D. Nelson
  • Patent number: 6866984
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: March 15, 2005
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Patent number: 6808859
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: October 26, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Patent number: 6767980
    Abstract: The present invention provides a reactive diluent composition which overcomes drawbacks of both the radical-cure and the cationic-cure reactive diluents and can be applied in a broad variety of uses such as paints, inks, adhesives, pressure sensitive adhesives, surface-modifiers, and molding materials; a curable resin composition containing the same; an activated energy ray-curable resin composition; and an activated energy ray-curable ink composition for ink-jet printing. A reactive diluent composition comprising a vinyl ether group-containing (meth)acrylic ester represented by the following general formula (1): CH2═CR1—COO—R2—O—CH═CH—R3  (1) wherein R1 represents a hydrogen atom or a methyl group; R2 represents an organic residue of 2 to 20 carbon atoms; R3 represents a hydrogen atom or an organic residue of 1 to 11 carbon atoms and a hydroxyl group-containing polymerizable compound and/or divinyl ether.
    Type: Grant
    Filed: April 19, 2002
    Date of Patent: July 27, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Keiji Yurugi, Akihiko Fukada, Kenji Matsukawa
  • Publication number: 20040131968
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Application
    Filed: December 18, 2003
    Publication date: July 8, 2004
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Patent number: 6756460
    Abstract: The present invention provides: a novel water-soluble copolymer which is excellent in performance for uses, such as detergent builders, pigment dispersants, and scale inhibitors. In addition, the present invention provides: a novel liquid detergent builder which has extremely excellent compatibility, high transparency when a liquid detergent composition comprises it, and excellent detergency; and a novel liquid detergent composition comprising the liquid detergent builder.
    Type: Grant
    Filed: August 16, 2001
    Date of Patent: June 29, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takuya Saeki, Junichi Nakamura, Yoshikazu Fujii, Masahito Takagi, Shigeru Yamaguchi
  • Publication number: 20040097638
    Abstract: The invention relates to a polymer synthesized
    Type: Application
    Filed: July 2, 2003
    Publication date: May 20, 2004
    Applicant: BASF Akiengesellschaft
    Inventors: Alexander Centner, Karl-Heinz Schumacher, Oliver Hartz, Martin Jung
  • Patent number: 6723813
    Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising; polymerizing a monomer mixture of a radical polymerizable monomer having an acid anhydride group and another radical polymerizable monomer at a temperature of 150° C. or higher by using a radical initiator, wherein the concentration of the monomer mixture is 50-75 wt %. This method can provide an acrylic copolymer having an acid anhydride group with a relatively low molecular weight that does not cause the problem of yellowing after baking when used in an acid/epoxy curing type clear paint, by means of high temperature polymerization without the use of a large amount of an expensive initiator.
    Type: Grant
    Filed: June 17, 2003
    Date of Patent: April 20, 2004
    Assignee: Nippon Paint Company, Ltd.
    Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
  • Patent number: 6692725
    Abstract: It was found that if a copolymer of maleic acid or maleic anhydride with an alkyl vinyl ether, which has a specific viscosity of 3.5 or more, is used as an antibacterial-enhancing agent, the action of an antibacterial agent in an oral composition is enhanced and the effect such as adhesion prevention of a soft deposit is improved.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: February 17, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Toshio Endo
  • Patent number: 6677102
    Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: January 13, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshiko Miya, Yasunori Uetani, Hiroaki Fujishima
  • Patent number: 6673515
    Abstract: The invention provides a polymer comprising recurring units of formula (1—1) or (1-2) wherein k is 0 or 1, m is 0, 1, 2, 3 or 4, and n is 1 or 2 and having a weight average molecular weight of 1,000 to 500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: January 6, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama
  • Patent number: 6649714
    Abstract: A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: November 18, 2003
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian
  • Patent number: 6642336
    Abstract: A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.
    Type: Grant
    Filed: August 23, 2000
    Date of Patent: November 4, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sook Lee, Ki-young Kwon, Si-hyeung Lee, Kwang-sub Yoon, Hyun-woo Kim, Dong-won Jung, Sang-jun Choi, Sang-gyun Woo
  • Patent number: 6641974
    Abstract: Disclosed is a chemically amplified positive photoresist composition including a multi-component copolymer having a polystyrene-reduced weight average molecular weight (Mw) of 3,000 to 50,000 and a molecular weight distribution (Mw/Mn) of 1.0 to 3.0, a low molecular weight additive, an acid generator, and a solvent. A resist composition comprising the additive may provide a resist pattern excellent in sensitivity as well as adhesion to substrate and dry etching resistance. Such a resist composition is a promising material greatly suitable for use in the fabrication of semiconductor devices that are expected to have further fineness. Especially, the resist composition is suitable for KrF or ArF excimer laser lithography and thus useful in the fine engineering of less than 0.20 micron patterns.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: November 4, 2003
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jae Young Kim, Joo Hyeon Park
  • Publication number: 20030199655
    Abstract: The present invention provides a reactive diluent composition which overcomes drawbacks of both the radical-cure and the cationic-cure reactive diluents and can be applied in a broad variety of uses such as paints, inks, adhesives, pressure sensitive adhesives, surface-modifiers, and molding materials; a curable resin composition containing the same; an activated energy ray-curable resin composition; and an activated energy ray-curable ink composition for ink-jet printing.
    Type: Application
    Filed: April 19, 2002
    Publication date: October 23, 2003
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Keiji Yurugi, Akihiko Fukada, Kenji Matsukawa
  • Patent number: 6632903
    Abstract: The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (—OH).
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: October 14, 2003
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Min Ho Jung, Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Publication number: 20030191259
    Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray.
    Type: Application
    Filed: March 21, 2003
    Publication date: October 9, 2003
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Chi Hyeong Roh, Jae Chang Jung
  • Patent number: 6617374
    Abstract: The present invention relates to a denture adhesive composition comprising mixed salts of an alkyl vinyl ether-maleic acid or anhydride copolymer and/or terpolymer with isobutylene wherein the mixed salt contains a cationic salt function comprising at least about 22.5% calcium cations, from about 15% to about 25% of zinc cations, of the total initial carboxyl groups reacted, the mixed salt containing from about 36% to about 50% free acid component. In addition the present invention relates to denture adhesive compositions comprising the above composition and at least one non-adhesive self-supporting layer. The present invention further relates to a method of increasing the adhesion of dentures to the oral cavity by applying the above compositions to dentures, directly to the oral cavity, palate or ridge of the oral cavity, or applying it to both, and thereafter securing the denture to the ridge or palate of the oral cavity.
    Type: Grant
    Filed: September 2, 1999
    Date of Patent: September 9, 2003
    Assignee: The Procter & Gamble Company
    Inventors: Jayanth Rajaiah, Carole Ann Schumacher, John Roy Whitney, Kimberly Ann Gilday-Weber, Robert Hargitt Culbertson
  • Publication number: 20030166811
    Abstract: A copolymer comprising units derivable from (A) one or more olefins of defined chain length; and (B) one or more ethylenically unsaturated compounds different from (A). The copolymers are useful as cold flow improvers in fuel oils.
    Type: Application
    Filed: December 2, 1999
    Publication date: September 4, 2003
    Inventors: DENNIS G. PEIFFER, BRID DILWORTH, ROBERT DRYDEN TACK