Abstract: Provided are novel plasma-assisted processes for preparing cured films having excellent heat resistance and moisture resistance. A process for preparing a cured film, comprising at least: applying a composition containing (A) at least one conductive polymer precursor on a substrate to form a coating layer, and irradiating the coating layer with a plasma to polymerize the conductive polymer precursor (A).

Abstract: A process (1) for producing a cycloolefin resin film comprising the steps of: the step (I) of mixing a cycloolefin monomer and a metathesis polymerization catalyst to prepare a polymerizable composition (A); the step (II) of coating or impregnating the supporting body with the polymerizable composition (A) at once after the step (I), and the step (III) of polymerizing the polymerizable composition (A) by polymerization; and a process (2) for producing a cycloolefin polymer sheet or film with the thickness of 1 mm or less comprising polymerizing a reactive solution containing a ruthenium complex catalyst, having a hetero atom-containing carbene compound as a ligand, and a cycloolefin monomer by ring-opening metathesis bulk polymerization, wherein the polymerization of the cycloolefin monomer is completed by heating the reactive solution to 100° C. or higher at the heating rate of 20° C./min or more.

Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.

Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.

Abstract: A process for continuously making a terpolymer or a tetrapolymer utilizing ethylene, an alpha olefin, and at least one polyene. This process allows for the creation of products with high polyene contents and broad molecular weight distributions while utilizing a continuous flow reactor and a known catalyst. The process allows for these products to be made without gelling, or fouling of the reactor.

Abstract: A process and the resultant product from the process for continuously making an EPDM utilizing ethylene, propylene, and dienes. This process allows for the creation of products with high diene contents and broad molecular weight distributions while utilizing a continuous flow reactor and a known catalyst. The process allows for these products to be made without gelling, or fouling of the reactor, which are problems known in the art.

Abstract: An adhesive film includes a cured product of a (meth)acrylic copolymer and has a refractive index from about 1.5 to about 1.6. An adhesive composition for preparing the adhesive film includes a (meth)acrylic copolymer of a monomer mixture. A display member includes the adhesive film coated on one or more surfaces of an optical film.

Abstract: The present invention provides an optical-use pressure-sensitive adhesive sheet, which includes a pressure-sensitive adhesive layer containing a polymer formed of one or more monomer ingredients containing, as an indispensable monomer ingredient, a monomer of which homopolymer has a glass transition temperature of not lower than ?10° C., said sheet having a moisture content of at least 0.65% by weight after stored in an environment at 60° C. and 95% RH for 120 hours. The pressure-sensitive adhesive layer is preferably an acrylic pressure-sensitive adhesive layer.

Abstract: A double-sided pressure-sensitive adhesive sheet includes a pressure-sensitive adhesive layer containing an acrylic polymer formed of a component comprising, as an essential monomer component, an alkyl (meth)acrylate having an alkyl group having 9 or less carbon atoms. A shear storage elastic modulus at 23° C. of the pressure-sensitive adhesive layer, which is measured by dynamic viscoelasticity measurement, is 5.0×105 Pa or less, and a shear storage elastic modulus at ?50° C. of the pressure-sensitive adhesive layer, which is measured by dynamic viscoelasticity measurement, is 1.0×108 Pa or more.

Abstract: The present invention provides an optical semiconductor sealing material comprising a radically polymerized polymer of a methacrylate ester having an alicyclic hydrocarbon group containing 7 or more carbon atoms, e.g. an adamantyl group, a norbornyl group, or a dicyclopentanyl group; and an optical semiconductor sealing material comprising a radically polymerized polymer of 50 to 97 mass % of the methacrylate ester and 3 to 50 mass % of acrylate ester having a hydroxyl group. The optical semiconductor sealing material of the present invention is highly transparent and stable to UV light and thus does not undergo yellowing. In addition, the material exhibits excellent compatibility between heat resistance and refractive index, does not undergo deformation or cracking during heating processes such as reflow soldering, and shows high processability.

Abstract: There are provided a photosensitive composition, and a cured product of the photosensitive composition, the photosensitive composition being an ultraviolet curable composition that is curable in a short time while a portion of the photosensitive composition such as a dark portion where radicals are not generated at all is curable. A cured product is obtained by curing a photosensitive composition by ultraviolet irradiation, the photosensitive composition containing an ultraviolet curable material, and a chain transfer agent that contains an ingredient (a) that is a compound containing at least one kind selected from the group consisting of a urethane bond, a urea bond and an isocyanate group, and an ingredient (b) that is a metal-containing compound, wherein a portion of the composition where irradiation light does not reach is curable.

Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.

Abstract: Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.

Abstract: This invention relates to a polymer of a cyclic olefin and a vinyl terminated macromonomer, and processes for the production thereof.

Abstract: Provided are an adamantane derivative represented by the following formula (1), a method for producing the same, a polymer containing an acrylate compound having the adamantane structure represented by formula (1) in a repeat unit, and a functional resin composition which contains the polymer, has excellent alkali developability and substrate adhesiveness, and can improve the resolution and the line edge roughness as a chemically amplified resist sensitive to far-ultraviolet rays represented by KrF excimer laser light, ArF excimer laser light, F2 excimer laser light or EUV without spoiling fundamental properties thereof as a resist such as pattern forming properties, dry etching resistance, heat resistance and the like.

Abstract: A polymer is obtained from copolymerization of a recurring unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and a recurring unit having formula (1) wherein R1 is methyl, ethyl, propyl, methoxy, ethoxy or propoxy, R2 is H or CH3, and m is 1 to 4. The polymer is used as a base resin to formulate a resist composition, which is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: Embodiments in accordance with the present invention relate generally to the use of polycycloolefinic polymers as a structure defining material in organic electronic devices, and more specifically to separators, insulating structures or bank structures of such devices and to organic electronic devices comprising such structures, to processes for preparing such structures and to organic electronic devices encompassing such structures.

Abstract: Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.

Abstract: A vinyloxy group-containing vinyl polymer, useful as a heat or light curing reactive prepolymer, containing at least a constituent unit expressed by the following formula (I):

Abstract: A heat-resistant cured product is efficiently produced by obtaining a semi-cured product where a curable resin composition containing a (meth)acrylate monomer, a non-conjugated vinylidene group-containing compound and a thermal radical-polymerization initiator is processed by at least one of photoirradiation and heating to give a semi-cured product having a complex viscosity of from 105 to 108 mPa·s at 25° C. and at a frequency of 10 Hz; and putting the semi-cured product in a forming die for pressure formation therein, and heating it therein for thermal polymerization to give a cured product.

Abstract: A polymer and composition useful in forming an insulating film provided with a low permittivity, a high heat resistance, and a high mechanical strength and an insulating film obtained from these and an electronic device having the same are provided. The polymer for forming an insulating film according to the present invention is characterized by being obtained by polymerizing a reactive compound represented by Formula (1). The insulating film according to the present invention is formed using a composition for forming an insulating film including that polymer, has molecular spaces having an average space size of 0.7 nm to 5 nm, and has a permittivity of 2.3 or less. The electronic device according to the present invention has the insulating film.

Abstract: An organic insulating material includes a prepolymer of a cage structure compound having a polymerizable unsaturated bond-containing group and a cage structure with an adamantane structure as the minimal unit. The prepolymer has a number-average molecular weight of between 2,000 and 500,000 based on polystyrene and measured by gel permeation chromatography. The prepolymer includes unsaturated bonds produced by reaction between the polymerizable unsaturated bonds and the unreacted polymerizable unsaturated bonds. The prepolymer has a residue rate of unreacted polymerizable unsaturated bonds of between 20% and 80%.

Abstract: A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C5-C42)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C1-C6)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.

Abstract: A radiation-sensitive resin composition includes a polymer having a structural unit represented by a formula (I). In the formula (I), R1 represents a hydrogen atom or a methyl group. X represents a bivalent alicyclic hydrocarbon group not having or having a substituent. Y represents a bivalent hydrocarbon group having 1 to 20 carbon atoms. R2 represents a methyl group or a trifluoromethyl group.

Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1), a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group, and a structural unit (a3) derived from an acrylate ester containing a hydroxy group-containing aliphatic hydrocarbon group represented by general formula (a3-1), and the amount of the structural unit (a3) based on the combined total of all structural units constituting the polymeric compound (A1) being in the range of 1 to 30 mol %.

Abstract: The cyclic olefin copolymer of the present invention contains (A) a repeating unit derived from one or more kinds of olefins represented by the following General Formula (I), (B) a repeating unit derived from a cyclic non-conjugated diene represented by the following General Formula (III), and (C) a repeating unit derived from one or more kinds of cyclic olefins represented by the following General Formula (V), wherein when a total mole number of the repeating units is regarded as 100 mol %, the (B) repeating unit derived from a cyclic non-conjugated diene is contained in an amount of 19 mol % to 36 mol %.

Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.

Abstract: The present invention provides a pressure-sensitive adhesive sheet large in adhesive force when used for a surface of a glass member and capable of reducing the adhesive force to a degree allowing the occurrence of the cracking or breakage of the glass member to be suppressed when the sheet is peeled from the surface of the glass member. The pressure-sensitive adhesive sheet for glass plates of the present invention includes a pressure-sensitive adhesive layer including an acrylic polymer, wherein the content of the acrylic polymer in the pressure-sensitive adhesive layer is 30% by weight or more in relation to the total amount (100% by weight) of the pressure-sensitive adhesive layer; the acrylic polymer substantially includes no acidic functional group; the solvent-insoluble fraction of the pressure-sensitive adhesive layer is 50% or more; and the adhesive force to glass as determined by a specific method is 12.0 N or less.

Abstract: Embodiments in accordance with the present invention provide forming polynorbornenes useful for forming pervaporation membranes, the membranes themselves and methods of making such membranes.

Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.

Abstract: The present invention relates to a specific photoreactive polymer that shows excellent alignment stability and thermal stability together with excellent liquid crystal alignment, thereby being desirably used in an alignment film of a liquid crystal display device, a compound having a photoreactive functional group that is used as a monomer for the preparation of the photoreactive polymer, and an alignment film.

Abstract: Disclosed is a method for purifying a polymer in which a solution containing a cyclic olefin polymer having at least a repeating structural unit [A] represented by the general formula (1) and a metal component is brought into contact with an organic compound having a basic functional group and an acidic functional group, and then the resulting solution is brought into contact with a basic adsorbent to remove the metal component contained in the solution.

Abstract: A two-component adhesive composition suitable for structural bonding of concrete/concrete, steel/concrete, or steel/steel, as well as for structural strengthening and reinforcing applications with fiber reinforced polymers, is disclosed. The composition includes a resin component A with a peroxide containing at least one norbornene group and at least one methacrylate containing compound and a hardener component B comprising a peroxide and at least one thiol. The resin component A and the hardener component B are spatially separated from one another to inhibit any reaction before mixing of the components.

Abstract: A method for producing a resist copolymer having a weight-average molecular weight of not less than 3000 and not more than 6000, in which copolymer the contents of an oligomer having a molecular weight of not more than 1000 and a byproduct derived from a polymerization initiator are small, is provided. The method for producing a resist copolymer comprises the step of continuously supplying a solution containing a monomer and a solution containing a polymerization initiator to a heated solvent to carry out a radical polymerization, wherein the variation range of the concentration of the polymerization initiator in polymerization solution is within ±25% of the median value between the maximum concentration and the minimum concentration during specific time; and the variation range of the concentration of unreacted monomer in the polymerization solution is within ±35% of the median value between the maximum concentration and the minimum concentration during specific time.

Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group

Abstract: Dental compositions and disulfide monomers described. The disulfide monomer comprises a disulfide backbone group wherein each of the sulfur atoms are bonded to a group terminating with an ethylenically unsaturated norbornyl group; and at least one other monomer comprising at least two ethylenically unsaturated groups.

Abstract: A photosemiconductor protective material comprising a chain olefin-cyclic olefin copolymer elastomer composed of a chain olefin and a cyclic olefin as polymerizable components is prepared. The elastomer may comprise an ?-chain C2-4olefin and a polycyclic olefin as polymerizable components, and the molar ratio of the ?-chain C2-4olefin relative to the polycyclic olefin may be 80/20 to 99/1 in a ratio of the ?-chain C2-4olefin/the polycyclic olefin. The photosemiconductor protective material may further contain an organic silicon compound having a hydrolytically condensable group. The organic silicon compound may be a silane coupling agent having a (meth)acryloyl group. A photosemiconductor protective material 1 as the protective material is suitable as a solar cell encapsulant or filler 3 for encapsulating a solar cell 4. The photosemiconductor protective material has a high transparency and a high weather resistance and a proper elasticity and effectively protects a photosemiconductor.

Abstract: Higher diamondoid derivatives capable of taking part in polymerization reactions are disclosed as well as intermediates to these derivatives, polymers formed from these derivatives and methods for preparing the polymers.

Abstract: An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.

Abstract: A vinyl ether compound represented by formula (1-a) or formula (1-b): wherein n represents 0 or 1, and R1 and R2 each independently represent a hydrogen atom, a methyl group, or an ethyl group, provided that a total of the number of carbon atoms of R1 and the number of carbon atoms of R2 is 1 or 2.

Abstract: Polymers having ordered architectures and one or more reactive functional groups incorporated in select blocks or regions of the polymer in particular proportions relative to other regions in the polymer, are described. The polymers are well suited for use in adhesive compositions, and particularly for pressure sensitive adhesive compositions. In addition, various methods for forming the noted polymers and adhesive compositions utilizing the ordered polymers are disclosed.

Abstract: A polymer includes a repeating unit shown by a general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents —X1Z1X2— which is an atomic group which forms a cyclic structure including a heteroatom together with Y. Z1 represents —O—, —S—, —CO—, —COO—, —SO—, or —SO2—. Each of X1 and X2 individually represents a single bond, a methylene group, or an alkylene group having 2 to 25 carbon atoms. Each of X1 and X2 is unsubstituted or substituted with a substituent, and optionally a carbon atom included in X1 and a carbon atom included in X2 are bonded via a divalent group.

Abstract: The present invention relates to a polymer having a novel structure and a photosensitive resin composition comprising the same. A photosensitive resin composition comprising a polymer according to the present invention has a high taper angle and excellent adhesion strength. Accordingly, the photosensitive resin composition comprising the polymer according to the present invention may be applied to various photosensitive materials, and particularly, may be preferably applied when a color filter pattern for LCD is manufactured.

Abstract: The present invention provides 1-alkene-acrylate based copolymer prepared by a method comprising step of a radical polymerization reaction of 1-alkene and acrylate based monomer under presence of a metal oxide or Lewis acid. The 1-alkene-acrylated based copolymer according to the present invention is a random copolymer of 1-alkene and a polar monomer, and an amount of a polar group contained in the copolymer is very high so that the alkene is not crystalline. Accordingly, when the copolymer is processed into a polymer film, a transparency of the polymer is not affected. Due to such a feature, the copolymer can be used for optical products.

Abstract: Embodiments of the invention provide a class of mesophase separated butene/?-olefin block interpolymers with controlled block sequences. The butene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.4. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block butene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (‘TREF’), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the butene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.4.

Abstract: Provided according to the present invention are an adamantyl (meth)acrylate represented by formula (1), having a formazin standard turbidity of less than 1.7 NTU (Nephelometric Turbidity Unit) in methylethylketone or tetrahydrofuran, and also a (meth)acrylic copolymer comprising the adamantyl (meth)acrylate as a repeating unit: (in the formula, R1 represents hydrogen or a methyl group; R2 through R4 each independently represent a hydrogen atom, a hydroxyl group, an alkyl group having a carbon number of 1 to 3, an aryl group, an alkoxy group, an aryloxy group, a halogen group, an alkyl halide group, or a hydroxyalkyl group; and n1 represents 0 or 1).

Abstract: The present invention relates to a photoreactive norbornene polymer comprising a photoreactive norbornene monomer, a process for preparing the same, and an alignment layer using the same. The photoreactive norbornene polymer includes a photoreactive functional group having a halogen, in particular, a fluorine substituent group so that it gives a compositional gradient in the alignment layer to improve an orientation rate, an orientation, and an adhesion property.

Abstract: An ultraviolet cross-linkable pressure sensitive adhesive sheet includes a (meth)acrylic copolymer of a monomer containing a (meth)acrylic acid ester having an ultraviolet cross-linkable site. The storage modulus of the pressure sensitive adhesive sheet before ultraviolet cross-linking is from 5.0×104 to 1.0×106 Pa at 30° C. and 1 Hz and 5.0×104 Pa or less at 80° C. and 1 Hz. The storage modulus of the pressure sensitive adhesive sheet after ultraviolet cross-linking is 1.0×103 Pa or more at 130° C. and 1 Hz.

Abstract: The present invention relates to a photoreactive polymer that comprises a multi-cyclic compound in a main chain, and a polymerization method thereof. Since the photoreactive polymer according to the present invention comprises a multi-cyclic compound having a high glass transition temperature as a main chain, the thermal stability is excellent, and since the mobility of the main chain is relatively high as compared to that of an additional polymer, a photoreactive group can be freely moved in the main chain of the polymer. Accordingly, it is possible to overcome a slow photoreactive rate that is considered a disadvantage of a polymer material used to prepare an alignment film for known liquid crystal display devices.