From Fused Or Bridged Ring Containing Monomer Patents (Class 526/280)
  • Patent number: 10273327
    Abstract: The present disclosure is directed to methods of making a polymer, including exposing a reaction mixture including a strained cyclic unsaturated monomer and an organic initiator to a stimulus to provide an activated organic initiator, whereby the activated organic initiator is effective to polymerize the strained cyclic unsaturated monomer via a 4-membered carbocyclic intermediate to provide a polymer having constitutional units derived from the strained cyclic unsaturated monomer.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: April 30, 2019
    Assignee: University of Washington
    Inventors: Andrew J. Boydston, Kelli Ogawa, Adam E. Goetz, Damian Dunford, Laura Marie Murphy Pascual
  • Patent number: 10263220
    Abstract: The manufacturing method for QLED display of the present invention uses the white QD layer to replace the organic light-emitting layer of the WOLED structure in the WOLED process, and adds the UV photoinitiator to the white QD layer. The QDs between the sub-pixels are irreversibly quenched by UV irradiation with mask to form fine QD pattern so as to eliminate the mutual influence between adjacent sub-pixels and effectively reduce the distance between two sub-pixels, increase the aperture ratio, and improve the color gamut and contrast of the display to enhance the color expression capability of the display. The manufacturing method is simple, and saves cost and process. Compared with the conventional TFT-LCD display, the QLED display of the present invention is not required to fabricate a liquid crystal cell separately, thinner and lighter, and has a longer lifetime and higher luminous efficiency than a conventional WOLED display.
    Type: Grant
    Filed: December 19, 2016
    Date of Patent: April 16, 2019
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Guohe Liu
  • Patent number: 10078261
    Abstract: Disclosed herein is a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety that comprises a halocarbon moiety, a silicon containing moiety, or a combination of a halocarbon moiety and a silicon containing moiety; a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to undergo acid-catalyzed deprotection causing a change of solubility of the graft block copolymer in a developer solvent.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: September 18, 2018
    Assignees: ROHM AND HAAS ELECTRONIC MATERIALS LLC, THE TEXAS A&M UNIVERSITY SYSTEM
    Inventors: Sangho Cho, Guorong Sun, Karen L. Wooley, James W. Thackeray, Peter Trefonas, III
  • Patent number: 10030105
    Abstract: The invention relates to low molecular mass products and to the use thereof as reversible or permanent low-temperature crosslinkers in Diels-Alder reactions.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: July 24, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Friedrich Georg Schmidt, Stefan Hilf, Emmanouil Spyrou, Jiawen Zhou, Nathalie Guimard, Christopher Barner-Kowollik, Kim Klaus Oehlenschlaeger, Andre Hennig
  • Patent number: 9459376
    Abstract: An optical polymer satisfying an expression: (?A??B)/?B×100<60, where, ?A is the melt viscosity of the optical polymer measured at a temperature of 290° C. and a shear rate of 200 (l/s), and ?B is the melt viscosity of the optical polymer measured at a temperature of 290° C. and a shear rate of 2000 (l/s).
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: October 4, 2016
    Assignee: ZEON CORPORATION
    Inventors: Ayumi Sato, Yosuke Harauchi, Hiroya Nishioka, Takashi Houkawa, Kenji Umeda, Takuya Komatsubara
  • Patent number: 9279023
    Abstract: Process for polymerizing ethylene in a reactor system containing one or more reactors in series, having a characteristic such that the average polymerization productivity [kgPE/kgcata] per unit ethylene per hour a1 during operation at any first residence time r1 is less than 1.7 (a2r2?a1r1)/(r2?r1), where a2 is the average polymerization productivity [kgPE/kgcata] per unit ethylene per hour during operation at any second residence time r2 where r2>r1, a2 and r2 being measured either in the same reactor in the case of a single reactor polymerization, or in a reactor subsequent to the reactor in which a1 and r1 are measured in the case where the polymerization takes place in more than one reactor. The specific yield of the reactor system is greater than 0.3 tonnes/m3. Operating the system under the above conditions results in improved productivity/unit ethylene.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: March 8, 2016
    Assignee: INEOS EUROPE AG
    Inventors: Daniel Marissal, Benoit Koch, Christophe Moineau
  • Publication number: 20150147697
    Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Publication number: 20150062518
    Abstract: A liquid crystal display device includes a substrate; a liquid crystal layer containing a liquid crystal material; and a first layer formed on the substrate, the first layer being configured to control the alignment of liquid crystal molecules, the first layer being placed between the substrate and the liquid crystal layer, and being formed by polymerization of two or more kinds of radical polymerizable monomers in the liquid crystal layer.
    Type: Application
    Filed: April 24, 2013
    Publication date: March 5, 2015
    Inventors: Masanobu Mizusaki, Satoshi Enomoto
  • Publication number: 20150064626
    Abstract: A positive resist composition is provided comprising a polymer comprising recurring units having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group and recurring units of tert-butyl or tert-amyl-substituted hydroxyphenyl methacrylate and having a weight average molecular weight of 1,000-500,000. The resist composition has a satisfactory effect of suppressing acid diffusion and a high resolution, and forms a pattern of good profile and minimal edge roughness after exposure.
    Type: Application
    Filed: July 14, 2014
    Publication date: March 5, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20150057422
    Abstract: There are provided a radically polymerizable composition that has a low viscosity suitable for use in coating and that forms a cured product having a high refractive index, a cured product formed by curing the composition, and plastic lens formed by curing the composition. The radically polymerizable composition includes, as essential components, phenylbenzyl acrylate (A); and bis[(meth)acryloylmethyl]biphenyl (B) or biphenyl compound (C) having a molecular structure in which biphenyl structures are bonded to each other through a methylene.
    Type: Application
    Filed: March 12, 2012
    Publication date: February 26, 2015
    Applicant: DIC CORPORATION
    Inventors: Akihiro Kondo, Atsuhisa Miyawaki, Nobuo Kobayashi, Naoya Ikushima, Kazuaki Hatsusaka
  • Publication number: 20150030983
    Abstract: A resist top coat composition includes a polymer including a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group and a repeating unit q of acenaphthylene having chemical formula 1. R is hydrogen, hydroxyl. R1 is hydrogen, hydroxyl, linear or branched C1-C10-alkyl, cycloalkyl, acyloxy, alkoxycarbonyl, carboxyl, —OC(?O)R2. R2 is linear or branched C1-C10-alkyl, cycloalkyl or fluorinated alkyl. m is 1 or 2. p and q are positive numbers satisfying the expressions 0<p<1.0 and 0<q<1.0, and 0<p+q?1.0.
    Type: Application
    Filed: July 28, 2014
    Publication date: January 29, 2015
    Inventors: Jun HATAKEYAMA, Hyun-Woo KIM
  • Publication number: 20150018445
    Abstract: A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R11, R12, R15, and R16 represent a substituent and A represents an atomic group necessary for forming a cyclic structure.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuusuke IIZUKA, Tatsuhiko OBAYASHI, Naoyuki MOROOKA, Takayasu NAGAI, Ayumi SOMEYA
  • Publication number: 20150014894
    Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
    Type: Application
    Filed: October 2, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Kunihiko KODAMA, Kyouhei SAKITA, Hiroyuki YONEZAWA
  • Patent number: 8871884
    Abstract: The inventions disclosed, described, and/or claimed herein relate to copolymers comprising copolymers comprising electron accepting A subunits that comprise thiazolothiazole, benzobisthiazole, or benzobisoxazoles rings, and electron donating subunits that comprise certain heterocyclic groups. The copolymers are useful for manufacturing organic electronic devices, including transistors and solar cells. The invention also relates to certain synthetic precursors of the copolymers. Methods for making the copolymers and the derivative electronic devices are also described.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: October 28, 2014
    Assignee: University of Washington
    Inventors: Samson A. Jenekhe, Selvam Subramaniyan, Eilaf Ahmed, Hao Xin, Felix Sunjoo Kim
  • Patent number: 8853345
    Abstract: Provided is a copolymer. The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: October 7, 2014
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung-Hoon Oh, Joon Hee Han, Tae Gon Kim, Hyun Sang Joo
  • Patent number: 8846833
    Abstract: The invention relates to a process for preparing pressure-sensitive adhesives (PSAs) which have high molar masses in combination with a narrow molar mass distribution, and also to PSAs, especially polyacrylate-based PSAs, prepared accordingly. It has been found that, surprisingly, polymers with high molar masses and a narrow molar mass distribution, more particularly polyacrylates with high molar masses and a narrow molar mass distribution, can be prepared outstandingly in particular by means of RAFT processes in the presence of a diradical initiator which undergoes thermal cyclization to form a diradical, these polymers being suitable for use as high-shear-strength PSAs.
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: September 30, 2014
    Assignee: TESA SE
    Inventor: Alexander Prenzel
  • Patent number: 8808960
    Abstract: A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: August 19, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
  • Patent number: 8808966
    Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR22)m—, B is —(CR52)n—, R2 and R5 are hydrogen or alkyl, m and n are 1 or 2, R3 is alkyl, alkenyl, alkynyl or aryl, R6 is alkyl, alkoxy, alkanoyl, alkoxycarbonyl, hydroxyl, nitro, aryl, halogen, or cyano, and p is 0 to 4.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: August 19, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Patent number: 8802798
    Abstract: A photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group or one of a specified subset of alicyclic hydrocarbon groups, alicyclic hydrocarbon groups, or hydrocarbon groups; R6 is a hydrogen atom or one of a specified subset of hydrocarbon groups or alicyclic hydrocarbon groups; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1. Also disclosed is a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the formula (3): wherein R8 is a hydrogen atom or a methyl group, and R9 is one of a specified subset of hydrocarbon groups.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: August 12, 2014
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa
  • Publication number: 20140212810
    Abstract: A polymer comprising recurring units (a) of styrene having an HFA group and an ester group adjacent thereto and recurring units (b) having a hydroxyl group is used as base resin to formulate a negative resist composition. The negative resist composition has a high dissolution contrast in alkaline developer, high sensitivity, high resolution, good pattern profile after exposure, and a suppressed acid diffusion rate.
    Type: Application
    Filed: December 23, 2013
    Publication date: July 31, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa, Daisuke Domon
  • Patent number: 8785105
    Abstract: A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: July 22, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Masaki Ohashi, Seiichiro Tachibana, Jun Hatakeyama
  • Patent number: 8778235
    Abstract: A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.
    Type: Grant
    Filed: September 28, 2010
    Date of Patent: July 15, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Junichi Ito, Masaru Yoshikawa, Yuki Mizukawa, Kenta Ushijima, Shinichi Kanna, Haruki Inabe, Yoshihiko Fujie, Akiyoshi Goto, Yushi Kaneko, Hiroaki Idei
  • Patent number: 8765894
    Abstract: Embodiments of the present disclosure encompass vinyl addition and ROMP polymers having at least one type of repeating unit that encompasses a comprise N+(CH3)3OH? moiety. Other embodiments in accordance with the disclosure include alkali anion-exchange membranes (AAEMs) made from one of such polymers, anion fuel cells (AFCs) that encompass such AAEMs and components of such AFCs, other than the AAEM, that encompass one of such polymers.
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: July 1, 2014
    Assignee: Promerus, LLC
    Inventors: Andrew Bell, Edmund Elce, Keitaro Seto
  • Patent number: 8765895
    Abstract: The invention relates to a polymer composition that includes a branched alkene which is cationically polymerizable as well as a glass-forming comonomer and/or a vinyl comonomer containing benzocyclobutene as the pendant group. The structure of the polymer composition can take various forms: linear random copolymer, linear block copolymer, star random copolymer, star block copolymer, and other hyperbranched polymers. The copolymer composition can undergoes crosslinking at elevated temperatures (preferably above 180° C.).
    Type: Grant
    Filed: June 25, 2008
    Date of Patent: July 1, 2014
    Assignee: Innolene LLC
    Inventors: Yonghua Zhou, Leonard Pinchuk
  • Patent number: 8765893
    Abstract: Embodiments of the present disclosure encompass vinyl addition and ROMP polymers having at least one type of repeating unit that encompasses a comprise N+(CH3)3OH? moiety. Other embodiments in accordance with the disclosure include alkali anion-exchange membranes (AAEMs) made from one of such polymers, anion fuel cells (AFCs) that encompass such AAEMs and components of such AFCs, other than the AAEM, that encompass one of such polymers.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: July 1, 2014
    Assignee: Promerus, LLC
    Inventors: Andrew Bell, Edmund Elce, Keitaro Seto
  • Patent number: 8754179
    Abstract: The present discovery uses monomers which contain reversible photo-crosslinkable groups in addition to primary polymerizable groups. The mechanical properties of these materials and the reversibility of the photo-activated shape memory effect demonstrate the effectiveness of using photo-irradiation to effect change in modulus and shape memory effect. In the preferred embodiment the reaction mixture includes a photo-reactive monomer comprising a photo reactive group and a polymerizable group; a second monomer, which is more preferably a mixture of monomers, which are acrylate based; a multi-functional crosslinking agent, preferably 1,6 hexanediol diacrylate (HDODA); an initiator, preferably a free radical initiator; and a fifth, optional, component which is a modifying polymer. The mixture of the second monomer, crosslinking agent, and initiator comprise the base polymer matrix into which the photo-reactive monomer is incorporated.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: June 17, 2014
    Assignee: Cornerstone Research Group, Inc.
    Inventors: Tat Hung Tong, Emily Snyder
  • Patent number: 8722828
    Abstract: A process (1) for producing a cycloolefin resin film comprising the steps of: the step (I) of mixing a cycloolefin monomer and a metathesis polymerization catalyst to prepare a polymerizable composition (A); the step (II) of coating or impregnating the supporting body with the polymerizable composition (A) at once after the step (I), and the step (III) of polymerizing the polymerizable composition (A) by polymerization; and a process (2) for producing a cycloolefin polymer sheet or film with the thickness of 1 mm or less comprising polymerizing a reactive solution containing a ruthenium complex catalyst, having a hetero atom-containing carbene compound as a ligand, and a cycloolefin monomer by ring-opening metathesis bulk polymerization, wherein the polymerization of the cycloolefin monomer is completed by heating the reactive solution to 100° C. or higher at the heating rate of 20° C./min or more.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: May 13, 2014
    Assignee: Zeon Corporation
    Inventor: Tomoo Sugawara
  • Patent number: 8685510
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 1, 2014
    Assignee: Zeon Corporation
    Inventors: Haruhiko Takahashi, Teiji Kohara
  • Patent number: 8648160
    Abstract: The present invention provides an optical semiconductor sealing material comprising a radically polymerized polymer of a methacrylate ester having an alicyclic hydrocarbon group containing 7 or more carbon atoms, e.g. an adamantyl group, a norbornyl group, or a dicyclopentanyl group; and an optical semiconductor sealing material comprising a radically polymerized polymer of 50 to 97 mass % of the methacrylate ester and 3 to 50 mass % of acrylate ester having a hydroxyl group. The optical semiconductor sealing material of the present invention is highly transparent and stable to UV light and thus does not undergo yellowing. In addition, the material exhibits excellent compatibility between heat resistance and refractive index, does not undergo deformation or cracking during heating processes such as reflow soldering, and shows high processability.
    Type: Grant
    Filed: August 16, 2012
    Date of Patent: February 11, 2014
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Tomoaki Takebe, Tsuyoshi Ota, Yutaka Obata, Hiroyuki Higuchi
  • Patent number: 8647730
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: February 11, 2014
    Assignee: Zeon Corporation
    Inventors: Nobuhiro Kudo, Koichi Ikeda
  • Publication number: 20130331501
    Abstract: Embodiments of the present disclosure illustrate systems and methods for the separation of carbon nanotubes (CNTs) in solution and continuously fabrication of functionalized carbon nanotubes (CNTs). In certain embodiments, the CNTs are isolated by sonication and chemical modification of the CNTs using functionalization reactions, including thermo-initiated or sono-initiated free radical polymerization and esterification. Beneficially, sonication facilitates mechanical separation of the CNTs, while the chemical modification of the CNTs results in more favorable interactions between the CNTs and their surrounding media which enables the separated CNTs to remain isolated. Embodiments of the isolated CNTs may also be employed into coating systems.
    Type: Application
    Filed: August 14, 2013
    Publication date: December 12, 2013
    Applicant: Cal Poly Corporation
    Inventors: Phillip J. Costanzo, Keith Vorst, Greg William Curtzwiler
  • Patent number: 8598288
    Abstract: A catalyst for a polymerization of norbornene monomers includes a transition metal complex represented by a formula (1). A method for producing a norbornene copolymer includes copolymerizing first norbornene monomers corresponding to a first monomer unit represented by a formula (2) and second norbornene monomers corresponding to a second monomer unit represented by a formula (3) in a presence of the catalyst. The transition metal complex is preferably (?-allyl) {2-[N-(2,6-diisopropylphenyl) iminomethyl]phenolate}palladium, (?-allyl) {2-[N-(2,6-diisopropylphenyl)iminomethyl]-4-fluorophenolate}palladium, (?-allyl)[2-(N-phenyliminomethyl) phenolate]palladium or (?-allyl){2-[N-(2,6-diisopropylphenyl) iminomethyl]-6-methylphenolate}palladium.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: December 3, 2013
    Assignee: Showa Denko K.K.
    Inventors: Satoshi Fujibe, Nobuyuki Kibino, Tsuneo Tajima
  • Patent number: 8598286
    Abstract: The present invention is directed to a polymer comprising repeat units derived from 1,3-butadiene and a substituted butadiene of formula I or II wherein R is hydrogen, an alkyl group, aryl group, or a fused cyclic group; and wherein at least 95 percent by weight of the repeat units have a cis-1, 4 microstructure. The invention is further directed to a rubber composition and pneumatic tire comprising the polymer, and a method for making the polymer using a neodymium catalyst system.
    Type: Grant
    Filed: November 5, 2012
    Date of Patent: December 3, 2013
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Margaret McGuigan Flook, Stephan Rodewald
  • Patent number: 8592618
    Abstract: The present invention relates to a kind of novel carbene ligands and ruthenium catalysts, which is highly active and selective for ROMP and RCM reactions, respectively. It discloses the significant electronic and steric effect of different substituted carbene ligands on the catalytic activity and stability of corresponding carbene ruthenium complexes; some of novel ruthenium complexes in the invention can be broadly used as catalysts highly effectively and selective for ROMP and RCM reactions. The invention also relates to preparation of new ruthenium catalysts and the uses in metathesis. Moreover, the invention also provides effective methods of making various functional polymers by ROMP reaction in the presence of new ruthenium catalysts.
    Type: Grant
    Filed: January 8, 2010
    Date of Patent: November 26, 2013
    Assignee: Zannan Scitech Co., Ltd.
    Inventor: Zheng-Yun James Zhan
  • Patent number: 8586160
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: November 19, 2013
    Assignee: Zeon Corporation
    Inventor: Koichi Ikeda
  • Patent number: 8569427
    Abstract: Methods of forming polymer material from rosin-derived material are provided. For example, a plurality of functionalized resin acids having a polymerizable functional group via controlled living polymerization can be polymerized into the polymeric material such that each polymer defines a functional end group and the polymeric material has a polydispersity index of about 1 to about 1.5. The resulting polymers are also described.
    Type: Grant
    Filed: October 8, 2010
    Date of Patent: October 29, 2013
    Assignee: University of South Carolina
    Inventor: Chuanbing Tang
  • Publication number: 20130237630
    Abstract: A heat-resistant cured product is efficiently produced by obtaining a semi-cured product where a curable resin composition containing a (meth)acrylate monomer, a non-conjugated vinylidene group-containing compound and a thermal radical-polymerization initiator is processed by at least one of photoirradiation and heating to give a semi-cured product having a complex viscosity of from 105 to 108 mPa·s at 25° C. and at a frequency of 10 Hz; and putting the semi-cured product in a forming die for pressure formation therein, and heating it therein for thermal polymerization to give a cured product.
    Type: Application
    Filed: April 24, 2013
    Publication date: September 12, 2013
    Applicant: FUJIFILM Corporation
    Inventors: Naoyuki MOROOKA, Rie OKUTSU, Tatsuhiko OBAYASHI, Hiroaki MOCHIZUKI
  • Patent number: 8530134
    Abstract: Disclosed is a process for producing a photoresist polymeric compound. The process includes the steps of polymerizing a monomer mixture containing at least one monomer selected from a monomer (a) containing a group capable of leaving with an acid to allow the polymeric compound to be soluble in an alkali, a monomer (b) having a lactone skeleton, and a monomer (c) having a hydroxyl-containing alicyclic skeleton, to give a polymer; passing a solution containing the polymer through a filter including a porous membrane having an anion-exchange group to give a polymer solution; and thereafter passing the polymer solution through a filter including a porous membrane having a cation-exchange group. The polymer solution before passing through the filter including a porous membrane having a cation-exchange group preferably has a content of metals of 1000 ppb by weight or less per the weight of the polymer.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: September 10, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Tadashi Teranishi
  • Patent number: 8500807
    Abstract: The invention relates to an intraocular lens comprising at least one pharmaceutically-acceptable photochromic polymer that enables all or part of the intraocular lens to change colour reversibly when exposed to light.
    Type: Grant
    Filed: January 6, 2006
    Date of Patent: August 6, 2013
    Assignee: Carl Zeiss Meditec SAS
    Inventors: Pascal Bernard, Marc Dolatkhani, Anne Pagnoux, Christophe Hupin
  • Patent number: 8487055
    Abstract: There is provided a polymer made from a monomer having Formula I: where: R and Y are independently selected from the group consisting of H, D, alkyl, fluoroalkyl, aryl, fluoroaryl, alkoxy, aryloxy, NR?2, R?, R? is a crosslinkable group; R? is independently selected from the group consisting of H, alkyl, fluoroalkyl, aryl, fluoroaryl, and R?; X is a leaving group; Z is C, Si, or N; Q is (ZR?n)b; a is an integer from 0 to 5; b is an integer from 0 to 20; c is an integer from 0 to 4; q is an integer from 0 to 7; and n is an integer from 1 to 2.
    Type: Grant
    Filed: December 5, 2011
    Date of Patent: July 16, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventors: Nora Sabina Radu, Gene M. Rossi, Eric Maurice Smith, Yulong Shen, Weiying Gao, Reid John Chesterfield, Jeffrey A. Merlo, Daniel David Lecloux, Frederick P. Gentry
  • Patent number: 8481166
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: July 9, 2013
    Assignee: Zeon Corporation
    Inventors: Haruhiko Takahashi, Teiji Kohara, Nobuhiro Kudo, Koichi Ikeda, Tokudai Ogawa, Takeshi Hirata
  • Patent number: 8470946
    Abstract: Carbon nanotube (CNT) yarns and sheets having enhanced mechanical strength using infused and bonded nano-resins. A CNT yarn or sheet is surface-activated to produce open bonds in the CNT walls prior to resin infusion. The CNT yarn or sheet is infused with a low viscosity nano-resin that penetrates spaces between individual CNTs and is cured to cross-link and chemically bond to the CNT walls, either directly or through a functional molecule, to bond the individual CNTs or ropes to each other. The nano-resin can comprise dicyclopentadiene having an uncured viscosity near that of water. The cross-linking process involves ring-opening metathesis polymerization and catalysis of the nano-resin in combination with a functionalizing material such as norbornene, to enhance bonding between the carbon and nano-resin. The process increases load capability, tensile strength, and elastic modulus of the yarns and sheets, for use as a structural component in composite materials.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: June 25, 2013
    Assignee: The Regents of the University of California
    Inventor: Lawrence E. Carlson
  • Patent number: 8470510
    Abstract: A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R1, R3, R4, and R6 each independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; R2 and R5 each independently represent hydrogen atom, cyano group, etc.; X1 and X2 each independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; X3 and X4 each independently represent single bond or —CO—; R7, R8, R9, and R10 each independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.
    Type: Grant
    Filed: June 1, 2009
    Date of Patent: June 25, 2013
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Arimichi Okumura, Keizo Inoue, Kazuki Okamoto
  • Patent number: 8431325
    Abstract: A compound of the present invention is represented by the formula (A); wherein R1 represents a hydrogen atom or a C1 to C6 alkyl group; Z1 represents a single bond, —CO—O—* or —CO—O—(CH2)k—CO—O—*; Z2 represents a single bond, *—O—CO—, *—CO—O—, *—O—(CH2)k—CO—, *—CO—(CH2)k—O—, *—O—(CH2)k—CO—O—, *—O—CO—(CH2)k—O— or *—O—CO—(CH2)k—O—CO—; k represents an integer of 1 to 6; * represents a binding position to W; W represents a C4 to C36 (n+1) valent alicyclic hydrocarbon group or a C6 to C18 (n+1) valent aromatic hydrocarbon group, one or more hydrogen atoms contained in the alicyclic hydrocarbon group and the aromatic hydrocarbon group may be replaced by a halogen atom, a C1 to C12 alkyl group, a C1 to C12 alkoxy group, a C2 to C4 acyl group or —OR10; R10 represents a hydrogen atom or a group represented by the formula (R2-2); R2 represents a hydrogen atom, a group represented by the formula (R2-1) or (R2-2); n represents an integer of 1 to 3; R4, R5 and R6 independently represent a C1 to C12 hydrocarbon group
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: April 30, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kazuhiko Hashimoto, Koji Ichikawa
  • Patent number: 8420755
    Abstract: The present invention relates to a novel metallocene compound, a catalyst composition including the compound and an olefin polymer prepared using the same. The metallocene compound and the catalyst composition can be used for preparing the olefin polymer with high copolymerization degree and high molecular weight. Particularly, the block copolymer with high heat resistance can be prepared by using the metallocene compound, and the olefin polymer with high melting point (Tm) can be obtained, even if co-monomer is used at an increased amount in preparation of olefin polymer.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: April 16, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Young-Chul Won, Sung-Ho Chun, Dai-Seung Choi, Dong-Woo Yoo, Bun-Yeoul Lee
  • Patent number: 8415424
    Abstract: An aromatic ring-containing polymer for an underlayer of a resist, including a unit structure represented by Chemical Formula 1:
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: April 9, 2013
    Assignee: Cheil Industries, Inc.
    Inventors: Min-Soo Kim, Hwan-Sung Cheon, Sung-Wook Cho, Seung-Bae Oh, Jee-Yun Song
  • Patent number: 8404792
    Abstract: Described is a cyclobutene polymer comprising: monomeric units of cyclobutene, said cyclobutene having at least one fused ring system substituted thereon, said polymer comprising not more than 10 mol percent ring-opened units of said cyclobutene; and said polymer having a molecular weight of at least 1,000; said polymer optionally copolymerized with a comonomer to form a copolymer therewith. Compositions thereof and methods of making the same are also described.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: March 26, 2013
    Assignee: North Carolina Sate University
    Inventors: Bruce M. Novak, Keitaro Seto
  • Patent number: 8399725
    Abstract: This invention relates to a functionalized co-oligomer having an Mn of 300 to 30,000 g/mol comprising 10 to 90 mol % propylene and 10 to 90 mol % of ethylene, wherein the oligomer has at least X % allyl chain ends, where: 1) X=(?0.94(mole % ethylene incorporated)+100), when 10 to 60 mole % ethylene is present in the co-oligomer, and 2) X=45, when greater than 60 and less than 70 mole % ethylene is present in the co-oligomer, and 3) X=(1.83*(mole % ethylene incorporated)?83), when 70 to 90 mole % ethylene is present in the co-oligomer. This invention also relates to a functionalized homo-oligomer, comprising propylene, wherein the oligomer has: at least 93% allyl chain ends, an Mn of about 500 to about 20,000 g/mol, an isobutyl chain end to allylic vinyl group ratio of 0.8:1 to 1.2:1.0, and less than 100 ppm aluminum. This invention also relates to a process of making functionalized homo- or co-oligomer, comprising propylene, wherein the productivity is greater than 4500 g/mmol Hf (or Zr)/hour.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: March 19, 2013
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Patrick Brant, Donna J. Crowther