Bridged Monomer Patents (Class 526/281)
  • Patent number: 10435497
    Abstract: [Problem] To provide a cyclopentene ring-opening copolymer used in a rubber composition for tires having excellent wet grip performance and low heat buildup; and a method for producing the cyclopentene ring-opening copolymer. To further provide a rubber composition obtained by using the cyclopentene ring-opening copolymer. [Solution] This cyclopentene ring-opening copolymer comprises cyclopentene and a cyclic olefin containing an aromatic ring; the content of the aromatic ring with respect to the total weight of the copolymer is 10 to 40 wt %; and the weight average molecular weight (Mw) is 200,000 to 1,000,000. The cyclopentene ring-opening copolymer alternatively comprises cyclopentene and a norbornene compound; the weight ratio of cyclopentene-derived structural units to all repeating structural units in the copolymer is 40 to 90 wt %, and the weight ratio of norbornene compound-derived structural units is 10 to 60 wt %; and the weight average molecular weight (Mw) is 200,000 to 1,000,000.
    Type: Grant
    Filed: February 26, 2014
    Date of Patent: October 8, 2019
    Assignee: ZEON CORPORATION
    Inventors: Yasuo Tsunogae, Takeshi Sugimura
  • Patent number: 10407554
    Abstract: A film for use in architectural applications (e.g. for roofs, walls or windows of buildings) comprises a polymeric material and an additive, wherein said polymeric material is a fluoropolymer and said additive is selected from titaniumnitride and tungsten oxide. Preferred polymeric materials may be ethylene chlorotrifluoroethylene (ECTFE) or an ethylene-tetrafluoroethylene copolymer (ETFE).
    Type: Grant
    Filed: October 15, 2015
    Date of Patent: September 10, 2019
    Assignee: COLORANT CHROMATICS AG
    Inventor: Steven John Moloney
  • Patent number: 9868820
    Abstract: Certain polyarylene oligomers having improved solubility are useful in forming dielectric material layers in electronics applications.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: January 16, 2018
    Assignees: Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd
    Inventors: Christopher D. Gilmore, Lujia Bu, Peng-Wei Chuang, Deyan Wang, Yerang Kang, Ping Ding, Young Seok Kim, Kathleen M. O'Connell
  • Patent number: 9758609
    Abstract: A monomer having a plurality of tertiary alcoholic hydroxyl groups is provided. A useful polymer is obtained by polymerizing the monomer. From a resist composition comprising the polymer, a negative pattern which is insoluble in alkaline developer and has high etch resistance is formed at a high resolution.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: September 12, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama, Jun Hatakeyama
  • Patent number: 9605361
    Abstract: The invention is: a fiber produced by forming a fiber using pellets, and annealing the fiber at 150 to 220° C., the pellets being formed of a resin powder of a cycloolefin polymer, the resin powder having a loose bulk density of 0.3 to 0.6 g/cc when measured using 100 cc of the resin powder: a method for producing the fiber. The invention provides a method for producing a cycloolefin polymer fiber that exhibits good productivity and strength during spinning, and a low thermal shrinkage ratio.
    Type: Grant
    Filed: October 20, 2014
    Date of Patent: March 28, 2017
    Assignee: ZEON CORPORATION
    Inventors: Shintaro Ikeda, Satoshi Yamada
  • Patent number: 9562136
    Abstract: A method of forming a crosslinked polymer comprising the step of reacting a crosslinkable group in the presence of a polymer, wherein: the crosslinkable group comprises a core unit substituted with at least one crosslinkable unit of formula (I): the crosslinkable group is bound to the polymer or is a crosslinkable compound mixed with the polymer; Ar is aryl or heteroaryl which may be unsubstituted or substituted with one or more substituents independently selected from monovalent substituents and a divalent linking group linking the unit of formula (I) to the core unit; and R is independently in each occurrence H, a monovalent substituent or a divalent linking group linking the unit of formula (I) to the core unit, with the proviso that at least one R is not H.
    Type: Grant
    Filed: July 3, 2012
    Date of Patent: February 7, 2017
    Assignees: Cambridge Display Technology, Ltd., Sumitomo Chemical Company Limited
    Inventors: Martin Humphries, Florence Bourcet, Sheena Zuberi
  • Patent number: 9490117
    Abstract: A method of forming a pattern by directed self-assembly, comprising: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) applying a crosslinkable underlayer composition over the one or more layers to be patterned to form a crosslinkable underlayer, wherein the crosslinkable underlayer composition comprises a crosslinkable polymer comprising a first unit formed from a monomer of the following general formula (I-A) or (I-B): wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; X1 is a monovalent electron donating group; X2 is a divalent electron donating group; Ar1 and Ar2 are trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Ar1 or Ar2; m and n are each an integer of 1 or more; and each R1 is independently a monovalent group; (c) heating the crosslinkable underlayer to form a crosslinked underlayer; (d) forming a self-
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: November 8, 2016
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Jong Keun Park, Jibin Sun, Christopher D. Gilmore, Jieqian Zhang, Phillip D. Hustad, Peter Trefonas, III, Kathleen M. O'Connell
  • Patent number: 9146427
    Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: September 29, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Heon Kim, Sung-Ho Chun, Sung-Joon Oh, Dong-Woo Yoo, Yu-Chan Kang
  • Patent number: 9090729
    Abstract: A polymer containing a recurring unit having an aliphatic polycyclic structure, wherein at least two atoms constituting the ring skeleton of the aliphatic polycyclic structure constitute the main chain of the polymer, and the recurring unit has an aliphatic ring containing a sulfonyl group as the constitutive group of the ring skeleton, has high refractivity, high Abbe's number, high-level heat resistance, high-level light transmittance and low water absorption.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: July 28, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Rie Okutsu, Seiya Sakurai, Tatsuhiko Obayashi, Hiroaki Mochizuki
  • Patent number: 9085647
    Abstract: A thermoplastic transparent resin which is produced by hydrogenating 70% or more of aromatic double bonds of a copolymer. The copolymer is produced by polymerizing a monomer composition containing at least one (meth)acrylic ester monomer and at least one aromatic vinyl monomer and has a molar ratio (A/B) of from 1 to 4 wherein A is a molar amount of a constitutional unit derived from the (meth)acrylic ester monomer and B is a molar amount of a constitutional unit derived from the aromatic vinyl monomer. The thermoplastic transparent resin is suitable for the production of a molded article such as optical article having a good color tone because molding defect is less produced.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: July 21, 2015
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Nobuya Saegusa, Shojiro Kuwahara
  • Patent number: 9068052
    Abstract: A polymerizable composition including a cycloolefin monomer mixture, a metathesis polymerization catalyst, and a crosslinking agent, the cycloolefin monomer mixture including a compound represented by a formula and an additional cycloolefin compound, the polymerizable composition producing a crosslinkable resin having a modulus of elasticity at 100° C. and a modulus of elasticity at 140° C. of 1.0×108 Pa or less when subjected to a ring-opening polymerization reaction at 170° C. or less, and the crosslinkable resin producing a crosslinked resin having a glass transition temperature (Tg) of 160° C. or more when subjected to a crosslinking reaction.
    Type: Grant
    Filed: March 25, 2013
    Date of Patent: June 30, 2015
    Assignee: ZEON CORPORATION
    Inventor: Manabu Hoshino
  • Publication number: 20150147697
    Abstract: A resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R5—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is an acid labile group, R5 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition is of dual-tone type in that an intermediate dose region of resist film is dissolved in a developer, but unexposed and over-exposed regions of resist film are insoluble.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Patent number: 9023965
    Abstract: Nonconjugated conductive polymers absorb radioactive iodine, therefore are useful for protection against nuclear radiation. These polymers have at least one double bond per repeat unit. The ratio of the number of double bonds to the total number of bonds along the polymer chain is less than half. Examples of nonconjugated conductive polymers include: cis-1,4-polyisoprene (natural rubber), trans-1,4-polyisoprene (gutta percha), polybutadiene, polydimethyl butadiene, poly(b-pinene), styrene butadiene rubber (SBR), polyalloocimene, polynorbornene and many others. Through interaction with iodine atoms the double bonds in the nonconjugated polymers transform into radical cations leading to a dark color. The iodine atoms remain (immobile) bound to the polymer chain through the charge-transfer interaction, these polymers are very inexpensive and can be easily processed into any shape, structure and size. Therefore, these are useful for protection against nuclear radiation including radioactive iodine.
    Type: Grant
    Filed: July 11, 2011
    Date of Patent: May 5, 2015
    Inventor: Mrinal Thakur
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Patent number: 9017918
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Patent number: 9005874
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: April 14, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Publication number: 20150084031
    Abstract: A polymerizable monomer represented by the following formula (1) wherein at least one of Ar1 to Ar3 is substituted by a group represented by the following formula (2) and which is substituted by one or more groups comprising a polymerizable functional group. Ar1 to Ar3 are a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms, Ar6 is a substituted or unsubstituted aryl group having 6 to 40 ring carbon atoms and Ar4 and Ar5 are a substituted or unsubstituted arylene group having 6 to 40 ring carbon atoms.
    Type: Application
    Filed: December 2, 2014
    Publication date: March 26, 2015
    Inventors: Mitsuru EIDA, Nobohiro YABUNOUCHI, Yumiko MIZUKI, Masami WATANABE, Akinori YOMOGITA
  • Patent number: 8986923
    Abstract: Embodiments in accordance with the present invention encompass negative-tone, aqueous base developable, self-imagable polymer compositions useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: March 24, 2015
    Assignee: Promerus, LLC
    Inventors: Brian Knapp, Edmund Elce, Hendra Ng, Andrew Bell, Cheryl Burns, Sridevi Kaiti, Brian Kocher, Yogesh Patel, Masanobu Sakamoto, Xiaoming Wu, Wei Zhang
  • Publication number: 20150029587
    Abstract: Provided is a producing method for a retardation film with a reverse wavelength dispersion property, which is highly reliable in terms of a small wavelength dispersion change and is low in display unevenness due to a position dependence of a retardation variation. The production method is designed for a retardation film which satisfies the following formulas (1) and (2): 0.7<Re1[450]/Re1[550]<0.97 - - - (1); and 1.5×10?3<?n<6.0×10?3 - - - (2) (where: Re1[450] and Re1[550] represent, respectively, in-plane retardation values thereof as measured by using light of a wavelengths of 450 nm and light of a wavelength of 550 nm, at 23° C.; and ?n represents an in-plane birefringence thereof as measured by using light of a wavelength of 550 nm).
    Type: Application
    Filed: January 10, 2013
    Publication date: January 29, 2015
    Applicant: NITTO DENKO CORPORATION
    Inventors: Toshiyuki Iida, Takashi Shimizu, Nao Murakami
  • Publication number: 20150018445
    Abstract: A curable resin composition comprising a (meth)acrylate monomer having an aromatic ring, a non-conjugated vinylidene group-containing compound represented by the general formula below, and a thermal or a photo-radical polymerization initiator makes it possible to produce a cured product with minimized occurrence of burring during molding and high product yield after molding. The cured product has good heat coloration resistance and low Abbe's number. R11, R12, R15, and R16 represent a substituent and A represents an atomic group necessary for forming a cyclic structure.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Yuusuke IIZUKA, Tatsuhiko OBAYASHI, Naoyuki MOROOKA, Takayasu NAGAI, Ayumi SOMEYA
  • Publication number: 20150005465
    Abstract: The present invention provides polymers containing an acetoacetate moiety. The polymers may be readily functionalized and the functionalized polymers may be further derivatized to provide a wide variety of useful polymers having desirable chemical and physical properties. The polymers of the present invention may be employed in a wide variety of compositions. wherein R1-R6, w, y, and z are described herein.
    Type: Application
    Filed: December 19, 2012
    Publication date: January 1, 2015
    Inventors: David K. Hood, Surya Kamin, Karyn B. Visscher
  • Publication number: 20150004344
    Abstract: The present invention relates to a polar group-containing olefin copolymer (A?) which is produced through polymerization using a transition metal catalyst, which has a weight-average molecular weight falling within a specific range and which contains a polar group-containing monomer within a specific range; a multinary polar olefin copolymer (A?) indispensably containing a polar monomer component that has a norbornene skeleton and a carboxyl group or an acid anhydride group and having three or more types of monomer units; and a resin composition (C) containing a specific amount of a polar group-containing olefin copolymer (A) and a specific amount of an olefin resin (B).
    Type: Application
    Filed: December 21, 2012
    Publication date: January 1, 2015
    Applicants: JAPAN POLYPROPYLENE CORPORATION, JAPAN POLYETHYLENE CORPORATION
    Inventors: Kazunari Abe, Minoru Kobayashi, Hideshi Uchino, Hiroyuki Shimizu, Tetsuya Morioka, Naoshi Iwama
  • Patent number: 8916332
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on the ?-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: December 23, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Makiko Irie, Tomoyuki Hirano, Daichi Takaki
  • Publication number: 20140335304
    Abstract: A resinous structure derived from fluorine-containing polymers useful as a mold with dimensional stability is disclosed.
    Type: Application
    Filed: May 9, 2014
    Publication date: November 13, 2014
    Applicant: TOYO GOSEI CO., LTD.
    Inventor: Takeshi Osaki
  • Patent number: 8883897
    Abstract: This invention relates to the new functional norbornanyl ester derivative and/or polymer compositions which are easily obtainable by reacting the Diels-Alder adduct of appropriate dienes and dienophiles with carboxylic acids. In particular, this invention relates to a new process for making cyclic chemical raw materials suitable for production coating, ink, adhesive, plasticizer, thermoplastic or thermosetting plastic and functional polymers.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: November 11, 2014
    Assignee: New Functional Polymers LLC
    Inventor: Hui Yu
  • Patent number: 8877424
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: November 4, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
  • Patent number: 8835580
    Abstract: The invention relates to a catalyst for the polymerization of norbornene monomers comprising transition metal complex (A) represented by formula (1); and a method for producing a norbornene (co)polymer, especially a norbornene copolymer containing a monomer unit represented by formulae (2) and (3), wherein a norbornen monomer is homopolyzed or copolymerized in the presence of the polymerization catalyst. Preferable examples of the transition metal complex (A) include (?-allyl){4-(2,6-diisopropylphenylimino)-2-penten-2-olato-?2N,O}palladium and (?-allyl){4-(1-naphthylimino)-2-penten-2-olato-?2N,O}palladium. In the formulae, the symbols are as defined in the description. A norbornene (co)polymer which has excellent transparency, excellent heat resistance, excellently low water absorption and excellent electrical insulation characteristics can be efficiently produced by the present invention.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: September 16, 2014
    Assignee: Showa Denko K.K.
    Inventors: Satoshi Fujibe, Nobuyuki Kibino
  • Patent number: 8829087
    Abstract: Embodiments in accordance with the present invention provide polymers for forming layers/films useful in the manufacture of a variety of types of optoelectronic displays. Such embodiments also provide compositions of such polymers for forming such layers/films where the formed layers/films have high transparency over the visible light spectrum.
    Type: Grant
    Filed: December 9, 2011
    Date of Patent: September 9, 2014
    Assignees: Promerus, LLC, Sumitomo Bakelite Co., Ltd.
    Inventors: Osamu Onishi, Larry F. Rhodes, Nobuo Tagashira
  • Patent number: 8796404
    Abstract: A polymer for an optical film including: a repeating unit A including a repeating unit represented by the following Chemical Formula 1; and a repeating unit B derived from a monomer including an unsaturated bond copolymerizable with the repeating unit A: wherein, in Chemical Formula 1, the variables R1 to R9 are defined herein.
    Type: Grant
    Filed: July 10, 2012
    Date of Patent: August 5, 2014
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries, Inc.
    Inventors: Hyung Jun Kim, Myung-Sup Jung, Won Cheol Jung, Jong-Hoon Won, Kyu Yeol In
  • Patent number: 8765358
    Abstract: A water-soluble resin composition for forming fine patterns comprising water-soluble polymer represented by Chemical Formula 1 as below and the first water-soluble solvent, is coated and heated on a photoresist layer having at least one contact hole to reduce a size of the at least one contact hole. (In Chemical Formula 1, each of R1, R2, R3 and R5 independently represents an alkyl group of C1-30 or an cyclo alkyl group of C3-30 which respectively have one selected from the group consisting of hydrogen, an ether group, an ester group, a carbonyl group, an acetal, an epoxy group, a nitril group, an amine group, and an aldehyde group; each of R4, R6, R7 and R8 independently represents hydrogen or a methyl group; n represents an integer of 0 to 5; a represents a real number of 0.05 to 0.5; each of b, c and d respectively represents a real number of 0 to 0.7; and a+b+c+d=1).
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: July 1, 2014
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sang Wook Park, So Jung Park, Dong-Chul Seo
  • Publication number: 20140163175
    Abstract: Conventional cross-linked cyclic olefin polymers do not have a sufficiently low linear expansion coefficient. A compound having a structure represented by the following formula (a).
    Type: Application
    Filed: July 25, 2012
    Publication date: June 12, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Seiji Okada, Ryo Ogawa
  • Publication number: 20140155511
    Abstract: Sulfur chelated ruthenium compounds represented by the following formula: wherein M indicates the ruthenium metal bound to a benzylidene carbon; R represents C1-C7 alkyl group or optionally substituted aryl; X1 and X2 each independently represent halogen; Y1 and Y2 each independently denote unsubstituted or alkyl-substituted phenyl; and Z independently represents hydrogen, electron withdrawing or electron donating substituent, with m being an integer from 1 to 4, and processes and compositions related thereto.
    Type: Application
    Filed: July 18, 2013
    Publication date: June 5, 2014
    Inventors: N. Gabriel LEMCOFF, Amos BEN-ASULY
  • Patent number: 8735521
    Abstract: A cycloolefin-based copolymer and a hydrogenation process are disclosed, wherein the cycloolefin-based copolymer is prepared by using: a monomer which can be easily and economically obtained by hydrogenating dicyclopentadiene that occupies much of C5 fractions from naphtha cracking; or a monomer which can be obtained by chemically bonding three molecules of cyclopentadiene via Diels-Alder reactions and then hydrogenating the cyclopentadiene. The copolymer can be used in various fields as an amorphous transparent resin.
    Type: Grant
    Filed: February 11, 2009
    Date of Patent: May 27, 2014
    Assignee: Kolon Industries, Inc.
    Inventors: Ik Kyung Sung, Woon Sung Hwang, Jung Hoon Seo, Bun Yeoul Lee, Sung Jae Na, Seung Taek Yu
  • Patent number: 8721950
    Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 13, 2014
    Assignees: Scivax Corporation, Maruzen Petrochemical Co., Ltd.
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Patent number: 8722828
    Abstract: A process (1) for producing a cycloolefin resin film comprising the steps of: the step (I) of mixing a cycloolefin monomer and a metathesis polymerization catalyst to prepare a polymerizable composition (A); the step (II) of coating or impregnating the supporting body with the polymerizable composition (A) at once after the step (I), and the step (III) of polymerizing the polymerizable composition (A) by polymerization; and a process (2) for producing a cycloolefin polymer sheet or film with the thickness of 1 mm or less comprising polymerizing a reactive solution containing a ruthenium complex catalyst, having a hetero atom-containing carbene compound as a ligand, and a cycloolefin monomer by ring-opening metathesis bulk polymerization, wherein the polymerization of the cycloolefin monomer is completed by heating the reactive solution to 100° C. or higher at the heating rate of 20° C./min or more.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: May 13, 2014
    Assignee: Zeon Corporation
    Inventor: Tomoo Sugawara
  • Patent number: 8722157
    Abstract: The present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same. More particularly, the present invention relates to a norbornene monomer, a polynorbornene derivative, a liquid crystal alignment film including the same, and a liquid crystal display device including the same, which have an alignment property by photoreaction, excellent thermal stability and photoreactivity, the increased photo-reaction rate and reliability of the alignment film, thereby showing high manufacturing process efficiency.
    Type: Grant
    Filed: August 17, 2009
    Date of Patent: May 13, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Dai-Seung Choi, Heon Kim, Sung-Ho Chun, Sung-Joon Oh, Dong-Woo Yoo, Yu-Chan Kang
  • Patent number: 8716421
    Abstract: This invention discloses and claims a series of polycyclic monomers and polymers useful in the production of optical waveguides. The polymers of the invention comprise one or more repeating units represented by the formula (IV): Wherein m, X, R1 and R2 are as defined herein. The films formed from the polymers of this invention exhibit significant changes in refractive index (greater than or equal to 0.5%) after exposure to suitable actinic or thermal energy thereby having superior optical transmission performance, which is of importance for modern optical applications such as wave guiding and optical data storage.
    Type: Grant
    Filed: May 23, 2013
    Date of Patent: May 6, 2014
    Assignees: Promerus, LLC, Sumitomo Bakelite Co., Ltd
    Inventors: Kazuyoshi Fujita, Nanae Kawate, Mari Ueda, Larry F Rhodes
  • Publication number: 20140114003
    Abstract: The molded product of the present invention is used for an optical component selected from an f? lens, an imaging lens, and a light guide plate and contains a polymer having an alicyclic structure in a portion or all of repeating structural units. Moreover, when the molded product is dipped in cyclohexane at a concentration of 1 g/mL at 23° C. for 6 hours under stirring, a number of insoluble fine particles contained in the cyclohexane and having a particle size of equal to or larger than 1 ?m and equal to or smaller than 2 ?m that is measured by a liquid-borne particle counter is equal to or less than 200 particles/ml.
    Type: Application
    Filed: July 4, 2012
    Publication date: April 24, 2014
    Applicant: MItsui Chemicals, Inc.
    Inventors: Emi Yoshimoto, Tooru Tanaka
  • Patent number: 8685510
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 1, 2014
    Assignee: Zeon Corporation
    Inventors: Haruhiko Takahashi, Teiji Kohara
  • Patent number: 8647730
    Abstract: A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of main-chain carbon-carbon double bonds of a ring-open polymer obtained by ring-opening polymerization of 2-norbornene. The hydrogenated norbornene ring-open polymer has a weight average molecular weight determined by gel permeation chromatography (GPC) of 50,000 to 200,000, a molecular weight distribution of 1.5 to 10.0, and a melting point of 110 to 145° C. A hydrogenated norbornene ring-open polymer obtained by hydrogenating 80% or more of carbon-carbon double bonds of a ring-open polymer obtained by ring-opening copolymerization of 2-norbornene and a substituent-containing norbornene monomer, wherein the proportion of a repeating unit (A) derived from the 2-norbornene with respect to all repeating units is 90 to 99 wt % and the proportion of a repeating unit (B) derived from the substituent-containing norbornene monomer with respect to all repeating units is 1 to 10 wt %. A resin composition and a molding material.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: February 11, 2014
    Assignee: Zeon Corporation
    Inventors: Nobuhiro Kudo, Koichi Ikeda
  • Publication number: 20140034883
    Abstract: The present invention relates to a polymerizable liquid crystal compound, a liquid crystal composition including the same, and an optically anisotropic body. The polymerizable liquid crystal compound according to the present invention has not only high birefringence but also excellent coating orientation, and thus it is possible to prepare a optically anisotropic body which is thin but superior in optical properties.
    Type: Application
    Filed: June 26, 2013
    Publication date: February 6, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Kyung-Chang SEO, Sung-Ho Chun, Dai-Seung Choi, Mi-Ra Hong, Hyeong-Bin Jang
  • Publication number: 20140026340
    Abstract: An inventive composition that has utility as an article for cleaning a target surface is provided. Embodiments of the inventive composition are readily applied to a substrate to form a cleaning article or form a free-standing article; the composition upon drying forms a matrix having a coefficient of friction of greater than one, and a glass transition temperature that is between 0° C. and 40° C. The matrix is amenable to loading with various additives illustratively including re-enforcing fibers, abrasives, plasticizers, foaming agents, fragrances, and combinations thereof. Embodiments of the inventive composition operate to clean a substrate such as a vehicle and ideally return the same to the original look and feel without requiring excessive work, or requiring the removal of too much material from the surface.
    Type: Application
    Filed: July 24, 2013
    Publication date: January 30, 2014
    Applicant: HTI USA, INC.
    Inventors: Robert E. Buxbaum, Herschel S. Wright
  • Patent number: 8629226
    Abstract: A retardation film, formed by stretching a film having a norbornene-based ring-opening copolymer containing a structural unit (A) represented by the general formula (1) and a structural unit (B) represented by the general formula (2), wherein the content of structural unity (A) is not less than 5 mol % but not more than 95 mol % relative to the total amount of structural units (A) and (B).
    Type: Grant
    Filed: December 24, 2010
    Date of Patent: January 14, 2014
    Assignee: JX Nippon Oil & Energy Corporation
    Inventors: Takeshi Koike, Shinichi Komatsu, Tetsuya Uesaka, Hisashi Sone, Yuji Takahashi
  • Patent number: 8609005
    Abstract: [Problems] To provide a stretched film of an addition polymer consisting of norbornene compounds favorable for use in manufacturing steps of electric insulating parts and optical parts that exhibits excellent film stability, does not suffer from coloration and has a low linear expansion coefficient. [Means for Solving Problems] A stretched film of an addition polymer consisting of norbornene compounds produced by stretching a film of the addition polymer consisting of norbornene compounds and having a linear expansion coefficient of at most 50 ppm/° C. The draw ratio is preferably from 1.2 times to 10 times. The stretched film is preferably a non-crosslinked film. A method for producing the stretched film comprises stretching a film of the addition polymer consisting of norbornene compounds at least in one direction in an inert gas atmosphere within a temperature range of the glass transition temperature (Tg) thereof ±50° C.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: December 17, 2013
    Assignee: Zeon Corporation
    Inventors: Yoshihisa Takeyama, Atsushi Ishiguro
  • Patent number: 8609574
    Abstract: Embodiments in accordance with the present invention encompass methods of forming in situ olefin polymerization catalyst systems, catalysts encompassed by such systems and polymers made using such systems. For such in situ olefin polymerization catalyst systems, a hydrocarbyl magnesium halide is generally contacted with a halohydrocarbyl compound to form a halohydrocarbyl Grignard and such Grignard is generally contacted with a Group 10 metal compound to form an olefin polymerization catalyst which is contacted with one or more olefin monomers to form a polymer therefrom.
    Type: Grant
    Filed: April 23, 2009
    Date of Patent: December 17, 2013
    Assignee: Promerus LLC
    Inventors: Larry F. Rhodes, Luis Francisco Martin, Andrew Bell
  • Patent number: 8604148
    Abstract: This invention relates to a polymer of a cyclic olefin and a vinyl terminated macromonomer, and processes for the production thereof.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: December 10, 2013
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Matthew W. Holtcamp, Donna J. Crowther, Caol P. Huff, Patrick Brant, Jacqueline A. Lovell
  • Patent number: 8603728
    Abstract: A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): wherein Ra is H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is an m valent C2-30 alkylene, C3-30 cycloalkylene, C6-30 arylene, C7-30 aralkylene group, X1 is independently a base-soluble organic group comprising ?-diketone, ?-ester-ketone, ?-di-ester, or a combination comprising at least one of the foregoing; and an additional monomer copolymerizable with the base-soluble monomer of formula (I).
    Type: Grant
    Filed: May 29, 2012
    Date of Patent: December 10, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Gerhard Polhers, Mingqi Li, Chunyi Wu, Cong Liu, Cheng-bai Xu
  • Publication number: 20130320326
    Abstract: A composition for forming an insulating material used in electronic devices which includes, as a polymerizable component, a monomer comprising two or more (meth)acrylic moieties and a polycyclic alicyclic structure.
    Type: Application
    Filed: February 14, 2012
    Publication date: December 5, 2013
    Inventors: Naoki Kurihara, Masatoshi Saito
  • Publication number: 20130323646
    Abstract: A polymer is obtained from copolymerization of a unit having a carboxyl and/or phenolic hydroxyl group substituted with an acid labile group with a hydroxyphenyl methacrylate unit having one acyl, acyloxy or alkoxycarbonyl group. The polymer is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.
    Type: Application
    Filed: May 9, 2013
    Publication date: December 5, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi