Abstract: The object of the present invention is to provide a process for producing an ethylene-?-olefin-polyene copolymer by continuous multistage polymerization which can give an ethylene-?-olefin-polyene copolymer excellent in a form retention property during extrusion. The process for producing an ethylene-?-olefin-polyene copolymer comprises continuously polymerizing ethylene, ?-olefin, and the following polyene (A) and polyene (B) in a solvent in the presence of an olefin polymerization catalyst using a polymerization reaction apparatus comprising two tanks of polymerization reactors connected in series, wherein the polymerization is carried out under specific conditions: polyene (A): at least one polyene selected from norbornadienes and vinylnorbornenes, polyene (B): polyene other than the polyene (A).

Abstract: The invention relates to a process for the production of post-crosslinkable thermoplastic resins by bulk-polymerizing a polymerizable composition (A) comprising (I) a monomer fluid containing a cyclic olefin (?) having two or more metathetical ring-opening reaction sites in the molecule in an amount 10 wt % or above based on the total amount of the monomers or a monomer fluid containing a norbornene monomer and a crosslinking agent, (II) a metathetical polymerization catalyst, and (III) a chain transfer agent; thermoplastic resins obtained by this process; and a process for producing crosslinked resins or crosslinked resin composite materials which comprises laminating such a thermoplastic resin with a substrate at need and then crosslinking the thermoplastic resin. According to the invention, thermoplastic resins which are free from odor due to residual monomers and excellent in storage stability can be efficiently obtained by a simple process of bulk-polymerizing the composition (A).

Abstract: A polymerizable composition which comprises a cycloolefin monomer (A), a filler (B), a polymer (C) having a carboxyl group or a carboxylic acid anhydride group and having an acid value of 0.1 to 100 mgKOH/g, and a metathesis polymerization catalyst (D). The polymerizable composition comprises a cycloolefin monomer and a large amount of a filler, and has a low viscosity and is excellent in fluidity, and further can provide a molded product which is excellent in the lowness of dielectric constant, the lowness of dielectric loss tangent, the lowness of linear expansion coefficient, high heat resistance and adhesiveness, and further is free of bubble inclusion.

Abstract: An acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, dry etching resistance, and pattern shape, and, in particular, excelling in forming contact holes and lines-and-spaces.

Abstract: The present invention provides curable and cured propylene-based elastomers, optionally including a diene, and having isotactic polypropylene crystallinity, a melting point by DSC equal to or less than 110° C., and a heat of fusion of from 5 J/g to 50 J/g. The present invention also provides blend compositions comprising any of the propylene-based elastomers described herein. The present invention also provides compositions comprising any of the propylene-based elastomers described herein and 1 to 100 parts by weight of inorganic filler per 100 parts of polymer. The present invention also provides films, fibers, fabrics, molded objects, and extruded forms which include any of the inventive compositions described herein.

Abstract: The present invention provides a polymerizable composition and a resin formed object capable of providing a crosslinked cycloolefin resin formed object and a crosslinked cycloolefin resin composite excellent in heat resistance, more specifically, a polymerizable composition comprising a cycloolefin mixture containing 0.1 to 50 % by mole of a cycloolefin having, as a substituent group, a monovalent group including an aliphatic carbon-carbon unsaturated bond, a metathesis polymerization catalyst, and a radical generating agent; and formed objects produced by using a polymerizable composition described above which preferably further comprises a chain transfer agent and making the cycloolefin mixture undergo at least ring-opening polymenzation.

Abstract: A flat plate made of a cycloolefin polymer comprising at least 30% by weight, based on the cycloolefin polymer, of repeating units (A) having an alicyclic structure. The repeating units (A) comprises at least 30% by weight, based on the repeating units (A), of repeating units (A-i) having no norbornane structure. The cycloolefin polymer has a weight average molecular weight of 5,000 to 50,000. The flat plate is especially useful as a light guide plate.

Abstract: A production method of an insulating film includes (1) a process of applying, onto a substrate, a film forming composition comprising a compound having a cage structure to form a film and then drying the film; and (2) a process of irradiating the film with an electron beam or an electromagnetic wave having a wavelength greater than 200 nm.

Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

Abstract: The present invention provided a norbornene compound with cross-linkable groups and their derivative polymers, wherein said cross-linkable groups were olefin or epoxy groups. Norbornene polymers with cross-linkable side chain and their block copolymers as well as modified derivatives were prepared via living ring-open metathesis polymerization method. The resulting polymers with excellent solubility and optic properties had narrow molecular weight distribution, well-controlled molecular weight, small refraction ration and high transparency. They were also suitable for preparing hybrid materials with high thermal stability and chemical resistance.

Abstract: A new family of concrete admixture additives can be derived from reacting a mixture of olefins/cyclic olefins-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-maleic anhydride copolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers, or a mixture of styrene-olefins/cyclic olefins-maleic anhydride terpolymers and methoxy polyethylene glycol amines and/or polyethylene glycol monoalkyl ethers. These reactions lead to formation of a kind of carboxylic salt containing polymer, which can be used alone in concrete. Only a small amount of this substance is needed to provide excellent water reduction, high concrete flowability and high early strength.

Abstract: Cyanoadamantyl compounds, polymers that comprise polymerized units of such compounds, and photoresist compositions that comprise such polymers are provided. Preferred polymers of the invention are employed in photoresists imaged at wavelengths less than 250 nm such as 248 nm and 193 nm.

Abstract: The present invention provided a norbornene compound with cross-linkable groups and their derivative polymers, wherein said cross-linkable groups were olefin or epoxy groups. Norbornene polymers with cross-linkable side chain and their block copolymers as well as modified derivatives were prepared via living ring-open metathesis polymerization method. The resulting polymers with excellent solubility and optic properties had narrow molecular weight distribution, well-controlled molecular weight, small refraction ration and high transparency. They were also suitable for preparing hybrid materials with high thermal stability and chemical resistance.

Abstract: A polymer obtained by polymerizing, in a presence of a polymerization initiator, a compound having a cage structure with at least 11 carbon atoms and an ethylenic double bond; a film forming composition containing the polymer; an insulating film formed using the composition; and an electronic device.

Abstract: The present invention provides method of preparing alkene-acrylate-norbornene terpolymer by polymerization of a monomer mixture consisting of alkene, acrylate and norbornene by a radical initiator under the presence of a Lewis acid. In the method of preparing the alkene-acrylate-norbornene terpolymer of the present invention, the terpolymer may be prepared in the mild condition of low temperature and low pressure by using the Lewis acid so that the process is simple and the property of the terpolymer may be easily controlled. In addition, the terpolymer prepared by the method includes the ethylene and the norbornene simultaneously so that it has high glass transition temperature, and the brittle property in forming of film is improved.

Abstract: A polymer having a number average molecular weight (Mn) of from 10,000 to 5,000,000, as determined by gel permeation chromatography and reduced to polystyrene, and repeating units represented by the following formula (1): wherein R1 and R2 may be the same with or different from each other and are substituted or unsubstituted alkyl groups having 1 to 12 carbon atoms, a is a number of 0, 1, 2 or a mixture thereof, and b is a number of 0, 1, 2 or a mixture thereof.

Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.

Abstract: A crosslinkable resin composition is provided which can be a forming material having excellent adhesion to metals and excellent heat resistance. The crosslinkable resin composition comprises; a cycloolefin resin (A) obtained through metathesis polymerization of a cycloolefin monomer in the presence of a compound having two or more vinyl groups in the molecule, and a radical generating agent (B). A crosslinked resin molded product is obtained by crosslinking such a crosslinkable resin composition through heating.

Abstract: Embodiments of the invention provide a class of propylene/?-olefin block interpolymers. The propylene/?-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, Mw/Mn, greater than about 1.3. Preferably, the block index is from about 0.2 to about 1. In addition or alternatively, the block propylene/?-olefin interpolymer is characterized by having at least one fraction obtained by Temperature Rising Elution Fractionation (“TREF”), wherein the fraction has a block index greater than about 0.3 and up to about 1.0 and the propylene/?-olefin interpolymer has a molecular weight distribution, Mw/Mn, greater than about 1.3.

Abstract: The present invention provides a process for producing an ethylene-?-olefin-unconjugated polyene random copolymer in an aliphatic hydrocarbon solvent under conditions of high-temperature and high-activity. The process comprises polymerizing at least the following components (a)-(c) in an aliphatic hydrocarbon solvent in the presence of a catalyst comprising (A) a transition metal complex having at least one cyclopentadienyl skeleton and (B) an organoaluminum compound and (C) a boron compound as co-catalysts wherein at least a part of the polyene (c) and at least a part of the boron compound (C) are previously contacted with each other before they are introduced into a polymerization reactor: (a): ethylene (b): an ?-olefin of 3-20 carbon atoms (c): a polyene.

Abstract: There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic ?-lactone structure defined in the general formula (V).

Abstract: There is disclosed a polymer which at least has the repeating unit represented by the following general formula (1a), and the repeating unit represented by the following general formula (1b) and/or the repeating unit represented by the following general formula (1c), and a positive resist composition comprising the polymer as a base resin.

Abstract: There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0<x?1, 0?y<1 and 0?z<1; and a weight-average molecular weight of the polymer is in the range of 2000 to 200000, and a resin having a (meth)acrylate unit of an alicyclic lactone structure represented by the

Abstract: This invention is based upon the discovery that a catalyst system which is comprised of (a) palladium or a palladium compound and (b) a fluorinated alcohol is effective for polymerizing norbornene-functional monomers into polynorbornene-functional polymers. It has been further discovered that this catalyst system is more effective in polymerizing certain norbornene-functional monomers that are difficult to polymerize, such as norbornene ester monomers, than prior art catalyst systems. The activity of the catalyst systems of this invention can be further improved with respect to polymerizing some monomers by including a Lewis acid and/or a ligand, such as a phosphine or a carbene, in the system. In any case, the catalyst systems of this invention offer the advantage of being soluble in a wide variety of solvents, relatively inexpensive, and capable of polymerizing many norbornene-functional monomers that are difficult to polymerize with conventional catalyst systems.

Abstract: It is an object of the present invention to provide a non-conjugated cyclic diene and a non-conjugated cyclic diene composition which enable the production of a polymer based on non-conjugated cyclic diene which makes it possible to produce a (co)polymer at a high degree of polymerization activity, and a method of producing a polymer based on non-conjugated cyclic diene which makes it possible to produce a (co)polymer at a high degree of polymerization activity. A non-conjugated cyclic diene is used which meets at least one of the following requirements: (1) it contains a compound having a seven-membered cyclic triene hydrocarbon structure in a specific amount or less and (2) it contains a conjugated polyene compound having an eight-membered bicyclic hydrocarbon structure in a specific amount.

Abstract: This invention relates to olefin polymerization processes for polymerizing ethylene, higher alpha-olefin comonomer and dienes, especially vinyl norbornene, and especially process for producing amorphous or semi-crystalline polymers such as EPDM. The invention also relates to the novel polymers produced by such processes. The invention furthermore relates to articles of manufacture with an improved balance of toughness and curing properties.

Abstract: The present invention provided a norbornene compound with cross-linkable groups and their derivative polymers, wherein said cross-linkable groups were olefin or epoxy groups. Norbornene polymers with cross-linkable side chain and their block copolymers as well as modified derivatives were prepared via living ring-open metathesis polymerization method. The resulting polymers with excellent solubility and optic properties had narrow molecular weight distribution, well-controlled molecular weight, small refraction ration and high transparency. They were also suitable for preparing hybrid materials with high thermal stability and chemical resistance.

Abstract: Novel ester compounds having formula (1) wherein A1 is a polymerizable functional group having a double bond, A2 is furandiyl, tetrahydrofurandiyl or oxanorbornanediyl, R1 and R2 each are a monovalent hydrocarbon group, or R1 and R2 may bond together to form an aliphatic hydrocarbon ring with the carbon atom, and R3 is hydrogen or a monovalent hydrocarbon group which may contain a hetero atom are polymerizable into polymers. Resist compositions comprising the polymers are sensitive to high-energy radiation, have an improved sensitivity, resolution, and etching resistance, and lend themselves to micropatterning with electron beams or deep-UV rays.

Abstract: The present invention relates to novel first to fourth lactone compounds. The first lactone compound is represented by the formula (1), in the formula, X represents CH2, CH2CH2, O, S or NR1, and R1 represents hydrogen atom, a straight-chain, branched or cyclic alkyl group of a carbon number of 1–10. Hydrogen(s) of the alkyl group may partially or entirely be replaced with fluorine atom(s). Furthermore, a part of the alkyl group may contain an atomic group containing oxygen atom, sulfur atom, nitrogen atom, carbon-carbon double bond, carbonyl group, hydroxy group or carboxyl group.

Abstract: This invention is based upon the discovery that a catalyst system which is comprised of (a) palladium or a palladium compound and (b) a fluorinated alcohol is effective for polymerizing norbornene-functional monomers into polynorbornene-functional polymers. It has been further discovered that this catalyst system is more effective in polymerizing certain norbornene-functional monomers that are difficult to polymerize, such as norbornene ester monomers, than prior art catalyst systems. The activity of the catalyst systems of this invention can be further improved with respect to polymerizing some monomers by including a Lewis acid and/or a ligand, such as a phosphine or a carbene, in the system. In any case, the catalyst systems of this invention offer the advantage of being soluble in a wide variety of solvents, relatively inexpensive, and capable of polymerizing many norbornene-functional monomers that are difficult to polymerize with conventional catalyst systems.

Abstract: The present invention provides for a photoresist composition comprising a mixture of two different copolymers.

Abstract: Disclosed herein is a method of preparing an EP(D)M elastomer, which includes pre-cooling a reactive solvent to ?80 to ?100° C.; and polymerizing ethylene, at least one higher ?-olefin having 3 to 18 carbons, and selectively, at least one conjugated or non-conjugated diene having 5 to 15 carbons, in the presence of the reactive solvent. According to the method of the current invention, the yield of the EP(D)M elastomer is drastically increased even though a conventional preparation device is used unchanged. Further, methods of controlling the yield of the EP(D)M elastomer and of recovering the EP(D)M elastomer are provided.

Abstract: According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.

Abstract: This invention relates to the synthesis of Mqn-containing monomeric compounds, comprising a polymerizable moiety, an Mqn-moiety, and an optional chemical spacer therebetween, wherein q, in each instance, comprises an 8-hydroxyquinoline residue, M is a metal such as Mg, Zn, Al, Ga, or In, and n is 2 or 3 as the valence of the metal requires. For example, the polymerization of Znq2- or Alq3-containing monomers, in the presence or absence of a co-monomer, provided a Znq2- or Alq3-containing polymer, which retained the optical properties of Znq2 or Alq3 in solution, respectively. The Mqn-containing polymers may be used in, among other things, the fabrication of light-emitting diodes (LEDs).

Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention contain in specified molar ratios both nitrile and photoacid labile groups that have an alicyclic moiety, particularly a bridged bicyclic or tricyclic group or other caged group. Polymers and resists of the invention can exhibit substantial resistance to plasma etchants.

Abstract: A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.

Abstract: A copolymer of ethylene and a vinyl compound (I) represented by the general formula CH2?CH—R, wherein R is a saturated hydrocarbon group, a steric parameter Es of the substituent R is from ?2.77 to ?1.64 and a steric parameter B1 of the substituent R is from 1.53 to 2.90, a molded article comprising the same, an adhesive comprising the same as an effective ingredient an laminate comprising the same.

Abstract: Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Abstract: An endless positive drive power transmission belt is described for use with a cooperating pulley member, wherein the endless positive drive transmission belt comprises an elastomeric body portion, a plurality of longitudinally extending spaced apart tensile members, and a layer of wear-resistant fabric material positioned on the cooperating pulley member engaging surface of said belt, wherein a layer of a high ethylene-containing elastomer composition is bonded to a surface of the layer of wear-resistant fabric material in such a manner that the surface layer of the high ethylene-containing elastomer is disposed between the layer of wear-resistant fabric material and the cooperating pulley member. A method for coating a wear-resistant fabric material with a high ethylene-containing elastomer is also described.

Abstract: Fluorinated copolymers useful in photoresist compositions and associated processes for microlithography are described. These copolymers are comprised of a fluoroalcohol or protected fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in basic media to these materials and a repeat unit derived from an acrylate monomer containing a fluoroalkyl group or a hydroxyl substituted alkyl group. The materials of this invention have high UV transparency, particularly at 193 and 157 nm, which makes them highly useful for lithography at these short wavelengths.

Abstract: A ternary copolymer comprising units of ?-trifluoromethylacrylic carboxylate having acid labile groups substituted thereon, units of ?-trifluoromethylacrylic carboxylate having adhesive groups substituted thereon, and units of styrene having hexafluoroalcohol pendants is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, and is suited for lithographic microprocessing.

Abstract: There is provided an ethylene-?-olefin-non-conjugated diene copolymer rubber satisfying the following requirements (1) to (4): (1) a ratio of a Z-average molecular chain length (Az) measured according to a gel permeation chromatography to a number average molecular chain length (An), Az/An, of the ethylene-?-olefin-non-conjugated diene copolymer rubber is from 20 to 30, (2) a ratio of a weight average molecular chain length (Aw), which is an index of a molecular weight distribution, to the number average molecular chain length (An), Aw/An, of the ethylene-?-olefin-non-conjugated diene copolymer rubber is more than 5, (3) a unimodal or bimodal molecular weight distribution structure having a molecular chain length component, which component is present in a maximum amount in a range of 3.8<Log Aw<4.5, exists in the ethylene-?-olefin-non-conjugated diene copolymer rubber, and (4) a viscosity (ML1+4, 121° C.

Abstract: The present invention relates to a shaped article for high purity applications containing at least one peroxide curable compound containing a substantially gel-free butyl polymer. In another of its aspects, the present invention relates to a sealing material and a medical device containing at least one peroxide-curable compound containing a substantially gel-free butyl polymer. In still another of its aspects, the present invention relates to a fuel cell containing at least one peroxide curable compound containing a substantially gel-free butyl polymer. In still another of its aspects, the present invention relates to halogen-free and sulfur-free shaped articles.

Abstract: The present invention relates to a method for preparing homo- and co-polymers having high molecular weights in high yields by polymerizing cyclic olefin compounds using a complex prepared by mixing a nickel salt compound, an organoaluminoxane compound, and at least one fluorine-containing compound.

Abstract: In accordance with the present invention, there are provided novel heterobifunctional monomers and users for the same. Invention compounds have many of the properties required by the microelectronics industry, such as, for example, hydrophobicity, high Tg values, low dielectric constant, ionic purity, low coefficient of thermal expansion (CTE), and the like. These properties result in a thermoset that is particularly well suited to high performance applications where typical operating temperatures are often significantly higher than those at which prior art materials were suitable. Invention compounds are particularly ideal for use in the manufacture of electronic components, such as, for example, printed circuit boards, and the like.

Abstract: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R?)zM(L?)x(L?)y]b[WCA]d wherein [(R?)zM(L?)x(L?)y] is a cation complex where M represents a Group 10 transition metal; R? represents an anionic hydrocarbyl containing ligand; L? represents a Group 15 neutral electron donor ligand; L? represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.

Abstract: A process for producing alkali metal polymaleimide salts by alkaline hydrolysis of maleimide polymers prepared by polymerization of maleimide monomers in the presence of a metal oxide and alcohol initiator or a base. In particular, the process produces alkali metal polymaleimide salts with particular ratios of C—N and C—C connected maleimide-derived monomer units which are dependent on the particular initiator used to synthesize the maleimide polymer. The alkali metal polymaleimide salts, which have chelating and anti-scaling properties, are useful as chelating agents and detergent builders and as such are suitable biodegradable replacements for synthetic polymers and sodium polyaspartate.

Abstract: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

Abstract: A copolymer of an acrylic monomer having at least one C6-20 alicyclic structure with a norbornene derivative or styrene monomer having a hexafluoroalcohol pendant is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-energy radiation below 200 nm, has excellent sensitivity, transparency and dry etching resistance, and is suited for lithographic microprocessing.