From S-containing Monomer Patents (Class 526/286)
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Publication number: 20080305009Abstract: Novel pyridinium salts functionalized with boronic acid and methods of making them are disclosed. When combined with a fluorescent dye, the compounds are useful in the detection of polyhydroxyl-substituted organic molecules.Type: ApplicationFiled: May 1, 2008Publication date: December 11, 2008Applicant: Glumetrics Inc.Inventors: Soya Gamsey, Ritchie A. Wessling
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Patent number: 7455952Abstract: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.Type: GrantFiled: April 14, 2005Date of Patent: November 25, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Yuji Harada
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Patent number: 7449439Abstract: A water-soluble thickener which is highly effective even in thickening strongly acidic aqueous solutions and has excellent stability in such solutions. It comprises a water-soluble copolymer having a weight-average molecular weight of 6,000,000 or higher obtainable by polymerizing a monomer mixture which comprises 2-acrylamido-2-methylpropanesulfonic acid and/or a salt thereof and acrylic acid and/or a salt thereof as essential components and optionally one or more other copolymerizable monomer components including the compound represented by the following Formula (1) and/or a salt thereof, wherein the 2-acrylamido-2-methylpropanesulfonic acid and/or a salt thereof represents 20 mol % or more of all the monomers. (wherein n is an integer of 1 to 12).Type: GrantFiled: October 6, 2003Date of Patent: November 11, 2008Assignee: Toagosei Co., Ltd.Inventors: Kenji Ito, Yoshio Mori
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Patent number: 7442749Abstract: There are disclosed a novel sulfur-containing poly(unsaturated carboxylic acid) and its uses and production process. A sulfur-containing poly(unsaturated carboxylic acid) having a weight-average molecular weight (Mw) of 500 to 4,500 and a molecular weight distribution (Mw/Mn) of not more than 2.Type: GrantFiled: August 15, 2003Date of Patent: October 28, 2008Assignee: Nippon Shokubai Co., Ltd.Inventors: Atsuro Yoneda, Takahiro Tsumori, Koji Fukuhara, Shigeru Yamaguchi
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Publication number: 20080242814Abstract: A method of preparing oligomeric compounds from polyfunctional reactants in the presence of heterogeneous catalysts that exhibit size selective characteristics, such that further reaction between first generation products or first generation products and reactants is less favored than between the starting reactants is disclosed. Preparation of oligomeric polyacrylate compounds in a liquid solution using these catalysts is also disclosed comprising reacting X—H acidic Michael donor compounds with unsaturated Michael acceptor compounds containing more than one unsaturated group.Type: ApplicationFiled: May 1, 2008Publication date: October 2, 2008Applicant: SUN CHEMICAL CORPORATIONInventor: Steve Nahm
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Publication number: 20080226584Abstract: The present invention relates to a substrate having one or more antimicrobial or antistatic properties. Such properties are imparted by applying a coating or film formed from a cationically-charged polymer composition. The polymer composition includes a noncationic ethylenically unsaturated monomer and an ethylenically unsaturated monomer capable of providing a cationic charge to the polymer composition. Optionally, the polymer composition includes a steric stabilization component incorporated into the cationically-charged polymer composition. The present invention also relates to a personal care product and polymeric material comprising a base polymer blended with the above cationically-charged polymer composition.Type: ApplicationFiled: May 6, 2008Publication date: September 18, 2008Inventor: Venkataram Krishnan
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Publication number: 20080221289Abstract: The present invention relates to compounds of the general formula I in which the variables are each defined as follows: Z1, Z2 are each independently hydrogen, optionally substituted C1-C20-alkyl in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, or reactive radicals by means of which polymerization can be brought about, A1, A2 are each independently spacers having from 1 to 30 carbon atoms, in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, Y1, Y2 are each independently a chemical single bond, oxygen, sulfur, —CO—, —O—CO—, —CO—O—, —S—CO—, —CO—S—, —NR—CO— or —CO—NR—, Y3, Y4 are each independently a chemical single bond, oxygen, sulfur, —CR?CR—, —C?C—, —CR?CR—CO—O—, —O—CO—CR?CR—, —C?C—O—, —O—C?C—, —CH2—CH2—, —CH2—O—, —O—CH2—, —CH2—S—, —S—CH2—, —CO—, —O—CO—, —CO—O—, —S—CO—, —CType: ApplicationFiled: May 10, 2006Publication date: September 11, 2008Applicant: BASF AKTIENGESELLSCHAFTInventors: Olivier Enger, Rudiger Sens, Christian Lennartz, Robert Parker
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Publication number: 20080214711Abstract: A hard coat composition comprising a cationic acrylic polymer is disclosed. The hard coat is suitable for application to a substrate, and can be used without an adhesive promoting primer.Type: ApplicationFiled: May 7, 2008Publication date: September 4, 2008Applicant: PPG INDUSTRIES OHIO, INC.Inventors: Shan Cheng, David R. Fenn, Brian K. Rearick, Steven R. Zawacky
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Patent number: 7417096Abstract: A new, facile, general one-phase method of generating thiol-functionalized transition metal nanoparticles and surface modified by (co)polymers synthesized by the RAFT method is described. The method includes the steps of forming a (co)polymer in aqueous solution using the RAFT methodology, forming a collidal transition metal precursor solution from an appropriate transition metal; adding the metal precursor solution or surface to the (co)polymer solution, adding a reducing agent into the solution to reduce the metal colloid in situ to produce the stabilized nanoparticles or surface, and isolating the stabilized nanoparticles or surface in a manner such that aggregation is minimized. The functionalized surfaces generated using these methods can further undergo planar surface modifications, such as fuctionalization with a variety of different chemical groups, expanding their utility and application.Type: GrantFiled: October 25, 2006Date of Patent: August 26, 2008Assignee: University of Southern MississippiInventors: Charles L. McCormick, III, Andrew B. Lowe, Brent S. Sumerlin
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Publication number: 20080175758Abstract: A biochip substrate capable of realizing the high detection accuracy by restricting a nonspecific adsorption or bonding of a substance to be detected, when used for a detection or analysis of protein, nucleic acids and the like. The biochip substrate is for fixing a biologically active substance on a surface of a solid substrate, and characterized in that it has a layer comprising a polymer compound obtained by copolymerizing an ethylenically unsaturated polymerizable monomer having an alkylene glycol residue, an ethylenically unsaturated polymerizable monomer having a functional group for fixing a biologically active substance and an ethylenically unsaturated polymerizable monomer having a cross-linkable functional group, on the surface of the substrate.Type: ApplicationFiled: March 14, 2006Publication date: July 24, 2008Inventors: Mitsutaka Matsumoto, Sumio Shibahara, Takayuki Matsumoto, Kanehisa Yokoyama, Sohei Funaoka, Daisuke Masuda, Michael Patrick Coleman, Dominic Zichi
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Publication number: 20080152985Abstract: A proton conducting polymer includes a polymer backbone and a heterocyclic compound attached to the polymer backbone. The heterocyclic compound includes a sulfonyl functionality bonded to heterocyclic compound.Type: ApplicationFiled: December 21, 2006Publication date: June 26, 2008Applicants: Toyota Engineering & Manufacturing North America, Inc., Georgia Tech Research CorporationInventors: Siwen Li, Zhen Zhou, Yuelan Zhang, Meilin Liu, Wen Li
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Publication number: 20080139770Abstract: Copolymers which comprise dicarboxylic acid units modified with —SR, —CSNR2 and/or —CN units, and also at least one further comonomer. Processes for preparing them by polymer-analogous reaction, and their use as corrosion inhibitors.Type: ApplicationFiled: January 24, 2006Publication date: June 12, 2008Applicant: BASF AktiengesellschaftInventors: Alexander Gothlich, Guido Vandermeulen, Helmut Witteler, Monica Fernandez Gonzalez
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Patent number: 7378477Abstract: The present invention concerns inorganic deposit inhibitors, and particularly of calcium carbonate and barium sulphate in oil wells. It also concerns certain copolymers particularly suitable for this application, particularly in high pressure/high temperature conditions (HP/HT).Type: GrantFiled: August 12, 2004Date of Patent: May 27, 2008Assignee: Ceca S.A.Inventors: Christian Hurtevent, Rosangela Pirri
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Publication number: 20080114139Abstract: In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. According to the invention, in a copolymer for semiconductor lithography, which is obtained by copolymerizing a monomer having a hydroxyl group and a monomer having no hydroxyl group, when a copolymer of which composition of a hydroxyl group-containing repeating unit is controlled is used, the object can be achieved.Type: ApplicationFiled: April 28, 2005Publication date: May 15, 2008Applicant: MARUZEN PETROCHEMICAL CO., LTD.Inventors: Takanori Yamagishi, Takayoshi Okada, Satoshi Yamaguchi, Kiyomi Miki
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Patent number: 7371804Abstract: Compositions comprising a matrix polymer and a mixture of monomers are used for making polymer mixtures containing the matrix polymer and a second polymer formed from the monomer mixture. Preferably, the matrix polymer comprises a polyester, polystyrene, polyacrylate, thiol-cured epoxy polymer, thiol-cured isocyanate polymer, or mixtures thereof. Preferably, the monomer mixture comprises a thiol monomer and at least one second monomer selected from the group consisting of ene monomer and yne monomer. The compositions may be used to fabricate optical elements such as lenses.Type: GrantFiled: September 7, 2004Date of Patent: May 13, 2008Assignee: Ophthonix, Inc.Inventors: Jagdish Jethmalani, Andreas W. Dreher, Gomaa Abdel-Sadek, Jeffrey Chomyn, Jieming Li, Maher Qaddoura
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Publication number: 20080107997Abstract: There is provided an anti-reflective coating forming composition comprising a solid content and a solvent, wherein a proportion of sulfur atom in the solid content is 5 to 25 mass %. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, and can use in lithography process by use of a light having a short wavelength such as F2 excimer laser beam (wavelength 157 nm) or ArF excimer laser beam (wavelength 193 nm), etc.Type: ApplicationFiled: March 15, 2005Publication date: May 8, 2008Applicant: NISSAN CHEMICAL INDUSTRIES LTD.Inventors: Yoshiomi Hiroi, Takahiro Kishioka, Kelsuke Nakayama, Rikimaru Sakamoto
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Publication number: 20080097059Abstract: A resin composition for making a loudspeaker cone, including from 50 to 99.9 weight parts of an alkyl acrylate (A) represented by the following formula (I), from 0.1 to 50 weight parts of a vinyl unsaturated monomer (B), and an emulsifying agent (C) present in an amount of from 0.1 to 10 weight parts based on the combined weight parts of (A) and (B), wherein R1 represents a hydrogen atom, or a C1-C12 linear or branched alkyl group, alkenyl group, alkynyl group or alcoholic group, and R2 represents a hydrogen atom, or a C1-C3 linear or branched alkyl group.Type: ApplicationFiled: October 20, 2006Publication date: April 24, 2008Inventors: Wen-Shyang Hsu, Hiroshi Ohara
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Patent number: 7345123Abstract: A composition comprises a copolymer comprising repeating units derived from at least one co-reactant comprising two or more acrylate groups and repeating units derived from a fluoroacrylate comprising the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: C4F9—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, n=1 to 5, y 32 0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoroacrylate monomer having 2 to about 30 carbon atoms in its alkylene portion; wherein the composition is coatable.Type: GrantFiled: December 28, 2004Date of Patent: March 18, 2008Assignee: 3M Innovative Properties CompanyInventors: Zai-Ming Qiu, George G. I. Moore, John C. Clark, Ramesh C. Kumar
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Patent number: 7342082Abstract: Soluble polymers and methods for the preparation thereof, wherein the polymers of the present invention have pendant acylsulfonamide amine-reactive groups that can be used for the capture of amine containing materials.Type: GrantFiled: December 17, 2004Date of Patent: March 11, 2008Assignee: 3M Innovative Properties CompanyInventors: Karl E. Benson, G. Marco Bommarito, Albert I. Everaerts, Brinda B. Lakshmi, Charles M. Leir, George G. I. Moore, Lang N. Nguyen, Rahul Shah, Peter A. Stark
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Patent number: 7332530Abstract: The present invention relates to a proton-conducting polymer membrane comprising polymers containing sulfonic acid groups, obtainable by a process comprising the steps of A) mixing vinyl-containing sulfonic acid with one or more aromatic tetraamino compounds with one or more aromatic carboxylic acids, their esters, their acid halides or their acid anhydrides, containing at least two acid groups per carboxylic acid monomer, and/or mixing vinyl-containing sulfonic acid with one or more aromatic and/or heteroaromatic diaminocarboxylic acids, their esters, their acid halides or their acid anhydrides, B) heating the mixture obtainable according to step A) under inert gas to temperatures of up to 350° C., to form polyazole polymers, C) applying a layer to a support, using the mixture according to step A) and/or B), D) polymerizing the vinyl-containing sulfonic acid present in the sheetlike structure obtainable according to step C).Type: GrantFiled: July 31, 2003Date of Patent: February 19, 2008Assignee: Celanese Ventures GmbHInventors: Joachim Kiefer, Oemer Uensal, Gordon Calundann
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Patent number: 7312290Abstract: Curable formulations comprising: (a) at least one multifunctional acrylate having a functionality of at least two, (b) at least one mono-acrylate monomer, (c) at least one heteroatom-containing diacrylate, wherein the heteroatom is sulfur or selenium; and (d) a curing agent, have been discovered. The curable formulations show promise as precursors to high refractive index materials suitable for use in light management devices and other optical devices. In addition the novel curable formulations are useful for producing coatings, which may be useful in forming display films, in particular brightness enhancing display films.Type: GrantFiled: September 24, 2004Date of Patent: December 25, 2007Assignee: General Electric CompanyInventors: Bret Ja Chisholm, James Edward Pickett
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Patent number: 7300973Abstract: A composition comprising expandable cross linked polymeric microparticles having an unexpanded volume average particle size diameter of from about 0.05 to about 10 microns and a cross linking agent content of about 6,000 to less than about 9,000 ppm of labile cross linkers and from 0 to about 300 ppm of non-labile cross linkers, useful for modifying the permeability of subterranean formations and increasing the mobilization and/or recovery rate of hydrocarbon fluids present in the formations.Type: GrantFiled: September 20, 2002Date of Patent: November 27, 2007Assignee: Nalco CompanyInventors: Kin-Tai Chang, Harry Frampton, James C. Morgan
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Patent number: 7294657Abstract: A composition comprising a phenylthioethylacrylate, a multifunctional (meth)acrylate, a curing agent, wherein the phenylthioethylacrylate comprises less than about 400 parts per million tin and less than about 2 percent by weight of the corresponding phenylthioethanol. The composition may further comprise at least one unsaturated acid.Type: GrantFiled: March 7, 2005Date of Patent: November 13, 2007Assignee: General Electric CompanyInventors: Daniel Robert Olson, Dennis Joseph Coyle, Christian Andrew Huntley, Bret Ja Chisholm, Paul Michael Smigelski, Jr., Alvin Un-Teh Chen
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Patent number: 7291688Abstract: A copolymer comprises repeating units derived from at least one co-reactant comprising two or more mercapto functional groups, and repeating units derived from a fluoroacrylate comprising the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: C4F9—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, n=1 to 5, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoroacrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.Type: GrantFiled: December 28, 2004Date of Patent: November 6, 2007Assignee: 3M Innovative Properties CompanyInventors: Zai-Ming Qiu, John C. Clark, Ramesh C. Kumar
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Polymerizable ester having sulfonamide structure, polymer, resist composition and patterning process
Patent number: 7285368Abstract: Novel ester compounds having a sulfonamide structure are polymerizable into polymers having improved transparency at wavelength of up to 300 nm, especially ArF excimer laser light, and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.Type: GrantFiled: June 10, 2004Date of Patent: October 23, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeru Watanabe, Takeshi Kinsho -
Patent number: 7268197Abstract: A fluorochemical compound comprises the reaction product of: (a) the reaction product of: (i) at least one fluorochemical alcohol represented by the formula: CnF2n+1—X—OH wherein: n=1 to 6, R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, y=0 to 6, q=1 to 8; and (ii) at least one unbranched symmetric diisocyanate, and (b) at least one co-reactant comprising two or more functional groups that are capable of reacting with an isocyanate group.Type: GrantFiled: December 12, 2005Date of Patent: September 11, 2007Assignee: 3M Innovative Properties CompanyInventors: George G. I. Moore, Ramesh C. Kumar, Zai-Ming Qiu, John C. Clark, Chetan P. Jariwala, Thomas P. Klun
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Patent number: 7256245Abstract: Provided is a polymeric fluorescent substance showing fluorescence in solid state, which has a specific carrier drift mobility, a specific repeating unit, and specific number-average molecular weight. The polymeric fluorescent substance is excellent in solubility to organic solvents, and has higher efficiency and longer lifetime in applying as a polymer LED.Type: GrantFiled: June 9, 2003Date of Patent: August 14, 2007Assignee: Sumitomo Chemical Company, LimitedInventors: Masato Ueda, Takanobu Noguchi
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Patent number: 7253241Abstract: In one aspect, the invention provides a water-based release coating composition comprising a mixture of (A.) from about 5 to about 100 wt % of a polymer comprising the reaction product of (a.) from 1 to about 15 wt % of a fluorinated monomer selected from the group consisting of monomers according to the general formula: RfX—OC(O)—C(R)?CH2, wherein Rf represents a perfluorinated aliphatic group having 3 or 4 carbon atoms, X is an organic divalent linking group, and R represents a hydrogen or methyl group, (b.) from about 40 to about 70 wt % of an alkyl (meth)acrylate, wherein the alkyl group contains from 16 to 22 carbon atoms, (c.) from about 3 to about 20 wt % of (meth)acrylic acid, (d.) from about 20 to about 40 wt % acrylonitrile, and (e.) from 0 to about 15 wt % of vinyl monomer, other than acrylonitrile, wherein the sum of (a.) through (e.) equals 100%; and (B.) from 0 to about 95 wt % of an extender polymer, wherein the sum of (A.) and (B.Type: GrantFiled: December 28, 2004Date of Patent: August 7, 2007Assignee: 3M Innovative Properties CompanyInventors: James P. DiZio, David J. Kinning, George G. I. Moore
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Patent number: 7214752Abstract: Homopolymers suitable for storage of information provided optically are disclosed.Type: GrantFiled: November 29, 2004Date of Patent: May 8, 2007Assignee: Bayer MaterialScience AGInventors: Horst Berneth, Uwe Claussen, Serguei Kostromine, Ralf Neigl, Hans-Joachim Vedder
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Patent number: 7205368Abstract: Dithiocarbonate derivatives are disclosed, along with a process for preparing the same. The dithiocarbonate compounds can be utilized as initators, chain transfer agents and/or terminators in controlled free radical polymerizations. The dithiocarbonates can be used to produce polymers having narrow molecular weight distribution. Advantageously, the compounds of the present invention can also introduce functional groups into the resulting polymers. The dithiocarbonate compounds have low odor and are substantially colorless.Type: GrantFiled: October 23, 2002Date of Patent: April 17, 2007Assignee: Noveon, Inc.Inventor: John Ta-Yuan Lai
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Patent number: 7205362Abstract: The present invention relates to a process for controlled radical polymerization using an organosulfur reversible chain transfer agent which consists in preparing polymers having a molar weight of greater than 100 000 g/mol, with a polydispersity index of less than 1.2 for molar weights of less than 200 000 g/mol and of less than 1.4 for molar weights of greater than 200 000 g/mol, with a degree of conversion of monomer of greater than 75% and a polymerization time of less than 8 h, characterized by the control of the flux of initiator radicals in the polymerization medium. The control of the flux of initiator radicals can be achieved by the use of two appropriate polymerization temperatures T1 and T2 or by use of an initiator having a decomposition rate constant which is greater than that of azobisisobutyronitrile at the same temperature.Type: GrantFiled: December 12, 2003Date of Patent: April 17, 2007Assignee: bioMérieuxInventors: Amaud Favier, Marie-Therese Charreyre
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Patent number: 7199197Abstract: Fluoroacrylates comprise the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: CnF2n+1—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoro acrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.Type: GrantFiled: December 28, 2004Date of Patent: April 3, 2007Assignee: 3M Innovative Properties CompanyInventors: Gregg A. Caldwell, John C. Clark, David J. Kinning, Alan R. Kirk, Thomas P. Klun, Ramesh C. Kumar, Roger A. Mader, George G. I. Moore, Zai-Ming Qiu, Richard B. Ross
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Patent number: 7196151Abstract: A non crosslinked, covalently crosslinked and/or ionically crosslinked polymer, having repeating units of the general formula (1) —K—R—??(1) In which K is a bond, oxygen, sulphur, the radical R is a divalent radical of an aromatic or heteroaromatic compound.Type: GrantFiled: May 24, 2004Date of Patent: March 27, 2007Inventor: Thomas Häring
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Patent number: 7183367Abstract: There is provided a polymer having a side chain of general formula (I) in which R may be any suitable alkyl, oxyalkyl, aryl or oxyaryl linking group R is preferably C1-6 alkyl (especially —CH2—), a benzene group or a group —CH2—O-Phe-. Generally, the side chain will be attached to an ethylene moiety forming part of the backbone of the polymer. Preferred polymers include polystyrene. The polymer is useful as a support for solid phase chemical reactions especially combinatorial chemical synthesis.Type: GrantFiled: March 12, 2004Date of Patent: February 27, 2007Assignee: N.V. OrganonInventors: David Gani, Friedrich E. Kroll, Michael J. Plater, John R. Morphy, David C. Rees
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Patent number: 7160968Abstract: The invention relates to solid polyelectrolyte membranes and processes for their production. As solid polyelectrolyte materials, there have been known fluoropolymers which have perfluoroskeletons and side chains bearing sulfonic acid groups and heat-resistant resins which have hydrocarbon skeletons and contain alkylsulfonic acid or alkylphosphoric acid groups introduced thereto. The fluoropolymers are excellent in heat resistance and chemical resistance but have the problem of being expensive, while the heat-resistant resins have the problem of being poor in chemical resistance. Further, solid polyelectrolyte materials having higher electric conductivities have been desired.Type: GrantFiled: October 19, 2001Date of Patent: January 9, 2007Assignee: Canon Kabushiki KaishaInventors: Iko Ito, Masahiro Rikukawa
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Patent number: 7147985Abstract: A compound including a polymeric chain, an acid labile group attached to the polymeric chain, and at least one hydrophilic group attached to the acid labile group is disclosed. Compositions including the compound, and methods of using the compositions are also disclosed.Type: GrantFiled: March 31, 2004Date of Patent: December 12, 2006Assignee: Intel CorporationInventors: Wang Yueh, Ernisse S. Putna
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Patent number: 7144954Abstract: The present invention relates to mixtures containing A) compounds of the formula (I) and (II) where R1 is independently at each instance hydrogen or a methyl radical, R2 is independently at each instance a linear or branched, aliphatic or cycloaliphatic radical or a substituted or unsubstituted aromatic or heteroaromatic radical and m and n are each independently an integer of not less than 0 subject to the proviso that m+n>0, and B) at least one ethylenically unsaturated monomer (A) which is different from the compounds of the formula (I) and (II). The present invention further relates to processes for polymerizing these mixtures, the highly transparent polymers thus obtainable and to their use.Type: GrantFiled: September 13, 2003Date of Patent: December 5, 2006Assignee: Röhm GmbH & Co. KGInventors: Bardo Schmitt, Wolfgang Klesse, Volker Kerscher, Patrik Hartmann
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Patent number: 7138468Abstract: A new, facile, general one-phase method of generating thio-functionalized transition metal nanoparticles and surfaces modified by (co)polymers synthesized by the RAFT method is described. The method includes the stops of forming a (co)polymer in aqueous solution using the RAFT methodology, forming a colloidal transition metal precursor solution from an appropriate transition metal; adding the metal precursor solution or surface to the (co)polymer solution, adding a reducing agent into the solution to reduce the metal colloid in situ to produce the stabilized nanoparticles or surface, and isolating the stabilized nanoparticles or surface in a manner such that aggregation is minimized. The functionalized surfaces generated using these methods can further undergo planar surface modifications, such as functionalization with a variety of different chemical groups, expanding their utility and application.Type: GrantFiled: March 27, 2003Date of Patent: November 21, 2006Assignee: University of Southern MississippiInventors: Charles L. McCormick, III, Andrew B. Lowe, Brent S. Sumerlin
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Patent number: 7132475Abstract: The invention provides methods for the preparation of multiblock copolymers, dispersions of multiblock copolymers, vesicles and micelles containing multiblock copolymers, and oxidative degradation products of multiblock copolymers.Type: GrantFiled: October 19, 2001Date of Patent: November 7, 2006Assignee: Ecole Polytechnique Federale de LausanneInventors: Jeffrey A. Hubbell, Alessandro Napoli, Nicola Tirelli
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Patent number: 7105620Abstract: An aqueous dispersion of a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion; a preparation process therefor; its use for coating; a printing ink containing the aqueous dispersion; an electro-conductive layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion derived from an aqueous dispersion thereof; and an antistatic layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.Type: GrantFiled: May 12, 2004Date of Patent: September 12, 2006Assignee: Agfa GevaertInventors: Bert Groenendaal, Frank Louwet
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Patent number: 7087556Abstract: The present invention provides compositions of treating subterranean zones penetrated by well bores in primary well cementing operations, well completion operations, production stimulation treatments and the like. The invention includes aqueous well treating fluids comprised of water and a water soluble polymer complex fluid loss control additive. Preferred polymer complexes comprise water-soluble polymers made in the presence of hydroxyethylcellulose.Type: GrantFiled: April 15, 2002Date of Patent: August 8, 2006Assignee: WSP Chemicals & Technology, L.L.C.Inventors: Shih-Ruey T. Chen, Jiten Chatterji, Valentino L. DeVito, Randy J. Loeffler, Kevin W. Frederick, Kevin W. Smith
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Patent number: 7078147Abstract: A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.Type: GrantFiled: March 26, 2003Date of Patent: July 18, 2006Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., LtdInventors: Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Shinji Kishimura
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Patent number: 7060774Abstract: The invention relates to a prepolymer material based on monomeric, oligomeric or polymeric compounds with at least one ethylenically unsaturated (meth)acryloyl group. The problem of imperfect imprinting properties, escpecially of an unwanted adhering to the imprinting stamp or mold, is circumvented by a fluorinated organo silane surfactant as an additional component of the prepolymer material. Furthermore, the invention describes an imprinting process for the manufacture of polymer articles with relief on their surface. Better release properties of the polymer article from the stamp or mold are accomplished by applying a surfactant, comprising a fluorinated organo silane, onto the surface of the mold or stamp.Type: GrantFiled: February 28, 2003Date of Patent: June 13, 2006Assignee: Merck Patent GesellschaftInventors: David Sparrowe, Maxim Shkunov, Iain McCulloch
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Patent number: 7041763Abstract: Ring-opening metathesis polymerization (ROMP) of a photochromic 1,2-bis-(3-thienyl)-cyclopentene monomer generated a series of novel polymers. All polymers exhibit reversible light-activated interconversion between their colorless-open and their colored-closed forms.Type: GrantFiled: July 13, 2001Date of Patent: May 9, 2006Assignee: Simon Fraser UniversityInventors: Neil R. Branda, Andrew J. Myles
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Patent number: 7037997Abstract: A vinyl monomer of the structure R—B—Ar(—CH?CH2)n (1) in which Ar is an aromatic ring (arylene group); n is an integer >0, in particular one or two; B is a bridge structure; R is a (C2-30)-hydrocarbon group carrying two or more protected or unprotected hydroxy groups. The monomer is characterized in that B comprises a chain of atoms linking R to Ar and consisting of 1–10 atoms selected from carbons and the heteroatoms ether oxygen, thioether sulphur or amino nitrogen, with the proviso that the terminal atom in B which is attached to R is one of the heteroatoms. A method for producing a polymer support matrix in which the vinylmonomer is one of the monomeric units. The support matrix as such is also claimed. The preferred method for producing the support matrices involves suspension polymerisation, the preferred form of matrix is beads.Type: GrantFiled: June 6, 2000Date of Patent: May 2, 2006Assignee: GE Healthcare Bio-Sciences ABInventors: Rose Nasman, legal representative, Harry Nasman, legal representative, Jan Nasman, deceased
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Patent number: 7034061Abstract: Polymers having non-thrombogenic properties can be prepared by copolymerizing monomers of at least three classes selected from (a) monomers having sulphate groups, (b) monomers having sulphonate groups, (c) monomers having sulphamate groups, (d) monomers having polyoxyalkylene ether groups, and (e) monomers having zwitterionic groups. The polymers can additionally be provided with anti-thrombogenic properties by including an additional comonomer having a pendant heparin (or hirudin, warfarin or hyaluronic acid) group. The polymers can be used as coating materials for medical devices, such as tubing or connectors, in order to provide them with non-thrombogenic, and optionally anti-thrombogenic, properties.Type: GrantFiled: June 6, 2000Date of Patent: April 25, 2006Inventors: Ajay Kumar Luthra, Shivpal Singh Sandhu
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Patent number: 7026418Abstract: Disclosed is an improved method of making polymers. The method utilizes at least one ethylenically unsaturated monomer and at least one polymerizable surface active agent. The polymerizable surface active agent is capable of co-polymerization with traditional monomers and/or polymerization with itself (i.e. homopolymerization) and is preferably substantially completely consumed during the course of the polymerization. Polymers produced by the method of the present invention are well suited for use in coatings, adhesives, sealants, elastomers and the like, as they form stable films, possess excellent adhesion properties and have improved hydrolytic stability characteristics. The present invention also encompasses homopolymeric surface active agents and their use in polymerization reactions.Type: GrantFiled: July 28, 2004Date of Patent: April 11, 2006Assignee: Stepan CompanyInventors: Alfred K. Schulz, Adnan Siddiqui
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Patent number: 7008749Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.Type: GrantFiled: November 5, 2001Date of Patent: March 7, 2006Assignee: The University of North Carolina at CharlotteInventor: Kenneth E. Gonsalves
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Patent number: 7006344Abstract: The present invention provides a bis(4-mercaptophenyl) sulfide derivative represented by general formula 1. This derivative is a monomer that can form a dielectric film suitable for an electronic component. The present invention further provides a method for producing this derivative and an electronic component having high characteristics under excellent humidity and high temperature.Type: GrantFiled: July 23, 2001Date of Patent: February 28, 2006Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Noriyasu Echigo, Kazuyoshi Honda, Yoshiaki Kai, Masaru Odagiri, Hisaaki Tachihara, Hideki Matsuda, Jun Katsube, Kazuo Iwaoka, Takanori Sugimoto, Nobuki Sunagare
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Patent number: 6995223Abstract: An aqueous dispersion of a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion; a preparation process therefor; its use for coating; a printing ink containing the aqueous dispersion; an electro-conductive layer containing a copolymer of at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.2 g/L and a polyanion derived from an aqueous dispersion thereof; and an antistatic layer containing a copolymer of at least one 3,4-alkylenedioxy-thiophene compound with a solubility in water at 25° C. of less than 2.2 g/L with at least one 3,4-alkylenedioxythiophene compound with a solubility in water at 25° C. of at least 2.Type: GrantFiled: December 17, 2002Date of Patent: February 7, 2006Assignee: Agfa-GevaertInventors: Bert Groenendaal, Frank Louwet