Monomer Containing At Least Two Carboxylic Acid Ester Groups Patents (Class 526/321)
-
Patent number: 7482112Abstract: A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having at least one group selected from the group of consisting (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkaline developer and increasing solubility of the resin (C) in an alkaline developer, and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer, and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating, (ii) a step of exposing the resist coating to light via an immersion liquid, (iii) a step of removing the immersion liquid remaining on the resist coating, (iv) a step of heating the resist coating, aType: GrantFiled: January 22, 2007Date of Patent: January 27, 2009Assignee: FUJIFILM CorporationInventors: Shinichi Kanna, Haruki Inabe, Hiromi Kanda
-
Patent number: 7473737Abstract: The present invention relates to mixtures for preparing transparent plastics, encompassing a) compounds of the formula (I) and (II) where each R1, independently of the others, is hydrogen or a methyl radical, each R2, independently of the others, is a linear or branched, aliphatic or cycloaliphatic radical, or a substituted or unsubstituted aromatic or heteroaromatic radical, and each of m and n, independently of the other, is a whole number greater than or equal to 0, where m+n>0, and b) at least one monomer (A) capable of free-radical polymerization with a molar mass of at least 150 g/mol, which contains at least two terminal olefinic groups, where at least two of the olefinic groups of the monomer (A) have, in the ?- and/or ?-position with respect to the olefinic group, atoms which differ in nature and/or number, in the radical which connects the at least two olefinic groups.Type: GrantFiled: July 10, 2004Date of Patent: January 6, 2009Assignee: Roehm GmbH & Co. KGInventors: Bardo Schmitt, Patrik Hartmann
-
Patent number: 7473754Abstract: The present invention is directed to a novel polymerizable organic composition comprising one or more radically polymerizable monomers with at least one radically polymerizable monomer having at least two (meth)acryloyl groups that have backbone linkages selected from thiourethane linkages, dithiourethane linkages, combinations of thiourethane linkages and dithiourethane linkages. The present invention is also directed to polymerizates prepared from the polymerizable organic composition, shaped articles prepared from the polymerizable compositions, and photochromic articles that may be prepared from the polymerizable organic composition of the present invention.Type: GrantFiled: October 17, 2000Date of Patent: January 6, 2009Assignee: PPG Industries Ohio, Inc.Inventors: Michael O. Okoroafor, Robert A. Smith, Marvin J. Graham, Robert D. Herold
-
Patent number: 7455952Abstract: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.Type: GrantFiled: April 14, 2005Date of Patent: November 25, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Jun Hatakeyama, Yuji Harada
-
Publication number: 20080274304Abstract: The present invention concerns functionalized photoreactive compounds of formula (I), that are particularly useful in materials for the alignment of liquid crystals. Due to the adjunction of an electron withdrawing group to specific molecular systems bearing an unsaturation directly attached to two unsaturated ring systems, exceptionally high photosensitivities, excellent alignment properties as well as good mechanical robustness could be achieved in materials comprising said functionalized photoreactive compounds of the invention.Type: ApplicationFiled: September 15, 2006Publication date: November 6, 2008Inventors: Mohammed Zoubair Cherkaoui, Peggy Studer, Joachim Reichardt, Hubert Seiberle
-
Publication number: 20080242814Abstract: A method of preparing oligomeric compounds from polyfunctional reactants in the presence of heterogeneous catalysts that exhibit size selective characteristics, such that further reaction between first generation products or first generation products and reactants is less favored than between the starting reactants is disclosed. Preparation of oligomeric polyacrylate compounds in a liquid solution using these catalysts is also disclosed comprising reacting X—H acidic Michael donor compounds with unsaturated Michael acceptor compounds containing more than one unsaturated group.Type: ApplicationFiled: May 1, 2008Publication date: October 2, 2008Applicant: SUN CHEMICAL CORPORATIONInventor: Steve Nahm
-
Publication number: 20080236443Abstract: Embodiments relate to a relatively rapid transesterification process including transesterifying condensation polymers such as polyethylene terephthalate (PET), or other polyesters used in commerce, with a modifying monomer mix containing other monomers to manufacture new polymers containing the pre-condensed moieties. The process preferably only involves transesterification as a reaction mechanism. The process preferably produces a rapid buildup of molecular weight and/or polymer uniformity by the high temperature transesterification of the condensation polymer with the modifying monomer mixture. The process can be performed in any suitable vessel including an extrusion line, and it has the advantage of greatly reduced cycle times over currently used condensation polymer utilization processes such as the recycling of PET into other materials.Type: ApplicationFiled: March 29, 2007Publication date: October 2, 2008Inventor: Robert Keith Salsman
-
Publication number: 20080234451Abstract: A ring-opening metathesis polymerisation (ROMP) reaction is disclosed in which a cyclic alkene compound is subjected to ROMP using a transition metal ROMP catalyst which has an alkyl moiety which is connected to the metal centre thereof through a double bond. The process includes the step of adding sufficient of an acyclic alkene having a carbon-carbon double bond capable of reacting with the catalytic metal moieties attached to the living end of each of the polymer chains generated in the ROMP reaction to end cap the polymer chains and to generate a stable olefin metathesis catalyst.Type: ApplicationFiled: December 5, 2005Publication date: September 25, 2008Applicant: Imperial Chemical Industries PLCInventors: Alan Michael Kenwright, David Mitchell Haigh, Ezat Khosravi
-
Publication number: 20080221289Abstract: The present invention relates to compounds of the general formula I in which the variables are each defined as follows: Z1, Z2 are each independently hydrogen, optionally substituted C1-C20-alkyl in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, or reactive radicals by means of which polymerization can be brought about, A1, A2 are each independently spacers having from 1 to 30 carbon atoms, in which the carbon chain may be interrupted by oxygen atoms in ether function, sulfur atoms in thioether function or by nonadjacent imino or C1-C4-alkylimino groups, Y1, Y2 are each independently a chemical single bond, oxygen, sulfur, —CO—, —O—CO—, —CO—O—, —S—CO—, —CO—S—, —NR—CO— or —CO—NR—, Y3, Y4 are each independently a chemical single bond, oxygen, sulfur, —CR?CR—, —C?C—, —CR?CR—CO—O—, —O—CO—CR?CR—, —C?C—O—, —O—C?C—, —CH2—CH2—, —CH2—O—, —O—CH2—, —CH2—S—, —S—CH2—, —CO—, —O—CO—, —CO—O—, —S—CO—, —CType: ApplicationFiled: May 10, 2006Publication date: September 11, 2008Applicant: BASF AKTIENGESELLSCHAFTInventors: Olivier Enger, Rudiger Sens, Christian Lennartz, Robert Parker
-
Patent number: 7422778Abstract: Provided are a photoreactive compound represented by formula (1), a liquid crystal alignment layer using the compound, a method of manufacturing the alignment layer, and a liquid crystal display device including the alignment layer: where n is an integer of 20-1000; m is an integer of 1-5; and R is a hydrogen atom, CN, a C1-C5 alkyloxy group, a halogen atom, or a maleimide group.Type: GrantFiled: December 2, 2005Date of Patent: September 9, 2008Assignee: LG Chem, Ltd.Inventors: Byung Hyun Lee, Min Young Lim, Kyungjun Kim, Sung Ho Chun, Sung Joon Oh, Keon Woo Lee, Heon Kim, Hye Won Jeong
-
Patent number: 7423074Abstract: A polysiloxane copolymer that is useful for forming biomedical devices comprises blocks (I) and (II) and is terminated at each end with an ethylenically unsaturated radical: (*Dii*Diol*Dii*PS)x ??(I) (*Dii*PS)y ??(II) wherein: each Dii is independently a diradical residue of a diisocyanate; each Diol is independently a diradical residue of a diol having 1 to 10 carbon atoms; each PS is independently a diradical residue of a polysiloxane-containing diol or diamine; each * is independently —NH—CO—NH—, —NH—COO— or —OCO—NH—: x represents the number of blocks (I) and is at least 2, and y represents the number of blocks (II) and is at least 1.Type: GrantFiled: December 2, 2005Date of Patent: September 9, 2008Assignee: Bausch & Lomb IncorporatedInventors: Yu-Chin Lai, Weihong Lang, Edmond T. Quinn
-
Publication number: 20080214764Abstract: The present invention provides modified PVA having unsaturated double bonds derived from a specific monomer in the main chain of the molecule. A modified polyvinyl alcohol containing bond units of the formula (1) having double bonds in its molecular main chain: wherein each of X1 and X2 is a C1-12 lower alkyl group, a hydrogen atom or a metal atom, g is an integer of from 0 to 3, h is an integer of from 0 to 12, Y1 is a hydrogen atom or —COOM, and M is a hydrogen atom, an alkyl group or a metal atom.Type: ApplicationFiled: August 29, 2005Publication date: September 4, 2008Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHAInventors: Satoshi Watanabe, Hirohisa Otake
-
Patent number: 7411009Abstract: The present invention relates to new cure accelerators for anaerobic curable compositions. These anaerobic cure accelerators are generally sulfonimide derivatives and sulfonamide derivatives.Type: GrantFiled: March 7, 2005Date of Patent: August 12, 2008Assignee: Henkel CorporationInventors: Andrew D. Messana, Philip T. Klemarczyk, Karen R. Brantl
-
Patent number: 7411025Abstract: The present invention relates to phenylgycines and derivatives thereof, 1,4-aminobenzoyl compounds, and phenyl pyrazolinones as cure accelerators for anaerobically curable compositions.Type: GrantFiled: March 21, 2005Date of Patent: August 12, 2008Assignee: Henkel CorporationInventors: Andrew D. Messana, Philip T. Klemarczyk, Karen R. Brantl
-
Publication number: 20080161524Abstract: Photopolymer-based dielectric materials are provided with methods for preparing the same. Composites and electronic devices including such dielectric materials also are provided.Type: ApplicationFiled: November 28, 2007Publication date: July 3, 2008Inventors: He Yan, Antonio Facchetti, Tobin J. Marks
-
Publication number: 20080146738Abstract: The present invention provides curatives for thermosetting adhesive compositions, methods of preparation and uses thereof. In particular, the present invention relates to elastomeric epoxy curative compounds that can be used in thermosetting compounds, methods for preparing the curative compounds and epoxy compositions containing the curative compounds.Type: ApplicationFiled: December 19, 2007Publication date: June 19, 2008Inventor: Stephen M. Dershem
-
Publication number: 20080139773Abstract: This invention is directed to fluorinated acrylate compositions, which are suitable for use as low shrinkage, low absorbance refractive index matching adhesives for use in “pig-tailing” polymeric integrated waveguides to optical fiber bundles.Type: ApplicationFiled: February 13, 2008Publication date: June 12, 2008Inventor: Paul Gregory Bekiarian
-
Patent number: 7385017Abstract: This invention relates to a silicone resin composition which exhibits high heat resistance, high transparency and high dimensional stability and thus can be suitably used for optical applications such as a lens, an optical disc, an optical fiber, a substrate for a plat panel display, a window material for an automobile, and the like.Type: GrantFiled: March 22, 2004Date of Patent: June 10, 2008Assignee: Nippon Steel Chemical Co., Ltd.Inventors: Takashi Saito, Masayoshi Isozaki, Hideki Andoh
-
Patent number: 7361693Abstract: Low density polymeric beads made by polymerizing monomeric building blocks into large crosslinked polymer molecules in porous, spherical bead form by droplet or suspension polymerization in the presence of a porogen.Type: GrantFiled: July 18, 2005Date of Patent: April 22, 2008Assignee: Sun Drilling Products CorporationInventors: Robert L. Albright, Richard Mapp
-
Patent number: 7354693Abstract: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from an overlay material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the overlay material.Type: GrantFiled: August 4, 2005Date of Patent: April 8, 2008Assignees: Shin-Etsu Chemical Co., Ltd., Central Glass Co., Ltd.Inventors: Jun Hatakeyama, Yoshio Kawai, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani
-
Patent number: 7345125Abstract: The present invention relates to a silicone resin composition that can be used for a roll film having small birefringence, the silicone resin composition being suitable for, for example, optical applications, and a window material for an automobile, the silicone resin composition having high heat resistance, the silicon resin composition being stained at a low level, the silicone resin composition having a low thermal expansion coefficient, the silicone resin composition enabling a transparent conductive film to be stably formed, and the silicone resin composition providing good winding property.Type: GrantFiled: September 21, 2005Date of Patent: March 18, 2008Assignee: Nippon Steel Chemical Co., Ltd.Inventors: Masayoshi Isozaki, Takashi Saito, Hideki Andoh
-
Patent number: 7312290Abstract: Curable formulations comprising: (a) at least one multifunctional acrylate having a functionality of at least two, (b) at least one mono-acrylate monomer, (c) at least one heteroatom-containing diacrylate, wherein the heteroatom is sulfur or selenium; and (d) a curing agent, have been discovered. The curable formulations show promise as precursors to high refractive index materials suitable for use in light management devices and other optical devices. In addition the novel curable formulations are useful for producing coatings, which may be useful in forming display films, in particular brightness enhancing display films.Type: GrantFiled: September 24, 2004Date of Patent: December 25, 2007Assignee: General Electric CompanyInventors: Bret Ja Chisholm, James Edward Pickett
-
Patent number: 7282272Abstract: Polymerizable compositions comprising nanopartilces particularly useful for brightness enhancing films.Type: GrantFiled: March 11, 2005Date of Patent: October 16, 2007Assignee: 3M Innovative Properties CompanyInventors: Clinton L. Jones, David B. Olson, Emily S. Goenner, Brant U. Kolb, John T. Brady
-
Patent number: 7262230Abstract: A process that includes (a) providing a mixture including i) a halocatechol diacrylate, a haloresorcinol diacrylate, or a halohydroquinone diacrylate component, ii) a charge transporting component having a radical polymerizable group, and iii) a radical initiator and b) initiating a radical polymerization.Type: GrantFiled: January 21, 2005Date of Patent: August 28, 2007Assignee: Lumera CorporationInventor: Dan L. Jin
-
Patent number: 7250481Abstract: Unsaturated acids are esterified with polyalcohols. The resulting reaction mixtures have utility.Type: GrantFiled: June 6, 2003Date of Patent: July 31, 2007Assignee: BASF AktiengesellschaftInventors: Thomas Jaworek, Thomas Daniel, Lothar Wolf, Rainer Koeniger, Reinhold Schwalm, Gabriele Hartmann, Stefan Wickel
-
Patent number: 7244796Abstract: Branched polymers are prepared by mixing together monofunctional vinylic monomer with from 0.3 to 100% w/w of polyfunctional vinylic monomer and from 0.0001 to 50% w/w of chain transfer agent and thereafter reacting the mixture to form a polymer. The resulting branched polymers are soluble and may be used as component of surface coatings and inks as well as molding resins.Type: GrantFiled: September 16, 2003Date of Patent: July 17, 2007Assignee: Lucite International UK LimitedInventors: Michael S. Chisholm, Andrew T. Slark, David Sherrington, Nial O'Brien
-
Patent number: 7226980Abstract: A curable composition includes a poly(arylene ether) and a fused alicyclic (meth)acrylate monomer. Also described are a method of preparing the composition, a cured composition derived from the curable composition, and an article comprising the cured composition. The composition is useful, for example, as a bulk molding compound.Type: GrantFiled: August 7, 2003Date of Patent: June 5, 2007Assignee: General Electric CompanyInventor: Gary William Yeager
-
Patent number: 7199211Abstract: The present invention relates to novel (meth)acrylic esters of polyalkoxylated trimethylolpropane of the formula where AO is for each AO independently at each instance EO, PO or BO where EO is O—CH2-CH2- PO is independently at each instance O—CH2-CH(CH3)- or O—CH(CH3)-CH2- BO is independently at each instance O—CH2-CH(CH2-CH3)- or O—CH(CH2-CH3)-CH2- p1+p2+p3 is 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74 or 75, R1, R2 and R3 are independently H or CH3, a simplified process for preparing these esters and the use of reaction mixtures thus obtainable.Type: GrantFiled: June 6, 2003Date of Patent: April 3, 2007Assignee: BASF AktiengesellschaftInventors: Andreas Popp, Thomas Daniel, Jürgen Schröder, Thomas Jaworek, Rüdiger Funk, Reinhold Schwalm, Matthias Weismantel, Ulrich Riegel
-
Patent number: 7199213Abstract: A curable composition includes a poly(arylene ether) and a fused alicyclic (meth)acrylate monomer. Also described are a method of preparing the composition, a cured composition derived from the curable composition, and an article comprising the cured composition. The composition is useful, for example, as a bulk molding compound.Type: GrantFiled: January 5, 2005Date of Patent: April 3, 2007Assignee: General Electric CompanyInventor: Gary William Yeager
-
Patent number: 7160587Abstract: A plastic substrate for display, having little coloration and excellent in optical characteristics, heat resistance, resistance to thermal coloration and mechanical properties, and a display element using the same are provided. The plastic substrate for display comprises a fumaric acid diester resin which comprises 60 mol % or more of a fumaric acid diester residue unit represented by the following formula (1): wherein R1 and R2 each independently represent a branched alkyl group or a cyclic alkyl group, having 3–12 carbon atoms, and has a number average molecular weight of 1,000–500,000 as determined by a gel permeation chromatography and converted into standard polystyrene, the substrate having a thickness 30–600 ?m.Type: GrantFiled: August 19, 2004Date of Patent: January 9, 2007Assignee: Tosoh CorporationInventor: Toru Doi
-
Patent number: 7153588Abstract: Naphthalate polyester articles can be coated with polymerizable compositions containing a vinyl-functional crosslinkable film former, a large amount of benzotriazole and a copolymerizable monomer that solubilizes the benzotriazole. The cured compositions help protect the naphthalate polyester from UV exposure and other weathering effects.Type: GrantFiled: May 30, 2003Date of Patent: December 26, 2006Assignee: 3M Innovative Properties CompanyInventors: Steven J. McMan, Stephen A. Johnson, Clinton L. Jones, Eric W. Nelson, Emily S. Goenner
-
Patent number: 7144954Abstract: The present invention relates to mixtures containing A) compounds of the formula (I) and (II) where R1 is independently at each instance hydrogen or a methyl radical, R2 is independently at each instance a linear or branched, aliphatic or cycloaliphatic radical or a substituted or unsubstituted aromatic or heteroaromatic radical and m and n are each independently an integer of not less than 0 subject to the proviso that m+n>0, and B) at least one ethylenically unsaturated monomer (A) which is different from the compounds of the formula (I) and (II). The present invention further relates to processes for polymerizing these mixtures, the highly transparent polymers thus obtainable and to their use.Type: GrantFiled: September 13, 2003Date of Patent: December 5, 2006Assignee: Röhm GmbH & Co. KGInventors: Bardo Schmitt, Wolfgang Klesse, Volker Kerscher, Patrik Hartmann
-
Patent number: 7138472Abstract: A high molecular weight, water-soluble polymer comprising pendant salicylic acid groups and having a weight average molecular weight of at least about 2,000,000 daltons and use of the polymer for clarifying red mud-containing liquors generated in the Bayer process for the recovery of alumina from bauxite.Type: GrantFiled: February 24, 2003Date of Patent: November 21, 2006Assignee: Nalco CompanyInventors: Murat Quadir, Everett C. Phillips, Larry E. Brammer, Jr., Robert P. Mahoney, John D. Kildea, Manian Ramesh, John T. Malito
-
Patent number: 7122253Abstract: A curable resin composition comprising (A) reactive particles prepared by bonding (A1) at least one of oxide particles of an element selected from the group consisting of silicon, aluminum, zirconium, titanium, zinc, germanium, indium, tin, antimony, ruthenium, rhenium, silver, nickel, cupper and cerium, and (A2) an organic compound which comprises a polymerizable unsaturated group, (B) a compound having two or more polymerizable unsaturated groups in the molecule, and optionally (C) a terminal reactive polysiloxane compound having at least one polymerizable group, other than organic compound (A2).Type: GrantFiled: April 17, 2001Date of Patent: October 17, 2006Assignee: DSM N.V.Inventors: Yoshikazu Yamaguchi, Isao Nishiwaki, Yuichi Eriyama, Takashi Ukachi, Takao Yashiro, Michiko Takahashi
-
Patent number: 7119160Abstract: There are provided a polyalkenyl ether type polyurethane, which is excellent in flexibility, aor the like, and which has in the molecule, a structural unit represented by formula (XXX): (wherein n represents an integer of 2 to 1000, R1 represents substituted or unsubstituted lower alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, and R2, R3 and R4, which are the same or different, each represent a hydrogen atom, substituted or unsubstituted lower alkyl, substituted or unsubstituted cycloalkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, and R1s, R2s, R3s, and R4s, when they are each present two or more in number, may be respectively the same or different), and the like.Type: GrantFiled: April 3, 2003Date of Patent: October 10, 2006Assignee: Kyowa Hakko Chemical Co., Ltd.Inventors: Sai Kodama, Shigeru Murata, Toshihiro Inayama, Tatsuo Niimi
-
Patent number: 7112641Abstract: A monomer as represented by general formula (a) or (a?) below, with which a polymer having high oxygen permeability and transparency and suited to an ophthalmic lens is obtained, is provided. Suitable monomers include: wherein A is a siloxanyl group; R1 is H or a methyl group; R2 is a substituted group that is selected from the group consisting of alkyl groups with 1 to 20 carbon atoms that may be substituted, aryl groups with 6 to 20 carbon atoms that may be substituted and formula (c) below.Type: GrantFiled: March 13, 2002Date of Patent: September 26, 2006Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Kazuhiko Fujisawa, Naoki Shimoyama, Mitsuru Yokota
-
Patent number: 7101942Abstract: Dental material containing a cluster according to the general formula [(M1)a(M2)bOc(OH)d(OR)e(L-Sp-Z)f] (I) in which M1, M2, independently of each other, stand in each case for a metal atom of the IIIrd or Vth main groups or the Ist to VIIIth sub-groups of the periodic table; R is an alkyl group with 1 to 6 carbon atoms; L is a co-ordinating group with 2 to 6 complexing centres; Sp is a spacer group or is absent; Z is a polymerizable group; c is a number from 1 to 30; d, e, independently of each other, are in each case a number from 1 to 30; f is a number from 2 to 30, any charge of the cluster (I) present being equalized by counterions.Type: GrantFiled: January 18, 2002Date of Patent: September 5, 2006Assignee: Ivoclar Vivadent AGInventors: Norbert Moszner, Thomas Völkel, Volker Rheinberger, Ulrich Schubert
-
Patent number: 7087675Abstract: The ?-hydroxy carbamate, ethylenically unsaturated monomer of the invention can be polymerized as a homopolymer or copolymerized with other monomers. The polymerization can be carried out in an aqueous medium. The ?-hydroxy carbamate monomer is polymerized to form water-soluble homopolymers or, if polymerized as a mixture with one or more comonomers, copolymers that are soluble, emulsifiable, or dispersible in water. The ?-hydroxy carbamate monomer can be used as a replacement monomer for acrylamide.Type: GrantFiled: March 19, 2003Date of Patent: August 8, 2006Assignee: BASF CorporationInventors: Walter H. Ohrbom, Patricia A. Herrel
-
Patent number: 7026416Abstract: To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2?CFCF2—C(CF3)(R5)—CH2CH?CH2??(3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.Type: GrantFiled: May 9, 2005Date of Patent: April 11, 2006Assignee: Asahi Glass Company, LimitedInventors: Yasuhide Kawaguchi, Shinji Okada, Yoko Takebe, Osamu Yokokoji, Isamu Kaneko
-
Patent number: 6958368Abstract: The present invention relates to new cure accelerators for anaerobic curable compositions. These anaerobic cure accelerators are generally sulfinimides and oxygen and sulfur derivatives thereof, sulfonimides and oxygen and sulfur derivatives thereof, sulfonamides and oxygen and sulfur derivatives thereof, and oxygen and sulfur analogues of sulfimides.Type: GrantFiled: May 31, 2002Date of Patent: October 25, 2005Assignee: Henkel CorporationInventors: Philp T. Klemarczyk, Karen R. Brantl, Andrew D. Messana
-
Patent number: 6939931Abstract: The invention relates to a process for preparing solid polyvinyl ester resins using a bulk or solution polymerization process in the presence of a chain transfer agent, wherein one or more vinyl esters of unbranched or branched alkyl carboxylic acids having 1 to 15 carbon atoms are polymerized in the presence of a compound selected from the group consisting of monovalent aliphatic alcohols having 1 to 6 carbon atoms, esters of aliphatic monocarboxylic acids and aliphatic alcohols each having 1 to 4 carbon atoms, or aliphatic ketones having 3 to 6 carbon atoms.Type: GrantFiled: February 13, 2003Date of Patent: September 6, 2005Assignee: Wacker Polymer Systems GmbH & Co. KGInventors: Peter Tschirner, Andreas Lumpp, Robert Singer, Guenter Braunsperger
-
Patent number: 6930133Abstract: Low density polymeric beads made by polymerizing monomeric building blocks into large crosslinked polymer molecules in porous, spherical bead form by droplet or suspension polymerization in the presence of a porogen.Type: GrantFiled: May 30, 2003Date of Patent: August 16, 2005Inventors: Robert L. Albright, Richard Mapp
-
Patent number: 6930139Abstract: Coatings for agricultural grade fertilizer particles and industrial grade ammonium nitrate are provided which when applied to particles form a protective film which acts as a barrier to inhibit or prevent hydrocarbon infiltration of the fertilizer particle pores and also to physically separate the fertilizer particles and hydrocarbon materials. In so doing, the coating greatly reduces the efficacy of the fertilizer particles as an oxidizing agent for use in incendiary devices, thereby deterring or preventing the use of agricultural grade fertilizers or industrial grade ammonium nitrate in creating weapons of terror.Type: GrantFiled: January 24, 2003Date of Patent: August 16, 2005Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
-
Patent number: 6927267Abstract: A pressure-sensitive adhesive polymer comprising a reaction product of a C1 to C20 alkyl (meth)acrylate, an ethylenically unsaturated carboxylic acid, a C2 to C8 hydroxyalkyl (meth)acrylate, a vinyl aromatic, optionally a ethylenically unsaturated monomer containing sulfonic acid, and optionally a vinyl ester of a carboxylic acid. The pressure-sensitive adhesive polymer can provide adhesion and cohesion in a temperature range from ?30° C. to 50° C. for the All-temperature pressure-sensitive adhesive market.Type: GrantFiled: March 7, 2002Date of Patent: August 9, 2005Assignee: BASF AGInventors: Luis Varela de la Rosa, Timothy P Sanborn, Dieter Urban
-
Patent number: 6916543Abstract: Novel copolymers suitable for forming the top layer photoimagable coating in a deep U V. particularly a 193 nm and 248 nm, bilayer resist system providing high resolution photolithography. Chemically amplified photoresist composition and organosilicon moieties suitable for use in the binder resin for photoimagable etching resistant photoresist composition that is suitable as a material for use in ArF and KrF photolithography using the novel copolymers.Type: GrantFiled: October 31, 2003Date of Patent: July 12, 2005Assignee: Arch Specialty Chemicals, Inc.Inventors: Binod B. De, Sanjay Malik, Stephanie J. Dilocker, Ognian N. Dimov
-
Patent number: 6852778Abstract: Anaerobically curable compositions comprising: (a) a polymerizable monomer having a functional group represented by the general formula: H2C=C(R)? (wherein R is a hydrogen atom or a methyl group) at a terminal of its molecule; (b) an organic peroxide; (c) o-benzoic sulfimide; and (d) a salt selected from the group consisting of sodium salts, potassium salts and calcium salts of weakly acidic substances, have a high curing rate and high bonding strength despite of having high storage stability. In particular, the composition can rapidly bond even adherends such as inactive metals and plastics, with which conventional anaerobically curable compositions are hardly cured.Type: GrantFiled: June 9, 2000Date of Patent: February 8, 2005Assignee: Three Bond Co., Ltd.Inventor: Aki Kusuyama
-
Patent number: 6849378Abstract: A resist composition includes a photoacid generator (PAG) and a photosensitive polymer. The photosensitive polymer includes a comonomer having an acid-labile substituent group or a polar functional group, and a copolymer of alkyl vinyl ether and maleic anhydride. The copolymer is represented by the following structure: where k is an integer of 3 to 8, and where X is tertiary cyclic alcohol having 7 to 20 carbon atoms.Type: GrantFiled: April 17, 2002Date of Patent: February 1, 2005Assignee: Samsung Electronics Co., Ltd.Inventors: Sangjun Choi, Hyunwo Kim, Joontae Moon, Sanggyun Woo
-
Patent number: 6846564Abstract: The invention relates to cross-linked acrylic microparticles, a method for the production thereof by polymerization in a dispersion in a non aqueous medium and to the uses thereof in covering or moulding compositions involving a favourable compromise between hardness, flexibility and adhesion. The micropparticles are obtained from a composition comprising: 50-99% mols of a constitutent (A) consisting of Cardura E 10 (meth)acrylate and optionally alkyl (meth)acrylate in C2-C8; a compound (B) consisting of at least one monomer or oligomer having at least 2 ethylenic unsaturations; a compound (C) consisting of at least one monomer or oligomer having in addition to one ethylenic unsaturation at least one second function (F1) with the possibility of at least partial chemical modification of the initial functions f1 into final functions f2.Type: GrantFiled: March 24, 2000Date of Patent: January 25, 2005Assignee: Cray Valley, S.A.Inventors: Jean-Pierre Pascault, Ludovic Valette, Philippe Barbeau, Benoit Magny
-
Patent number: 6846900Abstract: A compound favored with low viscosity, capable of providing a cured product having high refractive index, and suitable for application to optical materials, including plastic lens material, radical polymerizable flame retardant and the like, as well as a process for producing the compound, a plastic lens composition using the compound, a plastic lens obtained by curing the composition and a process for producing the plastic lens. A novel aromatic ring-containing polyvalent (meth)allyl ester derived from a polyvalent carboxylic acid of trivalent or greater valent is employed.Type: GrantFiled: March 7, 2002Date of Patent: January 25, 2005Assignee: Showa Denko K.K.Inventors: Kazuhiko Ooga, Tsuneo Tajima, Kazufumi Kai, Hiroshi Uchida
-
Patent number: 6835325Abstract: A crosslinking agent containing a polyallyl ether compound having at least one hydroxyl group derived from a glycidyl group and at least two allyl groups can be used for the production of a highly water-absorbing polymer comprising a polymerizable compound having a carbon-carbon double bond or a salt thereof, has a high solubility in aqueous solution of the monomer and gives a highly water-absorbing polymer having water absorptivity required at practical levels.Type: GrantFiled: April 19, 2002Date of Patent: December 28, 2004Assignee: Daiso Co., Ltd.Inventors: Shin-ichiro Nakamura, Yasumi Shimizu, Tohru Matsutomi