Five-membered Heterocyclic Ring Contains At Least One Nitrogen Atom As A Ring Member Patents (Class 528/117)
  • Patent number: 10858533
    Abstract: An anti-reflective hardmask composition contains: (a) an arylcarbazole derivative polymer represented by the following Chemical Formula 1 or a polymer blend containing the same; and (b) an organic solvent in Chemical Formula 1, A1 and A2 are each independently a (C6-C40) aromatic aryl group and are the same as or different from each other, R is t-butyloxycarbonyl (t-BOC), ethoxyethyl, isopropyloxyethyl, or tetrahydropyranyl, X1 and X2 are each a polymerization linkage group derived from aldehyde or an aldehyde acetal monomer capable of being one-to-one polymerized with an arylcarbazole derivative and A2 in the presence of an acid catalyst, m/(m+n) is in a range of 0.05 to 0.8, and a weight average molecular weight (Mw) of an the polymer is in a range of 1,000 to 30,000.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: December 8, 2020
    Assignees: OLAS CO., LTD.
    Inventor: Sang Jun Choi
  • Patent number: 10017614
    Abstract: The present invention relates to an epoxy-resin composition as matrix component for sheet molding compounds (SMC) and/or bulk molding compounds (BMC), comprising a resin component comprising at least one epoxy resin and a hardener component comprising at least one imidazole compound and at least one latent hardener. In said epoxy-resin composition, the amount of the imidazole compounds used is in the range from 0.007 to 0.025 mol per mole of epoxy groups of the entire composition, and the total amount of primary amine groups optionally comprised does not exceed a proportion of 0.09 mol per mole of epoxy groups of the entire composition. The invention also relates to a fiber-matrix-semifinished-product composition (SMC composition or BMC composition) with, as matrix component, the epoxy-resin composition mentioned, and with, suspended therein, short reinforcement fibers with an average length of from 0.3 to 5.0 cm.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: July 10, 2018
    Assignee: Reichhold AS
    Inventors: Chunhong Yin, Achim Kaffee, Michael Henningsen, Joachim Zwecker, Lionel Gehringer
  • Patent number: 8993708
    Abstract: A carbazole polymer including a repeating unit represented by Formula 1 and having excellent one electron oxidation-state stability, wherein, in Formula 1, R1-R4 each independently represents an alkyl group having 1-60 carbon atoms, a haloalkyl group having 1-60 carbon atoms, or similar, Cz represents a divalent group including a carbazole skeleton represented by Formula 2, and Ar represents a divalent aromatic ring or similar; wherein, in Formula 2, R5 represents a hydrogen atom, an alkyl group having 1-60 carbon atoms, or similar, R6-R11 each independently represents a hydrogen atom, a halogen atom, or similar, and m represents an integer 1-10.
    Type: Grant
    Filed: January 22, 2013
    Date of Patent: March 31, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yuki Shibano, Takuji Yoshimoto
  • Patent number: 8946376
    Abstract: The present invention relates to 1,4-diketopyrrolo[3,4-c]pyrrole (DPP) derivatives of the below formula to their manufacture; to their use as organic semiconductors, e.g. in semiconductor devices, especially a sensor, a diode, a photodiode, an organic field effect transistor, a transistor for flexible displays, and/or a solar cell (photovoltaic cell); to such semiconductor devices comprising diketopyrrolopyrrol derivatives of the formula I as a semiconducting effective means, and to devices containing said semiconductor devices. The compounds of the formula I have excellent solubility in organic solvents. High efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when said compounds are used in semiconductor devices or organic photovoltaic (PV) devices.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: February 3, 2015
    Assignee: BASF SE
    Inventors: Frank Würthner, Sabin-Lucian Suraru, Pascal Hayoz
  • Patent number: 8912294
    Abstract: Polyamines A1 of formula (I) or (II). They can be easily synthesized from readily available raw materials and have no primary amino groups or only a low content of primary amino groups and thus exhibit hardly any blushing. Their viscosity is relatively low, compared with polyamine/polyepoxide adducts of the polyamine on which polyamine A1 is based. Thus epoxy resin compositions can be formulated that are free of benzyl alcohol and free of blushing.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: December 16, 2014
    Assignee: Sika Technology AG
    Inventor: Pierre-Andre Butikofer
  • Patent number: 8883958
    Abstract: Disclosed are certain polymeric compounds and their use as organic semiconductors in organic and hybrid optical, optoelectronic, and/or electronic devices such as photovoltaic cells, light emitting diodes, light emitting transistors, and field effect transistors. The disclosed compounds can provide improved device performance, for example, as measured by power conversion efficiency, fill factor, open circuit voltage, field-effect mobility, on/off current ratios, and/or air stability when used in photovoltaic cells or transistors. The disclosed compounds can have good solubility in common solvents enabling device fabrication via solution processes.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: November 11, 2014
    Assignee: Raynergy Tek Inc.
    Inventors: Antonio Facchetti, Hakan Usta, Hualong Pan, Martin Drees, Mitchell Denti
  • Patent number: 8865861
    Abstract: A Pechmann dye based polymer of formula 1, below, is provided.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: October 21, 2014
    Assignee: Xerox Corporation
    Inventors: Anthony J. Wigglesworth, Yiliang Wu, Ping Liu
  • Patent number: 8853349
    Abstract: Conjugated polymers and small molecules including the nonplanar aromatic 1,6-methano[10]annulene ring structure along with aromatic subunits, such as diketopyrrolopyrrole, and 2,1,3-benzothiadiazole, substituted with alkyl chains in a “Tail In,” “Tail Out,” or “No Tail” regiochemistry are disclosed.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: October 7, 2014
    Inventors: John D. Tovar, Benjamin C. Streifel, Patricia A. Peart
  • Patent number: 8828268
    Abstract: The present invention pertains to the field of thermosetting or thermoset polymers mainly used as materials, coatings or adhesives. The invention more specifically relates to the use of specific molecules having associative groups including a nitrogen heterocycle as a hardener or co-hardener of thermosetting polymers.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: September 9, 2014
    Assignee: Arkema France
    Inventors: Bruno Van Hemelryck, Manuel Hidalgo
  • Patent number: 8809484
    Abstract: An extended isoindigo polymer of Formula (I), below, is provided.
    Type: Grant
    Filed: December 27, 2012
    Date of Patent: August 19, 2014
    Assignee: Xerox Corporation
    Inventors: Anthony J. Wigglesworth, Yiliang Wu
  • Patent number: 8772442
    Abstract: Disclosed are certain polymeric compounds and their use as organic semiconductors in organic and hybrid optical, optoelectronic, and/or electronic devices such as photovoltaic cells, light emitting diodes, light emitting transistors, and field effect transistors. The disclosed compounds can provide improved device performance, for example, as measured by power conversion efficiency, fill factor, open circuit voltage, field-effect mobility, on/off current ratios, and/or air stability when used in photovoltaic cells or transistors. The disclosed compounds can have good solubility in common solvents enabling device fabrication via solution processes.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 8, 2014
    Assignee: Polyera Corporation
    Inventors: Zhengguo Zhu, Hualong Pan, Martin Drees, Hakan Usta, Shaofeng Lu, Antonio Facchetti
  • Patent number: 8722841
    Abstract: There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: May 13, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Tetsuya Shinjo, Keisuke Hashimoto
  • Patent number: 8691931
    Abstract: Polymers which can be used in p-type materials for organic electronic devices and photovoltaic cells. Compounds, monomers, dimers, trimers, and polymers comprising: wherein A1 and A2 each independently comprise a fused ring system comprising at least two fused rings directly covalently linked to the pyrrole rings. Good photovoltaic efficiency and lifetime can be achieved. The R group can provide solubility, environmental stability, and fine tuning of spectroscopic and/or electronic properties. Different polymer microstructures can be prepared which encourage multiple band gaps and broad and strong absorptions. The carbonyl can interact with adjacent thiophene rings to provide backbone with rigidity, induce planarity, and reduce and/or eliminate intramolecular chain twisting defects.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: April 8, 2014
    Assignee: Plextronics, Inc.
    Inventors: Christopher T. Brown, Christophe René Gaston Grenier, Chad Landis, Elena E. Sheina, Ting Xu
  • Patent number: 8674052
    Abstract: There is provided a resist underlayer film having heat resistance that is used for a lithography process in the production of semiconductor devices, and a high refractive index film having transparency that is used for an electronic device. A polymer comprising a unit structure of Formula (1): wherein each of R1, R2, R3, and R5 may be a hydrogen atom, R4 may be phenyl group or naphthyl group. A resist underlayer film forming composition comprising the polymer, and a resist underlayer film formed from the composition. A high refractive index film forming composition comprising the polymer, and a high refractive index film formed from the composition.
    Type: Grant
    Filed: January 4, 2013
    Date of Patent: March 18, 2014
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Daigo Saito, Hiroaki Okuyama, Hideki Musashi, Tetsuya Shinjo, Keisuke Hashimoto
  • Patent number: 8604147
    Abstract: A porphyrin copolymer containing quinoxaline unit, preparation method and uses thereof are disclosed. The copolymer has the structural formula (I), wherein R1, R2, R3, R4 are selected from C1˜C32 alkyl groups, and n is an integer between 1 and 100. The copolymer is useful in the fields of solar battery and the like.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: December 10, 2013
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Jie Huang, Yijin Liu
  • Patent number: 8598302
    Abstract: A perylenetetracarboxylic acid diimide organic semiconductive material is represented by the following formula (I), which belongs to the field of photoelectric material. In formula (I), n is an integer of 1-100, R1, R2 or R3 is hydrogen, C1-C20 alkyl, C1-C20 alkoxyl, phenyl or alkoxyphenyl, R4 or R5 is C1-C20 alkyl, R6 or R7 is hydrogen, C1-C20 alkyl, C1-C20 alkoxyl or phenyl.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: December 3, 2013
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Jie Huang, Rong Guan
  • Patent number: 8598299
    Abstract: A semiconductor composition for producing a semiconducting layer with consistently high mobility is disclosed. The semiconductor composition includes a diketopyrrolopyrrole-thiophene copolymer and a non-aromatic halogenated hydrocarbon solvent. The copolymer has a structure disclosed within. Preferably, the non-aromatic halogenated hydrocarbon solvent contains at least 2 carbon atoms and at least 3 halogen atoms.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: December 3, 2013
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Anthony James Wigglesworth, Ping Liu
  • Patent number: 8598301
    Abstract: A copolymer containing fluorenylporphyrin-anthracene is disclosed, which comprises a polymer represented by formula (1), in which R1, R2, R3 and R4, which may be identical or different, are C1-C16 alkyl, and n is an integer of 1 to 100. A preparation method of the copolymer containing fluorenylporphyrin-anthracene and the application thereof in manufacture of solar cell devices, organic field-effect transistors, organic electroluminescent devices, organic optical storage device, organic nonlinear materials or organic laser devices are also disclosed.
    Type: Grant
    Filed: January 30, 2010
    Date of Patent: December 3, 2013
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Jie Huang, Yijin Liu
  • Patent number: 8546512
    Abstract: A copolymer containing fluorenylporphyrin-benzene is disclosed, which comprises a copolymer represented by formula (1), in which R1, R2, R3 and R4, which may be identical or different, are C1-C16 alkyl, and n is an integer of 1 to 100. The preparation method of said copolymer containing fluorenylporphyrin-benzene and the use thereof in manufacture of solar batteries components, organic field effect transistors, organic electroluminescent components, organic optical storage components, organic non-linear materials or organic laser components are also disclosed.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: October 1, 2013
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Jie Huang, Yijin Liu
  • Patent number: 8507637
    Abstract: A porphyrin copolymer containing thienothiadiazole units, preparation method and uses thereof are disclosed. The copolymer has the structural formula (I), wherein: R1, R2, R3, R4 are same or different and each represents a C1-C32 alkyl; n is an integer of 1-100. The copolymer comprises fluorene units, thienothiadiazole units and porphyrin units, which enhance the density of electron cloud in copolymer skeleton, make the band-gap of the copolymer become narrow, thereby broaden the spectral response range of the copolymer, and improve the photoelectric transformation efficiency.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: August 13, 2013
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Jie Huang, Yijin Liu
  • Patent number: 8288504
    Abstract: The present invention is directed to a method for preparing a cyclic guanidine comprising reacting (i) a cyanamide, (ii) a polyamine, and (iii) a weak acid. The present invention is also directed to a coating composition comprising the cyclic guanidine.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: October 16, 2012
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Steven R. Zawacky, Charles R. Hickenboth, Richard F. Karabin, Gregory J. McCollum, Thomas C. Moriarity
  • Patent number: 8268158
    Abstract: Copper plating baths containing a leveling agent that is a reaction product of a certain imidazole with a certain epoxide-containing compound that deposit copper on the surface of a conductive layer are provided. Such plating baths deposit a copper layer that is substantially planar on a substrate surface across a range of electrolyte concentrations. Methods of depositing copper layers using such copper plating baths are also disclosed.
    Type: Grant
    Filed: August 11, 2011
    Date of Patent: September 18, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Zukhra I. Niazimbetova, Elie H. Najjar, Maria Anna Rzeznik, Erik Reddington
  • Patent number: 8268157
    Abstract: Copper plating baths containing a leveling agent that is a reaction product of a certain imidazole with a certain epoxide-containing compound that deposit copper on the surface of a conductive layer are provided. Such plating baths deposit a copper layer that is substantially planar on a substrate surface across a range of electrolyte concentrations. Methods of depositing copper layers using such copper plating baths are also disclosed.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: September 18, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Zukhra I. Niazimbetova
  • Patent number: 8262895
    Abstract: Copper plating baths containing a leveling agent that is a reaction product of a certain benzimidazole with a certain epoxide-containing compound that deposit copper on the surface of a conductive layer are provided. Such plating baths deposit a copper layer that is substantially planar on a substrate surface across a range of electrolyte concentrations. Methods of depositing copper layers using such copper plating baths are also disclosed.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: September 11, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Zukhra I. Niazimbetova, Maria Anna Rzeznik
  • Patent number: 8247517
    Abstract: The use of 1,3-substituted imidazolium salts of the formula I in which R1 and R3 independently of one another are an organic radical having 1 to 20 C atoms, R2, R4, and R5 independently of one another are an H atom or an organic radical having 1 to 20 C atoms, it also being possible for R4 and R5 together to form an aliphatic or aromatic ring, and X is a dicyanamide anion as latent catalysts for curing compositions comprising epoxy compounds.
    Type: Grant
    Filed: June 9, 2008
    Date of Patent: August 21, 2012
    Assignee: BASF SE
    Inventors: Lars Wittenbecher, Michael Henningsen, Georg Degen, Matthias Maase, Manfred Doering, Ulrich Arnold
  • Patent number: 8247051
    Abstract: A coating composition is provided for use in laminate substrates useful in packaging of liquids and solids where the coating provides and increased resistance to the permeability of gases such as oxygen and carbon dioxide. In one embodiment the coating composition is a dispersion or a solution that comprises at least one hydroxyl functional polyetheramine, phosphoric acid and a defoamer. The backbone of the polyetheramine has diglycidyl ether linkages that comprise about 5 to about 70 mole percent resorcinol diglycidyl ether. The coating composition can be applied to substrates by coating applications such as spraying, rolling reverse and direct, rolling direct and reverse gravure, kiss coat, flow coating, brushing, dipping and curtain-wall coating, for example.
    Type: Grant
    Filed: August 1, 2006
    Date of Patent: August 21, 2012
    Assignee: The Glidden Company
    Inventors: Daniel Bode, Cathy Li, Kenneth J. Gardner
  • Patent number: 8211330
    Abstract: A latent epoxy resin curing agent is provided which can be manufactured without using an amphiphilic polymer compound requiring a painful trial and error selection process, exhibits excellent solvent resistance and low-temperature fast-curing ability, and contains an imidazole-based compound as a main component. In the latent epoxy resin curing agent containing the imidazole-based compound as a main component, the adduct particles of the epoxy-based compound and the imidazole-based compound are coated with an ethyl cellulose film, and the surface thereof is crosslinked with a polyfunctional isocyanate compound. The epoxy-based compound, the imidazole-based compound, and ethyl cellulose are dissolved in a predetermined saturated hydrocarbon-based solvent under stirring and heating. Then, the epoxy-based compound and the imidazole-based compound are subjected to adduct reaction to obtain a slurry of the adduct.
    Type: Grant
    Filed: March 27, 2008
    Date of Patent: July 3, 2012
    Assignee: Sony Chemical & Information Device Corporation
    Inventors: Daisuke Masuko, Katsuhiko Komuro, Masahiko Ito, Tadasu Kawashima
  • Patent number: 8193297
    Abstract: The use of 1,3-substituted imidazolium salts of the formula I in which R1 and R3 independently of one another are an organic radical having 1 to 20 C atoms, R2, R4, and R5 independently of one another are an H atom or an organic radical having 1 to 20 C atoms, it also being possible for R4 and R5 together to form an aliphatic or aromatic ring, and X is a thiocyanate anion as latent catalysts for curing compositions comprising epoxy compounds.
    Type: Grant
    Filed: June 6, 2008
    Date of Patent: June 5, 2012
    Assignee: BASF SE
    Inventors: Lars Wittenbecher, Matthias Maase, Georg Degen, Michael Henningsen, Manfred Doering, Ulrich Arnold
  • Patent number: 8158746
    Abstract: The invention provides an active energy ray curable liquid composition containing a compound having a bonding group represented by a general formula (I), and a liquid cartridge. ([A] in the formula (I) is a cyclic group represented by a general formula (II), [Y] in the formula (II) is a cyclic linking group having a carbonyl group and a site containing an unsaturated carbon bond adjacent to the carbonyl group, and E in the formula (I) is a bonding group having at least one amide bond and at least one of divalent organic groups which may be substituted.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: April 17, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenji Shinjo
  • Patent number: 8158744
    Abstract: A polymer of Formula (I) wherein R1, R2, Ar1, Ar2, and n are as described herein. The polymer may be used in a semiconducting layer of an electronic device.
    Type: Grant
    Filed: March 1, 2011
    Date of Patent: April 17, 2012
    Assignee: Xerox Corporation
    Inventors: Yiliang Wu, Ping Liu, Anthony James Wigglesworth, Nan-Xing Hu
  • Patent number: 8148490
    Abstract: The present invention is directed to a method for preparing a cyclic guanidine comprising reacting (i) a guanidinium, (ii) a polyamine, and (iii) a weak acid. The present invention is also directed to a coating composition comprising the cyclic guanidine.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: April 3, 2012
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Gregory J. McCollum, Charles R. Hickenboth, Richard F. Karabin, Thomas C. Moriarity, Steven R. Zawacky
  • Patent number: 8128837
    Abstract: A latent epoxy resin curing agent is provided which exhibits excellent solvent resistance and low-temperature fast-curing ability, and contains an imidazole-based compound as a main component. In the latent epoxy resin curing agent containing the imidazole-based compound as a main component, adduct particles formed through adduct reaction of an epoxy-based compound with the particulate imidazole-based compound are coated with an ethyl cellulose film. Furthermore, the surfaces of the adduct particles may be crosslinked with a polyfunctional isocyanate compound. A mixture of the epoxy-based compound, the particulate imidazole-based compound, and ethyl cellulose in a predetermined saturated hydrocarbon-based solvent is heated under stirring. Then, the epoxy-based compound and the particulate imidazole-based compound are subjected to adduct reaction to give a slurry of the adduct. After the slurry is cooled, the latent epoxy resin curing agent is filtrated.
    Type: Grant
    Filed: March 27, 2008
    Date of Patent: March 6, 2012
    Assignees: Sony Corporation, Sony Corporation & Information Device Corporation
    Inventors: Daisuke Masuko, Katsuhiko Komuro, Masahiko Ito, Tadasu Kawashima
  • Patent number: 8039537
    Abstract: A modified bismaleimide resin of Formula (I) or (II) is provided. In Formula (I) or (II), Q is —CH2—, —C(CH3)2—, —O—, —S—, —SO2— or null, R is —(CH2)2—, —(CH2)6—, —(CH2)8—, —(CH2)12—, —CH2—C(CH3)2—CH2—CH(CH3)—CH2—CH2—, 10<n<500, and x+y=n. The invention also provides a method for preparing a modified bismaleimide resin and a composition including the modified bismaleimide resin.
    Type: Grant
    Filed: February 22, 2010
    Date of Patent: October 18, 2011
    Assignee: Industrial Technology Research Institute
    Inventors: Feng-Po Tseng, Lu-Shih Liao, Kuo-Chan Chiou
  • Patent number: 7932344
    Abstract: A polymer has a structure represented by: wherein each R is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each M is conjugated moiety selected from: and substituted derivatives and combinations thereof, a represents a number that is at least 1; b represents a number from 1 to 20; n represents a number from 2 to 500 a represents a number that is at least 1, b represents a number from 0 to 20, n represents a number from 2 to 5000, each X is independently selected from S, Se, 0, and NR?, where each R? is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each Z is independently one of an optionally substituted hydrocarbon, a hetero-containing group, and a halogen, d represents a number which is at least 1, and e represents a number from zero to 2.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: April 26, 2011
    Assignee: Xerox Corporation
    Inventor: Yuning Li
  • Patent number: 7910684
    Abstract: A thin film transistor device includes a semiconductor layer. The semiconductor layer includes a compound comprising a chemical structure represented by: wherein each R is independently selected from hydrogen, an optionally substituted hydrocarbon, and a hetero-containing group, each Ar is independently selected from optionally substituted aryl and heteroaryl groups, each M is an optional, conjugated moiety, a represents a number that is at least 1, b represents a number from 0 to 20, and n represents a number that is at least 1.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: March 22, 2011
    Assignee: Xerox Corporation
    Inventor: Yuning Li
  • Patent number: 7683153
    Abstract: Acyl-ethyleneurea terminated compounds based on the reaction of ethyleneurea with dibasic acids or methyl esters of dibasic acids or cyclic anhydrides are useful as modifying agents, cure accelerators and blocking agents with tertiary amine catalysts for epoxy resins. As epoxy modifiers, they react with epoxy resins at 120 degrees C. without a catalyst to produce modified epoxies having increased viscosity and increased reactivity and solvent power. When combined with a suitable tertiary amine catalyst, they are useful as cure accelerators at a low cure temperature of about 80 degrees C. When combined with a tertiary amine, they form complexes which provide superior latency of the epoxy-hardener mixture at 20 degrees C. Heat-curable epoxy-based compositions treated with the materials of the invention and processes whereby the various novel compositions of the invention are made, are also described.
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: March 23, 2010
    Assignee: ARDES Enterprises, Inc.
    Inventor: Richard D. Schile
  • Patent number: 7501087
    Abstract: An epoxy resin composition comprises (a) an epoxy resin, (b) an anionic polymerization initiator and (c) from 1 to 30 parts by weight per 100 parts by weight of epoxy resin (a) of an aromatic ring-containing proton donor of a polyhydric alcohol and/or a polymercaptan.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: March 10, 2009
    Assignee: Toray Industries, Inc.
    Inventors: Toshiya Kamae, Hiroki Oosedo, Go Tanaka, Shigeo Iwasawa
  • Patent number: 7148294
    Abstract: An epoxy resin composition comprises (a) an epoxy resin, (b) an anionic polymerization initiator and (c) from 1 to 30 parts by weight per 100 parts by weight of epoxy resin (a) of an aromatic ring-containing proton donor of a polyhydric alcohol and/or a polymercaptan.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: December 12, 2006
    Assignee: Toray Industries, Inc.
    Inventors: Toshiya Kamae, Hiroki Oosedo, Go Tanaka, Shigeo Iwasawa
  • Patent number: 7008555
    Abstract: A curing agent for epoxy agent having N-phenyl-p-phenylenediamine(4-aminodiphenylamine). An epoxy resin combination having a main agent and a curing agent. The main agent has an epoxy resin. The curing agent has a N-phenyl-p-phenylenediamine(4-aminodiphenylamine).
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: March 7, 2006
    Assignee: Applied Poleramic Inc.
    Inventors: Brian S. Hayes, Richard Moulton, Doyle Dixon, Leonid Vorobyev
  • Patent number: 6992154
    Abstract: The present invention provides a cyclic olefin addition copolymer which has a reactive silyl group having a specific structure, excels in optical transparency, heat resistance, and adhesion, and is capable of producing a crosslinked product having improved dimensional stability, solvent resistance, and chemical resistance. The present invention also provides a process for producing the cyclic olefin addition copolymer, a crosslinking composition, a crosslinked product and a process for producing the same, and an optically transparent material (transparent resin film) comprising the cyclic olefin addition copolymer. The optically transparent material excels in optical transparency and heat resistance, exhibits improved dimensional stability, adhesion, solvent resistance, and chemical resistance, and is capable of improving fragility and preventing occurrence of cracks in the film.
    Type: Grant
    Filed: October 21, 2004
    Date of Patent: January 31, 2006
    Assignee: JSR Corporation
    Inventors: Noboru Oshima, Yooichiroh Maruyama, Michitaka Kaizu, Katsutoshi Sawada, Toshihiro Hayashi, Kenzo Ohkita
  • Patent number: 6987161
    Abstract: Hardeners are provided for curing epoxies at lower temperatures than currently available hardeners while retaining superior mechanical and thermal properties. A first component is selected from imidazole, dicyandiamide, or a mixture of polyamines and tertiary amines. A poiyol mixture is then selected. The first component is combined with the polyol mixture to form a hardener. The hardener is combined with epoxy resin and is cured. A method for selecting a hardener to yield an epoxy-hardener system with good properties after curing at a specified temperature and time includes selecting components for the hardener so the glass transition temperature of the cured epoxy-hardener system is not significantly lower than 45° C. above the cure temperature. The method includes steps for adjusting and controlling the ultimate glass transition temperature to maximize the mechanical properties of the epoxy-hardener system. The method regularly produces hardened epoxy systems having about 90% or more epoxy groups reactect.
    Type: Grant
    Filed: April 25, 2003
    Date of Patent: January 17, 2006
    Assignee: Ardes Enterprise, Inc.
    Inventor: Richard D. Schile
  • Patent number: 6844403
    Abstract: The present invention provides a cyclic olefin addition copolymer which has a reactive silyl group having a specific structure, excels in optical transparency, heat resistance, and adhesion, and is capable of producing a crosslinked product having improved dimensional stability, solvent resistance, and chemical resistance. The present invention also provides a process for producing the cyclic olefin addition copolymer, a crosslinking composition, a crosslinked product and a process for producing the same, and an optically transparent material (transparent resin film) comprising the cyclic olefin addition copolymer. The optically transparent material excels in optical transparency and heat resistance, exhibits improved dimensional stability, adhesion, solvent resistance, and chemical resistance, and is capable of improving fragility and preventing occurrence of cracks in the film.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: January 18, 2005
    Assignee: JSR Corporation
    Inventors: Noboru Oshima, Yooichiroh Maruyama, Michitaka Kaizu, Katsutoshi Sawada, Toshihiro Hayashi, Kenzo Ohkita
  • Patent number: 6808819
    Abstract: A resin composition comprising the associated product of a polyimide resin having acid anhydride groups in the skeleton with an epoxy resin-curing catalyst, an epoxy resin, and optionally, an epoxy resin-curing agent has excellent adhesion, heat resistance, shelf stability and solvent resistance. An adhesive film comprising the resin composition is useful as an adhesive or sealant for printed circuit boards and semiconductor packages.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: October 26, 2004
    Assignee: Shin Etsu Chemical Co., Ltd.
    Inventors: Nobuhiro Ichiroku, Toshio Shiobara
  • Patent number: 6809130
    Abstract: A halogen-free, phosphorus-free poly-cyclic compound is used a flame retardant. This compound has amide and hydroxy groups, and thus it is able to react with an epoxy resin to form a reactive type flame-retardant advanced epoxy resin. The advanced epoxy resin together with an inorganic additive are mixed with an epoxy resin to form a halogen-free, phosphorus-free flame-retardant epoxy composition, which can be used in the manufacture of a printed circuit board and as an encapsulation material for a semi-conductor device.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: October 26, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Kuo-Chan Chiou, Tzong-Ming Lee, Feng-Po Tseng, Lu-Shih Liao, Jia-Chi Huang, Tzu-Ting Lin
  • Patent number: 6794479
    Abstract: A moisture-curable epoxy resin composition comprises a polyepoxide and a 2-alkyl-3-methyl or ethyl-oxazolidine wherein the 2-alkyl group the alkyl group is attached to the oxazolidine ring via a secondary or tertiary carbon atom.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: September 21, 2004
    Assignee: The Yokohama Rubber CO, LTD
    Inventors: Hiroyuki Okuhira, Kazunori Ishikawa
  • Patent number: 6727325
    Abstract: The present invention has an object to provide curatives for epoxy resins and curing accelerators for epoxy resins, which both have improved subliming and decomposing properties and which, when mixed with an epoxy resin, enable the mixture to be greatly improved in thermal stability that is extremely important for the control of a curing reaction and to have a prolonged pot life (stability as a one-pack mixture comprising the epoxy resin, curative, etc.) and improved curability at low temperatures.
    Type: Grant
    Filed: June 23, 1999
    Date of Patent: April 27, 2004
    Assignee: Nippon Soda Co. Ltd.
    Inventors: Hiroshi Suzuki, Satoru Abe, Izuo Aoki
  • Patent number: 6706835
    Abstract: Adhesion promoting compounds or resins containing a thiazole functionality (including benzothiazole) and a polymerizable functionality (Z) give improved adhesive strength to metal substrates. A representative structure is the following, in which R1 and R2 together can form a cyclic or aromatic structure, or are linear or branched organic moieties.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: March 16, 2004
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventor: Osama M. Musa
  • Patent number: 6660386
    Abstract: A primer for flame sprayed polyolefin comprises an epoxy resin, preferably of low molecular weight and/or low viscosity; and an amine hardener, part of which becomes highly reactive on exposure to open flame, providing near instant cure of the composition under flame spray conditions. The invention is unique that it provides strong adhesion to steel, even where the surface preparation is less than ideal, as well as to concrete and other substrates. The primer eliminates the need to preheat the substrate. The primer has strong adhesion to the topcoat polyolefinic material, especially to a functionalized topcoat. The composition withstands open flame and does not char under polyolefin flame spray conditions, nor does it run or sag, and it is not prone to failure as it cools after the application of the polyolefin.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: December 9, 2003
    Assignee: Polymer Ventures, L.L.C.
    Inventor: Shah A. Haque
  • Patent number: 6613449
    Abstract: A solventless non-filler underfill material for COF mounting comprising an organic material, which is used to fill the gap between an FPC having a polyimide film substrate and a copper circuit layer having a thickness of 9 &mgr;m or smaller and an IC chip mounted on the FPC, exhibits such adhesion as to destroy a silicon wafer in a polyimide film/silicon wafer adhesion test, and provides a cured film having a tensile modulus of 150 kg/mm2 or less.
    Type: Grant
    Filed: January 29, 2002
    Date of Patent: September 2, 2003
    Assignee: UBE Industries, Ltd.
    Inventors: Hiroaki Yamaguchi, Masafumi Kohda
  • Patent number: 6576297
    Abstract: A coating, sealant or adhesive composition curable at ambient temperatures of 40° C. or below comprises an epoxy resin and an amine-functional curing agent. The curing agent comprises a material containing at least two, and preferably at least three, heterocyclic secondary amine group.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: June 10, 2003
    Assignee: International Coatings Ltd.
    Inventors: Colin Cameron, Anna Thomas, Alastair Robert Marrion, Ian David Fletcher, Stefan Norbert Rudiger Niedoba