Phenolic Reactant Contains At Least Three Distinct Aromatic Or Carbocyclic Rings Or Mixtures Thereof Patents (Class 528/98)
  • Patent number: 11760906
    Abstract: A composite dry adhesive includes (a) an adhesive layer comprising a shape memory polymer and (b) a resistive heating layer comprising a shape memory polymer composite on the adhesive layer. The shape memory polymer composite includes conductive particles dispersed in a shape memory polymer matrix, where the conductive particles have a concentration sufficient to form a conductive path through the resistive heating layer.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: September 19, 2023
    Assignee: THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS
    Inventors: Seok Kim, Jeffrey D. Eisenhaure
  • Patent number: 11447458
    Abstract: A tannic acid curing agent and a preparation method thereof are provided. The present invention uses tannic acid as a raw material and the long fatty chain of 10-undecenoyl chloride is introduced into the tannic acid structure to obtain the tannic acid curing agent. The preparation method includes the following steps: mixing tannic acid, 10-undecenoyl chloride, a catalyst and a solvent for a substitution reaction to obtain undecylenyl tannic acid, in which the catalyst includes an acid binding agent and 4-diaminopyridine, and the solvent includes ethyl acetate and N,N-dimethylformamide; mixing the undecylenyl tannic acid, a mercapto compound, a solvent and a photoinitiator for an addition reaction under an ultraviolet irradiation to obtain the tannic acid curing agent, in which the mercapto compound is a mercapto carboxylic acid compound or a mercapto alcohol compound.
    Type: Grant
    Filed: January 29, 2021
    Date of Patent: September 20, 2022
    Assignee: Jiangxi Science and Technology Normal University
    Inventors: Changqing Fu, Liang Shen, Yaqi Hu
  • Patent number: 11427707
    Abstract: Provided is a resin composition for a fiber-reinforced composite material that has low tackiness when turned into a prepreg, has satisfactory handleability, and can be suppressed in deformation at the time of its release from a mold in a PCM method. The resin composition is a resin composition for a fiber-reinforced composite material including, as essential components: a liquid epoxy resin (A); a novolac-type epoxy resin (B); a polymer component (C) having a molecular weight of 10,000 or more; dicyandiamide (D); and an imidazole-based curing aid (E), wherein the resin composition includes 10 parts by mass to 35 parts by mass of the liquid epoxy resin (A), and 10 parts by mass to 25 parts by mass of the polymer component (C) out of 100 parts by mass of the total of the components (A) to (E), and has a glass transition temperature of 0° C. or more before its curing.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: August 30, 2022
    Assignee: NIPPON STEEL CHEMICAL & MATERIAL CO., LTD.
    Inventors: Yasuyuki Takao, Yuichi Taniguchi
  • Patent number: 11046808
    Abstract: A preparation method of thermadapt shape memory polymers includes: (1) synthesis of pendant hydroxyl groups functionalized epoxy oligomer using epoxy resin and alcohol amine; (2) synthesis of alkoxyl groups terminated silane crosslinking agent by isocyanate silane coupling agent and diamine; (3) crosslinked shape memory polymers were prepared by condensation reaction of pendant hydroxyl groups functionalized epoxy oligomer and alkoxyl groups terminated silane crosslinking agent. The thermadapt shape memory polymers show high glass transition temperatures and high tensile strength. The original shape of thermadapt shape memory polymers can be reconfigured to a new permanent shape as needed, and thus effectively solving the bottleneck problems of reprocessing or reshape in the traditional crosslinked polymers once after molding.
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: June 29, 2021
    Assignee: SOOCHOW UNIVERSITY
    Inventors: Aijuan Gu, Zhenjie Ding, Guozheng Liang, Li Yuan
  • Patent number: 9790241
    Abstract: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.
    Type: Grant
    Filed: June 27, 2014
    Date of Patent: October 17, 2017
    Assignees: Toyo Goesi Co., Ltd., Osaka University
    Inventor: Takashi Miyazawa
  • Patent number: 9650449
    Abstract: Provided herein are telechelic polymers and methods for producing the same. In some embodiments, provided herein are compounds having the formula and methods for producing the same.
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: May 16, 2017
    Assignee: The University of Southern Mississippi
    Inventors: Robson F. Storey, David L. Morgan
  • Patent number: 9074090
    Abstract: A photonic device is provided having a two or three-dimensionally periodic structure of interconnected members with alterable spacing between the members. The structure is composed of a shape memory polymer configured to be thermo-mechanically tunable to display a plurality of optical properties under a series of temperature changes and stress. A method of producing a photonic device based on a shape memory polymer is provided. A mold, having a two or three-dimensionally periodic structure of interconnected components with a characteristic spacing between the components, is infiltrated with a shape memory polymer precursor to form a composite structure. The composite structure is solidified. The mold is removed from the composite structure to form a photonic device as an inverse replica of the mold.
    Type: Grant
    Filed: April 15, 2011
    Date of Patent: July 7, 2015
    Assignee: GM Global Technology Operations LLC
    Inventors: Tao Xie, William B. Carter, Geoffrey P. McKnight
  • Patent number: 9005873
    Abstract: A method for producing a semiconductor device includes the steps of: applying a composition for forming a resist underlayer film for EUV lithography including a novolac resin containing a halogen atom onto a substrate having a film to be fabricated for forming a transferring pattern and baking the composition so as to form a resist underlayer film for EUV lithography; and applying a resist for EUV lithography onto the resist underlayer film for EUV lithography, irradiating, with EUV through a mask, the resist underlayer film for EUV lithography and a film of the resist for EUV lithography on the resist underlayer film, developing the film of the resist for EUV lithography, and transferring an image formed in the mask onto the substrate by dry etching so as to form an integrated circuit device.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: April 14, 2015
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Rikimaru Sakamoto, Takafumi Endo, Bangching Ho
  • Patent number: 9006369
    Abstract: Water based lignoepoxy resins, and methods for their preparation and use are provided. Methods of making lignoepoxy resins without the use of volatile organic compounds are also provided.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: April 14, 2015
    Assignee: Empire Technology Development LLC
    Inventor: Georgius Abidal Adam
  • Patent number: 8999510
    Abstract: A metal-clad phenolic resin laminate obtained by heating and pressing a lamination which comprises: (i) a central layered portion comprising one paper base prepreg which is made of a paper base impregnated with a first phenolic resin composition containing a resol-based resin, or a predetermined number of the paper base prepregs laid on each other; (ii) outer layered portions laid on an upper and a lower sides of the central layered portion, in which each of the outer layered portions comprises one glass fiber substrate prepreg which is made of a glass fiber substrate impregnated with a second phenolic resin composition containing a resol-based resin, or a predetermined number of the glass fiber substrate prepregs laid on each other; and (iii) a metal foil laid at least on one of the outer layered portions laid on the upper and lower sides of the central layered portion.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: April 7, 2015
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventor: Masao Uesaka
  • Publication number: 20150051317
    Abstract: This invention relates to a cardanol modified epoxy resin composition, especially, relates to a cardanol and/or dihydric phenol modified epoxy resin composition, a process making thereof and its application in low VOC high solids coating.
    Type: Application
    Filed: March 20, 2012
    Publication date: February 19, 2015
    Inventors: Yan Wu, Chen Chen, Yue Shen, Yurun Yang
  • Patent number: 8937145
    Abstract: An epoxy resin composition prepared from a dihydroxydiphenyl-cycloalkane compound to form a diglycidyl ether of dihydroxydiphenyl cycloalkane compound which may be useful for making various products including, for example, powder coatings, composites and electrical laminates.
    Type: Grant
    Filed: November 10, 2010
    Date of Patent: January 20, 2015
    Assignee: Dow Global Technologies LLC
    Inventors: Robert E. Hefner, Jr., Michael J. Mullins, Guillaume Metral, Johann-Wilhelm Frey, Bernd Hoevel
  • Patent number: 8883937
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 27, 2010
    Date of Patent: November 11, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Hiromi Hayashi
  • Patent number: 8816038
    Abstract: Disclosed is a polymer which is useful for the preparation of an epoxy resin composition or a cured product thereof in film or sheet exhibiting high heat resistance, high thermal conductivity, low thermal expansion, high gas barrier property, and high toughness. The polymer is a thermoplastic aromatic ether polymer comprising a unit represented by the following general formula (1) at a ratio of 10 to 100 mol % and having a weight average molecular weight of 3,000 or more; in formula (1), X is an oxygen atom or a sulfur atom, R1 and R2 each is a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group, an alkoxy group, an aralkyl group, or a halogen atom, and n is a number of 1 to 3.
    Type: Grant
    Filed: January 10, 2007
    Date of Patent: August 26, 2014
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami
  • Publication number: 20140039146
    Abstract: Water based lignoepoxy resins, and methods for their preparation and use are provided. Methods of making lignoepoxy resins without the use of volatile organic compounds are also provided.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 6, 2014
    Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC
    Inventor: Georgius Abidal Adam
  • Publication number: 20140018471
    Abstract: Disclosed are oligomeric phosphonates including oligophosphonates, random or block co-oligo(phosphonate ester)s and co-oligo(phosphonate carbonate)s produced using a condensation process terminated with hydroxyl, epoxy, vinyl, vinyl ester, isopropenyl, isocyanate groups, and the like. These materials can be used as a reactive additive to other polymers, oligomers or monomer mixtures to impart flame resistance without diminishing melt processability which is important in the fabrication of polymers for many applications.
    Type: Application
    Filed: September 12, 2013
    Publication date: January 16, 2014
    Applicant: FRX POLYMERS, INC.
    Inventors: Lawino KAGUMBA, Jan-Pleun LENS, Dieter FREITAG
  • Patent number: 8618238
    Abstract: One embodiment includes compositions of shape memory epoxy polymers.
    Type: Grant
    Filed: October 4, 2007
    Date of Patent: December 31, 2013
    Assignee: GM Global Technology Operations LLC
    Inventors: Tao Xie, Daniel E. Rodak, William R. Rodgers
  • Patent number: 8609806
    Abstract: To provide phosphorus-containing epoxy resins and phosphorus-containing epoxy resin compositions having high levels of appearance, yield and economic efficiency and cured products thereof that are used for various applications. A phosphorus-containing phenol compound represented by Formula (3) obtained by reacting a compound represented by Formula (2) with a compound represented by Formula (1), wherein in the peak area (A) of the component represented by Formula (1) on a chromatogram measured under specific conditions by gel permeation chromatography, peak area (B) on the high-molecular-weight side of the component of Formula (1), and total area (C) of peak area (A) and peak area (B), the value obtained by dividing peak area (B) by total area (C) is 8 area % or less, and epoxy resin compositions and cured products comprising the phosphorus-containing phenol compound as an essential ingredient.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: December 17, 2013
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Tetsuya Nakanishi, Hideyasu Asakage, Seigo Takuwa
  • Publication number: 20130307167
    Abstract: The present invention relates to techniques including a phenolic oligomer of general formula (1): wherein n is an integer of 0 to 15, Rs are allyl groups, a1 and a3 are each independently 0, 1, 2 or 3, each a2 is independently 0, 1 or 2, each R? is independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group, and proviso that at least one of a1, each a2 and a3 represents 2, and a method for producing such phenolic oligomer.
    Type: Application
    Filed: October 26, 2011
    Publication date: November 21, 2013
    Applicant: MEIWA PLASTIC INDUSTRIES, LTD.
    Inventors: Kiyoshi Oomori, Yasunori Fukuda, Yoshikazu Nakagawa, Yoshitaka Ooue, Noriyuki Mitani
  • Patent number: 8546510
    Abstract: Provided are a crystalline resin cured product which shows high thermal conductivity, low thermal expansion, high heat resistance, low moisture absorption, and good gas barrier properties and a crystalline resin composite material produced therefrom. Further provided is a method for producing the crystalline resin cured product and the crystalline resin composite material. The crystalline resin cured product is obtained by the reaction of an aromatic diglycidyl compound or a diglycidyl resin with an aromatic dihydroxy compound or with a dihydroxy resin and it shows a heat of melting of 10 J/g or more in differential thermal analysis while the endothermic peak corresponding to the melting appears in the range of 120 to 320° C. The crystalline resin composite material is obtained by combining the crystalline resin cured product with a filler or a base material. The crystalline resin cured product has a unit represented by -A-O—CH2—CH(OH)—CH2—O—B—, wherein A and B are divalent aromatic groups.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: October 1, 2013
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami, Kazuhiko Nakahara, Tomomi Fukunaga
  • Publication number: 20130203898
    Abstract: The invention relates to a curable composition comprising one or more epoxy compounds, one or more amino hardeners, and an addition of one or more dendritic polymers selected from the group of the dendritic polyester polymers, where the dendritic polyester polymers can be produced through an Ax+By synthesis route.
    Type: Application
    Filed: January 30, 2013
    Publication date: August 8, 2013
    Inventors: Anna MUELLER-CRISTADORO, Jean-Francois Stumbe, Guenter Scherr, Michael Henningsen, Bernd Bruchmann, Monika Haberecht, Miran Yu, Chunhong Yin, Achim Kaffee
  • Publication number: 20130090413
    Abstract: An object of the present invention is to provide a water-soluble epoxy resin that has high water-solubility, maintains emulsion stability for epoxy resin, and is capable of forming a cured product that has excellent coating film strength corrosion resistance and water resistance. The present invention provides a water-soluble epoxy resin obtained by causing an epoxy resin (B) having two or more epoxy groups in a molecule to react with a carboxy-group-containing compound (A) obtained by reacting a polyethylene glycol monoalkyl ether (A-1) having a number-average molecular weight of 400 to 10000 and an acid anhydride (A-2) derived from a polyvalent carboxylic acid; a water-soluble epoxy resin composition containing the water-soluble epoxy resin and an epoxy resin having two or more epoxy groups in a molecule; and a water-based epoxy resin composition in which the water-soluble epoxy resin composition is dispersed in an water-based solvent.
    Type: Application
    Filed: September 21, 2011
    Publication date: April 11, 2013
    Applicant: DIC CORPORATION
    Inventors: Hideaki Kawahara, Tetsuya Yamazaki
  • Patent number: 8410210
    Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.
    Type: Grant
    Filed: May 21, 2008
    Date of Patent: April 2, 2013
    Assignee: DIC Corporation
    Inventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano
  • Patent number: 8288591
    Abstract: A variety of curing agents for epoxy resins and methods for preparation thereof are disclosed, including compounds having the structures of formulas III and IV: wherein each of R1, R2, R3, R4, and R5 is independently selected from the group consisting of H, methyl, ethyl, n-propyl, iso-propyl, a butyl, and phenyl. Epoxy-based compositions including various curing agents are also disclosed. Other epoxy curatives containing amino, phenol, and/or imine groups are disclosed.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: October 16, 2012
    Assignee: Designer Molecules, Inc.
    Inventor: Stephen M Dershem
  • Patent number: 8263714
    Abstract: An epoxy resin composition including an epoxy resin and a curing agent as essential components, in which the curing agent comprises a phenol resin which has each structural moiety of a phenolic hydroxyl group-containing aromatic hydrocarbon group (P), an alkoxy group-containing aromatic hydrocarbon group (B) and a divalent aralkyl group (X), and also has, in a molecular structure, a structure in which the phenolic hydroxyl group-containing aromatic hydrocarbon group (P) and the alkoxy group-containing aromatic hydrocarbon group (B) are bonded with the other phenolic hydroxyl group-containing aromatic hydrocarbon group (P) or alkoxy group-containing aromatic hydrocarbon group (B) via the divalent aralkyl group (X).
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: September 11, 2012
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Ichiro Ogura, Yoshiyuki Takahashi, Kazuo Arita, Kunihiro Morinaga, Yutaka Satou
  • Publication number: 20120149805
    Abstract: Compositions and methods for forming surfactants, aqueous dispersions, and curing agents are provided. In one aspect, the invention relates to improved epoxy functional surfactants prepared by reaction of an epoxy composition and an amidoamine composition formed from a blend of acid-terminated polyoxyalkylene polyols. The improved epoxy functional surfactants may be reacted with an excess of epoxy composition and water to result in an aqueous dispersion. The amidoamone composition may be a reaction mixture of a diamine compound and an acid terminated polyoxyalkylene composition formed from two or more polyoxyalkylene polyol compounds. The epoxy functional surfactant may be reacted with amine compounds to form a compound suitable as a curing agent.
    Type: Application
    Filed: December 13, 2010
    Publication date: June 14, 2012
    Inventors: Jim D. Elmore, Larry Steven Corley, Jerry R. Hite
  • Patent number: 7968672
    Abstract: A phenol aralkyl type phenolic resin represented by the general formula (1), wherein the total content of the compounds represented by formulae (2) to (4) is 58 to 92% as determined by GPC and the contents of the compounds represented by formulae (2) to (4) as determined by HPLC satisfy the following relationship: 0.60?(2a+b)/(2a+2b+2c)?0.90 wherein a is the content of the compound of formula (2); b is the content of the compound of formula (3); and c is the content of the compound of formula (4).
    Type: Grant
    Filed: November 29, 2006
    Date of Patent: June 28, 2011
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Katsuhiko Oshimi, Shigeru Moteki, Takao Sunaga, Masataka Nakanishi, Sumio Ichimura
  • Patent number: 7935739
    Abstract: An object of the present invention is to provide a cationic curable composition which has low viscosity, can be rapidly photo-cured even in the air, has good adhesion to a substrate such as glass or resin, and is excellent in glass cleaner resistance and water resistance; an ink jet ink, a gravure ink and a hard coating material which comprise the composition; and cured products thereof. A cationic curable composition comprising: (A) 1 to 100 parts by weight of a phenol derivative having 3 or more aromatic rings per molecule, wherein the aromatic ring has a structure in which some or all of hydrogen atoms of phenolic hydroxyl groups of the aromatic ring are substituted by polymerizable functional groups; (B) 1 to 500 parts by weight of a cationic polymerizable compound; and (C) 0.05 to 20 parts by weight of a photo- and/or thermo-cationic initiator is provided.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: May 3, 2011
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Atsushi Shimizu, Masao Kondo, Kuon Miyazaki
  • Publication number: 20110098380
    Abstract: Epoxy resins and mixtures of polyphenolic compounds which comprise cycloaliphatic moieties, processes for the production thereof and mixtures and cured products which comprise these resins and/or mixtures.
    Type: Application
    Filed: March 5, 2009
    Publication date: April 28, 2011
    Applicant: Dow Global Technologies Inc.
    Inventors: Robert L. Hearn, Marvin L. Dettloff, Fabio Aguirre Vargas, George Jacob
  • Patent number: 7910181
    Abstract: Various embodiments of the present invention are directed to methods for manufacturing complex, anisotropic materials with desirable properties for information storage, processing, and display. Certain of these methods involve employing a magnetic field during manufacture to induce desired orientations of precursors, subunits, and/or molecular subassemblies. The applied magnetic field steers the precursors, subunits, and/or molecular subassemblies into desirable orientations while the precursors, subunits, and/or molecular subassemblies are assembled or self-assemble into a complex, anisotropic material. One embodiment of the present invention is a class of new, complex, well-ordered, network-like materials that include a ferromagnetic-material-based framework in which organic and/or organometallic compounds are organized.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: March 22, 2011
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Patricia A. Beck, Sean Zhang
  • Patent number: 7884172
    Abstract: To provide an epoxy resin giving a cured object having high heat resistance, which is improved in impact resistance and moisture resistance as compared with conventional high-heat-resistance epoxy resins. The epoxy resin is obtained by glycidylating one or more phenol compounds comprising 95% or more 1,1,2,2-tetrakis (hydroxyphenyl)ethane, and is characterized in that in an examination by gel permeation chromatography, the epoxy resin has a tetranucleus-form content of 50 to 90% by area and an octanucleus-form content of at least 5% by area and has a total chlorine content of 5,000 ppm or smaller.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: February 8, 2011
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Masataka Nakanishi, Katsuhiko Oshimi, Ryutaro Tanaka, Toru Kurihashi
  • Patent number: 7816482
    Abstract: An epoxy-crosslinked sulfonated poly(phenylene) copolymer composition used as proton exchange membranes, methods of making the same, and their use as proton exchange membranes (PEM) in hydrogen fuel cells, direct methanol fuel cell, in electrode casting solutions and electrodes, and in sulfur dioxide electrolyzers. These improved membranes are tougher, have higher temperature capability, and lower SO2 crossover rates.
    Type: Grant
    Filed: March 26, 2009
    Date of Patent: October 19, 2010
    Assignee: Sandia Corporation
    Inventors: Michael Hibbs, Cy H. Fujimoto, Kirsten Norman, Michael A. Hickner
  • Publication number: 20100113678
    Abstract: A fluorine-containing novolac resin represented by the following formula, as well as a fluorine based surfactant and a fluorine based surfactant composition, which include the fluorine-containing novolac resin. In the formula, R represents a fluorinated alkyl-containing substituent, R? represents a hydrogen atom or a methyl group, R? represents a hydrogen atom or a non-fluorinated substituent, —X— represents any one of following four types of linking groups, —X? represents any one of three following types of substituents, n represents 0 or an integer of 1 or more, m represents an integer of 1 or more, and n+m is an integer of 2 or more.
    Type: Application
    Filed: May 21, 2008
    Publication date: May 6, 2010
    Applicant: DIC CORPORATION
    Inventors: Hideya Suzuki, Shin Sasamoto, Kiyofumi Takano
  • Publication number: 20100080997
    Abstract: An epoxy prepolymer having excellent thermal conductivity is obtained by reacting an epoxy compound having a mesogenic skeleton and a trinuclear bisphenol represented by the following formula: (wherein each of R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11 and R12 represents a hydrogen atom or an alkyl group and each may be the same or different while at least one represents an alkyl group).
    Type: Application
    Filed: September 25, 2009
    Publication date: April 1, 2010
    Applicant: TDK CORPORATION
    Inventors: Junichi Seki, Kenji Tokuhisa
  • Publication number: 20090286929
    Abstract: A phenol aralkyl type phenolic resin represented by the general formula (1), wherein the total content of the compounds represented by formulae (2) to (4) is 58 to 92% as determined by GPC and the contents of the compounds represented by formulae (2) to (4) as determined by HPLC satisfy the following relationship: 0.60?(2a+b)/(2a+2b+2c)?0.90 wherein a is the content of the compound of formula (2); b is the content of the compound of formula (3); and c is the content of the compound of formula (4).
    Type: Application
    Filed: November 29, 2006
    Publication date: November 19, 2009
    Inventors: Katsuhiko Oshimi, Shigeru Moteki, Takao Sunaga, Masataka Nakanishi, Sumio Ichimura
  • Publication number: 20090200071
    Abstract: To provide a resin composition which is advantageous not only in that the resin composition can be produced at low cost, but also in that it is unlikely to thermally expand, a prepreg, a laminate, and a wiring board. A resin composition for use in production of a laminate, the resin composition comprising an insulating resin having an aromatic ring, wherein the insulating resin having an aromatic ring has a molecular weight between crosslinking sites of 300 to 1,000 on the stage after the production of the laminate, as determined from an elastic shear modulus of the insulating resin measured at a temperature of Tg or higher.
    Type: Application
    Filed: April 26, 2007
    Publication date: August 13, 2009
    Applicant: HITACHI CHEMICAL CO., LTD.
    Inventors: Koji Morita, Shin Takanezawa, Kazunaga Sakai, Yuusuke Kondou
  • Publication number: 20090181165
    Abstract: The invention provides an improvement to the useable lifetimes of phenolic-epoxy, phenolic-benzoxazine, phenolic-epoxy-benzoxazine mixtures and other phenolic mixtures through the use of protected phenolics, where a phenolic compound, polymer, or resin is released on demand by the addition of a deblocking agent.
    Type: Application
    Filed: January 10, 2008
    Publication date: July 16, 2009
    Applicant: Trillion Science, Inc.
    Inventors: Rong-Chang Liang, John J. McNamara, Yurong Ying, Chung-Jen Hou
  • Publication number: 20090131607
    Abstract: [Problems] To provide an epoxy resin giving a cured object having high heat resistance, which is improved in impact resistance and moisture resistance as compared with conventional high-heat-resistance epoxy resins. [Means for Solving Problems] The epoxy resin is obtained by glycidylating one or more phenol compounds comprising 95% or more 1,1,2,2-tetrakis(hydroxyphenyl)ethane, and is characterized in that in an examination by gel permeation chromatography, the epoxy resin has a tetranucleus-form content of 50 to 90% by area and an octanucleus-form content of at least 5% by area and has a total chlorine content of 5,000 ppm or smaller.
    Type: Application
    Filed: October 10, 2006
    Publication date: May 21, 2009
    Inventors: Masataka Nakanishi, Katsuhiko Oshimi, Ryutaro Tanaka, Toru Kurihashi
  • Publication number: 20090099330
    Abstract: The present invention provides an adamantyl group containing epoxy-modified (meth)acrylate and a resin composition containing it which are imparted by transparency, optical characteristics such as (durable) light resistance and the like, heat-resistance, and good mechanical properties. For example, they are an adamantyl group containing epoxy-modified (meth)acrylate having the following general formula (I) and a composition containing it. In the formula, R1 represents a hydrogen atom or a methyl group, and R2 represents a halogen atom or an aliphatic hydrocarbon group which may contain a hetero atom. Plural R2 may be the same or different, and m represents an integer of 0 to 4 and n represents an integer of 0 or more.
    Type: Application
    Filed: April 24, 2007
    Publication date: April 16, 2009
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Yasunari Okada, Hajime Ito, Hideki Yamane, Nobuaki Matsumoto
  • Patent number: 7495060
    Abstract: The present invention has an object to provide curatives for epoxy resins and curing accelerators for epoxy resins, which both have improved subliming and decomposing properties and which, when mixed with an epoxy resin, enable the mixture to be greatly improved in thermal stability that is extremely important for the control of a curing reaction and to have a prolonged pot life (stability as a one-pack mixture comprising the epoxy resin, curative, etc.) and improved curability at low temperatures.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: February 24, 2009
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Hiroshi Suzuki, Satoru Abe, Midori Aoki, legal representative, Izuo Aoki
  • Publication number: 20080275186
    Abstract: The invention relates to a modified hydrocarbylphenol-aldehyde resin prepared by reacting a hydrocarbylphenol-aldehyde resin with a primary or secondary amine and further with an epoxide. The invention also provides a process for preparing a modified, hydrocarbylphenol-aldehyde resin and a rubber composition containing such resin.
    Type: Application
    Filed: September 4, 2007
    Publication date: November 6, 2008
    Applicant: SI GROUP, INC.
    Inventors: Timothy E. BANACH, L. Scott HOWARD, Todd Scott Makenzie, Ronald K. Smith
  • Publication number: 20080262188
    Abstract: One embodiment includes compositions of shape memory epoxy polymers.
    Type: Application
    Filed: October 4, 2007
    Publication date: October 23, 2008
    Applicant: GM Global Technology Operations, Inc.
    Inventors: Tao Xie, Daniel E. Rodak, William R. Rodgers
  • Publication number: 20080185361
    Abstract: Compositions useful in circuitry substrates are described which have a polyimide component, and a sterically hindered hydrophobic epoxy component. Generally, a flowable precursor is applied and then cured to a wholly or partially solidified mass. The invention is also directed to methods of forming a passive electrical component upon or into a circuit board.
    Type: Application
    Filed: November 19, 2007
    Publication date: August 7, 2008
    Inventor: John D. Summers
  • Patent number: 7390540
    Abstract: Various embodiments of the present invention are directed to methods for manufacturing complex, anisotropic materials with desirable properties for information storage, processing, and display. Certain of these methods involve employing a magnetic field during manufacture to induce desired orientations of precursors, subunits, and/or molecular subassemblies. The applied magnetic field steers the precursors, subunits, and/or molecular subassemblies into desirable orientations while the precursors, subunits, and/or molecular subassemblies are assembled or self-assemble into a complex, anisotropic material. One embodiment of the present invention is a class of new, complex, well-ordered, network-like materials that include a ferromagnetic-material-based framework in which organic and/or organometallic compounds are organized.
    Type: Grant
    Filed: July 21, 2004
    Date of Patent: June 24, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Patricia A. Beck, Sean Zhang
  • Patent number: 7268193
    Abstract: Branched polyarylene polymers are provided comprising monovalent endcappers, divalent linear units, and polyvalent branching units. The composition of the polymers is controlled by adjusting the ratio of the three types of monomers.
    Type: Grant
    Filed: March 4, 2005
    Date of Patent: September 11, 2007
    Assignee: Mississippi Polymer Technologies, Inc.
    Inventors: Matthew L. Marrocco, III, Mark S. Trimmer, Ying Wang
  • Patent number: 7108807
    Abstract: Poly-o-hydroxyamides include binaphthyl substituents as repeating units. The poly-o-hydroxyamides can be cyclized to give the polybenzoxazole by heating. Pore formation occurs, so that a dielectric having a very low dielectric constant k of less than 2.5 is obtained.
    Type: Grant
    Filed: April 28, 2003
    Date of Patent: September 19, 2006
    Assignee: Infineon Technologies AG
    Inventors: Recai Sezi, Andreas Walter, Klaus Lowack, Anna Maltenberger, Robert Banfic
  • Patent number: 7087702
    Abstract: In the technical field where a difunctional epoxy resin having increased molecular weight is used to impart flexibility or improving dielectric properties, the present invention has remarkably improved moisture resistance and water resistance when used to produce a cured epoxy resin article. The epoxy resin composition comprises a difunctional epoxy resin (A) having a structure wherein an aromatic hydrocarbon group (a1) having a bonding site in an aromatic nucleus and a hydrocarbon group (a2) having an ether bond or the other hydrocarbon group (a3) are bonded via an acetal bond (a4), and also has a structure wherein a glycidyloxy group is bonded to the aromatic hydrocarbon group (a1); and a curing agent (B) as essential component.
    Type: Grant
    Filed: October 14, 2003
    Date of Patent: August 8, 2006
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Ichiro Ogura, Nobuya Nakamura, Tomoyuki Imada
  • Patent number: 7067233
    Abstract: A compound including an epoxy group that has a heat curing property and a chalcone group that has a radiation curing property is represented by the following formula: wherein n is an integer from 1 to 10,000, and each of R1, R2, R3, R4, R5, R6, R7 and R8 is selected from a group consisting of a hydrogen atom, alkyl group, alkoxy group, halogen atom and nitro group. The compound has a high curing efficiency. A photoresist composition including the compound above substantially prevents the formation of remnant in a photoresist pattern used in the manufacturing of a color filter. In addition, the color filter pattern that is formed using the photoresist composition has high color reproductivity and brightness.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: June 27, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yoon-Ho Kang, Dong-Ho Bae, Jang-Sub Kim
  • Patent number: 6903180
    Abstract: This invention relates to novel epoxy resins and epoxy resin compositions comprising said epoxy resins or cured articles thereof. The cured articles have excellent properties in respect to flame retardance, adhesiveness, moisture resistance and heat resistance and can be used in applications such as lamination, molding, casting and adhesion. The epoxy resins of this invention are represented by the following formula (3) wherein Y1 denotes a glycidyloxyarylmethyl group represented by —CH2—Ar—OG, Y2 and Y3 denote independently a glycidyl group or the aforementioned glycidyloxyarylmethyl group, Ar denotes a phenylene group which can be substituted with up to two hydrocarbon groups and G denotes a glycidyl group.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: June 7, 2005
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami
  • Patent number: 6812318
    Abstract: The object of the present invention is to provide an epoxy resin and epoxy resin composition having a low viscosity which can afford a cured product having an excellent heat resistance. The present invention is characterized by using an epoxy resin which is obtained by reacting 5-methylresorcin with epihalohydrin in the presence of alkali metal hydroxide.
    Type: Grant
    Filed: July 18, 2002
    Date of Patent: November 2, 2004
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Yasumasa Akatsuka, Koji Nakayama, Katsuhiko Oshimi, Syouichi Tomida