The Chalcogen, X, Is Part Of A -c(=x)x- Group Or A -x-x- Group, Wherein The X's Are The Same Or Diverse Chalcogens (e.g., -coo-hch-oxirane, Etc.) Patents (Class 549/557)
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Patent number: 9493661Abstract: Described are glycerol diesters of the general formula (I) wherein one of the two radicals R1 or R2 is hydrogen, and the radical of the two radicals R1 and R2 that is not hydrogen is a radical: and the radicals R3, R4, R5, and R6 independently of one another are a saturated, aliphatic radical having 1 to 20 carbon atoms, with the proviso that the radicals R3 and R4 together contain at least 5 carbon atoms and the radicals R5 and R6 together contain at least 5 carbon atoms. Also described is a process for preparing the glycerol diesters, use thereof as reactive diluents, coating materials comprising the glycerol diesters, multicoat paint systems and their production, comprising the use of the coating materials, and also to substrates coated therewith.Type: GrantFiled: November 16, 2012Date of Patent: November 15, 2016Assignee: BASF Coatings GmbHInventors: Peter Hoffmann, Sebastien Porcher, Melanie Goudard
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Patent number: 8993210Abstract: A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.Type: GrantFiled: February 15, 2011Date of Patent: March 31, 2015Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Hiromu Sakamoto
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Publication number: 20140371466Abstract: Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid.Type: ApplicationFiled: September 4, 2014Publication date: December 18, 2014Applicant: JSR CorporationInventors: Yushi Matsumura, Shinya Minegishi, Satoru Murakami, Yusuke Anno, Shinya Nakafuji, Kazuhiko Komura, Kyoyu Yasuda
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Patent number: 8722158Abstract: Disclosed is a liquid crystal photo-alignment agent and a liquid crystal photo-alignment film manufactured using the same. The liquid crystal photo-alignment agent includes an epoxy compound represented by Chemical Formula 1, and a polymer including a polyamic acid, a polyimide, or a mixture thereof.Type: GrantFiled: June 2, 2011Date of Patent: May 13, 2014Assignee: Cheil Industries Inc.Inventors: Hyo-Ju Seo, Tae-Hyoung Kwak, Dong-Seon Uh, Jae-Deuk Yang
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Publication number: 20130274433Abstract: There is provided an epoxy resin composition having low viscosity and a high cationic curing property. An epoxy compound of Formula (1): (in Formula (1), A is an (n4)-valent C4-20 linear hydrocarbon group optionally containing an epoxy group, an (n4)-valent C4-20 cyclic hydrocarbon group optionally containing an epoxy group, or an (n4)-valent group of a combination of the linear hydrocarbon group and the cyclic hydrocarbon group; R1 and R2 are each independently a hydrogen atom or a C1-10 alkyl group; n1 is an integer of 2 to 6; n2 is an integer of 2; n3 is an integer of 1; and n4 is an integer of 3 to 8). For example, A is an (n4)-valent organic group formed by removing (n4) hydrogen atoms from butane, pentane, or hexane, or an (n4)-valent organic group formed by removing (n4) hydrogen atoms from cyclobutane, cyclopentane, cyclohexane, epoxycyclohexane, alkyl-substituted epoxycyclohexane, bicycloheptene, or bicyclooctene.Type: ApplicationFiled: November 14, 2011Publication date: October 17, 2013Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Yuki Endo, Toshiaki Takeyama, Sayoko Yanagisawa
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Patent number: 8557500Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.Type: GrantFiled: February 28, 2012Date of Patent: October 15, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Koji Ichikawa, Hiromu Sakamoto, Takahiro Yasue
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Publication number: 20130243868Abstract: Nanoparticles comprising T3 and their use in treating, e.g., cardiac conditions, for example cardiac arrest, are provided. Such nanoparticles provide improved delivery of T3 and allow for acute treatment and optionally for sustained release of T3 in a patient.Type: ApplicationFiled: February 26, 2013Publication date: September 19, 2013Applicant: Avant Garde Therapeutics and Technologies LLCInventors: Leo RUBIN, Shaker Mousa
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Patent number: 8372994Abstract: Glycidyl 2-propylheptanoate, glycidyl 4-methyl-2-propylhexanoate or a mixture of these (referred to collectively for short as glycidyl ester).Type: GrantFiled: June 24, 2008Date of Patent: February 12, 2013Assignee: BASF SEInventors: Kai Gumlich, Roland Merten, Michael Henningsen, Martin Schaefer, Joaquim Henrique Teles, Bernhard Mohr
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Publication number: 20120285929Abstract: Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid.Type: ApplicationFiled: May 8, 2012Publication date: November 15, 2012Applicant: JSR CorporationInventors: Yushi MATSUMURA, Shinya Minegishi, Satoru Murakami, Yusuke Anno, Shinya Nakafuji, Kazuhiko Komura, Kyoyu Yasuda
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Publication number: 20120205578Abstract: A polishing composition, comprising a compound having structure I or salts thereof: wherein R1 is selected from the group consisting of —O?Mx+ wherein x is selected from the group consisting of 1, 2, and 3, —O—R3 wherein R3 is selected from the group consisting of alkyl, allyl, and phenyl, —N(R3R4) wherein R4 is selected from the group consisting of —H, alkyl, allyl, and phenyl, and —S—R3, and wherein R2 is selected from the group consisting of —CH2—CO2—CH3, —CO—NH—R5, —CH2—CH(OH)—CH2—OH, —CH2—CH(OH)—CH2—R3, and —CH2-substituted phenyl, wherein R5 is selected from the group consisting of alkyl and substituted phenyl.Type: ApplicationFiled: November 15, 2011Publication date: August 16, 2012Inventor: John L. Lombardi
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Publication number: 20120149807Abstract: A diepoxy compound represented by the formula (1) wherein R1, R2, R3 and R4 independently each represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.Type: ApplicationFiled: August 26, 2010Publication date: June 14, 2012Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Taku Asaumi, Makoto Itagaki
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Publication number: 20120029116Abstract: The invention provides an improvement to the useable lifetimes of phenolic-epoxy, phenolic-benzoxazine, phenolic-epoxy-benzoxazine mixtures and other phenolic mixtures through the use of protected phenolics, where a phenolic compound, polymer, or resin is released on demand by the addition of a deblocking agent.Type: ApplicationFiled: October 6, 2011Publication date: February 2, 2012Applicant: TRILLION SCIENCE, INC.Inventors: Rong-Chang Liang, John J. McNamara, Yurong Ying, Chung-Jen Hou
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Patent number: 8088301Abstract: Disclosed is an epoxy compound for a liquid crystal photo-alignment agent, a liquid crystal photo-alignment agent, and a liquid crystal photo-alignment film. The epoxy compound is represented by the following Chemical Formula 1. In the above Chemical Formula 1, each substituent is the same as defined in the specification. Since the epoxy compound according to an embodiment of the present invention may be prepared through a simple manufacturing process, it is possible to provide a liquid crystal photo-alignment agent and a liquid crystal photo-alignment film that are economical and have excellent substrate printability and reliability, and superb photoelectric characteristics.Type: GrantFiled: December 8, 2009Date of Patent: January 3, 2012Assignee: Cheil Industries Inc.Inventors: Jae-Deuk Yang, Dong-Seon Uh, Tae-Hyoung Kwak, Hyo-Ju Seo
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Publication number: 20110200936Abstract: A salt represented by the formula (I): wherein R1 and R2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group which can have one or more fluorine atoms and in which one or more —CH2— can be replaced by —O— or —CO—, R3 represents a group having a cyclic ether structure, and Z1+ represents an organic cation.Type: ApplicationFiled: February 15, 2011Publication date: August 18, 2011Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Koji ICHIKAWA, Hiromu SAKAMOTO
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Publication number: 20110172440Abstract: An epoxide agent for an epoxy resin system, the epoxide agent comprising at least one non-acid functional rosin moiety and at least one epoxide moiety. Another embodiment is a curing agent for an epoxy resin system comprising at least one non-acid functional rosin moiety and at least one moiety that is reactive with an epoxy.Type: ApplicationFiled: September 16, 2009Publication date: July 14, 2011Inventors: Jinwen Zhang, Xiaoqing Liu, Ming Xian
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Publication number: 20110130479Abstract: Compounds of formula (I) in the field of heat-curing and two-component epoxy resin compositions, which may be used as adhesion promoters or adhesion promoter ingredients and methods of producing such compounds. Such compounds may be prepared as liquids. A heat-curing epoxy resin composition including at least one epoxy resin with more than one epoxy group per molecule on the average; at least one curing agent for epoxy resins, which is activated by elevated temperature; and at least one compound of formula (I).Type: ApplicationFiled: July 17, 2009Publication date: June 2, 2011Applicant: SIKA TECHNOLOGY AGInventors: Andreas Kramer, Jurgen Finter
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Publication number: 20110086185Abstract: Subject The main aim of the invention is to provide a polymerizable liquid crystal compound that has a liquid crystal phase with a wide temperature range, an excellent compatibility with another polymerizable liquid crystal compound and an excellent solubility in organic solvent, and is polymerizable by heat and light even in air.Type: ApplicationFiled: September 30, 2010Publication date: April 14, 2011Applicants: CHISSO CORPORATION, CHISSO PETROCHEMICAL CORPORATIONInventors: DAISUKE OOTSUKI, JUNICHI INAGAKI
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Publication number: 20110086912Abstract: The present invention provides a method for treating a cancer in a subject involving administering to the subject a compound of formula (II) or (II?): wherein R1, R2, R3, R4, R5, R6 and R7 are independently H, OH, alkylcarbonyloxy, or a pharmaceutically acceptable salt thereof. Also provided is a compound of formula (II) or (II)?, wherein R1 and R2 are independently OH, alkoxy or alkylcarbonyloxy, R3 and R4 are independently H, OH, alkoxy or alkylcarbonyloxy, R6 is H, alkoxy or alkylcarbonyloxy, R5 is H, OH or alkylcarbonyloxy, R6 is H or alkoxy, and R7 is H, or a pharmaceutically acceptable salt thereof.Type: ApplicationFiled: October 8, 2010Publication date: April 14, 2011Inventor: ALEXANDER MACGREGOR
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Publication number: 20110001088Abstract: The purpose of the invention is to provide a polymerizable liquid crystal compound that has a liquid crystal phase with a wide temperature range, has an excellent compatibility with another polymerizable liquid crystal compound, has an excellent solubility in organic solvent and is polymerizable in air by heat or light. Means for Solving the Subject A polymerizable liquid crystal compound represented by formula (1) wherein A1 and A2 are a ring such as 1,4-cyclohexylene and 1,4 -phenylene; Z1 to Z3 are a bonding group such as a single bond and —O—, m is an integer of 1 to 5; Q1 and/or Q2 are —O(C2H4O)n 1(C3H6O)n 2— or —O(C3H6O)n 2(C2H4O)n 1—, where n1 and n2 are integer of 0 to 5 and the sum of n1 and n2 is 2 to 5; one of Q1 and Q2 may be alkylene; P1 and P2 are a polymerizable group represented by any one of formula (2-1) to formula (2-3) and R is hydrogen, halogen or alkylene having 1 to 5 carbons.Type: ApplicationFiled: June 18, 2010Publication date: January 6, 2011Applicants: CHISSO CORPORATION, CHISSO PETROCHEMICAL CORPORATIONInventors: Daisuke OOTSUKI, Tomohiro YANO
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Publication number: 20100286416Abstract: The present invention provides the production method of carboxylic acid compound, as shown in Scheme I.Type: ApplicationFiled: March 26, 2010Publication date: November 11, 2010Applicant: Japan Tobacco Inc.Inventors: Katsuya Matsumoto, Katsuyuki Yokota, Yuko Shinagawa, Teruhiko Inoue
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Publication number: 20100180802Abstract: Glycidyl 2-propylheptanoate, glycidyl 4-methyl-2-propylhexanoate or a mixture of these (referred to collectively for short as glycidyl ester).Type: ApplicationFiled: June 24, 2008Publication date: July 22, 2010Applicant: BASF SEInventors: Kai Gumlich, Roland Merten, Michael Henningsen, Martin Schaefer, Joaquim Henrique Teles, Bernhard Mohr
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Publication number: 20100155661Abstract: Disclosed is an epoxy compound for a liquid crystal photo-alignment agent, a liquid crystal photo-alignment agent, and a liquid crystal photo-alignment film. The epoxy compound is represented by the following Chemical Formula 1. In the above Chemical Formula 1, each substituent is the same as defined in the specification. Since the epoxy compound according to an embodiment of the present invention may be prepared through a simple manufacturing process, it is possible to provide a liquid crystal photo-alignment agent and a liquid crystal photo-alignment film that are economical and have excellent substrate printability and reliability, and superb photoelectric characteristics.Type: ApplicationFiled: December 8, 2009Publication date: June 24, 2010Applicant: CHEIL INDUSTRIES INC.Inventors: Jae-Deuk YANG, Dong-Seon UH, Tae-Hyoung KWAK, Hyo-Ju SEO
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Patent number: 7728090Abstract: The present invention provided a norbornene compound with cross-linkable groups and their derivative polymers, wherein said cross-linkable groups were olefin or epoxy groups. Norbornene polymers with cross-linkable side chain and their block copolymers as well as modified derivatives were prepared via living ring-open metathesis polymerization method. The resulting polymers with excellent solubility and optic properties had narrow molecular weight distribution, well-controlled molecular weight, small refraction ration and high transparency. They were also suitable for preparing hybrid materials with high thermal stability and chemical resistance.Type: GrantFiled: September 18, 2006Date of Patent: June 1, 2010Assignee: National Taiwan University of Science & TechnologyInventors: Der-Jang Liaw, Ching-Cheng Huang, Shou-Mau Hong, Ming-Hung Huang
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Patent number: 7586119Abstract: Provided are a low temperature-cured polymer gate insulation layer and an organic thin film transistor having the same. The gate insulation layer includes an acrylate-based compound, an anhydride-based compound, and an epoxy-based compound each by 0.1 weight % or more.Type: GrantFiled: February 15, 2006Date of Patent: September 8, 2009Assignee: Electronics and Telecommunications Research InstituteInventors: Gi Heon Kim, Sung Min Yoon, In Kyu You, Seung Youl Kang, Seong Deok Ahn, Kyu Ha Baek, Kyung Soo Suh
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Publication number: 20090181165Abstract: The invention provides an improvement to the useable lifetimes of phenolic-epoxy, phenolic-benzoxazine, phenolic-epoxy-benzoxazine mixtures and other phenolic mixtures through the use of protected phenolics, where a phenolic compound, polymer, or resin is released on demand by the addition of a deblocking agent.Type: ApplicationFiled: January 10, 2008Publication date: July 16, 2009Applicant: Trillion Science, Inc.Inventors: Rong-Chang Liang, John J. McNamara, Yurong Ying, Chung-Jen Hou
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Publication number: 20090163683Abstract: Provided are a novel photopolymerizable monomer having at least one unsaturated double bond and epoxide, and a photocurable composition comprising the photopolymerizable monomer and an initiator, which is polymerizable with good efficiency using light and/or heat, provides reduced shrinkage, and has superior mechanical strength including adhesion and transparency.Type: ApplicationFiled: December 17, 2008Publication date: June 25, 2009Inventors: EunKyoung KIM, Jeonghun Kim, Hyunjin Oh
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Publication number: 20090030218Abstract: The present invention provides an industrial method for preparing aminoalcohol derivatives (I) having a biphenyl group, biphenyloxyacetaldehyde derivatives which are used therefore, preparing methods thereof, and intermediates used for the preparing method. The present invention also provides a preparing method including processes for preparing a 3-substituted biphenylcarboxylic acid derivative represented by the following general formula: by allowing a 3-fluorobiphenylcarboxylic acid derivative prepared from a 3-fluorobiphenylcarbonitrile derivative which can be prepared by allowing a 4-halophenol derivative to react with a 2-fluorobenzonitrile derivative which is substituted by a leaving group at 4-position to react with an organometallic reagent.Type: ApplicationFiled: May 17, 2006Publication date: January 29, 2009Applicant: KISSEI PHARMACEUTICAL CO., LTD.Inventors: Kiyoshi Kasai, Minoru Kubota, Ritsu Suzuki, Tetsuji Ozawa, Takehiro Ishikawa, Makoto Kobayashi, Junichi Sonehara, Masahiro Kobayashi
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Patent number: 7074946Abstract: A method of stably producing glycidyl 2-hydroxyisobutyrate at high purity and high yield is provided. A reactive diluent is provided for an epoxy resin including the above-mentioned glycidyl 2-hydroxyisobutyrate, and an epoxy resin composition.Type: GrantFiled: December 1, 2004Date of Patent: July 11, 2006Assignee: Mitsubishi Gas Chemical Co., Ltd.Inventors: Takatoshi Shida, Syu Suzuki
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Patent number: 6627683Abstract: Curable compositions, reaction products of which are reworkable through thermal decomposition, are provided. Specific compounds useful in such curable compositions, as well as curable compositions and thermosets incorporating such compounds, are provided in the present invention. The compounds include a cyclic hydrocarbon moiety including an oxirane or thiirane group and an aromatic ether moiety including an oxirane or thiirane group. The cyclic hydrocarbon moiety and the aromatic ether moiety are joined to each other through an oxycarbonyl-containing linkage or a thiocarbonyl-containing linkage, preferably a secondary or tertiary linkage. Compositions incorporating such compounds are capable of curing by exposure to a specific temperature, and are decomposable at a temperature in excess of the curing temperature, thus providing a composition which is reworkable.Type: GrantFiled: September 5, 2000Date of Patent: September 30, 2003Assignee: Henkel Loctite CorporationInventors: Philip T. Klemarczyk, Lie-Zhong Gong
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Patent number: 6342615Abstract: The invention provides for a purified glycidyl ester product prepared from neo acids wherein said ester product is recovered as a light fraction from a glycidyl ester reaction product composition that has been subjected to conditions of temperature and vacuum in a thin film, short pass distillation evaporator, said purified glycidyl ester product further characterized that its polymerizable reaction product with methacrylic acid has a higher effective glass transition temperature as compared with the polymerizable reaction product with methacrylic acid of said glycidyl ester reaction product composition prior to purification.Type: GrantFiled: May 8, 2000Date of Patent: January 29, 2002Assignee: ExxonMobil Chemicals Patents Inc.Inventors: Richard William Ryan, Gerald G. McGlamery, Jr., Ralph Martin Kowalik, Michael J. Keenan
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Patent number: 6326393Abstract: Compounds of Formula I are disclosed as inhibitors having activity against the aspartyl proteases, plasmepsin and cathepsin D. The compounds are therefore useful for treatment of diseases such as malaria and Alzheimer's disease. In preferred compounds of Formula I, Y is an dialkoxyphosphonate, or &agr;-hydroxyamide group and Z is an acyl or &agr;-ketocarbamate functionality. Intermediates in the solid phase synthesis of compounds of Formula I, in which compounds are attached to a solid support, are also disclosed.Type: GrantFiled: June 20, 2000Date of Patent: December 4, 2001Assignee: Pharmacopeia, Inc.Inventors: Carolyn DiIanni Carroll, Roland Ellwood Dolle, III, Yvonne Class Shimshock, Timothee Felix Herpin
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Patent number: 6284902Abstract: This invention relates to a process for manufacturing an optically active (S)-3,4-epoxybutyric acid salt and more particularly, to a method for manufacturing (S)-3,4-epoxybutyric acid salt expressed by the following formula 1, wherein an optically active (S)-3-hydroxybutyrolactone is employed to undergo an economical ring-opening reaction and epoxvdation so that its chiral center is maintained in an original form, Wherein, R1 represents alkali metal atom, alkaline earth metal atom, alkylamine group or quarternary amine group.Type: GrantFiled: February 21, 2001Date of Patent: September 4, 2001Assignee: Samsung Fine Chemicals Co., Ltd.Inventors: Ho Sung Yu, Jae Young Bae, Yik Haeng Cho, Young Mi Park, Il Suk Byun
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Patent number: 6169158Abstract: The present invention is directed to a polyglycidyl compound having on average more than two, preferably more than two and a half, particularly preferably more than three, glycidyl groups per molecule and a Tg value (determined by DSC, heating rate=20° C./min) higher than 20° C.Type: GrantFiled: April 23, 1999Date of Patent: January 2, 2001Assignee: Vantico, Inc.Inventors: Christoph Rickert, Hugh Stephen Laver
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Patent number: 6147224Abstract: Compounds of Formula 1, Formula 2 or Formula 3 where X is O, S, or (CR.sub.1 R.sub.1).sub.n where n is 0, 1 or 2; Y is a bivalent radical having Formula 4 or Formula 5 where o is an integer from 1 to 4 ##STR1## or Y is a bivalent aryl or 5 or 6 membered heteroaryl radical having 1 to 3 heteroatoms selected from N, S and O, said aryl or heteroaryl groups being unsubstituted, or substituted with 1 to 3 C.sub.1-6 alkyl or with 1 to 3 C.sub.1-6 fluoroalkyl groups; and the remaining symbols have the meaning described in the specification, have RXR selective retinoid agonist-like activity.Type: GrantFiled: October 1, 1998Date of Patent: November 14, 2000Assignee: Allergan Sales, Inc.Inventors: Vidyasagar Vuligonda, Kwok Yin Tsang, Jayasree Vasudevan, Roshantha A. Chandraratna
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Patent number: 6136991Abstract: The invention provides for a purified glycidyl ester product prepared from neo acids wherein said ester product is recovered as a light fraction from a glycidyl ester reaction product composition that has been subjected to conditions of temperature and vacuum in a thin film, short pass distillation evaporator, said purified glycidyl ester product further characterized that its polymerizable reaction product with methacrylic acid has a higher effective glass transition temperature as compared with the polymerizable reaction product with methacrylic acid of said glycidyl ester reaction product composition prior to purification.Type: GrantFiled: November 10, 1997Date of Patent: October 24, 2000Assignee: Exxon Chemical Patents Inc.Inventors: Richard William Ryan, Gerald G. McGlamery, Jr., Ralph Martin Kowalik, Michael J. Keenan
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Patent number: 5866036Abstract: Chiral nonracemic molecules which are useful as high tilt, high polarization and/or high birefringence FLC materials or are useful as components of such FLC materials and which have the following general structure are provided:RO--(Ph.sub.1).sub.m --(A).sub.a --(Ph.sub.2).sub.n --(B).sub.b --(Ph.sub.3).sub.p --Twhere Ph.sub.1, Ph.sub.2 and Ph.sub.Type: GrantFiled: February 2, 1994Date of Patent: February 2, 1999Assignee: Displaytech, Inc.Inventors: Michael D. Wand, Rohini T. Vohra, David M. Walba, Sean D. Monahan
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Patent number: 5851427Abstract: Photocross-linkable naphthyl derivatives include compounds of the formula: ##STR1## wherein R.sup.1 and R.sup.2 each independently signify a cross-linkable group;S.sup.1 and S.sup.2 signify --(CY.sub.2).sub.m -, --O(CY.sub.2).sub.m -, --(CY.sub.2).sub.m O--, --(CY.sub.2).sub.m COO--, --(CY.sub.2).sub.m OOC--, --(Si?(CH.sub.3).sub.2 !O).sub.m -, --OCH.sub.2 (Si?(CH.sub.3).sub.2 !O).sub.m Si?(CH.sub.3).sub.2 !CH.sub.2 O-- or --NHCH.sub.2 (Si?(CH.sub.3).sub.2 !O).sub.m Si?(CH.sub.3).sub.2 !CH.sub.2 NH--;Y signifies hydrogen, fluorine or methyl;a signifies 0 or 1;b signifies 1 or 2, with the proviso that a+b=2;m signifies a whole number of 1 to 16;A.sup.1 and A.sup.2 each independently signify 1,4-phenylene, which is optionally mono- or multiply-substituted with halogen, cyano, methyl, methoxy and/or acetyl, pyridine-2,5-diyl, pyrimidine-2,5-diyl, trans-1,4-cyclohexylene or trans-1,3-dioxane-2,5-diyl; andZ.sup.1 and Z.sup.2 each independently signify a single bond, --CH.sub.2 CH.sub.2 --, --OCH.sub.2 --, --CH.Type: GrantFiled: February 23, 1996Date of Patent: December 22, 1998Assignee: Rolic AGInventor: Stephen Kelly
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Patent number: 5760245Abstract: The present invention relates to new orally active azole derivatives with antifungal activity of formula I ##STR1## wherein: X is CH or N; Ar represents phenyl substituted with halogen and/or trifluoromethyl; Z is --C(.dbd.O)-- or --SO.sub.2 --; R.sub.1 is CN, CO.sub.2 H, CO.sub.2 R.sub.7, CONR.sub.8 R.sub.9 or CH.sub.2 Y and then R.sub.3 is hydrogen, or R.sub.1 together with R.sub.3 forms a ring of formmula I' ##STR2## wherein B is O, hydroxy or hydrogen; R.sub.4 is C.sub.1-4 alkyl; R.sub.5, R.sub.6, R.sub.8 and R.sub.9 are hydrogen or C.sub.1-4 alkyl; Y is --OH,--OR.sub.7, --OC(.dbd.O)R.sub.7, --NR.sub.8 R.sub.9, --NHC(.dbd.O)OR.sub.7 ; R.sub.7 is C.sub.1 -C.sub.4 -alkyl, phenyl-C.sub.1 -C.sub.4 -alkyl or optionally substituted phenyl; when Z is --C(.dbd.O)--, R.sub.2 is optionally substituted phenyl, or naphtyl; when Z is --SO.sub.2 --, R.sub.2 is C.sub.1-4 alkyl, phenyl-C.sub.1-4 -alkyl or optionally substituted phenyl.Type: GrantFiled: April 24, 1997Date of Patent: June 2, 1998Assignee: J. Uriach & Cia S.A.Inventors: Javier Bartroli, Enric Turmo, Manuel Anguita, Elena Carceller, Carmen Almansa
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Patent number: 5756777Abstract: Disclosed are a novel (meth)acrylate having an alkenyl group, a novel epoxy(meth)acrylate, and processes for the preparation thereof.The (meth)acrylate having an alkenyl group of the present invention can be preferably used as resins for coatings, photo-curable resins, and adhesives by (co)polymerization thereof in the presence or absence of a variety of (meth)acrylic monomers, and the (meth)acrylate compound having an alkenyl group is useful as a silane coupling agent, a starting material for epoxy(meth)acrylates, a modifier for silicone resins, a modifier for unsaturated polyester resins, and a crosslinking agent for acrylic rubbers. The epoxy(meth)acrylate has a well-balanced excellent property between a pot life and reactivity in curing, and it does not contain chlorine, resulting in that a resin therefrom is excellent in an anti-corrosive property and an anti-yellowing property.Type: GrantFiled: October 10, 1995Date of Patent: May 26, 1998Assignee: Daicel Chemical Industries, Ltd.Inventors: Masami Shinohara, Hideki Matsui
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Patent number: 5514818Abstract: A method of resolving a mixture of stereoisomers of an aliphatic epoxide containing two or less oxygen atoms is provided. The method comprises utilizing a polysaccharide or a derivative thereof as a resolving agent.Type: GrantFiled: February 10, 1995Date of Patent: May 7, 1996Assignee: Daicel Chemical Industries, Ltd.Inventor: Kozo Tachibana
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Patent number: 5481012Abstract: Process for the epoxidation of an unsaturated (meth)acrylic compound of formula: ##STR1## in which R.sub.1 is chosen from H and C.sub.1 -C.sub.5 -alkyl; R.sub.2 is chosen from H, alkyl and aryl; R.sub.3 is a straight-chain, branched or cyclic alkylene or oxyalkylene radical having from 1 to 12 carbon atoms, it being possible for one of the carbon atoms of R.sub.2, when the latter is an alkyl radical, to be linked to one of the carbon atoms of R.sub.3 to form a ring; and A is chosen from O, S, NH and NR.sub.4, R.sub.4 being a C.sub.1 -C.sub.12 -alkyl group; by the action of hydrogen peroxide on the said unsaturated (meth)acrylic compound, at a temperature of between 10.degree. C. and 50.degree. C., in the presence of at least one catalyst chosen from the alkali metal molybdates and the alkali metal pertungstates and in the presence of at least one phase transfer agent.Type: GrantFiled: November 3, 1994Date of Patent: January 2, 1996Assignee: AtochemInventors: Paul Caubere, Yves Fort, Agnes Ortar
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Patent number: 5350873Abstract: Optically active compounds of the formula I ##STR1## where R is C.sub.1 -C.sub.12 -alkyl or -perfluoroalkyl in which one or two non-adjacent CH.sub.2 or CF.sub.2 groups can also be replaced by --O-- and/or --CO-- and/or --CO--O-- and/or --CH.dbd.CH-- and/or --CH-halogen-- and/or --CHCN-- and/or --0--CO--CH-halogen-- and/or --O--CO--CHCN--, or is C.sub.1 -C.sub.12 -alkyl which can have a terminal chemically reactive group and in which a CH.sub.2 group can be replaced by --O--,A.sup.1 and A.sup.2 are each, independently of one another, 1,4-phenylene which is unsubstituted or substituted by one or two F and/or Cl and/or Br atoms and/or CH.sub.3 groups and/or CN groups and in which one or two CH groups can also be replaced by N, 1,4-cyclohexylene in which one or two non-adjacent CH.sub.2 groups can also be replaced by --O-- and/or --S--, 1,4-piperidinediyl, 1,4-bicyclo[2.2.2]octylene, 2,6-naphthalenediyl, decahydro-2,6-naphthalenediyl or 1,2,3,4-tetrahydro-2,6-naphthalenediyl,A.sup.Type: GrantFiled: August 13, 1992Date of Patent: September 27, 1994Assignee: BASF AktiengesellschaftInventors: Volker Bach, Wolfgang Brox, Karl-Heinz Etzbach, Axel Paul, Karl Siemensmeyer
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Dispersant adducts comprising alcohol adducts of dicarboxylic acid monoepoxy thiol reaction products
Patent number: 5340487Abstract: The present invention is directed to an oil-soluble lubricating oil additive comprising at least one adduct of (A) a polyolefin of 700 to 5,000 number average molecular weight substituted with carboxylic acid producing moieties (preferably acid or anhydride moieties), and (B) a monoepoxy thiol.Type: GrantFiled: August 19, 1993Date of Patent: August 23, 1994Assignee: Exxon Chemical Patents Inc.Inventors: Jacob Emert, Robert D. Lundberg -
Patent number: 5336436Abstract: Optically active oxirane derivatives containing a mesogenic molecular unit are suitable as dopes in liquid-crystal mixtures. They give liquid-crystalline ferroelectric phases having short response times and electroclinic phases having large electroclinic coefficients. A further advantage is that they induce a helix of very small pitch, so that they are also suitable for helix compensation in LC mixtures.Type: GrantFiled: June 22, 1992Date of Patent: August 9, 1994Assignee: Hoechst AktiengesellschaftInventors: Gunter Scherowsky, Kirsten Gruneberg
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Patent number: 5334682Abstract: Epoxy functional copolymers of a higher .alpha.-olefin, and an unsaturated dicarboxylic acid ester formed by copolymerization of olefin, acid ester and ethylenically unsaturated glycidyl compound can be used to form nitrogen, oxygen, phosphorus and/or sulfur-containing lubricant additives by reaction of the epoxy functionality in such a copolymer with glycidyl-reactive compounds containing nitrogen, oxygen, phosphorus and/or sulfur atoms. Alternatively, the copolymerization reaction can utilize the olefin, unsaturated acid ester, and an ethylenically unsaturated compound containing the nitrogen, phosphorus and/or sulfur atom, which compound is formed by reaction of ethylenically unsaturated glycidyl compound and an epoxy-reactive nitrogen, phosphorus, and/or sulfur-containing compound.Type: GrantFiled: August 27, 1993Date of Patent: August 2, 1994Assignee: Akzo nvInventors: Theodore A. Marolewski, Eric W. Burkhardt, Uwe H. Wallfahrer
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Patent number: 5294646Abstract: The invention relates to new N-alkyl-N-(meth)acryloyloxyalkylcarboxamides of aromatic carboxylic acids and aromatic carboxylic acid anhydrides, their preparation and formulations of these compounds for use as adhesives for the treatment of dental hard substance.Type: GrantFiled: June 25, 1992Date of Patent: March 15, 1994Assignee: Bayer AktiengesellschaftInventors: Michael Muller, Wolfgang Podszun, Werner Finger, Jens Winkel
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Patent number: 5294463Abstract: This invention concerns new molecules with active, non-linear optical properties and which can be thermally reticulated (more precisely, these molecules include terminal functions which can be reticulated, attached to either side of the groups active in non-linear optics, which can be oriented under an electrical field). When reticulated and oriented under an electrical field, these materials are particularly stable and can be employed for industrial applications, using non-linear optics (electrooptical modulators, frequency doublers, etc.).Type: GrantFiled: June 12, 1992Date of Patent: March 15, 1994Assignee: Thompson-CSFInventors: Pierre Le Barny, Evelyne Chastaing, Jean-Claude Dubois, Sophie Muller, Francoise Soyer
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Patent number: 5266660Abstract: Compositions comprising epoxy resins containing one or more rodlike mesogenic moieties per molecule are cured with curing agents which will normally cure epoxy resins. These curable compositions can be oriented by the application of an electric field, magnetic field drawing and/or shear flow prior to and/or during curing. The resultant cured products exhibit an improvement in one or more physical or mechanical properties as compared to a like epoxy resin system which does not contain any rodlike mesogenic moieties.Type: GrantFiled: July 17, 1992Date of Patent: November 30, 1993Assignee: The Dow Chemical Co.Inventors: Robert E. Hefner, Jr., Jimmy D. Earls, Paul M. Puckett
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Patent number: 5242996Abstract: A modified epoxy resin or compound of the formula: ##STR1## wherein A is the backbone reside of a glycidyl ether epoxy resin with removal of the glycidyloxy groups; R.sup.1 and R.sup.2 are independently a hydrogen atom or C.sub.1 -C.sub.12 alkyl; R.sup.3 is a glycidyl group; and n is an integer of greater than 1. A method for producing the modified epoxy resin is also disclosed.Type: GrantFiled: May 22, 1991Date of Patent: September 7, 1993Assignee: Nippon Paint Co., Ltd.Inventors: Mitsuo Yamada, Kei Aoki, Ryuzo Mizuguchi
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Patent number: 5241081Abstract: The invention relates to new N-alkyl-N-(meth)acryloyloxyalkylcarboxamides of aromatic carboxylic acids and aromatic carboxylic acid anhydrides, their preparation and formulations of these compounds for use as adhesives for the treatment of dental hard substance.Type: GrantFiled: August 9, 1991Date of Patent: August 31, 1993Assignee: Bayer AktiengesellschaftInventors: Michael Muller, Wolfgang Podszun, Werner Finger, Jens Winkel