Abstract: A catalyst for polymerization of olefins formed from (A) a solid catalyst component containing magnesium, titanium, halogen, and an electron donor compound, (B) an organoaluminum compound shown by the formula, R6pAlQ3-p, and (C) an aminosilane compound shown by the formula, R3nSi(NR4R5)4-n; and a process for producing a catalyst for polymerization of olefins in the presence of the catalyst are provided. A novel aminosilane compound, a catalyst component for polymerization of olefins having a high catalytic activity, capable of producing polymers with high stereoregularity in a high yield, and exhibiting an excellent hydrogen response, a catalyst, and a process for producing olefin polymers using the catalyst are provided.

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <300° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least one disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups.

Abstract: The invention relates to a method for the regeneration of a reactor and the use of said method for the improved performance of production processes for desired products.

Abstract: Aminosilane precursors for depositing silicon-containing films, and methods for depositing silicon-containing films from these aminosilane precursors, are described herein. In one embodiment, there is provided an aminosilane precursor for depositing silicon-containing film comprising the following formula (I): (R1R2N)nSiR34-n ??(I) wherein substituents R1 and R2 are each independently chosen from an alkyl group comprising from 1 to 20 carbon atoms and an aryl group comprising from 6 to 30 carbon atoms, at least one of substituents R1 and R2 comprises at least one electron withdrawing substituent chosen from F, Cl, Br, I, CN, NO2, PO(OR)2, OR, SO, SO2, SO2R and wherein R in the at least one electron withdrawing substituent is chosen from an alkyl group or an aryl group, R3 is chosen from H, an alkyl group, or an aryl group, and n is a number ranging from 1 to 4.

Abstract: Active carrier that consists of a carrier base (1) and attached linkers containing activated linker functional groups. The active carrier contains two or more different activated linker functional groups. A process for the production of the active carrier that comprises a carrier base (1) and linkers containing activated linker functional groups. Steps of the process: a) binding of a linker containing one or more linker functional groups to the carrier base (1), through the carrier functional groups; and b) reacting the linker functional groups of the linkers bound to the carrier base in step a) with two or more different activating reagents simultaneously. Use of the active carrier, during which the surface of the active carrier is contacted with one or more solution of small molecules.

Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.

Abstract: A perfluoropolyether-modified polysilazane is provided. The polysilazane consists of units having formula (1): F(CxF2xO)mCyF2y-Q-Si(NH)1.5 ??(1) wherein Q represents a divalent organic group, m represents an integer of 1 or greater, and x and y each represents an integer of 1 to 3. The polysilazane can be cured at normal temperatures, forms a tough coating on a substrate surface without application of a primer, and is useful as a surface treatment agent that is capable of maintaining water and oil repellency and releasability and the like, over a long period of time.

Abstract: Pentakis(dimethylamino) disilane with general formula (1): Si2(NMe2)5Y, where Y is selected from the group comprising H, Cl or an amino group its preparation method and its use to manufacture gate dielectric films or etch-stop dielectric films of SiN or SiON.

Abstract: The crucible for melting silicon according to the present invention is a crucible for melting silicon including a crucible main body including a heat-resistant member, and a protective film formed at least on an inner surface of the crucible main body, in which the protective film has a composition of SiOXNY in which X>0 and Y>0. The crucible for melting silicon according to the present invention has excellent releasability to a silicon block, reduces the amount of impurities dissolved in a silicon melt, and can be produced at low cost. Furthermore, the present invention provides a release agent for use in the production of the crucible for melting silicon.

Abstract: Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as low dielectric constant (k) thin films, high k gate silicates, low temperature silicon epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon dioxide (SiO2). The precursors of the invention are amenable to use in low temperature (e.g., <500° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.

Abstract: Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as films including silicon carbonitride, silicon oxycarbonitride, and silicon nitride (Si3N4), and a method of depositing the silicon precursors on substrates using low temperature (e.g., <550° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.

Abstract: Disclosed are: a method for production of an organic-inorganic complex by intercalation of a positively charged organic compound between layers of a non-swellable layered silicate which is believed to be difficult to achieve under convenient conditions; the organic-inorganic complex; and a layered silicate/polymer nanocomposite using the organic-inorganic complex. The method comprises: step (I) wherein a hydrous layered silicate having a hydroxyl group in its crystalline structure is heat-treated at a temperature not higher than 1,200° C. and lower than the phase transition temperature of the silicate to dehydrate the silicate; and step (II) wherein the dehydrated layered silicate is contacted with an aqueous solution of a positively charged organic compound.

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <550° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least a silane or disilane derivative that is substituted with at least one alkylhydrazine functional groups and is free of halogen substitutes.

Abstract: An amino alkoxy-modified silsesquioxane (AMS) comprising one or more compounds selected from the group consisting of an amino AMS, an amino/mercaptan co-AMS, an amino/blocked mercaptan co-AMS, mixtures thereof, and a weak acid-neutralized solid or aqueous solution thereof, and a method of making the amino AMS, are presented. The compounds are useful in compounding, processing, cure and storage of silica-reinforced rubbers because they contain low levels of volatile organic compounds (VOC).

Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain carboxylic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerized carboxylic hydrophilic siloxanyl monomers.

Abstract: A new class of reagents and method of use of the reagents in the reaction of the reagents with electrophilic compounds. The invention in one embodiment is directed to a method for the formation of an alcohol of the formula (I). The method includes reacting a reagent of the formula (II) with an aldehyde of the formula R10CHO to form the alcohol. X3 is one of O and C(R4)(R5). Each of X1 and X2 is independently O or N—R. Each of Ca and Cb is independently an achiral center, an (S) chiral center or an (R) chiral center. Ra and Rb are (i) each independently C1-10 alkyl, C6-10 aryl or C3-9 heteroaryl, or (ii) taken together to form a C3—C4 alkylene chain which together with Ca and Cb forms a 5-membered or 6-membered aliphatic ring. Rc and Rd are each independently hydrogen, C1-10 alkyl, C6-10 aryl or C3-9 heteroaryl. R is C1-10 alkyl, C6-10 aryl or C3-9 heteroaryl.

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <300° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least one disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups.

Abstract: Cyclic silazanes containing an oxamido ester group and methods of making these compounds are described. The compounds can be used, for example, to make oxamido ester-terminated siloxanes, which can be precursors for the preparation of various polymeric materials such as, for example, polydiorganosiloxane polyoxamides.

Abstract: Classes of liquid aminosilanes have been found which allow for the production of silicon-containing films. These aminosilanes, in contrast, to some of the precursors employed heretofore, are liquid at room temperature and pressure allowing for convenient handling. In addition, the invention relates to a process for producing such films. The classes of compounds are generally represented by the formulas: and mixtures thereof, wherein R and R1 in the formulas represent aliphatic groups typically having from 2 to about 10 carbon atoms, e.g., alkyl, cycloalkyl with R and R1 in formula A also being combinable into a cyclic group, and R2 representing a single bond, (CH2)n, a ring, or SiH2.

Abstract: The present invention relates to a curing accelerating compound-silica composite material capable of giving excellent storage stability to a curable resin composition, which is obtained by subjecting one or more compounds selected from compounds represented by the general formula (I-1) below and partial condensates thereof to a sol-gel reaction in the presence of a curing accelerating compound and water; a curable resin composition comprising the same; and an electronic component device comprising a device sealed with the curable resin composition.

Abstract: The invention relates to novel silane compounds corresponding to the following formula (I): A-E-X??(I) in which: X represents a silylated group which makes possible the covalent attachment of the silane compound to the hydroxyl or hydride functional groups of a support; E represents an organic spacer group; A represents a group capable of releasing an —OH functional group by acid hydrolysis, the said —OH functional group, after the said hydrolysis, being covalently bonded to E. Use of these silane compounds for functionalizing solid supports and for immobilizing biological molecules on these supports.

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <300° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least one disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups.

Abstract: The present invention provides a highly durable packing material for liquid chromatography that is excellent in acidic resistance and alkalic resistance. Such a packing material for liquid chromatography can be obtained by chemically modifying silica gel with a bifunctional silane compound represented by the general formula [I], and carrying out an endcapping reaction of the resulting chemically modified silica gel using bifunctional cyclic silazane represented by the general formula [II]. In the formula [I], X1 and X2, the same or different, represent a hydrogen atom, a halogen atom or an alkoxy group having 1 to 4 carbon atoms; and R1 represents an alkyl group or an aryl group, which can have substituent(s). In the formula [II], R2 and R3, the same or different, represent an alkyl group having 1 to 4 carbon atoms; and n represents a value indicating unit number that forms the ring, which is an integer of 2 to 10.

Abstract: To provide an aminoaryl containing organosilicon compound with high efficiency, after protecting amino groups of a haloaniline compound with a specific compound, to form a Grignard reagent and to deprotect the aforementioned groups by reacting the Grignard reagent with a silicon compound.

Abstract: A crosslinkable silane-terminated polymer is provided which includes the reaction product of an isocyanate-terminated prepolymer and a silane possessing a plurality of hydrolysable sites and at least one active hydrogen-containing group which is reactive for isocyanate, the silane upon hydrolysis produces a reduced amount of volatile organic compound compared to that produced by the hydrolysis of a silane possessing an equivalent number of hydrolyzable sites all of which are hydrolyzable alkoxy groups.

Abstract: Reversible switchable surfactants are provided. A surfactant is the salt of an amidine or guanidine having at least one R group that is a hydrophobic moiety selected from the group consisting of higher aliphatic moiety, higher siloxyl moiety, higher aliphatic/siloxyl moiety, aliphatic/aryl moiety, siloxyl/aryl moiety, and aliphatic/siloxyl/aryl moiety. The other R groups are smaller moieties such as H, C1 to C4 aliphatic or the like. The surfactant is turned on by a gas that liberates hydrogen ions, such as, for example, carbon dioxide, which liberates hydrogen ions in the presence of water. The surfactant is turned off by exposure to a flushing gas and/or heating. When “on” the surfactants are useful to stabilize emulsions, and when “off” they are useful to separate immiscible liquids or a liquid and a solid. The surfactants find uses in polymerization and in the oil industry.

Abstract: A process for the production of trialkoxyhalosilanes which comprises reacting a tetrahalosilane [37] with a tetra-alkoxysilane [38] in the presence of an alcohol whose alkoxy group is the same as those of the tetraalkoxysilane to thereby obtain a trialkoxyhalosilane [39], characterized in that the alcohol is used in an amount of 5 to 50% by mole based on the total amount of Si of the tetrahalosilane and the tetraalkoxysilane: SiX4 [37] (wherein X is halogeno) Si(OR1)4 [38] (wherein R1 is a hydrocarbon group having 1 to 6 carbon atoms) XSi(OR1)3 [39] (wherein X and R1 are each as defined above).

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <550° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least a silane or disilane derivative that is substituted with at least one alkylhydrazine functional groups and is free of halogen substitutes.

Abstract: Novel silicon precursors for low temperature deposition of silicon films are described herein. The disclosed precursors possess low vaporization temperatures, preferably less than about 500° C. In addition, embodiments of the silicon precursors incorporate a —Si—Y—Si— bond, where Y may comprise an amino group, a substituted or unsubstituted hydrocarbyl group, or oxygen. In an embodiment a silicon precursor has the formula: where Y is a hydrocarbyl group, a substituted hydrocarbyl group, oxygen, or an amino group; R1, R2, R3, and R4 are each independently a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, a heterohydrocarbyl group, wherein R1, R2, R3, and R4 may be the same or different from one another; X1, X2, X3, and X4 are each independently, a hydrogen group, a hydrocarbyl group, a substituted hydrocarbyl group, or a hydrazino group, wherein X1, X2, X3, and X4 may be the same or different from one another.

Abstract: Positron emitting compounds and methods of their production are provided. The compounds have the formula: (F)m G (R)n wherein each R is a group comprising at least one carbon, nitrogen, phosphorus or sulfur atom and G is joined to R through said carbon, nitrogen, phosphorus or sulfur atom; G is silicon or boron; m is 2 to 5 and n is 1 to 3 with m+n=3 to 6 when G is silicon; m is 1 to 3 and n is 1 to 3 with m+n=3 to 4 when G is boron; and wherein the compound further comprises one or more counterions when the above formula is charged; and wherein at least one F is 18 F.

Abstract: In one aspect, the invention relates to methods of synthesizing acryloyl compounds, comprising the step of hydrosilylating a compound having the structure: with a compound having the structure A-H, wherein A comprises a siloxanyl group, to yield a compound having the structure: Compounds and compositions produced thereby can effectively attain a satisfactory balance between high oxygen permeability and hydrophilicity while achieving an acceptably low concentration of undesirable impurities. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present invention.

Abstract: The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1): M[(R1)2N](n?s)(R2)s??(1) wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R1 represents a methyl group or ethyl group, R2 represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n?1.

Abstract: A subject of the present invention is new compounds having a lanthanide and having a tridentate ligand, a process for their preparation and their use in particular as polymerization catalysts.

Abstract: A metallocene catalyst in which the metal is coordinated by a ?5 cyclopentadienyl ligand which forms part of an indenyl or indenyloid moiety, characterized in that said moiety is directly or indirectly substituted at the 4-, 5-, 6- or 7-position by a pendant siloxy or germyloxy group.

Abstract: An adhesive compound for use during the formation of a photoresist film represented by the following chemical formula, wherein R represents a photoacid generator is disclosed.

Abstract: A composition and method of preparation, to provide silane compounds that are free of chlorine. The compounds are hexakis(monohydrocarbylamino)disilanes with general formula (I) ((R)HN)3—Si—Si—(NH(R))3??(I) wherein each R independently represents a C1 to C4 hydrocarbyl. These disilanes may be synthesized by reacting hexachlorodisilane in organic solvent with at least 6-fold moles of the monohydrocarbylamine RNH2 (wherein R is a C1 to C4 hydrocarbyl). Such compounds have excellent film-forming characteristics at low temperatures. These films, particularly in the case of silicon nitride and silicon oxynitride, also have excellent handling characteristics.

Abstract: A process for synthesizing an aminosilane compound such as bis(tertiarybutylamino)silane is provided. In one aspect of the present invention, there is provided a process for making bis(tertiarybutylamino)silane comprising reacting a stoichiometric excess of tert-butylamine with dichlorosilane under anhydrous conditions sufficient such that a liquid comprising the bis(tertiarybutylamino)silane product is produced.

Abstract: A modified silica support having a polar phase bound to its surface and suitable for use for chromatographic separations, having the following formula: wherein, m=0-20; n=0-20; p=1-50; X is sulfonyl, carbonyl, carbamoyl, or oxycarbonyl; R1=H, alkyl, substituted alkyl, aryl or substituted aryl groups; R2=alkyl, substituted alkyl, aryl or substituted aryl groups; and R3 and R4 are alkyl, aryl, hydroxyl, or alkoxyl groups or groups including oxygen atoms cross-linked to silicon atoms. Also, a polar silane intermediate to make this support.

Abstract: Catalysts and processes for preparing polyisocyanates containing isocyanurate groups, and their use, wherein the catalysts are represented by the following formula (1): [Hl?Xm?Fn?]p·[R(4?q)Si(NR1R2)q]r??(I), wherein n=m+l with 1?m/n>0, and l?0, p>0 and r>0, and the ratio p/r is any value, q=1 or 2, and R, R1, R2 and X are as defined.

Abstract: Bissilylamino group-bearing chlorosilane compounds of formula (1):

Abstract: The invention comprises a networked polymer comprising the formula: wherein n≧1; wherein n is an average value obtained by averaging all repeating units of the networked polymer; wherein m≧1; wherein Y is a divalent group containing one or more acetylenic groups, one or more crosslinks, or both; wherein z is the average number of crosslinks per Y group; wherein Ar1 and Ar2 are independently selected aromatic groups; and wherein each R is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl, and combinations thereof. The invention also includes prepolymers and precursors needed to make the networked polymer and processes for making all of the above. The invention also includes a ceramic composition made by pyrolysis of the networked polymer.

Abstract: A prepolymer, represented by the formula: wherein n is an average value grater than or equal to 0, Ar is an aromatic group, and each R10 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof and each R11 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof.

Abstract: An alkynyl S,N-acetal derivative of the present invention is represented by the following structural formula: 1

Abstract: Method is provided for selectively opening rings of polyhedral oligomeric silsesquioxane (POSS) compounds to from functionalized derivatives thereof or new POSS species. Per the inventive method, the POSS compound is reacted with an acid to selectively cleave bonds in the POSS rings to add functionalities thereto for grafting, polymerization or catalysis, to thus form new familes of POSS derived compounds. Also provided are the new compounds so formed. Method is also provided for expanding rings of POSS compounds. Per the inventive method, a POSS compound is reacted with silane reagents to obtain an expanded POSS framework with added Si ring substituends to form new families of POSS compounds. Also provided are the new compounds so formed.

Abstract: This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., <300° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least one disilane derivative compound that is fully substituted with alkylamino and/or dialkylamino functional groups.

Abstract: A process for synthesizing an aminosilane compound such as bis(tertiarybutylamino)silane is provided. In one aspect of the present invention, there is provided a process for making bis(tertiarybutylamino)silane comprising reacting a stoichiometric excess of tert-butylamine with dichlorosilane under anhydrous conditions sufficient such that a liquid comprising the bis(tertiarybutylamino)silane product is produced.

Abstract: The present invention is a demulsifying and corrosion-inhibiting compound formed from the salt of an amphiphilic amine and an amphiphilic acid. In a preferred embodiment of the invention, the demulsifier may be a salt of an alkyl amine and an alkyl aryl sulfonic acid. Even more preferably, the demulsifier may be a salt of a methyl, di-cocoyl amine and an alkyl aryl sulfonic acid. According to another embodiment of the invention, an organic system may be demulsified by mixing the salt of an alkyl amine and an alkyl sulfonic acid with the system to be demulsified.

Abstract: A subject of the present invention is new compounds having a lanthanide and having a tridentate ligand, a process for their preparation and their use in particular as polymerization catalysts.

Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and ?represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl, and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.

Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and ?represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.