Noncarbon Atom In Acyclic Chain Between The Benzene Ring And The Sulfonate Sulfur Patents (Class 562/42)
  • Patent number: 11560355
    Abstract: A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.
    Type: Grant
    Filed: January 15, 2020
    Date of Patent: January 24, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama
  • Patent number: 10611725
    Abstract: The present invention relates to beta-naphthol ether sulfonic acids or salts thereof having the general formula (I) R—O-(AO)n—CH2—CH2—S(O)3M (I), where R, AO, n and M have the definitions stated in the claims and in the description, to mixtures thereof, to aqueous solutions and to electrolytes comprising them, to processes for preparing them and to the use of these.
    Type: Grant
    Filed: May 18, 2016
    Date of Patent: April 7, 2020
    Assignee: BASF SE
    Inventors: Sophie Maitro-Vogel, Michael Lorenz, Tobias Urban, Silke Annika Koehler
  • Patent number: 10011703
    Abstract: An epoxy or hardener mixture comprising (a) optionally water, (b) at least one hardener or epoxy resin, and (c) from 0.1 to 20 weight percent, based on epoxy resin of at least one distyryl phenol, tristyryl phenol or cumylphenol based additive surfactant with phosphate or sulfonate end groups having the structure R—OXn-W wherein R designates a polystyrylphenol or cumylphenol, preferentially chosen from among distyrylphenol, tristyrylphenol or cumylphenol, and mixtures thereof, and wherein OX designates ethylene oxide and/or propylene oxide. The number of groups “n” varies from 0 to 200, and W designates H, sulfate (—SO3?) or phosphate (—PO3H or —PO2—OXnR). Freeze thaw resistance and improved stability is obtained in epoxy mixtures used in dispersion form. Improved pot life and cure time is obtained using either the epoxy mixture, the hardener mixture or a combination of the two in epoxy hardener formulations.
    Type: Grant
    Filed: March 9, 2013
    Date of Patent: July 3, 2018
    Assignee: ETHOX CHEMICALS, LLC
    Inventors: Gerald Vandezande, Charles F. Palmer, Jr., Edward R. Godwin
  • Patent number: 9464223
    Abstract: Methods and compositions comprising an emulsion or a microemulsion for use in various aspects of the life cycle of an oil and/or gas well are provided. In some embodiments, the emulsion or the microemulsion comprises water, a solvent, and a surfactant, and optionally, one or more additives.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: October 11, 2016
    Assignee: Flotek Chemistry, LLC
    Inventors: Lakia M. Champagne, Angus Fursdon-Welsh, Nathan L. Lett, Maria Elizabeth Green
  • Patent number: 9263766
    Abstract: An additive for an electrolyte of a lithium battery including a disultone-based compound represented by Formula 1 below, an organic electrolyte solution including the additive, and a lithium battery including the organic electrolyte solution are provided: wherein, in Formula 1, A1, A2, A3, and A4 are each independently a substituted or unsubstituted C1-C5 alkylene group; a carbonyl group; or a sulfinyl group.
    Type: Grant
    Filed: January 9, 2014
    Date of Patent: February 16, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Khasanov Makhmut, Sang-Hoon Kim, Ha-Rim Lee, Pavel Alexandrovich Shatunov, In-Haeng Cho, Woo-Cheol Shin
  • Patent number: 9051292
    Abstract: The invention relates to polysultone derivatives used as precursors to radiolabelled macromolecules usable for medicine and in nuclear imaging. The aim of the invention is to provide novel prosthetic compounds or groupings, the synthesis of which is straightforward, easy and automatable, enabling access to economical and effective radiolabelled macromolecules. The aim is achieved by the invention, which involves compounds of formula 10 or 11. Said double-sultone derivatives are produced by opening the sultone rings using a nucleophile radical Ri which may be a radionucleide R* for one of the sultone rings and an active radical peptide Ra for the other sultone ring. The invention also relates to the method for producing the abovementioned compounds, as well as to the drugs or diagnosis products that the latter are capable of forming.
    Type: Grant
    Filed: August 10, 2010
    Date of Patent: June 9, 2015
    Assignee: ADVANCED ACCELERATOR APPLICATIONS
    Inventor: Cedric Bouteiller
  • Patent number: 9040220
    Abstract: A resist composition including a base component which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component which generates acid upon exposure, the acid-generator including an acid generator consisting of a compound represented by general formula (b1-1) shown below: In which RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: May 26, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita, Hiroaki Shimizu, Yasuhiro Yoshii
  • Patent number: 9040745
    Abstract: A production process of a fluorosulfuric acid aromatic-ring ester according to the present invention includes reaction of an aromatic-ring hydroxyl compound with sulfuryl fluoride (SO2F2) in the presence of a tertiary amine except pyridine and methylpyridine. The sulfuryl fluoride, used as the reactant in the production process according to the present invention, is widely adapted as a fumigant and is easily available on a large scale. Further, the target compound can be obtained rapidly with a high yield under moderate reaction conditions in the production process according to the present invention. In this way, all of the prior art problems can be solved in the production process according to the present invention. The production process according to the present invention is thus particularly useful for industrial production of the fluorosulfuric acid aromatic-ring ester.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: May 26, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Akihiro Ishii, Takehisa Ishimaru, Takako Yamazaki, Manabu Yasumoto
  • Patent number: 9034556
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-1) shown below: wherein RX represents a hydrocarbon group which may have a substituent exclusive of a nitrogen atom; each of Q2 and Q3 independently represents a single bond or a divalent linkage group; Y1 represents an alkylene group or fluorinated alkyl group of 1 to 4 carbon atoms; and Z+ represents an organic cation exclusive of an ion represented by general formula (w-1).
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: May 19, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Yoshiyuki Utsumi, Keita Ishiduka, Kensuke Matsuzawa, Fumitake Kaneko, Kyoko Ohshita, Hiroaki Shimizu, Yasuhiro Yoshii
  • Publication number: 20150094240
    Abstract: The present invention relates to novel compounds of polyfunctionalized polyethylene and polypropylene glycols, their synthesis and their use, in particular as tracers in applications related to oil and gas production, and especially as specific markers of various target fluids.
    Type: Application
    Filed: September 30, 2014
    Publication date: April 2, 2015
    Inventors: Lars KILAAS, Erland NORDGARD, Anne DALAGER DYRLI
  • Patent number: 8907103
    Abstract: Provided herein are compounds, including enantiomerically pure forms thereof, and pharmaceutically acceptable salts or co-crystals and prodrugs thereof which have glucagon receptor antagonist or inverse agonist activity. Further, provided herein are pharmaceutical compositions comprising the same as well as methods of treating, preventing, delaying the time to onset or reducing the risk for the development or progression of a disease or condition for which one or more glucagon receptor antagonist is indicated, including Type I and II diabetes, insulin resistance and hyperglycemia. Moreover, provided herein are methods of making or manufacturing compounds disclosed herein, including enantiomerically pure forms thereof, and pharmaceutically acceptable salts or Co-crystals and prodrugs thereof.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: December 9, 2014
    Assignee: Metabasis Therapeutics, Inc.
    Inventors: Jorge E. Gomez-Galeno, Scott J. Hecker, Qun Dang, Mali Venkat Reddy, Zhili Sun, Matthew P. Grote, Thanh Huu Nguyen, Robert Huerta Lemus, Haiqing Li
  • Publication number: 20140349221
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the method for manufacturing an electronic device.
    Type: Application
    Filed: August 13, 2014
    Publication date: November 27, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroo TAKIZAWA, Tomotaka TSUCHIMURA
  • Patent number: 8889901
    Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: November 18, 2014
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon Oh, Dae Kyung Yoon, Yong Hwa Hong, Seung Duk Cho
  • Patent number: 8853441
    Abstract: A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; R1 and R2 each independently represent an alkyl group or the like; R4 to R6 each independently represent an alkyl group, or the like; R3 represents a cyclic alkenediyl group or the like; and ?A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: October 7, 2014
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon Oh, Dae Kyung Yoon, Seung Duk Cho, So Jeong Park
  • Publication number: 20140255853
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W1 represents a group which is formed by polymerization reaction of a group containing a polymerizable group; Y1 and Y2 each independently represents a divalent linking group; Y3 represents a carbonyl group or an alkylene group; R2 and R3 each independently represents a fluorine atom or a fluorinated alkyl group; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Application
    Filed: March 4, 2014
    Publication date: September 11, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Yoshiyuki Utsumi
  • Patent number: 8748656
    Abstract: The invention relates to methods, compounds, compositions and vehicles for delivering 3-amino-1-propanesulfonic acid (3APS) in a subject, preferably a human subject. The invention encompasses compounds that will yield or generate 3APS, either in vitro or in vivo. Preferred compounds include amino acid prodrugs of 3APS for use, including but not limited to, the prevention and treatment of Alzheimer's disease.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: June 10, 2014
    Assignee: BHI Limited Partnership
    Inventors: Xianqi Kong, Mohamed Atfani, Benoit Bachand, Abderrahim Bouzide, Stéphane Ciblat, Sophie Levesque, David Migneault, Isabelle Valade, Xinfu Wu, Daniel Delorme
  • Publication number: 20140114088
    Abstract: A production process of a fluorosulfuric acid aromatic-ring ester according to the present invention includes reaction of an aromatic-ring hydroxyl compound with sulfuryl fluoride (SO2F2) in the presence of a tertiary amine except pyridine and methylpyridine. The sulfuryl fluoride, used as the reactant in the production process according to the present invention, is widely adapted as a fumigant and is easily available on a large scale. Further, the target compound can be obtained rapidly with a high yield under moderate reaction conditions in the production process according to the present invention. In this way, all of the prior art problems can be solved in the production process according to the present invention. The production process according to the present invention is thus particularly useful for industrial production of the fluorosulfuric acid aromatic-ring ester.
    Type: Application
    Filed: June 15, 2012
    Publication date: April 24, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Akihiro Ishii, Takehisa Ishimaru, Takako Yamazaki, Manabu Yasumoto
  • Publication number: 20140065512
    Abstract: The present invention relates to a novel sulfonate-based compound, a method for preparing the same, a polymer electrolyte membrane comprising the sulfonate-based compound, a membrane electrode assembly comprising the same and a fuel cell comprising the same.
    Type: Application
    Filed: December 3, 2012
    Publication date: March 6, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Hyejin Kwon, Seong Ho Choi, Min-Jong Lee, Sergey Ulyakhin, Chong Kyu Shin
  • Publication number: 20140051815
    Abstract: The present disclosure relates to an organic sulfonic acid-based compound and a preparation method thereof, a dopant including the compound, and a conductive polymer composite including the dopant, and more specifically, provides a dopant including a derivative compound containing a sulfonic acid group connected to a benzene ring via a flexible chain to enhance the solubility and the dispersibility in a general solvent, and the environment-resistance thereof, thus increasing the electric conductivity and significantly improving not only the processability but also the mechanical feature.
    Type: Application
    Filed: October 25, 2013
    Publication date: February 20, 2014
    Applicant: Ajou University Industry-Academic Cooperation Foundation
    Inventors: Suck Hyun Lee, O Pil Kwon, Tae Ja Kim
  • Patent number: 8653297
    Abstract: A solid acid having a core of calixarene or calix resorcinarene. The solid acid is an ion conducting compound in which at least one of the hydroxyl groups is substituted by an organic group having a cation exchange group at a terminal end, a polymer electrolyte membrane including the same, and a fuel cell using the polymer electrolyte membrane. The polymer electrolyte membrane can provide low methanol crossover and high ionic conductivity. Accordingly, a fuel cell having high efficiency can be obtained by using the polymer electrolyte membrane.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: February 18, 2014
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jae-jun Lee, Myung-sup Jung, Do-yun Kim, Jin-gyu Lee, Sang-kook Mah
  • Publication number: 20130273800
    Abstract: The present disclosure provides novel oligo phenylene ethynylene (OPE) compounds, methods for synthesizing these compounds, and materials and substances incorporating these compounds. The various OPEs show antibacterial, antiviral and anti-fungal activity.
    Type: Application
    Filed: July 13, 2011
    Publication date: October 17, 2013
    Applicant: Office of Technology Licensing
    Inventors: David G. Whitten, Kirk S. Schanze, Eunkyung Ji, Thomas S. Corbitt, Zhijun Zhou, Dimitri Dascier, Ying Wang, Linnea K. Ista, Anand Parthsaray
  • Patent number: 8530138
    Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.
    Type: Grant
    Filed: August 24, 2011
    Date of Patent: September 10, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Isao Yoshida, Koji Ichikawa
  • Publication number: 20130210828
    Abstract: The present disclosure provides novel poly(phenylene ethynylene) (PPE) compounds, methods for synthesizing these compounds, and materials and substances incorporating these compounds. The various PPEs show antibacterial, antiviral and antifungal activity.
    Type: Application
    Filed: July 13, 2011
    Publication date: August 15, 2013
    Inventors: David G. Whitten, Kirk S. Sehanze, Anand Parthsaray, Eunkyung Ji, Motokatsu Ogawa, Thomas S. Corbitt, Dimitri Dascier, Ying Wang, Linnea K. Ista
  • Patent number: 8318404
    Abstract: A salt represented by the formula (a1): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents —CO—O—Xa1— or —CH2—O—Xa2— wherein Xa1 and Xa2 independently each represent a C1-C15 alkylene group and one or more —CH2— in the alkylene group can be replaced by —O— or —CO—, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O— or —CO—, and Z+ represents an organic cation.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: November 27, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Masako Sugihara, Hiromu Sakamoto
  • Publication number: 20120289738
    Abstract: A sulfonic acid derivative represented by the following general formula (1): [Chemical formula 1] RCOOCH2CH2CFHCF2SO3?M+??(1) where R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation.
    Type: Application
    Filed: January 13, 2011
    Publication date: November 15, 2012
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Yasuhiro Hosoi, Yuzuru Kaneko
  • Patent number: 8288077
    Abstract: The object of the present invention is to provide a chemically amplified resist composition excellent in a resolution and a mask error enhancement factor. By employing the salt represented by the formulae (A1) as an acid generator of a resist composition, the above mentioned object is achieved. wherein Z+ represents an organic cation, Q1 and Q2 each independently represent a fluorine atom or a perfluoroalkyl group, Ra2 represents a divalent alicyclic hydrocarbon group pr the like, Ra2 represents an elimination group represented by the formulae (II-1) or (II-2). In the formulae (II-1) or (II-2), Ra3 and Ra4 each independently represent a hydrogen atom or an aliphatic hydrocarbon group, Ra5 represents an aliphatic hydrocarbon group, Ra6 represents a divalent aliphatic hydrocarbon group, and Ra7 represents an aliphatic hydrocarbon group.
    Type: Grant
    Filed: July 27, 2010
    Date of Patent: October 16, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Isao Yoshida, Satoshi Yamaguchi
  • Patent number: 8283104
    Abstract: There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3?M+??(2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: October 9, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Takeshi Kinsho, Youichi Ohsawa
  • Publication number: 20120226072
    Abstract: The present invention is directed to novel macrocyclic compounds of formula (I) and their pharmaceutically acceptable salts, hydrates or solvates: wherein R1, R2, R3, R4, R5, R6, n1, m, p Z1, Z2, and Z3 are as describe in the specification. The invention also relates to compounds of formula (I) which are antagonists of the motilin receptor and are useful in the treatment of disorders associated with this receptor and with or with motility dysfunction.
    Type: Application
    Filed: March 5, 2012
    Publication date: September 6, 2012
    Inventors: Eric Marsault, Luc Ouellet, Hamid R. Hoveyda
  • Publication number: 20120203030
    Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.
    Type: Application
    Filed: February 7, 2012
    Publication date: August 9, 2012
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon OH, Dae Kyung Yoon, Yong Hwa Hong, Seung Duk Cho
  • Patent number: 8227169
    Abstract: There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R2—CH2—O—Y1—SO3?A+??(b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A+ represents a cation.
    Type: Grant
    Filed: April 4, 2008
    Date of Patent: July 24, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Kotaro Endo, Daisuke Kawana, Yasuhiro Yoshii, Tsuyoshi Kurosawa
  • Patent number: 8173353
    Abstract: The present invention provides a sulfonium compound represented by the formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1 represents a C5-C42 organic group having a ?-ketoester structure and A+ represents an organic counter ion, and a chemically amplified photoresist composition comprising the above-mentioned sulfonium compound and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: May 8, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsuro Masuyama, Junji Shigematsu, Hanwoo Park
  • Publication number: 20120046364
    Abstract: The present invention relates to sulfonic acid containing compounds of formula IB, in which G, R1, R3 and T are as defined in the claims, that bind to thyroid receptors in the liver. Activation of these receptors results in modulation of gene expression of genes regulated by thyroid hormones. The compounds can be used to treat diseases and disorders including metabolic diseases such as obesity, NASH, hypercholesterolemia and hyperlipidemia, as well as associated conditions such as atherosclerosis, coronary heart disease, impaired glucose tolerance, metabolic syndrome X and diabetes.
    Type: Application
    Filed: February 9, 2010
    Publication date: February 23, 2012
    Applicant: METABASIS THERAPEUTICS, INC.
    Inventors: Serge H. Boyer, Scott J. Hecker, Mali Venkat Reddy
  • Patent number: 8049032
    Abstract: A solid acid having a core of calixarene or calix resorcinarene. The solid acid is an ion conducting compound in which at least one of the hydroxyl groups is substituted by an organic group having a cation exchange group at a terminal end, a polymer electrolyte membrane including the same, and a fuel cell using the polymer electrolyte membrane. The polymer electrolyte membrane can provide low methanol crossover and high ionic conductivity. Accordingly, a fuel cell having high efficiency can be obtained by using the polymer electrolyte membrane.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: November 1, 2011
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jae-jun Lee, Myung-sup Jung, Do-yun Kim, Jin-gyu Lee, Sang-kook Mah
  • Patent number: 7993797
    Abstract: A membrane-electrode assembly in a polymer electrolyte/proton exchange membrane fuel cell includes the electrodes (anode and cathode), with a thin layer of catalyzed conductive support particles bonded to either side of the membrane. Where the polymer membrane comprises pendant chains of fluorinated carbon atoms with mobile proton containing terminal groups, proton conductivity with the catalyst particles is improved by chemically attaching like pendant chains to carbon atoms at surfaces of carbon particles. In certain implementations, an amino aryl perfluorinated sulfonic acid precursor is prepared. This precursor is converted to an aryl diazonium cation in the presence of carbon particles. The diazonium cation is reduced to the aryl radical which reacts with carbon atoms of the carbon substrate.
    Type: Grant
    Filed: July 10, 2007
    Date of Patent: August 9, 2011
    Assignee: GM Global Technology Operations LLC
    Inventors: Tina T. Salguero, Elena Sherman, Ping Liu
  • Publication number: 20110152537
    Abstract: The present invention relates to chemical compounds comprising a [Y(CHRa)n—CH(Ra)SO3]? anion, their preparation and application. The chemical compounds are preferably ionic liquids.
    Type: Application
    Filed: May 12, 2009
    Publication date: June 23, 2011
    Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
    Inventors: Peter Wasserscheid, Natalia Paape, Andreas Boesmann, Peter Schulz
  • Publication number: 20110048721
    Abstract: The present invention describes the synthesis and use of cleavable di-functional anionic surfactants for enhanced oil recovery applications and/or the use of sacrificial surfactants.
    Type: Application
    Filed: September 2, 2010
    Publication date: March 3, 2011
    Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Gary A. Pope, Upali P. Weerasooriya, Quoc P. Nguyen, Larry N. Britton
  • Publication number: 20100119974
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).
    Type: Application
    Filed: November 10, 2009
    Publication date: May 13, 2010
    Inventors: Hideo Hada, Yoshiyuki Utsumi, Takehiro Seshimo, Akiya Kawaue
  • Publication number: 20100119970
    Abstract: There is disclosed a resist lower-layer composition configured to be used by a multi-layer resist method used in lithography to form a layer lower than a photoresist layer acting as a resist upper layer film, wherein the resist lower-layer composition becomes insoluble or poorly-soluble in an alkaline developer after formation of the lower layer, and wherein the resist lower-layer composition comprises, at least, a thermal acid generator for generating an acid represented by the general formula (1) by heating at a temperature of 100° C. or higher.
    Type: Application
    Filed: October 20, 2009
    Publication date: May 13, 2010
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Youichi Ohsawa, Jun Hatakeyama, Takeru Watanabe, Takeshi Kinsho
  • Publication number: 20100112545
    Abstract: Novel trans-1,2-diphenylethylene derivatives are synthesized which can be used to form nanoparticles-monomer-nanomolecule-receptor nanosensors. These trans-1,2-diphenyl-ethylene derivatives are soluble in both water and organic solvents, highly fluorescent and can be synthesized in high yields. The trans-1,2-diphenylethylene derivatives are bonded to a nanoparticle, a nanomolecule bonded to the derivative and a receptor bonded to the nanomolecule to form a nanosensor that can be used to detect chemical and biological agents.
    Type: Application
    Filed: July 13, 2007
    Publication date: May 6, 2010
    Inventors: Subra Muralidharan, Chun Wang
  • Publication number: 20100104973
    Abstract: There are provided a compound preferable as an acid generator for a resist composition, an acid generator including the compound, a resist composition containing the acid generator, and a method of forming a resist pattern using the resist composition, and the compound is represented by general formula (b1-12) shown below: R2—CH2—O—Y1—SO3?A+??(b1-12) wherein R2 represents a monovalent aromatic organic group; Y1 represents an alkylene group of 1 to 4 carbon atoms which may be fluorinated; and A+ represents a cation.
    Type: Application
    Filed: April 4, 2008
    Publication date: April 29, 2010
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehito Seo, Hideo Hada, Kotaro Endo, Daisuke Kawana, Yasuhiro Yoshii, Tsuyoshi Kurosawa
  • Publication number: 20100028745
    Abstract: A membrane-electrode assembly in a polymer electrolyte/proton exchange membrane fuel cell includes the electrodes (anode and cathode), with a thin layer of catalyzed conductive support particles bonded to either side of the membrane. Where the polymer membrane comprises pendant chains of fluorinated carbon atoms with mobile proton containing terminal groups, proton conductivity with the catalyst particles is improved by chemically attaching like pendant chains to carbon atoms at surfaces of carbon particles. In certain implementations, an amino aryl perfluorinated sulfonic acid precursor is prepared. This precursor is converted to an aryl diazonium cation in the presence of carbon particles. The diazonium cation is reduced to the aryl radical which reacts with carbon atoms of the carbon substrate.
    Type: Application
    Filed: July 10, 2007
    Publication date: February 4, 2010
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS, INC.
    Inventors: Tina T. Salguero, Elena Sherman, Ping Liu
  • Publication number: 20090171115
    Abstract: Disclosed is a method of preparing an ion dissociation functional molecule which is chemically and thermally stable under the operating conditions required in an electrochemical system such as a fuel cell and which is suitable for use as a material of, for example, a proton conductor used in a fuel cell, in a higher yield and more easily, more efficiently, more inexpensively and more safely, than by the existing art. In a second step of reacting AgOOCCF2SO2F with iodine to synthesize a raw material molecule ICF2SO2F, the reactants mixed in equimolar relation are reacted with each other at 110° C., which is higher than that in the existing art, to thereby enhance the production efficiency of the raw material molecule, then a mixed gas of the thus produced raw material molecule with carbon dioxide is pre-cooled in an exhaust passage kept at ?15° C., followed by trapping the raw material molecule by a trapping vessel cooled with dry ice, whereby the trapping efficiency for the raw material molecule is enhanced.
    Type: Application
    Filed: April 5, 2006
    Publication date: July 2, 2009
    Applicant: SONY CORPORATION
    Inventor: Yongming Li
  • Publication number: 20090004525
    Abstract: Disclosed herein are an ion-dissociative functional compound, a method for production thereof, an ionic conductor, and an electrochemical device, the ion-dissociative functional compound being thermally and chemically stable under the condition required of fuel cells and being suitable for use as a material such as protonic conductor in fuel cells. The proton-dissociative functional compound shown in FIG. 1A is composed of a fullerene C60 molecule and about 10 sulfonic acid groups —SO3H as proton-dissociative groups each attached to the fullerene through a difluoromethane group —CF2—. The proton-dissociative functional compound shown in FIG. 1B is composed of fullerene molecules three-dimensionally connected to each other through a linking group —CF2SO2NHSO2CF2—. It contains, as the proton-dissociative group, sulfoneimide groups —SO2NHSO2— and sulfoneamide groups —SO2H2 in addition to sulfonic acid groups.
    Type: Application
    Filed: August 4, 2004
    Publication date: January 1, 2009
    Inventors: Kazuaki Fukushima, Shuichi Takizawa, Koichiro Hinokuma, Atsushi Nishimoto, Kazuhiro Noda
  • Patent number: 7468360
    Abstract: Disclosed herein is a compound having a structure: Therapeutic methods, compositions, and medicaments relating thereto are also disclosed.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: December 23, 2008
    Assignee: Allergan, Inc.
    Inventors: David W. Old, Danny T. Dinh
  • Publication number: 20080220407
    Abstract: The presently described subject matter is directed to water-soluble conjugated polyene compounds that exhibit aggregation induced emission, as well as to water dispersible, fluorescent, polymeric microparticles and/or nanoparticles comprising the water-soluble conjugated polyene compounds. Also provided are methods of making and using the compounds and particles. The described conjugated polyene compounds are useful as bioprobes for the detection biomacromolecules, as well as in the manufacture of sensors.
    Type: Application
    Filed: December 10, 2007
    Publication date: September 11, 2008
    Applicant: The Hong Kong University of Science and Technology
    Inventors: Benzhong Tang, Yuning Hong, Matthias Haeussler, Hui Tong, Yonggiang Dong, Zhen Li, Changmin Xin
  • Publication number: 20080114183
    Abstract: The invention relates generally to monomers comprising superacidic functional groups. The superacidic functional groups comprise fluorinated sulfonate moieties. Monomers provided by the present invention include dihydroxy aromatic compounds, aromatic diamines, aromatic dicarboxylic acids, aromatic diacarboxylic acid esters, aromatic dithiols, and monomers comprising mixed functionalities, for example monomers comprising an aromatic amine group and an aromatic hydroxyl group. The monomers provided by the present invention are useful in the preparation of novel polymers comprising superacidic functional groups, materials useful in membrane applications. The superacidic functional groups present in the polymer compositions impart excellent proton conductivities. In one embodiment, the present invention provides monomers which may be used to prepare polymers useful as materials for polymer electrolyte fuel cell membranes.
    Type: Application
    Filed: November 14, 2006
    Publication date: May 15, 2008
    Applicant: General Electric Company
    Inventors: David Roger Moore, Hongyi Zhou, Daniel Joseph Brunelle, Joyce Hung, Hongwei Liu, Daniel Steiger
  • Patent number: 6852878
    Abstract: Thioketals and thioethers are provided that inhibit the expression of VCAM-1, and which can be used in the treatment of VCAM-1 mediated diseases including inflammatory disorders, cardiovascular diseases, occular diseases, autoimmune diseases, neurological disorders, and cancer. The compounds also can be used to treat hyperlipidemia and/or hypercholesterolemia.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: February 8, 2005
    Assignee: Atherogenics, Inc.
    Inventors: Charles Q. Meng, Lee K. Hoong, Patricia K. Somers
  • Patent number: 6271415
    Abstract: The invention relates to novel S-(4-biphenyl)-thiosulfuric acids and their salts, to a method for producing them from S-(4-biphenyl)-thiosulfinic acids and their salts, and to a method for producing 4-mercaptobiphenyls from the S-(4-biphenyl)-thiosulfuric acids and their salts.
    Type: Grant
    Filed: April 19, 2000
    Date of Patent: August 7, 2001
    Assignee: Bayer Aktiengesellschaft
    Inventors: Friedrich-Wilhelm Ullrich, Helmut Fiege, Wolfgang Eymann
  • Patent number: 6090850
    Abstract: A class of novel naphthyl glyoxamide compounds of formula (I) is disclosed together with a process for making the novel naphthyl glyoxamide compounds and the use of such compounds for inhibiting sPLA.sub.2 mediated release of fatty acids for treatment of conditions such as septic shock.
    Type: Grant
    Filed: June 9, 1998
    Date of Patent: July 18, 2000
    Assignee: Eli Lilly and Company
    Inventors: Theodore Goodson, Jr., David K. Herron
  • Patent number: 5962730
    Abstract: Sulfonyl compounds have the formula ##STR1## where n is 0, 1 or 2,Y is vinyl or a radical of the formula C.sub.2 H.sub.4 Q, where Q is hydroxyl or an alkali-detachable group,E is C.sub.3 -C.sub.6 -alkylene with or without interruption by 1 or 2 oxygen atoms in ether function,Ar is the radical of benzene or naphthalene, andR.sup.1, R.sup.2 and R.sup.3 are each hydrogen, unsubstituted or substituted C.sub.1 -C.sub.6 -alkyl, C.sub.1 -C.sub.6 -alkoxy, hydroxyl, halogen, nitro, amino, hydroxysulfonyl, carboxyl, carbamoyl, sulfamoyl, cyano or a radical of the formula (NH--).sub.m (CH.sub.2 --).sub.q SO.sub.2 --Y, where m is 0 or 1, q is 0, 2 or 3, and Y is as defined above.
    Type: Grant
    Filed: January 9, 1998
    Date of Patent: October 5, 1999
    Assignee: BASF Aktiengesellschaft
    Inventors: Claus Marschner, Manfred Patsch