Alicyclic Ring Containing Patents (Class 568/721)
-
Patent number: 12187662Abstract: Provided are compounds, or pharmaceutically acceptable salts thereof, which are useful for inhibiting FOXM1, inhibiting cancer growth, and/or treating cancer. In particular, these compounds and their corresponding quaternary ammonium salts may be used to treat various forms of breast cancer.Type: GrantFiled: April 9, 2019Date of Patent: January 7, 2025Assignee: The Board of Trustees of the University of IllinoisInventors: John A. Katzenellenbogen, Benita Katzenellenbogen, Sung Hoon Kim, Noah Bindman
-
Patent number: 10370489Abstract: The invention relates to aromatic polycarbonates which comprise dioxydiarylcycloalkane structural units, and which have improved optical and thermal properties. It also relates to an improved process to produce the said polycarbonates from dihydroxydiphenylcycloalkanes, and also to mixtures of these polycarbonates with polymers, with fillers, with dyes and with conventional additives.Type: GrantFiled: December 7, 2017Date of Patent: August 6, 2019Assignee: Covestro Deutschland AGInventors: Karl-Heinz Köhler, Franky Bruynseels
-
Patent number: 9868817Abstract: The invention relates to aromatic polycarbonates which comprise dioxydiarylcycloalkane structural units, and which have improved optical and thermal properties. It also relates to an improved process to produce the said polycarbonates from dihydroxydiphenylcyloalkanes, and also to mixtures of these polycarbonates with polymers, with fillers, with dyes and with conventional additives.Type: GrantFiled: April 8, 2011Date of Patent: January 16, 2018Assignee: Covestro Deutschland AGInventors: Karl-Heinz Köhler, Franky Bruynseels
-
Patent number: 9102596Abstract: In a method of manufacturing 4,4?-dihydroxy-m-terphenyl, a 2-cyclohexene-1-one or 3-hydroxycyclohexane-1-one, and phenol are used as materials, Step (A), Step (B), and Step (C) are implemented in this order, or Step (D) and Step (C) are implemented in this order: Step (A) to obtain a 1,1,3-trisphenol by causing the 2-cyclohexene-1-one or 3-hydroxycyclohexane-1-one and phenol to react with each other in the presence of a catalyst; Step (B) to obtain a bis(4-hydroxyphenyl)cyclohexene by causing the 1,1,3-trisphenol to undergo breakdown reaction; Step (C) to obtain a 4,4?-dihydroxy-m-terphenyl by dehydrogenating the bis(4-hydroxyphenyl)cyclohexene; Step (D) to obtain a bis(4-hydroxyphenyl)cyclohexene by causing the 2-cyclohexene-1-one or 3-hydroxycyclohexane-1-one and phenol to react with each other in the presence of a catalyst.Type: GrantFiled: May 14, 2013Date of Patent: August 11, 2015Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhito Ashida, Yuki Hashimoto, Tomoya Yamamoto, Xuwang Lu
-
Patent number: 8921613Abstract: Provided is a polynuclear poly(phenol)family represented by general formula (1). In general formula (1), R1s are each independently C1-8 alkyl group, C1-8 alkoxy group, an aromatic hydrocarbon group, or a C1-8 saturated hydrocarbon group having an aromatic hydrocarbon group; n is 0 or an integer of 1 to 3; X is a hydroxyphenyl group represented by general formula (2); and A is a tetravalent carbon atom group or a tetravalent saturated hydrocarbon group having two or more carbon atoms, with the proviso that when A is a tetravalent saturated hydrocarbon group having two or more carbon atoms, two carbon atoms in the A group are each bonded to two phenyl groups.Type: GrantFiled: December 15, 2010Date of Patent: December 30, 2014Assignee: Honshu Chemical Industry Co., Ltd.Inventor: Tatsuya Iwai
-
Patent number: 8846292Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.Type: GrantFiled: December 29, 2011Date of Patent: September 30, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
-
Patent number: 8173351Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.Type: GrantFiled: January 8, 2008Date of Patent: May 8, 2012Assignee: JSR CorporationInventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
-
Patent number: 7648816Abstract: A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.Type: GrantFiled: February 20, 2006Date of Patent: January 19, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Taku Hirayama, Hideo Hada
-
Patent number: 7622613Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.Type: GrantFiled: October 25, 2005Date of Patent: November 24, 2009Assignee: Showa Denko K.K.Inventors: Hirotoshi Kamata, Mina Onishi, Katsumi Murofushi
-
Patent number: 7015365Abstract: A process for forming a cycloalkylidene bisphenol comprises: reacting a cycloalkanone compound of formula: where [A] is a substituted or an unsubstituted aromatic group, R1–R4 independently represent a hydrogen or a C1–C12 hydrocarbyl group; and “a” and “b” are integers independently having values from 0–3; with an aromatic hydroxy compound of formula [A]-OH, where [A] is as previously described; at a mole ratio of greater than or equal to about 20, in the presence of a sulfonic acid type ion exchange resin catalyst crosslinked with greater than or equal to about 8 weight percent of divinylbenzene, and a promoter selected from the group consisting of a mercaptan compound and a resorcinol compound; to form a cycloalkylidene bisphenol of formula: where [A], R1–R4, “a” and “b” are as previously described. Moreover, any acid catalyst can be used with a resorcinol promoter.Type: GrantFiled: December 19, 2003Date of Patent: March 21, 2006Assignee: General Electric CompanyInventors: Debjani Kapila, Ramesh Krishnamurti, Jan-Pleun Lens, Gurram Kishan, Nileshkumar Kukalyekar, Jegadeesh Thampi, Umesh Krishna Hasyagar, Vinod Kumar Rai, Ashok S. Shyadligeri, Radhakrishna Sreenivasarao Arakali, Edward J. Nesakumar, Pramod Kumbhar
-
Patent number: 6992227Abstract: A process for production of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane which comprises reacting phenol with 3,3,5-trimethylcyclohexanone in the presence of an acid catalyst, separating the resulting phenol adduct crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane from the resulting reaction mixture, and removing the phenol from the phenol adduct crystals, wherein the phenol adduct crystals are dissolved in a crystallization solvent comprising an aromatic hydrocarbon solvent and water, crystallizing the crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane out of the crystallization solvent, and collecting the crystals by filtration at a temperature of 40–60° C.Type: GrantFiled: September 11, 2000Date of Patent: January 31, 2006Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
-
Patent number: 6972344Abstract: A method of producing 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane comprising: crystallizing a phenol adduct of 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane from a solution comprising 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane and phenol; washing the phenol adduct with a washing solution comprising phenol and water; decomposing by heating the washed phenol adduct in an aqueous solvent to remove phenol from the phenol adduct, thereby obtaining pure 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane.Type: GrantFiled: December 16, 2004Date of Patent: December 6, 2005Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhiko Yao, Kenji Ekawa
-
Patent number: 6906226Abstract: Hydroxymethyl-substituted polyfunctional phenols, expressed by the following structure: General structure (I) (wherein X represents: bivalent group (a) expressed by the following structure: General structure (II) (wherein R1, R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); quadrivalent group (b) expressed by the following structure: General structure (III) (wherein R5 and R6 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); or bivalent group (c) expressed by the following structure: General structure (IV) (wherein R7 and R8 each independently represent a hydrogen atom or a monofluoromethyl, difluoromethyl or trifluoromethyl group; however, R7 and R8 cannot be both hydrogen atoms); wherein n takes 2 when X is bivalent group (a), takes 4 when X is quadrivalent group (b), or takes 2 when X is bivalent group (c)).Type: GrantFiled: April 3, 2003Date of Patent: June 14, 2005Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuya Matsuishi, Takayuki Ohno, Taiichi Shiomi
-
Patent number: 6875896Abstract: A method for producing a high purity 1,1-bis(4-hydroxyphenyl)cyclohexane represented by the general formula (II), wherein R is a hydrogen atom or alkyl group, comprising the steps of: reacting cyclohexanone and a phenol represented by the general formula (I) in the presence of an acid catalyst; wherein R is the same as defined above, neutralizing the resultant reaction mixture with an alkali; primarily crystallizing and filtering a 1,1-bis(4-hydroxyphenyl)cyclohexane produced to obtain a primary crystallization filtrate; dissolving 100 parts by weight of the primary crystallization filtrate in a mixed solvent, which comprises 5 to 10 parts by weight of water and 100 to 200 parts by weight of a lower aliphatic ketone solvent, or 200 to 400 parts by weight of a lower aliphatic alcohol solvent; filtering the resulting solution through a zeta potential filter; and secondarily crystallizing and filtering the 1,1-bis(4-hydroxyphenyl)cyclohexane from the resulting filtrate in the presence of water.Type: GrantFiled: June 29, 2004Date of Patent: April 5, 2005Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhiko Yao, Tooru Nakaguchi, Kenji Ekawa
-
Patent number: 6872858Abstract: The invention provides a diphenol represented by the general formula (I) wherein X is a divalent cyclic hydrocarbon group selected from 1-cyclohexene-1,4-ylene group, 1,4-cyclohexylene group and p-phenylene group, R is an alkyl group of 1-4 carbon atoms, n is 0 or an integer of 1-3 when X is 1-cyclohexene-1,4-ylene group and an integer of 1-3 when X is 1,4-cyclohexylene group or p-phenylene group. The invention further provides a process for the production of the same.Type: GrantFiled: February 7, 2002Date of Patent: March 29, 2005Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kouji Muragaki, Tadashi Hiramine, Hiroyasu Ohno
-
Patent number: 6838584Abstract: The present invention relates to compounds and derivatives thereof, their synthesis, and their use as estrogen receptor modulators. The compounds of the instant invention are ligands for estrogen receptors and as such may be useful for treatment or prevention of a variety of conditions related to estrogen functioning including: bone loss, bone fractures, osteoporosis, cartilage degeneration, endometriosis, uterine fibroid disease, hot flashes, increased levels of LDL cholesterol, cardiovascular disease, impairment of cognitive functioning, cerebral degenerative disorders, restenosis, gynecomastia, vascular smooth muscle cell proliferation, obesity, incontinence, and cancer, in particular of the breast, uterus and prostate.Type: GrantFiled: May 6, 2002Date of Patent: January 4, 2005Assignee: Merck & Co., Inc.Inventors: Timothy Allen Blizzard, Milton Lloyd Hammond, Jerry Dwain Morgan, Ralph Troy Mosley
-
Patent number: 6746629Abstract: Coloring matters and filters for plasma display panels, which can effectively screen the neon emission radiated from plasma display panels. Squarylium compounds represented by the following formula (I): [in the formula (I), R is a halogen atom, an alkyl group which may have a substituent, an alkoxy group which may have a substituent, or an alkenyl group which may have a substituent, m is an integer of from 1 to 4, and n is an integer of from 0 to 4], and filters for plasma display panels, made by laminating layers containing these compounds with layers containing ultraviolet absorbers and, if necessary, providing additionally near infrared screening layers, antireflection layers and/or non-glare layers.Type: GrantFiled: September 4, 2001Date of Patent: June 8, 2004Assignee: Mitsubishi Chemical CorporationInventors: Tetsuo Ozawa, Tetsuo Murayama
-
Patent number: 6673975Abstract: The invention provides a process for production of high purity 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane (BPTMC) which comprises: (a) a reaction step wherein phenol is reacted with 3,3,5-trimethylcyclohexanone (TMC) in a slurry containing phenol adduct crystals of BPTMC in the presence of an acid catalyst; (b) a neutralization step wherein after the reaction, the resulting reaction mixture in the form of slurry is neutralized with an alkali while heating to convert the slurry to a solution; (c) a primary crystallization and filtration step wherein the resulting solution is cooled and the resulting phenol adduct crystals of BPTMC are collected by filtration; (d) a secondary crystallization and filtration step wherein the adduct crystals obtained in the primary crystallization and filtration step are heated in a crystallization solvent to dissolve the crystals therein to prepare a solution and then the solution is cooled to crystallize BPTMC out of the solution, followed by collecting the crystals ofType: GrantFiled: March 7, 2003Date of Patent: January 6, 2004Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
-
Patent number: 6673973Abstract: A process for production of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane which comprises reacting phenol with 3,3,5-trimethylcyclohexanone in the presence of an acid catalyst, adding an aqueous solution of an alkali to the resulting reaction mixture to neutralize it, removing a water phase from the thus neutralized reaction mixture, cooling the resulting oil phase to crystallize phenol adduct crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane while obtaining a primary crystallization filtrate, wherein the primary crystallization filtrate is heated to a temperature of 150-250° C. in the presence of an alkali catalyst in an inert gas atmosphere under a reduced pressure to thermally decompose 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane in the primary crystallization filtrate.Type: GrantFiled: March 6, 2003Date of Patent: January 6, 2004Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
-
Patent number: 6673974Abstract: A process for production of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane which comprises reacting phenol with 3,3,5-trimethylcyclohexanone in the presence of an acid catalyst wherein the reaction of phenol with 3,3,5-trimethylcyclohexanone is started in a slurry comprising phenol adduct crystals of 1,1-bis(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane and hydrated phenol in the presence of an acid catalyst, and then the reaction is continued in the slurry.Type: GrantFiled: March 6, 2003Date of Patent: January 6, 2004Assignee: Honshu Chemical Industry Co. Ltd.Inventors: Kazuhiko Yao, Kenji Ekawa, Yoichiro Isota, Toru Nakaguchi
-
Patent number: 6451879Abstract: A process for producing a phenolic resin of good hue, characterized by reacting a hydroxylated aromatic compound with an unsaturated cyclic hydrocarbon compound in the presence of both active hydrogen and a reducing metal compound with the aid of an acid catalyst, subsequently deactivating the catalyst, and then removing the catalyst, the metal compound, and the starting materials remaining unreacted; and a process for producing an epoxy resin which comprises a step of reacting the phenolic resin with an epihalohydrin. By these processes, a phenolic resin and an epoxy resin are obtained which each is colored little and has an excellent hue. These resins are useful as resins for electrically insulating materials, especially as resins for semiconductor encapsulation materials and for laminated plates.Type: GrantFiled: April 13, 2001Date of Patent: September 17, 2002Assignee: Nippon Petrochemicals Company, LimitedInventors: Satoshi Mori, Fumiaki Oshimi, Ryuichi Ueno
-
Patent number: 6407150Abstract: A process for producing phenol resin having good color tone, which process comprises reacting hydroxyl group-containing aromatic compound and unsaturated cyclic hydrocarbon under the condition that the moisture is 100 ppm or less and the concentration of Friedel-Crafts catalyst is 0.07 mass % or less in a reaction system and a process for producing epoxy resin having good color tone, which process comprises reacting the obtained phenol resin and epihalohydrin in the presence of base catalyst, removing remaining catalyst and further removing unreacted epihalohydrin.Type: GrantFiled: August 10, 2000Date of Patent: June 18, 2002Assignee: Nippon Petrochemicals Company, LimitedInventors: Satoshi Mori, Fumiaki Oshimi, Masato Hattori
-
Patent number: 6313355Abstract: Tetrabromobisphenol-A is produced in a bromination process where no bromine or only a very small proportion of bromine is fed to the reactor. In the process aqueous hydrobromic acid, is the sole source or a major source of the bromine. In the process there are at least three concurrent continuous feeds to the reactor. One is composed of bisphenol-A and/or underbrominated bisphenol-A and a water-miscible organic solvent. The second is gaseous hydrogen bromide or preferably, aqueous hydrobromic acid, and the third is aqueous hydrogen peroxide. Optionally a small additional continuous feed of bromine can be employed. The feeds are proportioned to maintain a liquid phase containing (i) from above about 15 to about 85 wt % water, based upon the amount of water and water-miscible organic solvent in such liquid phase, and (ii) an amount of unreacted bromine that is in excess over the stoichiometric amount theoretically required to convert the bisphenol-A and/or underbrominated bisphenol-A to tetrabromobisphenol-A.Type: GrantFiled: July 12, 2000Date of Patent: November 6, 2001Inventors: Thanikavelu Manimaran, Richard A. Holub, Randall S. Barton
-
Patent number: 6300527Abstract: This invention relates, inter alia, to a process for the production of tetrabromobisphenol-A by the bromination of bisphenol-A and/or underbrominated bisphenol-A, which process features: a water and water-miscible organic solvent reaction medium; a relatively high reaction temperature; and the presence, in the reaction medium, of both (i) excess unreacted Br2 during the feed of bisphenol-A to the reactor, and (ii) sufficient HBr to protect the tetrabromobisphenol-A produced against undesirable color formation. Tetrabromobisphenol-A precipitates from the reaction mass and is easily recovered. Product of high purity (97% or more) and very low color (APHA of 50 or less) can be produced, even when using large excesses of bromine in the reaction.Type: GrantFiled: July 12, 2000Date of Patent: October 9, 2001Assignee: Albemarle CorporationInventors: Thanikavelu Manimaran, Hassan Y. Elnagar, Richard A. Holub, Alvin E. Harkins, Jr., Bonnie G. McKinnie
-
Patent number: 6284931Abstract: A process for producing a 3,3,5-trimethylcyclohexylidenebisphenol, comprising pre-reacting a phenol (A), i.e., phenol whose 2- and 6-positions may be monosubstituted or disubstituted with an alkyl group having 1 to 4 carbon atoms, with 3,3,5-trimethylcyclohexanone (B) at a molar ratio ((A)/(B)) of 3 to 7 in the presence of an acid catalyst until 3,3,5-trimethylcyclohexanone (B) exhibits a degree of conversion of at least 90 mol %; adding the phenol (A) and/or an aromatic hydrocarbon (C) to the thus obtained reaction mixture; and post-reacting the resultant mixture. This process enables not only suppressing a rise of the viscosity of the reaction mixture but also obtaining the desired product at high yield. Therefore, this process is applicable to not only the productivity enhancement in batch processing but also a continuous reaction processing which has been regarded as being difficult.Type: GrantFiled: October 20, 1999Date of Patent: September 4, 2001Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Yoichiro Isota, Toru Nakaguchi, Hiroshi Takenaka, Kazuhiko Yao
-
Patent number: 6242641Abstract: The present invention relates to compounds selected from formula I wherein R1, R2, R3 and R4 are the same or different and represent hydrogen, C1, to C6-alkyl, C5 to C6-cycloalkyl, phenyl and halogen, m and n are the same or different and represent the 2, 3, 4 or 5, X, A and B represent carbon and Y1, Y2, Z1 and Z2 are the same or different and represent hydrogen, hydroxyl (OH), amino (NH2), isocyanato (NCO) or 4-hydroxyphenyl.Type: GrantFiled: March 22, 1999Date of Patent: June 5, 2001Assignee: Bayer AktiengesellschaftInventors: Manfred Jautelat, Carl Casser, Hanns-Peter Müller, Manfred Hajek
-
Patent number: 6015873Abstract: A polyphenol composition is provided comprising trisphenol represented by the following formula (I): ##STR1## wherein R is a methyl group, X is independently an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms or a halogen atom, and m and n are an integer of 0 to 2 which has an excellent balance between heat resistance and water resistance as a curing agent for epoxy resins.Type: GrantFiled: June 26, 1997Date of Patent: January 18, 2000Assignee: Shell Oil CompanyInventors: Mareki Miura, Yoshinobu Ohnuma
-
Patent number: 6002050Abstract: This invention relates to a process for the production of tetrabromobisphenol-A, which process features: a water and water miscible solvent reaction medium; a relatively high reaction temperature; and the presence, in the reaction medium, of unreacted Br.sub.2 during the feed of bisphenol-A to the reactor.Type: GrantFiled: September 8, 1998Date of Patent: December 14, 1999Assignee: Albemarle CorporationInventor: Bonnie G. McKinnie
-
Patent number: 5959159Abstract: A process for resolving racemic diesters of (R,S)(.+-.)-5-hydroxy-3-(4'-hydroxyphenyl)-1,1,3-trimethylindane is disclosed. The process utilizes a microbial enzyme derived from Chromobacterium viscosum to catalyze the enantioselective and regioselective hydrolysis of the (S)(-)-enantiomer of the racemic mixture to its corresponding monoester at a faster rate than the (R)(+)-enantiomer. A substantially pure (S)(-)-indane monoester is thereby formed, while the (R)(+)-indane diester remains unreacted. The (S)(-)-monoester and the (R)(+)-diester can then be hydrolyzed using conventional techniques to form optically active (R)(+)- and (S)(-)-5-hydroxy-3-(4'-hydroxyphenyl)-1,1,3-trimethylindane enantiomers for use as monomers in the synthesis of chiral polymers.Type: GrantFiled: October 24, 1997Date of Patent: September 28, 1999Assignee: Molecular OptoElectronics CorporationInventors: Romas Joseph Kazlauskas, Xiaoming Zhang
-
Patent number: 5932623Abstract: The present invention provides a fruit polyphenol obtained by subjecting unripe fruits of Rosaceae to pressing and/or extraction and then purifying the resulting juice or extract. The present invention further provides an antioxidant, a hypotensive agent, an antimutagenic agent, an antiallergic agent and an anticariogenic agent each comprising, as an effective component, a fruit polyphenol obtained by subjecting unripe fruits of Rosaceae to pressing and/or extraction and then purifying the resulting juice or extract. The fruit polyphenol of the present invention has various physiological activities, for example, an antioxidative activity, an ACE-inhibiting activity, an antimutagenic activity, a hyalulonidase-inhibiting activity and a GTase-inhibiting activity.Type: GrantFiled: November 9, 1995Date of Patent: August 3, 1999Assignee: The Nikka Whisky Distilling Co., Ltd.,Inventors: Masayuki Tanabe, Tomomasa Kanda, Akio Yanagida
-
Patent number: 5851837Abstract: A method for making bisphenol salt as the result of the reaction between bisphenol and an alkali metal hydroxide. The method comprising steps to obtain the anhydrous alkali metal bisphenoxide salt within about a 0.2 mol % stoichiometry relationship between bisphenol and alkali metal hydroxide. A method for determining stoichiometry error of a sample comprises determining variables and applying the variables to an equation to determine stoichiometry.Type: GrantFiled: February 6, 1997Date of Patent: December 22, 1998Assignee: General Electric CompanyInventors: Edward Brittain Stokes, Thomas Link Guggenheim, James Marshall Finan
-
Patent number: 5698600Abstract: The invention relates to the synthesis of bisphenols from monophenols and carbonyl compounds such as aldehydes and ketones with concentrated mineral acids such as hydrochloric acid and/or hydrogen chloride gas as acid catalysts and a mercaptan as cocatalyst, which is fixed by an ion-pair bond to a matrix insoluble in the reaction medium.Type: GrantFiled: October 15, 1996Date of Patent: December 16, 1997Assignee: Bayer AGInventors: Claus Wulff, Gerhard Fennhoff, Alfred Eitel
-
Patent number: 5545444Abstract: The present invention is to provide new diamino compounds useful for raw materials for production of liquid crystal aligning films that have excellent aligning properties and uniform and high pretilt angles over the whole display surface of wide substrates without afterimage phenomenons.Type: GrantFiled: June 6, 1995Date of Patent: August 13, 1996Assignee: Chisso CorporationInventors: Minoru Nakayama, Toshiya Sawai, Shizuo Murata
-
Patent number: 5493060Abstract: This invention provides a unique method of producing 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane ("BPTMC"). The disclosed method manufactures BPTMC from ketals and hemithioketals of 3,3,5-trimethylcyclohexanone ("TMC"). The reaction takes place in the presence of an acid catalyst, and optionally added co-catalysts. Additionally, applicants have disclosed a particularly useful method of manufacturing BPTMC from TMC and alcohol and/or thiol starting materials. These starting materials react to form the TMC ketal or thioketal materials. This method is particularly useful in that it allows recovery and recycling of the alcohol and/or thiol.Type: GrantFiled: September 16, 1994Date of Patent: February 20, 1996Assignee: Aristech Chemical CorporationInventors: Mark R. Rubino, Jeffrey S. Salek
-
Patent number: 5430195Abstract: The present invention is to provide new diamino compounds useful for raw materials for production of liquid crystal aligning films that have excellent aligning properties and uniform and high pretilt angles over the whole display surface of wide substrates without afterimage phenomenons.Type: GrantFiled: October 25, 1994Date of Patent: July 4, 1995Assignee: Chisso CorporationInventors: Minoru Nakayama, Toshiya Sawai, Shizuo Murata
-
Patent number: 5414126Abstract: The present invention is to provide new diamino compounds useful for raw materials for production of liquid crystal aligning films that have excellent aligning properties and uniform and high pretilt angles over the whole display surface of wide substrates without afterimage phenomenons.Type: GrantFiled: October 27, 1993Date of Patent: May 9, 1995Assignee: Chisso CorporationInventors: Minoru Nakayama, Toshiya Sawai, Shizuo Murata
-
Patent number: 5406003Abstract: A phenolic compound is provided which can be described by the formula ##STR1## in which Ar is a C.sub.6-20 aromatic moiety, L is a cyclohexanenorbornane linking moiety, L' is a divalent cycloaliphatic moiety, and each of m and n is a number within the range of 0 to about 10. Such phenols include the product of the addition reaction of phenol with a cyclohexenenorbornene compound such as 5-(3-cyclohexen-1-yl)bicyclo[2.2.1 ]hept-2-ene.Type: GrantFiled: August 25, 1994Date of Patent: April 11, 1995Assignee: Shell Oil CompanyInventors: Pen C. Wang, Donald R. Kelsey
-
Patent number: 5387725Abstract: Compounds having acidic protons and a molecular structure which can delocalize the electron density of the conjugate base (target compounds) are chlorinated by contacting such compounds with a perchloroalkane and aqueous base in the presence of a phase transfer catalyst which is an tetraalkylammonium hydroxide. Chlorinated products, preferably gem-dichloro compounds, are produced. The gem-dichloro compounds are useful for alkylation of aromatic compounds. For instance fluorene is chlorinated to form 9,9-dichlorofluorene which is reacted with such compounds as phenol or aniline to form such compounds as 9,9-bis(hydroxyphenyl)fluorene, 9,9-bis(aminophenyl)fluorene, or 9-aminophenyl-9-chlorofluorene.Type: GrantFiled: July 12, 1993Date of Patent: February 7, 1995Assignee: The Dow Chemical CompanyInventors: Marlin E. Walters, W. Frank Richey, Katherine S. Clement, Steven L. Brewster, Emmett L. Tasset, Paul M. Puckett, V. Rao Durvasula, Hong A. Nguyen
-
Patent number: 5382713Abstract: A phenolic compound is provided which can be described by the formula ##STR1## in which Ar is a C.sub.6-20 aromatic moiety, L is a cyclohexanenorbornane linking moiety, L' is a divalent cycloaliphatic moiety, and each of m and n is a number within the range of 0 to about 10. Such phenols include the product of the addition reaction of phenol with a cyclohexenenorbornene compound such as 5-(3-cyclohexen-1-yl)bicyclo[2.2.1]hept-2-ene.Type: GrantFiled: February 5, 1993Date of Patent: January 17, 1995Assignee: Shell Oil CompanyInventors: Pen C. Wang, Donald R. Kelsey
-
Patent number: 5349111Abstract: A novolac resin is prepared by reacting a phenolic compound, an aldehyde or a ketone, and a hydroxyl-substituted benzocyclobutene compound wherein the hydroxyl group is attached to an aromatic ring. The benzocyclobutenes are connected to the phenolic rings through an oxygen or oxyaryl bridge, or the cyclobutene is fused directly to a phenol ring. The novolac resin cures without evolution of volatiles and, when cured, provides a polymer which has a high glass transition temperature and which is essentially insoluble in organic solvents.Type: GrantFiled: April 23, 1993Date of Patent: September 20, 1994Assignee: The Dow Chemical CompanyInventor: Daniel M. Scheck
-
Patent number: 5344999Abstract: 1,3-Bis(4-hydroxyphenyl)-1,3-dialkylcyclohexanes, as illustrated by 1,3-bis(4-hydroxyphenyl)-1, 3-dimethylcyclohexane, may be prepared by the reaction of phenol with a 1,5-dialkyl-1,4-cyclohexadiene under acidic conditions. Polycarbonates prepared therefrom have high glass transition temperatures and are expected to be ductile.Type: GrantFiled: October 1, 1993Date of Patent: September 6, 1994Assignee: General Electric CompanyInventor: John C. Schmidhauser
-
Patent number: 5345001Abstract: An aqueous resol solution produced by an alkaline condensation of a phenolic compound with an aldehyde in a molar ratio of 1:1.5 to 2.5 with an alkali metal content of 1 to 5.0% by weight of the reaction solution, neutralizing the solution after the end of condensation at least partially with an aromatic hydroxy carboxylic acid at a temperature not greater than 50.degree. C. and then concentrating the reaction mixture which is readily dilutable with water.Type: GrantFiled: August 23, 1993Date of Patent: September 6, 1994Assignee: Rutgerswerke Aktiengesellschaft AGInventors: Stephan Schroter, Achim Hansen, Arno Gardziella, Peter Adolphs
-
Patent number: 5336752Abstract: A method is provided for producing a phenolic resin represented by the formula (I) ##STR1## wherein R.sup.1 is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, R.sup.2 is a divalent cyclic hydrocarbon residue having 5 to 18 carbon atoms, p is a number of from 0 to 10 and q is a number of 1 or 2. The method involves reacting a phenol with an unsaturated cyclic hydrocarbon compound having two or more carbon-carbon double bonding in the presence of an acid catalyst; and processing a resulting reaction product by a hydrotalcite compound represented by the formula (II)M.sub.1-x.sup.2+ M.sub.x.sup.3+ (OH).sub.2+x-ny A.sub.y.sup.n-.m(H.sub.2 O)(II)where M.sup.2+ is a divalent, magnesium ion, a divalent zinc ion, a divalent calcium ion, a divalent nickel ion, a divalent cobalt ion, a divalent manganese ion or a divalent copper ion, M.sup.3+ is a trivalent aluminum ion, a trivalent iron ion or a trivalent chromium ion, A.sup.n- is HCO.sub.3.sup.-, CO.sub.3.sup.2- or OH.sup.-, and x, y and m each are 0.Type: GrantFiled: January 28, 1993Date of Patent: August 9, 1994Assignee: Nippon Oil Co., Ltd.Inventors: Fumiaki Oshimi, Susumu Kubota, Masami Enomoto, Yutaka Otsuki
-
Patent number: 5336812Abstract: A process for making 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane via the acid catalyzed reaction of phenol and 3,3,5-trimethylcyclohexanone containing an organic thiol co-catalyst is described wherein the organic thiol is rejuvenated by treatment with a halogen acid and recycled to a fresh mixture of phenol and 3,3,5-trimethylcyclohexanone to make additional 1,1-bis-(4-hydroxyphenyl)-3,3,5-trimethylcyclohexane.Type: GrantFiled: November 12, 1993Date of Patent: August 9, 1994Assignee: Aristech Chemical CorporationInventors: Jeffrey S. Salek, Joseph Pugach, Mark R. Rubino
-
Patent number: 5283374Abstract: A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one compound of formula (I): ##STR1## wherein each R is individually selected from the group consisting of hydrogen and a lower alkyl group having 1-4 carbon atoms and each n is 0, 1, or 2; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.Type: GrantFiled: April 5, 1993Date of Patent: February 1, 1994Assignee: OCG Microelectronic Materials, Inc.Inventor: Alfred T. Jeffries, III
-
Patent number: 5281688Abstract: 1,3-Bis(4-hydroxyphenyl)-1,3-dialkylcyclohexanes, as illustrated by 1,3-bis(4-hydroxyphenyl)-1,3-dimethylcyclohexane, may be prepared by the reaction of phenol with a 1,5-dialkyl-1,4-cyclohexadiene under acidic conditions. Polycarbonates prepared therefrom have high glass transition temperatures and are expected to be ductile.Type: GrantFiled: December 11, 1992Date of Patent: January 25, 1994Assignee: General Electric CompanyInventor: John C. Schmidhauser
-
Patent number: 5276213Abstract: Dihydroxydiphenyl bicycloalkanes characterized in that they contain 9 to 13 ring C atoms in the bicycloaliphatic component are disclosed. The disclosed compounds were found to be suitable for the preparation of high molecular weight, thermoplastic polycarbonate resins having favorable properties.Type: GrantFiled: February 10, 1993Date of Patent: January 4, 1994Assignee: Bayer AktiengesellschaftInventors: Volker Serini, Uwe Westeppe, Gerd Fengler, Manfred Hajek, Carl Casser, Helmut Waldmann
-
Patent number: 5210328Abstract: This invention relates to a process for the preparation of substituted cycloalkylidene bisphenols from phenols and special cycloalkanones in the presence of acid condensation catalysts and in the presence of water.Type: GrantFiled: June 25, 1992Date of Patent: May 11, 1993Assignee: Bayer AktiengesellschaftInventors: Dieter Freitag, Claus H. Wulff, Alfred Eitel, Helmut Waldmann, Uwe Westeppe, Manfred Hajek, Klaus D. Berg, Bernd Griehsel, Carl Casser
-
Patent number: 5157164Abstract: This invention is addressed to antioxidants which are polymerizable using the Ziegler catalyst system. The antioxidant of the present invention has the formula: ##STR1## wherein R.sub.1 and R.sub.2 are each aryl groups containing a hindered antioxidant structure imparting antioxidant properties to the compounds. The compounds of the present invention are useful in the polymerization of olefin compounds using Ziegler catalyst systems whereby the antioxidant of the invention becomes chemically bound to the polymer while, at the same time, imparting antioxidant properties thereto.Type: GrantFiled: May 8, 1991Date of Patent: October 20, 1992Assignee: Copolymer Rubber & Chemical Corp.Inventor: Errol J. Olivier
-
Patent number: 5110993Abstract: 9,9-Bis(3,5-diphenyl-4-hydroxyphenyl)fluorene a novel compound can be used to produce amorphous poly(arylene ethers) which have high glass transition temperatures and good thermo-oxidative stability and which are soluble in aromatic and chlorinated solvents; the novel fluorene derivative is produced by transalkylation of 9,9-bis(4-hydroxyphenyl)fluorene or 9,9-bis(4-methoxyphenyl)fluorene with 2,6-diphenylphenol.Type: GrantFiled: February 8, 1991Date of Patent: May 5, 1992Inventors: Allan S. Hay, Zhi Y. Wang