Two Phenols Bonded Directly To The Same Carbon Patents (Class 568/722)
-
Patent number: 10442746Abstract: The present invention relates to an apparatus and a method for preparing bisphenol A, and provides an apparatus and a method for preparing bisphenol A that can increase the energy efficiency of the entire process by utilizing an internal heat source.Type: GrantFiled: November 21, 2016Date of Patent: October 15, 2019Assignee: LG CHEM, LTD.Inventors: Tae Woo Kim, Sung Kyu Lee, Joon Ho Shin
-
Patent number: 10113132Abstract: The invention provides a lubricating composition containing an oil of lubricating viscosity and an alkylene-coupled phenol compound for use in engines operated with biodiesel fuels or fuel blends containing biodiesel components. The invention further relates to methods of lubricating an internal combustion engine fueled with biodiesel by supplying the described lubricating composition to the internal combustion engine. The invention further relates to the use of the alkylene-coupled phenol compound to reduce corrosion and oxidative instability resulting from biodiesel introduction into the lubricant.Type: GrantFiled: October 31, 2013Date of Patent: October 30, 2018Assignee: The Lubrizol CorporationInventor: Yanshi Zhang
-
Patent number: 9371257Abstract: A method for the oxidative coupling of hydrocarbons includes providing an oxidative catalyst inside a reactor and carrying out the oxidative coupling reaction under a set of reaction conditions. The reactor surfaces that contact the reactants and products do not provide a significant detrimental catalyzing effect. In an embodiment the reactor contains an inert lining or a portion of the reactor inner surface is treated to reduce the detrimental catalytic effects. In an embodiment the reactor contains a lining that includes an oxidative catalyst.Type: GrantFiled: February 11, 2015Date of Patent: June 21, 2016Assignee: Fina Technology, Inc.Inventors: Sivadinarayana Chinta, Joseph L. Thorman
-
Patent number: 8969629Abstract: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.Type: GrantFiled: November 25, 2010Date of Patent: March 3, 2015Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada
-
Publication number: 20150011604Abstract: Compounds and their pharmaceutically acceptable salts for treatment of synucleinopathies, such as Parkinson's disease and tauopathies.Type: ApplicationFiled: September 15, 2014Publication date: January 8, 2015Applicant: ProteoTech Inc.Inventors: Esposito A Luke, Marisa C Yadon, Joel Cummings, F Michael Hudson, Thomas Lake, Qubai Hu, Judy Cam, Alan D. Snow
-
Patent number: 8846292Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.Type: GrantFiled: December 29, 2011Date of Patent: September 30, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
-
Patent number: 8816135Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.Type: GrantFiled: September 9, 2010Date of Patent: August 26, 2014Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Akira Yoshitomo, Shihoko Nakano
-
Patent number: 8748078Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.Type: GrantFiled: August 30, 2010Date of Patent: June 10, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
-
Macromolecular amine-phenolic antioxidant compositions, process technology thereof, and uses thereof
Patent number: 8455414Abstract: This invention relates to novel macromolecular amine-phenolic compositions having oxidation inhibition characteristics that are exhibited when added to organic material normally susceptible to oxidative degradation in the presence of air or oxygen, such as petroleum products, synthetic polymers, and elastomeric substances.Type: GrantFiled: October 17, 2007Date of Patent: June 4, 2013Assignee: Albemarle CorporationInventors: Mahmood Sabahi, Vincent J. Gatto, Hassan Y. Elnagar -
Patent number: 8350096Abstract: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.Type: GrantFiled: March 18, 2011Date of Patent: January 8, 2013Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
-
Publication number: 20120130009Abstract: Vulcanizates with desirable properties can be obtained from compounds incorporating polymers that include hydroxyl group-containing diphenylethylene-type functionalities. The functionalities can be incorporated by using any or all of appropriate initiators, monomers and optional terminating compounds. Such polymers exhibit excellent interactivity with both conventional and non-conventional fillers.Type: ApplicationFiled: June 30, 2010Publication date: May 24, 2012Inventors: Zengquan Qin, Yuan-Yong Yan, Xiao-Dong Pan
-
Patent number: 8173351Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.Type: GrantFiled: January 8, 2008Date of Patent: May 8, 2012Assignee: JSR CorporationInventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
-
Patent number: 8110334Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.Type: GrantFiled: November 1, 2007Date of Patent: February 7, 2012Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
-
Patent number: 7989666Abstract: The present invention discloses a method for preparing bisphenol A, comprising the following steps: transferring phenol and acetone into a reaction zone charged with condensation catalyst, obtaining a stream containing bisphenol A after reaction; transferring the obtained stream containing bisphenol A into a rectification zone, obtaining a product fraction primarily containing bisphenol A and phenol; and transferring the product fraction primarily containing bisphenol A and phenol into a crystallization zone to obtain a bisphenol A product; wherein a water-depleted fraction primarily containing phenol, bisphenol A and acetone is obtained from the rectification zone, and said water-depleted fraction is cooled and returned as a cycled stream to the reaction zone.Type: GrantFiled: September 24, 2004Date of Patent: August 2, 2011Assignee: China Petroleum & Chemical CorporationInventors: Dongyi Hong, Jidong Zhou, Jinlai Qin, Xuelei Li, Zhenwei Yao, Hongjiang Zhang, Cuiyun Liu, Weihua Fan
-
Patent number: 7943795Abstract: The present invention relates to novel, non-secosteroidal, phenyl-naphthalene compounds of Formula (I): wherein R, R1, RP, ZP, LP1, LP2 LNP, RP3, RN, and ZNP are defined herein, their preparation, pharmaceutical compositions, and methods of use.Type: GrantFiled: December 19, 2005Date of Patent: May 17, 2011Assignee: Eli Lilly and CompanyInventors: Lynn Stacy Gossett, Jose Eduardo Lopez, Alan M. Warshawsky, Ying Kwong Yee
-
Publication number: 20110098380Abstract: Epoxy resins and mixtures of polyphenolic compounds which comprise cycloaliphatic moieties, processes for the production thereof and mixtures and cured products which comprise these resins and/or mixtures.Type: ApplicationFiled: March 5, 2009Publication date: April 28, 2011Applicant: Dow Global Technologies Inc.Inventors: Robert L. Hearn, Marvin L. Dettloff, Fabio Aguirre Vargas, George Jacob
-
Patent number: 7932014Abstract: A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.Type: GrantFiled: February 14, 2008Date of Patent: April 26, 2011Assignee: Canon Kabushiki KaishaInventor: Toshiki Ito
-
Patent number: 7737310Abstract: A process for preparing biphenols of the general formula I by reaction of monophenols of the general formula II where the radicals R1, R2 and R3 are each, independently of one another, hydrogen, alkyl, aryl or arylalkyl having from 1 to 10 carbon atoms, in the presence of an oxidant in a reactor, wherein a) the reactor comprises no stationary internals which act as baffles, b) a total of not more than 0.6 mol of oxidant is used per one mol of monophenol, and c) the oxidant is introduced either continuously or discontinuously in a plurality of portions over a period of from 10 minutes to 24 hours, with the amount of oxidant introduced per unit time not being constant over the total period of time but instead being varied.Type: GrantFiled: April 5, 2006Date of Patent: June 15, 2010Assignee: BASF SEInventors: Michael Bartsch, Gerd Haderlein, Tobias Aechtner, Jens Scheidel, Christian Dienes, Alexander Tempel, Thorsten Hofrichter, Werner Weinle
-
Patent number: 7648816Abstract: A positive resist composition that includes a base material component (A) that contains an acid-dissociable, dissolution-inhibiting group and exhibits increased alkali solubility under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base material component (A) contains a compound (A1), in which either a portion of, or all of, the hydrogen atoms of phenolic hydroxyl groups within a polyhydric phenol compound with a molecular weight of 300 to 2,500 represented by a general formula (I) shown below have been substituted with at least one group selected from the group consisting of acid-dissociable, dissolution-inhibiting groups represented by a general formula (II) shown below and acid-dissociable, dissolution-inhibiting groups represented by a general formula (III) shown below.Type: GrantFiled: February 20, 2006Date of Patent: January 19, 2010Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Taku Hirayama, Hideo Hada
-
Patent number: 7601784Abstract: It is an object of the present invention to provide molecular compounds useful in the fields of state-of the-art materials, such as formulations, waste water treatments, energy transducers, conductors and bio-model reactions, in a way that interaction points and forces working inside polymer assemblies are fixed as well as controlled so that constituent polymers are aligned and modified. It is also an object of the present invention to provide methods for aligning and/or modifying polymers having hydrogen bond sites. A molecular compound is produced from a tetrakis aryl compound represented by Formula (I) (wherein, X is (CH2)n, or p-phenylene; n is 0, 1, 2 or 3; Y is hydroxyl, carboxyl or optionally substituted amino: and R1 and R2 are each hydrogen, lower alkyl, optionally substituted phenyl, halogen or lower alkoxy) and a polymer having hydrogen bond sites, such as polyethers, polyalcohols or polyamines.Type: GrantFiled: May 9, 2005Date of Patent: October 13, 2009Assignee: Nippon Soda Co., Ltd.Inventors: Hiroshi Suzuki, Satoru Abe
-
Patent number: 7586012Abstract: A process for recovering a solid adduct of a bis(4-hydroxyaryl)alkane and a phenolic compound from a suspension comprising the addict is disclosed. The process comprises the steps of a) supplying the suspension to a rotary filter, b) filtering the supplied suspension in the rotary filter to retain adduct as an adduct cake, c) pre-drying the adduct cake with an inert gas, d) washing the pre-dried adduct cake, e) optionally drying the washed adduct cake, and f) discharging the washed adduct cake from the rotary filter.Type: GrantFiled: January 16, 2004Date of Patent: September 8, 2009Inventors: Emil Patrascu, Johann-Wilhelm Frey, Manfred Hagel
-
Publication number: 20080194882Abstract: A process for producing a 2-benzylphenol compound represented by the following formula (2): wherein, R1, R2, R3 and R4 may be the same or different and are each independently hydrogen atom, alkyl group or the like; and R5, R6, R7, R8 and R9 are the same or different and are each independently hydrogen atom, alkyl group or the like, the process including reacting, in the presence of a dehydrogenating agent, a benzylidenecyclohexanone compound represented by the following formula (1) wherein, R1, R2, R3, R4, R5, R6, R7, R8 and R9 have the same definitions as given above).Type: ApplicationFiled: November 7, 2005Publication date: August 14, 2008Inventors: Kentaro Kawazoe, Yasuo Yoshida
-
Patent number: 7371902Abstract: Methods for purifying a p,p-bisphenol A generally include distilling a feed stream comprising p,p-BPA in a distillation column at a pressure less than or equal to 20 millibars. The distillation column separates the bisphenol feed stream to produce a light fraction, an intermediate fraction and a heavy fraction. The intermediate fraction comprising the purified bisphenol contains lesser impurities that the p,p-BPA in the feed stream. In one embodiment, the intermediate stream is recovered using a side-draw. The side-draw is located between a first zone and a third zone in the distillation column.Type: GrantFiled: September 29, 2004Date of Patent: May 13, 2008Assignee: General Electric CompanyInventors: Ramachandran Kumar, Gomatam Raghavan Ravi, Hyacinth Mary Bastian, Gururaj Sathyanarayana, Sheldon Jay Shafer, Kumar Krishna Ramamurthy, Dwijaraja Mouli Murukutla, Venkata Rama Narayanan Ganapathy Bhotla
-
Patent number: 7115785Abstract: Disclosed is a method for preparing an alkali metal salt of a hydroxy-substituted hydrocarbon which comprises the steps of (i) contacting in solvent media at least one hydroxy-substituted hydrocarbon with a base comprising an alkali metal cation; and (ii) devolatilizing the solvent media comprising alkali metal salt by adding or spraying the solvent media into a substantially water-immiscible organic solvent, said solvent being at a temperature greater than the boiling point of solvent media at the prevailing pressure. In one embodiment the solvent media comprises water, and optionally at least one water-soluble protic organic solvent.Type: GrantFiled: August 25, 2003Date of Patent: October 3, 2006Assignee: General Electric CompanyInventors: Thomas Link Guggenheim, Daniel Joseph Brunelle, David Winfield Woodruff, Lee Harris Bergman, Norman Enoch Johnson, Matthew Hal Littlejohn, Farid Fouad Khouri
-
Patent number: 7087799Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers. An amino group containing phenol derivative of the present invention is represented by a general formula (1) show below, and the present invention also provides a polyimide precursor produced using such an amino group containing phenol derivative. (wherein, R1, R2 and R3, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, a COOR group (in which R represents an alkyl group of 1 to 6 carbon atoms) or a hydrogen atom; R4 and R5, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms or a hydrogen atom; X represents —O—, —S—, —SO2—, —C(CH3)2—, —CH2—, —C(CH3)(C2H5)—, or —C(CF3)2—; and n represents an integer of 1 or greater).Type: GrantFiled: January 31, 2003Date of Patent: August 8, 2006Assignee: Gun Ei Chemical Industry Co., Ltd.Inventors: Takeshi Tsuihiji, Michiyasu Yamazaki
-
Patent number: 7078556Abstract: The invention relates to new antibiotics designated Cyan-416A, Cyan 416B, Cyan-416C, Cyan-416D and Cyan-416E to their production by fermentation of Acremonium sp. NRRL 30631 to methods for recovery and concentration from the crude solutions, and to a process for purification and to semisynthetic ethers of Cyan-416B.Type: GrantFiled: December 16, 2005Date of Patent: July 18, 2006Assignee: Wyeth Holdings CorporationInventors: Haiyin He, Ramunas Bigelis
-
Patent number: 7067704Abstract: Bisphenol-A is purified in a process which comprises the following steps: a) cooling a liquid mixture comprising bisphenol-A and water in a bisphenol-A crystallizer to form bisphenol-A crystals in a liquid phase; b) separating the bisphenol-A crystals from the liquid phase; c) dividing at least a portion of the liquid phase into a bisphenol-rich organic phase and a water-rich phase; d) feeding phenol and at least a portion of the bisphenol-rich organic phase into a adduct crystallizer to form a crystalline adduct of phenol and bisphenol-A in a mother liquor, and e) separating the crystalline adduct from the mother liquor. Bisphenol-A of high purity at a high yield is obtained.Type: GrantFiled: November 12, 2003Date of Patent: June 27, 2006Assignee: Dow Global Technologies Inc.Inventors: Thomas C. Young, Damian M. Feord, Johann-Wilhelm Frey
-
Patent number: 6960641Abstract: A method of preparing block copolymers by solid state polymerization is described. A mixture of a partially crystalline polycarbonate having activated terminal aryloxy groups, for example terminal methyl salicyl groups, when heated together with an oligomeric polyester having reactive terminal hydroxy groups under solid state polymerization conditions affords block copolymers. The activated terminal aryloxy groups play a key role in preserving the block lengths of the starting materials. A control sample in which the partially crystalline polycarbonate lacks activated terminal aryloxy groups, for example polycarbonates substituted by phenol, affords a much lower molecular weight, more highly randomized copolymer product. The product block copolymers are useful as “weatherable” plastic materials.Type: GrantFiled: December 22, 2003Date of Patent: November 1, 2005Assignee: General Electric CompanyInventors: Gregory Allen O'Neil, James Day, Daniel Joseph Brunelle, Joseph Anthony Suriano, Patrick Joseph McCloskey, Paul Michael Smigelski, Jr.
-
Patent number: 6784228Abstract: The present invention relates to an epoxy resin composition a cure article thereof, a novel epoxy resin used therein, a polyhydric phenol compound suited for used as an intermediate thereof, and a process for preparing the same. One of the objects to be achieved by the present invention is to exert the heat resistance, the moisture resistance, the dielectric performances and the flame-resistant effect required of electric or electronic materials such as semiconductor encapsulating materials and varnishes for circuit boards in the epoxy resin composition.Type: GrantFiled: July 9, 2002Date of Patent: August 31, 2004Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Ichiro Ogura, Yoshiyuki Takahashi, Tomoyuki Imada
-
Patent number: 6620939Abstract: This disclosure relates to a method for producing and using catalysts in the production of bisphenols, and in particular to a method for producing catalysts which contain poly-sulfur mercaptan promoters, and using these catalysts in the production of bisphenol-A and its derivatives.Type: GrantFiled: September 18, 2001Date of Patent: September 16, 2003Assignee: General Electric CompanyInventors: Jimmy Lynn Webb, James Lawrence Spivack
-
Patent number: 6600004Abstract: A method of preparing polyestercarbonates is presented in which a mixture of at least one activated diaryl carbonate is reacted under melt polymerization conditions with at least one aromatic dihydroxy compound together with at least one dicarboxylic acid. Polyestercarbonates possessing up to about percent 10 mole dicarboxylic acid residues based on the total amount of structural units derived from aromatic dihydroxy compounds are obtained. The method provides both for high levels of incorporation of the dicarboxylic acid into the polyestercarbonate backbone and a high level of polymer endcapping.Type: GrantFiled: April 10, 2002Date of Patent: July 29, 2003Assignee: General Electric CompanyInventors: Patrick Joseph McCloskey, Paul Michael Smigelski
-
Publication number: 20030028055Abstract: The present invention is a high-quality bisphenol A wherein the content of sodium is not more than 80 ppb and the content of each element of the group A consisting of iron, nickel, chromium, manganese, lead, and molybdenum is not more than 50 ppb, or a high-quality bisphenol A containing an organic compound such as 9,9′-dimethylxanthene, 2-(4-hydroxyphenyl)-2,4,4-trimethylchroman, 2,2,4-trimethyl-chromene, etc., in an amount of lower than a specific amount, and a preparation process of these high-quality bisphenol A. When an aromatic polycarbonate is prepared using the high-quality bisphenol of the invention, an aromatic polycarbonate which is not colored at the preparation thereof and molding the polycarbonate.Type: ApplicationFiled: August 2, 2001Publication date: February 6, 2003Inventors: Hideaki Nakamura, Masamitsu Inomata, Toshizumi Miura
-
Publication number: 20020142923Abstract: Hindered tert-butylphenolic antioxidant compositions characterized by a low level of volatile and undesirable single-ring tert-butylphenolic antioxidants and a high level of non-volatile multi-ring (or methylene bridged) tert-butylphenolic antioxidants are obtained by reacting a specific mixture of ultra pure ortho-tert-butylphenol (OTBP), ultra pure 2,6-di-tert-butylphenol (DTBP) and formaldehyde in a solvent in the presence of catalyst. These antioxidants are further characterized by having a low level of 2,6-di-tert-butylphenol, low levels of ortho-tert-butylphenol, and trace levels of 2,4,6-tri-tert-butylphenol.Type: ApplicationFiled: March 8, 2002Publication date: October 3, 2002Inventor: Vincent J. Gatto
-
Patent number: 6433236Abstract: A substituted diaryl compound or a mixture of substituted diaryl compounds, such as dimethylbiaryl compounds are isomerized by treatment with a strong acid or mixtures of strong acids in the absence of any additional catalyst. The strong acid or mixture of acids has a Hammett acidity of less than about −12.6. The isomerization reaction conditions such as reaction temperature, amount of acid, and amount of solvent can be adjusted to selectively produce desired isomers in high yields. One or more desired isomers may be produced in high yields by isomerization of substituted diaryl compounds and selectively removing one or more desired isomers from the resulting equilibrium mixture of isomers. The isomer mixture may be re-isomerized subsequent to selective removal of the desired isomer to produce additional amounts of desired isomer.Type: GrantFiled: March 21, 2000Date of Patent: August 13, 2002Assignee: Arteva North America S.A.R.L.Inventors: David Anthony Schiraldi, Alexei Viktorovich Iretski, Sheldon Christopher Sherman, Laren Malcolm Tolbert, Mark Gilmore White
-
Patent number: 6414106Abstract: The present invention relates to a method of neutralizing residual acid species in crude dihydric phenol comprising the step of introducing a thermally stable organic base selected from the group consisting of tetraalkyl phosphonium hydroxides, tetraorganophosphonium carboxylic acid salts, or a mixture thereof into the crude dihydric phenol.Type: GrantFiled: March 2, 2001Date of Patent: July 2, 2002Assignee: General Electric CompanyInventors: Paul Michael Smigelski, Jr., Timothy Brydon Burnell, Patrick Joseph McCloskey
-
Patent number: 6384288Abstract: A process for producing bis(4-hydroxyaryl)alkane is disclosed. The process comprise in sequence the steps of (a) passing inert gas through a melt at 150 to 230° C. that contains bis(4-hydroxyaryl)alkane and other aromatic hydroxy compounds, under conditions designed to remove said other aromatic hydroxy compounds from said melt and to obtain a stream of inert gas that contains said other aromatic hydroxy compounds (b) condensing the stream obtained in (a) to remove said other aromatic hydroxy compound, and to obtain a stream of inert gas, and (c) purifying and compressing the stream of inert gas obtained in (b), and recycling to step (a).Type: GrantFiled: April 16, 2001Date of Patent: May 7, 2002Assignee: Bayer AktiengesellschaftInventors: Steffen Kühling, Rolf Lanze, Rainer Neumann, Frieder Heydenreich, Tony van Osselaer
-
Publication number: 20020045726Abstract: The present invention relates to a method for avoiding undesirable discoloration in polycarbonate production by catalytic removal of dissolved oxygen from phenol byType: ApplicationFiled: February 5, 2001Publication date: April 18, 2002Inventors: Frieder Heydenreich, Rudolf Wagner, Michael Bodiger
-
Patent number: 6316677Abstract: A process for the production of a bisphenol compound comprising: a step for reacting a phenolic compound (a) with at least one compound (b) selected from the group consisting of dialkenylbenzene compounds, bis(hydroxyalkyl)benzene compounds and (hydroxyalkyl)-alkenylbenzene compounds or at least one compound (c) selected from the group consisting of monoalkenylphenolic compounds and mono(hydroxyalkyl)phenolic compounds in the presence of an acidic catalyst to obtain a reaction mixture containing said bisphenol compound, a step for neutralizing the reaction mixture with an anion exchange resin, a step for removing a remaining phenolic compound from the reaction mixture to concentrate the neutralized reaction mixture, and a step for isolating the bisphenol compound from the resulting concentrated mixture. This process enables to produce a bisphenol compound, which is useful for preparing raw materials of thermoplastic polymers, surface-active agents and stabilizers.Type: GrantFiled: March 16, 1999Date of Patent: November 13, 2001Assignee: Mitsui Chemicals, Inc.Inventors: Masahiro Enna, Naoshi Nagai, Toshiyuki Isaka
-
Patent number: 6313355Abstract: Tetrabromobisphenol-A is produced in a bromination process where no bromine or only a very small proportion of bromine is fed to the reactor. In the process aqueous hydrobromic acid, is the sole source or a major source of the bromine. In the process there are at least three concurrent continuous feeds to the reactor. One is composed of bisphenol-A and/or underbrominated bisphenol-A and a water-miscible organic solvent. The second is gaseous hydrogen bromide or preferably, aqueous hydrobromic acid, and the third is aqueous hydrogen peroxide. Optionally a small additional continuous feed of bromine can be employed. The feeds are proportioned to maintain a liquid phase containing (i) from above about 15 to about 85 wt % water, based upon the amount of water and water-miscible organic solvent in such liquid phase, and (ii) an amount of unreacted bromine that is in excess over the stoichiometric amount theoretically required to convert the bisphenol-A and/or underbrominated bisphenol-A to tetrabromobisphenol-A.Type: GrantFiled: July 12, 2000Date of Patent: November 6, 2001Inventors: Thanikavelu Manimaran, Richard A. Holub, Randall S. Barton
-
Patent number: 6300527Abstract: This invention relates, inter alia, to a process for the production of tetrabromobisphenol-A by the bromination of bisphenol-A and/or underbrominated bisphenol-A, which process features: a water and water-miscible organic solvent reaction medium; a relatively high reaction temperature; and the presence, in the reaction medium, of both (i) excess unreacted Br2 during the feed of bisphenol-A to the reactor, and (ii) sufficient HBr to protect the tetrabromobisphenol-A produced against undesirable color formation. Tetrabromobisphenol-A precipitates from the reaction mass and is easily recovered. Product of high purity (97% or more) and very low color (APHA of 50 or less) can be produced, even when using large excesses of bromine in the reaction.Type: GrantFiled: July 12, 2000Date of Patent: October 9, 2001Assignee: Albemarle CorporationInventors: Thanikavelu Manimaran, Hassan Y. Elnagar, Richard A. Holub, Alvin E. Harkins, Jr., Bonnie G. McKinnie
-
Publication number: 20010020116Abstract: There is disclosed an improved process for the preparation of a compound of the formula I 1Type: ApplicationFiled: January 5, 2001Publication date: September 6, 2001Inventors: Fabio Pizzoli, Reto Luisoli, Gerrit Knobloch, Hans-Rudolf Meier
-
Patent number: 6162953Abstract: This invention relates to a process for the production of tetrabromobisphenol-A by the bromination of bisphenol-A, which process features the addition of bisphenol-A to a reaction mass containing unreacted Br.sub.2 and 30 to 85 wt % water and an alcohol solvent, the reaction mass being at a relatively high temperature.Type: GrantFiled: September 28, 1999Date of Patent: December 19, 2000Assignee: Albemarle CorporationInventors: Bonnie G. McKinnie, Richard A. Holub, Hassan Y. Elnagar
-
Patent number: 6147169Abstract: A curable coating composition comprising (A) a functional group-containing base resin and (B) a clathrate compound consisting of (i) at least one guest compound selected from the group consisting of a curing agent having a functional group crosslinkable with the functional group of the base resin and a curing catalyst, and (ii) a host compound consisting of tetrakisphenols.Type: GrantFiled: March 25, 1998Date of Patent: November 14, 2000Assignee: Kansai Paint Co., Ltd.Inventor: Kazuhiko Ohnishi
-
Patent number: 6118029Abstract: A batch or continuous process produces highly pure 3,3',5,5'-tetra-t-butylbiphenol suitable as a starting material for the synthesis of 4,4'-biphenol. The process for producing 3,3',5,5'-tetra-t-butylbiphenol comprises conducting an oxidation coupling of purified 2,6-di-t-butylphenol(i) or crude 2,6-di-t-butylbiphenol(ii), said crude 2,6-di-t-butylphenol being obtained by reacting isobutylene with phenol in the presence of an aluminum catalyst, and removing the aluminum catalyst. The 2,6-di-t-butylphenol is oxidatively coupled in an alkali metal catalyst mixture comprising (1) an alkali metal catalyst and alkylphenols, or (2) alkali metal catalyst, alkylphenols and phenol to produce 3,3',5,5'-tetra-t-butylbiphenol. The oxidative coupling is conducted together with 10-30% by weight of phenol and/or t-butylphenol per 100% by weight of 2,6-di-t-butylphenol in the presence of an alkali metal catalyst.Type: GrantFiled: January 30, 1998Date of Patent: September 12, 2000Assignee: Honshu Chemical Industry Co., Ltd.Inventors: Yoichiro Isota, Kazuhiko Yao, Mikio Kawahara
-
Patent number: 6084136Abstract: This invention relates to a process for the production of tetrabromobisphenol-A by the bromination of bisphenol-A, which process features: (a) feeding to a reaction mass (i) bisphenol-A and (ii) a stream of gaseous bromine, the gaseous stream having a Reynold's No. .gtoreq.40,000; (b) the reaction mass containing from about 50 to about 20,000 ppm unreacted bromine and less than 20 wt % HBr; and (c) the reaction mass having precipitated therefrom tetrabromobisphenol-A, all of (a)(ii), (b) and (c) occurring during the bisphenol-A feed.Type: GrantFiled: June 11, 1998Date of Patent: July 4, 2000Assignee: Albmarle CorporationInventors: Richard A. Holub, Steven R. Alferi, Bonnie G. McKinnie, Hassan Y. Elnagar
-
Patent number: 6084137Abstract: This invention relates to a process for the production of tetrabromobisphenol-A by the bromination of bisphenol-A, which process features the addition of bisphenol-A to a reaction mass containing unreacted Br.sub.2 and 30 to 85 wt. % water and an alcohol solvent, the reaction mass being at a relatively high temperature.Type: GrantFiled: October 21, 1997Date of Patent: July 4, 2000Assignee: Albemarle CorporationInventors: Bonnie G. McKinnie, Richard A. Holub, Hassan Y. Elnagar
-
Patent number: 6011184Abstract: An integrated process for the preparation and recovery of BPA in pure form utilizes a series of steps to crystallize the 1:1 adduct of phenol and bisphenol-A, with periodic descaling of the crystallizer surfaces with a modified reactor/crystallizer containing 1 to 40 percent water.Type: GrantFiled: April 6, 1998Date of Patent: January 4, 2000Assignee: General Electric CompanyInventors: Johan Adrianus Aarssen, Gerrit Op Den Dries, Ad Nieuwlaat, Marcel Vieveen, Rudy Francois Alain Joseph Peemans
-
Patent number: 6002051Abstract: Novel compounds of the general formula ##STR1## wherein each R.sub.1 is independently a tertiary alkyl group containing from 4 to about 8 carbon atoms and each of X, Y and Z is independently hydrogen or a hydrocarbon-based group, provided at least one of X, Y and Z is an aliphatic hydrocarbon group containing at least 7 carbon atoms, and wherein R.sub.1 is different from the at least one of X, Y and Z that is an aliphatic hydrocarbon group containing at least 7 carbon atoms, R.sub.2 is an alkylene or alkylidene group, and n is a number ranging from zero to about 4. Also disclosed are methods for preparing novel phenolic compounds, organic compositions, including lubricants based on oils of lubricating viscosity and fuels based on normally liquid fuels and additive concentrates containing the novel phenolic compounds of this invention.Type: GrantFiled: October 16, 1992Date of Patent: December 14, 1999Assignee: The Lubrizol CorporationInventors: Louis Burjes, Calvin W. Schroeck
-
Patent number: 6002050Abstract: This invention relates to a process for the production of tetrabromobisphenol-A, which process features: a water and water miscible solvent reaction medium; a relatively high reaction temperature; and the presence, in the reaction medium, of unreacted Br.sub.2 during the feed of bisphenol-A to the reactor.Type: GrantFiled: September 8, 1998Date of Patent: December 14, 1999Assignee: Albemarle CorporationInventor: Bonnie G. McKinnie
-
Patent number: 5959158Abstract: Methods/systems for making a relatively high-purity bisphenol A product from phenol and acetone. Controlled turbulence is used to form bisphenol A adduct solids having improved physical properties. Phenol is separated from the bisphenol A product while inhibiting decomposition of bisphenol A.Type: GrantFiled: April 15, 1996Date of Patent: September 28, 1999Inventor: Ben Gammill