Identical Phenols Patents (Class 568/723)
  • Patent number: 9950979
    Abstract: A process for preparing unsymmetric biphenols, comprising: a) adding a first substituted phenol to the reaction mixture; b) adding a second substituted phenol having different substitution than the first phenol to the reaction mixture; c) adding selenium dioxide to the reaction mixture; d) adding a solvent; and e) heating the reaction mixture such that the first substituted phenol and the second phenol having different substitution are converted to an unsymmetric biphenol.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: April 24, 2018
    Assignee: Evonik Degussa GmbH
    Inventors: Katrin Marie Dyballa, Robert Franke, Dirk Fridag, Michael Mirion, Thomas Quell, Siegfried R. Waldvogel
  • Patent number: 9517986
    Abstract: A process for preparing a 2,2?-biphenol, proceeds by a) adding a first phenol to a reaction mixture, b) adding a second phenol to the reaction mixture, c) adding selenium dioxide to the reaction mixture, d) adding an acid having a pKa in the range from 0.0 to 5.0 to the reaction mixture, and e) heating the reaction mixture such that the first phenol and the second phenol are converted to said 2,2?-biphenol.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: December 13, 2016
    Assignee: Evonik Degussa GmbH
    Inventors: Katrin Marie Dyballa, Robert Franke, Dirk Fridag, Siegfried R. Waldvogel, Thomas Quell, Michael Mirion
  • Patent number: 9454076
    Abstract: The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: September 27, 2016
    Assignee: INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES
    Inventors: Guoqiang Yang, Jian Xu, Li Chen, Shuangqing Wang, Shayu Li
  • Publication number: 20150105531
    Abstract: A method for recovering a dihydroxy aromatic compound and urea from a polycarbonate-containing composition comprising a polycarbonate and a phosphorus-containing flame retardant, comprising contacting the composition with ammonia in the presence of a swelling solvent for a time sufficient to depolymerize the polycarbonate producing a dihydroxy aromatic compound and urea.
    Type: Application
    Filed: October 15, 2013
    Publication date: April 16, 2015
    Inventors: Alexander Stanislaus, Venkata Ramanarayanan Ganapathy Bhotla, PS Sreenivasan, Philip Wesley Bell
  • Patent number: 8969629
    Abstract: Disclosed are: a cyclic compound which has high solubility in a safe solvent, is highly sensitive, enables the formation of a resist pattern having a good shape, and rarely causes resist pattern collapse; a process for producing the cyclic compound; a radiation-sensitive composition containing the cyclic compound; and a resist pattern formation method using the composition. Specifically disclosed are: a cyclic compound having a specific structure; a process for producing the cyclic compound; a radiation-sensitive composition containing the compound; and a resist pattern formation method using the composition.
    Type: Grant
    Filed: November 25, 2010
    Date of Patent: March 3, 2015
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masaaki Takasuka, Masatoshi Echigo, Yu Okada
  • Patent number: 8846292
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: September 30, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Patent number: 8835686
    Abstract: A method, an apparatus and an article of manufacture for attracting charged nanoparticles using a graphene nanomesh. The method includes creating a graphene nanomesh by generating multiple holes in graphene, wherein each of the multiple holes is of a size appropriate to a targeted charged nanoparticle, selectively passivating the multiple holes of the graphene nanomesh to form a charged ring in the graphene nanomesh by treating the graphene nanomesh with chemistry yielding a trap with an opposite charge to that of the targeted nanoparticle, and electrostatically attracting the target charged nanoparticle to the oppositely charged ring to facilitate docking of the charged nanoparticle to the graphene nanomesh.
    Type: Grant
    Filed: November 22, 2011
    Date of Patent: September 16, 2014
    Assignee: International Business Machines Corporation
    Inventors: Ali Afzali-Ardakani, Ahmed Maarouf, Glenn J. Martyna
  • Patent number: 8829192
    Abstract: Described is the use of specific merocyanine derivatives for protecting body-care and household products from photolytic and oxidative degradation. These compounds perform outstanding UV absorber properties.
    Type: Grant
    Filed: July 19, 2006
    Date of Patent: September 9, 2014
    Assignee: BASF SE
    Inventors: Barbara Wagner, Oliver Reich
  • Patent number: 8748078
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: June 10, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
  • Patent number: 8709166
    Abstract: Methods for extracting bisphenols from polymer substrates are described. The methods include contacting the polymer substrate with an aqueous composition which includes a phase transfer agent, a base and optionally an oxidant, whereby the bisphenol is extracted into the aqueous composition. Suitable phase transfer agents are delineated. Also described are compositions which can be used in the present methods.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: April 29, 2014
    Assignee: Empire Technology Development LLC
    Inventor: Kraig Anderson
  • Publication number: 20140051803
    Abstract: A modified ion exchange resin catalyst having an attached dimethyl thiazolidine promoter is disclosed. Also disclosed is a process for catalyzing condensation reactions between phenols and ketones, wherein reactants are contacted with a modified ion exchange resin catalyst having an attached dimethyl thiazolidine promoter. Also disclosed is a process for catalyzing condensation reactions between phenols and ketones that does not utilize a bulk promoter.
    Type: Application
    Filed: May 2, 2012
    Publication date: February 20, 2014
    Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
    Inventors: Johannes De Brouwer, Paulus Johannes Maria Eijsbouts
  • Publication number: 20140051802
    Abstract: Methods for performing a condensation reaction are disclosed. Specifically, various methods for the production of highly-pure bisphenol-A are disclosed in which an attached promoter ion exchange resin catalyst system is combined with a solvent crystallization step.
    Type: Application
    Filed: May 2, 2012
    Publication date: February 20, 2014
    Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
    Inventors: Johannes De Brouwer, Paulus Johannes Maria Eijsbouts
  • Publication number: 20130211036
    Abstract: A process for oxidizing a composition comprising contacting an alkylbenzene of the general formula (I): where R1 and R2 each independently represents hydrogen or an alkyl group having from 1 to 4 carbon atoms, wherein R1 and R2 may be joined to form a cyclic group having from 4 to 10 carbon atoms, the cyclic group being optionally substituted, and R3 represents hydrogen, one or more alkyl groups having from 1 to 4 carbon atoms or a cyclohexyl group; and (ii) about 0.05 wt % to about 5 wt % of phenol, with oxygen in the presence of a catalyst containing a cyclic imide having the general formula (II): wherein X represents an oxygen atom, a hydroxyl group, or an acyloxy group under conditions effective to convert at least a portion of the alkylbenzene to a hydroperoxide.
    Type: Application
    Filed: August 16, 2011
    Publication date: August 15, 2013
    Applicant: ExxonMobil Chemical Company - Law Technology
    Inventors: Jihad M. Dakka, Edmund J. Mozeleski, Charles Morris Smith, Christopher L. Becker, Stephen Zushma
  • Publication number: 20130172514
    Abstract: In a process for producing a cycloalkylaromatic compound, an aromatic compound, hydrogen and at least one diluent are supplied to a hydroalkylation reaction zone, such that the weight ratio of the diluent to the aromatic compound supplied to the hydroalkylation reaction zone is at least 1:100. The aromatic compound, hydrogen and the at least one diluent are then contacted under hydroalkylation conditions with a hydroalkylation catalyst in the hydroalkylation reaction zone to produce an effluent comprising a cycloalkylaromatic compound.
    Type: Application
    Filed: June 28, 2011
    Publication date: July 4, 2013
    Applicant: ExxonMobil Chemical Patents Inc.
    Inventors: Teng Xu, Wenyih F. Lai
  • Patent number: 8455414
    Abstract: This invention relates to novel macromolecular amine-phenolic compositions having oxidation inhibition characteristics that are exhibited when added to organic material normally susceptible to oxidative degradation in the presence of air or oxygen, such as petroleum products, synthetic polymers, and elastomeric substances.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: June 4, 2013
    Assignee: Albemarle Corporation
    Inventors: Mahmood Sabahi, Vincent J. Gatto, Hassan Y. Elnagar
  • Publication number: 20130131383
    Abstract: A method, an apparatus and an article of manufacture for attracting charged nanoparticles using a graphene nanomesh. The method includes creating a graphene nanomesh by generating multiple holes in graphene, wherein each of the multiple holes is of a size appropriate to a targeted charged nanoparticle, selectively passivating the multiple holes of the graphene nanomesh to form a charged ring in the graphene nanomesh by treating the graphene nanomesh with chemistry yielding a trap with an opposite charge to that of the targeted nanoparticle, and electrostatically attracting the target charged nanoparticle to the oppositely charged ring to facilitate docking of the charged nanoparticle to the graphene nanomesh.
    Type: Application
    Filed: November 22, 2011
    Publication date: May 23, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Ali Afzali-Ardakani, Ahmed Maarouf, Glenn J. Martyna
  • Patent number: 8389197
    Abstract: The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: March 5, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takako Hirosaki, Daiju Shiono, Taku Hirayama, Hideo Hada
  • Patent number: 8350096
    Abstract: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: January 8, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Patent number: 8216970
    Abstract: This invention provides 1,1-bis(4-hydroxyphenyl)-1-phenylethane having a crystal form characterized by an X-ray diffraction pattern having one sharp and strong peak at 16.4° and three sharp peaks of intermediate intensity at each of 13°-16° and 17°-20.8° and at least three peaks of intermediate intensity at 22°-23° as a diffraction angle (2?) in an X-ray diffractometry with Cu—K ?-rays, and being capable of giving the storing stability of a colored image and a non-colored portion against heat, water or the like and the low-energy color-developing property suitable for high-speed color development.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: July 10, 2012
    Assignee: Nipponkayaku Kabushikikaisha
    Inventors: Hiroaki Tsugawa, Soichi Uehori, Mituo Yoshifuji
  • Publication number: 20120172568
    Abstract: Bis-Phenol A (BPA) can now be replaced in industrial processes by BPA substitutes. The BPA substitutes can have structures that are derivatives of BPA. The BPA substitutes can be used in preparing epoxy composition, polycarbonate compositions, and polysulfonate compositions or for other uses in place of BPA.
    Type: Application
    Filed: December 29, 2010
    Publication date: July 5, 2012
    Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC
    Inventor: Masahiro Ueda
  • Patent number: 8211588
    Abstract: A sulfonated poly(arylene sulfone) contains an unsaturated bond. A cross-linked material may be formed from the sulfonated poly(arylene sulfone), and a clay nanocomposite may include the sulfonated poly(arylene sulfone) or the cross-linked material. A fuel cell includes the clay nanocomposite.
    Type: Grant
    Filed: January 4, 2010
    Date of Patent: July 3, 2012
    Assignees: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Yeong-suk Choi, Sang-ouk Kim, Sun-hwa Lee, Won-jun Lee
  • Publication number: 20120130009
    Abstract: Vulcanizates with desirable properties can be obtained from compounds incorporating polymers that include hydroxyl group-containing diphenylethylene-type functionalities. The functionalities can be incorporated by using any or all of appropriate initiators, monomers and optional terminating compounds. Such polymers exhibit excellent interactivity with both conventional and non-conventional fillers.
    Type: Application
    Filed: June 30, 2010
    Publication date: May 24, 2012
    Inventors: Zengquan Qin, Yuan-Yong Yan, Xiao-Dong Pan
  • Publication number: 20120115084
    Abstract: Disclosed are a negative resist composition which shows excellent sensitivity and resolution in pattern formation by exposure to electron beams or EUV, a novel crosslinking agent suitable for the resist composition, and a pattern forming method using the resist composition. The negative resist composition comprises: (A) a polyphenol compound comprising two or more phenolic hydroxyl groups in a molecule thereof and having a molecular weight of 300 to 3,000, (B) an acid generator which directly or indirectly produces acid by exposure to active energy rays having a wavelength of 248 nm or less, and (C) a crosslinking agent represented by the following chemical formula (1). (The symbols shown in the formula (1) are defined in the Description).
    Type: Application
    Filed: September 29, 2009
    Publication date: May 10, 2012
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Kenichi Okuyama, Yasunori Nagatsuka
  • Patent number: 8173351
    Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.
    Type: Grant
    Filed: January 8, 2008
    Date of Patent: May 8, 2012
    Assignee: JSR Corporation
    Inventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
  • Patent number: 8110334
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: February 7, 2012
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Patent number: 8039679
    Abstract: An improved process is provided for producing bisphenol-A (BPA) comprising steps of (1) contacting benzene and a C3 alkylating agent to produce an alkylation effluent comprising cumene; (2) oxidizing the cumene to produce the corresponding hydroperoxide; (3) cleaving the hydroperoxide to produce product comprising phenol and acetone; (4) reacting acetone with phenol to form a reaction product stream comprising crude bisphenol-A product; (5) distilling the reaction product stream, while sending downstream to a BPA-phenol adduct crystallization and purification step, the resulting concentrated BPA phenolic feed stream; (6) producing BPA-phenol adduct crystals by crystallization of the concentrated BPA phenolic feed stream; (7) separating the BPA-phenol adduct crystals by solid-liquid separationr; (8) cracking a stream comprising at least a portion of said final mother liquor to recover a product; and (9) recovering and feeding the phenol product of step (8) to step (4) and/or step (7).
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: October 18, 2011
    Assignee: Badger Licensing LLC
    Inventors: Steven D. Evitt, Stephen W. Fetsko, Chung-Ming Chi
  • Publication number: 20110172239
    Abstract: Bis- and tris-dihydroxyaryl compounds and their methylenedioxy analogs and pharmaceutically acceptable esters, their synthesis, pharmaceutical compositions containing them, and their use in the treatment of amyloid diseases, especially A? amyloidosis, such as observed in Alzheimer's disease, IAPP amyloidosis, such as observed in type 2 diabetes, and synucleinopathies, such as observed in Parkinson's disease, and the manufacture of medicaments for such treatment.
    Type: Application
    Filed: July 16, 2010
    Publication date: July 14, 2011
    Inventors: Alan D. SNOW, Beth NGUYEN, Gerardo CASTILLO, Virginia SANDERS, Thomas LAKE, Lesley LARSEN, Rex T. WEAVERS, Stephen LORIMER, David LARSEN, David L. COFFEN, Charlotte COFFEN
  • Publication number: 20110152389
    Abstract: A strong-acid cation exchange resin comprising a plurality of acid groups which are partially neutralized with a cation of formula (I); wherein R1 at each occurrence independently is hydrogen or a Ci-4-alkyl group, R2 at each occurrence independently is hydrogen, alkyl or aryl, R3 at each occurrence independently is hydrogen or alkyl or two vicinal groups R3 together form an aromatic ring, m is 1, 2, 3, 4, 5 or 6, n is 1, 2, 3 or 4, o is 1 or 2, and p is 1, 2 or 3, is useful in the production of bisphenols.
    Type: Application
    Filed: July 18, 2007
    Publication date: June 23, 2011
    Inventor: Johann-Wilhelm Frey
  • Patent number: 7932014
    Abstract: A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: April 26, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Toshiki Ito
  • Patent number: 7902407
    Abstract: A method for preparing a metal salt of a hydroxy-substituted aromatic compound is described. The method comprises contacting in an aqueous medium at least one hydroxy-substituted aromatic compound with a base comprising a metal cation to provide a mixture comprising water and a metal salt of said hydroxy-substituted aromatic compound. The aqueous metal salt is then contacted with a substantially water-immiscible solvent at a temperature greater than the boiling point of water at the prevailing pressure to provide a slurry comprising the metal salt of the hydroxy-substituted aromatic compound and a vapor stream comprising the water-immiscible solvent and water. The components of the vapor stream are separated using a vapor handling system comprising a partial reflux condenser to provide a water-rich component and a water immiscible solvent-rich component.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: March 8, 2011
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: James Manio Silva, Thomas Link Guggenheim, David Winfield Woodruff
  • Publication number: 20100297528
    Abstract: An alkylated bisphenol-based compound, a method of preparing the same, sulfonated polyarylene sulfone polymer prepared from the alkylated bisphenol-based compound, a method of preparing the polymer, and a fuel cell using the sulfonated polyarylene sulfone polymer.
    Type: Application
    Filed: April 30, 2010
    Publication date: November 25, 2010
    Applicants: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and Technology
    Inventors: Yeong-suk Choi, Sang-ouk Kim, Won-jun Lee, Sun-hwa Lee
  • Publication number: 20100234589
    Abstract: In a process for oxidizing a hydrocarbon to a corresponding hydroperoxide, alcohol, ketone, carboxylic acid or dicarboxylic acid, the hydrocarbon is contacted with an oxygen-containing gas in the presence of a catalyst comprising a cyclic imide of the general formula (I): wherein each of R1 and R2 is independently selected from hydrocarbyl and substituted hydrocarbyl radicals having 1 to 20 carbon atoms, or from the groups SO3H, NH2, OH and NO2, or from the atoms H, F, Cl, Br and I provided that R1 and R2 can be linked to one another via a covalent bond; each of Q1 and Q2 is independently selected from C, CH, N and CR3; each of X and Z is independently selected from C, S, CH2, N, P and an element of Group 4 of the Periodic Table; Y is O or OH; k is 0, 1, or 2; 1 is 0, 1, or 2; m is 1 to 3, and R3 can be any of the entities listed for R1.
    Type: Application
    Filed: July 11, 2008
    Publication date: September 16, 2010
    Inventors: Jihad M. Dakka, James C. Vartuli, Stephen Zushma
  • Patent number: 7737310
    Abstract: A process for preparing biphenols of the general formula I by reaction of monophenols of the general formula II where the radicals R1, R2 and R3 are each, independently of one another, hydrogen, alkyl, aryl or arylalkyl having from 1 to 10 carbon atoms, in the presence of an oxidant in a reactor, wherein a) the reactor comprises no stationary internals which act as baffles, b) a total of not more than 0.6 mol of oxidant is used per one mol of monophenol, and c) the oxidant is introduced either continuously or discontinuously in a plurality of portions over a period of from 10 minutes to 24 hours, with the amount of oxidant introduced per unit time not being constant over the total period of time but instead being varied.
    Type: Grant
    Filed: April 5, 2006
    Date of Patent: June 15, 2010
    Assignee: BASF SE
    Inventors: Michael Bartsch, Gerd Haderlein, Tobias Aechtner, Jens Scheidel, Christian Dienes, Alexander Tempel, Thorsten Hofrichter, Werner Weinle
  • Patent number: 7696388
    Abstract: A process for preparing 2,2-bis(4-hydroxyphenyl)propane (p,p-bisphenol-A) from 2,4,4-trimethyl-2-(4-hydroxyphenyl)chroman (chroman 1.5) is disclosed. Phenol and chroman 1.5 are contacted over an acidic ion exchange resin at a given temperature for a given period of time. The process results in improved quality of p,p-bisphenol-A, better performance of catalyst, improved raw material usage, and reduced waste.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: April 13, 2010
    Assignee: SABIC Innovative Plastics IP B.V.
    Inventors: Hatem Abdallah Belfadhel, Umesh Krishna Hasyagar, Gurram Kishan, Rathinam Jothi Mahalingam
  • Publication number: 20100010273
    Abstract: A process for preparing 2,2-bis(4-hydroxyphenyl)propane (p,p-bisphenol-A) from 2,4,4-trimethyl-2-(4-hydroxyphenyl)chroman (chroman 1.5) is disclosed. Phenol and chroman 1.5 are contacted over an acidic ion exchange resin at a given temperature for a given period of time. The process results in improved quality of p,p-bisphenol-A, better performance of catalyst, improved raw material usage, and reduced waste.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 14, 2010
    Applicant: SABIC INNOVATIVE PLASTICS IP BV
    Inventors: Hatem Abdallah Belfadhel, Umesh Krishna Hasyagar, Gurram Kishan, Rathinam Jothi Mahalingam
  • Publication number: 20090264657
    Abstract: Described is the use of specific merocyanine derivatives for protecting body-care and household products from photolytic and oxidative degradation. These compounds perform outstanding UV absorber properties.
    Type: Application
    Filed: July 19, 2006
    Publication date: October 22, 2009
    Inventors: Barbara Wagner, Oliver Reich
  • Patent number: 7601784
    Abstract: It is an object of the present invention to provide molecular compounds useful in the fields of state-of the-art materials, such as formulations, waste water treatments, energy transducers, conductors and bio-model reactions, in a way that interaction points and forces working inside polymer assemblies are fixed as well as controlled so that constituent polymers are aligned and modified. It is also an object of the present invention to provide methods for aligning and/or modifying polymers having hydrogen bond sites. A molecular compound is produced from a tetrakis aryl compound represented by Formula (I) (wherein, X is (CH2)n, or p-phenylene; n is 0, 1, 2 or 3; Y is hydroxyl, carboxyl or optionally substituted amino: and R1 and R2 are each hydrogen, lower alkyl, optionally substituted phenyl, halogen or lower alkoxy) and a polymer having hydrogen bond sites, such as polyethers, polyalcohols or polyamines.
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: October 13, 2009
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Hiroshi Suzuki, Satoru Abe
  • Patent number: 7414160
    Abstract: A process produces an aromatic compound by bringing an aromatic compound (B) into contact with molecular oxygen (C) in the presence of a catalyst (A) comprising at least one of (A1) a heteropolyacid and/or a salt thereof, and (A2) a mixture of oxoacids and/or salts thereof containing, as a whole, one of P and Si and at least one selected from V, Mo and W to thereby yield another aromatic compound (G) than the aromatic compound (B). The process can produce, for example, a corresponding aromatic hydroxy compound (G1) by allowing the aromatic compound (B) to react with the molecular oxygen (C) further in the presence of a reducing agent (D).
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: August 19, 2008
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano
  • Publication number: 20080194790
    Abstract: The invention relates to a hydroxy-aromatic compound of formula (I): wherein: at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; formula (II) is the following group: wherein EWG is an electron-withdrawing group.
    Type: Application
    Filed: December 1, 2005
    Publication date: August 14, 2008
    Inventors: Rudolfus A.T.M. Van Benthem, Renier H.M. Kierkels
  • Publication number: 20080177113
    Abstract: A process for preparing biphenols of the general formula I by reaction of monophenols of the general formula II where the radicals R1, R2 and R3 are each, independently of one another, hydrogen, alkyl, aryl or arylalkyl having from 1 to 10 carbon atoms, in the presence of an oxidant in a reactor, wherein a) the reactor comprises no stationary internals which act as baffles, b) a total of not more than 0.6 mol of oxidant is used per one mol of monophenol, and c) the oxidant is introduced either continuously or discontinuously in a plurality of portions over a period of from 10 minutes to 24 hours, with the amount of oxidant introduced per unit time not being constant over the total period of time but instead being varied.
    Type: Application
    Filed: April 5, 2006
    Publication date: July 24, 2008
    Applicant: BASF Aktiengesellschaft
    Inventors: Michael Bartsch, Gerd Haderlein, Tobias Aechtner, Jens Scheidel, Christian Dienes, Alexander Tempel, Thorsten Hofrichter, Werner Weinle
  • Publication number: 20080132722
    Abstract: Disclosed is a method for producing at least one chemical reaction product by chemically reacting one or several reactants that is/are optionally dissolved in one or several solvents and is/are supplied as a feed stream by bringing the same in contact with a heterogeneous catalyst in a continuously operated fixed-bed reactor which is filled with a particle bed, a continuous annular chromatograph (CAC) that is filled with the particle bed being used as a fixed-bed reaction in which the at least one reaction product is formed and purified while the at least one purified reaction product as well as optionally provided secondary products and/or non-reacted reactants are withdrawn at a different, predetermined azimuthal position of the annular chromatograph, respectively. The inventive method is characterized in that only one type of particle material is used in a single particle bed as both a formation catalyst and a chromatographic medium for purifying the at least one reaction product in the particle bed.
    Type: Application
    Filed: January 13, 2005
    Publication date: June 5, 2008
    Applicant: A.L.P. Technology AG
    Inventors: Massimo Morbidelli, Marco Mazzotti, Adalbert Prior, Joachim Prior, Frank Lang
  • Patent number: 7371902
    Abstract: Methods for purifying a p,p-bisphenol A generally include distilling a feed stream comprising p,p-BPA in a distillation column at a pressure less than or equal to 20 millibars. The distillation column separates the bisphenol feed stream to produce a light fraction, an intermediate fraction and a heavy fraction. The intermediate fraction comprising the purified bisphenol contains lesser impurities that the p,p-BPA in the feed stream. In one embodiment, the intermediate stream is recovered using a side-draw. The side-draw is located between a first zone and a third zone in the distillation column.
    Type: Grant
    Filed: September 29, 2004
    Date of Patent: May 13, 2008
    Assignee: General Electric Company
    Inventors: Ramachandran Kumar, Gomatam Raghavan Ravi, Hyacinth Mary Bastian, Gururaj Sathyanarayana, Sheldon Jay Shafer, Kumar Krishna Ramamurthy, Dwijaraja Mouli Murukutla, Venkata Rama Narayanan Ganapathy Bhotla
  • Patent number: 7115785
    Abstract: Disclosed is a method for preparing an alkali metal salt of a hydroxy-substituted hydrocarbon which comprises the steps of (i) contacting in solvent media at least one hydroxy-substituted hydrocarbon with a base comprising an alkali metal cation; and (ii) devolatilizing the solvent media comprising alkali metal salt by adding or spraying the solvent media into a substantially water-immiscible organic solvent, said solvent being at a temperature greater than the boiling point of solvent media at the prevailing pressure. In one embodiment the solvent media comprises water, and optionally at least one water-soluble protic organic solvent.
    Type: Grant
    Filed: August 25, 2003
    Date of Patent: October 3, 2006
    Assignee: General Electric Company
    Inventors: Thomas Link Guggenheim, Daniel Joseph Brunelle, David Winfield Woodruff, Lee Harris Bergman, Norman Enoch Johnson, Matthew Hal Littlejohn, Farid Fouad Khouri
  • Patent number: 7087799
    Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers. An amino group containing phenol derivative of the present invention is represented by a general formula (1) show below, and the present invention also provides a polyimide precursor produced using such an amino group containing phenol derivative. (wherein, R1, R2 and R3, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, a COOR group (in which R represents an alkyl group of 1 to 6 carbon atoms) or a hydrogen atom; R4 and R5, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms or a hydrogen atom; X represents —O—, —S—, —SO2—, —C(CH3)2—, —CH2—, —C(CH3)(C2H5)—, or —C(CF3)2—; and n represents an integer of 1 or greater).
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: August 8, 2006
    Assignee: Gun Ei Chemical Industry Co., Ltd.
    Inventors: Takeshi Tsuihiji, Michiyasu Yamazaki
  • Patent number: 7067704
    Abstract: Bisphenol-A is purified in a process which comprises the following steps: a) cooling a liquid mixture comprising bisphenol-A and water in a bisphenol-A crystallizer to form bisphenol-A crystals in a liquid phase; b) separating the bisphenol-A crystals from the liquid phase; c) dividing at least a portion of the liquid phase into a bisphenol-rich organic phase and a water-rich phase; d) feeding phenol and at least a portion of the bisphenol-rich organic phase into a adduct crystallizer to form a crystalline adduct of phenol and bisphenol-A in a mother liquor, and e) separating the crystalline adduct from the mother liquor. Bisphenol-A of high purity at a high yield is obtained.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: June 27, 2006
    Assignee: Dow Global Technologies Inc.
    Inventors: Thomas C. Young, Damian M. Feord, Johann-Wilhelm Frey
  • Patent number: 7045664
    Abstract: In a process for producing bisphenol A, an adduct of bisphenol A with phenol is promptly recovered in highly purity and high efficiency from a reaction mother liquor in the case of singling out bisphenol A from a reaction product. An adduct layer of bisphenol A with phenol is formed by crystallizing an adduct of bisphenol A with phenol from a solution of bisphenol A in phenol to form a slurry, the bisphenol A being produced by reacting phenol and acetone in the presence of an acid catalyst, subjecting the resultant slurry to a solid-liquid separation treatment, and thereafter removing the phenol from solid components, characterized by pouring onto a filter, a slurry solution of bisphenol A in phenol, the slurry solution containing in a crystalline state, an adduct of bisphenol A having an average particle size in the range of 0.05 to 1 mm with phenol, and filtering the slurry solution under reduced pressure in an atmosphere of an inert gas stream at 30 to 80° C.
    Type: Grant
    Filed: July 29, 2003
    Date of Patent: May 16, 2006
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventors: Kazuyuki Hirano, Norio Ogata
  • Patent number: 7019179
    Abstract: A process produces an aromatic compound by bringing an aromatic compound (B) into contact with molecular oxygen (C) in the presence of a catalyst (A) comprising at least one of (A1) a heteropolyacid and/or a salt thereof, and (A2) a mixture of oxoacids and/or salts thereof containing, as a whole, one of P and Si and at least one selected from V, Mo and W to thereby yield another aromatic compound (G) than the aromatic compound (B). The process can produce, for example, a corresponding aromatic hydroxy compound (G1) by allowing the aromatic compound (B) to react with the molecular oxygen (C) further in the presence of a reducing agent (D).
    Type: Grant
    Filed: March 6, 2003
    Date of Patent: March 28, 2006
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yasutaka Ishii, Tatsuya Nakano
  • Patent number: 6906226
    Abstract: Hydroxymethyl-substituted polyfunctional phenols, expressed by the following structure: General structure (I) (wherein X represents: bivalent group (a) expressed by the following structure: General structure (II) (wherein R1, R2, R3 and R4 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); quadrivalent group (b) expressed by the following structure: General structure (III) (wherein R5 and R6 each independently represent a hydrogen atom or an alkyl group with a carbon atom number of 1 through 4); or bivalent group (c) expressed by the following structure: General structure (IV) (wherein R7 and R8 each independently represent a hydrogen atom or a monofluoromethyl, difluoromethyl or trifluoromethyl group; however, R7 and R8 cannot be both hydrogen atoms); wherein n takes 2 when X is bivalent group (a), takes 4 when X is quadrivalent group (b), or takes 2 when X is bivalent group (c)).
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: June 14, 2005
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Kazuya Matsuishi, Takayuki Ohno, Taiichi Shiomi
  • Patent number: 6872859
    Abstract: The present invention relates to a process for preparing bisphenols which comprises reacting a carbonyl compound containing at least two carbon atoms with an aromatic compound, containing a hydroxyl group and at least one hydrogen atom bound to the aromatic ring, in the presence of a catalyst comprising a zeolite characterized by a spaciousness index equal to or higher than 8. The invention also relates to a method for the regeneration of the zeolitic catalyst used in this process and comprises subjecting the exhausted catalyst to hot treatment with a suitable aromatic compound containing at least one activating group, preferably the same hydroxylated aromatic compound used in the process for the preparation of bisphenols from which the exhausted catalyst derives.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: March 29, 2005
    Assignee: Enitecnologie S.p.A.
    Inventors: Carlo Perego, Alberto De Angelis
  • Publication number: 20040181100
    Abstract: A high productivity catalyst for bisphenol-A has been discovered which comprises strongly acidic cation-exchange resin spheres produced from a polystyrene/divinylbenzene (PS/DVB) copolymer sulfonated under conditions to introduce sulfone cross-linking. Surprisingly, the sulfone cross-linking improves the resistance to deformation but does not have a negative effect on the activity and selectivity of the catalyst in bisphenol-A production.
    Type: Application
    Filed: March 22, 2004
    Publication date: September 16, 2004
    Inventor: Eric Gustave Lundquist