Length, Width, Or Height Patents (Class 73/1.81)
  • Oxide film thickness standards and manufacturing methods thereof
    Patent number: 6231918
    Abstract: A film thickness standard (FTS) comprises an oxide film formed on a semiconductor substrate with a thickness over 1 &mgr;m. A method of preparing an oxide film thickness standard reference of semiconductor device is carried out by repeatedly and continuously performing the formation process of the oxide film under the same processing conditions thereby to form the oxide film on a semiconductor substrate with a thickness over a certain level.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: May 15, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-woo Sun, Sang-kil Lee
  • Method for estimating the accuracy of an optical distance measuring probe
    Patent number: 6189365
    Abstract: A method for estimating the error of a measured shape of a workpiece, as measured using an optical probe. A series of N equally spaced distance measurements are transformed to a power spectrum. The average power above a cutoff index is divided by N to give an estimate of the variance of the shape measurement.
    Type: Grant
    Filed: December 17, 1998
    Date of Patent: February 20, 2001
    Assignee: Nex Tec Ltd.
    Inventors: Gabi Horovitz, David Bunimovich