For Error Compensation (epo) Patents (Class 850/11)
  • Patent number: 11637030
    Abstract: A first x-y translation stage, a second x-y translation stage, and a chuck are disposed in a chamber. The chuck is situated above and coupled to the second x-y translation stage, which is situated above and coupled to the first x-y translation stage. The chuck is configured to support a substrate and to be translated by the first and second x-y stages in x- and y-directions, which are substantially parallel to a surface of the chuck on which the substrate is to be mounted. A first barrier and a second barrier are also disposed in the chamber. The first barrier is coupled to the first x-y translation stage to separate a first zone of the chamber from a second zone of the chamber. The second barrier is coupled to the second x-y translation stage to separate the first zone of the chamber from a third zone of the chamber.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: April 25, 2023
    Assignee: KLA Corporation
    Inventors: Yoram Uziel, Ulrich Pohlmann, Frank Laske, Nadav Gutman, Ariel Hildesheim, Aviv Balan
  • Patent number: 9267902
    Abstract: Provided is a sample analysis method of irradiating a sample with a primary ion beam to analyze a secondary ion emitted from the sample by mass spectrometry, the sample analysis method including the steps of cooling a sample placed in a chamber; forming an ice layer on a surface of the cooled sample by discharging one of water and an aqueous solution to the chamber; and irradiating the surface of the sample with the primary ion beam with the ice layer being formed thereon, wherein an amount of the water forming the ice layer is 0.1 ng/mm2 or more and 20 ng/mm2 or less.
    Type: Grant
    Filed: January 12, 2012
    Date of Patent: February 23, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Manabu Komatsu, Masafumi Kyogaku, Hiroyuki Hashimoto, Naofumi Aoki
  • Patent number: 8990961
    Abstract: Determination of non-linearity of a positioning scanner of a measurement tool is disclosed. In one embodiment, a method may include providing a probe of a measurement tool coupled to a positioning scanner; scanning a surface of a first sample with the surface at a first angle relative to the probe to attain a first profile; scanning the surface of the first sample with the surface at a second angle relative to the probe that is different than the first angle to attain a second profile; repeating the scannings to attain a plurality of first profiles and a plurality of second profiles; and determining a non-linearity of the positioning scanner using the different scanning angles to cancel out measurements corresponding to imperfections due to the surface of the sample. The non-linearity may be used to calibrate the positioning scanner.
    Type: Grant
    Filed: August 25, 2011
    Date of Patent: March 24, 2015
    Assignee: International Business Machines Corporation
    Inventors: George W. Banke, Jr., James M. Robert, Carlos Strocchia-Rivera
  • Patent number: 8904560
    Abstract: A method of operating a metrology instrument includes generating relative motion between a probe and a sample at a scan frequency using an actuator. The method also includes detecting motion of the actuator using a position sensor that exhibits noise in the detected motion, and controlling the position of the actuator using a feedback loop and a feed forward algorithm. In this embodiment, the controlling step attenuates noise in the actuator position compared to noise exhibited by the position sensor over the scan bandwidth. Scan frequencies up to a third of the first scanner resonance frequency or greater than 300 Hz are possible.
    Type: Grant
    Filed: May 7, 2007
    Date of Patent: December 2, 2014
    Assignee: Bruker Nano, Inc.
    Inventors: Jian Shi, Chanmin Su, Craig Prater, Ji Ma
  • Patent number: 8723116
    Abstract: A method of determining an applicable threshold for determining the critical dimension of a category of patterns imaged by atomic force scanning electron microscopy is presented. The method includes acquiring, from a plurality of patterns, a pair of images for each pattern; for each pair of images determining a reference critical dimension via an image obtained by a reference instrumentation and determining an empirical threshold applicable to an image obtained by a CD-SEM instrumentation such that the empirical threshold substantially corresponds to the reference critical dimension; determining a threshold applicable to a category of patterns, the threshold being determined from a plurality of empirical thresholds.
    Type: Grant
    Filed: May 3, 2013
    Date of Patent: May 13, 2014
    Assignee: Commissariat a l'energie atomique et aux energies alternatives
    Inventors: Johann Foucher, Mazan Saied
  • Patent number: 8707461
    Abstract: The method relates to a method of scanning a sample. Scanning a sample is typically done by scanning the sample with a probe along a multitude of parallel lines. In prior art scan methods a sample is scanned multiple times with a nominally identical scan pattern. The invention is based on the insight that the coherence between adjacent points in a direction along the scan direction is much better than the coherence of adjacent points perpendicular to the scan direction. By combining two images that are scanned perpendicular to each other, it should thus be possible to form an image making use of the improved coherence (due to shorter temporal distance) in both directions. The method thus involves scanning the sample with two scan patterns, the lines of one scan pattern preferably perpendicular to the lines of the other scan pattern. Hereby it is possible to use the temporal coherence of scan points on a line of one scan pattern to align the lines of the other scan pattern, and vice versa.
    Type: Grant
    Filed: October 18, 2012
    Date of Patent: April 22, 2014
    Assignee: FEI Company
    Inventors: Arthur Reinout Hartong, Cornelis Sander Kooijman
  • Patent number: 8615811
    Abstract: A method of measuring vibration characteristics of a cantilever in a scanning probe microscope (SPM). An excitation signal is generated by a forward and backward frequency sweep signal in a frequency range including a resonance frequency of the cantilever. The cantilever is vibrated by supplying the excitation signal to a vibrating portion of the cantilever. The largest amplitude of a displacement of the cantilever in a forward path and in a backward path is directly measured, and an intermediate value of a frequency between frequencies measured on the basis of the directly measured largest amplitude of the displacement of the cantilever is detected as the resonance frequency of the cantilever.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: December 24, 2013
    Assignee: SII NanoTechnology Inc.
    Inventors: Masatsugu Shigeno, Yoshiteru Shikakura
  • Patent number: 8484759
    Abstract: An approach for the thermomechanical characterization of phase transitions in polymeric materials (polyethyleneterephthalate) by band excitation acoustic force microscopy is developed. This methodology allows the independent measurement of resonance frequency, Q factor, and oscillation amplitude of a tip-surface contact area as a function of tip temperature, from which the thermal evolution of tip-surface spring constant and mechanical dissipation can be extracted. A heating protocol maintained a constant tip-surface contact area and constant contact force, thereby allowing for reproducible measurements and quantitative extraction of material properties including temperature dependence of indentation-based elastic and loss moduli.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: July 9, 2013
    Assignee: UT-Battelle, LLC
    Inventors: Stephen Jesse, Sergei V. Kalinin, Maxim P. Nikiforov
  • Patent number: 8459102
    Abstract: A digital system for controlling the quality factor in a resonant device. The resonant device can be a a device that includes a cantilever within its system, such as an atomic force microscope. The quality factor can be digitally controlled to avoid noise effect in the analog components. A direct digital synthesizer implemented in a way that provides access to the output of the phase accumulator. That output is a number which usually drives a lookup table to produce a cosine or sine output wave. The output wave is created, but the number is also adjusted to form a second number that drives a second lookup table to create an adjustment factor to adjust the output from the cosine table. The adjusted digital signal than drives a DA converter which produces an output drive for the cantilever.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: June 11, 2013
    Assignees: Oxford Instruments PLC, Oxford Instruments AFM Inc.
    Inventors: Dan Bocek, Jason Cleveland
  • Patent number: 8415621
    Abstract: A method for line width measurement, comprising: providing a substrate, wherein a raised line pattern is formed on a surface of the substrate, and the line pattern has a width; forming a first measurement structure and a second measurement structure on opposite sidewalls of the line pattern in the width direction of the line pattern; removing the line pattern; and measuring the spacing between the first measurement structure and the second measurement structure, and obtaining the width of the line pattern by subtracting a predetermined offset from the spacing. The present invention facilitates to reduce the uncertainty associated with the measuring process and to improve the measurement precision.
    Type: Grant
    Filed: July 22, 2011
    Date of Patent: April 9, 2013
    Assignee: Institute of Microelectronics, Chinese Academy of Sciences
    Inventors: Haizhou Yin, Huilong Zhu, Zhijiong Luo
  • Patent number: 8347411
    Abstract: The scanning probe microscope has a primary control loop (7, 11, 12) for keeping the phase and/or amplitude of deflection at constant values as well as a secondary control loop (9) that e.g. keeps the frequency of the cantilever oscillation constant by applying a suitable DC voltage to the probe while, at the same time, a conservative AC excitation is applied thereto. By actively controlling the frequency with the first control loop (7, 11, 12) and subsequently controlling the DC voltage in order to keep the frequency constant, a fast system is created that allows to determine the contact potential difference or a related property of the sample (3) quickly.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: January 1, 2013
    Assignee: Specs Zürich GmbH
    Inventors: Dominik Ziegler, Andreas Christian Stemmer, Jorg Rychen
  • Patent number: 8347409
    Abstract: A method includes generating, using a sensor, a data signal. The data signal includes a first component based on a motion in a first direction of an actuator configured to provide motion between a sample and a probe in the first direction, the first direction substantially in the plane of the sample; and a second component based on at least one of topographic variations of the sample in a second direction, and a materials property of the sample. The method further includes generating, using a processor, a compensatory signal based on the first component of the data signal generated by the sensor; and providing the compensatory signal to the actuator.
    Type: Grant
    Filed: May 24, 2010
    Date of Patent: January 1, 2013
    Assignee: Massachusetts Institute of Technology
    Inventors: Daniel James Burns, Georg Ernest Fantner, Kamal Youcef-Toumi
  • Patent number: 8321960
    Abstract: A portion of light emitted from a laser source (11) for detecting a displacement of a cantilever (4) is extracted by a half mirror (20) and guided onto a photodetector (21) having a light-receiving surface divided into four sections. When the direction of the emitted light is inclined due to a change in the ambient temperature or other factors, the light spot formed on the light-receiving surface of the photodetector (21) moves. Accordingly, the amount and direction of the inclination of the emission direction can be recognized from the amount and direction of the movement of the light spot. A drive amount calculator (22) calculates a drive amount according to the amount and direction of the inclination, and operates an actuator (23) to rotate the laser source (11) around each of the Y and Z axes. This operation compensates for the inclination of the direction of the emitted light and thereby prevents the inclination from being falsely recognized as an irregularity on the sample surface.
    Type: Grant
    Filed: January 24, 2008
    Date of Patent: November 27, 2012
    Assignee: Shimadzu Corporation
    Inventor: Takeshi Ito
  • Patent number: 8296860
    Abstract: An atomic force microscopy (AFM) method includes a scanning probe that scans a surface of a structure to produce a first structure image. The structure is then rotated by 90° with respect to the scanning probe. The scanning probe scans the surface of the structure again to produce a second structure image. The first and second structure images are combined to produce best fit image of the surface area of the structure. The same method is used to produce the best fit image of a flat standard. The best fit image of the flat standard is subtracted from the best fit image of the structure to obtain a true topographical image in which Z direction run out error is substantially reduced or eliminated.
    Type: Grant
    Filed: March 16, 2009
    Date of Patent: October 23, 2012
    Assignee: Seagate Technology LLC
    Inventors: Huiwen Liu, Lin Zhou, Dale Egbert, Jonathan Arland Nelson, Peter Gunderson
  • Patent number: 8178836
    Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: May 15, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
  • Publication number: 20110314577
    Abstract: A method, apparatus and computer program are provided for automatically compensating a drift of a force applied by an Atomic Force Microscope during contact mode. The method makes it possible to automatically control and correct force drift in contact mode Atomic Force Microscopy. In a preferred embodiment, the present method includes steps measuring independently lateral and vertical vibration signals, analyzing theses signals and finally comparing theses signals to reference vibration signals. In a second embodiment, the vibration signals may be combined by means of an index, called force index.
    Type: Application
    Filed: February 5, 2010
    Publication date: December 22, 2011
    Inventors: Simon Scheuring, Ignacio Casuso
  • Patent number: 8074291
    Abstract: A scanning probe microscope and method for operating the same to correct for errors introduced by a repetitive scanning motion are disclosed. The microscope includes an actuator that moves the probe tip relative to the sample in three directions. The actuator executes a repetitive motion, characterized by a repetitive motion frequency, in one of the directions, and changes a distance between the sample and the probe tip in a second one of the directions. A probe position signal generator generates a probe position signal indicative of a position of the probe tip relative to the cantilever arm. A probe signal correction generator generates a corrected probe position signal by correcting the probe position signal for errors introduced by the repetitive motion. A controller maintains the probe tip in a fixed relationship with respect to the sample in the second one of the dimensions based on the corrected probe position signal.
    Type: Grant
    Filed: January 29, 2010
    Date of Patent: December 6, 2011
    Assignee: Agilent Technologies, Inc.
    Inventor: Daniel Yves Abramovitch
  • Patent number: 8069493
    Abstract: An object of the present invention is to provide an atomic force microscope apparatus allowing tracking errors to be made as close to zero as possible to reduce images obtained through high-speed scanning from being degraded. To accomplish the object of the present invention, the present invention provides an atomic force microscope apparatus imaging a surface topography of a sample in a contact mode, the apparatus including a cantilever having a probe interacting with the sample surface via an atomic force and being subjected to a deflection by the atomic force, laser light provision means for allowing first laser light to enter the cantilever, light detection means, a controller estimating the surface topography of the sample surface, and data storage means for recording the estimated surface topography.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: November 29, 2011
    Assignee: Yokohama National University
    Inventors: Hiroshi Fujimoto, Takashi Ooshima
  • Patent number: 8042383
    Abstract: A digital system for controlling the quality factor in a resonant device. The resonant device can be any mechanically driven resonant device, but more particularly can be a device that includes a cantilever within its system, such as an atomic force microscope. The quality factor can be digitally controlled to avoid noise effect in the analog components. One of the controls can use a direct digital synthesizer implemented in a way that provides access to the output of the phase accumulator. That output is a number which usually drives eight lookup table to produce a cosine or sign output wave. The output wave is created, but the number is also adjusted to form a second number of the drives a second lookup table to create an adjustment factor. The adjustment factor is used to adjusts the output from the cosine table, to create an adjusted digital signal. The adjusted digital signal than drives a DA converter which produces an output drive for the cantilever.
    Type: Grant
    Filed: June 17, 2008
    Date of Patent: October 25, 2011
    Assignee: Asylum Research Corporation
    Inventors: Dan Bocek, Jason Cleveland
  • Patent number: 7886366
    Abstract: The amplitude control of a cantilever based on the van der Pol model is performed through feedback using measurement data on a deflection of the cantilever. A self-oscillating circuit integrates a deflection angle signal of a cantilever detected by a deflection angle measuring mechanism using an integrator, multiplies a resulting integral value by linear feedback gain generated by a gain generator, and an output corresponding to the linear feedback signal is generated. Also, the self-oscillating circuit cubes the deflection angle signal using analog multipliers, integrates the resulting values using integrators, multiplies the resulting integral values by a nonlinear feedback gain generated by a gain generator, and an output corresponding to the nonlinear feedback signal is generated. Furthermore, the self-oscillating circuit adds the outputs together using an adder, and a voltage signal for a piezo element is generated.
    Type: Grant
    Filed: November 20, 2008
    Date of Patent: February 8, 2011
    Assignees: National Institute of Advanced Industrial Science and Technology, University of Tsukuba
    Inventors: Masaharu Kuroda, Kentaro Nishimura, Takashi Someya, Hiroshi Yabuno
  • Patent number: 7865966
    Abstract: A method of operating a scanning probe microscope (SPM) includes scanning a sample as a probe of the SPM interacts with a sample, and collecting sample surface data in response to the scanning step. The method identifies a feature of the sample from the sample surface data and automatically performs a zoom-in scan of the feature based on the identifying step. The method operates to quickly identify and confirm the location of features of interest, such as nano-asperities, so as to facilitate performing a directed high resolution image of the feature.
    Type: Grant
    Filed: September 12, 2008
    Date of Patent: January 4, 2011
    Assignee: Veeco Metrology Inc.
    Inventors: Chanmin Su, Sergey Belikov
  • Patent number: 7836757
    Abstract: A phase feedback AFM (atomic force microscope) and method for the phase feedback AFM. A cantilever is driven to oscillate at a constant frequency close to the resonance frequency of the cantilever by a driving signal. The distance between the probe and the sample is controlled such that the phase difference between the driving signal and a cantilever deflection signal indicating deflections of the cantilever is kept constant. The phase feedback AFM has an amplifier-controller for receiving the cantilever deflection signal, the output from an oscillator for driving the cantilever into oscillation, and a signal representing a reference amplitude of oscillation of the cantilever. The phase feedback AFM further includes a feedback circuit which receives the output from the amplifier-controller which controls the cantilever deflection signal to a preset amplitude.
    Type: Grant
    Filed: March 19, 2008
    Date of Patent: November 23, 2010
    Assignee: JEOL Ltd.
    Inventor: Shinichi Kitamura
  • Patent number: 7745782
    Abstract: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
    Type: Grant
    Filed: February 27, 2008
    Date of Patent: June 29, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tatsuaki Ishijima, Katsuhiro Sasada, Ritsuo Fukaya
  • Patent number: 7663103
    Abstract: A line-width measurement adjusting method, which is used when first and second electron beam intensity distributions for measuring a line width are produced from intensity distribution images of secondary electrons obtained respectively by scanning a first irradiation distance with an electron beam at first magnification, and by scanning a second irradiation distance with an electron beam at second magnification, includes the step of adjusting the second electron beam intensity distribution of the electron beam at the second magnification such that the second electron beam intensity distribution is equal to the first electron beam intensity distribution of the electron beam at first magnification. The second electron beam intensity distribution may be adjusted by increasing or decreasing a second irradiation distance when producing the electron beam intensity distribution.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: February 16, 2010
    Assignee: Advantest Corp.
    Inventors: Masayuki Kuribara, Jun Matsumoto
  • Patent number: 7588605
    Abstract: To be able to measure a value with regard to a dissipation, or a value in proportion to a dissipation energy without making a premise by being brought into a steady state. Exciting means 12 for carrying out an excitation by following a resonance frequency of a cantilever 2, a displacement detector 10 for detecting a displacement of a stylus at a tip of the cantilever 2, an amplitude detector 20 for successively providing an amplitude from a signal from the displacement detector 10, a difference value detector 21 for providing a time difference value of the amplitude, a divider 22 for providing a value of a quotient between the time difference values, a logarithmic converter 23 for providing a logarithmic value of the value of the quotient, and a second divider 24 for providing a value with regard to a dissipation by calculating a value constituted by dividing the logarithmic value by a difference time period are provided.
    Type: Grant
    Filed: August 7, 2007
    Date of Patent: September 15, 2009
    Assignee: SII NanoTechnology Inc.
    Inventor: Norio Ookubo
  • Patent number: 7566873
    Abstract: One embodiment relates to an apparatus for inspecting a substrate using charged particles. The apparatus includes an illumination subsystem, an objective subsystem, a projection subsystem, and a beam separator interconnecting those subsystems. The apparatus further includes a detection system which includes a scintillating screen, a detector array, and an optical coupling apparatus positioned therebetween. The optical coupling apparatus includes both refractive and reflective elements. Other embodiments and features are also disclosed.
    Type: Grant
    Filed: December 14, 2006
    Date of Patent: July 28, 2009
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: David Walker, Salam Harb, Vassil Spasov, David Stites, Izzy Lewis, Marian Mankos