Abstract: Provided is a charged particle beam apparatus capable of stably obtaining a spherical aberration correction effect. The charged particle beam apparatus includes: a charged particle beam aperture stop 121 and an electrode 122 that are arranged on an optical axis between the charged particle beam source 101 and the objective lens 105; and a power supply 108 that applies a voltage between the charged particle beam aperture stop 121 and the electrode 122, in which the voltage that is applied from the electrode to the charged particle beam aperture stop by the power supply is a voltage having a polarity opposite to a charge of the charged particle beam, the electrode 122 includes an annular aperture 205, and the charged particle beam aperture stop 121 includes a plurality of apertures 201 that are arranged at positions overlapping the annular aperture 205 of the electrode 122 when viewed in a direction Z along the optical axis.

Abstract: An apparatus and a method for identifying a sample position in an atomic force microscope according to an exemplary embodiment of the present disclosure are provided. The method for identifying a sample position in an atomic force microscope includes receiving a vision image including a subject sample through a vision unit; determining a subject sample region in the vision image using a prediction model which is configured to output the subject sample region by receiving the vision image as an input; and determining a position of the subject sample based on the subject sample region.

Abstract: A method of performing x-ray spectroscopy material analysis of a region of interest within a cross-section of a sample using an evaluation system that includes a focused ion beam (FIB) column, a scanning electron microscope (SEM) column, and an x-ray detector, including: forming a lamella having first and second opposing side surfaces in the sample by milling, with the FIB column, first and second trenches in the sample to expose the first and second sides surface of the lamella, respectively; depositing background material in the second trench, wherein the background material is selected such that the background material does not include any chemical elements that are expected to be within the region of interest of the sample; generating a charged particle beam with the SEM column and scanning the charged particle beam across a region of interest on the first side surface of the lamella such that the charged particle beam collides with the first side surface of the lamella at a non-vertical angle; and detect

Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

Abstract: A method of performing atomic force microscopy (AFM) measurements, uses an ultrasound transducer to transmit modulated ultrasound waves with a frequency above one GHz from the ultrasound transducer to a top surface of a sample through the sample from the bottom surface of the sample. Effects of ultrasound wave scattering are detected from vibrations of an AFM cantilever at the top surface of the sample. Before the start of the measurements, a drop of a liquid is placed on a top surface of the ultrasound transducer. The sample is placed on the top surface of the ultrasound transducer, whereby the sample presses the liquid in the drop into a layer of the liquid between the top surface of the ultrasound transducer and a bottom surface of the sample. The AFM measurements are started after a thickness of the layer of the liquid has stabilized.

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

Abstract: A method of mass spectrometry is disclosed wherein one or more relatively abundant or intense species of ions in a first population of ions are selectively attenuated so as to form a second population of ions. The total ion current of the second population of ions is then adjusted so that the ion current corresponding to ions which are onwardly transmitted to a mass analyser comprising an ion detector is within the dynamic range of the ion detector.

Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.

Abstract: A method for evaluating a region of an object, the method may include repeating, for each sub-region out of a first sub-region of the region till a penultimate sub-region of the region, the steps of: (a) acquiring, by a charged particle imager, a charged particle image of the sub-region; and (b) milling, by a charged particle miller, the sub-region to expose another sub-region of region; acquiring, by the charged particle imager, a charged particle image of a last sub-region of the region; and generating three-dimensional information about a content of the region based on charge particle images of the first sub-region till last sub-region of the region.

Abstract: In one embodiment, an apparatus to treat a substrate may include an extraction plate to extract a plasma beam from a plasma chamber and direct the plasma beam to the substrate. The plasma beam may comprise ions forming a non-zero angle of incidence with respect to a perpendicular to a plane of the substrate; and a gas outlet system disposed outside the plasma chamber, the gas outlet system coupled to a gas source and arranged to deliver to the substrate a reactive gas received from the gas source, wherein the reactive gas does not pass through the plasma chamber.

Abstract: According to one embodiment, an inspection apparatus includes an irradiation device irradiating an inspection target substrate with multiple beams, a detector detecting each of a plurality of charged particle beams formed by charged particles emitted from the inspection target substrate as an electrical signal, and a comparison processing circuitry performing pattern inspection by comparing image data of a pattern formed on the inspection target substrate, the pattern being reconstructed in accordance with the detected electrical signals, and reference image data. The detector includes a plurality of detection elements that accumulate charges, and a detection circuit that reads out the accumulated charges. The plurality of detection elements are grouped into a plurality of groups.

Abstract: An electron beam inspection device includes: a primary electron optical system that irradiates the surface of a sample with an electron beam; and a secondary electron optical system that gathers secondary electrons emitted from the sample and forms an image on the sensor surface of a detector. An electron image of the surface of the sample is obtained from a signal detected by the detector, and the sample is inspected. A cylindrical member that is formed with conductors stacked as an inner layer and an outer layer, and an insulator stacked as an intermediate layer is provided inside a lens tube into which the secondary electron optical system is incorporated. An electron orbital path is formed inside the cylindrical member, and the members constituting the secondary electron optical system are arranged outside the cylindrical member.

Abstract: An apparatus for correlating at least two images of a photolithographic mask that at least partially overlap, in which the apparatus includes a correlation unit that is provided to use at least one random variation, which is present in the at least two images, of at least one structural element of the photolithographic mask for the correlation of the at least two images.

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus comprises a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections. In a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material or of a non-specified material that is different from a pre-specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

Abstract: Disclosed is a method of inspecting a defect present at a surface portion of a photomask blank which includes an optical film, and a thin film. The method includes: selecting and designating an inspection treatment procedure and a criterion for determination of rugged shape of the defect which correspond to modes of the optical film and the thin film of the photomask blank; applying inspection light to a region including the defect while maintaining a distance between the defect and an objective lens of an inspecting optical system, based on the designated inspection treatment procedure, and collecting reflected light from the region irradiated with the inspection light, as a magnified image of the region, through the inspecting optical system; and determining the rugged shape of the defect, from light intensity distribution of the magnified image, based on the designated criterion for determination.

Abstract: A computer-implemented method for viewing images on an interactive computing device comprises displaying an image from a stack comprising a display image and at least one compressed sub-image of nominally the same scene, each of the sub-images of the stack having been acquired at respective focal distances. Responsive to a user selecting a portion of the displayed image, the selected portion is mapped to a corresponding mapped portion of a sub-image within the stack according to the difference in focal distances between the displayed image and the sub-image. At least one row of compressed image blocks of the at least one sub-image extending across the mapped portion; and a reference value for a point in the compressed image stream of the sub-image preceding the row of compressed image blocks is determined.

Abstract: In certain embodiments, a probe scans a surface to produce a first scan. The first scan is used to estimate a vertical offset for scanning the surface to produce a second scan. In certain embodiments, an AFM device engages a probe to a surface using a piezo voltage. The probe scans the surface to produce a first scan. The first scan is used to estimate a vertical offset such that the probe uses the piezo voltage to engage the surface for a second scan at a different vertical position.

Abstract: The subject matter described herein includes methods, systems, and computer readable media for dual resonance frequency enhanced electrostatic force microscopy. One method includes applying an alternating current (AC) bias and a direct current (DC) bias to an atomic force microscopy cantilever, wherein the AC bias has a frequency greater than a fundamental resonance frequency of the cantilever. The method further includes mechanically vibrating the cantilever at a frequency different from the frequency of the AC bias. The method further includes physically and electrostatically scanning a sample in the same pass using the cantilever while vibrating the cantilever and applying the AC and DC biases to the cantilever, and generating a topology image of the sample from the physical scanning and an electrostatic image of charged material under or on a surface of the sample from the electrostatic scanning.

Abstract: Disclosed is a charged particle beam microscope which can obtain information about pattern materials and stereostructure without lowering throughput of pattern dimension measurement. To achieve this, the charged particle beam microscope acquires a plurality of frame images by scanning the field of view of the sample (S304, 305), adds the images together (S307), computes the dimensions of the pattern formed on the sample (308) and at the same time acquires pattern information (314) using components of a frame image, such as a single frame image or subframe image, as a separated image (309, 310).

Abstract: A sample observation method uses a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample. The method includes maintaining a pressure of the sample chamber higher than that of the vacuum chamber by a thin film which permits the charged particle beam to be transmitted, determining a relation between a height of a lower surface of the thin film and a height of a lower end of a lens barrel of an optical microscope, measuring a distance between the sample and the lens barrel, and setting a distance between the sample and thin film based on the relation and the distance.

Abstract: A method for Transmission Electron Microscopy (TEM) sample creation. The use of a Scanning Electron Microscope (SEM)—Scanning Transmission Electron Microscope (STEM) detector in the dual-beam focused ion beam (FIB)/SEM allows a sample to be thinned using the FIB, while the STEM signal is used to monitor sample thickness. A preferred embodiment of the present invention can measure the thickness of or create TEM and STEM samples by using a precise endpoint detection method. Preferred embodiments also enable automatic endpointing during TEM lamella creation and provide users with direct feedback on sample thickness during manual thinning. Preferred embodiments of the present invention thus provide methods for endpointing sample thinning and methods to partially or fully automate endpointing.

Abstract: The detecting method and detecting device provided in the present disclosure is used for detecting an array substrate, including: scanning a defect on the array substrate and determining a size of the defect; generating a switching controlling command according to the size of the defect and switching a lens to a magnification adapted to the size of the defect; and capturing an image of the defect using the switched lens. In the embodiment, by analyzing the size of the scanned defect and switching the camera lens according to the size of the defect, the switched lens is allowed to capture a complete and clear image of the defect, which eases the analysis of the type of the defect, effectively improves the analyzing accuracy of the defect, and improves the monitoring effect of the manufacturing process.

Abstract: An electro-optical inspection apparatus is provided that is capable of preventing adhesion of dust or particles to the sample surface as much as possible. A stage (100) on which a sample (200) is placed is disposed inside a vacuum chamber (112) that can be evacuated to vacuum, and a dust collecting electrode (122) is disposed to surround a periphery of the sample (200). The dust collecting electrode (122) is applied with a voltage having the same polarity as a voltage applied to the sample (200) and an absolute value that is the same or larger than an absolute value of the voltage. Thus, because dust or particles such as particles adhere to the dust collecting electrode (122), adhesion of the dust or particles to the sample surface can be reduced. Instead of using the dust collecting electrode, it is possible to form a recess on a wall of the vacuum chamber containing the stage, or to dispose on the wall a metal plate having a mesh structure to which a predetermined voltage is applied.

Abstract: Systems and methods are provided for swellable material activation and monitoring in a subterranean well. A sensor system for use in a subterranean well includes a swellable material, and at least one sensor which is displaced to a wellbore surface in response to swelling of the swellable material. Another sensor system includes a sensor which detects swelling of a swellable material. A swellable well tool system includes a base pipe, a swellable material on an exterior of the base pipe, and eccentric weighting for inducing rotation of the swellable material about a longitudinal axis of the base pipe.

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus, the method comprising: a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections, wherein, in a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

Abstract: An imaging region of a high-magnification reference image capable of being acquired in a low-magnification field without moving a stage from a position at which a defective region has been imaged at a low magnification is searched for and if the search is successful, an image of the imaging region itself is acquired and the high-magnification reference image is acquired. If the search is unsuccessful, the imaging scheme is switched to that in which the high-magnification reference image is acquired from a chip adjacent to the defective region.

Abstract: A time-of-flight type mass spectrometer in which, at the time when ions are generated by irradiating a sample with a laser beam, an extraction electric field having a potential gradient that decreases gradually from a sample plate toward an extraction electrode is formed. Ions are roughly separated in accordance with the m/z in the extraction region due to the effect of this electric field, and ions with a large m/z remain near the sample. The voltages applied to the sample plate and an auxiliary electrode are increased after a delay time has passed so as to form an acceleration electric field having a potential gradient with a polygonal line pattern. Since this electric field is similar to an ideal potential gradient curve, it is possible to provide the ions with appropriate potential energy changes for each m/z, improving resolution by appropriately realizing energy convergence over a wide m/z range.

Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

Abstract: The present disclosure is discloses the development of a new device, system, and method that combines advantages of magnetic resonance and atomic force microscopy technologies, and the utility of the new device, system, and method for a wide range of biomedical and clinical researchers. According to one aspect of the present disclosure, a device for micro-scale spectroscopy is disclosed. The micro-scale spectroscopy device includes a beam having a distal end, a proximal end, a top surface and a bottom surface, where the beam is attached to an anchor at the proximal end and further includes a tip extending substantially perpendicular from the bottom surface at or near the distal end, and a coil having at least one turn mounted to the top surface of the beam at or near the distal end opposite the tip, where the coil is capable of both transmitting and sensing electromagnetic radiation.

Abstract: A probe alignment tool (10) for scanning probe microscopes utilizes an attached relay optics to view the scanning probe microscope probe tip (40) and align its image in the center of the field of view of an optical microscope (36). Adjustments to optical microscope motorized stages (50) and (60) along with adjustments of scanning probe microscope stages (44), (46) and (58) allow determination of a path and distance from the center of the field of view to the probe tip (40). From such determination a target area to be examined by the scanning probe microscope may be positioned precisely and accurately under the probe tip (40). Replacement of a scanning probe microscope probe tip (40) in an atomic force microscope unit (42) may be accomplished without the loss of alignment measurements.

Abstract: The present disclosure is discloses the development of a new device, system, and method that combines advantages of magnetic resonance and atomic force microscopy technologies, and the utility of the new device, system, and method for a wide range of biomedical and clinical researchers. According to one aspect of the present disclosure, a device for micro-scale spectroscopy is disclosed. The micro-scale spectroscopy device includes a beam having a distal end, a proximal end, a top surface and a bottom surface, where the beam is attached to an anchor at the proximal end and further includes a tip extending substantially perpendicular from the bottom surface at or near the distal end, and a coil having at least one turn mounted to the top surface of the beam at or near the distal end opposite the tip, where the coil is capable of both transmitting and sensing electromagnetic radiation.

Abstract: The apparatus includes a probe tip configured to scan a substrate having a defect to attach the defect on the probe tip while scanning the substrate, a cantilever configured to integrate a holder holding at least one probe tip, a stage configured to secure the substrate, an electromagnetic radiation source configured to generate the electromagnetic radiation beam, and an electromagnetic radiation detector configured to receive the first electromagnetic radiation signal and the second electromagnetic radiation signal. A first electromagnetic radiation signal is generated while an electromagnetic radiation beam focuses on the probe tip. A second electromagnetic radiation signal is generated while the electromagnetic radiation beam focuses on the sample attached on the probe tip. A chemical analysis of the sample is executed by comparing a difference between the first electromagnetic radiation signal and the second electromagnetic radiation signal.

Abstract: This invention involves measurement of optical properties of materials with sub-micron spatial resolution through infrared scattering scanning near field optical microscopy (s-SNOM). Specifically, the current invention provides substantial improvements over the prior art by achieving high signal to noise, high measurement speed and high accuracy of optical amplitude and phase. Additionally, it eliminates the need for an in situ reference to calculate wavelength dependent spectra of optical phase, or absorption spectra. These goals are achieved via improved asymmetric interferometry where the near field scattered light is interfered with a reference beam in an interferometer. The invention achieves dramatic improvements in background rejection by arranging a reference beam that is much more intense than the background scattered radiation. Combined with frequency selective demodulation techniques, the near-field scattered light can be efficiently and accurately discriminated from background scattered light.

Abstract: The invention refers to a method for analyzing a defect of an optical element for the extreme ultra-violet wavelength range comprising at least one substrate and at least one multi-layer structure, the method comprising the steps: (a) determining first data by exposing the defect to ultra-violet radiation, (b) determining second data by scanning the defect with a scanning probe microscope, (c) determining third data by scanning the defect with a scanning particle microscope, and (d) com-bining the first, the second and the third data.

Abstract: A new method in microscopy is provided which extends the domain of AFM's to nanoscale spectroscopy. Molecular resonance of nanometer features can be detected and imaged purely by mechanical detection of the force gradient between the interaction of the optically driven molecular dipole/multipole and its mirror image in a Platinum coated scanning probe tip. The method is extendable to obtain nanoscale spectroscopic information ranging from infrared to UV and RF.

Abstract: A method of determining an applicable threshold for determining the critical dimension of a category of patterns imaged by atomic force scanning electron microscopy is presented. The method includes acquiring, from a plurality of patterns, a pair of images for each pattern; for each pair of images determining a reference critical dimension via an image obtained by a reference instrumentation and determining an empirical threshold applicable to an image obtained by a CD-SEM instrumentation such that the empirical threshold substantially corresponds to the reference critical dimension; determining a threshold applicable to a category of patterns, the threshold being determined from a plurality of empirical thresholds.

Abstract: Provided is a fusion measurement apparatus which increases or maximizes the reliability of a measurement. The fusion measurement apparatus includes an atomic microscope for measuring a surface of a substrate at an atomic level, an electron microscope for measuring the atomic microscope and the substrate, and at least one electrode which distorts the path of a secondary electron on the substrate covered by a cantilever of the atomic microscope so that the secondary electron proceeds to an electron detector of the electron microscope.

Abstract: Described herein is the analysis of nanomechanical characteristics of cells. In particular, changes in certain local nanomechanical characteristics of ex vivo human cells can correlate with presence of a human disease, such as cancer, as well as a particular stage of progression of the disease. Also, for human patients that are administered with a therapeutic agent, changes in local nanomechanical characteristics of ex vivo cells collected from the patients can correlate with effectiveness of the therapeutic agent in terms of impeding or reversing progression of the disease. By exploiting this correlation, systems and related methods can be advantageously implemented for disease state detection and therapeutic agent selection and monitoring.

Abstract: A disclosed chemical detection system for detecting a target material, such as an explosive material, can include a cantilevered probe, a probe heater coupled to the cantilevered probe, and a piezoelectric element disposed on the cantilevered probe. The piezoelectric element can be configured as a detector and/or an actuator. Detection can include, for example, detecting a movement of the cantilevered probe or a property of the cantilevered probe. The movement or a change in the property of the cantilevered probe can occur, for example, by adsorption of the target material, desorption of the target material, reaction of the target material and/or phase change of the target material. Examples of detectable movements and properties include temperature shifts, impedance shifts, and resonant frequency shifts of the cantilevered probe. The overall chemical detection system can be incorporated, for example, into a handheld explosive material detection system.

Abstract: The magnetic head inspection method includes, exciting the cantilever of a magnetic force microscope at a predetermined frequency, the cantilever being provided with a magnetic probe on the end thereof, floating the magnetic probe over the writing head of the magnetic head and two-dimensionally scanning a search range, detecting the specific position of the writing head based on the search two-dimensional magnetic field intensity of the writing head with exciting state of the cantilever in the two-dimensional scan, setting a shape detection range smaller than the search range for detecting the shape of the writing head based on the specific position, and floating the magnetic probe over the writing head with exciting state of the cantilever, detecting the shape of the writing head by detecting the detection two-dimensional magnetic field intensity of the writing head in the two-dimensional scan.

Abstract: An apparatus, system, and method of integrating atomic force microscopy (AFM) and fluorescence microscopy (FM). One particular application is to simultaneous single molecular fluorescence with AFM force spectroscopy. Included is a methodology to align the AFM tip and a molecule or other nanoscale object with high accuracy.

Abstract: An embodiment includes an integrated microscope including scanning probe microscopy (SPM) hardware integrated with optical microscopy hardware, and other embodiments include related methods and devices.

Abstract: Provided is a friction force microscope that can measure a friction force by a cantilever in a quantitative manner. The friction force microscope includes a friction force calculating mechanism that calculates an effective probe height and a torsional spring constant of the cantilever from bending sensitivity determined from displacement information in a bending direction of the cantilever and torsional sensitivity determined from displacement information in a torsional direction of the cantilever, respectively, so as to use the calculated values for calculating the friction force.

Abstract: An apparatus for performing magnetic resonance force microscopy on one or more large area samples comprising a base plate, one or more heat sink plates coupled to the base plate, one or more suspension mechanisms coupled to the base plate and the heat sink plates, a probe head suspended from the one or more suspension mechanisms for scanning the one or more samples and a sample cylinder comprising a sample stage coupled to the probe head for sample positioning and an outer drum for isolating the sample stage.

Abstract: Described are methods for magnetically actuating microcantilevers and magnetically actuated and self-heated microcantilevers. Also described are methods for determining viscoelastic properties and thermal transition temperatures of materials.

Abstract: A method for positioning a tip of an atomic force microscope relative to a intracellular target site in a cell is provided. In general terms, the method comprises: a) positioning a fluorescent tip of an atomic force microscope over a cell comprising a fluorescent intracellular target site so that said tip is above target site; b) moving the tip toward said target site while obtaining images of the distal end of said tip and/or the target site using a fluorescence microscope; and c) arresting the movement of the tip when the target site and the distal end of the tip are both in focus in the fluorescence microscope. A microscope system for performing the method is also provided.

Abstract: An apparatus for scanning over a surface of an arbitrarily sized sample in magnetic resonance force microscopy comprising a cantilever for holding a magnetic particle at the cantilever tip, an RF antenna, positioned around the cantilever, for emitting an RF magnetic field across a portion of the sample causing spin of particles in the sample to reverse attracting and opposing the magnetic particle at the cantilever tip, an optical fiber, positioned close to the cantilever tip, for measuring displacements of the cantilever tip where the RF antenna, cantilever, magnetic particle and optical fiber are in fixed positions relative to each other and the sample is positionable according to a sample stage.

Abstract: According to one embodiment, a planar positioning device includes a first actuator displaceable in a first axis direction, a second actuator displaceable in a second axis direction perpendicular to the first axis, a first displacement magnifying mechanism configured to magnify a displacement of the first actuator, a second displacement magnifying mechanism configured to magnify a displacement of the second actuator, a stage arranged in a plane, a first drive support mechanism including a parallel link connected between the first displacement magnifying mechanism and the stage to transmit the magnified displacement in the first-axis direction to the stage, a second drive support mechanism including a parallel link connected between the second displacement magnifying mechanism and the stage to transmit the magnified displacement in the second-axis direction to the stage, and a stabilizing support mechanism configured to apply tensions in the first-axis direction and the second-axis direction to the stage.

Abstract: Methods and processes for quantitatively determining the ratio of the metallic to semiconductor tubes in the sample single-wall carbon nanotubes is provided. The single-walled carbon nanotubes can be sonicated to debundle the bulk material. The debundled SWNTs can be coated with a polymer, such as sulfonated polystyrene-block-poly(ethylene-ran-butylene)-block-polystyrene (SDPS), and the coated SWNTs can be deposited on a substrate. The total number of tubes can be determined by atomic force microscopy (AFM). The semiconducting nanotubes can be determined by photoluminescence spectroscopy. The combination of photoluminescence and AFM measurements provides a quantitative ratio of the metallic to semiconductor tubes in the sample.

Abstract: In some embodiments, a system for performing microscopy at hyperbaric pressures includes a hyperbaric chamber that defines a sealed interior space, and an imaging system contained within the interior space that is operated from outside of the hyperbaric chamber to image materials within the interior space at hyperbaric pressures.