Abstract: A system and a method for printing a desired pattern on a substrate, the method may include: receiving or generating printing instructions for printing multiple patterns during multiple printing iterations, wherein at least two different printing iterations are expected to be executed by different sets of nozzles of an array of nozzles, wherein a superposition of the multiple patterns is expected to differ from the desired pattern by a tolerable difference even when a nozzle of the array of nozzles malfunctions; and printing the multiple patterns during multiple during multiple printing iterations, wherein at least two different printing iterations are expected to be executed by different sets of nozzles of the array of nozzles.

Abstract: A method for inspecting a diced object that comprises multiple dies, the method includes: acquiring multiple images of multiple portions of the diced object, starting from a first portion that comprises an alignment area and continuing through adjacent portions of the diced object; assigning a die index to each die of the multiple dies of the diced object, starting from a die of the first portion and continuing through adjacent portions of the diced object; associating between dies of the diced object and a dies of a reference object in response to the assigned indexes and locations of the dies of the diced object; wherein the reference object is not diced; and comparing between a die of the diced object and another die while taking into account an association between the die of the diced object and a reference object die.

Abstract: A method for defect detection using transmissive bright field and transmissive dark field illumination, the method includes: determining a relationship between at least one transmissive bright field illuminator (92) characteristic and at least one transmissive dark field illuminator (91) characteristic in response to at least one characteristic of each defect type out of multiple defect types that should be detected during a defect detection session and in response to at least one phenomenon to be ignored of during the defect detection session; setting the at least one transmissive bright field illuminator (92) characteristic and the at least one transmissive dark field illuminator (91) characteristic according to the determination; illuminating an at least partially transparent object by the transmissive dark field illuminator and by the transmissive bright field illuminator; detecting light that passes through the at least partially transparent object to provide detection signals, and processing the detecte

Abstract: A system and a method for milling and inspecting an object. The method may include performing at least one iteration of a sequence that includes: milling, by a particle beam, a first surface of the object, during a first surface milling period; obtaining, by an electron detector, an image of a second surface of the object during at least a majority of the first surface milling period; wherein the object is expected to comprise an element of interest (EOI) that is positioned between the first and second surfaces; milling, by the particle beam, the second surface of the object during a second surface milling period; wherein each of the first surface milling period and the second surface milling period has a duration that exceeds a long duration threshold; obtaining by the electron detector an image of the first surface of the object during at least a majority of the second surface milling period.

Abstract: A system and a method may be provided. The system may include an illumination module arranged to illuminate an object by short pulses of light that form at least one spot on the object; a collection module that comprises a sensor that is arranged to generate detection signals representative of three dimensional information about the object: and a mechanical stage that is arranged to introduce a movement between the object and at least one of the collection module and the illumination module.

Abstract: A diced wafer adaptor that includes: a cylindrical shaped inner portion, adapted to support and hold an annular frame and a membrane suspended within the annular frame and to apply vacuum to an outer portion of the membrane; wherein an inner portion of the membrane supports a diced wafer and is surrounded by the outer portion of the membrane; and an outer portion having a perimeter shaped substantially as a perimeter of a non-diced wafer.

Abstract: A system and a method for preparing a lamella. The method may include aligning, by the manipulator, a mask and a sample. Positioning the mask and the sample in front of an ion miller while unchanging the spatial relationship between the mask and the sample. Milling a first exposed portion of the sample until exposing a first sidewall of the lamella. Positioning the mask and the sample in front of the ion miller so that the mask masks a second masked portion of the sample. Milling, by the ion miller, the second exposed portion of the sample until exposing a second sidewall of the lamella. Removing, by the miller, matter from both sides of the lamella; and detaching the lamella from the sample.

Abstract: System, computer readable medium and method. The system includes (i) a data obtaining module arranged to obtain data about at least one portion of an inspected article; and (ii) a processor arranged to perform at least one processing operation of the data out of: (a) processing the data to provide the inspection recipe; and (b) processing the data, while utilizing the inspection recipe, to detect defects; wherein the inspection recipe comprises multiple zones of multiple types of zones; wherein a zone of a first type of zones differs from a zone of a second type of zone.

Abstract: An inspection system and a method. The method may include: illuminating the object with impinging light of a first polarization; performing a polarization based filtering of (a) multiple-reflected light signals, each multiple-reflected light signal being reflected from at least two different bevel side surfaces of the object, and (b) additional light signals, each additional light signal being reflected from a single element of the object, such as to suppress the multiple-reflected light signals, and to provide polarization based filtered light signals; and detecting the polarization based filtered light signals.

Abstract: A system and method for a sample, the method may include manipulating a mask and a sample and thereby exposing different sides of the sample to an ion miller. The manipulating may include rotating the mask and the sample while maintaining the spatial relationship between the sample and the mask unchanged.

Abstract: A method and a system for establishing a wafer testing recipe are disclosed. The method may include acquiring images of a number of dice from a produced wafer; using at least part of the images to compose a reference-image; defining on the reference-image multiple “zones of interest; determining the Detection-Policy for each kind of zone of interest and determining the algorithm that will be used by each of the Detection-Policy; determining the parameters of each of the Detection-Policy's algorithms; determining the Reporting-policy; determining the Inspection-policy; and creating a “wafer testing recipe” by integrating of the testing reference of a typical die image, the zones of interest, the Detection-Policies, the parameters of the Detection-Policies' algorithms, the Reporting-Policies and the Inspection-Policies.

Abstract: A system and method for controlling an angular coverage of a light beam. The method includes: defining a non-uniform angular coverage of a first light beam; altering a first spatial relationship between a first movable transmissive deflector and a first light source in response to the definition; directing a first light beam from the first light source through the first movable transmissive deflector such as to provide a first deflected light beam; and focusing the first deflected beam, by a first optical focusing element, to provide a first focused light bean that is focused onto a first area that is characterized by a location that is substantially indifferent to changes in the first spatial relationship.

Abstract: An optical inspection system, the system includes: (i) an image sensor; and (ii) a single optical element, that at least partially surrounds an edge of an inspected object; wherein the optical element is adapted to direct light from different areas of the edge of the inspected object towards the image sensor so that the image sensor concurrently obtains images of the different areas.

Abstract: A method for measuring a depth of a narrow hole, the method includes: obtaining from a chromatic confocal sensor a group of height measurements taken along an imaginary line that crosses the narrow hole; ignoring height measurements attributed to optical artifacts and blind measurement points and calculating an inverted parabolic estimate of a sub-group of the height measurements; wherein a top of the parabolic estimate is representative of a height of a bottom of the narrow hole.

Abstract: A method and a system for preparing a pattern's reference-model to be used for automatic inspection of surface are disclosed. The system according to the present invention is comprised of an imaging device that captured images of plurality of the patters; a dedicated software that uses dedicated algorithms to correct and align the captured images; and a controller operative for collecting the same located and same coincident pixel of each of the images; choosing, according to predetermined criteria, one of the collected pixels; creating a new image with same dimensions as the captured images and locating the chosen pixel in the same place corresponding to the place of the collected pixels in the origin images; repeating the process as defined above for each pixel of the captured images; and providing the new created image as a reference model for inspecting the pattern.

Abstract: A method for macro inspection, the method includes: (i) concurrently illuminating a current group of spaced apart object sub areas; wherein light reflected in a specular manner from a certain object sub area of the current group of object sub areas is expected to be detected by a certain sensor element of a current group of spaced apart sensor elements that correspond to the current group of spaced apart object sub areas; wherein the object sub areas are spaced apart so as to reduce a probability of a detection of non-specular light from the object; wherein each image sub area comprises multiple pixels; (ii) obtaining image information from the current group of spaced apart sensor elements; and (iii) processing at least a portion of the image information to provide an inspection result.

Abstract: A composite structure comprising an extruded polystyrene layer, a mortar layer and a primer layer, wherein at least one surface of the extruded polystyrene layer is planed, and the mortar layer is made from a mortar composition comprising re-dispersible powder, cellulose ether, one or more viscosity modification agents, one or more hydraulic binders, and one or more aggregates. A method of making such a composite structure.

Abstract: A method and an inspection system, the inspection system includes a camera comprising multiple pixels having a pixel width; a mechanical stage, for introducing a movement between an inspected object and optics of the inspection system; wherein the inspected object is expected to move a distance that substantially equals the pixel width during a pixel movement period; an illumination module and optics for illuminating inspected portions of the inspected object and for directing light from the inspected portions to the camera; and wherein the camera is arranged to acquire multiple acquired images of the inspected portions during each pixel movement period, wherein at least two acquired images partially overlap.

Abstract: An inspection system and a method for defect detection, the method includes: generating a first beam that comprises a near infrared spectral component and a visible light component; directing at least the near infrared spectral component of the first beam towards an inspected object; directing, towards a sensor, a near infrared spectral component of a second beam generated from the illuminating of the inspected object; wherein the sensor is sensitive to visual light radiation and to near infrared radiation; generating, by the sensor, detection signals that are responsive to the near infrared component of the second beam; and detecting defects in the inspected object by processing the detection signals.

Abstract: A system for acquiring multiple images of objects, the system includes: a lateral transferor that comprises multiple lateral transferor portions adapted to transfer the objects to a lateral imaging area in a lateral manner; wherein each lateral transferor portion comprises a object receiver and a transfer element; wherein the transfer element moves the object receiver towards an imaging area unless encountering a resistance that is above a predefined resistance; and an imager that is configured to obtain images of two opposite sides of the object when the objects are positioned at the lateral imaging area.