Abstract: A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
Type:
Grant
Filed:
February 3, 2009
Date of Patent:
April 26, 2016
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
Type:
Grant
Filed:
May 19, 2015
Date of Patent:
November 24, 2015
Assignee:
MOLECULAR IMPRINTS, INC.; BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
Inventors:
Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
Type:
Grant
Filed:
March 17, 2014
Date of Patent:
October 27, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Se Hyun Ahn, Byung-Jin Choi, Frank Y. Xu
Abstract: A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.
Type:
Grant
Filed:
June 17, 2010
Date of Patent:
October 20, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Abstract: Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas.
Type:
Grant
Filed:
October 28, 2009
Date of Patent:
September 1, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Michael N. Miller, Cynthia B. Brooks, Laura Anne Brown, Gerard M. Schmid
Abstract: Systems for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
Type:
Grant
Filed:
January 26, 2015
Date of Patent:
July 28, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Abstract: Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.
Type:
Grant
Filed:
May 11, 2011
Date of Patent:
June 30, 2015
Assignee:
Molecular Imprints, Inc.
Inventors:
Shuqiang Yang, Michael N. Miller, Mohamed M. Hilali, Fen Wan, Gerard M. Schmid, Liang Wang, Sidlgata V. Sreenivasan, Frank Y. Xu
Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
Type:
Grant
Filed:
June 5, 2013
Date of Patent:
June 23, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Niyaz Khusnatdinov, Weijun Liu, Frank Y. Xu, Edward Brian Fletcher, Fen Wan
Abstract: Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.
Type:
Grant
Filed:
January 26, 2011
Date of Patent:
March 17, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Gerard M. Schmid, Michael N. Miller, Byung-Jin Choi, Douglas J. Resnick, Sidlgata V. Sreenivasan, Frank Y. Xu, Darren D. Donaldson
Abstract: Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
Type:
Grant
Filed:
April 25, 2012
Date of Patent:
March 3, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Niyaz Khusnatdinov, Kosta S. Selinidis, Joseph Michael Imhof, Dwayne L. LaBrake
Abstract: Control of lateral strain and lateral strain ratio (dt/db) between template and substrate through the selection of template and/or substrate thicknesses (Tt and/or Tb), control of template and/or substrate back pressure (Pt and/or Pb), and/or selection of material stiffness are described.
Type:
Grant
Filed:
April 27, 2011
Date of Patent:
March 3, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard M. Schmid, Mario Johannes Meissl, Anshuman Cherala, Frank Y. Xu, Byung-Jin Choi, Sidlgata V. Sreenivasan
Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.
Type:
Grant
Filed:
August 11, 2010
Date of Patent:
February 24, 2015
Assignees:
Board of Regents, The University of Texas System, Molecular Imprints, Inc.
Inventors:
Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Vikramjit Singh
Abstract: Systems and methods for controlling velocity of a contact line and height profile between a template and a substrate during imprinting of polymerizable material are described.
Type:
Grant
Filed:
December 3, 2008
Date of Patent:
February 3, 2015
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Abstract: Functional nanoparticles may be formed using at least one nanoimprint lithography step. In one embodiment, sacrificial material may be patterned on a multilayer substrate including one or more functional layers between removable layers using an imprint lithography process. At least one of the functional layers includes a functional material such as a pharmaceutical composition or imaging agent. The pattern may be further etched into the multilayer substrate. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Removing the removable layers releases the pillars from the patterned structure to form functional nanoparticles such as drug or imaging agent carriers.
Type:
Grant
Filed:
November 4, 2011
Date of Patent:
December 23, 2014
Assignee:
Molecular Imprints, Inc.
Inventors:
Vikramjit Singh, Frank Y. Xu, Sidlgata V. Sreenivasan
Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
Type:
Grant
Filed:
July 1, 2010
Date of Patent:
December 16, 2014
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
Abstract: A polymerizable composition includes an organic modified silicate selected from the group consisting of silsesquioxanes having the composition RSiO1.5, partially condensed alkoxysilanes, organically modified silicates having the composition RSiO3 and R2SiO2, and partially condensed orthosilicates having the composition SiOR4, where R is an organic substituent; a decomposable organic compound; a photoinitiator; and a release agent. The composition polymerizes upon exposure to UV radiation to form an inorganic silica network, and the decomposable organic compound decomposes upon exposure to heat to form pores in the inorganic silica network. The composition may be used to form a patterned dielectric layer in an integrated circuit device. A metallic film may be disposed on the patterned dielectric layer and then planarized.
Type:
Grant
Filed:
June 29, 2011
Date of Patent:
November 18, 2014
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Inventors:
Frank Y. Xu, Jun Sung Chun, Michael P. C. Watts
Abstract: Detection of periodically repeating nanovoids is indicative of levels of substrate contamination and may aid in reduction of contaminants on substrates. Systems and methods for detecting nanovoids, in addition to, systems and methods for cleaning and/or maintaining cleanliness of substrates are described.
Type:
Grant
Filed:
July 7, 2011
Date of Patent:
November 18, 2014
Assignees:
Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
Type:
Application
Filed:
April 8, 2014
Publication date:
October 30, 2014
Applicant:
Molecular Imprints, Inc.
Inventors:
Sidlgata V. Sreenivasan, Vikramjit Singh, Frank Y. Xu, Byung-Jin Choi
Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
Type:
Application
Filed:
March 17, 2014
Publication date:
October 23, 2014
Applicant:
MOLECULAR IMPRINTS, INC.
Inventors:
Se Hyun Ahn, Byung-Jin Choi, Frank Y. Xu
Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.
Type:
Application
Filed:
April 16, 2014
Publication date:
October 23, 2014
Applicants:
CANON KABUSHIKI KAISHA, Molecular Imprints, Inc.
Inventors:
Makoto Mizuno, Tsuyoshi Arai, Yukio Takabayashi, Steven C. Shackleton, Byung-Jin Choi