Patents Assigned to Molecular Imprints, Inc.
  • Method for adhering materials together
    Patent number: 8557351
    Abstract: The present invention provides a method adhering a layer to a substrate that features defining first and second interfaces by having a composition present between the layer and the substrate that forms covalent bonds to the layer and adheres to the substrate employing one or more of covalent bonds, ionic bonds and Van der Waals forces. In this manner, the strength of the adhering force of the layer to the composition is assured to be stronger than the adhering force of the layer to the composition formed from a predetermined adhering mechanism, i.e., an adhering mechanism that does not include covalent bonding.
    Type: Grant
    Filed: July 22, 2005
    Date of Patent: October 15, 2013
    Assignee: Molecular Imprints, Inc.
    Inventor: Frank Y. Xu
  • Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template
    Patent number: 8556616
    Abstract: A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: October 15, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Critical dimension control during template formation
    Patent number: 8545709
    Abstract: Thickness of a residual layer may be altered to control critical dimension of features in a patterned layer provided by an imprint lithography process. The thickness of the residual layer may be directly proportional or inversely proportional to the critical dimension of features. Dispensing techniques and material selection may also provide control of the critical dimension of features in the patterned layer.
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: October 1, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Cynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael N. Miller, Sidlgata V. Sreenivasan, David James Lentz, Frank Y. Xu
  • Enhanced densification of silicon oxide layers
    Patent number: 8541053
    Abstract: Densifying a multi-layer substrate includes providing a substrate with a first dielectric layer on a surface of the substrate. The first dielectric layer includes a multiplicity of pores. Water is introduced into the pores of the first dielectric layer to form a water-containing dielectric layer. A second dielectric layer is provided on the surface of the water-containing first dielectric layer. The first and second dielectric layers are annealed at temperature of 600° C. or less. In an example, the multi-layer substrate is a nanoimprint lithography template. The second dielectric layer may have a density and therefore an etch rate similar to that of thermal oxide, yet may still be porous enough to allow more rapid diffusion of helium than a thermal oxide layer.
    Type: Grant
    Filed: July 7, 2011
    Date of Patent: September 24, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Marlon Menezes, Frank Y. Xu, Fen Wan
  • EXTRUSION REDUCTION IN IMPRINT LITHOGRAPHY
    Publication number: 20130241109
    Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
    Type: Application
    Filed: January 17, 2013
    Publication date: September 19, 2013
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Niyaz Khusnatdinov, Christopher Ellis Jones, Joseph G. Perez, Dwayne L. LaBrake, Ian Matthew McMackin
  • Large area patterning of nano-sized shapes
    Patent number: 8529778
    Abstract: Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
    Type: Grant
    Filed: November 12, 2009
    Date of Patent: September 10, 2013
    Assignees: Molecular Imprints, Inc., Board of Regents, The University of Texas System
    Inventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Dwayne L. LaBrake
  • LARGE AREA IMPRINT LITHOGRAPHY
    Publication number: 20130214452
    Abstract: Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.
    Type: Application
    Filed: February 21, 2013
    Publication date: August 22, 2013
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Byung-Jin Choi, Se Hyun Ahn, Mahadevan GanapathiSubramanian, Michael N. Miller, Sidlgata V. Sreenivasan
  • Drop pattern generation with edge weighting
    Patent number: 8512797
    Abstract: Imprint lithography may comprise generating a fluid map, generating a fluid drop pattern, and applying a fluid to a substrate according to the fluid drop pattern. The fluid drop pattern may be generated using edge weighting through one or more modified Lloyd's method iterations to result in surface features being substantially filled with the fluid during imprint.
    Type: Grant
    Filed: October 16, 2009
    Date of Patent: August 20, 2013
    Assignee: Molecular Imprints, Inc.
    Inventor: Philip D. Schumaker
  • Template pillar formation
    Patent number: 8512585
    Abstract: Methods for forming an imprint lithography template are provided. Materials for forming the imprint lithography template may be etched at different rates based on physical properties of the layers. Additionally, reflectance of the materials may be monitored to provide substantially uniform erosion of the materials.
    Type: Grant
    Filed: January 18, 2012
    Date of Patent: August 20, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Gary F. Doyle, Gerard M. Schmid, Michael N. Miller, Douglas J. Resnick, Dwayne L. LaBrake
  • Fluid dispense device calibration
    Patent number: 8480933
    Abstract: Systems and methods for calibrating a dispense head to provide substantially uniform droplets on a substrate are described.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: July 9, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Van Nguyen Truskett, Stephen C. Johnson, Niyaz Khusnatdinov, Logan Simpson
  • Nano-imprint lithography templates
    Patent number: 8470188
    Abstract: Porous nano-imprint lithography templates may include pores, channels, or porous layers arranged to allow evacuation of gas trapped between a nano-imprint lithography template and substrate. The pores or channels may be formed by etch or other processes. Gaskets may be formed on an nano-imprint lithography template to restrict flow of polymerizable material during nano-imprint lithography processes.
    Type: Grant
    Filed: October 2, 2009
    Date of Patent: June 25, 2013
    Assignee: Molecular Imprints, Inc.
    Inventor: Marlon Menezes
  • FABRICATION OF SEAMLESS LARGE AREA MASTER TEMPLATES FOR IMPRINT LITHOGRAPHY USING STEP AND REPEAT TOOLS
    Publication number: 20130153534
    Abstract: Described are methods of forming large area templates useful for patterning large area optical devices including e.g. wire grid polarizers (WGPs). Such methods provide for seamless patterning of such large area devices.
    Type: Application
    Filed: December 19, 2012
    Publication date: June 20, 2013
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventor: MOLECULAR IMPRINTS, INC.
  • Alignment for edge field nano-imprinting
    Patent number: 8432548
    Abstract: Systems and methods for alignment of template and substrate at the edge of substrate are described.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: April 30, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Pawan Kumar Nimmakayala, Philip D. Schumaker
  • Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
    Patent number: 8415010
    Abstract: A nano-imprint lithography stack includes a nano-imprint lithography substrate, a non-silicon-containing layer solidified from a first polymerizable, non-silicon-containing composition, and a silicon-containing layer solidified from a polymerizable silicon-containing composition adhered to a surface of the non-silicon-containing layer. The non-silicon-containing layer is adhered directly or through one or more intervening layers to the nano-imprint lithography substrate. The silicon-containing layer includes a silsesquioxane with a general formula (R?(4-2z)SiOz)x(HOSiO1.5)y, wherein R? is a hydrocarbon group or two or more different hydrocarbon groups other than methyl, 1<z<2, and x and y are integers.
    Type: Grant
    Filed: October 19, 2009
    Date of Patent: April 9, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Weijun Liu, Frank Y. Xu
  • In-situ cleaning of an imprint lithography tool
    Patent number: 8394203
    Abstract: Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: March 12, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Gerard M. Schmid, Ian Matthew McMackin, Byung-Jin Choi, Douglas J. Resnick
  • Method and system to control movement of a body for nano-scale manufacturing
    Patent number: 8387482
    Abstract: Systems to control movement of a template during an imprint lithography process are described. The systems include an orientation stage having an inner frame, and outer frame, and a plurality of actuators coupled between the inner frame and the outer frame to vary translational motion and impart angular motion about a plurality of axes.
    Type: Grant
    Filed: November 9, 2010
    Date of Patent: March 5, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Byung-Jin Choi, Sidlgata V. Sreenivasan
  • Imprint alignment method, system and template
    Patent number: 8366434
    Abstract: Sets of lithographic templates providing improved lithographic alignment are described. The sets include at least two templates. The first template has an array of first geometries and the second template has an array of second geometries. The second geometries correspond to the first geometries and at least one second geometry is intentionally offset from its corresponding first geometry.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: February 5, 2013
    Assignee: Molecular Imprints, Inc.
    Inventor: Ronald D. Voisin
  • Facilitating adhesion between substrate and patterned layer
    Patent number: 8361546
    Abstract: Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.
    Type: Grant
    Filed: October 27, 2009
    Date of Patent: January 29, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Edward B. Fletcher, Zhengmao Ye, Dwayne L. LaBrake, Frank Y. Xu
  • Extrusion reduction in imprint lithography
    Patent number: 8361371
    Abstract: Devices positioned between an energy source and an imprint lithography template may block exposure of energy to portions of polymerizable material dispensed on a substrate. Portions of the polymerizable material that are blocked from the energy may remain fluid, while the remaining polymerizable material is solidified.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: January 29, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Christopher Ellis Jones, Joseph G. Perez, Dwayne L. LaBrake, Ian Matthew McMackin
  • Method to arrange features on a substrate to replicate features having minimal dimensional variability
    Patent number: 8349241
    Abstract: The present invention is directed to a method of and a mold for arranging features on a substrate to replicate the features with minimal dimensional variability. The method includes arranging features on a layer to minimize thickness variations in the layer that are attributable to density variations of the plurality of features on the layer. The features are transferred into an underlying substrate. It is believed that by forming the features so as to define a uniform fill factor in the layer, the thickness variations may be reduced, if not abrogated. To that end, one method in accordance with the present invention includes forming a flowable material on the substrate. Thereafter, a plurality of features is formed in a region of the flowable material. The plurality of features are arranged to provide a substantially uniform fill factor in the region.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: January 8, 2013
    Assignee: Molecular Imprints, Inc.
    Inventors: Sidlgata V. Sreenivasan, Michael P. C. Watts