Abstract: A word line pump device of a dynamic random access memory (DRAM) chip and a clamp circuit thereof are provided. The DRAM chip receives a first voltage and a second voltage from outside, and the first voltage is smaller than the second voltage. The clamp circuit clamps a word line voltage to the second voltage in response to the word line pump device not receiving a power supply voltage.

Abstract: The present application discloses a semiconductor device with stacking structures. The semiconductor device includes a bottom die; a first stacking structure including a first controller die positioned on the bottom die, and a plurality of first storage dies stacked on the first controller die; and a second stacking structure including a second controller die positioned on the bottom die, and a plurality of second storage dies stacked on the second controller die. The plurality of first storage dies respectively include a plurality of first storage units configured as a floating array. The plurality of second storage dies include a plurality of second storage units respectively including an insulator-conductor-insulator structure.

Abstract: The present application discloses a semiconductor device and a method for fabricating the semiconductor device. The semiconductor device includes a substrate; a drain region positioned in the substrate; a common source region positioned in the substrate and opposing to the drain region; a bit line structure including a bit line conductive layer positioned on the substrate and electrically coupled to the common source region; a cell contact positioned on the substrate, adjacent to the bit line structure, and electrically connected to the drain region; a landing pad positioned above the bit line conductive layer and electrically connected to the cell contact; and an air gap positioned between the landing pad and the bit line conductive layer.

Abstract: A semiconductor device includes a channel structure, a dielectric structure, a gate structure, a first conductive structure, and a second conductive structure. The channel structure has a top surface, a bottom surface, and a sidewall extending from the top surface to the bottom surface. The first conductive structure is disposed on the bottom surface of the channel structure and includes a body portion and at least one convex portion, and a top surface of the convex portion is higher than a top surface of the body portion. The second conductive structure is disposed on the top surface of the channel structure and includes a body portion and at least one convex portion, and a bottom surface of the body portion is higher than a bottom surface of the convex portion.

Abstract: The present disclosure provides a data storage device. The data storage device includes a first area configured to store a first data; a second area configured to store a second data. The second data is associated with the first data, and the first data and/or the second data exclude an ECC.

Abstract: A semiconductor structure includes a substrate, first and second transistors, first and second fuses, a contact structure, and a dielectric layer. The substrate has first and second device regions, and a fuse region. The first and second transistors are respectively above the first and second device regions. The first fuse is electrically connected to the first transistor and includes a first fuse active region having first and second portions. The second fuse is electrically connected to the second transistor and includes a second fuse active region having third and fourth portions. The contact structure interconnects the second portion and the third portion, wherein the first portion and the fourth portion are on opposite sides of the contact structure. The dielectric layer is between the contact structure and the fuse region of the substrate.

Abstract: An integrated circuit package structure includes a circuit board, an integrated circuit die and a conductive stair structure. The circuit has an upper surface. The integrated circuit die is located on the upper surface of the circuit board. The conductive stair structure is located on the upper surface of the circuit board. The conductive stair structure includes steps along a first direction substantially perpendicular to the upper surface of the circuit board. The steps have different heights relative to the upper surface of the circuit board.

Abstract: A method of manufacturing a semiconductor structure is provided. The method includes providing a semiconductor substrate having an active region, forming a fin structure in the active region, and forming a conductive element on the body portion and the first tapered portion of the fin structure. The fin structure includes a body portion, and a first tapered portion protruding from an upper surface of the body portion.

Abstract: The present disclosure provides a memory device. The memory device includes a substrate, a dielectric layer, a first metallization layer, a first channel layer, a second metallization layer, and a second channel layer. The dielectric layer is disposed on the substrate. The first metallization layer is disposed within the dielectric layer and extends along a first direction. The first channel layer is surrounded by the first metallization layer. The second metallization layer is disposed within the dielectric layer and extends along the first direction. The second channel layer is surrounded by the second metallization layer. The first metallization layer includes a first protruding portion protruding toward the second metallization layer.

Abstract: A method for preparing a semiconductor device, includes: forming a first dielectric structure and a second dielectric structure over a semiconductor substrate; forming a conductive material over the first dielectric structure and the second dielectric structure, wherein the conductive material extends into a first opening between the first dielectric structure and the second dielectric structure; partially removing the conductive material to form a first bit line and a second bit line in the first opening; forming a first capacitor contact and a second capacitor contact in the first dielectric structure and the second dielectric structure, respectively; forming a sealing dielectric layer over the first bit line and the second bit line such that an air gap is formed between the sealing dielectric layer and the semiconductor substrate; and forming a first capacitor and a second capacitor over the first capacitor contact and the second capacitor contact, respectively.

Abstract: A test device method includes: setting a core voltage of a memory device to a first voltage value and a peripheral voltage of the memory device to a second voltage value; testing the memory device by accessing the memory device based on the core voltage and the at least one peripheral voltage; adjusting the core voltage to a third voltage value and the at least one peripheral voltage of the memory device to a fourth voltage value; testing the memory device by reading the memory device based on the core voltage and the at least one peripheral voltage; adjusting the core voltage to a fifth voltage value and the at least one peripheral voltage of the memory device to a sixth voltage value; and testing the memory device by reading the memory device based on the core voltage and the at least one peripheral voltage.

Abstract: The disclosure provides a system to simulate a simulated noise on the power zone block of a substrate. The system comprises a signal trace and a signal generating circuit. The signal trace is disposed adjacent to the power zone block. The signal generating circuit is electrically coupled to the signal trace, configured to transmit an alternating current signal over the signal trace. The alternating current signal transmitted over the signal trace is configured to induce a simulated noise on the power zone block, and a waveform of the simulated noise is determined by a frequency of the alternating current signal.

Abstract: A semiconductor structure includes a substrate, an isolation layer, a dielectric layer, an insulation layer, a conductor and a capping layer. The substrate has a concave portion. The isolation layer is located on a top surface of the substrate. The dielectric layer is located on the isolation layer. The insulation layer is located on a surface of the concave portion and extends to a sidewall of the isolation layer. The conductor is located on the insulation layer in the concave portion. The conductor has a first top surface and a second top surface, and the first top surface is closer to the dielectric layer than the second top surface. The capping layer is located in the concave portion and covers the conductor.

Abstract: A method of manufacturing a semiconductor structure includes the following steps: providing a first semiconductor wafer, wherein the first semiconductor wafer includes a first dielectric layer and at least one first top metallization structure embedded in the first dielectric layer, and a top surface of the first dielectric layer is higher than a top surface of the first top metallization structure by a first distance; providing a second semiconductor wafer, wherein the second semiconductor wafer includes a second dielectric layer and at least one second top metallization structure embedded in the second dielectric layer, and a top surface of the second top metallization structure is higher than a top surface second dielectric layer of the by a second distance; and hybrid-bonding the first semiconductor wafer and the second semiconductor wafer.

Abstract: The present application discloses a chip socket, a testing fixture and a chip testing method thereof. The chip socket includes a pedestal, a plurality of conductive traces, a plurality of clamp structures, and a plurality of electrical contacts. The plurality of conductive traces are formed in the pedestal. The plurality of clamp structures are conductive and disposed on the first surface of the pedestal, and at least one of the plurality of clamp structures is coupled to a corresponding conductive trace and configured to clamp a solder ball of a chip to be tested. The plurality of electrical contacts are disposed on the second surface of the pedestal, and at least one of the plurality of electrical contacts is coupled to a corresponding clamp structure through a corresponding conductive trace.

Abstract: The present disclosure provides a semiconductor structure having a fin structure. The semiconductor includes a substrate defined with an active region. A first gate structure is disposed in the active region and includes a dielectric material. A second gate structure is disposed in the active region and includes the dielectric material. A fin structure having a first top surface is arranged to alternate with the first gate structure and the second gate structure. The first gate structure has a second top surface and the second gate structure has a third top surface. The second top surface and the third top surface are lower than the first top surface.

Abstract: A memory device includes a data array, a parity array and an ECC circuit. The ECC circuit is coupled to the data array and the parity array. In a first test mode, the ECC function of the ECC circuit is disabled, and in a second test mode, the ECC circuit directly accesses the parity array to read or write parity information through the parity array.

Abstract: A fault analysis device and a fault analysis method of the fault analysis device are provided. A sensing circuit senses a first distorted signal on a first signal transmission path of an abnormal signal device when the abnormal signal device performs a preset operation. A signal generating circuit provides a fault test signal to a second signal transmission path of a standard device corresponding to the first signal transmission path when the standard device performs the preset operation, so as to generate a second distorted signal on the second signal transmission path, where the first distorted signal and the second distorted signal have the same signal distortion characteristics.

Abstract: A memory device includes a data array, a parity array and an ECC circuit. The ECC circuit is coupled to the data array and the parity array. In a first test mode, the ECC function of the ECC circuit is disabled, and in a second test mode, the ECC circuit directly accesses the parity array to read or write parity information through the parity array.

Abstract: The present application discloses a method for fabricating a semiconductor device with an oxidized intervention layer. The method includes providing a substrate; forming a tunneling insulating layer over the substrate; forming a floating gate over the tunnel oxide layer; forming a dielectric layer over the floating gate; forming a control gate over the dielectric layer; and performing a lateral oxidation process over the substrate, wherein a process temperature of the lateral oxidation process is between about 300° C. and about 600° C.