Abstract: System and method for developing an ASIC. A software program may be stored which includes program instructions which implement a function. The software program may be executed on a processing system at a desired system speed and may be validated based on the execution. A first hardware description of at least a portion of the processing system may be stored and may specify implementation of at least a portion of the processing system. A second hardware description may be generated that corresponds to a first portion of the first hardware description. The second hardware description may specify a dedicated hardware implementation of a first portion of the software program executing on the processing system. Generation of the second hardware description may be performed one or more times to fully specify the ASIC. An ASIC may be created which implements the function of the software program.

Abstract: A photomask is washed and at least one physical amount of transmittance and phase difference of the photomask, dimension of a pattern, height of the pattern and a sidewall shape of the pattern is measured. After this, the two-dimensional shape of a borderline pattern previously determined for the photomask is measured. Lithography tolerance is derived by performing a lithography simulation for the measured two-dimensional shape by use of the measured physical amount. Then, whether the photomask can be used or not is determined based on the derived lithography tolerance.

Abstract: Methods and systems for simulating logic may translate logic design into executable code for a multi-processor based parallel logic simulation device. A system may implement one or more parallel execution methods, which may include IPMD, MPMD, and/or DDMT.

Abstract: Systems and methods of semiconductor device optimization include a system and method to determine a dataset for a layer of the semiconductor device, where the operation includes receiving a dataset defining a plurality of original patterns of sacrificial material in a layer of a semiconductor device, wherein the original patterns of sacrificial material are used to define placement of spacer material to define patterning of circuit elements for the semiconductor device; determining densities of the plurality of original patterns of sacrificial material in areas across a portion of the layer of the semiconductor device; and augmenting the dataset to include an additional pattern of sacrificial material in an area of the layer having a density lower than a threshold density.

Abstract: Photolithographic process simulation is described in which fast computation of resultant intensity for a large number of process variations and/or target depths (var,zt) is achieved by computation of a set of partial intensity functions independent of (var,zt) using a mask transmittance function, a plurality of illumination system modes, and a plurality of preselected basis spatial functions independent of (var,zt). Subsequently, for each of many different (var,zt) combinations, expansion coefficients are computed for which the preselected basis spatial functions, when weighted by those expansion coefficients, characterize a point response of a projection-processing system determined for that (var, zt) combination. The resultant intensity for that (var,zt) combination is then computed as a sum of the partial intensity functions weighted according to corresponding products of those expansion coefficients.

Abstract: The present invention provides a system and method for generating circuit schematic that includes extracting connectivity data of a plurality of devices from a netlist, categorizing the plurality of devices into groups, placing Schematic Analog Placement Constraints on all the instances by identifying instances among the groups that match with a circuit template (in-built as well as user-specified), creating a BFS instance tree of tree instances, creating a two terminal device clusters and creating instance attachments. Using the constraints during grid based placement and eventually generated schematic which look like analog schematic.

Abstract: A precharacterized cell library for EDA tools includes driver model data includes output current signals indexed by output voltages. The driver model can then generate a model output by interpolating the output current signals using the output voltage to generate an output current. The output current can then be used to generate an updated output voltage across a predetermined time increment. The output current signals can then be interpolated using the updated output voltage to generate a new output current, when can be used to update the output voltage once again across the next time increment. By repeating this process across a time frame for the model output signal, a model output current and output voltage signals can be generated that match the actual output current and voltage signals from a driver in a multi-driver system.

Abstract: The invention provides a method and process for designing an integrated circuit based on using the results from both 1) a specific set of silicon test structure characterizations and 2) the decomposition of logic into combinations of simple logic primitives, from which a set of logic bricks are derived that can be assembled for a manufacturable-by-construction design. This implementation of logic is compatible with the lithography settings that are used for implementation of the memory blocks and other components on the integrated circuit, particularly by implementing geometrically consistent component features. The invention provides the ability to recompile a design comprised of logic and memory blocks onto a new geometry fabric to implement a set of technology-specific design changes, without requiring a complete redesign of the entire integrated circuit.

Abstract: Disclosed are a method and a system for partially removing circuit patterns from a multi-project wafer. This method and this system can be used to provide a multi-project-wafer to a user without disclosing proprietary circuit information of other customers. At least one integrated circuit design of a user is identified from a plurality of integrated circuit designs of a plurality of users. Those unidentified circuits can be totally removed through circuit removing method. Then the modified multi-project wafer can be delivered to the user without concerns about disclosing information of unidentified circuits which belongs to other customers. In one embodiment, a laser system may be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits. In another embodiment, a diamond-blade saw may also be used to totally remove the unidentified integrated circuit designs without impacting the circuit performance of identified circuits.

Abstract: This invention discloses a photomask manufacturing method. A pattern dimensional map is generated by preparing a photomask in which a mask pattern is formed on a transparent substrate, and measuring a mask in-plane distribution of the pattern dimensions. A transmittance correction coefficient map is generated by dividing a pattern formation region into a plurality of subregions, and determining a transmittance correction coefficient for each of the plurality of subregions. The transmittance correction value of each subregion is calculated on the basis of the pattern dimensional map and the transmittance correction coefficient map. The transmittance of the transparent substrate corresponding to each subregion is changed on the basis of the transmittance correction value.

Abstract: A method for developing a circuit is disclosed. The method generally comprises the steps of (A) generating a solution space having a dimension for each of a plurality of parameters for the circuit, (B) evaluating a plurality of instances of the circuit in the solution space through a software simulation, (C) evaluating the instances through a hardware simulation, and (D) updating the instances in response to the software simulation and the hardware simulation to approach an optimum instance of the instances for the circuit.

Abstract: A verification support apparatus that verifies operation of a circuit includes a receiving unit, a detecting unit, and a determining unit. The receiving unit receives implementation description data of the circuit. Based on the implementation description data, the detecting unit detects a functional block that is in the circuit and includes an external input terminal that receives an external input signal. Based on a detection result of the detecting unit, the determining unit determines the functional block to verify an abnormal-event operation. The abnormal-event operation is an operation that differs from an operation implementing a function of the circuit.

Abstract: A method and system for concurrent buffering and layer assignment in integrated current layout. Buffers are inserted and metal interconnects or “wires” are sized for every net, which consists of one driver and one or more receivers, such that timing skew constraints can be met. Long nets are promoted to a higher level if the slew violation can be fixed only by a promotion of the net or if the “slack” gain available by this promotion is equal to or greater than a predesignated layer of promotion threshold. In response to determining these layer assignments, the method and system then systematically demotes nets that are not critical and which do not impact the circuit and electrical constraints in order to minimize the use of high layer wire resources.

Abstract: A method for designing a chip a priori for design subsetting, feature analysis, and yield learning. The method includes identifying a plurality of signal paths within a chip design that can be readily identified from chip fail data and removing a fraction of the plurality of signal paths that have physical design constraints to generate a subset of the plurality of signal paths. The method further includes constructing a physical implementation of each of the signal paths in the subset, identifying one or more signal paths in the subset that are not constructed consistently with the respective physical implementation, and removing those signal paths from the subset.

Abstract: Method and apparatus for providing secure intellectual property (IP) cores for a programmable logic device (PLD) are described. An aspect of the invention relates to a method of securely distributing an IP core for PLDs. A circuit design is generated for the IP core, the circuit design being re-locatable in a programmable fabric for PLDs. The circuit design is encoded to produce at least one partial configuration bitstream. Implementation data is generated for utilizing the IP core as a reconfigurable module in top-level circuit designs. The at least one partial configuration bitstream and the implementation data are delivered to users of the PLDs.

Abstract: State retention cells of a test circuit embedded in an electrical circuit are interconnected to form one or more scan chains. The scan chains are interconnected so that unknown states, or X-states, are shifted through the scan chains in an order other than the order in which the states were captured by the state retention cells of the scan chain. Such reordering of response states in individual scan chains may be used to align the X-states across multiple scan chains to achieve higher test compression scan register circuit testing.

Abstract: After finding the shortest conductive signal return-current path for each signal, the invention assesses whether each conductive return-current path is adequate. The method analyzes each shortest conductive signal return-current path and determines if a significant portion of the signal return current flows as displacement current rather than following the conductive current path. A significant displacement current flows when the length of the conductive return-current path that diverges from a signal net is more than a previously defined limit based on the signal transition time. Further, a significant displacement current flows when the overall length of the signal differs from the overall length of the conductive return-current path by more than a previously defined limit based on the signal transition time.

Abstract: An approach that provides electrically driven optical proximity correction is described. In one embodiment, there is a method for performing an electrically driven optical proximity correction. In this embodiment, an integrated circuit mask layout representative of a plurality of layered shapes each defined by features and edges is received. A lithography simulation is run on the mask layout. An electrical characteristic is extracted from the output of the lithography simulation for each layer of the mask layout. A determination as to whether the extracted electrical characteristic is in conformance with a target electrical characteristic is made. Edges of the plurality of layered shapes in the mask layout are adjusted in response to determining that the extracted electrical characteristic for a layer in the mask layout fails to conform with the target electrical characteristic.

Abstract: A layout design device according to an exemplary aspect of the present invention is a layout design device for designing layout of an integrated circuit, including a routing section for adjacently wiring a signal line having a high activity rate and a signal line having a low activity rate based on an activity rate of the signal line of each circuit element.

Abstract: A method for generating a layout for an integrated circuit having a plurality of sinks and at least one source is disclosed. The source supplies a plurality of signals to the respective plurality of sinks. The method includes: identifying the source which supplies at least one of the respective sinks and having a negative slack; finding all sinks having a negative slack driven by the source; clustering the sinks according to timing and placement information read from a database, yielding a plurality of clusters of sinks, in which each cluster includes only a predetermined portion of the plurality of sinks; generating a plurality of clones associated with a respective one of the clusters of sinks; and coupling the clones to respective ones of the clusters of sinks yielding a second layout.