Abstract: The present invention comprises a method for high tilt angle implantation, with angular precision not previously achievable. An ion beam, having a width and height dimension, is made up of a number of individual beamlets. These beamlets typically display a higher degree of parallelism in one of these two dimensions. Thus, to minimize angular error, the workpiece is tilted about an axis substantially perpendicular to the dimension having the higher degree of parallelism. The workpiece is then implanted at a high tilt angle and rotated about a line orthogonal to the surface of the workpiece. This process can be repeated until the high tilt implantation has been performed in all required regions.

Abstract: A neutral atom trapping device with a multipole-magnetic field-generating electrode is provided with a main current electrode through which main current flows, and a pair of sub-current electrodes through which sub-current flows, and which is located in parallel to and both sides of said main current electrode; a neutral atom trapping device with an S-shaped multipole-magnetic field-generating electrode.

Abstract: An extreme ultra-violet lithographic apparatus for imaging a pattern onto a substrate includes a radiation system constructed and arranged to provide a beam of an extreme ultra-violet radiation, and an absorber arranged in the beam and constructed and arranged to absorb at least a portion of the radiation beam. The absorber has a volume configured to accommodate a flow of an absorbing gas. The flow is directed in a transverse direction with respect to the beam. The absorber includes a structure having an extreme ultra-violet radiation-transmissive beam entry area and an extreme ultra-violet radiation-transmissive beam exit area. The apparatus also includes a gas inlet actuator array configured to inject the gas into the volume and a gas outlet actuator array arranged to evacuate the gas from the volume.

Abstract: The present invention relates to a system and method for mass spectrometry (100) that allows for bi-directional introduction of collections of charged particles into the magnetic field of a mass spectrometer. More particularly, the present invention includes a system for mass spectrometry (100) (e.g., an FTMS mass spectrometer) with a cylindrical magnet (101) configured to receive and measure the cyclotron frequencies (104) of charged particles that are introduced (102, 103) into the cylindrical magnet (101) from either of the two axial ends thereof. Methods of the invention relate to performing mass spectrometry analysis on collections of charged particles that are introduced (102, 103), serially, simultaneously or both, into a cylindrical magnet (101) from opposing axial ends thereof. The present invention exhibits significantly increased magnet throughput relative to currently available devices, by allowing flow in the opposite direction to a second detector, e.g.

Abstract: The invention relates generally to systems, methods and devices for analyzing samples and, more particularly, to systems using tandem differential mobility spectrometers in combination with a mass analyzer to enhance the analysis process of constituents of a sample.

Abstract: A method of transmitting ions along an analyzer region between closely spaced electrodes is disclosed. The method includes providing an analyzer region for transmitting ions, the analyzer region in fluid communication with an ionization source and with an ion detecting device. The method further includes affecting a pressure within at least one portion of the analyzer region, to differ from the pressure within another part of the analyzer region, and providing an electric field that is synchronized with the pressure differences to focus the ions.

Abstract: A gas flow management system may comprise a first and second enclosing walls at least partially surrounding first and second respective spaces; a system generating plasma in the first space, the plasma emitting extreme ultraviolet light; an elongated body restricting flow from the first space to the second space, the body at least partially surrounding a passageway and having a first open end allowing EUV light to enter the passageway from the first space and a second open end allowing EUV light to exit the passageway into the second space, the body shaped to establish a location having a reduced cross-sectional area relative to the first and second ends; and a flow of gas exiting an aperture, the aperture positioned to introduce gas into the passageway at a position between the first end of the body and the location having a reduced cross-sectional area.

Abstract: A method of obtaining pure component mass spectra or pure peak elution profiles from mass spectra of a mixture of components involves estimating number of components in the mixture, filtering noise, and extracting individual component mass spectra or pure peak elution profiles using blind entropy minimization with direct optimization (e.g. downhill simplex minimization). The method may be applied to deconvolution of pure GC/MS spectra of overlapping or partially overlapping isotopologues or other compounds, separation of overlapping or partially overlapping compounds in proteomics or metabolomics mass spectrometry applications, peptide sequencing using high voltage fragmentation followed by deconvolution of the obtained mixture mass spectra, deconvolution of MALDI mass spectra in the separation of multiple components present in a single solution, and specific compound monitoring in security and/or environmentally sensitive areas.

Abstract: The invention relates to an optical substance manipulator capable of continuing to apply a continued force of action to moving substances without being limited by the flowing conditions for the substances yet with a wide manipulation margin and with efficiency, thereby continuously carrying out various manipulations such as separation, concentration, mixing, and deflection. Specifically, the invention provides an optical substance manipulator capable of manipulating microscopic particles dispersed in a flowing fluid by means of light pressure, characterized by comprising an optical system that forms multiple linear light-collective areas simultaneously with respect to a fluid that flows on a subject surface (5), and further comprising, in optical paths forming the respective linear light-collective areas, means (CL1), (CL2) adapted to adjust directions of the linear light-collective areas on the subject surface and means (M1), (M2) adapted to adjust positions of the linear light-collective areas.

Abstract: A lightray treatment device (1) for hardening fingernail modeling compounds has a lightray treatment chamber (3) enclosed in a housing (2) and can be comfortably reached by both the left and right hands of a user of the device (1). The housing (2) has two oppositely located wall openings (6, 7) and a hand support surface (8, 9) with a thumb support (12, 13) assigned to each wall opening (6, 7) in the lightray treatment chamber (3). At least two light sources (10, 11) are arranged in the lightray treatment chamber (3), of which the first light source (10) is used for treating the thumb with light and is arranged in front of the thumb supports (12, 13) of the hand support surfaces (8, 9), and the second light source (11) is arranged in the ceiling of the lightray treatment chamber (3).

Abstract: Methods that include using a noble gas ion beam to determine dopant information for a sample are disclosed, the dopant information including dopant concentration in the sample, dopant location in the sample, or both.

Abstract: Aimed at providing an ion implantation apparatus elongated in period over which failure of a target work, due to deposition and release of ion species typically to and from the inner surface of a through-hole shaping a beam shape of ion beam, may be avoidable, reduced in frequency of exchange of an aperture component, and consequently improved in productivity, an aperture component shaping a beam shape has a taper opposed to the ion beam, in at least a part of inner surface of at least the through-hole, and has a thick thermal-sprayed film formed so as to cover the inner surface and therearound of the through-hole.

Abstract: A scanning electron microscope with a length measurement function includes an electron gun for emitting an electron beam, a measurement target region setting unit for setting a measurement region for a pattern formed on a sample, a storing unit for storing the designated measurement region, a beam blanker unit for controlling an irradiation of the electron beam depending on the measurement region, and a control unit for extracting the designated measurement region from the storing unit, interrupting the electron beam with the beam blanker unit in a region other than the measurement region, irradiating the electron beam onto the sample in the measurement region, capturing an image of the measurement region, and measuring the pattern. The measurement region may be a pair of regions having the same areas as each other.

Abstract: Methods and systems for measuring charges deposited on resistive and/or pixilated electrodes are described. The system includes a Time-of-Flight (TOF) detector with precise timing information provided by a discriminator implemented as a combination of a leading edge discriminator and a constant fraction discriminator. The discriminator initiates acquisition of the peak amplitude for accurate TOF measurements substantially independent of the signal amplitude at the input of the discriminator. The disclosed charge detection electronics has applications for space-based experiments.

Abstract: A device for disinfecting publicly-used equipment includes a plurality of reflective units disposed along the interior of each wall of the device. Each of the reflective units can include a reflective back section and at least three reflective sections disposed about the reflective back section. UV lamps can be disposed to extend along the walls, and at partially disposed adjacent to a one or more reflective back sections of the reflective units. The UV lamps together with the reflective units collectively direct sufficient UV light on the equipment such that the equipment can be disinfected. The walls and ceiling of the device define a tunnel into which the equipment to be disinfected is inserted. Optionally, the device can include a door to prevent children and others from entering the tunnel while the UV lamps are illuminated.

Abstract: A method of evaluating an element that includes the step of preparing a thin evaluation sample including a first portion in which a first layer containing a first material and a second layer containing a second material are laminated, a second portion containing the first material, and a third portion containing the second material; and calculating the thickness of the first layer in the first portion.

Abstract: The invention provides a planar component for interfacing an atmospheric pressure ionizer to a vacuum system. The component combines electrostatic optics and skimmers with an internal chamber that can be filled with a gas at a prescribed pressure and is fabricated by lithography, etching and bonding of silicon.

Abstract: A charged-particle beam writing apparatus includes first and second storage devices, a transfer processor for sequentially sending to the first storage several design data files per pattern layout-defined region, a first data processor which sequentially reads design data files from the first storage and converts each data file's design data into draw data for storage in the second storage while being pipelined with the transfer processing, second to n-th data processors which sequentially read data files from the second storage and apply mutually different ones of second to n-th data processings to each draw data in a way that the first to n-th data processings are pipelined and store the processed draw data in the second storage, and a pattern-writing unit for writing a pattern on a workpiece by using a beam that is controlled based on each n-th data processing-completed data being stored in the second storage.

Abstract: There is provided a collector system. The collector system includes a first collector mirror and a second collector mirror. The first collector mirror receives EUV light from a light source at a first aperture angle via a first beam path, and reflects the EUV light at a second aperture angle along a second beam path. The first aperture angle is larger than or substantially equal to the second aperture angle. The second mirror receives the EUV light from the first mirror at the second aperture angle. The collector is an oblique mirror type normal incidence mirror collector system.

Abstract: A procedure for the preparation of radioisotopes consisting of a first step of electrodepositing a metallic isotope target to be irradiated on a target-holder element, a second step of irradiating the target, a third step of dissolving the target and a fourth set of purifying the radioisotope from the initial metallic isotope and from other possible radioactive and metallic impurities; the electrodeposition step in turn consisting of a dissolution operation in which the isotope to be irradiated is dissolved in a solution of HNO3 with concentration from 0.5 to 2.5 M, a pH buffering operation, and a recirculation operation, in which the solution obtained above is circulated at a rate from 0.5 to 3 within an electrolytic cell during the current output within the cell itself; the electrodeposition of the target to be irradiated occurs within the electrolytic cell during the recirculation operation.