Patents by Inventor Daisuke Shimizu
Daisuke Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11964672Abstract: A passenger transportation system includes: an abnormality determination unit configured to determine whether or not a passenger feeling unwell is present in a vehicle; a transportation planning unit configured to determine, when it is determined that the passenger feeling unwell is present, a medical facility to which the passenger feeling unwell is transported and a via-point where normal passengers are dropped off; and a vehicle control unit configured to control the vehicle to travel so as to transport the passenger feeling unwell to the medical facility via the via-point.Type: GrantFiled: December 1, 2021Date of Patent: April 23, 2024Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Ryota Tomizawa, Shozo Takaba, Ayako Shimizu, Hojung Jung, Daisuke Sato, Yasuhiro Kobatake
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Patent number: 11964342Abstract: A laser processing apparatus includes: a stage 2 capable of levitating and transporting a substrate 3 by jetting gas from a front surface; a laser oscillator configured to irradiate a laser beam 20a onto the substrate 3; and a gas jetting port arranged at a position overlapping a focus point position of the laser beam 20a in plan view, and being configured to jet inert gas. The front surface of the stage 2 is constituted by upper structures 5a and 5b, and the upper structures 5a and 5b are arranged so as to be spaced apart from each other and face each other. A gap between the upper structures 5a and 5b overlaps the focus point position of the laser beam 20a in plan view. A filling member 8 is arranged between the upper structures 5a and 5b so as to fill the gap between the upper structures 5a and 5b.Type: GrantFiled: November 29, 2019Date of Patent: April 23, 2024Assignee: JSW AKTINA SYSTEM CO., LTD.Inventors: Teruaki Shimoji, Daisuke Ito, Tatsuro Matsushima, Ryo Shimizu
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Patent number: 11941990Abstract: A bus dispatch device includes a vehicle dispatch unit that determines, based on external environment information, a ratio between various classes of in-service buses having different states of a specific amenity.Type: GrantFiled: March 22, 2022Date of Patent: March 26, 2024Assignee: TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Ryota Tomizawa, Shozo Takaba, Ayako Shimizu, Hojung Jung, Daisuke Sato, Yasuhiro Kobatake
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Patent number: 11932221Abstract: A system and method control an automobile by decelerating the automobile at a first deceleration using a braking mechanism in response to detecting that a parking brake switch is turned on, a second deceleration which is smaller than the first deceleration, in response to not detecting that the parking brake switch is turned on and determining that the driver is incapacitated, and a third deceleration which is smaller than the first deceleration, in response to determining that an SOS switch is turned on, detecting that the parking brake switch is changed from on to off, and not determining that the driver is incapacitated.Type: GrantFiled: September 23, 2021Date of Patent: March 19, 2024Assignee: MAZDA MOTOR CORPORATIONInventors: Takashi Hamada, Yuma Nishijo, Kouichi Kojima, Yoshiyuki Yamashita, Shinya Kyusaka, Yuta Tsuji, Nobuhiro Nonaka, Daisuke Shimizu, Keigo Fukuda, Yasuhiro Nakashima, Taro Oike
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Publication number: 20240068915Abstract: To improve accuracy of gas analysis. An analysis apparatus is placed on a toilet bowl and collects and analyzes a sample gas in the toilet bowl. The analysis apparatus includes a gas flow generator including a sucker and a discharger and generating a gas flow of the sample gas passing through the inside of the toilet bowl, and an analyzer that analyzes a component contained in the sample gas.Type: ApplicationFiled: March 15, 2022Publication date: February 29, 2024Inventors: Hanako ISHIDA, Shinichi ABE, Daisuke UEYAMA, Etsuro SHIMIZU
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Publication number: 20230402286Abstract: Methods and apparatus for etching a substrate in a plasma etch chamber are provided. In one example, the method includes exposing a substrate disposed on a substrate supporting surface of a substrate support to a plasma within a processing chamber, and applying a voltage waveform to an electrode disposed in the substrate support while the substrate is exposed to the plasma during a plurality of macro etch cycles. Each macro etch cycle includes a first macro etch period and a second macro etch period. The macro etch period includes a plurality of micro etch cycles. Each micro etch cycle has a bias power on (BPON) period and a bias power off (BPOFF) period, wherein a duration of the BPON period being less than a duration of the BPOFF period. Bias power is predominantly not applied to the electrode during the second macro etch period.Type: ApplicationFiled: June 10, 2022Publication date: December 14, 2023Inventors: Daisuke SHIMIZU, Li LING, Hikaru WATANABE, Kenji TAKESHITA
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Patent number: 11813881Abstract: Disclosed is a printing device including: a print head; a finger holder that includes a nail rest on which a nail is placed, and a spring which biases the nail rest in a direction of pushing up the nail rest to locate a printing target surface of the nail placed on the nail rest at a printing position by the print head; and a spacer that presses down the nail rest against a biasing force of the spring.Type: GrantFiled: March 11, 2021Date of Patent: November 14, 2023Assignee: CASIO COMPUTER CO., LTD.Inventor: Daisuke Shimizu
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Patent number: 11760100Abstract: A printing apparatus includes the following. A carriage is capable of holding at least one tank containing ink and performs printing in a printing area in the apparatus. A driver moves the carriage between at least the printing area and a stirring area provided outside the printing area. A stirrer is provided in the stirring area and is capable of stirring the ink in the tank. The stirrer is in a fastened state with the carriage in response to the driver moving the carriage to the stirring area, and stirs the ink in the tank in the fastened state.Type: GrantFiled: January 20, 2022Date of Patent: September 19, 2023Assignee: CASIO COMPUTER CO., LTD.Inventor: Daisuke Shimizu
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Patent number: 11669573Abstract: Provided are an AP node to which a plurality of sensors is connected; and a DB node connected to the AP node. The AP node includes: a receiving unit configured to receive measurement data including values of a plurality of measurement items output from each of the sensors; a queue that stores a most recent value in units of measurement items of each of the sensors; a determination unit configured to refer to the queue and then determine whether the value of each of the measurement items has changed, every time the measurement data is output from each of the sensors; a transmission unit configured to, in a case where there is a measurement item having a value change, generate storage data including the value of the measurement item for each of the measurement items and transmit the generated data to the DB node; and an overwriting unit configured to overwrite the most recent value in the queue with a newest value of the measurement item.Type: GrantFiled: November 8, 2019Date of Patent: June 6, 2023Assignee: Nomura Research Institute, Ltd.Inventors: Yuzo Ishida, Nobuo Suga, Satoshi Otake, Daisuke Shimizu
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Publication number: 20230057145Abstract: A plasma treatment chamber comprises one or more sidewalls and a support surface within the sidewalls holds a workpiece. An array of individual gas injectors is distributed about the sidewalls. Pump ports are along the sidewalls to eject gas from the chamber. Aa etch rate uniformity of a material on the workpiece is controlled by: using the array gas injectors to inject one or more gas flows in across the workpiece; injecting a first gas flow from a first set of adjacent individual gas injectors to etch the materials on the workpiece; and simultaneously injecting a second gas flow from remaining gas injectors. The second gas flow either dilutes the first gas flow to reduce an area on the workpiece having a faster etch rate, or acts as an additional etchant to increase the etch rate in the area of the workpiece having the faster etch rate.Type: ApplicationFiled: June 3, 2022Publication date: February 23, 2023Inventors: DAISUKE SHIMIZU, Kenji Takeshita, James D. Carducci, Li Ling, Hikaru Watanabe, Kenneth S. Collins, Michael R. Rice
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Patent number: 11558524Abstract: Disclosed is a printing device including: a finger stage which has a nail rest, having an identifier, to place a tip of a nail, the nail being a printing target, and on which a finger corresponding to the nail is placed; and at least one camera which obtains an image from a first direction and an image from a second direction. The identifier which detects a position of the nail is provided on one surface of the nail rest such that the identifier does not exist in the image from the first direction but the identifier exists in the image from the second direction.Type: GrantFiled: June 10, 2022Date of Patent: January 17, 2023Assignee: CASIO COMPUTER CO., LTD.Inventor: Daisuke Shimizu
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Publication number: 20220303419Abstract: Disclosed is a printing device including: a finger stage which has a nail rest, having an identifier, to place a tip of a nail, the nail being a printing target, and on which a finger corresponding to the nail is placed; and at least one camera which obtains an image from a first direction and an image from a second direction. The identifier which detects a position of the nail is provided on one surface of the nail rest such that the identifier does not exist in the image from the first direction but the identifier exists in the image from the second direction.Type: ApplicationFiled: June 10, 2022Publication date: September 22, 2022Inventor: Daisuke SHIMIZU
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Publication number: 20220227136Abstract: A printing apparatus includes the following. A carriage is capable of holding at least one tank containing ink and performs printing in a printing area in the apparatus. A driver moves the carriage between at least the printing area and a stirring area provided outside the printing area. A stirrer is provided in the stirring area and is capable of stirring the ink in the tank. The stirrer is in a fastened state with the carriage in response to the driver moving the carriage to the stirring area, and stirs the ink in the tank in the fastened state.Type: ApplicationFiled: January 20, 2022Publication date: July 21, 2022Inventor: Daisuke SHIMIZU
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Patent number: 11381699Abstract: Disclosed is a printing device including: a finger stage which has a nail rest, having an identifier, to place a tip of a nail, the nail being a printing target, and on which a finger corresponding to the nail is placed; and at least one camera which obtains an image from a first direction and an image from a second direction. The identifier which detects a position of the nail is provided on one surface of the nail rest such that the identifier does not exist in the image from the first direction but the identifier exists in the image from the second direction.Type: GrantFiled: July 13, 2021Date of Patent: July 5, 2022Assignee: CASIO COMPUTER CO., LTD.Inventor: Daisuke Shimizu
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Patent number: 11373877Abstract: Methods and apparatus for producing high aspect ratio features in a substrate using reactive ion etching. In some embodiments, a method comprises flowing acetylene gas into a process chamber to produce a diamond like carbon deposition on a pattern mask or on at least one layer of oxide or nitride on the substrate, flowing a gas mixture of a first gas of a hydrofluorocarbon-based gas and a second gas of a fluorocarbon-based gas into the process chamber, forming a plasma from the gas mixture using an RF power source and at least one RF bias power source, performing an anisotropic etch of the at least one layer of oxide or nitride on the substrate using the pattern mask, and evacuating the process chamber while interrupting the RF power source to stop plasma formation.Type: GrantFiled: April 13, 2020Date of Patent: June 28, 2022Assignee: APPLIED MATERIALS, INC.Inventors: Daisuke Shimizu, Taiki Hatakeyama, Shinichi Koseki, Sean S. Kang, Jairaj Joseph Payyapilly, Hikaru Watanabe
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Publication number: 20220153949Abstract: Since most elastomer foam molded bodies use a petroleum-derived resin as a base resin, there is a demand for an elastomer foam molded body with high rebound resilience and low environmental load. An object of the present invention is to provide a foam molded body having a rebound resilience coefficient equivalent to that of a petroleum-derived polyamide-based elastomer foam molded body, and excellent moldability during in-mold foaming; foam particles; and a method for producing the foam molded body. The present invention relates to a polyamide-based elastomer foam molded body comprising 50 to 100 mass % of a block copolymer resin containing a polyamide block as a hard segment and a polyether block as a soft segment, wherein the copolymer resin has a biobased product content as measured by ASTM D6866 of 30% or more.Type: ApplicationFiled: March 16, 2020Publication date: May 19, 2022Applicant: SEKISUI PLASTICS CO., LTD.Inventors: Daisuke SHIMIZU, Yuichi GONDOH
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Publication number: 20220105908Abstract: A system and method control an automobile by decelerating the automobile at a first deceleration using a braking mechanism in response to detecting that a parking brake switch is turned on, a second deceleration which is smaller than the first deceleration, in response to not detecting that the parking brake switch is turned on and determining that the driver is incapacitated, and a third deceleration which is smaller than the first deceleration, in response to determining that an SOS switch is turned on, detecting that the parking brake switch is changed from on to off, and not determining that the driver is incapacitated.Type: ApplicationFiled: September 23, 2021Publication date: April 7, 2022Applicant: Mazda Motor CorporationInventors: Takashi HAMADA, Yuma NISHIJO, Kouichi KOJIMA, Yoshiyuki YAMASHITA, Shinya KYUSAKA, Yuta TSUJI, Nobuhiro NONAKA, Daisuke SHIMIZU, Keigo FUKUDA, Yasuhiro NAKASHIMA, Taro OIKE
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Publication number: 20220084795Abstract: Embodiments disclosed herein include a plasma treatment chamber, comprising one or more sidewalls. A support surface within the one or more sidewalls holds a workpiece. A first gas injector along the one or more sidewalls injects a first gas flow in a first direction generally parallel to and across a surface of the workpiece. A first pump port along the one or more sidewalls generally opposite of the first gas injector pumps out the first gas flow. A second gas injector along the one or more sidewalls injects a second gas flow in a second direction generally parallel to and across the surface of the workpiece. A second pump port along the one or more sidewalls generally opposite of the second gas injector pumps out the second gas flow. The first and second gas flows comprise a process gas mixture and/or an independent gas injection (IGI) mixture.Type: ApplicationFiled: November 4, 2021Publication date: March 17, 2022Inventors: Kenneth S. Collins, Michael R. Rice, James D. Carducci, Daisuke Shimizu
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Patent number: 11246825Abstract: The present invention provides a composition that has an excellent hardness adjustment action, can be used as a solidifying agent for various cosmetics, and when added to cosmetics, can impart those cosmetics with excellent shape retention properties, an oil oozing suppression effect during use, a favorable texture and good storage stability, and also provides an oily solid cosmetic to which the composition has been added. Specifically, the invention provides a solid wax composition containing a component (A): candelilla wax, and a component (B): a monoester having a total of 40 to 48 carbon atoms, wherein the mass ratio between the component (A) and the component (B) in the solid wax composition satisfies component (A):component (B)=45:55 to 95:5, and the monoester is a monoester of a monovalent fatty acid and a monohydric alcohol.Type: GrantFiled: June 21, 2019Date of Patent: February 15, 2022Assignee: The Nisshin OilliO Group, Ltd.Inventors: Masashi Shibata, Daisuke Shimizu, Hisanori Kachi
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Publication number: 20220021780Abstract: Disclosed is a printing device including: a finger stage which has a nail rest, having an identifier, to place a tip of a nail, the nail being a printing target, and on which a finger corresponding to the nail is placed; and at least one camera which obtains an image from a first direction and an image from a second direction. The identifier which detects a position of the nail is provided on one surface of the nail rest such that the identifier does not exist in the image from the first direction but the identifier exists in the image from the second direction.Type: ApplicationFiled: July 13, 2021Publication date: January 20, 2022Inventor: Daisuke SHIMIZU