Abstract: Methods and apparatus for producing high aspect ratio features in a substrate using reactive ion etching (RIE). In some embodiments, a method comprises flowing a gas mixture of C3H2F4 and a companion gas into a process chamber, forming a plasma from the gas mixture using an RF power source connected to an upper electrode above the substrate and at least one RF bias power source connected to a lower electrode under the substrate, performing an anisotropic etch, via the plasma, of at least one layer of oxide or nitride on the substrate using a pattern mask, reducing power of the at least one RF bias power source to produce deposition of a passivation layer on the at least one layer of oxide or nitride on the substrate, and evacuating the process chamber while interrupting the RF power source to stop plasma formation.

Abstract: Methods for RF pulse reflection reduction are provided herein. In some embodiments, a method for processing a substrate in a plasma enhanced substrate processing system using multi-level pulsed RF power includes; receiving a process recipe for processing the substrate that includes a plurality of pulsed RF power waveforms from a plurality of RF generators, using the master RF generator to generate a transistor-transistor logic (TTL) signal having a base frequency and a first duty cycle, setting a multiplier for each RF generator, dividing the first duty cycle into a high level interval and a low level interval, determining a frequency command set for each RF generator and sending the frequency command set to each RF generator, wherein the frequency command set includes a frequency set point for each RF generator; and providing the plurality of pulsed RF power waveforms from the plurality of RF generators to a process chamber.

Abstract: A motor controller includes an energization pattern determiner that determines an energization pattern that specifies a coil to be energized, and a current supply that, assuming that an energization period is a time from determination of the energization pattern to determination of a next energization pattern, supplies a current to a coil specified by the energization pattern in the energization period. The current supply includes a first operation mode in which the energization period is only a supply period that supplies a current, and a second operation mode in which the energization period includes the supply period and a stop period that stops current supply.

Abstract: Methods and apparatuses for etching oxide-nitride stacks to form features that include high aspect ratio features are discussed herein. The methods include providing an ionizable gas mixture to a processing chamber of an etch reactor. The ionizable gas mixture includes C3H2F4 and a companion gas such a fluorocarbon. The ionizable gas mixture may be introduced to the chamber along with a carrier gas such as O2 in addition to inert gases and other process gases. A plasma is formed from the ionizable gas mixture and etches the stack such that the etch selectivity of the stack is 1:1.

Abstract: A motor controller includes an energization pattern determiner that determines an energization pattern that specifies a coil to be energized from coils of multiple phases and a current supply that supplies a current to the coil based on the energization pattern. The energization pattern determiner includes, assuming that an energization period is a time from determination of the energization pattern to determination of the next energization pattern, a first operation mode in which the energization period is determined based on a rotation speed of the rotor, and a second operation mode in which the energization period is longer than in the first operation mode. At the start of activation, the energization pattern determiner passes through multiple energization periods in the second operation mode, and then shifts to the first operation mode.

Abstract: The present invention provides a composition that has an excellent hardness adjustment action, can be used as a solidifying agent for various cosmetics, and when added to cosmetics, can impart those cosmetics with excellent shape retention properties, an oil oozing suppression effect during use, a favorable texture and good storage stability, and also provides an oily solid cosmetic to which the composition has been added. Specifically, the invention provides a solid wax composition containing a component (A):candelilla wax, and a component (B): a monoester having a total of 40 to 48 carbon atoms, wherein the mass ratio between the component (A) and the component (B) in the solid wax composition satisfies component (A):component (B)=45:55 to 95:5, and the monoester is a monoester of a monovalent fatty acid and a monohydric alcohol.

Abstract: Embodiments include a plasma processing method for cleaning polymer byproducts from interior surfaces of the plasma chamber. In an embodiment the plasma process may include processing a workpiece in a plasma processing chamber. Thereafter, the method may include removing the workpiece from the processing chamber. After the workpiece is removed, embodiments may include cleaning the plasma processing chamber with a cleaning process that includes a high pressure cleaning process, a first low pressure cleaning process, and a second low pressure cleaning process, wherein the second low pressure cleaning process includes applying a pulsed bias.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate in which a pattern is defined on one major surface, a charge supply step of supplying a charge of one polarity to the substrate, a first voltage application step of applying, in parallel with the charge supply step, a voltage of the other polarity to a first electrode arranged on the other major surface of the substrate through a dielectric member, a second voltage application step of applying, after the first voltage application step, a voltage of the one polarity to the first electrode while keeping a state where a ground connection of the substrate is released and a drying step of removing, in parallel with the second voltage application step, a liquid from the one major surface of the substrate so as to dry the substrate.

Abstract: A waste ink case includes a container. The container houses an ink absorber that absorbs ink. The container includes an ink introducing port, an exhaust vent, and a partition wall. Through the ink introducing port, the ink is introduced from a print head into the container. Through the exhaust vent, air in the container is exhausted. The partition wall acts as an obstruction between the ink introducing port and the exhaust vent. The ink absorber is provided along a ventilation passage. The ventilation passage is from the ink introducing port to the exhaust vent, detouring around the partition wall.

Abstract: A coating-forming composition for an electrical steel sheet that maintains excellent insulating properties, corrosion resistance, adhesion, and the like required in a coating for an electrical steel sheet, and exhibits excellent viscosity stability, with an increase in viscosity over time being kept gradual. A coating-forming composition for an electrical steel sheet comprises colloidal silica, a phosphate, phenylphosphonic acid or a salt thereof, and an aqueous medium.

Abstract: Provided is a surface treatment agent for a metal material with which it is possible to produce a surface-treated metal material that has excellent initial anti-rust properties without being coated with an anti-rust oil, excellent lubrication properties, and excellent anti-corrosion and adhesion properties in a coating film for which phosphate-based chemical conversion treatment, zirconium-based chemical conversion treatment, or other coating underlay processing is omitted. This surface treatment agent for a metal material contains: a zirconium compound; an aqueous epoxy resin having in the skeleton thereof a carboxyl-group-containing polymer that includes a repeated unit derived from a carboxyl-group-containing vinyl monomer, said aqueous epoxy resin also having an acid value of 5-50 mg KOH/g; and a hydroxycarboxylic acid.

Abstract: A drawing device, including: a drawing head which performs drawing on a drawing target; a head moving unit which moves the drawing head in a first direction and in a second direction which intersects with the first direction; a processor which controls the drawing head and the head moving unit; and a plurality of maintenance units in which the drawing head performs maintenance with contents different from each other, wherein within a range where the drawing head is moved by the head moving unit, a drawing area, a stand-by area and the plurality of maintenance units are provided at positions different from each other, and the processor controls the head moving unit to control whether the maintenance is performed or not in at least one of the plurality of maintenance units when the drawing head moves between the stand-by area and the drawing area.

Abstract: An object of the present invention is to provide a readily thermally degradable resin binder that is an organic resin binder for use as a binder component in a high-concentration inorganic microparticle dispersion, and that enables firing in a firing process to be carried out at lower temperatures and can inhibit the production of carbon residues, while maintaining the printing characteristics. This object can be achieved by a mixture formed of a specific (meth)acrylic resin and an ethyl cellulose resin in a weight ratio of 5:95 to 50:50. This specific (meth)acrylic resin is a (meth)acrylic polymer having a weight-average molecular weight of 1,000 to 250,000 and having a monomer unit given by the following general formula (1) [in the formula, R1 represents hydrogen or a methyl group and R2 represents hydrogen or a C1-12 straight-chain hydrocarbon group, branched-chain hydrocarbon group or hydroxyl group-bearing hydrocarbon group, or a polyalkylene oxide-containing group].

Abstract: A holding apparatus includes an insertion space into which an object, namely a finger or a toe including a nail, is inserted; and a plurality of pressing members disposed in the insertion space along an insertion direction of the object into the insertion space, that hold the object inserted into the insertion space in the insertion space. In such a holding apparatus, the insertion space includes an object holding wall provided at a position capable of contacting the object inserted into the insertion space; each of the plurality of pressing members is capable of movement in a first direction pressing the object to a side of the holding wall and a second direction opposite the first direction, and is biased toward the first direction; and a biasing force biasing the a first pressing member of the plurality of pressing members disposed relatively at a back side in the insertion direction is greater than biasing forces biasing the other pressing members.

Abstract: A drawing apparatus is provided. In the apparatus plural drawing tools for applying ink on an object are held by plural drawing tool holding units respectively. A drawing unit takes one of the plural drawing tools from the plural drawing tool holding units to draw an image on the object. An imaging unit images an identification image, which includes first information representing colors of inks to be applied respectively by the plural drawing tools and second information representing an arrangement of the plural drawing tools held in the plural drawing tool holding units. A controlling unit controls the drawing unit to draw a design image having at least one color on the object, based on the first and second information included in the identification image and the color of the design image.

Abstract: Methods of operating a plasma enhanced substrate processing system using multi-level pulsed RF power are provided herein. In some embodiments, a method of operating a plasma enhanced substrate processing system using multi-level pulsed RF power includes providing a first multi-level RF power waveform to a process chamber, the first multi-level RF power waveform having at least a first power level, a second power level, and a third power level, providing, after a first delay period, a second multi-level RF power waveform to the process chamber, the second multi-level RF power waveform having at least a first power level, a second power level, and a third power level, and processing the substrate using the first multi-level RF power waveform and the second multi-level RF power waveform to produce a features on the substrate have an aspect ratio of greater than 60:1 while maintaining an etch rate of greater than 170 nm/min.

Abstract: The present invention provides a method for producing a polymer by efficiently removing residue of metals such as titanium, aluminum and lithium from a polymer solution containing the residue of these metals to successfully obtain a purified polymer solution containing a smaller amount of the metal residue and having satisfactory color tone and transparency, a polymer solution and a polymer obtained by the production method.

Abstract: A holding apparatus including an object holding wall and a plurality of pressing members which is movable in a first direction to the object holding wall. An insertion space is formed by the plurality of pressing members and the object holding wall, and an object that is a finger or a toe having a nail is inserted into the insertion space, and the object holding wall is provided in a position that restricts movement of the object inserted into the insertion space in the first direction. An end of the object inserted into the insertion space is closer to one of the plurality of pressing members than the other of the plurality of pressing members, and each of the plurality of pressing members applies a biasing force to the object inserted such that the biasing force applied by the one of the plurality of pressing members is greater than biasing forces applied by the other of the plurality of pressing members.

Abstract: Methods of operating a plasma enhanced substrate processing system using multi-level pulsed RF power are provided herein. In some embodiments, a method of operating a plasma enhanced substrate processing system using multi-level pulsed RF power includes providing a first multi-level RF power waveform to a process chamber, the first multi-level RF power waveform having at least a first power level during a first pulse duration, a second power level during a second pulse duration, and a third power level during a third pulse duration, and providing, after a first delay period, a second multi-level RF power waveform to the process chamber, the second multi-level RF power waveform having at least a first power level during a first pulse duration, a second power level during a second pulse duration, and a third power level during a third pulse duration.

Abstract: An article having alternating oxide layers and nitride layers is etched by an etch process. The etch process includes providing a first gas comprising C4F6H2 in a chamber of an etch reactor, ionizing the C4F6H2 containing gas to produce a plasma comprising a plurality of ions, and etching the article using the plurality of ions.