Patents by Inventor Daisuke Shimizu

Daisuke Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170099722
    Abstract: Methods of operating a plasma enhanced substrate processing system using multi-level pulsed RF power are provided herein. In some embodiments, a method of operating a plasma enhanced substrate processing system using multi-level pulsed RF power includes providing a first multi-level RF power waveform to a process chamber, the first multi-level RF power waveform having at least a first power level during a first pulse duration, a second power level during a second pulse duration, and a third power level during a third pulse duration, and providing, after a first delay period, a second multi-level RF power waveform to the process chamber, the second multi-level RF power waveform having at least a first power level during a first pulse duration, a second power level during a second pulse duration, and a third power level during a third pulse duration.
    Type: Application
    Filed: October 14, 2015
    Publication date: April 6, 2017
    Inventors: KATSUMASA KAWASAKI, SERGIO FUKUDA SHOJI, JUSTIN PHI, DAISUKE SHIMIZU
  • Publication number: 20170073831
    Abstract: A composition for direct-current cathodic electrolysis. The composition is capable of forming a lubrication-film-equipped metal material exhibiting excellent lubrication properties and excellent chemical conversion properties after degreasing. This composition for direct-current cathodic electrolysis includes: (A) at least one metal ion selected from the group consisting of typical metal ions (excluding zinc ion) having a valency of at least 2 and rare-earth-element ions, or a complex thereof; (B) an organic acid compound including, in the molecule thereof, a carboxyl group, and a straight-chain alkylene group having at least 4 carbon atoms; and (C) water.
    Type: Application
    Filed: February 16, 2015
    Publication date: March 16, 2017
    Inventors: Ryosuke KAWAGOSHI, Daisuke SHIMIZU
  • Publication number: 20170065051
    Abstract: A drawing apparatus is provided. In the apparatus plural drawing tools for applying ink on an object are held by plural drawing tool holding units respectively. A drawing unit takes one of the plural drawing tools from the plural drawing tool holding units to draw an image on the object. An imaging unit images an identification image, which includes first information representing colors of inks to be applied respectively by the plural drawing tools and second information representing an arrangement of the plural drawing tools held in the plural drawing tool holding units. A controlling unit controls the drawing unit to draw a design image having at least one color on the object, based on the first and second information included in the identification image and the color of the design image.
    Type: Application
    Filed: August 10, 2016
    Publication date: March 9, 2017
    Applicant: CASIO COMPUTER CO., LTD.
    Inventor: Daisuke SHIMIZU
  • Patent number: 9589832
    Abstract: One or more openings in an organic mask layer deposited on a first insulating layer over a substrate are formed. One or more openings in the first insulating layer are formed through the openings in the organic mask using a first iodine containing gas. An antireflective layer can be deposited on the organic mask layer. One or more openings in the antireflective layer are formed down to the organic mask layer using a second iodine containing gas. The first insulating layer can be deposited on a second insulating layer over the substrate. One or more openings in the second insulating layer can be formed using a third iodine containing gas.
    Type: Grant
    Filed: November 4, 2013
    Date of Patent: March 7, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Daisuke Shimizu, Jong Mun Kim
  • Patent number: 9546240
    Abstract: The present invention is related to a method for producing a polymer to efficiently remove metal residues of at least lithium and/or titanium from a polymer solution comprising the at least lithium and/or titanium to thereby obtain a refined polymer solution having little metal residue.
    Type: Grant
    Filed: April 24, 2013
    Date of Patent: January 17, 2017
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Daisuke Shimizu, Kenta Shibuya
  • Patent number: 9493623
    Abstract: The present invention provides a crosslinked foam having an excellent balance of various physical properties in terms of lightness, flexibility, permanent compression set, tear strength, impact resilience, and molding stability; a shoe midsole; and a crosslinkable and foamable composition that provides the crosslinked foam and shoe midsole. A crosslinkable and foamable composition comprising (A) an ethylene-based copolymer; (B) a copolymer comprising a vinyl aromatic monomer unit and an unsaturated bond-containing a conjugated diene monomer unit; (C) an organic peroxide; and (D) a foaming agent; a mass ratio of the component (A) to the component (B), (A/B), being from 97/3 to 50/50; and the component (B) comprising 5 mass % or more and 80 mass % or less of the vinyl aromatic monomer unit, and 5 mass % or more and 55 mass % or less of the conjugated diene monomer unit.
    Type: Grant
    Filed: December 21, 2009
    Date of Patent: November 15, 2016
    Assignee: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Daisuke Shimizu, Yoshifumi Araki, Katsumi Suzuki, Yasuhiro Kusanose, Mika Horiuchi
  • Patent number: 9464208
    Abstract: This invention provides a viscosity modifier for high concentration dispersion of inorganic fine particles which can reduce, by giving excellent viscosity modifying function to a high concentration dispersion of inorganic fine particles (e.g., printing ink composition, functional paste composition or paint composition, of high concentration dispersion of inorganic fine particles), the occurrence of inconvenience in a printing step or coating step for the manufacture of components or substrates, and also provides a high concentration dispersion of inorganic fine particles which contains said viscosity modifier.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: October 11, 2016
    Assignee: KUSUMOTO CHEMICALS, LTD.
    Inventors: Daisuke Shimizu, Junpei Suetou, Chihiro Hamazaki, Kenichi Asano, Hideki Satake, Eiichi Sato
  • Publication number: 20160244884
    Abstract: Provided is a surface treatment agent for a metal material with which it is possible to produce a surface-treated metal material that has excellent initial anti-rust properties without being coated with an anti-rust oil, excellent lubrication properties, and excellent anti-corrosion and adhesion properties in a coating film for which phosphate-based chemical conversion treatment, zirconium-based chemical conversion treatment, or other coating underlay processing is omitted. This surface treatment agent for a metal material contains: a zirconium compound; an aqueous epoxy resin having in the skeleton thereof a carboxyl-group-containing polymer that includes a repeated unit derived from a carboxyl-group-containing vinyl monomer, said aqueous epoxy resin also having an acid value of 5-50 mg KOH/g; and a hydroxycarboxylic acid.
    Type: Application
    Filed: October 18, 2013
    Publication date: August 25, 2016
    Inventors: Eisuke KUDO, Yoshikazu NAMAI, Daisuke SHIMIZU
  • Patent number: 9365706
    Abstract: A crosslinked composition is obtained by crosslinking a composition, containing: 1 to 99 parts by mass of a vinyl aromatic copolymer rubber (I) comprising 5 to 70% by mass of a vinyl aromatic monomer unit and 0.1 to 30% by mass of a conjugated diene monomer unit and having one or more tan ? peak temperatures between 75° C. and 125° C.; 99 to 1 parts by mass of an ethylenic copolymer rubber (II); 10 to 100 parts by mass of an olefinic resin (III) based on 100 parts by mass of a total amount of the vinyl aromatic copolymer rubber (I) and the ethylenic copolymer rubber (II); and 0.01 to 50 parts by mass of a crosslinking agent (IV) based on 100 parts by mass of the total amount of the vinyl aromatic copolymer rubber (I) and the ethylenic copolymer rubber (II).
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: June 14, 2016
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Daisuke Shimizu, Yoshifumi Araki, Katsumi Suzuki
  • Publication number: 20160130457
    Abstract: An object of the present invention is to provide a readily thermally degradable resin binder that is an organic resin binder for use as a binder component in a high-concentration inorganic microparticle dispersion, and that enables firing in a firing process to be carried out at lower temperatures and can inhibit the production of carbon residues, while maintaining the printing characteristics. This object can be achieved by a mixture formed of a specific (meth)acrylic resin and an ethyl cellulose resin in a weight ratio of 5:95 to 50:50. This specific (meth)acrylic resin is a (meth)acrylic polymer having a weight-average molecular weight of 1,000 to 250,000 and having a monomer unit given by the following general formula (1) [in the formula, R1 represents hydrogen or a methyl group and R2 represents hydrogen or a C1-12 straight-chain hydrocarbon group, branched-chain hydrocarbon group or hydroxyl group-bearing hydrocarbon group, or a polyalkylene oxide-containing group].
    Type: Application
    Filed: October 20, 2015
    Publication date: May 12, 2016
    Applicant: KUSUMOTO CHEMICALS, LTD.
    Inventors: Daisuke SHIMIZU, Kenichi ASANO, Takuro MATSUMOTO
  • Patent number: 9299574
    Abstract: Multilayered stacks having layers of silicon interleaved with layers of a dielectric, such as silicon dioxide, are plasma etched with non-corrosive process gas chemistries. Etching plasmas of fluorine source gases, such as SF6 and/or NF3 typically only suitable for dielectric layers, are energized by pulsed RF to achieve high aspect ratio etching of silicon/silicon dioxide bi-layers stacks without the addition of corrosive gases, such as HBr or Cl2. In embodiments, a mask open etch and the multi-layered stack etch are performed in a same plasma processing chamber enabling a single chamber, single recipe solution for patterning such multi-layered stacks. In embodiments, 3D NAND memory cells are fabricated with memory plug and/or word line separation etches employing a fluorine-based, pulsed-RF plasma etch.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: March 29, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Daisuke Shimizu, Jong Mun Kim
  • Publication number: 20160086771
    Abstract: Multilayered stacks having layers of silicon interleaved with layers of a dielectric, such as silicon dioxide, are plasma etched with non-corrosive process gas chemistries. Etching plasmas of fluorine source gases, such as SF6 and/or NF3 typically only suitable for dielectric layers, are energized by pulsed RF to achieve high aspect ratio etching of silicon/silicon dioxide bi-layers stacks without the addition of corrosive gases, such as HBr or Cl2. In embodiments, a mask open etch and the multi-layered stack etch are performed in a same plasma processing chamber enabling a single chamber, single recipe solution for patterning such multi-layered stacks. In embodiments, 3D NAND memory cells are fabricated with memory plug and/or word line separation etches employing a fluorine-based, pulsed-RF plasma etch.
    Type: Application
    Filed: December 4, 2015
    Publication date: March 24, 2016
    Inventors: Daisuke Shimizu, Jong Mun Kim
  • Publication number: 20160068653
    Abstract: A composition containing an oxide of titanium contains a conjugated dienic polymer and the oxide of titanium, wherein the content of the oxide of titanium is 0.10 to 75 ppm by mass in terms of titanium atom, and the average particle diameter of the oxide of titanium is 1.0 to 100 ?m.
    Type: Application
    Filed: April 23, 2014
    Publication date: March 10, 2016
    Applicant: ASAHI KASEI CHEMICALS CORPORATION
    Inventors: Kosuke Nakatani, Kenta Shibuya, Daisuke Shimizu
  • Patent number: 9269587
    Abstract: Embodiments of the present invention provide methods for etching a material layer using synchronized RF pulses. In one embodiment, a method includes providing a gas mixture into a processing chamber, applying a first RF source power at a first time point to the processing chamber to form a plasma in the gas mixture, applying a first RF bias power at a second time point to the processing chamber to perform an etching process on the substrate, turning off the first RF bias power at a third time point while continuously maintaining the first RF source power on from the first time point through the second and the third time points, and turning off the first RF source power at a fourth time point while continuously providing the gas mixture to the processing chamber from the first time point through the second, third and fourth time points.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: February 23, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Daisuke Shimizu, Jong Mun Kim, Katsumasa Kawasaki, Sergio Fukuda Shoji
  • Publication number: 20150328538
    Abstract: In a configuration to receive change of positions of a plurality of types of objects arranged in a game screen game screen from a player, to determine whether positional relationship of a plurality of objects satisfies a matching condition by the change of positions of objects, to extend reception of an input of the change of positions of objects by the player when the matching condition is satisfied, and to provide an effect on a game according to the satisfied matching condition, the effect on a game according to the matching condition is provided when the matching condition is satisfied by the change of positions of objects made by the extended reception of an operation of objects.
    Type: Application
    Filed: May 13, 2015
    Publication date: November 19, 2015
    Inventors: Akio OYAMA, Daisuke SHIMIZU
  • Publication number: 20150311850
    Abstract: An electric motor drive system includes an electric motor including windings for separate phases including a center tap, a winding for a low-speed rotation located between the center tap and a winding start terminal, and a winding for a high-speed rotation located between the center tap and a winding end terminal; an inverter configured to supply an inverter electric current to the winding of each phase; a first winding switch portion configured to open and close connection between the inverter and the winding start terminal, and a second winding switch portion configured to open and close connection between the inverter and the center tap of the winding of each phase; and a controller configured or programmed to control opening and closing of each of the first and second winding switch portions.
    Type: Application
    Filed: January 5, 2015
    Publication date: October 29, 2015
    Inventors: Akira YANO, Daisuke SHIMIZU, Katsuhisa YANO, Kenta MOMEN
  • Publication number: 20150299370
    Abstract: The present invention provides a method for producing a polymer by efficiently removing residue of metals such as titanium, aluminum and lithium from a polymer solution containing the residue of these metals to successfully obtain a purified polymer solution containing a smaller amount of the metal residue and having satisfactory color tone and transparency, a polymer solution and a polymer obtained by the production method.
    Type: Application
    Filed: May 13, 2013
    Publication date: October 22, 2015
    Applicant: Asahi Kasei Chemicals Corporation
    Inventors: Daisuke SHIMIZU, Kenta SHIBUYA, Takuya SUZUKI
  • Patent number: 9129911
    Abstract: Boron-doped carbon-based hardmask etch processing is described. In an example, a method of patterning a film includes etching a boron-doped amorphous carbon layer with a plasma based on a combination of CH4/N2/O2 and a flourine-rich source such as, but not limited to, CF4, SF6 or C2F6.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: September 8, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Kenny Linh Doan, Jong Mun Kim, Daisuke Shimizu
  • Publication number: 20150234263
    Abstract: This headup display (projector) includes a plurality of light source portions, an optical scanning portion, a base portion and a heat transfer portion that contacts with the light source portions, and the thermal resistance of a first heat transfer path from the light source portions to the base portion is larger than the thermal resistance of a second heat transfer path from the light source portions to the heat transfer portion.
    Type: Application
    Filed: February 13, 2015
    Publication date: August 20, 2015
    Inventors: Daisuke YAMAGIWA, Daisuke SHIMIZU, Tomohiro KOBAYASHI
  • Publication number: 20150112027
    Abstract: The present invention is related to a method for producing a polymer to efficiently remove metal residues of at least lithium and/or titanium from a polymer solution comprising the at least lithium and/or titanium to thereby obtain a refined polymer solution having little metal residue.
    Type: Application
    Filed: April 24, 2013
    Publication date: April 23, 2015
    Applicant: Asahi Kasei Chemicals Corporation
    Inventors: Daisuke Shimizu, Kenta Shibuya