Abstract: An economy class (Y class) private suite includes a continuous seatback and a stowable aisle-side panel. The continuous seatback covers the gaps between seats of a 3-seat or 4-seat PAX and the stowable aisle-side panel slides to close off the PAX from the aisle when desirable. Each seat in the PAX includes an extension element to extend from the anterior surface of the seat cushion and establish a substantially flat surface including the seat cushions and extension elements. A separate padded element may be placed over the substantially flat surface. Each seatback cushion in the PAX is removable and reconfigurable as a reclining support or expanded armrest.

Abstract: According to an embodiment of the present disclosure, a method of manufacturing semiconductor device includes: forming a first mandrel and a second mandrel over a mask layer; depositing a spacer layer over the first mandrel and the second mandrel; forming a line-end cut pattern over the spacer layer between the first mandrel and the second mandrel; depositing a protection layer over the line-end cut pattern; etching the protection layer and exposing upper portion of the line-end cut pattern; reducing a width of the line-end cut pattern; etching the spacer layer to expose the first mandrel and the second mandrel; and patterning the mask layer using the etched spacer layer and the reduced line-end cut pattern as an etch mask.

Abstract: The present disclosure relates to a composition for preventing and treating Mycoplasma synoviae infection, the composition comprising Tuf, NOX, MS53-0285 or a combination thereof as active ingredients. The composition of the present disclosure is effective in alleviating symptoms caused by Mycoplasma synoviae infection and can be used as an effective tool in preventing or treating poultry diseases.

Abstract: An antibody-drug conjugate (ADC) has a structure represented by Formula (I): [D2-L2-Cn2yG2-Ab-Sg1G1-L1-D1]x?? Formula (I) or a pharmaceutically acceptable salt thereof, wherein Ab is an antibody without glycans (i.e., the protein portion of an antibody); G1 and G2 are glycan moieties, which may be the same or different; Cn1 and Cn2 are conjugation moieties, which may be the same or different; L1 and L2 are linker moieties, which may be the same or different; D1 and D2 are drug units which may be the same or different; and x and y are independently an integer from 0 to 8, provided that x+y?0.

Abstract: An aircraft seat may include a seat pan cushion coupled to a seat base. The aircraft seat may include a seat back cushion. The aircraft seat may include an auxiliary rear section. The auxiliary rear section may be configured to transition between an extended position and a retracted position. The seat pan cushion and the seat back cushion may be configured to transition between a first position and a second position. The auxiliary rear section may be configured to be in the extended position when the seat pan cushion and the seat back cushion are in the first position. The auxiliary rear section may be configured to be in the retracted position when the seat pan cushion and the seat back cushion are in the second position.

Abstract: A method of fabricating a semiconductor device includes: forming a trench on an insulating layer to expose a first conductive feature disposed under the insulating layer; forming a barrier layer over the insulating layer, a sidewall of the trench, and the first conductive feature; etching a bottom of the barrier layer to expose the first conductive feature; and forming a second conductive feature over an exposed portion of the first conductive feature.

Abstract: In a pattern formation method, a photo resist pattern is formed over a target layer to be patterned. An extension material layer is formed on the photo resist pattern. The target layer is patterned by using at least the extension material layer as an etching mask.

Abstract: A method for reducing wiggling in a line includes forming a silicon patterning layer over a substrate and depositing a mask layer over the silicon patterning layer. The mask layer is patterned to form one or more openings therein. The mask layer is thinned and the one or more openings are widened, to provide a smaller height-to-width ratio. The pattern of the mask layer is then used to pattern the silicon patterning layer. The silicon patterning layer is used, in turn, to pattern a target layer where a metal line will be formed.

Abstract: In a pattern formation method, a photo resist pattern is formed over a target layer to be patterned. An extension material layer is formed on the photo resist pattern. The target layer is patterned by using at least the extension material layer as an etching mask.

Abstract: A system includes a chamber, an inlet valve, a control device, and a recycle pipe. The chamber is configured to perform a semiconductor process and including an output port. The inlet valve is coupled to the chamber and a supply pipe. The controller is coupled to the inlet valve and the chamber. The recycle pipe arranged outside the chamber and coupled to the chamber. The recycle pipe is independent from the supply pipe. The controller is configured to determine whether the chamber is idle, and is configured to control the inlet valve based on the determination of whether the chamber is idle. When the controller closes the output port of the chamber and opens the inlet valve, water from the supply pipe flows into a wall of the chamber through the inlet vale first and then flows into the recycle pipe.

Abstract: An embodiment is a method of fabricating a semiconductor structure. The method includes utilize uses of a multi-layer structure disposed on a pattern defining layer. In some embodiments, a method of fabricating a semiconductor structure includes forming a first multi-layer structure on a pattern defining layer disposed on a film stack on a substrate, patterning the first multi-layer structure to form an aperture in the first multi-layer structure, forming a first cut opening in the pattern defining layer through the aperture defined by the first multi-layer structure, and forming a second multi-layer structure on the pattern defining layer, a portion of the second multi-layer structure being disposed in the first cut opening.

Abstract: A system includes a chamber, an inlet valve, and a control device. The chamber is configured to perform a semiconductor process. The inlet valve is coupled to the chamber and a facility water source. The control device is coupled to the inlet valve, and configured to at least partially close the inlet valve when the chamber is idle.

Abstract: A method for reducing wiggling in a line includes forming a silicon patterning layer over a substrate and depositing a mask layer over the silicon patterning layer. The mask layer is patterned to form one or more openings therein. The mask layer is thinned and the one or more openings are widened, to provide a smaller height-to-width ratio. The pattern of the mask layer is then used to pattern the silicon patterning layer. The silicon patterning layer is used, in turn, to pattern a target layer where a metal line will be formed.

Abstract: The present invention provides a ?-agarase, a composition containing the same and applications thereof. The present ?-agarase provides the field a novel alternative and is favorable for the industrial utilities of the hydrolysis products of agarose. Furthermore, the present agarase is particularly modified for heterologous production by prokaryotic expression systems, and thereby is favorable for commercial use.

Abstract: A shuttle vector is provided which can be manipulated in various kinds of host cells, thereby providing a novel tool for the field of genetic engineering. Also provided are a prokaryotic host cell and a kit including said shuttle vector, so as to construct expression vectors which contain the target gene using the shuttle vector, thereby producing proteins in various host cells with one single vector.

Abstract: The present invention provides a preparation method for PCV2 capsid protein and a pharmaceutical composition containing said capsid protein. The method of the present invention uses a novel arabinose-induced expression vector and thereby improves the synthesis efficiency of said PCV2 capsid protein. On the other hand, the present pharmaceutical composition combines said capsid protein and other favorable components at a proper ratio so that achieves excellent immune-inducing effects.

Abstract: Disclosed is a composition for preventing and treating a Mycoplasma hyorhinis infection in swine. The composition uses XylF, DnaK, P72, or a combination thereof as an active pharmaceutical ingredient. Further disclosed are an expression vector and a method for producing the active pharmaceutical ingredient of the composition using a prokaryotic expression system.

Abstract: The present disclosure relates to some embodiments of a method for improving processing efficiency of a cluster tool. The method comprises transferring a first lot of wafers from a transfer load lock to a designated storage load lock and transferring a second lot of wafers from the transfer load lock to the designated storage load lock while the first lot of wafers is in the transfer load lock or the designated storage load lock. The designated storage load lock has the same structure as the transfer load lock and respectively has an inner load lock portal at an interface with the first transfer chamber and an outer load lock portal on a sidewall of a front end interface. The inner load lock portal of the designated storage load lock is retained opened during processing. The outer load lock portal of the designated storage load lock is retained closed during processing.

Abstract: A compound for treating a protein kinase-related disease or disorder having a structure of formula (I) wherein L is NR8 or O; R1, R2, R3, R4, R5, R6 and R7 are defined herein. Compounds of formula (I) are useful for inhibition of protein kinases. Methods of using compounds of formula (I), stereoisomers, tautomers and pharmaceutically acceptable salts thereof, for in vitro, in situ, and in vivo diagnosis, prevention or treatment of such disorders in mammalian cells, or associated pathological conditions are disclosed.

Abstract: According to an embodiment of the present disclosure, a method of manufacturing semiconductor device includes: forming a first mandrel and a second mandrel over a mask layer; depositing a spacer layer over the first mandrel and the second mandrel; forming a line-end cut pattern over the spacer layer between the first mandrel and the second mandrel; depositing a protection layer over the line-end cut pattern; etching the protection layer and exposing upper portion of the line-end cut pattern; reducing a width of the line-end cut pattern; etching the spacer layer to expose the first mandrel and the second mandrel; and patterning the mask layer using the etched spacer layer and the reduced line-end cut pattern as an etch mask.