Patents by Inventor Wenjun Li

Wenjun Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11192672
    Abstract: The present invention discloses a bead wire wrapper device and a wrapper method.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: December 7, 2021
    Assignee: SHANDONG DAYE CO., LTD.
    Inventor: Wenjun Li
  • Publication number: 20210369855
    Abstract: A conjugation of a cytotoxic drug to a cell-binding molecule with a bis-linker (dual-linker) as shown in Formula (I). Bis-linkage methods of making a conjugate of a cytotoxic drug/molecule to a cell-binding agent in a specific manner are also described, as well as application of the conjugates for the treatment of a cancer, or an autoimmune disease, or an infectious disease. wherein “” is an optional bond; X, Y, Z1, and Z2 are a functional group; m1 and n are a integer; L1 and L2 are a linker.
    Type: Application
    Filed: July 28, 2021
    Publication date: December 2, 2021
    Applicant: Hangzhou DAC Biotech Co., Ltd.
    Inventors: Robert Yongxin ZHAO, Yuanyuan HUANG, Qingliang YANG, Shun GAI, Hangbo YE, Linyao ZHAO, Chengyu YANG, Yifang XU, Huihui GUO, Minjun CHAO, Qianqian TONG, Wenjun LI, Xiang CAI, Xiaomai ZHOU, Hongsheng XIE, Junxiang JIA, Haifeng ZHU, Zhixiang GUO, Shuihong GAO, Chunyan WANG, Chen LIN, Yanlei YANG, Zhicang YE, Jie PENG, Jun XU, Xiaotao ZUO, Qingyu SU
  • Publication number: 20210364689
    Abstract: A backlight source module and a display device are provided. The backlight source module includes a back plate structure and a rubber member. The back plate structure includes a bottom plate, and a first side plate and a second side plate respectively connected with the bottom plate, and the first side plate and the second side plate oppose each other. A light-emitting portion, a light-guiding component and the rubber member are sequentially disposed on the bottom plate along a first direction pointing from the first side plate to the second side plate. The rubber member is only disposed at the second side plate.
    Type: Application
    Filed: April 25, 2019
    Publication date: November 25, 2021
    Inventor: Wenjun LI
  • Publication number: 20210353777
    Abstract: The present invention relates to novel linkers containing a 2,3-disubstituted succinic group, or 2-monosubstituted, or 2,3-disubstituted fumaric or maleic (trans (E)- or cis (Z)-butenedioic), or acetylenedicarboxyl group for conjugation of a cytotoxic agent, and/or one or more different functional molecules per linker to a cell-binding molecule, through bridge linking pairs of thiols on the cell-binding molecule specifically. The invention also relates to methods of making such linkers, and of using such linkers in making homogeneous conjugates, as well as of application of the conjugates in treatment of cancers, infections and autoimmune disorders.
    Type: Application
    Filed: July 13, 2021
    Publication date: November 18, 2021
    Applicant: Hangzhou DAC Biotech Co., Ltd.
    Inventors: Robert Yongxin ZHAO, Qingliang YANG, Yuanyuan HUANG, Shun GAI, Linyao ZHAO, Hangbo YE, Huihui GUO, Qianqian TONG, Minjun CAO, Junxiang JIA, Chengyu YANG, Wenjun LI, Xiaomai ZHOU, Hongsheng XIE, Chen LIN, Zhixiang GUO, Zhicang YE
  • Publication number: 20210346523
    Abstract: The present invention relates to novel linkers containing a 2,3-disubstituted succinic group, or 2-monosubstituted, or 2,3-disubstituted fumaric or maleic (trans (E)- or cis (Z)-butenedioic), or acetylenedicarboxyl group for conjugation of a cytotoxic agent, and/or one or more different functional molecules per linker to a cell-binding molecule, through bridge linking pairs of thiols on the cell-binding molecule specifically. The invention also relates to methods of making such linkers, and of using such linkers in making homogeneous conjugates, as well as of application of the conjugates in treatment of cancers, infections and autoimmune disorders.
    Type: Application
    Filed: July 13, 2021
    Publication date: November 11, 2021
    Applicant: Hangzhou DAC Biotech Co., Ltd.
    Inventors: Robert Yongxin ZHAO, Qingliang YANG, Yuanyuan HUANG, Shun GAI, Linyao ZHAO, Hangbo YE, Huihui GUO, Qianqian TONG, Minjun CAO, Junxiang JIA, Chengyu YANG, Wenjun LI, Xiaomai ZHOU, Hongsheng XIE, Chen LIN, Zhixiang GUO, Zhicang YE
  • Publication number: 20210351293
    Abstract: A device is disclosed that includes a source region positioned in a first doped well region in a semiconductor substrate and a drain region positioned in a second doped well region in the substrate, wherein there is a well gap between the first doped well region and the second doped well region. The device also includes a gate structure that includes a first gate insulation layer positioned above an upper surface of the substrate, wherein the first gate insulation layer extends from a drain-side sidewall of the gate structure to a location above the well gap, and a second gate insulation layer having a first portion positioned above the upper surface of the substrate and a second portion positioned above the first gate insulation layer.
    Type: Application
    Filed: May 8, 2020
    Publication date: November 11, 2021
    Inventors: Man Gu, Wang Zheng, Rong-Ting Liou, Haiting Wang, Wenjun Li
  • Patent number: 11166177
    Abstract: Methods, systems, and devices for wireless communication are disclosed. Flexible interleaving configurations may be employed to support various operations, including beamforming. Flexible interleaving may include dynamically or semi-statically determining a combination of bit-level, tone-level, tone-group level, or other interleaving technique for one or more transmissions. The interleaving configuration may be based on delay spread, a coherence bandwidth, a signal to noise ratio, a Doppler spread, or a combination thereof. An interleaving configuration may be a determination may be made by a base station or some other network entity and explicitly signaled to another device. Additionally or alternatively, the determination may be made based on one or more implicit rules, which may be based on a variety of factors (e.g., available bandwidth, modulation and coding scheme (MCS), code block (CB) size). Further, interleaving may be enabled (or disabled) under certain conditions.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: November 2, 2021
    Assignee: QUALCOMM Incorporated
    Inventors: Wenjun Li, Tao Luo, Alexandros Manolakos
  • Publication number: 20210335772
    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to unitary Cascode cells with resistance and capacitance optimization, and methods of manufacture. The structure includes a common source FET (CS-FET) in a first portion of a single common semiconductor region, the CS-FET comprising a source region and a drain region, a common gate FET (CG-FET) in a second portion of the single common semiconductor region, the CG-FET comprising a source region and a drain region, and a doped connecting region of the single common semiconductor region, connecting the drain of the CS-FET and the source of the CG-FET.
    Type: Application
    Filed: April 24, 2020
    Publication date: October 28, 2021
    Inventors: Wenjun LI, Chen PERKINS YAN, Tamilmani ETHIRAJAN, Cole E. ZEMKE
  • Patent number: 11158624
    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to unitary Cascode cells with resistance and capacitance optimization, and methods of manufacture. The structure includes a common source FET (CS-FET) in a first portion of a single common semiconductor region, the CS-FET comprising a source region and a drain region, a common gate FET (CG-FET) in a second portion of the single common semiconductor region, the CG-FET comprising a source region and a drain region, and a doped connecting region of the single common semiconductor region, connecting the drain of the CS-FET and the source of the CG-FET.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: October 26, 2021
    Assignee: GLOBALFOUNDRIES U.S. INC.
    Inventors: Wenjun Li, Chen Perkins Yan, Tamilmani Ethirajan, Cole E. Zemke
  • Publication number: 20210308277
    Abstract: The present invention relates to linkers having a group of propiolyl, substituted acryl(acryloyl), or disubstituted propanoyl, and using such linkers for the conjugation of compounds, in particular, cytotoxic agents to a cell-binding molecule.
    Type: Application
    Filed: November 14, 2016
    Publication date: October 7, 2021
    Applicant: Hangzhou DAC Biotech Co., Ltd.
    Inventors: Yongxin Robert Zhao, Qingliang Yang, Yuanyuan Huang, Shun Gai, Hangbo Ye, Linyao Zhao, Chengyu Yang, Huihui Guo, Xiaomai Zhou, Hongsheng Xie, Haifeng Zhu, Yifang Xu, Qianqian Tong, Junxiang Jia, Minjun Cao, Wenjun Li, Shuihong Gao, Zhixiang Guo, Lu Bai, Chen LI, Yanlei YANG, Chunyan WANG, Zhichang YE
  • Patent number: 11129910
    Abstract: The present invention relates to novel linkers containing a 2,3-disubstituted succinic group, or 2-monosubstituted, or 2,3-disubstituted fumaric or maleic (trans (E)- or cis (Z)-butenedioic), or acetylenedicarboxyl group for conjugation of a cytotoxic agent, and/or one or more different functional molecules per linker to a cell-binding molecule, through bridge linking pairs of thiols on the cell-binding molecule specifically. The invention also relates to methods of making such linkers, and of using such linkers in making homogeneous conjugates, as well as of application of the conjugates in treatment of cancers, infections and autoimmune disorders.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: September 28, 2021
    Assignee: HANGZHOU DAC BIOTECH CO., LTD.
    Inventors: Robert Yongxin Zhao, Qingliang Yang, Yuanyuan Huang, Shun Gai, Linyao Zhao, Hangbo Ye, Huihui Guo, Qianqian Tong, Minjun Cao, Junxiang Jia, Chengyu Yang, Wenjun Li, Xiaomai Zhou, Hongsheng Xie, Chen Lin, Zhixiang Guo, Zhicang Ye
  • Patent number: 11124255
    Abstract: Provided is a saddle system and a bicycle, wherein the saddle system comprises a follower device, and the follower device is arranged on the seat rod of the bicycle for mounting the saddle. The follower device comprises a left and right rotating assembly and a left and right turnover assembly which are interconnected, wherein the left and right rotating assembly is rotated leftward or rightward with respect to the left and right turnover assembly, so that the saddle rotates leftward or rightward with respect to the seat rod. The left and right turnover assembly is turned over leftward or rightward with respect to the left and right rotating assembly to make the saddle is turned over leftward or rightward with respect to the seat rod.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: September 21, 2021
    Inventor: Wenjun Li
  • Patent number: 11117106
    Abstract: The aerator system incorporates a land-based or water-based floating solar activated water aeration system with integrated linear diaphragm air compressor and controller to provide improved oxygen addition into water. The system uses low voltage and an advanced controller with max power point tracking (MPPT) technique, which converts the solar panel photovoltaic low voltage DC to low voltage AC and allows power generated from each solar panel to be fully utilized.
    Type: Grant
    Filed: April 11, 2019
    Date of Patent: September 14, 2021
    Assignee: LW Engineering LLC
    Inventors: Wenjun Li, Yichao Hao, Han Zhang
  • Publication number: 20210273046
    Abstract: A semiconductor device includes a semiconductor body having a base region incorporating a field stop zone where the base region and the field stop zone are both formed using an epitaxial process. Furthermore, the epitaxial layer field stop zone is formed with an enhanced doping profile to realize improved soft-switching performance for the semiconductor device. In some embodiments, the enhanced doping profile includes multiple doped regions with peak doping levels where a first doped region adjacent to a first side of the field stop zone has a first peak doping level that is not higher than a last peak doping level of a last doped region adjacent to the base region. The epitaxial layer field stop zone of the present invention enables complex field stop zone doping profiles to be used to obtain the desired soft-switching characteristics in the semiconductor device.
    Type: Application
    Filed: May 4, 2021
    Publication date: September 2, 2021
    Inventors: Lei Zhang, Karthik Padmanabhan, Lingpeng Guan, Jian Wang, Lingbing Chen, Wim Aarts, Hongyong Xue, Wenjun Li, Madhur Bobde
  • Publication number: 20210273094
    Abstract: Integrated circuit (IC) structures including asymmetric, recessed source and drain regions and methods for forming are provided. In an example, the IC structure includes a substrate, a gate structure over the substrate, first and second spacers contacting respective, opposite sidewalls of the gate structure, and source and drain regions on opposite sides of the gate structure. In one configuration, the source region includes an upper source portion having a first lateral width, and a lower source portion having a second lateral width greater than the first lateral width, and the drain region includes an upper drain portion having a third lateral width, and a lower drain portion having a fourth lateral width that is substantially the same as the third lateral width.
    Type: Application
    Filed: March 2, 2020
    Publication date: September 2, 2021
    Inventors: Man Gu, Wenjun Li
  • Publication number: 20210265342
    Abstract: Integrated circuit (IC) structures including buried insulator layer and methods for forming are provided. In a non-limiting example, a IC structure includes: a substrate; a first fin over the substrate; a source region and a drain region in the first fin; a first gate structure and a second gate structure over the first fin, the first and the second gate structures positioned between the source region and the drain region; and a buried insulator layer including a portion disposed under the first fin.
    Type: Application
    Filed: February 20, 2020
    Publication date: August 26, 2021
    Inventors: Wenjun Li, Man Gu
  • Patent number: 11101137
    Abstract: A process is applied to develop a plurality of reverse conducting insulated gate bipolar transistors (RCIGBTs). The process comprises the steps of providing a wafer, applying a first grinding process, patterning a mask, applying an etching process, removing the mask, implanting N++ type dopant, applying a second grinding process forming a TAIKO ring, implanting P+ type dopant, annealing and depositing TiNiAg or TiNiVAg, removing the TAIKO ring, attaching a tape, and applying a singulation process. The mask can be a soft mask or a hard mask. The etching process can be a wet etching only; a wet etching followed by a dry etching; or a dry etching only.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: August 24, 2021
    Assignee: ALPHA AND OMEGA SEMICONDUCTOR INTERNATIONAL LP
    Inventors: Zhiqiang Niu, Long-Ching Wang, Yueh-Se Ho, Lingpeng Guan, Wenjun Li
  • Publication number: 20210249307
    Abstract: Structures for a field-effect transistor and methods of forming a structure for a field-effect transistor. First and second gate structures extend over a semiconductor body. The first gate structure includes a first sidewall and a second sidewall opposite the first sidewall, and the second gate structure includes a sidewall adjacent to the first sidewall of the first gate structure. A first source/drain region includes a first epitaxial semiconductor layer positioned between the first sidewall of the first gate structure and the sidewall of the second gate structure. A second source/drain region includes a second epitaxial semiconductor layer positioned adjacent to the second sidewall of the first gate structure. The first sidewall of the first gate structure and the sidewall of the second gate structure are separated by a distance that is greater than a width of the first epitaxial semiconductor layer.
    Type: Application
    Filed: February 6, 2020
    Publication date: August 12, 2021
    Inventors: Man Gu, Wenjun Li
  • Publication number: 20210242339
    Abstract: Structures for a field-effect transistor and methods of forming a structure for a field-effect transistor. A gate structure extends over a semiconductor body, a first source/drain region includes an epitaxial semiconductor layer on a first portion of the semiconductor body, and a second source/drain region is positioned in a second portion of the semiconductor body. The gate structure includes a first sidewall and a second sidewall opposite the first sidewall, the first source/drain region is positioned adjacent to the first sidewall of the gate structure, and the second source/drain region is positioned adjacent to the second sidewall of the gate structure. The first source/drain region has a first width, and the second source/drain region has a second width that is greater than the first width.
    Type: Application
    Filed: January 30, 2020
    Publication date: August 5, 2021
    Inventors: Wenjun Li, Man Gu, Baofu Zhu
  • Patent number: D923975
    Type: Grant
    Filed: July 20, 2020
    Date of Patent: July 6, 2021
    Inventor: Wenjun Li