Patents by Inventor Yasuhiro Yoneda

Yasuhiro Yoneda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6734248
    Abstract: A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.
    Type: Grant
    Filed: September 25, 2001
    Date of Patent: May 11, 2004
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Satoshi Tazaki, Yasuhiro Yoneda, Kishio Yokouchi
  • Publication number: 20040065021
    Abstract: A polishing composition comprising polymer particles and inorganic particles in an aqueous medium, wherein the inorganic particles have an average particle size of from 5 to 170 nm, and wherein an average particle size Dp (nm) of said polymer particles and an average particle size Di (nm) of said inorganic particles satisfy the following formula (1): Dp≦Di+50 nm (1); a polishing process for a substrate to be polished comprising polishing the substrate to be polished with the polishing composition as defined above; and a process for improving a rate for polishing a substrate to be polished with the polishing composition as defined above. The polishing composition of the present invention can be favorably used in polishing the substrate for precision parts, including semiconductor substrates; substrates for magnetic recording media such as magnetic discs, optical discs and opto-magnetic discs; photomask substrates; glass for liquid crystals; optical lenses; optical mirrors; optical prisms; and the like.
    Type: Application
    Filed: September 24, 2003
    Publication date: April 8, 2004
    Inventors: Yasuhiro Yoneda, Toshiya Hagihara
  • Publication number: 20040040217
    Abstract: A polishing composition comprising an aqueous medium and abrasive particles, wherein the abrasive particles comprise abrasive particles having a particle size of 2 to 200 nm in an amount of 50% by volume or more, the abrasive particles having a particle size of 2 to 200 nm comprising (i) 40 to 75% by volume of small size particles having a particle size of 2 nm or more and less than 58 nm; (ii) 0 to 50% by volume of intermediate size particles having a particle size of 58 nm or more and less than 75 nm; and (iii) 10 to 60% by volume of large size particles having a particle size of 75 nm or more and 200 nm or less; a polishing composition comprising an aqueous medium and abrasive particles, wherein the abrasive particles comprise abrasive particles (A) having an average particle size of 2 to 50 nm; and abrasive particles (B) having an average particle size of 52 to 200 nm, wherein a weight ratio of A to B (A/B) is from 0.5/1 to 4.
    Type: Application
    Filed: August 11, 2003
    Publication date: March 4, 2004
    Inventors: Shigeaki Takashina, Yasuhiro Yoneda, Toshiya Hagihara
  • Patent number: 6693736
    Abstract: An optical circuit system which takes out at least a portion of the light of a light power source corresponding to at least one type of output voltage of an IC, board, multichip module, electronic element, or opto-electronic element and produces an optical signal, wherein the light power source is an optical waveguide into which light has been introduced, a waveguide laser, or a waveguide optical amplifier, light reflecting portions are provided at its ends and/or middle, a signal transmission waveguide is formed in contact with the side surface and/or top or bottom surface of the optical waveguide or in proximity to the same at a certain distance, and the optical signal corresponding to at least one type of output voltage of the IC, board, multichip module, electronic element, or opto-electronic element is made to propagate to the signal transmission waveguide, which optical circuit system is rich in flexibility and enables complicated optical interconnections to be handled, and components of the same.
    Type: Grant
    Filed: October 17, 2000
    Date of Patent: February 17, 2004
    Assignee: Fujitsu Limited
    Inventors: Tetsuzo Yoshimura, Takeshi Ishitsuka, Katsusada Motoyoshi, Satoshi Tatsuura, Wataru Sotoyama, Koji Tsukamoto, Yasuhiro Yoneda, Tomoaki Hayano, Azuma Matsuura
  • Publication number: 20030156346
    Abstract: The present invention is aimed to provide a head suspension having a high resonant frequency, high shock resistance and low rigidity, which greatly contributes to an improvement of a magnetic disk apparatus. In an oscillation-type actuator, at least a part of a spring arm of the head suspension having a data reading/writing head slider 1 is made of an anisotropic layer whose rigidity varies in accordance with a direction. In this case, the anisotropic layer is laminated so that the high rigidity modulus orientation direction is different according to layer.
    Type: Application
    Filed: October 3, 2002
    Publication date: August 21, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Atsushi Suzuki, Ryosuke Koishi, Daisuke Mizutani, Ren Ishikawa, Masashi Takada, Yasuhiro Yoneda
  • Publication number: 20030063453
    Abstract: An inexpensive multilayer wiring circuit board capable of conducting high frequency switching operation on the circuit while the generation of high frequency noise is being suppressed by reducing the inductance of the circuit in provided. A multilayer wiring circuit board comprising: an uppermost layer designated as a first layer on which parts are mounted; a second layer on which one of a ground layer and an electric power source layer is arranged; a third layer on which the other is arranged; and an insulating layer arranged between the ground layer and the electric power source layer. A resin layer having a thermoplastic adhesion property on both faces is used as material of the insulating layer arranged between the electric power source layer and the ground layer.
    Type: Application
    Filed: September 26, 2002
    Publication date: April 3, 2003
    Applicant: FUJITSU LIMITED
    Inventors: Toshihiro Kusagaya, Yasuhiro Yoneda, Daisuke Mizutani, Kazuhiko Iijima, Yuji Suwa
  • Publication number: 20020081949
    Abstract: A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.
    Type: Application
    Filed: October 23, 2001
    Publication date: June 27, 2002
    Inventors: Hiroyuki Yoshida, Toshiya Hagihara, Ryoichi Hashimoto, Yasuhiro Yoneda
  • Patent number: 6403289
    Abstract: The invention relates to a developer for photosensitive polyimide resin compositions, comprising an alkaline aqueous solution containing a basic compound (A) represented by a formula (1): wherein X+ is N+ or P+, R is an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 10 ring forming carbon atoms, Y− is a monovalent anion, m is 0 or 1, n is 3 or 4, and m+n is 4, with the proviso that when m is 0, n is 4, and R is an alkyl group, the total number of carbon atoms of 4 alkyl groups is at least 13, or when m is 1, n is 3, and R is an alkyl group, the total number of carbon atoms of 3 alkyl groups is at least 6.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: June 11, 2002
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Kei Sakamoto, Yasuhiro Yoneda, Kishio Yokouchi
  • Publication number: 20020035196
    Abstract: A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.
    Type: Application
    Filed: September 25, 2001
    Publication date: March 21, 2002
    Inventors: Akira Tanaka, Satoshi Tazaki, Yasuhiro Yoneda, Kishio Yokouchi
  • Publication number: 20020032273
    Abstract: A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.
    Type: Application
    Filed: September 25, 2001
    Publication date: March 14, 2002
    Inventors: Akira Tanaka, Satoshi Tazaki, Yasuhiro Yoneda, Kishio Yokouchi
  • Patent number: 6338975
    Abstract: An optical circuit device is manufactured by forming an organic film formed on a substrate, and giving this organic film non-linear optical properties. An optical circuit device is formed containing an organic film formed on a substrate, wherein said film is either selectively formed on a portion of the region on a substrate or said film being formed over the entire region on a substrate, and a portion of a region of that film is either selectively formed to a thickness differing from other regions or selectively having a different structure. This optical circuit device can be manufactured to have various constitutions, and allows the formation of a multilayer optical circuit.
    Type: Grant
    Filed: February 25, 1999
    Date of Patent: January 15, 2002
    Assignee: Fujitsu Limited
    Inventors: Tetsuzo Yoshimura, Satoshi Tatsuura, Wataru Sotoyama, Yasuhiro Yoneda, Katsusada Motoyoshi, Koji Tsukamoto, Takeshi Ishitsuka
  • Patent number: 6310135
    Abstract: A polyimide resin composition comprising a polyimide resin (A) and at least one 1H-tetrazole (B) selected from the group consisting of 1H-tetrazole, 5,5′-bis-1H-tetrazole, and derivatives thereof, and having an excellent rust preventing effect on copper and copper alloys.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: October 30, 2001
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Akira Tanaka, Satoshi Tazaki, Yasuhiro Yoneda, Kishio Yokouchi
  • Patent number: 6307091
    Abstract: The present invention is to provided a trifluoro-substituted benzoic acid, an ester thereof, particularly 2,3,4-trifluoro-5-iodobenzonic acid, 2,3,4-trifluoro-5-trifluoromethylbenzonic acid, esters thereof, which are useful as a starting material for synthesizeing a quinolonecarboxylic acid compound useful as a medicine, an anti-bacterial agent or an antiviral agent, and processes for preparing these compounds and 2,4,5-trifluoro-3-iodobenzonic acid, 2,4,5-trifluoro-3-trifluoromethylbenzoic acid and esters thereof.
    Type: Grant
    Filed: October 3, 2000
    Date of Patent: October 23, 2001
    Assignee: Ube Industries, Ltd.
    Inventors: Yasuhito Yamamoto, Yasuhiro Yoneda, Kikuo Ataka, Naoyuki Yokota
  • Patent number: 6160081
    Abstract: The invention relates to a photosensitive polyimide resin composition comprising (A) a polyamic acid having, in its main chain, repeating units formed from a polycondensation product of at least one tetracarboxylic acid or tetracarboxylic anhydride thereof with at least one diamine compound, and having actinic ray-sensitive functional groups at both terminals thereof; (B) a photosensitive auxiliary having a photopolymerizable functional group; (C) a photopolymerization initiator; and (D) a solvent, wherein 1 the polyamic acid is such that when the repeating unit represented by the formula (1) is defined as a unit molecular weight, a unit molecular weight per carboxyl group (unit molecular weight/COOH) falls within a range of from 200 to 300, and 2 the photosensitive resin composition permits the formation of a polyimide film having a residual stress of 40 MPa or lower and a coefficient of thermal expansion of 30 ppm/.degree. C.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: December 12, 2000
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Akira Tanaka, Kei Sakamoto, Kenichi Ito, Yasuhiro Yoneda, Kishio Yokouchi, Yasuo Naganuma
  • Patent number: 6160171
    Abstract: The present invention is to provide a trifluoro-substituted benzoic acid, an ester thereof, particularly 2,3,4-trifluoro-5-iodobenzoic acid, 2,3,4-trifluoro-5-trifluoromethylbenzoic acid, esters thereof, which are useful as a starting material for synthesizing a quinolonecarboxylic acid compound useful as a medicine, an anti-bacterial agent or an antiviral agent, and processes for preparing these compounds and 2,4,5-trifluoro-3-iodobenzoic acid, 2,4,5-trifluoro-3-trifluoromethylbenzoic acid and esters thereof.
    Type: Grant
    Filed: February 17, 1999
    Date of Patent: December 12, 2000
    Assignee: Ube Industries, Ltd.
    Inventors: Yasuhito Yamamoto, Yasuhiro Yoneda, Kikuo Ataka, Naoyuki Yokota
  • Patent number: 6081632
    Abstract: A method of forming waveguides, refractive index distributions and optical couplings automatically by light incidence, and devices obtained thereby. A non-linear optical material which has excellent properties of a large degree of freedom for an optical circuit substrate composition, etc. is used for optical circuit devices and optical circuit substrates. A photoelectric device containing an organic conjugated polymer film is deposited on a substrate by vapor deposition polymerization as at least one function layer. An optical network is provided with optical wiring for exchanging signals between processing elements selected from electronic elements, electronic apparatuses, electrooptical elements and electrooptical apparatuses.
    Type: Grant
    Filed: October 16, 1997
    Date of Patent: June 27, 2000
    Assignee: Fujitsu Limited
    Inventors: Tetsuzo Yoshimura, Wataru Sotoyama, Katsusada Motoyoshi, Takeshi Ishitsuka, Koji Tsukamoto, Shigenori Aoki, Yasuhiro Yoneda, Satoshi Tatsuura, Haruhisa Soda, Tsuyoshi Yamamoto
  • Patent number: 6017681
    Abstract: A method of coupling optical parts including bonding the optical coupling faces of two optical waveguides by butting and fusing them. Also, a method for forming a refractive-index distribution having the focusing lens effect by setting the interval between the optical coupling faces of two optical parts to 0.1 mm or more, feeding a refractive-index imaging material also serving as an adhesive into the gap between the faces, and applying light to the refractive-index imaging material from the optical coupling face of at least one of the optical parts.
    Type: Grant
    Filed: November 7, 1995
    Date of Patent: January 25, 2000
    Assignee: Fujitsu Limited
    Inventors: Koji Tsukamoto, Takeshi Ishitsuka, Tetsuzo Yoshimura, Katsusada Motoyoshi, Yasuhiro Yoneda
  • Patent number: 6001488
    Abstract: A resin composition comprising an epoxy group-containing cycloolefin resin and a crosslinking agent is provided. More specifically, a resin composition comprising an epoxy group-containing thermoplastic norbornene resin obtained by introducing epoxy groups into a thermoplastic norbornene resin, and as the crosslinking agent, a curing agent for epoxy resins or a photoreactive substance is provided. The resin composition is suitable for use as an insulating material.
    Type: Grant
    Filed: June 29, 1998
    Date of Patent: December 14, 1999
    Assignees: Nippon Zeon Co., Ltd., Fujitsu Limited
    Inventors: Hideaki Kataoka, Eiko Yuda, Shigemitsu Kamiya, Masahide Yamamoto, Yoshikatsu Ishizuki, Yasuhiro Yoneda, Daisuke Mizutani, Kishio Yokouchi
  • Patent number: 5942292
    Abstract: The present invention provides a spacer for a liquid crystal display which is excellent in light shielding properties, does not suffer from fading even after the lapse of a long period, thus being excellent in long-term reliability, and has satisfactory strengths and a liquid crystal display made by using the spacer. The above spacer is composed of colored fine particles prepared by copolymerizing a polymerizable anthraquinone dye having at least one ethylenically unsaturated bond in the molecule with an ethylenically unsaturated monomer component in an aqueous medium.
    Type: Grant
    Filed: December 15, 1997
    Date of Patent: August 24, 1999
    Assignee: Kao Corporation
    Inventors: Yasuhiro Yoneda, Kazuo Kubota, Tetsuo Takano
  • Patent number: 5917980
    Abstract: An optical circuit device is manufactured by forming an organic film formed on a substrate, and giving this organic film non-linear optical properties. An optical circuit device is formed containing an organic film formed on a substrate, wherein said film is either selectively formed on a portion of the region on a substrate or said film being formed over the entire region on a substrate, and a portion of a region of that film is either selectively formed to a thickness differing from other regions or selectively having a different structure. This optical circuit device can be manufactured to have various constitutions, and allows the formation of a multilayer optical circuit.
    Type: Grant
    Filed: March 8, 1993
    Date of Patent: June 29, 1999
    Assignee: Fujitsu Limited
    Inventors: Tetsuzo Yoshimura, Satoshi Tatsuura, Wataru Sotoyama, Yasuhiro Yoneda, Katsusada Motoyoshi, Koji Tsukamoto, Takeshi Ishitsuka