Gas dispersing plate for semiconductor manufacturing apparatus
Latest ASM IP Holding B.V. Patents:
- Gas supply assembly, components thereof, and reactor system including same
- Selective deposition of metals, metal oxides, and dielectrics
- Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
- Cyclical deposition methods
- Batch furnace assembly and method of operating a batch furnace assembly
Description
Claims
The ornamental design for a gas dispersing plate for a semiconductor manufacturing apparatus, as shown and described.
Referenced Cited
U.S. Patent Documents
3232437 | February 1966 | Hultgren |
D411516 | June 29, 1999 | Imafuku |
D497977 | November 2, 2004 | Engelbrektsson |
D609652 | February 9, 2010 | Nagasaka |
D614593 | April 27, 2010 | Lee |
D716742 | November 4, 2014 | Jang |
D724553 | March 17, 2015 | Choi |
D725168 | March 24, 2015 | Yamagishi |
D726884 | April 14, 2015 | Yamagishi |
D732145 | June 16, 2015 | Yamagishi |
D732644 | June 23, 2015 | Yamagishi |
D733261 | June 30, 2015 | Yamagishi |
D733843 | July 7, 2015 | Yamagishi |
D734377 | July 14, 2015 | Hirakida |
D735836 | August 4, 2015 | Yamagishi |
D753269 | April 5, 2016 | Yamagishi |
20170009347 | January 12, 2017 | Jang |
Patent History
Patent number: D790041
Type: Grant
Filed: Mar 22, 2016
Date of Patent: Jun 20, 2017
Assignee: ASM IP Holding B.V. (Almere)
Inventors: Hyun Soo Jang (Daejeon), Jeong Ho Lee (Seoul), Young Hoon Kim (Cheonan-si), Young Hyo Jeon (Pyeongtaek-si)
Primary Examiner: Eric Goodman
Assistant Examiner: Amy Wierenga
Application Number: 29/558,824
Type: Grant
Filed: Mar 22, 2016
Date of Patent: Jun 20, 2017
Assignee: ASM IP Holding B.V. (Almere)
Inventors: Hyun Soo Jang (Daejeon), Jeong Ho Lee (Seoul), Young Hoon Kim (Cheonan-si), Young Hyo Jeon (Pyeongtaek-si)
Primary Examiner: Eric Goodman
Assistant Examiner: Amy Wierenga
Application Number: 29/558,824
Classifications
Current U.S. Class:
Fitting (10) (D23/259)