Abstract: An apparatus for production of sacks from semi-finished sacks, preferably tube pieces, with which sacks of different format can be produced has at least one device for the folding of sack bottoms and at least one gluing station for the gluing of at least the bottom flaps of an opened bottom square of the sack bottoms. The gluing station has at least two application heads. Each application head has a glue application area, whose extent is variable in a spatial direction (y), and is movable relative to a bottom center line of the sacks. A maximum glue application area in the spatial direction (y) has a length that is shorter than a spacing (C) located on one side of a bottom center line between an outer edge of the bottom flap of the largest sack format gluable in the gluing station and the center line of the sack.

Abstract: A method of making a fuel grain for use in a rocket motor, the method comprising blending a first energetic nanoscale metallic compound and a second compound suitable to form a feedstock material for use in an additive manufacturing apparatus, the additive manufacturing apparatus operatively connected to a computing system, that provides additive manufacturing printing instructions to the additive manufacturing apparatus, permitting construction of an autonomously designed and optimized rocket fuel grain section; wherein the stochastic deposition simulation-assisted fuel grain geometries further comprise a plurality of agglutinated layers of solidified fuel grain compound, each layer of the plurality of layers comprising a plurality of blended and radially displaced beads of different radii, said radial displacement optionally optimized via competitive simulation programs, and wherein the system continuously mixes constituent materials in an inline/static mixer, with viscosity controlled via particle size var

Abstract: A method, of manufacturing a series of objects is disclosed. In the method, a layer of a manufacturing medium is provided. Portions of the layer of the medium, are bond together at at least edge regions of the layer to form a support portion. The support portion is lowered while gripping the support portion by the edge regions of the layer. A further layer of the medium is provided supported by the support portion. Portions of the further layer of the medium are selectively bound to form at least an object portion. An apparatus for performing the method is also disclosed.

Abstract: Apparatus and associated methods related to providing safe electrical control and/or communication between a remote controller located in a safe location and interface system for a machine located in a hazardous location. The control and/or communication is provided via industrial-voltage power lines that traverse a barrier separating the safe location from the hazardous location. Control and/or communication is provided by reactively coupling to industrial power lines, which traverse the barrier, so as to superimpose a control and/or communication signal upon AC operating power provided to the machine. Each of the interface system located at the hazardous location and the remote control module located at a safe location provides such reactive coupling to the industrial-voltage power lines so as to communicate therebetween.

Abstract: The invention relates to a method and an automatic disinfection machine for the controlled disinfection of the skin of a patient comprising a treatment chamber for accommodating the body part with the skin to be disinfected; an electrically controllable disinfecting device for disinfecting the skin, a recording device for recording the disinfection of the skin in the form of disinfection data, a data processing control device for controlling the disinfecting device and the recording device. The control device is thereby designed to effect the disinfection of the skin by controlling the disinfecting device, record the disinfection of a skin section of the skin in the form of disinfection data by controlling the recording device.

Abstract: Described herein is a technique capable of improving the controllability of firm thickness distribution. According to one aspect of the technique, there is provided a substrate processing apparatus including: a process chamber; a first and a second gas supply system; an exhaust system; and a controller for controlling the first and the second gas supply system and the exhaust system to form a film. The first gas supply system includes: a first and a second storage part; a first gas supply port for supplying a gas stored in the first storage part from an outer periphery toward a center of a substrate; and a second gas supply for supplying the gas stored in the second storage part from the outer periphery along a direction more inclined toward the outer periphery than a direction from the outer periphery toward the center of the substrate.

Abstract: There is provided a technique that includes a load port on which a plurality of storage containers, each storage container storing a plurality of substrates, are mounted, a plurality of process chambers configured to be capable of accommodating the substrates, a transfer part configured to transfer the substrates stored in each storage container to each of the process chambers; an operation part configured to, when performing the process in a state in which a substrate is not present in each process chamber, count first count data of data tables for corresponding process chambers; a memory configured to store the data tables; and a controller configured to assign first transfer flag data to a data table of a process chamber having largest first count data and configured to control the transfer part based on the first transfer flag data so as to transfer the substrates in the predetermined order.

Abstract: The purpose of the present invention is to provide a manufacturing method for an exhaust gas purification device that can uniformly coat a honeycomb substrate with slurry even when using a low viscosity slurry. The present invention pertains to a manufacturing method for an exhaust gas purification device that includes providing a slurry for catalyst layer formation from a shower nozzle onto a honeycomb substrate, coating the honeycomb substrate with the slurry, and firing the honeycomb substrate coated with the slurry, wherein the viscosity of the slurry at a shear rate of 4 s?1 is 800 mPA·s or less, the shower nozzle has a plurality of discharge openings for discharging the slurry, the relationship of the spacing a) of the discharge openings and the diameter b) of the liquid drops formed when starting supply of the slurry is 0.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: In a plasma processing apparatus of an exemplary embodiment, a radio frequency power source generates radio frequency power for plasma generation. A bias power source periodically applies a pulsed negative direct-current voltage to a lower electrode to draw ions into a substrate support. The radio frequency power source supplies the radio frequency power as one or more pulses in a period in which the pulsed negative direct-current voltage is not applied to the lower electrode. The radio frequency power source stops supply of the radio frequency power in a period in which the pulsed negative direct-current voltage is applied to the lower electrode. Each of the one or more pulses has a power level that gradually increases from a point in time of start thereof to a point in time when a peak thereof appears.

Abstract: An example method of setting a plurality of valves into a predetermined configuration for use in a wellbore servicing operation includes presenting a schematic display of the plurality of valves with a visual indication of the current state of each valve. The method also includes displaying a list of predefined valve configurations. The method further includes overlaying on the schematic display a predefined valve configuration selected from the list and visually indicating on the overlay the state of each valve if the predefined valve configuration is implemented.

Abstract: A dispersant system comprises a plurality of taggant vessels, each having a taggant that corresponds to a position in a tag string and a computer controller convert the tag string into a selection of a taggant set while computer-controlled valves allow or block a flow of taggants to a manifold output tube. From the output tube, a mix of the taggants flow to form a dispersant formed according to the tag string. A nozzle disperses the dispersant onto an object to be tagged, possibly atomized with air. The taggant can comprise a DNA taggant comprising a static portion and a dynamic portion that is unique to each tag string position. Tag strings for adjacent lots might have a low Hamming distances to reduce cross-contamination and/or have redundancy for error detection and correction and selected so that consumption of taggants evens out over the plurality of taggant vessels.

Abstract: According to one embodiment, a nozzle head includes a main body having a space in an interior of the main body, the space being capable of storing a source material liquid, a first nozzle provided at the main body, the first nozzle ejecting the source material liquid stored in the main body, and a second nozzle provided at the main body, the second nozzle supplying a cleaning liquid to a vicinity of an outlet of the first nozzle.

Abstract: A transfer device includes a rotation driving mechanism for rotationally driving a first linear arm and a second linear arm to move a holding part between a waiting location and a transfer location; a rotation angle detection mechanism for detecting rotation angles of the first linear arm and the second linear arm; a position detection sensor for detecting a position of the second linear arm; a calculation part for calculating a position of the holding part based on the rotation angles of the first linear arm and the second linear arm; and a control part for comparing a position information of the holding part with a position information of the second linear arm and allowing the transfer location to which the target object is transferred to be collected, based on a difference between the position information of the holding part and the position information of the second linear arm.

Abstract: There is provided a technique that includes providing a substrate; and forming a film on the substrate by performing: supplying a first inert gas from a first supplier to the substrate; supplying a second inert gas from a second supplier to the substrate; and supplying a first processing gas from a third supplier, which is installed on an opposite side of the first supplier across a straight line passing through the second supplier and a center of the substrate, to the substrate, wherein in the act of forming the film, a substrate in-plane film thickness distribution of the film formed on the substrate is adjusted by controlling a balance between a flow rate of the first inert gas supplied from the first supplier and a flow rate of the second inert gas supplied from the second supplier.

Abstract: Embodiments of the present disclosure generally describe methods for depositing an amorphous carbon layer onto a substrate, including over previously formed layers on the substrate, using a high power impulse magnetron sputtering (HiPIMS) process, and in particular, biasing of the substrate during the deposition process and flowing a nitrogen source gas and/or a hydrogen source gas into the processing chamber in addition to an inert gas to improve the morphology and film stress of the deposited amorphous carbon layer.

Abstract: A method for controlling a system pressure within a closed system includes sending a signal to a pressure control valve corresponding to a pressure set point and actuating the pressure control valve to vary a pilot pressure of a control fluid contained within a pressure control line that is fluidly connected to a pressure regulator. A diaphragm of the pressure regulator is disposed between the pressure control line and a system line and acts on a fluid with the system line to modify the system pressure.

Abstract: A method for controlling a system pressure within a closed system includes sending a signal to a pressure control valve corresponding to a pressure set point and actuating the pressure control valve to vary a pilot pressure of a control fluid contained within a pressure control line that is fluidly connected to a pressure regulator. A diaphragm of the pressure regulator is disposed between the pressure control line and a system line and acts on a fluid with the system line to modify the system pressure.

Abstract: Disclosed is a control device that controls an operation of a substrate processing apparatus that forms a laminated film by forming a first film on a substrate and then forming a second film. The control device includes a recipe memory unit storing first and second film formation conditions to form the first and second films, a model memory storing first and second process models that represent the effects of the first film formation conditions on the properties of the first and second films, and a controller configured to: adjust the second film formation condition based on a measured value of a property of the laminated film formed by the first and second film formation conditions, and the second process model stored in the model memory unit; and determine whether or not to adjust the first film formation condition based on an expected value of the property of the laminated film.

Abstract: A substrate treating apparatus includes a treating section for treating substrates. The treating section has a front face and a rear face both connectable to an indexer section for feeding the substrates to the treating section. Such substrate treating apparatus can improve the degree of freedom for arranging the treating section and the indexer section.

Abstract: A test apparatus includes a lighting unit radiating light on a to-be-tested object having a light transmitting resin containing a light conversion material; a camera unit obtaining an image of the to-be-tested object while the light transmitting resin is emitted by receiving light emitted by the lighting unit; and a controller determining whether the to-be-tested object is defective by calculating gray values from the image obtained by the camera unit.

Abstract: Provide an apparatus for selective epitaxial growth. The apparatus for selective epitaxial growth, the apparatus comprising, a process tube comprising an inner tube in which a substrate stack unit for receiving a plurality of substrates is accommodated and an outer tube surrounding the inner tube, a heater assembly disposed to surround the process tube and a side nozzle unit vertically disposed inside the process tube, wherein the side nozzle unit comprises first and second side nozzles for respectively spraying an etching gas and a depo gas for the selective epitaxial growth.

Abstract: Provided is a substrate processing device capable of improving throughput without increasing the operation speed of a drive device. Vacuum processing chambers which house a wafer for plasma processing of the wafer are respectively provided with gate valves for opening and closing a wafer inlet/outlet port, and wafer detection sensors for detecting the wafer moving forward or backward through the wafer inlet/outlet port, and a scara robot for making extending/retracting motion and rotating motion transfers the wafer. At this time, the scara robot starts the rotating motion to transfer the wafer picked up from the vacuum processing chamber in response to a trigger signal transmitted from the wafer detection sensor. The trigger signal indicates that the wafer has passed through the wafer inlet/outlet port and has arrived at a point where the gate valve and the wafer inlet/outlet port no longer interfere with the wafer.

Abstract: An article transport facility includes a traveling portion configured to travel on a traveling rail, a cleaning unit coupled to the traveling portion, a feeding portion configured to supply traveling driving power for the traveling portion and cleaning driving power for the cleaning unit, a power storage device connected between the feeding portion and the cleaning unit, and a power control portion. The power control portion is configured to: charge the power storage device with power corresponding to a driving state of the traveling portion and a position of the traveling portion along the transport path; and discharge the power storage device when power received from the feeding portion is insufficient relative to a total power of the traveling driving power and the cleaning driving power.

Abstract: A gas supply system for supplying a gas into a processing chamber for processing a substrate to be processed includes: a processing gas supply unit; a processing gas supply line; a first and a second branch line; a branch flow control unit; an additional gas supply unit; an additional gas supply line; and a control unit. The control unit performs, before processing the substrate to be processed, a processing gas supply control and an additional gas supply control by using the processing gas supply unit and the additional gas supply unit, respectively, wherein the additional gas supply control includes a control that supplies the additional gas at an initial flow rate greater than a set flow rate and then at the set flow rate after a lapse of a period of time.

Abstract: A gas supply unit, for supplying a gas into a processing chamber in which a substrate is processed, includes a plurality of gas supply sources, a mixing line for mixing a plurality of gases supplied from the gas supply sources to make a gaseous mixture, a multiplicity of branch lines for branching the gaseous mixture to be supplied to a multiplicity of places in the processing chamber, and an additional gas supply unit for supplying a specified additional gas to a gaseous mixture flowing in at least one branch line. The gas supply unit also includes pressure gauges and valves for adjusting gas flow rates in the branch lines, respectively, and a pressure ratio controller for controlling that gaseous mixtures branched into the branch lines to have a specified pressure ratio by adjusting opening degrees of the valves based on measurement results obtained by using the pressure gauges.

Abstract: In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.

Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.

Abstract: The disclosed electrostatic coating system (1) includes a spray gun (2) for electrostatic coating, a high-voltage generator (5), and an alternating-current source unit (4), and further includes a removable grounding member (7), in a state attached to the main body of the gun, provided to close an open-circuit portion (3c) of the grounded power source line (3a), and a control circuit (8) for controlling the alternating current source unit (4) by detecting the current flowing through the power source line (3) or the voltage of the power source line (3) by a current coil (13) to stop application of the alternating voltage (Vac) to the high-voltage generator (5) when the detected electric current or the detected voltage has dropped or either the current or the voltage is not detected during supply of the alternating voltage (Vac) to the high voltage generator (5) of the spray gun (2). This system enables prevention of charging of the removable grounding member (7) to improve the safety in the coating operation.

Abstract: A film adhering mechanism includes a base, a film adsorbing platform, at least two flexible members, a vacuum generator; and an electromagnetic valve. The film adsorbing platform includes a main body positioned on the base, and a protective pad covered on the main body away from the base. The at least two flexible members are separately mounted on the base, and pass through the main body and the protective pad, and protrude from the protective pad. A gas inlet and a first adsorbing hole communicating with the gas inlet are defined in the main body. A second adsorbing hole is defined in the protective pad communicating with the first adsorbing hole. The vacuum generator communicates with the gas inlet, and the electromagnetic valve controls the vacuum generator.

Abstract: The present invention provides apparatus, including a pigging tool, that comprises a spraying mechanism configured to move along an inner surface of a pipeline, including a slurry transport pipeline in a minable oilsands facility or plant, and to spray a coating on the inner surface of the pipeline; and a curing source, including an ultraviolet (UV) light source, a microwave source or an RF source, configured to cure the coating sprayed on the inner surface of the pipeline in situ as the spray mechanism moves along the inner surface of the pipeline.

Abstract: A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations.

Abstract: A detector for detecting a position of a mark comprises: an image sensing device; an optical system which projects the mark onto an image sensing surface of the image sensing device; a pattern located in a position between the image sensing surface and an optical element located closest to a plane on which the mark is to be located, among optical elements forming the optical system, the position being optically conjugated with the plane; and a processor which calculates a position of the mark with respect to one of a position of the pattern and a position already known from the position of the pattern, based on a moire pattern formed on the image sensing surface by the mark and the pattern.

Abstract: A method and system for forming filter elements on a plurality of display substrates using a digital imaging system operable to selectively deposit filter material at a plurality of deposition locations is disclosed. The method involves receiving orientation information defining a disposition of a plurality of pixels associated with the at least one display substrate, identifying pixels in the plurality of pixels that are to receive filter material for forming a filter element on the pixel, selecting deposition locations within each of the identified pixels in accordance with the orientation information to meet an alignment criterion associated with placement of the filter element within the pixel, and controlling the digital imaging system to cause deposition of the filter material at the selected deposition locations.

Abstract: A system for and method of delivering pulses of a desired mass of gas to a tool is described.

Abstract: A single axis application unit for processing a glass workpiece includes a workpiece supporting table, an applicator movable on a traveler shiftable along a first linear axis and a central suction unit that is activateable to grip the glass workpiece that travels along a second linear axis oriented generally perpendicular to the first linear axis. A central suction unit brake selectively secures the central suction unit both rotationally and translationally. The central suction unit is freely moveable both translationally and rotationally when the central suction unit brake is released. A mid-peripheral suction unit is located at a fixed location remote from the central suction unit and selectively activateable to grip the glass workpiece to hold the glass workpiece in a fixed orientation. A corner suction gripper is movable with the applicator parallel to the first linear axis, and is selectively activateable to grip the glass workpiece.

Abstract: In resin coating, carrying a light-passing member test-coated with a resin on a light-passing member carrying unit; making a light source placed above the light-passing member carrying unit emit excitation light exciting the fluorescent substance; measuring light emission characteristics of the light by irradiating the excitation light emitted from the light source unit from above to the resin coated onto the light-passing member and receiving the light that the resin emits from below the light-passing member by a light emission characteristic measurement unit; obtaining a deviation between a measurement result of the light emission characteristic measurement unit and a prescribed light emission characteristic; and deriving the appropriate resin coating quantity of the resin to be coated onto the LED element as what is used for practical production based on the deviation.

Abstract: A method for providing steerability in a plasma processing environment during substrate processing is provided. The method includes managing, power distribution by controlling power being delivered into the plasma processing environment through an array of electrical elements. The method also includes directing gas flow during substrate processing by controlling the amount of gas flowing through an array of gas injectors into the plasma processing environment, wherein individual ones of the array of gas injectors are interspersed between the array of electrical elements. The method further includes controlling gas exhausting during substrate processing by managing amount of gas exhaust being removed by an array of pumps, wherein the array of electrical elements, the array of gas injectors, and the array of pumps are arranged to create a plurality of plasma regions, each plasma region being substantially similar, thereby creating a uniform plasma region across the substrate.

Abstract: Systems and apparatus are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated.

Abstract: A substrate processing method includes a first step of subjecting a target substrate to a gas process within an atmosphere containing a fluorine-containing process gas, thereby forming a fluorine-containing reaction product on a surface of the target substrate. The method further includes a second step of subjecting the target substrate treated by the gas process to a heating process and a gas process within an atmosphere containing a reactive gas that reacts with fluorine.

Abstract: A light guide plate includes a first transparent base layer, an adhesive layer and a transparent composite layer. The adhesive layer is configured for bonding the transparent composite layer on the first transparent base layer. The transparent composite layer is located on the adhesive layer, and the transparent composite layer comprising a light emitting surface, the light emitting surface includes a plurality of microstructures.

Abstract: A method and apparatus for coating a group of objects may be provided. A three-dimensional model of the group of objects may be generated. Segments that represent each object in the group of objects in the three-dimensional model may be formed. Instructions for coating the group of objects may be generated based on the segments. The instructions may be configured to cause a robotic coating system to coat the group of objects.

Abstract: A plasma processing device includes a processing chamber for generating a plasma, a vacuum window that constitutes a part of a wall of the processing chamber, induction antennas including at least two systems for generating plasma in the processing chamber, radio frequency power sources for applying the current independently to the respective induction antennas, and a controller including phase circuits for controlling the phase of the current of the radio frequency power sources of the respective systems or the current value over time, and a control unit. The controller sequentially time modulates the phase difference between currents flowing to the systems or the current value within a sample processing period to move the plasma generation position so as to make the ion incident angle to the wafer uniform in the wafer plane.

Abstract: The embodiments disclosed herein relate to construction systems, assemblies, and methods. The construction systems can include concrete dispensing assemblies. The concrete dispensing assemblies can be configured to dispense a plurality of discrete units. The concrete dispensing assemblies can also be configured to simultaneously dispense two or more concrete mixtures. One or more dispensing parameter may be controllable, for example, by a computer control system. Additives and/or curing agents may also be used. Exemplary curing agents include carbon dioxide containing materials.

Abstract: A machine (1) for transferring fluids to a moving web (3), comprises: a spreading roller (2) by which the fluids are spread and which is configured to come into contact with the moving web (3); a plurality of distribution rollers (5a-5e) on which the web (3), which is subject to tensioning, is made to run; and a transfer system (8) for transferring fluids to the spreading roller (2); the plurality of distribution rollers (5a-5e) is rotatably pivoted on fixed pins relative to the machine (1) and the spreading roller (2) is slidably constrained to the machine. The invention also relates to a method for transferring fluids to a web by means of the machine.

Abstract: In a Cu wiring structure forming method, a barrier film serving as a Cu diffusion barrier is formed at least on a surface of a recess in a first insulating film formed on a substrate, and the recess is filled with an Al-containing Cu film. A Cu wiring is formed from the Al-containing Cu film, and a cap layer including a Ru film is formed on the Cu wiring. Further, an interface layer containing a Ru—Al alloy is formed at an interface between the Cu wiring and the cap layer by heat generated in forming the cap layer or by a heat treatment performed after forming the cap layer. A second insulating film is formed on the cap layer.

Abstract: Method for printing high resolution features on a substrate, the method comprising: depositing a nanoparticle ink, comprising metal/semi-metal nanoparticles and an adhesive compound, having a binder on a substrate; and applying a laser beam, directly on some or all of the deposited nanoparticle ink to define the print feature, wherein the laser beam is configured to remove the nanoparticle coating or binder thereby allowing the adhesive compound to bond to the nanoparticles and the laser beam is further configured to transform the ink to form a metal/semi-metal structure. The remaining uncured structure can be easily washed away using standard developer solutions such as sodium or potassium hydroxide.

Abstract: Disclosed are coating apparatus including flow coating and roll-coating that may be used for uniform sol-gel coating of substrates such as glass, solar panels, windows or part of an electronic display. Also disclosed are methods for substrate preparation, flow coating and roll coating. Lastly systems and methods for skin curing sol-gel coatings deposited onto the surface of glass substrates using a high temperature air-knife are disclosed.

Abstract: A substrate processing system for sequentially processing substrates includes processing chambers, a transfer unit, and a control unit controlling the processing chambers and the transfer unit. The control unit includes a transfer control unit controlling an operation of the transfer unit, a transfer order setting unit setting a transfer order of substrates to the processing chambers, an accumulation unit for accumulating a film thickness of a formed thin film or the number of processed substrates after completion of previous cleaning or previous pre-coating in the processing chambers, a processing chamber priority determination unit for determining priority of processing the substrates in the processing chambers based on predetermined rules, and an execution instruction unit for executing conditioning in the processing chambers.

Abstract: A lithographic apparatus includes a clamp (406) configured to receive an object (402). The clamp defines at least one channel (408) configured to pass a fluid at a first fluid temperature. The lithographic apparatus also includes a chuck (404) coupled to the clamp. The chuck (404) defines at least one void (464) configured to thermally insulate the chuck from the clamp.