With Treating Means (e.g., Jarring) Patents (Class 118/722)
- Vacuum evaporation means within deposition chamber (e.g., activated reactive evaporation, etc.) (Class 118/723VE)
- Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means) (Class 118/723MP)
- Focused electron beam gas energizing means (Class 118/723FE)
- Focusing means for ion beam coating material or focused ion beam gas energizing means (i.e., excluding ion plating or ion implanting) (Class 118/723FI)
- Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) (Class 118/723MW)
- Hot cathode means for thermionic emission of electrons (e.g., tungsten filament, etc.) (Class 118/723HC)
- Having glow discharge electrodes (e.g., DC, AC, RF, etc.) (Class 118/723E)
- Radio frequency antenna or radio frequency inductive coil discharge means (Class 118/723I)