Abstract: A remote plasma generation apparatus that can enhance plasma processing efficiency by centralizing remote plasma to a processing object is provided. The remote plasma generation apparatus includes: a dielectric support body that has a main body that is connected to a discharge gas injection opening and a nozzle portion that is connected to a plasma outlet; a driving electrode that is fixed to the main body and that receives application of an AC voltage from a power supply unit to generate plasma at internal space of the main body; and a ground electrode that supports a processing object at the outside of the nozzle portion. The nozzle portion includes an inclined surface that is integrally connected to the main body, and by forming a width of the plasma outlet to be smaller than a width of the main body, remote plasma is concentrated to the processing object.

Abstract: Various embodiments include a device for generating plasma and for directing an flow of electrons towards a specific target; the device comprises a hollow cathode; a main electrode at least partially placed inside the cathode; a resistor, electrically earthing the main electrode; a substantially dielectric tubular element extending through a wall of the cathode; a ring-shaped anode placed around the tubular element and earthed; and an activation group which is electrically connected to the cathode and is able to reduce the electric potential of the cathode of at least 8 kV in about 10 ns.

Abstract: A physical vapor deposition system may include an RF generator configured to transmit an AC process signal to a physical vapor deposition chamber via an RF matching network. A detector circuit may be configured to sense the AC process signal and output a DC magnitude error signal and a DC phase error signal. A controller may be coupled to the detector circuit and the RF matching network and configured to receive the DC magnitude and phase error signals and to vary an impedance of the RF matching network in response to the DC magnitude and phase error signals.

Abstract: The present invention relates to a plasma source which is arranged in floating fashion on a vacuum chamber, wherein the plasma source comprises a source housing, and a filament is provided in the source housing and is arranged so as to be insulated therefrom, wherein means for measuring the potential drop between the source housing and the filament are provided. The measured potential drop can be used for regulating the voltage heating the filament. According to the invention, corresponding means are provided.

Abstract: According to embodiments, an inner electrode having a plurality of gas holes includes a first contact surface provided to a part of an outer peripheral surface. An outer electrode includes a second contact surface provided to a part of an inner peripheral surface, corresponding to the first contact surface of the inner electrode. The inner electrode and the outer electrode come into contact with each other on the first and second contact surfaces. A brazing filler metal is filled in a brazing filler metal filling hole that reaches from front side main surfaces of the inner electrode and the outer electrode to the contact surfaces to join the inner electrode and the outer electrode.

Abstract: Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.

Abstract: The invention relates to a plasma source with an oscillator having an active element and a resonator connected to the active element. The resonator has a hollow body, a gas inlet, a gas outlet arranged at a distal end of the hollow body about a longitudinal axis of the hollow body, and a coil arranged along the longitudinal axis of the hollow body, said coil having an effective length of one quarter of a wavelength at a resonant frequency of the resonator. A distal end of the coil is arranged relative to the gas outlet such that a plasma section can form between the distal end of the coil serving as a first plasma electrode and the gas outlet of the hollow body serving as a second plasma electrode. At a proximal end of the hollow body, the coil is lead out of the interior of the hollow body through an electrically contact-free feed-through, and a proximal end of the coil contacts the hollow body at its external side.

Abstract: This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Abstract: Radial transmission line based plasma sources for etch chambers are described. In an example, a radial transmission line based plasma source includes a gas delivery channel having a first end coupled to a gas inlet and having a second end coupled to a plasma showerhead. A folded or co-axial stub surrounds at least a portion of the gas delivery channel. An RF input is coupled to the folded or co-axial stub.

Abstract: A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.

Abstract: A plasma generating system. A pair of electrodes are spaced apart by an electrode gap. A source of a gas adapted to place the gas in the electrode gap. A power generating circuit is coupled to the electrodes to generate an electric field across the electrodes so as to initiate a plasma discharge within the electrode gap. The power generating circuit has adequate capacity to maintain a sufficient electric field across the gap during the plasma discharge to allow a plasma impedance to self-tune to the plasma generating system. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.

Abstract: Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.

Abstract: A physical vapor deposition system may include an RF generator configured to supply a pulsing AC process signal to a target in a physical vapor deposition chamber via the RF matching network. A detector circuit may be coupled to the RF generator and configured to sense the pulsing AC process signal and to produce a corresponding pulsing AC voltage magnitude signal and pulsing AC current magnitude signal. An envelope circuit may be electrically coupled to the detector circuit and configured to receive the pulsing AC voltage and current magnitude signals and to produce a DC voltage envelope signal and a DC current envelope signal. A controller may be electrically coupled to the envelope circuit and the RF matching network and configured to receive the DC voltage and current envelope signals and to vary an impedance of the RF matching network in response to the DC voltage and current envelope signals.

Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.

Abstract: Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.

Abstract: An apparatus includes: an electromagnetic waveguide and an iris structure providing an iris in the electromagnetic waveguide. The iris structure defines an iris hole. The apparatus further includes an electric field rotation arrangement configured to establish a 2N-pole electric field around a circumference of the iris hole, wherein N is an integer which is at least two. The electric field rotation arrangement may include at least four iris slots, each in communication with the iris hole, wherein a first one of the iris slots is further in disposed at a first side of the iris hole and a second one of the iris slots is disposed at a second side of the iris hole which is opposite the first side.

Abstract: A plasma generator may include a first electrode extending in one direction, and a second electrode spaced apart from the first electrode. Facing surfaces of the first electrode and the second electrode may have spiral shapes along the one direction. A cross-section of the first electrode and a cross-section of the second electrode, which are perpendicular to the one direction, may have at least partially concentric shapes. An electrode for generating plasma may include a platform extending in one direction, and at least one protruding thread spirally formed on a surface of the platform along the one direction.

Abstract: Apparatus for forming a magnetic field and methods of use thereof are provided herein. In some embodiments, a plurality of coils having substantially similar dimensions disposed about a process chamber in a symmetric pattern centered about a central axis of the process chamber, wherein the plurality of coils are configured to produce a magnetic field having a plurality of magnetic field lines that are substantially planar and substantially parallel. In some embodiments, the plurality of coils comprises eight coils disposed about the process chamber, wherein each of the eight coils is offset by an angle of about 45 degrees from respective adjacent coils of the eight coils.

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract: Methods and apparatus are described that use an array of two or more cold plasma jet ports oriented to converge at a treatment area. The use of an array permits greater tissue penetration by cold plasma treatments. This approach enables treatment of deeper infections of soft and hard tissues without surgical intervention. For example, this approach can treat sub-integumental infections, such as those common to joint replacements, without surgically opening the issues overlying the deeper infection.

Abstract: A method to modulate the density of an electron beam as it is emitted from a cathode, the method comprised of connecting a source of pulsed input power to the input end of a nonlinear transmission line and connecting the output end directly to the cathode of an electron beam diode by a direct electrical connection.

Abstract: Apparatuses and methods for treating wounds are disclosed. An apparatus for treating wounds is disclosed comprising an instrument for generating a low temperature, atmospheric pressure plasma, a means of flowing gas comprising mixing an inert gas and a reactive gas through the instrument, and a means of contacting the wound with the reactive gases flowing out of the instrument. A method for treating wounds using reactive gases is disclosed. The use of atmospheric pressure plasmas for treating wounds is also disclosed.

Abstract: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses the electrode cell. The electrode cell includes a first electrode, a discharge space, a second electrode, dielectrics, and a pass-through formed in a central portion in a plan view. An insulating tube having a cylindrical shape is arranged within the pass-through. Ejection holes are formed in a side surface of the cylindrical shape. The plasma generation apparatus further includes a precursor supply part that is connected to a hollow portion of the insulating tube and configured to supply a metal precursor.

Abstract: A method and apparatus is provided for generating a plasma electron flood using microwave radiation. In one embodiment, a microwave PEF apparatus is configured to generate a magnetic field that rapidly decays over a PEF cavity, resulting in a static magnetic field having a high magnetic field strength near one side (e.g., “bottom”) of the PEF cavity and a low magnetic field strength (e.g., substantially zero) near the opposite side (e.g., “top”) of the PEF comprising an elongated extraction slit. In one particular embodiment, the one or more permanent magnets are located at a position that is spatially opposed to the location of the elongated extraction slit to achieve the rapidly decaying magnetic field. The magnetic field results in an electron cyclotron frequency in a region of the cavity equal to or approximately equal to a microwave radiation frequency so that plasma is generated to diffuse through the extraction apertures.

Abstract: An improved electrode for use in a plasma arc torch. The electrode includes an electrode body, a cavity in a front face at a first end of the electrode body, and an insert disposed in the cavity. The first end of the electrode body is formed of high purity copper containing at least 99.81% copper. The insert has a first end and a second end and is formed of a high emissivity material. A diameter of the first end of the insert is less than a diameter of a second end of the insert. An electrode is compressed to retain the insert using radial compression. The invention also includes a method for forming the electrode, and a method of operation of an electrode in a plasma torch.

Abstract: According to one embodiment, a power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber. The power supply control device includes a radio frequency power supply, a storage unit, and a matching circuit. The radio frequency power supply supplies a power to the plasma generation unit. The storage unit stores matching information including a first matching value, a second process condition, and a third matching value. The first matching value corresponds to process information of a first process condition. The second matching value corresponds to process information of a second process condition. The third matching value corresponds to process information of a transient state where the first process condition is being switched to the second process condition. The matching circuit matches impedances based on the matching information.

Abstract: In one embodiment an ion source includes an arc chamber and an emitter having a surface disposed in the arc chamber, where the emitter is configured to generate a plasma in the arc chamber. The ion source further includes a repeller having a repeller surface positioned opposite the emitter surface, and a hollow cathode coupled to the repeller and configured to provide a feed material into the arc chamber.

Abstract: A vacuum ultraviolet (VUV) photon source includes a body, a VUV window, electrodes disposed on the body outside an interior thereof, and a dielectric barrier between the electrodes. A method for generating VUV photons includes generating a dielectric barrier discharge (DBD) in an interior of a photon source by applying a periodic voltage between a first electrode and a second electrode separated by a dielectric barrier, wherein the DBD produces excimers from a gas in a gap between the electrodes, and transmitting VUV photons through a window of the photon source.

Abstract: Systems and methods for statistical data decimation are described. The method includes receiving a variable from a radio frequency (RF) system, propagating the variable through a model of the RF system, and counting an output of the model for the variable to generate a count. The method further includes determining whether the count meets a count threshold, generating a statistical value of the variable at the output of the model upon determining that the count meets the count threshold, and sending the statistical value to the RF system to adjust the variable.

Abstract: In one aspect, a method includes protecting passive components connected to a high-frequency generator. In another aspect, a system includes a high-frequency generator having an HF source generating a high-frequency power signal at a fundamental frequency, and having a first control circuit which is fed with a signal related to an HF power transmitted by a high-frequency cable between the high-frequency generator and a load.

Abstract: The invention relates to a special plasma source designated as a plasma intractor (PI) for producing a cold, homogeneous plasma under atmospheric pressure conditions, which plasma source can be used advantageously to excite and control reactive processes in flowing media. The device according to the invention is characterized in that the device comprises at least 6 elongated electrodes (2) and a molded body (1) made of insulating material, the molded body (1) being provided with an elongated cylindrical cavity (7) and with additional holes, which are guided parallel to the cavity (7) and arranged symmetrical to the axis of the cavity and equidistant to one another, and the electrodes (2) are embedded in holes of the molded body (1) and are connected to an AC high-voltage supply in such a way that the polarities of respective adjacent electrodes are opposite in each phase of the voltage period.

Abstract: The present invention relates to a method and device for generating optical radiation (18), in particular EUV radiation or soft x-rays, by means of electrically operated discharges. A plasma (15) is ignited in a gaseous medium between at least two electrodes (1, 2), wherein said gaseous medium is produced at least partly from a liquid material (6), which is applied to one or several surface(s) moving in the discharge space and is at least partially evaporated by one or several pulsed energy beam(s) (9). At least two consecutive pulses (16) are applied within a time interval of each electrical discharge onto said surface(s). The delay between and/or the pulse energy of said consecutive pulses is controlled to stabilize the position of an emission center of the plasma (15).

Abstract: A filter for filtering radio frequency (RF) power transmitted from an electrostatic chuck (ESC) in a plasma processing system. The plasma processing system may include a heating element disposed at the ESC. The plasma processing system may further include a power supply. The filter may include a core member and a cable wound around and wound along the core member to form a set of inductors. The cable may include a plurality of wires, including a first wire and a second wire, a portion of the first wire and a portion of the second wire being twisted together, a first end of the first wire and a first end of the second wire being connected to the heating element, each of a second end of the first wire and a second end of the second wire being connected to a capacitor and being connected to the power supply.

Abstract: The invention relates to a method for ionizing and identifying gases, wherein the gases to be identified are ionized in a reaction chamber and the product ions are measured, wherein the measurement of the product ions takes place via electrical fields acting on the product ions and the detection is performed with a detector for ions. It is provided that ionization takes place via UV radiation, and that simultaneously or sequentially ionization by electrons takes place. The invention further relates to a device for ionizing and identifying gases, which includes an ion source chamber having an ion source and an ion mobility spectrometer. For this purpose, a partition between the ion source chamber and the ion mobility spectrometer has a UV-transparent window and a window permeable for electrons, wherein UV radiation and electron radiation can be generated in the ion source chamber with the ion source.

Abstract: A method and a system for increasing the lifespan of a plasma obtained in the atmosphere. The method includes the following steps: emitting a femtosecond laser pulse, referred to as a first pulse, generating a column of plasma by the filamentation phenomenon, and emitting a second YAG laser pulse, focused by way of an axicon on a line in the plasma column, the energy of the photons of the second laser pulse being greater than the attachment energy of the electrons in the plasma to neutral molecules such as oxygen molecules. The duration of the second pulse is greater than the duration of the first pulse, and the delay between the two pulses is greater than one microsecond.

Abstract: Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.

Abstract: A method for stabilizing plasma ignition in a continuous process conducted on a substrate, includes: applying a spike of RF power between an upper electrode and a lower electrode on which the substrate is placed, wherein the spike starts from zero power, jumps to a spike power, and then drops to a base power which is so low as to cause plasma ignition failure; and continuously applying RF power at the base power between the upper and lower electrode for a duration substantially longer than a duration of the spike to process the substrate. The spike is such that ignition failure is reduced.

Abstract: A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring at the discharge gap; a ground plane disposed on the second surface of the substrate; a gas flow element configured to flow gas between at least one of: (1) the discharge gap, and (2) the pair of electrode extensions; and a structure disposed adjacent the substrate to form an enclosure that substantially encloses at least a region including the discharge gap and the electrode extensions, the enclosure being adapted to contain a plasma.

Abstract: A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

Abstract: An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield.

Abstract: A cathode assembly and a method for generation of pulsed plasma are disclosed. The cathode assembly comprises a cathode holder connected to multiple longitudinally aligned cathodes, preferably of the same diameter, and different lengths. The method is characterized by forming an electric arc between the cathodes in the assembly and an anode by passing DC current of a predetermined magnitude. Once the arc is established the current is reduced to the magnitude sufficient to sustain an electric arc, or a slightly larger magnitude, thereby reducing the area of arc attachment to a single cathode. Once the area of attachment has been reduced, the current is raised to the operational level of the pulse, while the area of attachment does not increase significantly.

Abstract: The invention relates to a plasma generating device that comprises at least one very high frequency source (>100 MHz) connected via an impedance adaptation device to an elongated conductor attached on a dielectric substrate, at least one means for cooling said conductor, and at least one gas supply in the vicinity of the dielectric substrate on a side opposite to that bearing the conductor. The invention also relates to plasma torches using said device.

Abstract: A novel ion source is described having an improved lifetime. The ion source, in one embodiment, is a proton source, including an external RF antenna mounted to an RF window. To prevent backstreaming electrons formed in the beam column from striking the RF window, a back streaming electron dump is provided, which in one embodiment is formed of a cylindrical tube, open at one end to the ion source chamber and capped at its other end by a metal plug. The plug, maintained at the same electrical potential as the source, captures these backstreaming electrons, and thus prevents localized heating of the window, which due to said heating, might otherwise cause window damage.

Abstract: A plasma generator has a first member 2 containing a dielectric material, and an electrode group composed of a plurality of electrodes and including a first assembly 6 partially including a plurality of electrodes and a second assembly 7 partially including a plurality of electrodes. In accordance with an AC voltage, the first assembly 6 generates a plasma in a first space 23 contacting the first member 2. In accordance with a DC voltage, the second assembly 7 generates an electric field in a second space 24 contacting the first member 2 and communicating with the first space 23. At least one or more electrodes of a portion of the first assembly 6 and at least one or more electrodes of a portion of the second assembly 7 are provided on the surface of or in the inside of the first member 2.

Abstract: Systems and methods may be provided for cylindrical Hall thrusters with independently controllable ionization and acceleration stages. The systems and methods may include a cylindrical channel having a center axial direction, a gas inlet for directing ionizable gas to an ionization section of the cylindrical channel, an ionization device that ionizes at least a portion of the ionizable gas within the ionization section to generate ionized gas, and an acceleration device distinct from the ionization device. The acceleration device may provide an axial electric field for an acceleration section of the cylindrical channel to accelerate the ionized gas through the acceleration section, where the axial electric field has an axial direction in relation to the center axial direction. The ionization section and the acceleration section of the cylindrical channel may be substantially non-overlapping.

Abstract: This disclosure describes systems, methods, and apparatus for capacitively coupling energy into a plasma to ignite and sustain the plasma within a remote plasma source. The power is provided by a first electrode that at least partially surrounds or is surrounded by a second electrode. The second electrode can be grounded or floating. First and second dielectric components can be arranged to separate one or both of the electrodes from the plasma and thereby DC isolate the plasma from one or both of the electrodes.

Abstract: The present invention provides a plasma generation apparatus that, even when a source gas is supplied into a housing where an electrode cell is arranged, does not cause a problem of corrosion of a power feed part and an electrode surface arranged in the housing and a problem of deposition of a metal in a place within the housing other than a discharge part of the electrode cell. A plasma generation apparatus (100) according to the present invention includes an electrode cell and a housing (16) that encloses the electrode cell. The electrode cell includes a first electrode (3), a second electrode (1) facing the first electrode (3) with interposition of a discharge space (6) therebetween, and dielectrics (2a, 2b) arranged on main surfaces of the electrodes (1, 3).

Abstract: A thermionic emission device includes an insulating substrate, a patterned carbon nanotube film structure, a positive electrode and a negative electrode. The insulating substrate includes a surface. The surface includes an edge. The patterned carbon nanotube film structure is partially arranged on the surface of the insulating substrate. The patterned carbon nanotube film structure includes two strip-shaped arms joined at one end to form a tip portion protruded from the edge of the surface of the insulating substrate and suspended. The patterned carbon nanotube film structure includes a number of carbon nanotubes parallel to the surface of the insulating substrate. The patterned carbon nanotube film structure is connected between the positive electrode and the negative electrode in series.

Abstract: Provided is a plasma ignition technique allowing easy and reliable ignition and reignition of plasma without monitoring or manual handling. A plasma ignition system according to this technique is provided with a radio-frequency power supply configured to supply a predetermined high frequency signal to an applied electrode for generating plasma; a matching device configured to match impedance on a side of the radio-frequency power supply and impedance on a side of the applied electrode; a forward wave/reflected wave detector configured to detect a forward wave and a reflected wave of the high frequency signal; a high-voltage generator configured to generate a predetermined high voltage; and a controller configured to superimpose the high voltage on the high frequency signal when a ratio of the reflected wave to the forward wave is greater than a first threshold value.

Abstract: In a high-frequency power supply for plasma having a housing and a high-frequency circuit substrate placed inside the housing elements for supplying a high-frequency current to a high-frequency inductive coil are mounted on the high-frequency circuit substrate, a cooling block for cooling the high-frequency circuit substrate, a fan for sending air to the elements on the high-frequency circuit substrate as wind are further provided, and fins for allowing air to flow through so that the air is cooled are formed on the surface of the cooling block. The housing is provided with an air path for supplying the air that has flown through the fins to the absorbing side of the fan.