Oxygen Containing Patents (Class 423/325)
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Patent number: 5973057Abstract: Deaggregated highly disperse silicic acid, in which the average particle size is less than 100 nm, preferably less than 50 nm, is prepared by extremely high mechanical stress. The deaggregated silicic acid is employed as a filler in silicone rubber mixtures.Type: GrantFiled: December 22, 1997Date of Patent: October 26, 1999Assignee: Huels Silicone GmbHInventors: Peter Schoeley, Ralf Winkler, Harald Schickmann
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Patent number: 5962132Abstract: A method of making silicon oxide nanoparticles possessing photoluminescence in the blue and green part of the visible spectrum when irradiated with ultraviolet (UV) light. The silicon oxide nanoparticles are formed in a chamber containing a direct current (dc) electric arc that generates a plasma in an oxygen-containing atmosphere. In the chamber, silicon is used as the anode, and the cathode can be copper (Cu) or tungsten (W). The use of silicon as an electrode is enabled by doping silicon with boron to a sufficiently high electronic conductivity, and orienting the two electrodes vertically in the chamber, so that the silicon anode is lowermost to contain silicon in the anode when it melts and vaporizes in the arc. The silicon oxide nanoparticles are collected on a cold plate adjacent to the arc.Type: GrantFiled: January 8, 1998Date of Patent: October 5, 1999Assignee: Northwestern UniversityInventors: Robert Pang Heng Chang, Jeffrey Michael Lauerhaas, Tobin Jay Marks, Udo C. Pernisz
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Patent number: 5876683Abstract: A low pressure combustion flame method for the production of nanophase powders, coatings and free-standing forms. The process involves controlled thermal decomposition of one or more metalorganic precursors in a flat-flame combustor unit in which both temperature distribution and gas phase residence time are uniform over the entire surface of the burner. It is this feature that makes the combustion flame reactor such a versatile tool for (1) high rate production of loosely agglomerated nanoparticle powders with controlled particle size and distribution, (2) uniform deposition of shape conformal nanophase coatings, and (3) net-shaped fabrication of nanocrystalline free-standing forms such as sheets, rings and drums. Applications for this new nanomaterials processing technology include electrical, thermal, optical, display, magnetic, catalytic, tribological and structural materials.Type: GrantFiled: November 2, 1995Date of Patent: March 2, 1999Inventors: Nicholas Glumac, Bernard H. Kear, Ganesh Skandan, Yijia Chen
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Patent number: 5855859Abstract: A gettering agent for gettering metals from a solution. The gettering agent has a surface layer of SiO.sub.2 which is greater than 15 angstroms in thickness.Type: GrantFiled: October 30, 1996Date of Patent: January 5, 1999Assignee: MEMC Electronic Materials, Inc.Inventors: Larry W. Shive, Saeed Pirooz
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Patent number: 5834389Abstract: The invention is directed to a silicon oxynitride ceramic material characterised by the following relative intensities and d spacings for the most intense X-ray powder diffraction peaks:______________________________________ d.ANG. I ______________________________________ 4.421 66 3.414 39 3.329 100 2.686 24 2.416 51 2.Type: GrantFiled: April 29, 1997Date of Patent: November 10, 1998Assignee: Industrial Research LimitedInventors: Glen Clifton Barris, Carolyn Mary Sheppard
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Patent number: 5824280Abstract: A lithium ion battery electrode formed by the pyrolysis of a siloxane polymer of the structure(R.sup.1 R.sup.2 R.sup.3 SiO.sub.0.5).sub.w (R.sup.4 R.sup.5 SiO).sub.x (R.sup.6 SiO.sub.1.5).sub.y (SiO.sub.4/2).sub.zfollowed by introducing lithium ions. In this structure, each R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are independently selected from the group consisting of hydrogen and a hydrocarbon, w is in the range of 0 to about 0.8, x is in the range of 0 to about 0.9, y is in the range of 0 to about 0.9, z is in the range of 0 to 1 and w+x+y+z=1.Type: GrantFiled: June 11, 1996Date of Patent: October 20, 1998Assignee: Dow Corning CorporationInventors: Jeffery Raymond Dahn, Katsuya Eguchi, Alf M. Wilson, Weibing Xing, Gregg Alan Zank
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Patent number: 5789075Abstract: The present invention relates to mat-shaped composites having porosities above 60% and densities below 0.6 g/cm.sup.3, comprising an aerogel and fibers dispersed therein, the aerogel having cracks and the aerogel fragments enclosed by the cracks, whose average volume is 0.001 mm.sup.3 to 1 cm.sup.3, being held together by the fibers. The present invention further relates to processes for producing the composites of the invention and to their use.Type: GrantFiled: February 20, 1997Date of Patent: August 4, 1998Assignee: Hoechst AktiengesellschaftInventors: Dierk Frank, Andreas Zimmermann
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Patent number: 5785941Abstract: A process for preparing finely divided silica by reaction of gaseous or vaporizable silicon compounds in a mixture with gases forming water on combustion with air or oxygen in a flame includes producing discharges of gas in the combustion chamber by means of at least one gas gun. The apparatus for carrying out this process has applied to the outside of the combustion chamber wall at least one gas gun which produces a discharge of gas via an opening in the combustion chamber wall, preferably in conjunction with a nozzle on the inside of the combustion chamber wall.Type: GrantFiled: November 13, 1995Date of Patent: July 28, 1998Inventors: Helmut Maginot, Johann Huber
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Patent number: 5771472Abstract: The invention relates to a process for the conditioning of radioactive waste using silicated apatites as the confinement matrix.This process consists of incorporating the waste (1) into a phosphosilicated apatite-based confinement matrix (3) e.g. complying with the formula:M.sub.t Ca.sub.x Ln.sub.y A.sub.z (PO.sub.4).sub.u (SiO.sub.4).sub.6-u X (I)in which M is an alkali metal, Ln a rare earth, A an actinide, X is S.sup.2-, 2F.sup.-, 2Cl.sup.-, 2Br.sup.-, 2I.sup.- or 2OH.sup.- and u is between 0 and 6.Type: GrantFiled: November 16, 1995Date of Patent: June 23, 1998Assignee: Commissariat a l'Energie AtomiqueInventors: Joelle Carpena, Jean-Louis Lacout
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Patent number: 5756628Abstract: The present invention provides an inorganic-organic hybrid material having both the characteristics of the inorganic material and the characteristics of the organic material. The material has a lamellar structure formed by piling a sheet of silicon tetrahedrons upon a sheet of titanium octahedrons. In this lamellar structure, an organic group is bonded to a center atom of a tetrahedron via a covalent bond. The organic group can be polymerized to make the organic phyllotitanosilicate a tough and hard coating material. The hybrid material of the present invention thus has both the characteristics, such as high hardness and heat resistance, of the constitutive inorganic material and the characteristics, such as flexibility and filmability at room temperature, of the constitutive organic material, and further has an excellent UV-blocking property.Type: GrantFiled: March 10, 1997Date of Patent: May 26, 1998Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Masaaki Tani, Yoshiaki Fukushima, Kazuo Okamoto, Kazuhisa Yano
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Patent number: 5730838Abstract: A process is disclosed for extracting pure, coarse-grain silicic acid crystals from silicic acid-containing spent lye in cellulose production, comprising adding coarse-grain silicic acid to alkalized spent lye, lowering the pH of the alkalized spent lye to about 9 such that a sediment is formed, separating the sediment formed into coarse grain and fine grain silicic acid with little lignin and lignin-containing spent lye free from silicic acid, and separating the coarse grain and fine grain silicic acid with little lignin into course grain silicic acid and lignin. At least part of the course grain silicic acid separated is fed back to the alkalinized spent lye to be desilicified.Type: GrantFiled: June 21, 1996Date of Patent: March 24, 1998Assignee: Austrian Energy & Environment SGP/Waagner-BIRO GmbHInventor: Alfred Glasner
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Patent number: 5710067Abstract: A silicon oxime film is formed by plasma enhanced chemical vapor deposition. The silicon oxime film is useful as an anti-reflection layer during photolithography, as an etch stop, and as a protection layer.Type: GrantFiled: June 7, 1995Date of Patent: January 20, 1998Assignee: Advanced Micro Devices, Inc.Inventors: David K. Foote, Subash Gupta
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Patent number: 5695730Abstract: The present invention provides silicic acid hydrate having a large pore volume and tiny particle diameters, and a process for preparing it. There is disclosed silicic acid hydrate obtained by neutralizing an aqueous solution of sodium silicate with a mineral acid, which has particle properties represented by an oil absorption of 250 to 350 ml/100 g, a total pore volume of 4.0 to 6.0 cc/g, an average pore radius of 200 to 400 .ANG., and an average pore diameter of 3.0 to 15 .mu.m by the laser method, or 2.0 to 4.0 .mu.m by the coulter method, or 0.5 to 3.5 .mu.m by the centrifugal precipitation method.Type: GrantFiled: September 20, 1995Date of Patent: December 9, 1997Assignee: Nippon Paper Industries Co., Ltd.Inventors: Kuniaki Maejima, Shigeki Yamagata, Tomohiro Banda, Masaru Kishida, Keiji Monbetsu, Tsutomu Naito
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Patent number: 5670687Abstract: The invention relates to a process for preparing organosilanes which contain at least one Si-bonded hydrogen in the presence of a phosphonium catalyst, the phosphonium catalyst itself and also a process for its preparation.Type: GrantFiled: October 15, 1996Date of Patent: September 23, 1997Assignee: Wacker-Chemie GmbHInventors: Gilbert Geisberger, Tassilo Lindner
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Patent number: 5635154Abstract: Disclosed herein is a process for producing fine metal oxide particles comprising the step of heat-treating an aqueous solution of a metal salt at a temperature of not lower than 200.degree. C. under a pressure of not less than 160 kg/cm.sup.2 for 1 second to 1 hour so as to bring into the decomposition reaction of said metal salt.Type: GrantFiled: May 23, 1995Date of Patent: June 3, 1997Assignee: Nissan Chemical Industries Ltd.Inventors: Kunio Arai, Tadafumi Ajiri
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Patent number: 5625054Abstract: The present invention relates to fluorinated surfaces which exhibit sufficient hydrophilicity and sufficient electropositivity to bind DNA from a suspension containing DNA and permit elution of the DNA from the surface. Generally, the hydrophilic and electropositive characteristics are expressed at the fluorinated surface. Preferred fluorinated surfaces of the present invention include fluorinated Al(OH).sub.3, fluorinated SiO.sub.2 and fluorinated Celite. The fluorinated surfaces of the present invention are particularly useful in processes for purification of DNA from other cellular components. In these processes, a suspension of cellular components is placed in contact with the fluorinated surface, the fluorinated surface is washed to remove all cellular components other than DNA which are bound to the surface, and the bound DNA is eluted from the surface. Lower concentrations of chaotrope in the binding buffer are needed to bind DNA to the fluorinated surfaces.Type: GrantFiled: May 25, 1995Date of Patent: April 29, 1997Assignee: Becton Dickinson and CompanyInventors: Daniel L. Woodard, Adriann J. Howard, James A. Down
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Patent number: 5618766Abstract: Lightweight, monolithic ceramics resistant to oxidation in air at high temperatures are made by impregnating a porous carbon preform with a sol which contains a mixture of tetraethoxysilane, dimethyldiethoxysilane and trimethyl borate. The sol is gelled and dried on the carbon preform to form a ceramic precursor. The precursor is pyrolyzed in an inert atmosphere to form the ceramic which is made of carbon, silicon, oxygen and boron. The carbon of the preform reacts with the dried gel during the pyrolysis to form a component of the resulting ceramic. The ceramic is of the same size, shape and form as the carbon precursor. Thus, using a porous, fibrous carbon precursor, such as a carbon felt, results in a porous, fibrous ceramic. Ceramics of the invention are useful as lightweight tiles for a reentry spacecraft.Type: GrantFiled: July 22, 1996Date of Patent: April 8, 1997Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space AdministrationInventors: Daniel B. Leiser, Ming-Ta Hsu, Timothy S. Chen
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Patent number: 5601807Abstract: The invention is directed to provide novel sunscreen materials which are to protect human skin from the harmful ultraviolet radiation. Said sunscreen materials, designated Bolite-S, according to the invention having a composition, expressed in terms of moles of oxides as follows:mRO:vB.sub.2 O.sub.3 :wFe.sub.2 O.sub.3 :xSiO.sub.2 :yTiO.sub.2 :zH.sub.2 Owherein "R" is selected from the group consisting of hydrogen, alkyl groups containing 1-4 carbon atoms, and mixtures thereof, "m" is a value between 0 and about 1200, "v" is a value between 0 and about 500, "w" is a value between 0 and about 100, "x" is a value between 0 and about 200, "y" is a value between 1 and about 300 and "z" is a value of from 0 to about 300, said Bolite-S materials in calcined form having a characteristic X-ray powder diffraction pattern which contains the interplanar spacings and their assigned strengths set forth in Table 1.Type: GrantFiled: May 19, 1995Date of Patent: February 11, 1997Inventor: Hisatoshi Asaoka
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Patent number: 5599759Abstract: A process for producing a heat-resistant and high-purity porous silicon oxide material having excellent crystallinity and uniformity in pore size. The process includes: a first step of dispersing a substance containing silicon in an aqueous solution of a surfactant and adjusting the pH of the dispersion to a value of 10 or higher; a second step of adjusting the pH thereof to a value lower than 10 and forming a composite of a silicon oxide and a surfactant; and a third step of removing the surfactant from the composite. A water-soluble component is preferably removed from the dispersion between the first and second steps.Type: GrantFiled: June 21, 1995Date of Patent: February 4, 1997Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Shinji Inagaki, Yoshiaki Fukushima, Yuri Yamada
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Patent number: 5527871Abstract: A layered inorganic-organic polymer having the features of both inorganic and organic materials and a coating material produced therefrom. The former is produced, for example, by reacting an organoalkoxysilane having alkoxyl groups and organic groups with a metal salt or alkoxide in an alkaline solution. This reaction yields a layered inorganic-organic polymer composed of one or two sheets of tetrahedrons with a central atom of Si or a metal and a sheet of octahedrons with a central atom of a metal, part or all of the central atoms of the tetrahedrons being covalently bonded to organic groups. If the organic group is one which contains a functional group capable of polymerization, the resulting layered inorganic-organic polymer may be polymerized with a functional group to give a firm coating material. The functional group of the organic group may be bonded to an organic compound.Type: GrantFiled: April 12, 1995Date of Patent: June 18, 1996Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Masaaki Tani, Yoshiaki Fukushima, Akane Okada, Katsuya Mizutani
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Patent number: 5525319Abstract: Boron silicates, phosphosilicates and aluminum silicates useful as binding surfaces for DNA purification. These compounds allow DNA to be bound and eluted under native conditions (i.e., in the absence of chaotropes or alcohols) using only water, low salt buffers or physiological buffers. Methods for preparation of the compounds and methods for purifying DNA using the compounds are also provided.Type: GrantFiled: March 11, 1994Date of Patent: June 11, 1996Assignee: Becton, Dickinson and CompanyInventors: Daniel L. Woodard, Adriann J. Howard, James A. Down
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Patent number: 5503816Abstract: The present invention relates to a silicon-containing material which exhibits sufficient hydrophilicity and sufficient electropositivity to bind DNA from a suspension containing DNA and permit elution of the DNA from the material. Generally, the hydrophilic and electropositive characteristics are expressed at the surface of the silicon-containing material. Preferred silicon-containing materials of the present invention include boron silicate, aluminum silicate, phosphosilicate, silica carbonyl, silica sulfonyl and silica phosphonyl. The silicon-containing materials of the present invention are particularly useful in processes for purification of DNA from other cellular components. In these processes, a suspension of cellular components is placed in contact with the silicon-containing material, the silicon-containing material is washed to remove all cellular components other than DNA which are bound to the material, and the bound DNA is eluted from the material.Type: GrantFiled: September 27, 1993Date of Patent: April 2, 1996Assignee: Becton Dickinson and CompanyInventors: Daniel L. Woodard, Adriann J. Howard, James A. Down
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Patent number: 5503817Abstract: A novel curing process for preceramic organosilicon polymers is disclosed which involves contact with a gaseous hydrogen halide.Type: GrantFiled: January 16, 1986Date of Patent: April 2, 1996Assignee: Hoechst Celanese Corp.Inventor: Paul Foley
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Patent number: 5438129Abstract: The present invention relates to fluorinated surfaces which exhibit sufficient hydrophilicity and sufficient electropositivity to bind DNA from a suspension containing DNA and permit elution of the DNA from the surface. Generally, the hydrophilic and electropositive characteristics are expressed at the fluorinated surface. Preferred fluorinated surfaces of the present invention include fluorinated Al(OH).sub.3, fluorinated SiO.sub.2 and fluorinated Celite. The fluorinated surfaces of the present invention are particularly useful in processes for purification of DNA from other cellular components. In these processes, a suspension of cellular components is placed in contact with the fluorinated surface, the fluorinated surface is washed to remove all cellular components other than DNA which are bound to the surface, and the bound DNA is eluted from the surface. Lower concentrations of chaotrope in the binding buffer are needed to bind DNA to the fluorinated surfaces.Type: GrantFiled: September 27, 1993Date of Patent: August 1, 1995Assignee: Becton Dickinson and CompanyInventors: Daniel L. Woodard, Adriann J. Howard, James A. Down
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Patent number: 5412043Abstract: This invention relates to sol-gel methods for forming non-shrinking, high-glass composite materials and the products. Also taught is an inorganic-organic composite material having a solid interwoven network of an inorganic polymer matrix with interpenetrating polymerized alcohols. The inorganic matrix can be based on either Si or Ti atoms.Type: GrantFiled: August 24, 1993Date of Patent: May 2, 1995Assignee: The Regents of the University of CaliforniaInventors: Bruce M. Novak, Mark W. Ellsworth
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Patent number: 5409682Abstract: Essentially alkali-free borosilicate crystals having a zeolite structure and a size of from 2 to 150 .mu.m, measured over the longitudinal crystallite axis, are prepared by a process in which an SiO.sub.2 -containing mixture of water, a tetraalkylammonium compound, a boron component and ammonia is reacted hydrothermally in the absence of a metal hydroxide or of a metal salt in a molar ratio of ammonia/tetraalkylammonium of from 3:1 to 150:1.Type: GrantFiled: December 23, 1993Date of Patent: April 25, 1995Assignee: BASF AktiengesellschaftInventors: Ulrich Mueller, Wolfgang Hoelderich
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Patent number: 5346678Abstract: A process for preparation of silicon-32 is provide and includes contacting an irradiated potassium chloride target, including spallation products from a prior irradiation, with sufficient water, hydrochloric acid or potassium hydroxide to form a solution, filtering the solution, adjusting pH of the solution to from about 5.5 to about 7.5, admixing sufficient molybdate-reagent to the solution to adjust the pH of the solution to about 1.Type: GrantFiled: September 25, 1992Date of Patent: September 13, 1994Assignee: The United States of America as represented by the United States Department of EnergyInventors: Dennis R. Phillips, Mark A. Brzezinski
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Patent number: 5292830Abstract: A thermoplastic silicon-containing polymer, which may be a precursor of SiC, and which can be transformed to a thermosetting polymer by copolymerizing it with a thermosetting perhydropolysilazane or polyborosilazane.Type: GrantFiled: June 18, 1992Date of Patent: March 8, 1994Assignee: Tonen CorporationInventors: Osamu Funayama, Tomohiro Kato, Rika Takatsu, Yuuji Tashiro, Toshihide Kishi, Takayuki Date, Takeshi Isoda
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Patent number: 5279661Abstract: Compositions suitable for depositing coatings containing silicon and oxygen are disclosed. The compositions contain vaporized hydrogen silsesquioxane in a diluent gas.Type: GrantFiled: April 27, 1992Date of Patent: January 18, 1994Assignee: Dow Corning CorporationInventor: Theresa E. Gentle
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Patent number: 5254746Abstract: The phenols and phenol ethers are hydroxylated by reaction with hydrogen peroxide in the presence of a catalytically effective amount of a titanozeosilite, advantageously a silicon oxide/titanium oxide MFI zeolite having the general formula:SI.sub.(96-x), Ti.sub.x O.sub.192.Type: GrantFiled: August 19, 1992Date of Patent: October 19, 1993Assignee: Rhone-Poulenc ChimieInventors: Michel Costantini, Jean-Michel Popa, Michel Gubelmann
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Patent number: 5229336Abstract: The high-purity, heat-resistant oxynitride glass can be produced by subjecting a fine silica powder block to a nitriding treatment by heating it while keeping it in contact with an ammonia-containing gas in a reducing environment, which is achieved by at least one of the following means: (a) embedding the fine silica powder block in carbon powder, (b) placing the fine silica powder block in a carbon pipe or container, and (c) introducing a reducing gas, and simultaneously or subsequently sintering it.Type: GrantFiled: September 27, 1991Date of Patent: July 20, 1993Assignee: Tosoh CorporationInventors: Tomoyuki Akiyama, Koji Tsukuma
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Patent number: 5211921Abstract: A process for making metal oxides including niobium or tantalum oxides from ferro and nickel alloys containing these metals involving the multiple steps of hydriding the ferro or nickel alloy selected, under conditions of suitable temperature and pressure to render the alloys friable, subdividing the hydrided product into selected particle sizes, then nitriding with a nitrogen-containing gas at elevated temperatures above 500.degree. C. to form the alloy constituent nitrides, thereafter leaching the nitrides formed with aqueous acid to separate the formed ferro or nickel nitride from the acid soluble nitrides from the acid insoluble nitrides, calcining the acid insoluble nitrides with oxygen-containing gas under conditions suitable for the formation of the metal oxide of the acid soluble nitride.Type: GrantFiled: July 7, 1992Date of Patent: May 18, 1993Assignee: Teledyne Industries, Inc.Inventors: James A. Sommers, Verlin Q. Perkins
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Patent number: 5202104Abstract: A process for preparing silica having a low silanol content which comprises heating amorphous silica in an atmosphere of a low partial pressure of water vapor to maintain the amorphous silica at a temperature in a range of from 600.degree. to 1000.degree. C. at a first heating step and then maintain at a temperature of 1200.degree. C. or more at a second heating step. The silica having a low silanol content obtained according to the present invention is advantageously used as a raw material for quartz glass, particularly as a raw material for preparing crucibles used to pull up silicon single crystals.Type: GrantFiled: February 20, 1990Date of Patent: April 13, 1993Assignee: Nitto Chemical Industry Co., Ltd.Inventors: Naotake Watanabe, Koichi Orii, Junsuke Yagi, Iwao Ohshima
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Patent number: 5188810Abstract: A process for preparing metal oxides from ferrometal and nickel metal alloys is disclosed comprising first providing a ferrometal or nickel metal alloy containing an oxide forming metal, hydriding the alloy to an effective temperature and pressure with hydrogen containing gas, subdividing then carbiding the hydrided product at a temperature above about 500.degree. C. to form carbides, then employing an aqueous acid leach to dissolve the iron or nickel carbide and separating the acid soluble from the acid insoluble carbides. The acid insoluble carbides are reacted with oxygen at an elevated temperature for a time sufficient to form the metal oxides of said carbides.Type: GrantFiled: April 2, 1992Date of Patent: February 23, 1993Assignee: Teledyne Industries, Inc.Inventor: James A. Sommers
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Patent number: 5165905Abstract: A process for producing high purity silicic acid aqueous solution is disclosed, wherein alkali metals in an alkali silicate solution are removed by ion-exchanging, the resulting solution is treated in an electrochemical process in the present of a strong acid and oxidizing agent to solubilize the remaining non-alkali metal salts, and the non-alkali metals in the water soluble salts are removed by ion-exchanging to obtain the silicic acid aqueous solution.Type: GrantFiled: November 30, 1990Date of Patent: November 24, 1992Assignee: Monsanto Japan Ltd.Inventors: Shigeo Sasaki, Miho Yamada
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Patent number: 5114887Abstract: The process of this invention for preparing oxynitride ceramic fibers comprises spinning a viscous sol obtained by the hydrolysis of a feed mainly consisting of metal alkoxides, steam-treating the gel fibers, and firing the steam-treated gel fibers in a stream of ammonia and is commercially useful for the production of oxynitride fibers with excellent hardness, strength, modulus of elasticity, heat resistance, and corrosion resistance.Type: GrantFiled: April 19, 1991Date of Patent: May 19, 1992Assignee: Colloid Research InstituteInventors: Masahiro Sekine, Shingo Katayama
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Patent number: 5106604Abstract: Hydridospherosiloxanes and soluble hydrogensilsesquioxane resin are produced having the formula (HSiO.sub.3/2).sub.n, where n is an even integer greater than 8. A biphasic reaction medium is prepared, having a first solvent phase and a second solvent phase. The first solvent phase can contain a hydrocarbon solvent, such as an alcohol. The first solvent phase can be methanol or ethanol. The second solvent phase is a concentrated solution of a metal salt, such as Fe(III) in a polar organic solvent and water. A silicon compound represented by the formula: HSiX.sub.3, where X is a group which is hydrolyzable in the solvent of said first solvent phase, is added to the biphasic reaction medium. X can be Cl or OCH.sub.3. The first solvent phase is separated from the second solvent phase and then the separated first solvent phase is treated with a metal salt, such as sodium or potassium carbonate. Slow evaporation of the first solvent phase solvent is employed to isolate a mixture of crystals of (HSiO.sub.3/2).sub.Type: GrantFiled: March 12, 1991Date of Patent: April 21, 1992Inventor: Pradyot Agaskar
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Patent number: 5096685Abstract: A system for manufacturing fine-grained SiO powder includes means for heating a mixture of an SiO.sub.2 containing material and an Si and/or C containing material for generating SiO vapor, and for condensing the generated SiO vapor from a gaseous state in the presence of non-oxidizing gas and under substantially low pressure. Preferably, vacuum is maintained at the position where thermal reaction generates SiO vapor. Non-oxidizing gas serves for transferring vapor-state SiO and/or fine-grained SiO powder to an SiO collection chamber. This successfully prevents the SiO from being accumulated within a transfer pipe or duct and thus prevents the pipe or duct from being blocked. Furthermore, substantially low pressure (vacuum) atmosphere encourages SiO vapor generation from the reagent mixture and thus permits a lower heating temperature to cause SiO vapor generation.Type: GrantFiled: July 27, 1990Date of Patent: March 17, 1992Assignee: Kawasaki Steel CorporationInventors: Toshihiko Funahashi, Kenichi Ueda, Ryoji Uchimura, Yukio Oguchi
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Patent number: 5091162Abstract: The present invention relates to soluble perhydrosiloxane copolymers of the formula [H.sub.2 SiO].sub.x [HSiO.sub.3/2 ].sub.y wherein the mole fractions x and y total 1. In addition, the present invention relates to the use of these novel copolymers as coating materials, especially for use on electronic devices.Type: GrantFiled: October 1, 1990Date of Patent: February 25, 1992Assignee: Dow Corning CorporationInventors: Cecil L. Frye, Loren A. Haluska, Keith D. Weiss, Ronald H. Baney
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Patent number: 5079323Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).Type: GrantFiled: July 18, 1990Date of Patent: January 7, 1992Assignee: Toa Nenro Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 5063267Abstract: The present invention relates to hydrogen silsesquioxane resin (H-resin) fractions derived from an extraction process using one or more fluids at, near or above their critical state. These fractions can comprise narrow molecular weight fractions with a dispersity less than about 3.0 or fractions useful for applying coatings on substrates. The invention also relates to a method of using these fractions for forming ceramic coatings on substrates.Type: GrantFiled: November 28, 1990Date of Patent: November 5, 1991Assignee: Dow Corning CorporationInventors: Larry F. Hanneman, Theresa E. Gentle, Kenneth G. Sharp
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Patent number: 4999397Abstract: The present invention provides a relatively simple synthesis procedure for the formation of silane hydrolyzate compositions of the formula ##EQU1## where R is hydrogen or a methyl group, n is an integer greater than about 8, and x is a number between 0 and 2. The hydrolyzate compositions are metastable in solvent solution but become insoluble after coating on a substrate. The resins are useful as planarizing coatings for substrates such as electronic devices and can be ceramified by subjecting them to an oxidizing atmosphere at a temperature of between about 100.degree. to 1000.degree. C. to form ceramic or ceramic-like coatings on such substrates.Type: GrantFiled: July 28, 1989Date of Patent: March 12, 1991Assignee: Dow Corning CorporationInventors: Keith D. Weiss, Cecil L. Frye
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Patent number: 4981664Abstract: A method for producing high purity silica and ammonium fluoride from silicon tetrafluoride-containing gas wherein silicon tetrafluoride-containing gas from the acidulation of phosphorus-containing rock is recovered and the liquid entrainment is separated from the gas. The recovered gas is converted to an ammonium fluosilicate solution and is ammoniated to produce high purity silica and ammonium fluoride. The recovered gas can be converted to an ammonium fluosilicate solution either by absorbing the gas directly in a solution of ammonium fluoride or by first absorbing the gas in water to produce fluosilicic acid and then reacting the fluosilicic acid with ammonia or ammonium fluoride.Type: GrantFiled: April 14, 1988Date of Patent: January 1, 1991Assignee: International Minerals & Chemical CorporationInventor: Paul C. Chieng
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Patent number: 4977125Abstract: This invention relates to a process for the preparation of Si.sub.2 N.sub.2 O-containing which comprises reacting an amorphous, non-porous silicon dioxide material with flowing, ammonia-containing gas at temperatures of 950.degree.-1300.degree. C. The expression "flowing, ammonia-containing gas" refers to a large number of different gas mixtures which may contain only ammonia or one or more other gases besides ammonia, such as nitrogen, hydrogen, carbon monoxide, carbon dioxide or oxygen. Preferably, pure ammonia or ammonia mixed with the customary unconverted reaction components of the ammonia synthesis, optionally mixed with traces of carbon dioxide, carbon monoxide or oxygen, is employed.Type: GrantFiled: September 27, 1989Date of Patent: December 11, 1990Assignee: Shell Oil CompanyInventor: Peter W. Lednor
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Patent number: 4975394Abstract: A sintered silicon oxynitride composition comprises as an amount of starting material the combination of (a) a silicon component comprising silicon nitride(Si.sub.3 N.sub.4) and silicon oxide(SiO.sub.2) in a mol ratio of SiO.sub.2 /Si.sub.3 N.sub.4 being 0.7 to 1.2, and (b) at least one second component selected from an aluminum oxide, an aluminum nitride, a rare earth oxide, and a rare earth nitride, said second component being in an amount of from about 0.1 to 10 mol per 100 mol of said silicon component.Type: GrantFiled: April 28, 1988Date of Patent: December 4, 1990Assignees: NGK Spark Plug Co., Ltd., Kozo Iizuka, Director-General of Agency of Industrial Science and TechnologyInventors: Shuzo Kanzaki, Masayoshi Ohashi, Hideyo Tabata, Osami Abe, Tooru Shimamori, Koichi Moori
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Patent number: 4965058Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH-- and --SiH.sub.2).sub.m O-- as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mols % or more) and oxygen (5 mol % or more).Type: GrantFiled: July 19, 1989Date of Patent: October 23, 1990Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 4965061Abstract: A process for producing hydrofluoric acid from SiF.sub.6.sup.2- in a wastewater is disclosed. The process is carried out by(i) combining (NH.sub.4).sub.2 SO.sub.4, at a pH high enough such that the sulfate is in its divalent state, with SiF.sub.6.sup.2- from said wastewater in an amount in excess of that stoichiometrically required to form (NH.sub.4).sub.2 SiF.sub.6 as follows:(NH.sub.4).sub.2 SO.sub.4 +SiF.sub.6.sup.2- .fwdarw.(NH.sub.4).sub.2 SiF.sub.6 +SO.sub.4.sup.2-(ii) concentrating a solution including (NH.sub.4).sub.2 SiF.sub.6 and excess (NH.sub.4).sub.2 SO.sub.4 to precipitate and separate (NH.sub.4).sub.2 SiF.sub.6 of high purity therefrom;(iii) re-solubilizing the (NH.sub.4).sub.2 SiF.sub.6 for reaction with NH.sub.4 OH to form NH.sub.4 F liquor and precipitated Si(OH).sub.4 ;(iv) separating the NH.sub.4 F liquor from the precipitated Si(OH).sub.4 ;(v) reacting the NH.sub.4 F with water to form precipitated NH.sub.4 F.multidot.HF and ammonia gas;(vi) reacting NH.sub.4 F.multidot.Type: GrantFiled: January 30, 1989Date of Patent: October 23, 1990Assignee: Florida Recoveries PartnershipInventors: William W. Berry, Gordon J. Rossiter
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Patent number: 4888159Abstract: This invention relates to a process for the preparation of Si.sub.2 N.sub.2 O-containing materials which comprises reacting an amorphous, non-porous silicon dioxide material with flowing, ammonia-containing gas at temperatures of 950.degree.-1300.degree. C. The expression "flowing, ammonia-containing gas" refers to a large number of different gas mixtures which may contain only ammonia or one or more other gases besides ammonia, such as nitrogen, hydrogen, carbon monoxide, carbon dioxide or oxygen. Preferably, pure ammonia or ammonia mixed with the customary uncoverted reaction components of the ammonia synthesis, optionally mixed with traces of carbon dioxide, carbon monoxide or oxygen, is employed.Type: GrantFiled: May 4, 1988Date of Patent: December 19, 1989Assignee: Shell Oil CompanyInventor: Peter W. Lednor
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Patent number: 4869858Abstract: Novel polysiloxazanes comprising [(SiH.sub.2).sub.n NH] and [(SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).Type: GrantFiled: February 12, 1987Date of Patent: September 26, 1989Assignee: Toa Nenryo Kogyo Kabushiki KaishaInventors: Osamu Funayama, Mikiro Arai, Hayato Nishii, Takeshi Isoda
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Patent number: 4853016Abstract: Silicon monoxide grains finer than 10 mesh are vacuum hot pressed to form a glass billet which can than be used to provide silicon monoxide of a size and/or shape suitable for vapor deposition purposes.Type: GrantFiled: August 8, 1988Date of Patent: August 1, 1989Assignee: GTE Products CorporationInventors: Chad I. Stevens, Edward D. Parent