Nonuniform Or Patterned Ion Plating Or Ion Implanting (e.g., Mask, Etc.) Patents (Class 427/526)
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Publication number: 20110104618Abstract: Various methods of utilizing the physical and chemical property differences between amorphized and crystalline silicon are used to create masks that can be used for subsequent implants. In some embodiments, the difference in film growth between amorphous and crystalline silicon is used to create the mask. In other embodiments, the difference in reflectivity or light absorption between amorphous and crystalline silicon is used to create the mask. In other embodiments, differences in the characteristics of doped and undoped silicon is used to create masks.Type: ApplicationFiled: November 1, 2010Publication date: May 5, 2011Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.Inventors: Nicholas P.T. Bateman, Helen L. Maynard, Benjamin B. Riordon, Christopher R. Hatem, Deepak Ramappa
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Patent number: 7916986Abstract: An erbium (Er)-doped silicon (Si) nanocrystalline embedded silicon oxide (SiOx) waveguide and associated fabrication method are presented. The method provides a bottom layer, and forms an Er-doped Si nanocrystalline embedded SiOx film waveguide overlying the bottom layer, having a minimum optical attenuation at about 1540 nanometers (nm). Then, a top layer is formed overlying the Er-doped SiOx film. The Er-doped SiOx film is formed by depositing a silicon rich silicon oxide (SRSO) film using a high density plasma chemical vapor deposition (HDPCVD) process and annealing the SRSO film. After implanting Er+ ions, the Er-doped SiOx film is annealed again. The Er-doped Si nanocrystalline SiOx film includes has a first refractive index (n) in the range of 1.46 to 2.30. The top and bottom layers have a second refractive index, less than the first refractive index.Type: GrantFiled: April 30, 2008Date of Patent: March 29, 2011Assignee: Sharp Laboratories of America, Inc.Inventors: Hao Zhang, Pooran Chandra Joshi, Apostolos T. Voutsas
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Publication number: 20110070411Abstract: The present invention provides a plastic with improved gloss properties and a surface treatment method for plastic, which forms a nanopattern and a hardened layer on the surface of a polymer material by irradiating an argon ion beam onto the surface to change the refractive index, thus changing the gloss of the polymer variously using only the polymer/plastic material.Type: ApplicationFiled: March 26, 2010Publication date: March 24, 2011Applicants: HYUNDAI MOTOR COMPANY, KIA MOTORS CORPORATION, KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Yong Jun Jang, Ki Chun Lee, Sang Sun Park, Kwang Ryeol Lee, Myoung Woon Moon, Faruque Ahmed Sk
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Patent number: 7838061Abstract: Disclosed herein is a method of fabricating a high temperature superconducting film in a vacuum chamber through auxiliary cluster beam spraying using an evaporation method, wherein a high temperature superconducting material is deposited on a substrate in a vapor state by evaporating the high temperature superconducting material, and at the same time, a cluster beam material is formed into gas atoms by heating the cluster beam material charged in a housing, and the formed gas atoms pass through a nozzle of an inlet of the housing and then are sprayed and grown on the substrate in the form of the cluster beam, thereby forming pinning centers in the high temperature superconducting film.Type: GrantFiled: January 12, 2007Date of Patent: November 23, 2010Assignee: Korea Electrotechnology Research InstituteInventors: Sang Soo Oh, Ho Seop Kim, Kyu Jung Song, Do Jun Youm, Sun Mi Lim, Yong Hwan Jung, Sang Moo Lee, Ye Hyun Jung, Jae Eun Yoo
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Publication number: 20100272917Abstract: A method and apparatus, the method including: forming a recess in a graphene layer wherein the recess creates a boundary between a first portion of the graphene layer and a second portion of the graphene layer; depositing electrically insulating material within the recess; and depositing an electrically conductive material over the insulating material.Type: ApplicationFiled: April 28, 2009Publication date: October 28, 2010Inventors: Samiul Haque, Reijo K. Lehtiniemi, Asta M. Karkkainen, Lorenz Lechner, Pertti Hakonen
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Publication number: 20100261040Abstract: Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on the substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of alternative processes that expose substrates to energy of varying forms.Type: ApplicationFiled: April 13, 2010Publication date: October 14, 2010Applicant: APPLIED MATERIALS, INC.Inventors: Majeed A. Foad, Nir Merry
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Publication number: 20100238236Abstract: A lyophobic treatment method for imparting lyophobic properties to a surface of a base material having a hole section, includes: a lyophobic film forming step of forming a lyophobic film on the surface and inner wall faces of the hole section of the base material; a protective member forming step of forming a protective member on the lyophobic film on the surface of the base material; a lyophobic film removal step of removing the lyophobic film on the inner wall faces of the hole section of the base material; a protective member removal step of removing the protective member on the lyophobic film on the surface of the base material; and an ion injection step of injecting ions exhibiting lyophobic properties into at least a peripheral portion of an opening of the hole section in the surface of the base material.Type: ApplicationFiled: March 22, 2010Publication date: September 23, 2010Inventor: Hiroki Uchiyama
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Patent number: 7794798Abstract: A method for depositing material on a substrate is described. The method comprises maintaining a reduced-pressure environment around a substrate holder for holding a substrate having a surface, and holding the substrate securely within the reduced-pressure environment. Additionally, the method comprises providing to the reduced-pressure environment a gas cluster ion beam (GCIB) from a pressurized gas mixture, accelerating the GCIB, and irradiating the accelerated GCIB onto at least a portion of the surface of the substrate to form a thin film. In one embodiment, the pressurized gas mixture comprises a silicon-containing specie and at least one of a nitrogen-containing specie or a carbon-containing specie for forming a thin film containing silicon and at least one of nitrogen or carbon. In another embodiment, the gas mixture comprises a metal-containing specie for forming a thin metal-containing film.Type: GrantFiled: September 29, 2007Date of Patent: September 14, 2010Assignee: TEL Epion Inc.Inventor: John J. Hautala
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Patent number: 7790216Abstract: A method for producing a zirconia-layered orthopedic implant component includes depositing zirconium onto the orthopedic implant component, thereby forming a zirconium-layered component, and converting at least a portion of the zirconium into a substantially monoclinic zirconia surface layer unaccompanied by a substantial underlying ?-phase. A method for producing a zirconia-layered orthopedic implant component includes depositing zirconium onto the orthopedic implant component by ion bombardment and deposition in a vacuum to form a zirconium-layered component including an intermix zone at least 1000 ? thick and a zirconium layer about 3-5 ?m thick, and heat treating the zirconium-layered component at a temperature of about 500-600° C. in an atmosphere containing oxygen.Type: GrantFiled: April 19, 2005Date of Patent: September 7, 2010Assignee: Zimmer Technology, Inc.Inventors: Oludele Popoola, Jeffrey P. Anderson, Michael E. Hawkins, Todd S. Johnson, H. Ravindranath Shetty
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Publication number: 20100209731Abstract: An article surface ornamental structure that is easy to work and able to form a decorative pattern of an optional design and a high-grade feeling produced thanks to the metallic luster and, if necessary, to form a third dimensional decorative pattern. A metal-coated layer is formed by depositing a metal material with metallic luster on a surface of a base material. The metal-coated layer is at least partly provided with a separation part part, in which the based material has its surface exposed to create an ornamental pattern thanks to a difference between the outer appearance of the base material and the metallic luster of the remaining metal-coated layer. With the base material and the metal-coated layer exposed, respectively, each of their surfaces is coated with a clear-coating layer made of synthetic resin material having transmittancy in order to protect the surface of the ornamental pattern.Type: ApplicationFiled: April 8, 2009Publication date: August 19, 2010Applicant: HAMANO PLATING CO., LTD.Inventor: Kimio Hamano
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Publication number: 20100159154Abstract: A method in one embodiment includes forming a layer of a nonmagnetic material above an upper surface of a substrate; forming a resist structure above the layer of nonmagnetic material, wherein the resist structure has an undercut; removing a portion of the layer of nonmagnetic material not covered by the resist structure; depositing a layer of magnetic material above the substrate adjacent a remaining portion of the layer of nonmagnetic material such that at least portions of the layer of magnetic material and the remaining portion of the layer of nonmagnetic material lie in a common plane; removing the resist structure; and forming a write pole above the layer of magnetic material and the remaining portion of the layer of nonmagnetic material. Additional methods are also presented.Type: ApplicationFiled: December 22, 2008Publication date: June 24, 2010Inventors: Amanda Baer, Wen-Chien David Hsiao, John I. Kim, Vladimir Nikitin, Trevor W. Olson, John Bruce Piggott, JR., Yuan Yao
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Publication number: 20100124529Abstract: A method of manufacturing carbon cylindrical structures, as represented by carbon nanotubes, by growing them on a substrate using a chemical vapor deposition (CVD) method, comprising the steps of implanting metal ions to the substrate surface and then growing the carbon cylindrical structures using the metal ions as a catalyst. A method of manufacturing carbon nanotubes comprising a step of using nano-carbon material as seed material for growing carbon nanotubes is also disclosed. A biopolymer detection device comprising vibration inducing part for inducing vibration, binding part capable of resonating with the vibration induced by the vibration inducing part and capable of binding or interacting with a target biopolymer, and detection part for detecting whether or not the binding part have bound or interacted with the target biopolymer, is also disclosed.Type: ApplicationFiled: June 19, 2009Publication date: May 20, 2010Applicant: FUJITSU LIMTEDInventors: Yuji Awano, Akio Kawabata, Shozo Fujita
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Patent number: 7718231Abstract: A method of fabricating silicon-on-insulators (SOIs) having a thin, but uniform buried oxide region beneath a Si-containing over-layer is provided. The SOI structures are fabricated by first modifying a surface of a Si-containing substrate to contain a large concentration of vacancies or voids. Next, a Si-containing layer is typically, but not always, formed atop the substrate and then oxygen ions are implanted into the structure utilizing a low-oxygen dose. The structure is then annealed to convert the implanted oxygen ions into a thin, but uniform thermal buried oxide region.Type: GrantFiled: September 30, 2003Date of Patent: May 18, 2010Assignee: International Business Machines CorporationInventors: Kwang Su Choe, Keith E. Fogel, Siegfried L. Maurer, Ryan M. Mitchell, Devendra K. Sadana
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Patent number: 7713591Abstract: An apparatus and method is disclosed for orienting the magnetic anisotropy of longitudinal patterned magnetic recording media. A disk-shaped longitudinal granular magnetic recording medium is provided having a high orientation ratio in the circumferential direction. The medium is then patterned to form a uniform array of magnetic islands. The magnetic islands are then irradiated with ions to increase the magnetic exchange coupling between the grains of each island. This aligns the axes of magnetic anisotropy of the individual grains with the average axis of magnetic anisotropy of the grains, thereby aligning the magnetic anisotropy of each island along the circumferential direction.Type: GrantFiled: August 22, 2005Date of Patent: May 11, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Manfred Albrecht, Andreas Moser, Natacha Supper, Bruce Terris
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Patent number: 7709062Abstract: A hole in a sample from which a sample piece has been extracted with a focused ion beam is filled at high speed using ion beam gas assisted deposition. A method of filling the hole by using the ion beam includes a step of irradiating the hole formed in a face of the sample with the ion beam to thereby form an ion beam gas-assisted deposition layer in the hole. The ion beam gas-assisted deposition layer is formed in the hole while controlling the area to which the ion beam is irradiated so as to cause the ion beam to fall on a part of a side wall of the hole and to not fall on another part of the side wall in an area scanned with the ion beam. The filled hole may then be covered with a protective film.Type: GrantFiled: December 19, 2002Date of Patent: May 4, 2010Assignee: Hitachi High-Technologies CorporationInventors: Hiroyasu Shichi, Muneyuki Fukuda, Isamu Sekihara, Satoshi Tomimatsu, Kaoru Umemura
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Publication number: 20100098873Abstract: A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.Type: ApplicationFiled: October 22, 2008Publication date: April 22, 2010Inventors: STEVEN VERHAVERBEKE, Omkaram Nalamasu, Majeed Foad, Mahalingam Venkatesan, Nety M. Krishna
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Publication number: 20100092739Abstract: The invention relates to an aqueous composition for preparing an edible coating on a microwavable food, which composition comprises at least one prolamin and at least one hydrocolloid or gelling agent. The invention further relates to a microwavable food comprising an edible coating, which coating comprises at least one prolamin and at least one hydrocolloid or gelling agent.Type: ApplicationFiled: December 21, 2007Publication date: April 15, 2010Applicant: Nederlandse Organisatie voor toegepast-natuurweten schappelijk onderzoek TNOInventors: Anton Kaasjager, Arjan Hovestad, Hein Jager
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Publication number: 20100089866Abstract: A method of making nanowire probes is provided. The method includes providing a template having a nanoporous structure, providing a probe tip that is disposed on top of the template, and growing nanowires on the probe tip, where the nanowires are grown from the probe tip along the nanopores, and the nanowires conform to the shape of the nanopores.Type: ApplicationFiled: October 10, 2008Publication date: April 15, 2010Inventors: Friedrich B. Prinz, Neil Dasgupta, Munekazu Motoyama
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Publication number: 20100047667Abstract: A method for forming a mixed metal coating on a gas diffusion medium substantially free of ionomeric components which includes the steps of subjecting an electrically conductive web to a first ion beam having an energy not higher than 500 eV, then to a second beam having an energy of at least 500 eV containing the ions of a first metal, and to at least a third beam having an energy of at least 500 eV containing the ions of a noble metal. The invention also relates to gas diffusion electrodes.Type: ApplicationFiled: June 30, 2006Publication date: February 25, 2010Applicant: BASF Fuel Cell GmbHInventors: Andrea Gulla, Robert Allen
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Patent number: 7666464Abstract: A method of measuring ion dose in a plasma immersion ion implantation reactor during ion implantation of a selected species into a workpiece includes placing the workpiece on a pedestal in the reactor and feeding into the reactor a process gas comprising a species to be implanted into the workpiece, and then coupling RF plasma source power to a plasma in the reactor. It further includes coupling RF bias power to the workpiece by an RF bias power generator that is coupled to the workpiece through a bias feedpoint of the reactor and measuring RF current at the feedpoint to generate a current-related value, and then integrating the current-related over time to produce an ion implantation dose-related value.Type: GrantFiled: October 23, 2004Date of Patent: February 23, 2010Assignee: Applied Materials, Inc.Inventors: Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Andrew Nguyen, Biagio Gallo
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Publication number: 20100032550Abstract: Disclosed are embodiments of an image sensor and a method of manufacturing the same. The image sensor includes an insulating layer on a substrate, and a graded-index microlens in the insulating layer corresponding to each pixel of the image sensor.Type: ApplicationFiled: July 28, 2009Publication date: February 11, 2010Inventor: Young Je Yun
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Publication number: 20100021695Abstract: An engraved plate which includes a substrate and an insulating layer on a surface of the substrate wherein a concave portion which increases in width toward an opening and to which the substrate is exposed is formed at the insulating layer, and an engraved plate, a substrate with conductor layer pattern manufactured by a transferring method using the engraved plate, and a conductor layer pattern are provided.Type: ApplicationFiled: December 27, 2007Publication date: January 28, 2010Inventors: Susumu Naoyuki, Hisashige Kanbara, Minoru Tosaka, Kyosuke Suzuki, Toshirou Okamura, Yoshihito Kikuhara, Masami Negishi, Tadayasu Fujieda, Kouichi Tsuyama
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Publication number: 20090316096Abstract: The present invention includes a method of preparing a dry deposited liquid-crystal alignment layer using one of a mechanical mask, photo-resist, UV treatment, and ridge and fringe field methods. The present invention further provides a multi-domain, wide viewing angle liquid-crystal display, comprising: a bottom substrate; a first transparent conductive layer; a top substrate; a color filter layer; a second transparent conductive layer; a first dry deposited liquid-crystal alignment layer; a second dry deposited liquid-crystal alignment layer, the second dry deposited liquid-crystal alignment layer being spaced adjacent to and facing the first dry deposited liquid-crystal alignment layer; spacers; and a liquid-crystal material.Type: ApplicationFiled: August 27, 2009Publication date: December 24, 2009Inventors: Alessandro Cesare Callegari, Praveen Chaudhari, James Patrick Doyle, Eileen Galligan, James Andrew Lacey, Shui-Chih Alan Lien
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Publication number: 20090244777Abstract: A disclosed method for manufacturing a magnetic recording medium includes a first step of forming a magnetic recording film on a non-magnetic substrate and a second step of forming, in the magnetic recording film, a magnetic recording region which is magnetically recordable and an isolation region which is magnetically non-recordable and includes a first isolation-region portion and a second isolation-region portion. The second step includes the sub-steps of performing first ion implantation on the magnetic recording film to form the first isolation-region portion along a boundary of the isolation region to be formed with the magnetic recording region to be formed; and performing second ion implantation on the magnetic recording film to form the second isolation-region portion in the surface of the isolation region to be formed.Type: ApplicationFiled: October 22, 2008Publication date: October 1, 2009Applicant: FUJITSU LIMITEDInventors: Sanae Shimizu, Yuji Ito
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Publication number: 20090232449Abstract: An erbium (Er)-doped silicon (Si) nanocrystalline embedded silicon oxide (SiOx) waveguide and associated fabrication method are presented. The method provides a bottom layer, and forms an Er-doped Si nanocrystalline embedded SiOx film waveguide overlying the bottom layer, having a minimum optical attenuation at about 1540 nanometers (nm). Then, a top layer is formed overlying the Er-doped SiOx film. The Er-doped SiOx film is formed by depositing a silicon rich silicon oxide (SRSO) film using a high density plasma chemical vapor deposition (HDPCVD) process and annealing the SRSO film. After implanting Er+ ions, the Er-doped SiOx film is annealed again. The Er-doped Si nanocrystalline SiOx film includes has a first refractive index (n) in the range of 1.46 to 2.30. The top and bottom layers have a second refractive index, less than the first refractive index.Type: ApplicationFiled: April 30, 2008Publication date: September 17, 2009Inventors: Hao Zhang, Pooran Chandra Joshi, Apostolos T. Voutsas
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Patent number: 7585424Abstract: This invention provides a pattern reversal process for self aligned imprint lithography (SAIL). The method includes providing a substrate and depositing at least one layer of material upon the substrate. A pattern is then established upon the layer of material, the pattern providing at least one exposed area and at least one covered area of the layer of material. The exposed areas are treated to toughen the material and reverse the pattern. Subsequent etching removes the un-toughened material. A thin-film transistor device provided by the pattern reversal process is also provided.Type: GrantFiled: January 18, 2005Date of Patent: September 8, 2009Assignee: Hewlett-Packard Development Company, L.P.Inventor: Ping Mei
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Publication number: 20090213497Abstract: Embodiments of the present invention provide recording area separated magnetic recording media (DTMs, BPMs) allowing magnetic heads to fly lower. According to one embodiment, the recording area separated magnetic recording media are configured so that magnetic recording layers have parts with the relatively higher element ratio of a ferromagnetic material, and parts with the lower element ratio of the ferromagnetic material, occurring periodically in the in-plane direction, and the average height from the substrate surface of the parts with the relatively higher element ratio of a ferromagnetic material is higher than the average height from the substrate surface of the parts with the lower element ratio of the ferromagnetic material.Type: ApplicationFiled: February 20, 2009Publication date: August 27, 2009Inventors: Toshinori Ono, Hiroshi Kanai, Tatsuysa Hinoue, Hiroyuki Suzuki, Hiroshi Inaba
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Publication number: 20090214169Abstract: N-V centers in diamond are created in a controlled manner. In one embodiment, a single crystal diamond is formed using a CVD process, and then annealed to remove N-V centers. A thin layer of single crystal diamond is then formed with a controlled number of N-V centers. The N-V centers form Qubits for use in electronic circuits. Masked and controlled ion implants, coupled with annealing are used in CVD formed diamond to create structures for both optical applications and nanoelectromechanical device formation. Waveguides may be formed optically coupled to the N-V centers and further coupled to sources and detectors of light to interact with the N-V centers.Type: ApplicationFiled: July 11, 2006Publication date: August 27, 2009Inventors: Robert C. Linares, Patrick J. Doering, William W. Dromeshauser, Bryant Linares, Alfred R. Genis
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Publication number: 20090214898Abstract: Embodiments of the present invention help to produce discrete track media and bit patterned media having both excellent recording and reproducing performance and reliability. According to one embodiment, a manufacturing method forms a nonmagnetic layer mainly composed of the same element as a nonmagnetic element contained in magnetic recording layers and on the magnetic recording layers and a mask layer having apertures for forming more concentrated parts of the nonmagnetic element in the magnetic recording layers on the nonmagnetic layer. The method implants ions of the nonmagnetic element through the nonmagnetic layer masked by the mask layer to form the more concentrated parts of the nonmagnetic element in the magnetic recording layer.Type: ApplicationFiled: February 10, 2009Publication date: August 27, 2009Inventors: Tatsuya Hinoue, Hiroshi Kanai, Toshinori Ono, Hiroyuki Suzuki, Hiroshi Inaba
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Publication number: 20090214895Abstract: Embodiments of the present invention produce discrete track media and bit patterned media having both excellent read/write performance and reliability. According to one embodiment, the medium comprises a magnetic layers formed by at least two ferromagnetic alloy layers with different compositions on a substrate. The ferromagnetic alloy layer located closest to the medium surface has more concentrated parts and less concentrated parts of nonmagnetic element in the in-plane direction. The more concentrated parts of the nonmagnetic element contain more nonmagnetic elements than the other parts except for an intermediate layer in the magnetic recording layer. The more concentrated parts and the less concentrated parts of the nonmagnetic element in the ferromagnetic alloy layer located closest to the medium surface are formed substantially concentric. The more concentrated parts of the nonmagnetic element is formed by being doped with ions of nonmagnetic element.Type: ApplicationFiled: February 18, 2009Publication date: August 27, 2009Inventors: Tatsuya Hinoue, Hiroshi Kanai, Toshinori Ono, Hiroyuki Suzuki, Hiroshi Inaba
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Patent number: 7578889Abstract: Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.Type: GrantFiled: March 30, 2007Date of Patent: August 25, 2009Assignee: Lam Research CorporationInventors: Hong Shih, Yaobo Yin, Shun Jackson Wu, Armen Avoyan, John E. Daugherty, Linda Jiang
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Patent number: 7566483Abstract: Modified strain regions are created in correlation to strain reactive structures that are subjected to a predetermined dimensional precision adjustment. The modified strain regions are created by impacting incident particles into exposed regions of the strain reactive structures. The irradiation by the incident particles creates a predetermined material disruption and consequently a change in strain energy. The strain energy, and the associated dimensional adjustment is dependent on the irradiation process and the sum properties of the modified strain regions and the strain reactive structure.Type: GrantFiled: June 4, 2004Date of Patent: July 28, 2009Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: John Edward Eric Baglin, Richard D. Bunch, Linden James Crawforth, Eric W. Flint, Andrew J. Kellock, Timothy Clark Reiley
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Patent number: 7566482Abstract: A method in which a SOI substrate structure is fabricated by oxidation of graded porous Si is provided. The graded porous Si is formed by first implanting a dopant (p- or n-type) into a Si-containing substrate, activating the dopant using an activation anneal step and then anodizing the implanted and activated dopant region in a HF-containing solution. The graded porous Si has a relatively coarse top layer and a fine porous layer that is buried beneath the top layer. Upon a subsequent oxidation step, the fine buried porous layer is converted into a buried oxide, while the coarse top layer coalesces into a solid Si-containing over-layer by surface migration of Si atoms.Type: GrantFiled: September 30, 2003Date of Patent: July 28, 2009Assignee: International Business Machines CorporationInventors: Kwang Su Choe, Keith E. Fogel, Devendra K. Sadana
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Publication number: 20090180213Abstract: A discrete track-type magnetic recording medium (30) includes a nonmagnetic substrate (1), a magnetic recording track and a servo signal pattern that are provided on at least one side of the nonmagnetic substrate and a part (4) nonmagnetized through implantation (7) of ions from above a mask (6) having a shape of a pattern expected to be separated for physically separating the magnetic recording track and the servo signal pattern. A magnetic recording and reproducing device includes the magnetic recording medium (30), a driving part (26) serving to drive the magnetic recording medium in a direction of recording, a magnetic head (27) composed of a recording part and a reproducing part, means (28) to impart motion to the magnetic head relative to the magnetic recording medium and recording and reproducing signal processing means (29) for entering a signal into the magnetic head and reproducing an output signal from the magnetic head.Type: ApplicationFiled: February 19, 2007Publication date: July 16, 2009Applicant: SHOWA DENKO K.K.Inventors: Masato Fukushima, Akira Sakawaki, Yasumasa Sasaki
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Publication number: 20090087578Abstract: A method for depositing material on a substrate is described. The method comprises maintaining a reduced-pressure environment around a substrate holder for holding a substrate having a surface, and holding the substrate securely within the reduced-pressure environment. Additionally, the method comprises providing to the reduced-pressure environment a gas cluster ion beam (GCIB) from a pressurized gas mixture, accelerating the GCIB, and irradiating the accelerated GCIB onto at least a portion of the surface of the substrate to form a thin film. In one embodiment, the pressurized gas mixture comprises a silicon-containing specie and at least one of a nitrogen-containing specie or a carbon-containing specie for forming a thin film containing silicon and at least one of nitrogen or carbon. In another embodiment, the gas mixture comprises a metal-containing specie for forming a thin metal-containing film.Type: ApplicationFiled: September 29, 2007Publication date: April 2, 2009Applicant: TEL EPION INC.Inventor: John J. Hautala
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Patent number: 7465478Abstract: A method of processing a workpiece includes placing the workpiece on a workpiece support pedestal in a main chamber with a gas distribution showerhead, introducing a process gas into a remote plasma source chamber and generating a plasma in the remote plasma source chamber, transporting plasma-generated species from the remote plasma source chamber to the gas distribution showerhead so as to distribute the plasma-generated species into the main chamber through the gas distribution showerhead, and applying plasma RF power into the main chamber.Type: GrantFiled: January 28, 2005Date of Patent: December 16, 2008Assignee: Applied Materials, Inc.Inventors: Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo
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Publication number: 20080260478Abstract: A PVD coating is disclosed, and in particular a nanoscale multilayer superlattice PVD coating comprising high hardness, a low friction coefficient and increased chemical inertness. The multilayer coating comprises a repeating bilayer represented by (VxMe(i-x))CyN(i-y)/(MezV(1-z))CyN(i-y) where 0.1?x?0.9; 0.01<y<0.99 and 0.1?z?0.9 and Me is a substantially pure metal or a metal alloy. The composition of the coating through the layers alternates from layer to layer according to a V-rich layer and a Me-rich layer modulated sequence. Vanadium is incorporated within the layer composition and has been found to act as a lubricating agent during sliding wear. Carbon, also incorporated within the coating, serves to further stabilise the friction coefficient thereby increasing the chemical inertness between cutting tool and workpiece material.Type: ApplicationFiled: April 25, 2006Publication date: October 23, 2008Inventors: Papken Hovsepian, Arutiun P. Ehiasarian
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Patent number: 7425353Abstract: Magnetic medium recording performance can be enhanced by irradiating a magnetic medium with ions having an acceleration voltage of between 10 keV and 100 keV to induce exchange coupling between grains of the magnetic medium. The magnetic medium is exposed to a cumulative ion dosage of between 1013 ions/cm2 and 1017 ions/cm2 using a non-patterned exposure of the magnetic medium. The ions can be selected from the group consisting of H+, He+, Ne+, Ar+, Kr+, and Xe+. Alternatively, the ions can be selected from the group consisting of Ga+, Hg+, and In+.Type: GrantFiled: January 29, 2004Date of Patent: September 16, 2008Assignee: International Business Machines CorporationInventors: Manfred Albrecht, Charles Thomas Rettner, Bruce David Terris, Thomas Thomson
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Patent number: 7404981Abstract: A method is provided for printing electronic and opto-electronic circuits. The method comprises: (a) providing a substrate; (b) providing a film-forming precursor species; (c) forming a substantially uniform and continuous film of the film-forming precursor species on at least one side of the substrate, the film having a first electrical conductivity; and (d) altering portions of the film with at least one conductivity-altering species to form regions having a second electrical conductivity that is different than the first electrical conductivity, the regions thereby providing circuit elements. The method employs very simple and continuous processes, which make the time to produce a batch of circuits very short and leads to very inexpensive products, such as electronic memories (write once or rewriteable), electronically addressable displays, and generally any circuit for which organic electronics or opto-electronics are acceptable.Type: GrantFiled: April 21, 2003Date of Patent: July 29, 2008Assignee: Hewlett-Packard Development Company, L.P.Inventors: Xiao-An Zhang, R. Stanley Williams, Yong Chen
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Patent number: 7320815Abstract: A method for forming an oriented film is provided for forming an oriented film on a base material by irradiating the surface of the base material where the oriented film will be formed with an ion beam comprising nitrogen ions from a direction inclined at a prescribed angle ?a with respect to the direction perpendicular to the surface, while evaporating carbon from an evaporation source. The prescribed angle, ?a, is preferably 45-89°. The accelerating voltage of the ion beam comprising nitrogen ions is preferably 100-500 V. The electric current of the ion beam comprising nitrogen ions is preferably 10-500 mA.Type: GrantFiled: September 1, 2004Date of Patent: January 22, 2008Assignee: Seiko Epson CorporationInventors: Hidenobu Ota, Yukihiro Endo
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Publication number: 20070200500Abstract: A plasma display panel, a method of manufacturing an electrode burying dielectric wall of a plasma display panel, and a method of manufacturing an electrode burying dielectric wall of the plasma display panel. The plasma display panel comprises a front substrate, a rear substrate separated from the front substrate in a vertical direction, front discharge electrodes and rear discharge electrodes disposed between the front substrate separated from one another by an insulating layer, a high dielectric layer surrounding the front discharge electrodes and the rear discharge electrodes, discharge cells, at least a portion of each discharge cell being surrounded by the high dielectric layer, a phosphor layer disposed in each of the discharge cells, and a discharge gas filled in the discharge cells.Type: ApplicationFiled: February 13, 2007Publication date: August 30, 2007Applicant: Samsung Techwin Co., Ltd.Inventors: Woo-suk Choi, Eun-hee Kim
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Patent number: 7250196Abstract: An exemplary system and method for plasma plating are provided to generate a deposition layer on a substrate. The method for plasma plating includes positioning a substrate within a vacuum chamber, positioning a depositant in a filament within the vacuum chamber, reducing the pressure in the vacuum chamber to a level at or below 4 milliTorr, and introducing a gas into the vacuum chamber at a rate to raise the pressure in the vacuum chamber to a level at or between 0.1 milliTorr and 4 milliTorr. In other embodiments, the gas is not required to be introduced. The method also includes applying a dc signal to the substrate at a voltage amplitude at or between 1 volt and 5000 volts, applying a radio frequency signal to the substrate at a power level at or between 1 watt and 50 watts, and heating the depositant to a temperature at or above the melting point of the depositant to generate a plasma in the vacuum chamber.Type: GrantFiled: October 26, 1999Date of Patent: July 31, 2007Assignee: Basic Resources, Inc.Inventors: Jerry D. Kidd, Craig D. Harrington, Daniel N. Hopkins
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Patent number: 7125587Abstract: A system and method to expose a material to an ion beam during a continuous material production process may include a vacuum fixture to form the ion beam and a slit in the fixture to allow at least a portion of the ion beam to exit the fixture through the slit. The material can be placed in contact with an exterior area of the fixture so as to cover the slit. With the material in place, the vacuum within the fixture may be maintained and the ion beam formed. The material over the slit can be exposed to the ion beam. As the continuous process moves material past the slit, the vacuum within the vacuum fixture may help to maintain the material in contact with the fixture.Type: GrantFiled: May 20, 2002Date of Patent: October 24, 2006Assignee: Varian Semiconductor Equipment Associates Inc.Inventor: Gary L. Viviani
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Patent number: 7052019Abstract: A manufacturing method of a piston ring is developed, wherein the method provides a countermeasure for wear of butt ends of the ion plating film coated piston ring and a countermeasure for breakage of the piston ring and the piston ring manufactured at a low cost. A thickness of the film (2) in the vicinity of butt ends (7) of a piston ring (1) is made greater than the thickness of the film (2) at other outer peripheral surface. Piston ring blanks (5) are rotated around their own axes toward an evaporation source (4) and a speed is lowered when the butt ends (7) face the evaporation source (4).Type: GrantFiled: December 21, 2001Date of Patent: May 30, 2006Assignee: Kabushiki Kaisha RikenInventor: Hiroshi Miida
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Patent number: 6955578Abstract: A method of varying a transmittance of a transparent conductive film includes forming the transparent conductive film on a substrate and injecting a high energy source into the transparent conductive film to vary the transmittance of the transparent conductive film.Type: GrantFiled: June 10, 2002Date of Patent: October 18, 2005Assignee: Samsung SDI Co., Ltd.Inventors: Sang-Il Park, Chang-Soo Kim
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Patent number: 6953519Abstract: In order to establish processing techniques capable of making multi-tip probes with sub-micron intervals and provide such microscopic multi-tip probes, there is provided an outermost surface analysis apparatus for semiconductor devices etc. provided with a function for enabling positioning to be performed in such a manner that there is no influence on measurement in electrical measurements at an extremely small region using this microscopic multi-tip probe, and there are provided the steps of making a cantilever 1 formed with a plurality of electrodes 3 using lithographic techniques, and forming microscopic electrodes 6 minute in pitch by sputtering or gas-assisted etching a distal end of the cantilever 1 using a focused charged particle beam or using CVD.Type: GrantFiled: August 29, 2003Date of Patent: October 11, 2005Assignee: SII NanoTechnology Inc.Inventors: Yoshiharu Shirakawabe, Hiroshi Takahashi, Tadashi Arai
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Patent number: 6905725Abstract: This invention relates to methods of writing and reading information hidden from visual observation and may be used for visualizing hidden images (marks) identifying an object, which provide protection from unauthorized reproduction (forgery). The method of creation and visualization of an optically invisible mark consists in the following. On the surface of the object in question an optically invisible marking image is formed by means of modification of, at least one part of said surface, after which visualization of said image is established. Prior to formation of the optically invisible marking image the surface of the object in question (carrying the applied image) is made into a mirror. Modification is achieved by changing the surface energy of the parts being modified.Type: GrantFiled: April 26, 2001Date of Patent: June 14, 2005Assignee: Valinmark Inc.Inventors: Alexander M. Dykhne, Yuri K. Nizienko
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Patent number: 6878418Abstract: A system and method for improving the durability and reliability of recording media used in hard drives is disclosed. A protective overcoat made by depositing a diamond like carbon (DLC) layer over a magnetic layer and then depleting a portion of the DLC protective layer of hydrogen before it is coated with a Perfluoropolyethers (PFPE) using an in-situ vapor lubrication technique. The portion of the DLC layer which is depleted can be data zone of the media so that the lubricant-bonding ratio is higher for the landing zone than it is for the data zone.Type: GrantFiled: March 27, 2003Date of Patent: April 12, 2005Assignee: Seagate Technology LLCInventors: Xiaoding Ma, Michael Joseph Stirniman, Jing Gui
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Patent number: 6864042Abstract: A magnetic recording medium is formed with a distribution of low coercivity regions functioning as a transition pattern for servo information capable of being sensed by a read/write head by exposing a masked magnetic layer to ions to change the coercivity of the exposed magnetic layer without substantially affecting the topography of the magnetic layer. Embodiments of the present invention include forming a series of substantially radially extending low coercivity regions used to divide the magnetic layer into a plurality of sectors comprising substantially concentric circumferentially extending data tracks by exposing a masked magnetic layer having a high coercivity, i.e. from about 2000 Oe to about 10000 Oe, to one or more heavy atom ion bombardments of gaseous ions, e.g. argon ions, at a dose of about 1×1013 atoms/cm2 to about 9×1015 atoms/cm2 having an implantation energy of about 10 KeV to about 50 KeV.Type: GrantFiled: July 25, 2001Date of Patent: March 8, 2005Assignee: Seagate Technology LLCInventors: David Kuo, Xinwei Li, Jing Gui
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Patent number: 6829121Abstract: A magnetoresistive film includes a nonmagnetic film, and a structure in which magnetic films are formed on the two sides of the nonmagnetic film. At least one of the magnetic films is a perpendicular magnetization film. A magnetic film whose easy axis of magnetization is inclined from a direction perpendicular to the film surface is formed at a position where the magnetic film contacts the perpendicular magnetization film but does not contact the nonmagnetic film. A memory, magnetic element, magnetoresistive element, and magnetic element manufacturing method are also disclosed.Type: GrantFiled: April 2, 2002Date of Patent: December 7, 2004Assignee: Canon Kabushiki KaishaInventors: Takashi Ikeda, Akio Koganei, Kazuhisa Okano