Abstract: The present invention includes a curable ink composition for digitally printing onto plastic substrates and three dimensional objects comprising an ink composition comprising a pigment, an oligomeric component, a diluent, additives and a mono-functional monomer having a molecular weight of 10 g/mole to 600 g/mole. The curable ink composition adheres to the plastic substrate to thereby allow elongation of 100% to 900% of the printed ink image during thermal processing of the plastic substrate.

Abstract: The present invention includes a curable ink composition for digitally printing onto plastic substrates and three dimensional objects comprising an ink composition comprising a pigment, an acrylic polymer or copolymer having an acid number below about 20 component, a diluent, additives and a mono-functional monomer. The mono-functional monomer may be an aromatic monoacrylate.

Abstract: A composite for a transducer facilitates an increased actuation force as compared to similar prior art composites for transducers. The composite facilitates increased compliance of the transducer in one direction, an improved reaction time as compared to similar prior art composites for transducers, and provides an increased lifetime of the transducer in which it is applied.

Abstract: Nanotubes loaded with materials, such as active species, and methods to load materials into nanotubes are disclosed. The method includes flowing a medium containing the material to be loaded through the interior volume of the nanotube, wherein it is retained, optionally by a crosslinking or polymerization reaction. Flowing the medium occurs under different conditions and processes, including centrifuging and size exclusion methods.

Abstract: The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film comprising the at least one cyclic group on the substrate surface. The method further includes substantially removing the at least one cyclic group from the non-cured film using an electron beam at curing conditions sufficient to provide a dielectric constant less than 2.5 and a hardness greater than 0.5 GPa.

Abstract: Low K dielectric films exhibiting low mechanical stress may be formed utilizing various techniques in accordance with the present invention. In one embodiment, carbon-containing silicon oxide films are formed by plasma-assisted chemical vapor deposition at low temperatures (300° C. or less). In accordance with another embodiment, as-deposited carbon containing silicon oxide films incorporate a porogen whose subsequent liberation reduces film stress.

Abstract: In a method for manufacturing a negative electrode for a battery, an active material layer including a metallic element M and an element A that is at least any one of oxygen, nitrogen, and carbon is formed on a current collector. This active material layer is irradiated with an X-ray and at least one of intensity of a K? ray of the element A and intensity of a K? ray of the metallic element M in fluorescent X-rays generated from the active material layer is measured.

Abstract: A plasma display panel 1 of the present invention has a protective film 14 over a sustaining electrode 15 and a scanning electrode 16, with the main components of the protective film being CaO and SrO, and the concentration of the CaO in the protective film 14 is 20 mol % or more and 90 mol % or less. This protective film 14 has a smaller work function than a conventional MgO film so light can be emitted at a lower discharge voltage than in the past. If the discharge voltage is lower, the protective film 14 will be sputtered more slowly so that the service life of the plasma display panel 1 will be longer. Also, since the plasma gas contains xenon gas, the plasma display panel of the present invention has higher brightness.

Abstract: The present invention relates to a film having a liquid at least partially absorbed therein, wherein the liquid has been applied to a surface of the film and prior to application of the liquid to the surface, the surface has been subjected to a surface activation treatment such that the surface has a surface energy of at least about 50 dynes.

Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperature process to remove at least a portion of at least one pore-forming phase within a multiphasic film thereby forming a porous film. The pore-forming phase may be removed via exposure to at least one energy source, preferably an ultraviolet light source, in a non-oxidizing atmosphere.

Abstract: A method is for manufacturing a nanostructure in-situ, at least one predetermined point on a supporting carrier. The method includes choosing a suitable material for a substrate in the carrier, creating the substrate, and preparing a template on the substrate so that the template covers the predetermined point. The template is given a proper shape according to the desired final shape of the nanostructure, and a film of nanosource material with desired dimensions is formed on the template. The film of nanosource material is made to restructure from a part of the template, thus forming the desired nanostructure. Suitably, the template includes a first and a second area which have different properties with respect to the nanosource material.

Abstract: In an embodiment, one reinforced substrate for use in a photovoltaic device includes a polymer base material and a reinforcing structure bonded with the base material. The reinforced substrate presents a surface in a condition that is made-ready for deposition of thin film layers of the photovoltaic device. A thin film photovoltaic device includes the reinforced substrate, a back contact layer formed on the surface of the reinforced substrate, and a solar absorber layer formed on the back contact layer. A plurality of thin film photovoltaic devices may be formed on a common reinforced substrate. A process of producing a reinforced substrate includes combining a fluid base material and a fiber reinforcing structure to form an impregnated fiber reinforcement. The impregnated fiber reinforcement is cured to form the reinforced substrate, and the reinforced substrate is annealed.

Abstract: A metal coated with a ceramic material and a method of manufacturing the same are provided. The method includes a) preparing a coating solution by dissolving a SiC precursor in a solvent; b) coating a metal material with the coating solution using a non-thermal coating technique; c) forming a SiC precursor coating layer on the metal material by drying the metal material coated with the coating solution in an oxygen-free atmosphere; d) partially removing a polymer by preprocessing the SiC precursor coating layer; and e) converting the SiC precursor coating layer into a SiC coating layer using a thermal treatment process. In this method, the SiC precursor is coated on the metal material and converted into the SiC coating layer, so that a pure SiC coating layer can be formed without causing cracking or delaminating. Thus, the metal material can have higher resistance to oxidation, chemicals, and heat.

Abstract: In a method of manufacturing an LCD device, an atomic beam is irradiated onto a thin film including a carbon-carbon double bond to form a polarized functional group by transforming the carbon-carbon double bond into a carbon-carbon single bond and a radical state. Then, a polarity preserving material is combined with the polarized functional group so as to preserve a polarity of the polarized functional group. According to the present invention, the alignment film is formed on the thin film transistor unit cell and on the color filter unit cell by a non-contact method. Therefore, time of forming the alignment film is reduced and alignment of the liquid crystal molecules is improved.

Abstract: A process for making a metal-polymer composites suitable for shaping into container end panels having improved resistance to feathering and angel hair formation. A polymer coating is applied to a metal sheet. The polymer coating includes at least one cured polymer selected from polyolefins, anhydride modified polyolefins, epoxies, and phenoxies. The polymer coating on the composite is then irradiated with an electron beam, thereby scissioning chains in the cured polymer. The metal sheet preferably comprises an aluminum alloy and the polymer coating preferably comprises maleic anhydride modified polyropylene.

Abstract: A method for evaluating a fixing belt includes forming a fixing belt which includes a substrate, an elastic layer laminated on the substrate, and a mold releasing layer laminated on the elastic layer. A universal hardness test for the fixing belt is performed. The fixing belt is judged as an acceptable product if a creep value CHU is included within a range of 0.40?CHU ?3.50 (%) when the universal hardness test is performed for the fixing belt and when the creep value CHU, which is measured from the side of the mold releasing layer, is defined by the following formula: CHU=(h2-hl)/hl×100 (%) where h1 is a pushed depth when a test load reaches a predetermined value which is kept for a predetermined period of time, and h2 is a pushed depth when a predetermined period of time is elapsed after the test load is removed.

Abstract: An organic material film formed on a surface of an object to be processed is cured by electron beams irradiated thereon through a hydrocarbon radical generating gas. By employing the electron beams and the hydrocarbon radical generating gas, a deterioration of a k value of the organic material film and a reduction of a chemical resistance thereof are suppressed.

Abstract: A thermal processing system and method for curing a dielectric film. The thermal processing system is configured to treat the dielectric film with ultraviolet (UV) radiation and infrared (IR) radiation in order to cure the dielectric film. The thermal processing system can include an array if IR and UV light-emitting devices (LEDs) configured to irradiate a substrate having a low dielectric constant (low-k) film. The method dries the dielectric film to remove contaminants from the film and exposes the dielectric film at a single stage to ultraviolet radiation and IR radiation.

Abstract: A process for forming low dielectric constant dielectric films for the production of microelectronic devices. A dielectric layer is formed on a substrate by chemical vapor depositing a monomeric or oligomeric dielectric precursor in a chemical vapor deposit apparatus, or a reaction product formed from the precursor in the apparatus, onto a substrate, to form a layer on a surface of a substrate. After optionally heating the layer at a sufficient time and temperature to dry the layer, the layer is then exposed to electron beam radiation, for a sufficient time, temperature, electron beam energy and electron beam dose to modify the layer. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.

Abstract: The present invention provides a multiphase, ultra low k film which exhibits improved elastic modulus and hardness as well as various methods for forming the same. The multiphase, ultra low k dielectric film includes atoms of Si, C, O and H, has a dielectric constant of about 2.4 or less, nanosized pores or voids, an elastic modulus of about 5 or greater and a hardness of about 0.7 or greater. A preferred multiphase, ultra low k dielectric film includes atoms of Si, C, O and H, has a dielectric constant of about 2.2 or less, nanosized pores or voids, an elastic modulus of about 3 or greater and a hardness of about 0.3 or greater. The multiphase, ultra low k film is prepared by plasma enhanced chemical vapor deposition in which one of the following alternatives is utilized: at least one precursor gas comprising siloxane molecules containing at least three Si—O bonds; or at least one precursor gas comprising molecules containing reactive groups that are sensitive to e-beam radiation.

Abstract: A process for fabricating a water-swellable porous plastic plug is provided, the process including the steps of: providing a porous substrate having a plurality of passageways therethrough, disposing into the passageways a hydrophilic polymer, irradiating the substrate to induce cross-linking of the hydrophilic polymer, such that the polymer forms a hydrogel coating on the walls of the passageways.

Abstract: A method of manufacturing an organic light emitting device, whereby a first electrode is formed on a substrate, at least one organic thin film is formed on the first electrode, the organic thin film is optically treated, and a second electrode is formed on the organic thin film. The method can provide an organic light emitting device with an organic thin film having a stable surface morphology and increased durability.

Abstract: A metallized polyimide film includes: a polyimide film; an intermediate layer formed in the polyimide film, the intermediate layer extending 20 nm or less from a surface of the polyimide film, and the intermediate layer including at least one element selected from the group consisting of Mo, Cr, Ni, and Si injected into the polyimide film; and a conductive layer that is made of copper or a copper alloy formed on the intermediate layer, wherein the amount of the at least one element injected into the intermediate layer is between 0.3 and 15 mg/m2.

Abstract: Disclosed herein is a process of forming a ferroelectric polymer film from a solution, wherein the solvent composition is selected so as to adjust the properties of the film. Films formed by this method have improved properties, particularly with respect to roughness and crystal domain size.

Abstract: The invention concerns a method for making an antiglare stack by vacuum evaporation on an organic substrate (1) at a temperature lower than 150° C., comprising steps which consist in depositing at least a layer of material having a refractive index different from that of MgF2 (4, 4?), preparing the surface of the thus coated substrate, and depositing an outer MgF2 layer (5) without ionic assistance. The resulting antiglare stack on organic substrate exhibits good adherence and good scratch resistance. The invention is applicable to ophthalmic lenses.

Abstract: A silicon-containing insulation film is formed on a substrate by plasma reaction using a reaction gas including (i) a source gas comprising a silicon-containing hydrocarbon compound containing multiple cross-linkable groups, (ii) a cross-linking gas, and (iii) an inert gas, into a reaction chamber where a substrate is placed. The insulation film is then exposed to electron beam radiation, thereby increasing mechanical strength of the film without substantial alternation of its dielectric constant.

Abstract: An apparatus includes a low magnetic-coercivity layer of material (LMC layer) having a majority electron-spin-polarization (M-ESP), an energy-gap coupled with the LMC layer, wherein a flow of spin-polarized electrons having an electron-spin-polarization anti-parallel to the LMC layer are injected via the energy-gap, to change the M-ESP of the LMC layer. A non-magnetic material is in electrical communication with the LMC layer and provides a spin-balanced source of current to the LMC layer, responsive to the injection of spin-polarized electrons into the LMC layer.

Abstract: A method for reducing the surface variance of a porous metal substrate. The method does not significantly reduce the bulk porosity. The method can be used to reduce the surface pore diameter. A membrane, can be deposited on the reduced variance surface to form a separation membrane.

Abstract: A method of forming a thin-film including a capability to remove contaminants from the formed thin-film and/or a substrate on which the thin-film is formed using alcohol. The method includes allowing a substrate holder to support a substract. A first mixture is produced by mixing a condensation polymer containing an element of metal oxide compound and alcohol. Then second mixture is produced by mixing supercritical fluid or liquid carbon dioxide and the first mixture. A thin film is formed by applying the second mixture on a surface of the substrate. After forming the thin-film, the substrate is cleaned by applying alcohol to upper and lower surfaces, preferably the whole upper and lower surfaces, of the substract. The thin-film is crystallized by heating, and the crystallizing may include applying oxygen in a crystallizing chamber. Soft X-rays may be applied to the substrate, during the forming of the thin-film on the surface of the substrate.

Abstract: The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film comprising the at least one cyclic group on the substrate surface. The method further includes substantially removing the at least one cyclic group from the non-cured film using an electron beam at curing conditions sufficient to provide a dielectric constant less than 2.5 and a hardness greater than 0.5 GPa.

Abstract: A method for depositing a low dielectric constant film is provided by reacting a gas mixture including one or more linear, oxygen-free organosilicon compounds, one or more oxygen-free hydrocarbon compounds comprising one ring and one or two carbon-carbon double bonds in the ring, and one or more oxidizing gases. Optionally, the low dielectric constant film is post-treated after it is deposited. In one aspect, the post treatment is an electron beam treatment.

Abstract: Method of synthesizing carbon nano tubes (CNTs) on a catalyst layer formed on a support member, by catalytic deposition of carbon from a gaseous phase, whereby an ion beam is used prior to, during, and/or after formation of the carbon nano tubes for modifying the physical, chemical, and/or conductive properties of the carbon nanotubes.

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: A process for crosslinking a coating of pressure-sensitive adhesive systems on a backing material, characterized in that the pressure-sensitive adhesive system present on the backing material is irradiated with accelerated electrons by means of an irradiation means, the backing material coated with the pressure-sensitive adhesive system to be irradiated runs via a roller, there is a contact medium between the roller and the backing material during irradiation.

Abstract: A porous SOG film is formed by preparing an organic silane solution containing an organic silane, water and an alcohol, subjecting the organic silane to acid hydrolysis or alkali hydrolysis and then heat-treating the resulting reaction system in the presence of a surfactant to thus form a porous SiO2 film to use for an interlayer insulating film. Alternatively, a porous SOG film is formed by repeating the foregoing step at least one time; or by forming a hydrophobic film on the porous SiO2 film prepared by the foregoing step by the CVD or sputtering technique to thus cap the surface of the porous film; or repeating the porous film-forming and capping steps at least one time. Moreover, after the preparation of the foregoing porous SiO2 film, it is subjected to either of the oxygen plasma-treatment, electron beam-irradiation treatment and UV light-irradiation treatment to remove the unreacted OH groups remaining on the porous film and to thus form a porous SOG film.

Abstract: A method of applying a marker element (6; 6?; 6?; 25; 25?; 26; 28) to an implant (1; 1?; 1?; 1??; 20; 20?), in particular a stent, intended for implantation in the human or animal body, comprising a main body and an opening (3; 3?; 3?; 3??; 21; 21?) provided in said main body (2; 2?; 2?; 2??; 22; 22?) for receiving the marker element (6; 6?; 6?; 25; 25?; 26; 28), wherein to form at least a part of the marker element (6; 6?; 6?; 25; 25?; 26; 28) a hardenable material or material mix is introduced into the opening and hardened therein.

Abstract: Coating compositions, methods and articles of manufacture comprising a nanoparticle system employing same to impart surface modifying benefits for all types of soft surfaces, and in some cases, hard surfaces, are disclosed. In some embodiments, dispersement of nanoparticles in a suitable carrier medium allows for the creation of coating compositions, methods and articles of manufacture that create multi-use benefits to the modified surfaces. These surface modifications can produce long lasting or semi-permanent multi-use benefits that, in some embodiments, may include at least one of the following improved surface properties: cleaning, wettability, liquid strike-through, comfort, stain resistance, soil removal, malodor control, modification of surface friction, reduced damage to abrasion and color enhancement, relative to the surfaces unmodified with such nanoparticle systems.

Abstract: The invention is directed to a photoresist-free method for depositing films composed of metals, such as copper or silica, or their oxides from metal complexes. More specifically, the method involves applying an amorphous film of a metal complex to a substrate. The metal complexes have a metal and a photo-degradable ligand. A preferred ligand is acac or alkyl-acac, expecially in combination with acetate ligands. These films, upon, for example, thermal, photochemical or electron beam irradiation may be converted to the metal or its oxides. By using either directed light or electron beams, this may lead to a patterned metal or metal oxide film in a single step. Low temperature baking may be used to remove residual organics from the deposited film. If silica is the metal, the deposited film has excellent smoothness and dielectric properties.

Abstract: There is provided an array of fluoro-substituted silsesquioxane thin film precursors having a structure wherein fluoro groups are bonded to the silicon atoms of a silsesquioxane cage. In a first aspect, the present invention provides a composition comprising a vaporized material having the formula [F—SiO1.5]x[H—SiO1.5]y, wherein x+y=n, n is an integer between 2 and 30, x is an integer between 1 and n and y is a whole number between 0 and n. Also provided are films made from these precursors and objects comprising these films.

Abstract: Methods and systems for changing properties of a layer-formed plastic part comprised of at least one plastic material are disclosed. In one embodiment, an electromagnetic radiation source is provided and the layer-formed plastic part is positioned within a potential exposure range of the electromagnetic radiation source. An exposure of radiation from the electromagnetic radiation source operable to change the property of the layer-formed plastic part from the existing state to an altered state is determined. The layer-formed plastic part is then exposed to the radiation to change the property of the layer-formed plastic part to the altered state.

Abstract: A method of producing an adhesive article including the steps of applying release coating compound(s) to a second side of a liner backing; applying an adhesive onto a first side of said coated liner backing; crosslinking said adhesive with E-Beam radiation applied through the second side of said liner backing; and winding said article into a roll.

Abstract: Disclosed is an ion beam-assisted deposition system that includes a bi-lateral RF ion source system that, when used in conjunction with an electron beam, magnetron or ion beam evaporator assembly, creates a deposition zone of sufficient width to enable simultaneous deposition onto a plurality of parallel-arranged translating metal substrate tapes. The arrangement of the bilateral RF ion source is such that a pair of RF ion sources is arranged on opposite sides of an evaporation source in such a manner that a pair of ion beams is directed toward a translating set of parallel-arranged substrate tapes at incident angles of, for example, 55 degrees.

Abstract: The present invention provides a method of increasing the surface energy of an article having a polymeric surface increasing the relative amount of nitrogen atoms or oxygen atoms within a portion of the surface to form a nitrogen or oxygen enriched surface layer. The method of the invention is advantageously applied to a vehicle body frame to facilitate adhesion of a windshield. In another embodiment of the invention a method for inhibiting sealer redeposition is provided in which a plastic component in an automobile is treated prior to being subjected to the various paint preprocessing baths.

Abstract: A substrate containing a natural polymeric material is modified by: A) treating the substrate containing the natural polymeric material with a modifying agent selected from the group consisting of organo-functional coupling agents and multi-functional amine containing organic compounds; and B) optionally exposing the substrate containing natural polymeric material with one or more treatments selected from the consisting of: i) subjecting the substrate to extraction with a solvent to reduce the content of extractable materials associated with the natural polymeric material prior to or during treatment with the modifying agent; ii) treatment with a physical field selected from static physical fields, high-frequency alternating physical fields and combinations of two or more thereof either prior to, during or after treatment with the modifying agent; and iii) oxidation of at least part of the natural polymeric material prior to or during treatment with the modifying agent.

Abstract: A method of modifying a polymeric material which comprises the steps of activation-treatment and a hydrophilic polymer-treatment, or comprises the steps of activation-treatment, a hydrophilic polymer-treatment, and monomer grafting in this order, or comprises the step of a solvent-treatment followed by these steps. Thus, the polymeric material, e.g., polyolefin, is improved in hydrophilicity, adhesion, etc. without lowering the practical strength thereof. The polymeric material thus improved in adhesion and other properties can be used in many applications where water absorption and adhesion are required, such as an absorption material, e.g., a wiping/cleansing material, a water retention material, a material for microorganism culture media, a separator for batteries (or cells), a synthetic paper, a filter medium, a textile product for clothing, a medical/sanitary/cosmetic supply, and reinforcing fibers for composite materials.

Abstract: A fabrication method of an IPS mode LCD including forming a pixel electrode and a common electrode on a first substrate; forming a passivation layer on the pixel electrode and common electrode; forming a black matrix layer on a second substrate; forming a color filter layer on the black matrix layer; forming an overcoat layer on the color filter layer; and irradiating an ion beam on the passivation film on the first substrate and the overcoat layer on the second substrate to perform an orientation treatment of the passivation film and the overcoat layer. The common electrode, the pixel electrode, the gate line and the data line are formed in a stripe configuration or a zigzag configuration. In a zigzag configuration, there is at least one bent portion in the configuration.

Abstract: The present invention is a grafted polymer electrolyte membrane prepared by first preparing a precursor membrane comprising a polymer which is capable of being graft polymerized, exposing the surface of the precursor membrane to a plasma in an oxidative atmosphere, then graft-polymerizing a side chain polymer to the plasma treated precursor membrane and introducing a proton conductive functional group to the side chain. The resulting grafted polymer electrolyte membrane has excellent stability and performance when used in a proton-exchange membrane fuel cell or for electrolysis of water.

Abstract: A polarized electroluminescence element used for a display is disclosed. The polarized electroluminescence element includes a substrate, an orientation-inducing layer situated on the substrate and in a first direction of orientation, and a light-emitting layer situated on the orientation-inducing layer and made of a mixture of an electroluminescent material and an oriented material for emitting polarized electroluminescence, wherein the electroluminescent material and the oriented material are in a second direction of orientation corresponding to the first direction of orientation.

Abstract: The invention provides a process for curing powder coatings which makes it possible to fuse and cure powder coatings using NIR radiation and which gives rise to coatings having improved mechanical properties, improved flow and increased uniformity of surface gloss of the coating;

Abstract: A process for making a metal-polymer composites suitable for shaping into container end panels having improved resistance to feathering and angel hair formation. A polymer coating is applied to a metal sheet. The polymer coating includes at least one cured polymer selected from polyolefins, anhydride modified polyolefins, epoxies, and phenoxies. The polymer coating on the composite is then irradiated with an electron beam, thereby scissioning chains in the cured polymer. The metal sheet preferably comprises an aluminum alloy and the polymer coating preferably comprises maleic anhydride modified polyropylene.