Abstract: A paper machine substrate modified to resist contamination by adhesive materials. The paper machine substrate includes: a paper machine substrate; and an active agent that is grafted to the surface of the paper machine substrate to lower the surface energy of the paper machine substrate so that the substrate resists contamination by adhesive material. The papermachine substrate may be made by a process that includes the steps of: providing a paper machine substrate; applying an active agent to the paper machine substrate; and exposing the paper machine substrate to greater than about 2 million rads (Mrad) of radiation to cause a reaction between the active agent and the substrate so the active agent becomes joined to the substrate. The active agent may be a fluorinated monomer, a fluorinated polymer, a perfluorinated polymers, or a polyalkyl siloxane.

Abstract: Fluoropolymer particles are subjected to high energy treatment so as to change the chemical functionality of the particle surfaces and thereby change the surface characteristics of the particles. These characteristics improve the usefulness of these particles and can make them highly dispersible, even in water. The surface treated fluoropolymer particles are subject to a chemical crosslinking process, or alternatively, are subject to a high energy treatment process, and may optionally be pretreated with a macromolecular chemical species prior to the foregoing processes. The high energy treatment can be used to both surface treat the fluoropolymer particles and in some embodiments, may also cause chain scission of the fluoropolymers to thereby reduce the molecular weight of the fluoropolymer particles. The surface treated fluoropolymer particles can be used to form fluoropolymer coatings on various substrates.

Abstract: A process is given to protect polymer modulators during push-pull poling employing high voltages to the electrodes is given where a thin layer of dielectric material is applied to the electrodes prior to poling, applying the direct current high voltage, and removing the dielectric after completion of poling.

Abstract: An ion-assisted deposition technique to provide planarization of topological defects, e.g., to mitigate the effects of small particle contaminants on reticles for extreme ultraviolet (EUV) lithography. Reticles for EUV lithography will be fabricated by depositing high EUV reflectance Mo/Si multilayer films on superpolished substrates and topological substrate defects can nucleate unacceptable (“critical”) defects in the reflective Mo/Si coatings. A secondary ion source is used to etch the Si layers in between etch steps to produce topological defects with heights that are harmless to the lithographic process.

Abstract: A method of making a composite polymer of a molecularly doped polymer. The method includes mixing a liquid polymer precursor with molecular dopant forming a molecularly doped polymer precursor mixture. The molecularly doped polymer precursor mixture is flash evaporated forming a composite vapor. The composite vapor is cryocondensed on a cool substrate forming a composite molecularly doped polymer precursor layer, and the cryocondensed composite molecularly doped polymer precursor layer is cross linked thereby forming a layer of the composite polymer layer of the molecularly doped polymer.

Abstract: According to the present invention, provided is a method for improving solubility of a protein in water by irradiating the protein with an electron beam. According to the method, the solubility of the protein in water is improved without alteration and decomposition of the protein and an associated body which is not generated in an ordinary state is formed, so that protein which is stable even in an aqueous solution can be obtained.

Abstract: The present invention is directed to a particle beam processing apparatus that is smaller in size and operates at a higher efficiency. The processing apparatus includes a particle beam generating assembly, a foil support assembly, and a processing assembly. In the particle beam generating assembly, a cloud of particles, for example, electrons, are generated by heating at least one tungsten filament. The electrons are then extracted to travel at a high speed to the foil support assembly which is set at a much lower voltage than the particle beam generating assembly. A substrate is fed to the processing apparatus through the processing zone and is exposed to the electrons exiting the particle beam generating assembly and entering the processing zone. The electrons penetrate and cure the substrate causing a chemical reaction, such as polymerization, cross-linking, or sterilization.

Abstract: The present invention relates to a method of coating substrates, including the following steps:

Abstract: A method for applying a coating to an optical surface of an optical device. In one embodiment, the method includes the steps of placing a coating solution in a cliche of a cliche plate, transferring the coating solution from the cliche to deformable body of a transfer pad, and pressing the transfer pad to the optical surface so as to transfer the coating solution from the deformable body of the transfer pad to the optical surface. The method further includes a step of irradiating the coating solution associated with the optical surface at a wavelength of microwave so as to form a coating layer on the optical surface. The coating layer can be further cured to form a desired coating on a proper optical surface. The optical device can be an optical lens having at least one optical surface, or a mold that can be used to produce an optical lens. In other words, the present invention allows a coating to be applied directly to an optical surface of an optical lens.

Abstract: Process for producing coatings, adhesive films or seals which comprises

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: The present invention provides a titanium oxide photocatalytic thin film having a surface layer containing silicon oxide and titanium oxide and a production method for producing a titanium oxide photocatalytic thin film having a surface layer containing silicon oxide and titanium oxide and comprising a step of radiating excimer beam to the titanium oxide thin film while heating substrate on which the titanium oxide thin film is disposed in vacuum or gas atmosphere in the presence of a silicon-including compound.

Abstract: A process for irradiating material in web form by means of electron beams and/or UV rays, wherein

Abstract: The invention provides a method and related apparatus to link and/or pattern self-assembled first objects to a second object. Each of the first object (e.g., a nanoparticle) can be embedded in a mobile binder (i.e., a stabilizer). The invention applies energy to the first object and stabilizer, links this first object to the second object, and provides a controlled linkage of the first object with respect to the second object. Applying this procedure to many such objects results in a larger a real arrangement of these linked objects. An appropriate solvent may be used to remove non-linked objects, yielding a patterned array. Thermal annealing can be applied to control the physical and chemical properties of the array.

Abstract: A process for forming low dielectric constant dielectric films for the production of microelectronic devices. A dielectric layer is formed on a substrate by chemical vapor depositing a monomeric or oligomeric dielectric precursor in a chemical vapor deposit apparatus, or a reaction product formed from the precursor in the apparatus, onto a substrate, to form a layer on a surface of a substrate. After optionally heating the layer at a sufficient time and temperature to dry the layer, the layer is then exposed to electron beam radiation, for a sufficient time, temperature, electron beam energy and electron beam dose to modify the layer. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, in which process in a first step: a) the inorganic or organic substrate is subjected to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, the radiation or discharge is then discontinued, in a further step: b) at least one electron- or H-donor, each containing at least one ethylenically unsaturated group, is applied to the inorganic or organic substrate in vacuo or at normal pressure and reacted with the free radicals formed there, and c1) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligomer and a photoinitiator, and the coating is cured by means of electromagnetic and/or ionizing radiation; or c2) the substrate so precoated with coinitiator is coated with a composition comprising at least one ethylenically unsaturated monomer or oligo

Abstract: A process for producing a homogeneous oxide layer on metal components includes uniformly heating the components, in all their regions, in a vacuum chamber and, after a predetermined temperature has been reached, exposing the components to an oxygen-containing gas for a predetermined period and at a predetermined pressure. The metal components are coated with MCrAlY or PtAl. The preheating temperature is between 750 and 850° C., preferably, approximately 800° C. Preferably, the thickness of the homogeneous oxide layer is between 0.01 and 5 &mgr;m. The heating is preferably by electron radiation. The predetermined period is approximately 10 minutes, and the predetermined pressure is between 1×10−3 and 8×10−2 mbar.

Abstract: A process for forming low dielectric constant dielectric films for the production of microelectronic devices. A dielectric layer is formed on a substrate by chemical vapor depositing a monomeric or oligomeric dielectric precursor in a chemical vapor deposit apparatus, or a reaction product formed from the precursor in the apparatus, onto a substrate, to form a layer on a surface of a substrate. After optionally heating the layer at a sufficient time and temperature to dry the layer, the layer is then exposed to electron beam radiation, for a sufficient time, temperature, electron beam energy and electron beam dose to modify the layer. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.

Abstract: There is to provide an optical element fabrication method including the steps of forming a thin film onto a substrate, and eliminating a color center produced in the forming step by giving energy to the substrate.

Abstract: The present invention is directed to a method for producing a high gloss coating on a printed surface. In the present method, an aqueous coating composition is deposited onto a surface to be printed using a blanket roller coating face which is a low energy, non-stick, smooth surface profile. In the present method, simultaneous with the deposition of aqueous coating onto a substrate, or shortly thereafter, pressure either alone or in combination with heat may be applied to the coating in order to create a substantially tack-free surface conforming to the surface of the coating face. By using a highly polished coating face, high gloss coatings may be readily obtained using this methodology in a number of traditional printing techniques including wet trap inline sheet-fed printing, heat-set offset printing, dry trap inline flexographic printing, offset web-fed printing and gravure printing.

Abstract: In order to produce a fusible interfacing, dots of a hot-melt polymer are deposited on the right side of an interfacing support selected from textile and nonwoven supports and the wrong side of the interfacing support undergoes electron bombardment. The dots of hot-melt polymer are based on at least one functionalized polymer comprising functional groups that can react with free radicals generated by the action of an electron bombardment and/or which are themselves generators of free radicals under the action of an electron bombardment. The penetration depth of the electrons into the polymer dots is adjusted to obtain self-crosslinking of said functionalized polymer over a limited thickness e with respect to the mean thickness E of the polymer dots. The functional groups preferably comprise functions containing an ethylenically unsaturated bond, for example of the acrylate, methacrylate, allyl, acrylamide, vinylether, styrene, maleic or fumaric type.

Abstract: A method of depositing nano-particles in a gas stream for efficiently depositing nano-particles by irradiating an electron beam on charged nano-particles in the stream of a first gas species containing the nano-particles, as well as a method of modifying the surface of the nano-particles in a gas stream by mixing them with the first gas species in a gas mixing chamber thereby activating the second gas species, intended for providing a method of depositing nano-particles and a method of modifying the surface thereof in a gas stream, capable of efficiently depositing the nano-particles in a charged state in a gas stream and modifying the surface of the nano-particles which are extremely sensitive to defects and impurities caused by large exposure ratio of surface atoms in a gas stream at a good controllability.

Abstract: A porous SOG film is formed by preparing an organic silane solution containing an organic silane, water and an alcohol, subjecting the organic silane to acid hydrolysis or alkali hydrolysis and then heat-treating the resulting reaction system in the presence of a surfactant to thus form a porous SiO2 film to use for an interlayer insulating film. Alternatively, a porous SOG film is formed by repeating the foregoing step at least one time; or by forming a hydrophobic film on the porous SiO2 film prepared by the foregoing step by the CVD or sputtering technique to thus cap the surface of the porous film; or repeating the porous film-forming and capping steps at least one time. Moreover, after the preparation of the foregoing porous SiO2 film, it is subjected to either of the oxygen plasma-treatment, electron beam-irradiation treatment and UV light-irradiation treatment to remove the unreacted OH groups remaining on the porous film and to thus form a porous SOG film.

Abstract: A method for producing increased resistance to biodegradability is provided for biomedical devices subject to in vivo implantation. Among the steps required to produce such resistance are the application of a thermoplastic polyurethane coating to the device to provide a coating, and the subsequent crosslinking of the thermoplastic polyurethane coating through the application of radiation of a sufficient intensity and duration to convert said thermoplastic polyurethane coating to a thermoset coating possessing the attribute of increased biostability.

Abstract: A radiation-curable anti-reflective coating is disclosed. The coating may be deposited on a substrate by spinning, dipping or rolling. The anti-reflective coating may have two layers in which case the anti-reflective coating has a V-shaped reflectance pattern in the visible wavelength spectrum. The anti-reflective coating may have three layers in which case the anti-reflective coating has a broadband reflectance pattern in the visible wavelength spectrum.

Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate that comprises, in a first step a) subjecting the inorganic or organic substrate to the action of a low-temperature plasma discharge, a corona discharge, high-energy UV radiation or electron radiation, then discontinuing the radiation or discharge; in a further step b) under vacuum or at normal pressure, applying one or more photoinitiators containing at least one ethylenically unsaturated group to the inorganic or organic substrate, and allowing reaction with the free-radical sites formed there; and c1) coating the substrate so precoated with photoinitiator with a composition comprising at least one ethylenically unsaturated monomer or oligomer, and curing the coating by means of UV/VIS radiation or c2) depositing a metal, semi-metal oxide or metal oxide from the gaseous phase, in the presence of UV light, on the substrate so precoated with photoinitiator.

Abstract: A composition which provides gas, flavor, and aroma barrier to substrates, where the composition is formed by mixing an ethylenically unsaturated acid, a bis-silane and a polyamine.

Abstract: A curable coating composition comprising a polymer of an aromatic vinyl compound and an &agr;,&bgr;-unsaturated carboxylic acid ester; a vegetable oil or a fatty acid ester thereof; and a (metha) acrylic monomer or (metha) acrylic oligomer, and a printing method thereof are disclosed. A printing ink utilizing the curable coating composition of the present invention can be printed with a printing machine used for oil-based inks. At the same time, if in combination with an activation energy beam curable overprint varnish, glossy printed matters having aesthetically high-grade feeling can be obtained.

Abstract: A process for the preparation of a multi-layer coating wherein a colour- and/or special effect-imparting base lacquer coating compound is applied to a substrate optionally precoated with a primer and/or primer surfacer coating compound and/or further coating compounds and a clear lacquer layer is then applied to the colour- and/or special effect-imparting base lacquer layer, wherein the colour- and/or special effect-imparting base lacquer coating compound used is one which contains binders which can be cured by free-radical and/or cationic polymerisation under the action of high-energy radiation.

Abstract: Process for producing a multi-layer lacquer finish, in which a surfacer coating compound is applied to a substrate optionally pre-coated with a priming layer and/or further coating layers, and a top coating comprising a color-imparting and/or special-effect-imparting base lacquer layer and a transparent clear lacquer layer, or a top coating comprising a pigmented one-layer top lacquer, is then applied, in which the surfacer coating compound which is used is one which either contains binders which are curable exclusively by free radical and/or cationic polymerization, wherein the said binders are cured by means of high-energy radiation, or is one which contains binders which are curable by free radical and/or cationic polymerization, wherein the said binders are cured by means of high-energy radiation, and additionally contains chemically cross-linking binders.

Abstract: The invention relates to a method for adjusting the quality factors of the surface of a piece of wood, so that the effective period of hydrogen peroxide, from its application onto the wood surface to its evaporation therefrom is less than 5 minutes, advantageously less than 1 minute. In the method onto the surface of the piece of wood, with a temperature near room temperature or lower, there is fed hydrogen peroxide as spray, the pH of the initial solution of said spray being neutral or acidic. The hydrogen peroxide is allowed to affect the wood surface about 1-60 seconds, advantageously about 1-30 seconds. Thereafter the hydrogen peroxide is activated by irradiating the surface of the piece of wood by a radiation source, so that at the end of the irradiation period, the wood surface temperature is 40-80° C. The power of the radiation source is 20-500 kW, advantageously 50-200 kW per surface m2 of the piece of wood.

Abstract: A process for crosslinking a coating of pressure-sensitive adhesive systems on a backing material, characterized in that

Abstract: There is provided a process for forming a silicon oxide film which is useful as an electrical insulating film, dielectric film or protective film as used in LSI, thin-film transistor, photoelectric converter, photosensitive body and the like. The process comprises forming a coating film from a polysilane compound represented by the formula SinRm (wherein n is an integer of 3 or more, m is an integer of n to 2n+2, and a plurality of R's are independently a hydrogen atom or an alkyl group) and oxidizing the coating film to form the silicon oxide film.

Abstract: Systems and methods for high throughput fabrication and analysis of an array of coated materials. The systems include a movable substrate having a plurality of predefined regions, where a plurality of materials are provided for coating the substrate. A delivery mechanism associated with the plurality of materials delivers a continuously varying mixture of the plurality of materials onto the surface of the substrate. The methods include delivering a continuously varying mixture of a plurality of materials onto the surface of a movable substrate having a plurality of predefined regions to form a predefined coating on each of the regions.

Abstract: A method for fabricating a magnetoresistive memory cell with improved roughness uniformity and reduced roughness amplitude of a selected layer of material in the magnetoresistive memory cell by smoothing at an atomic scale an interface surface of the selected layer is disclosed. The smoothing is accomplished by irradiating an interface surface of the selected layer with a collimated beam of gas cluster ions that are accelerated along a beam bath by predetermined acceleration voltage. The gas cluster ions bombard the interface surface and upon impact therewith, the gas cluster ions disintegrate in a direction that is substantially lateral to the beam path. As a result, the gas cluster ions laterally sputter the interface surface and remove one or more monolayers of material from the interface surface. Consequently, an initial surface roughness of the interface surface is reduced and homogenized (i.e. made uniform) to a final surface roughness.

Abstract: Process for the continuous solvent-free and mastication-free production of self-adhesive compositions based on non-thermoplastic elastomers in a continuously operating apparatus having a filling section and a compounding section, comprising a) feeding the solid components of the self-adhesive composition, such as elastomers and resins, into the filling section of the apparatus, optionally feeding of fillers, colorants and/or crosslinkers, b) transferring the solid components of the self-adhesive composition from the filling section to the compounding section, c) adding the liquid components of the self-adhesive composition, such as plasticizers, crosslinkers and/or further tackifier resins to the compounding section, d) preparing a homogeneous self-adhesive composition in the compounding section, and e) discharging the self-adhesive composition, f) coating the self-adhesive composition on a web-form material, where the coating of the web-form material is carried out using a multi-roll applicator unit, p

Abstract: The present invention is a method of making a thin film of a polyurethane. The method has the steps of: (a) vacuum coating a thin layer of a solventless mixture of a monomer mixture, said monomer mixture selected from the group consisting of polyols, polyisocyanates and combinations thereof, onto a substrate in a vacuum chamber; and (b) curing the monomer as said thin film of said polyurethane.

Abstract: A process of accelerating electrons with a voltage applied thereto in a vacuum, guiding the accelerated electrons into a normal-pressure atmosphere, and irradiating the electron beam (EB) onto an object. The electron beam irradiation process uses a vacuum tube-type electron beam irradiation apparatus, and with the acceleration voltage for generating an electron beam set at a value smaller than 100 kV, the electron beam is irradiated onto the object.

Abstract: The present invention relates to an electrically conductive coating that is producible by hydrolytic condensation of a mixture comprising at least one silicon compound of the general formula SiXnR(4−n) (I), wherein at least one of the groups R is a mercapto-substituted alkyl or aryl group; and a compound of the general formula ZaSiYbR(a−4−b) (II), wherein the group Z is a quaternary ammonium salt, for example. Said coating is particularly suitable for toner transfer drums, and exhibits high scratch resistance and good adhesion to the substrate.

Abstract: This invention is directed to a method for forming an inked image on game balls, golf balls, and the like, through the use of novel curable inks that are low energy curable and require minimal curing through multiple source radiation curing processes, such as UV radiation, visible radiation, and electron beam radiation. Production inks, logo inks, and methods for forming production prints and logos on golf balls, game balls, and the like are disclosed.

Abstract: A method of producing a magnetic recording medium, and an apparatus thereof in which coercive force can be detected in an in-line mode, a metal thin film magnetic layer can be produced stably, and a vapor deposition film having a stable quality can be obtained. A method of producing a magnetic recording medium, comprising the steps of forming a metal thin film magnetic layer on a substrate, irradiating a light to a surface of the metal thin film magnetic layer, and measuring lightness of a reflected light from the surface to monitor coercive force of the metal thin film magnetic layer.

Abstract: A method for making a non-linear optical polymer layer. The method includes flash evaporating a liquid polymer precursor mixture containing a plurality of non-linear optical molecules forming an evaporate, cryocondensing the evaporate on a substrate forming a cyrocondensed polymer precursor layer, and crosslinking the cryocondensed polymer precursor layer. The surface may be electrically biased for poling during crosslinking.

Abstract: Polymeric substrate are coated by a process comprising pretreating the polymeric substrate by at least one physical method selected from the group consisting of corona discharge, flaming, glow discharge, irradiation with electromagnetic waves, and a plasma pretreatment, then coating the pretreated polymeric substrate with a composition comprising a fluoroalkyl-containing silicon compound. The resulting coated is very thin, highly hydrophobic and oleophobic. The coatings prepared by the process of the present invention are stable in boiling water and are resistant to abrasion.

Abstract: Coating compositions, methods and articles of manufacture comprising a nanoparticle system employing same to impart surface modifying benefits for all types of soft surfaces, and in some cases, hard surfaces, are disclosed. In some embodiments, dispersement of nanoparticles in a suitable carrier medium allows for the creation of coating compositions, methods and articles of manufacture that create multi-use benefits to the modified surfaces. These surface modifications can produce long lasting or semi-permanent multi-use benefits that, in some embodiments, may include at least one of the following improved surface properties: cleaning, wettability, liquid strike-through, comfort, stain resistance, soil removal, malodor control, modification of surface friction, reduced damage to abrasion and color enhancement, relative to the surfaces unmodified with such nanoparticle systems.

Abstract: In a surface treatment method of treating the surface of a material to be treated, by irradiating with light the material to be treated and a mediating material in contact with each other, the mediating material itself causes substantially no interaction upon irradiation with light. The surface of the material to be treated is treated by provision of a chemical reaction field, in which a substituent of the material to be treated and an atom of atomic group of the mediating material is induced by excitation, by irradiating with light by using the logical product of the contact interface between the material to be treated and the mediating material and the light irradiation region, thereby causing and progressing bonded state transition.

Abstract: The invention is directed to a process for multilayer coating of substrates which comprises

Abstract: A process for coating a moving length of sheet metal is disclosed that includes the steps of 1) cleaning the moving length of sheet metal to remove surface contaminants that may interfere with the coating adhering to the sheet metal; 2) applying an electron beam curable coating to the moving length of sheet metal; and, 3) exposing the coating on the moving length of sheet metal to an electron beam to cure the coating, the cleaning, coating and curing resulting in no emission of pollutants that need to be removed before the emission is released into the atmosphere.

Abstract: In a strip-shaped mould for producing surface materials, in particular surfaces of melamine resin in the production of laminate panels, with a structured surface, a flexible strip (10) of paper or foil is provided with a layer (12) having a separating action in relation to the surface material, with the formation of slightly cross-linked regions, and a three dimensional shaped structure consisting of UV-hardening printing inks is applied thereto.

Abstract: A process and an apparatus for the repair of the protective coating on converted can ends comprises a repair agent application station for the selective application of a radiation-curable repair agent onto at least a portion of the converted can ends, a repair agent curing station for the curing of the repair agent applied to the converted can ends, and a transport system for conveying the converted can ends from the repair agent application station to the repair agent curing station.

Abstract: Process for producing a multi-layer lacquer finish, in which a surfacer coating compound is applied to a substrate optionally pre-coated with a priming layer and/or further coating layers, and a top coating comprising a colour-imparting and/or special-effect-imparting base lacquer layer and a transparent clear lacquer layer, or a top coating comprising a pigmented one-layer top lacquer, is then applied, in which coating compounds which contain binders which are curable by free radical and/or cationic polymerisation are employed as the surfacer, the base lacquer and the clear lacquer as well as the one-layer top lacquer, and wherein the said binders are cured by means of high-energy radiation.