High Energy Electromagnetic Radiation Or High Energy Particles Utilized (e.g., Gamma Ray, X-ray, Atomic Particle, I.e., Alpha Ray, Beta Ray, High Energy Electron, Etc.) Patents (Class 427/551)
  • Publication number: 20040209003
    Abstract: The invention relates to a radiation curable hot melt composition comprising:
    Type: Application
    Filed: May 12, 2004
    Publication date: October 21, 2004
    Inventors: Ann Kerstin B.K. Lindell, Klaas Jan H. Kruithof, Kent Raabjerg Sorensen
  • Publication number: 20040209002
    Abstract: A method of producing an adhesive article including the steps of applying release coating compound(s) to a second side of a liner backing; applying an adhesive onto a first side of said coated liner backing; crosslinking said adhesive with E-Beam radiation applied through the second side of said liner backing; and winding said article into a roll.
    Type: Application
    Filed: May 11, 2004
    Publication date: October 21, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: James J. Kobe, Junkang Jacob Liu, Jolin A. Harrison, Bradley S. Momchilovich, Raymond R. Rivera
  • Patent number: 6790486
    Abstract: A process for depositing a ceramic coating on a component. The process involves a technique for evaporating an evaporation source containing multiple different oxide compounds, at least one of the oxide compounds having a vapor pressure that is higher than the remaining oxide compounds, to deposit a coating of the multiple oxide compounds. A high energy beam is projected onto the evaporation source to melt and form a vapor cloud of the oxide compounds of the evaporation source, while preventing the vapor cloud from contacting and condensing on the component during an initial phase in which the relative amount of the one oxide compound in the vapor cloud is greater than its relative amount in the evaporation source. During a subsequent phase in which the relative amount of the one oxide compound in the vapor cloud has decreased to something approximately equal to its relative amount in the evaporation source, the vapor cloud is allowed to contact and condense on the component to form the coating.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: September 14, 2004
    Assignee: General Electric Company
    Inventors: Boris A. Movchan, Irene Spitsberg, Ramgopal Darolia
  • Patent number: 6787198
    Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.
    Type: Grant
    Filed: October 23, 2002
    Date of Patent: September 7, 2004
    Assignee: EKC Technology, Inc.
    Inventors: Shyama P. Mukherjee, Harold O. Madsen, Paul J. Roman, Jr., Leo G. Svendsen
  • Publication number: 20040170774
    Abstract: There is described a radiation curable powder composition which comprisesa) 10 to 90% weight of an ethylenically unsaturated polyester and/or acrylic copolymer having an “in chain” unsaturation from 0.35 to 3.50 milliequivalents of double bonds per gram resinb) 10 to 90% weight of an ethylenically unsaturated (hydrogenated) polyphenoxy resin having a vinyl group, an allyl group, a(meth)acrylate ester group or a diacid or anhydride containing unsaturated groups; andc) 0 to 30% weight of an ethylenically unsaturated oligomer.
    Type: Application
    Filed: January 23, 2004
    Publication date: September 2, 2004
    Inventors: Luc Moens, Kris Buysens, Daniel Maetens
  • Publication number: 20040170773
    Abstract: A packaging material, a method of making such a material, and a package made from such material, are disclosed. A substrate comprises at least one sheet of plastic material. An energy-curable coating is applied to one side of the substrate, which will be the outside of the eventual package. The energy-curable coating is cured by exposing it to an electron beam or other appropriate energy. A cold-seal cohesive coating is applied to the other side of the substrate. The package is formed by pressing together portions of the inside surface of at least one sheet of the material having the cold-seal cohesive coating on them to form a seal. Preferably, the cold-seal cohesive coating is applied only to those portions of the material that are to form seams in the eventual package.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 2, 2004
    Applicant: Sonoco Development, Inc.
    Inventors: Scott W. Huffer, Jeffrey M. Schuetz
  • Patent number: 6773654
    Abstract: A method for performing radiation-inducted graft polymerization on substrates in the form of webs of woven or non-woven fabric, which includes the steps of exposing a substrate woven or non-woven fabric composed of polymer fiber to electron beams in a nitrogen atmosphere, contacting the irradiated substrate with a specified amount of monomer in a nitrogen atmosphere, and subjecting the monomer and the substrate in mutual contact to graft polymerization in a nitrogen atmosphere, characterized in that the first through third steps are performed in succession.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 10, 2004
    Assignee: Ebara Coporation
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Publication number: 20040146751
    Abstract: A technique is disclosed for transferring information from a hot stamping foil or other physical transfer elements to a substrate wherein the adhesive used to attach the information to the substrate is a solid, radiation-curable resin which is cured by radiation to form a tenaciously adhered bond between the substrate and the information transferred. The resulting bond is resistant to solvents, chemicals, detergents, heat and mechanical stresses likely to be encountered in the use of substrates.
    Type: Application
    Filed: January 20, 2004
    Publication date: July 29, 2004
    Inventor: Peter Cueli
  • Publication number: 20040137165
    Abstract: A color and/or effect coating system for a primed or unprimed substrate, said system comprising a combination effect coat which can be prepared from a pigmented powder slurry.
    Type: Application
    Filed: October 29, 2002
    Publication date: July 15, 2004
    Inventors: Walter Lassmann, Klaus-Dieter Stegemann, Horst Hintze-Brning, Joachim Woltering, Wolfgang Reckordt
  • Publication number: 20040131794
    Abstract: A blood gas syringe includes a porous plastic plug having a crosslinked hydrogel affixed to a wall of a passageway of the plug. When a blood sample is taken with the syringe, the incoming sample forces air in the system out through the passageway of the plug until the sample contacts the hydrogel, causing the passageway to seal shut.
    Type: Application
    Filed: July 23, 2003
    Publication date: July 8, 2004
    Inventors: Richmond R. Cohen, Preston Keusch
  • Patent number: 6756074
    Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: June 29, 2004
    Assignees: General Electric Company, Avery Dennison Corporation
    Inventors: Radislav Alexandrovich Potyrailo, Daniel Robert Olson, Michael Jarvath Brennan, Jay Raghunandan Akhave, Mark Anthony Licon, Ali Reza Mehrabi, Dennis Lee Saunders, Bret Ja Chisholm
  • Patent number: 6749903
    Abstract: An apparatus for irradiating an article, particularly a multi-layer article, with electron beam radiation is provided. The apparatus contains a window having a short unit path length and allows for controlled irradiation of an article such that upper portions of the article receive significantly higher electron beam dosages than lower portions of the article. Such differential dosage allows for modification of an article comprising a coating composition that can be modified by electron beam irradiation on a substrate that is vulnerable to degradation from electron beam radiation. A method of irradiating an article with electron beams, and products manufactured using the apparatus and method of the invention, are also disclosed.
    Type: Grant
    Filed: September 17, 2002
    Date of Patent: June 15, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Douglas Eugene Weiss, James Patrick DiZio, Harvey William Kalweit, Roy G. Schlemmer, Bruce Alan Sventek
  • Patent number: 6743481
    Abstract: A multilayer coating of fullerene molecules is deposited on a substrate, and layers of the multilayer coating are removed leaving an approximate monolayer coating of fullerene molecules on the substrate. In some embodiments, a beam generator, such as an ion beam, electron beam or laser generator, produces a beam arranged to break the weaker fullerene-to-fullerene intermolecular bond of the multilayer coating and inadequate to break the stronger fullerene-to-substrate association/bond of the coating. The beam is directed at the multilayer coating to break the fullerene-to-fullerene intermolecular bond. In other embodiments, the monolayer of fullerene molecules is formed by applying a solvent to the multilayer coating to break the fullerene-to-fullerene intermolecular bond of the multilayer coating.
    Type: Grant
    Filed: May 31, 2001
    Date of Patent: June 1, 2004
    Assignee: Seagate Technology LLC
    Inventors: Joel W. Hoehn, John W. Dykes, James E. Angelo, William D. Mosley, Richard T. Greenlee, Brian W. Karr
  • Publication number: 20040101629
    Abstract: A multicoat system produced by
    Type: Application
    Filed: April 9, 2003
    Publication date: May 27, 2004
    Inventors: Hubert Baumgart, Uwe Meisenburg, Uwe Conring, Karl-Heinz Joost
  • Publication number: 20040101635
    Abstract: In order to provide a process for curing a coating, in particular a radiation-curable coating, on a work piece, which allows coatings even on difficult to access regions of a three-dimensional work piece to be cured in a simple manner, it is proposed that the work piece is disposed in a plasma generation area, and that in the plasma generation area a plasma is generated, by means of which the coating is at least partially cured.
    Type: Application
    Filed: April 17, 2003
    Publication date: May 27, 2004
    Applicant: Duerr Systems GmbH
    Inventors: Konrad Ortlieb, Dietmar Wieland, Wolfgang Tobisch, Dietmar Roth, Karl-Heinz Dittrich
  • Publication number: 20040101632
    Abstract: A method for depositing a low dielectric constant film on a substrate. The method includes depositing a low dielectric constant film comprising silicon, carbon, oxygen and hydrogen in a chemical vapor deposition chamber. The method further includes exposing the low dielectric constant film to an electron beam having an exposure dose less than about 400 &mgr;C/cm2 at conditions sufficient to increase the hardness of the low dielectric constant film.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 27, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Wen H. Zhu, Tzu-Fang Huang, Lihua Li, Li-Qun Xia, Ellie Y. Yieh
  • Publication number: 20040101633
    Abstract: The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compounds having at least one cyclic group to a substrate surface at deposition conditions sufficient to deposit a non-cured film comprising the at least one cyclic group on the substrate surface. The method further includes substantially removing the at least one cyclic group from the non-cured film using an electron beam at curing conditions sufficient to provide a dielectric constant less than 2.5 and a hardness greater than 0.5 GPa.
    Type: Application
    Filed: November 22, 2002
    Publication date: May 27, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Yi Zheng, Srinivas D. Nemani, Li-Qun Xia, Eric Hollar, Kang Sub Yim
  • Publication number: 20040096593
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperature process to remove at least a portion of at least one pore-forming material within a composite film thereby forming a porous film. The pore-forming material may be removed via exposure to at least one energy source, preferably an ultraviolet light source, in a non-oxidizing atmosphere.
    Type: Application
    Filed: July 21, 2003
    Publication date: May 20, 2004
    Inventors: Aaron Scott Lukas, Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki
  • Publication number: 20040096672
    Abstract: Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperature process to remove at least a portion of at least one pore-forming phase within a multiphasic film thereby forming a porous film. The pore-forming phase may be removed via exposure to at least one energy source, preferably an ultraviolet light source, in a non-oxidizing atmosphere.
    Type: Application
    Filed: November 14, 2002
    Publication date: May 20, 2004
    Inventors: Aaron Scott Lukas, Mark Leonard O'Neill, Mark Daniel Bitner, Jean Louise Vincent, Raymond Nicholas Vrtis, Eugene Joseph Karwacki
  • Patent number: 6730365
    Abstract: Method of thin film deposition especially in reactive conditions. Optical coatings with negligible optical absorption, of high quality and low cost even on unheated substrates are deposited using an RF/pulsed DC plasma RF/pulsed DC bias generates a plasma in front of the substrate. This plasma allows obtaining the right stoichiometry of the deposited film by increasing the reactivity of the reactive gas present in the plasma and, in addition, introduces an energetic ion bombardment of the substrate before and during the growth of the film which improves the adherence and the deposit compactness.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: May 4, 2004
    Inventors: Carlo Misiano, Hans K. Pulker
  • Publication number: 20040076766
    Abstract: A process for the production of a coating layer from a coating composition curable with high-energy radiation on a substrate, comprising the successive steps:
    Type: Application
    Filed: July 1, 2003
    Publication date: April 22, 2004
    Inventors: Thomas Fey, Oliver Reis, Carmen Flosbach, Stuart Kernaghan, Karl-Friedrich Doessel
  • Patent number: 6723388
    Abstract: This invention comprises methods for making nanostructured and nanoporous thin film structures of various compositions. These films can be directly patterned. In these methods, precursor films are deposited on a surface and different components of the precursor film are reacted under selected conditions, forming a nanostructured or nanoporous film. Such films can be used in a variety of applications, for example, low k dielectrics, sensors, catalysts, conductors or magnetic films. Nanostructured films can be created: (1) using one precursor component and two reactions, (2) using two or more components based on differential rates of photochemical conversion, (3) using two precursors based on the thermal sensitivity of one precursor and the photochemical sensitivity of the other, and (4) by photochemical reaction of a precursor film and selected removal of a largely unreacted component from the film.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: April 20, 2004
    Assignee: EKC Technology, Inc.
    Inventors: Leo G. Svendsen, Shyama P. Mukheriee, Paul J. Roman, Jr., Ross H. Hill, Harold O. Madsen, Xin Zhang, Donna Hohertz
  • Patent number: 6716487
    Abstract: An article of manufacture for the construction of environmentally compatible stickers which are decorated using inkjet printing methods comprising a polymer plastisol biodegradable rubber resin as its primary ingredient to form one layer from bonding multiple layers. This removable/reusable sticker can even be used for preventing slippery in bathtub. And it is environmental friendly because of its biodegradable character when discarded. The inkjet printing method application is also effective in reducing number of manufacturing steps or processing stages to create vibrant custom inkjet produced images all at a relatively low cost.
    Type: Grant
    Filed: October 20, 1999
    Date of Patent: April 6, 2004
    Inventor: Sang G. Song
  • Patent number: 6714401
    Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: March 30, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuyoshi Honda, Masaru Odagiri, Kiyoshi Takahashi, Noriyasu Echigo, Nobuki Sunagare
  • Publication number: 20040055698
    Abstract: A method of improving lamination consistency across a media substrate is provided. The method includes providing a media substrate having at least one ink-receptive (unprinted) surface and subjecting the ink-receptive surface to plasma treatment to create at least one treated surface of the media substrate.
    Type: Application
    Filed: September 24, 2002
    Publication date: March 25, 2004
    Inventors: Hai Q. Tran, Ronald A. Askeland
  • Publication number: 20040048003
    Abstract: Prior art coating methods have the following drawback in that the dimensions of existing holes in the substrate are altered when coating them thereby limiting the function and effect of the hole and of the substrate. The inventive method for coating a substrate having holes makes it possible for holes to retain their dimensions due to the fact that they are protected by a plug.
    Type: Application
    Filed: September 10, 2003
    Publication date: March 11, 2004
    Inventors: Andre Jeutter, Werner Stamm
  • Publication number: 20040043161
    Abstract: The invention relates to a method for the production of low solvent sol-gel systems, comprising the following steps: (a) hydrolysis or condensation of a silane and/or an alkoxide and/or several alkoxides of Al, Ce, Ga, Ge, Sn, Ti, Zr, Hf, V, Nb and Ta, (b) addition of water to the reaction mixture until phase separation sets in, and (c) separation of the condensate phase. The invention also relates to the sol-gel system thus obtained and to the use thereof.
    Type: Application
    Filed: June 18, 2003
    Publication date: March 4, 2004
    Inventors: Stefan Sepeur, Nora Kunze, Michael Kihm
  • Publication number: 20040039100
    Abstract: A photo-resist composition is disclosed that is a partial esterification product of a styrene maleic anhydride copolymer with (meth)acrylate and hydroxyl containing side chains. An amide containing (meth)acrylate is optionally present. These compositions exhibit a good balance between UV cure rate, tack free properties, and dissolution of uncured composition by dilute alkaline solution.
    Type: Application
    Filed: September 9, 2003
    Publication date: February 26, 2004
    Inventors: Norazmi Alias, Kris Verschueren
  • Patent number: 6696173
    Abstract: Described are conductor track structures on a nonconductive support material, especially fine conductor track structures, which are comprised of a base containing a heavy metal and a metallized coating applied to this, and a method for their production. The invention is characterized in that the heavy metal base in the area of the conductor track structures contains heavy metal nuclei, which have been created by the breakup of an organic nonconductive heavy metal complex, and that the support material contains microporous or microrough support particles to which the heavy metal nuclei are bound. An outstanding strength of adhesion of the deposited metal conductor tracks is achieved. The method is especially suitable also for the production of three-dimensional circuit supports.
    Type: Grant
    Filed: March 22, 1999
    Date of Patent: February 24, 2004
    Assignee: LPKF Laser & Electronics AG
    Inventors: Gerhard Naundorf, Horst Wissbrock
  • Publication number: 20040033318
    Abstract: To provide an apparatus and method for forming a thin-film using raw material fluid containing a film ingredient and supercritical fluid or liquid.
    Type: Application
    Filed: March 3, 2003
    Publication date: February 19, 2004
    Applicants: SEIKO EPSON CORPORATION, YOUTEC CO., LTD.
    Inventors: Takeshi Kijima, Eiji Natori, Mitsuhiro Suzuki
  • Publication number: 20040028818
    Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.
    Type: Application
    Filed: March 4, 2003
    Publication date: February 12, 2004
    Inventors: Radislav Alexandrovich Potyrailo, Daniel Robert Olson, Michael Jarvath Brennan, Jay Raghunandan Akhave, Mark Anthony Licon, Ali Reza Mehrabi, Dennis Lee Saunders, Bret Ja Chisholm
  • Patent number: 6685993
    Abstract: A process for achieving a wear resistant translucent surface on surface elements (1) which comprises a decorative upper layer (2) and a supporting core (5). A number of layers of UV- or electron-beam curing lacquer are applied on a decorative surface, through a process comprising the steps; i) Applying a base layer of lacquer to a surface weight of 5-50 g/m2. ii) Applying hard particles with an average particle size in the range 10-150 &mgr;m which are sprinkled to an amount of 1-40 g/m2 on the still wet lacquer. iii) Curing the applied layer of lacquer to a desired viscosity. iv) Applying a covering layer of lacquer to a surface weight of 5-150 g/m2. v) Curing the applied layer of lacquer to a desired viscosity. vi) Applying a topcoat layer of lacquer with an additive of 5-35% of hard particles with an average size in the range 50 nm-30 &mgr;m to a surface weight of 2-20 g/m2. vii) Curing the applied layers of lacquer to a desired final viscosity.
    Type: Grant
    Filed: November 24, 2000
    Date of Patent: February 3, 2004
    Assignee: Pergo (Europe) AB
    Inventors: Krister Hansson, Johan Lundgren, Hakan Wernersson
  • Publication number: 20040011288
    Abstract: The present invention provides a polymer coating method. In the method, in a vacuum chamber, a low temperature monomer evaporation chamber is used to heat a liquid monomer and a cooled substrate at a temperature lower than the liquid monomer reservoir or vapor. The liquid monomer is allowed to condense on the cooled substrate surface where it is polymerized by a radiation source. The process depends on the vapor pressure difference between liquid in the monomer source and liquid condensed on the surface of the cooled substrate. The film thickness is dependent on the temperature difference between the monomer reservoir and the substrate, and the time that is required to move the coated substrate from the evaporation chamber to the cure station. The method is suitable for forming very thin, uniform, pinhole-free, polymer coatings from a variety of monomers, having at least two olefinic groups per molecule, on a variety of substrates.
    Type: Application
    Filed: February 25, 2003
    Publication date: January 22, 2004
    Inventor: John D. Affinito
  • Publication number: 20040009301
    Abstract: Ink-jet recording media and continuous in-line process for manufacturing such media are provided. The media can be printed with ink-jet printers to form images having good color density, brilliance, and resolution. The ink-jet recording media include a paper substrate coated on one surface with a radiation-curable composition and an ink-receptive composition. The back surface of the paper may be coated with a polymeric coating to reduce curl and improve dimensional stability. The media have a water vapor transmission rate of no greater than 12 grams/100 square inches/24 hours and preferably have a surface gloss of at least 70.
    Type: Application
    Filed: July 3, 2003
    Publication date: January 15, 2004
    Inventors: Linlin Xing, Cau The Ho
  • Publication number: 20040009305
    Abstract: A process for preparing a graft copolymer membrane is provided comprising exposing a porous polymeric base film to a dose of ionizing radiation, and then contacting the irradiated base film with an emulsion comprising a fluorostyrenic or fluoronaphthyl monomer. The graft copolymer membrane may be densified to render it substantially gas-impermeable.
    Type: Application
    Filed: August 27, 2002
    Publication date: January 15, 2004
    Applicant: Ballard Power Systems Inc.
    Inventors: Charles Stone, Lukas M. Bonorand
  • Publication number: 20040009304
    Abstract: A system and method is presented for deposing a liquid on a substrate. The print head of an ink-jet printer emits a liquid containing ink and at least one other component. An energy beam, such as a laser, with sufficient intensity substantially causes at least a partial modification, such as evaporation, of a component of the liquid, thereby altering the drying profile. The ink deposed on the substrate may be used to create devices such as organic transistors and OLEDs.
    Type: Application
    Filed: July 9, 2002
    Publication date: January 15, 2004
    Applicant: Osram Opto Semiconductors GmbH & Co. OGH
    Inventors: Karl Pichler, Matthias Stoessel
  • Patent number: 6676997
    Abstract: A method of forming a two-layer coat, which comprises the steps of: applying (1) a coating composition onto a thermoplastic resin base and drying the coating to form a colored layer, the coating composition (1) comprising: (A) an acrylic resin obtained by copolymerization of a monomer mixture comprising n-butyl (meth)acrylate and methyl (meth)acrylate, each in an amount of at least 30 wt. %; (B) a colorant; and (C) an organic solvent; applying (2) an energy beam curable overcoat composition onto the colored layer, the overcoat composition (2) comprising: (D) a compound having at least three (meth)acryloyl groups and having a molecular weight of 250 to 1,800; and (E) an acrylic resin obtained by copolymerization of a monomer mixture comprising at least 20 wt. % of methyl (meth)acrylate, the compound (D) amounting to at least 50 wt. % of overcoat film-forming components; and curing the applied overcoat composition by energy beam irradiation.
    Type: Grant
    Filed: October 30, 2001
    Date of Patent: January 13, 2004
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Yoichi Tanimoto, Yooichi Abe
  • Patent number: 6677000
    Abstract: A process for irradiating material in web form by means of electron beams and/or UV rays, wherein the material is applied to a transport means, the material on the transport means is guided through a first irradiation in which the material is irradiated on the open side, the material is transferred from the transport means to a substrate, and the material on the substrate is guided through a second irradiation in which the material is irradiated on the second, hitherto unirradiated, open side.
    Type: Grant
    Filed: August 23, 2002
    Date of Patent: January 13, 2004
    Assignee: tesa Akteingesellschaft
    Inventors: Hermann Neuhaus-Steinmetz, Ralf Hirsch
  • Patent number: 6671950
    Abstract: A process for fabricating a multi-layer circuit assembly is provided comprising the following steps: (a) providing a perforate electrically conductive core having a via density of 500 to 10,000 holes/square inch (75 to 1550 holes/square centimeter); (b) applying a dielectric coating onto all exposed surfaces of the electrically conductive core to form a conformal coating on all exposed surfaces of the electrically conductive core; (c) ablating the surface of the dielectric coating in a predetermined pattern to expose sections of the electrically conductive core; (d) applying a layer of metal to all surfaces to form metallized vias through the electrically conductive core; and (e) applying a resinous photosensitive layer to the metal layer. Additional processing steps such as circuitization may be included.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: January 6, 2004
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Lance C. Sturni, Kevin C. Olson
  • Patent number: 6673397
    Abstract: A novel crosslinkable ambifunctional perfluorinated polyetheris provided wherein the polyether is defined by the formula X1—(CaF2aO)n—X2 where X1 and X2 are different functional terminal groups which are capable of forming a crosslinked perfluorinated polyether by addition, condensation or ring-opening reaction, and n ranges from 1 to 2000 and a is an integer of from 1 to 4. The mole ratio of X1 and X2 is 1:1. A release film may be formed from the cross-linked perfluorinated polyether.
    Type: Grant
    Filed: March 19, 2003
    Date of Patent: January 6, 2004
    Assignee: Adhesives Research, Inc.
    Inventor: Ranjit Malik
  • Patent number: 6670287
    Abstract: A closed space is formed in a reduced pressure drying station, and the closed space is brought to a vacuum state. In this state, an EB unit irradiates a wafer mounted on a hot plate with an electron beam to foam an insulating film material. Subsequently, the hot plate is raised to a predetermined temperature, and drying processing is performed under a reduced pressure. As described above, since the foaming processing is performed in the reduced pressure drying station, bubbles remain in the insulating film, so that the existence of the bubbles can decrease the relative dielectric constant.
    Type: Grant
    Filed: May 22, 2002
    Date of Patent: December 30, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Masami Akimoto, Yoichi Deguchi
  • Patent number: 6660339
    Abstract: The present invention relates to a process, preferably a continuous process, of coating a substrate, which allows water vapor and preferably air permeation, with a hydrophobic coating. The process preferably uses a thin film vacuum condensation step to create a monomer coating which is cured in situ after the coating. The process has the benefit of allowing continuous operation and providing an alternative to existing processes for hydrophobic coating. The substrates are coated such that the water vapour permeation sites are not blocked by the coating to maintain the desired breathability. The static water contact angle on the surface of such substrates is more than 95°.
    Type: Grant
    Filed: June 21, 2002
    Date of Patent: December 9, 2003
    Assignee: The Procter & Gamble Company
    Inventors: Saswati Datta, Paul Amaat Raymond Gerard France, Arseniy Valerevich Radomyselskiy
  • Patent number: 6660341
    Abstract: A liquid crystal display device includes an alignment layer with constituent materials. The constituent materials have a stoichiometric relationship configured to provide a given pretilt angle. Liquid crystal material is provided in contact with the alignment layer. A method for forming an alignment layer for liquid crystal displays includes forming the alignment layer on a substrate by introducing an amount of material to adjust a stoichiometric ratio of constituent materials wherein the amount is determined to provide a given pretilt angle to the alignment layer. Ions are directed at the alignment layer to provide uniformity of the pretilt angle.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: December 9, 2003
    Assignee: International Business Machines Corporation
    Inventors: Paul S. Andry, Praveen Chaudhari, James P. Doyle, Eileen A. Galligan, James A. Lacey, Shui-Chih A. Lien, Minhua Lu
  • Patent number: 6659751
    Abstract: A polymer substrate for radiation-induced graft polymerization in the form of a woven or non-woven fabric that comprises a woven or non-woven fabric composed of polymer fiber and a reinforcement polymer having a greater strength and a slower rate of radiation-induced graft polymerization than said polymer fiber. Also, radiation graft treated stock prepared from said polymer substrate. In another aspect, a radiation graft treated material in the form of a woven or non-woven fabric material that is composed of polymer monofilament fiber of which only the surface has undergone a radiation-induced graft polymerization but of which the center remains unaffected by grafting.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: December 9, 2003
    Assignee: Ebara Corporation
    Inventors: Takanobu Sugo, Kunio Fujiwara, Hideo Kawazu, Teruo Masubuchi, Junichi Kanno, Naotoshi Endo, Masaji Akahori
  • Patent number: 6652922
    Abstract: An improved method for producing substrates coated with dielectric films for use in microelectronic applications wherein the films are processed by exposing the coated substrate surfaces to a flux of electron beam. Substrates cured via electron beam exposure possess superior dielectric properties, density, uniformity, thermal stability, and oxygen stability.
    Type: Grant
    Filed: May 23, 1996
    Date of Patent: November 25, 2003
    Assignee: Alliedsignal Inc.
    Inventors: Lynn Forester, Neil H. Hendricks, Dong-Kyu Choi
  • Patent number: 6652925
    Abstract: The aim of the invention is to develop a method for producing massive-amorphous layers on massive metallic shaped bodies. According to the method, amorphous layers having a thickness of >20 &mgr;m can be produced in only one procedure step. To this end, alloys which can be used for producing massive metallic glasses under quick solidification conditions or alloy elements which can be used for producing massive metallic glasses together with the elements of the shaped body material and under quick solidification conditions are molten by means of high-energy radiation are directly applied onto the massive metallic shaped body for producing an amorphous layer that is >20 &mgr;m up to several millimeter thick or are alloyed into the surface of the shaped bodies. The melt is quickly solidified by means of natural cooling and/or forced air cooling of the shaped body. The inventive method enables to coat metallic shaped bodies with massive metallic glasses which improve the surface characteristics.
    Type: Grant
    Filed: March 1, 2002
    Date of Patent: November 25, 2003
    Assignee: Institut für Festkörper- und Werkstofforschung Dresden e.V.
    Inventors: Wolfgang Schwarz, Jürgen Eckert, Sabine Schinnerling
  • Publication number: 20030211244
    Abstract: A method for depositing a low dielectric constant film having a dielectric constant of about 3.0 or less, preferably about 2.5 or less, is provided by reacting a gas mixture including one or more organosilicon compounds and one or more oxidizing gases. In one aspect, the organosilicon compound comprises a hydrocarbon component having one or more unsaturated carbon-carbon bonds, and in another aspect, the gas mixture further comprises one or more aliphatic hydrocarbon compounds having one or more unsaturated carbon-carbon bonds. The low dielectric constant film is post-treated after it is deposited. In one aspect, the post treatment is an electron beam treatment, and in another aspect, the post-treatment is an annealing process.
    Type: Application
    Filed: April 8, 2003
    Publication date: November 13, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Lihua Li, Wen H. Zhu, Tzu-Fang Huang, Li-Qun Xia, Ellie Y. Yieh, Son Van Nguyen, Lester A. D'Cruz, Troy Kim, Dian Sugiarto, Peter Wai-Man Lee, Hichem M'Saad, Melissa M. Tam, Yi Zheng, Srinivas D. Nemani
  • Publication number: 20030207043
    Abstract: Ion texturing methods and articles are disclosed.
    Type: Application
    Filed: July 30, 2001
    Publication date: November 6, 2003
    Inventors: Leslie G. Fritzemeier, John D. Scudiere
  • Publication number: 20030207044
    Abstract: A method is provided for gettering impurities from silicon wafers and devices to improve the quality of the material and the device performance. The wafer or the device is coated on the back-side with a layer of aluminum and is illuminated form the other side with light having a significant portion of energy in the IR region. This process leads to formation of a Si-Al melt on the backside, at temperature below 550° C. Dissolved impurities in the Si diffuse toward the Al melt and are trapped there. At higher illuminations and concomitant higher temperatures, the Al interface serves as a source of point defect injection. This mode of processing causes dissolution of precipitated impurities at greatly reduced temperatures and in short periods of time.
    Type: Application
    Filed: August 30, 2002
    Publication date: November 6, 2003
    Inventor: Bhushan L. Sopori
  • Patent number: 6641705
    Abstract: A charged particle beam uniformly removes material, particularly crystalline material, from an area of a target by compensating for or altering the crystal orientation or structure of the material to be removed. The invention is particularly suited for FIB micromachining of copper-based crystalline structures. Uniformity of material removal can be improved, for example, by passing incoming ions through a sacrificial layer formed on the surface of the material to be removed. The sacrificial layer is removed along with the material being milled. Uniformity of removal can also be improved by changing the morphology of the material to be removed, for example, by disrupting its crystal structure or by altering its topography.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: November 4, 2003
    Assignee: FEI Company
    Inventors: Michael Phaneuf, Jian Li, Richard F. Shuman, Kathryn Noll, J. David Casey, Jr.