Antihalation Or Filter Layer Containing Patents (Class 430/510)
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Patent number: 6497986Abstract: The invention relates to a photographic element comprising nacreous pigment.Type: GrantFiled: August 16, 2001Date of Patent: December 24, 2002Assignee: Eastman Kodak CompanyInventors: Peter T. Aylward, Robert P. Bourdelais, Alphonse D. Camp
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Patent number: 6492076Abstract: This invention relates to a color photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one antihalation layer or filter layer, wherein the antihalation or filer layer comprises an aqueous heat-bleachable composition comprising at least one zwitterionic 1-aminopyridinium dye having a methine linkage terminated by a substituted or unsubstituted heterocyclic nucleus.Type: GrantFiled: August 27, 2001Date of Patent: December 10, 2002Assignee: Eastman Kodak CompanyInventors: Ramanuj Goswami, Mark E. Irving, David H. Levy
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Patent number: 6489086Abstract: Disclosed are an improved silver halide color photographic photosensitive material comprising a support having thereon a photosensitive layer containing at least one kind of photosensitive silver halide grain, a color developing agent, a coupler and a binder, and a non-photosensitive layer, wherein a one dye is contained as a dispersion of solid fine particles at least one of the layers the dye being represented by general formula (I) as follows: D−(X)y General formula (I) wherein D represents a compound having a chromophore; X represents a dissociative proton or a group having a dissociative proton which is linked to D directly or via a divalent linking group; and y represents an integer of 1 to 7.Type: GrantFiled: March 17, 2000Date of Patent: December 3, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Tetsu Kamosaki, Keizo Kimura, Masashi Ogiyama
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Patent number: 6479220Abstract: A method of imaging comprising: providing a photothermographic material having at least one photothermographic medium and exposing said material to a source of narrow band radiation, wherein said material comprises one or more non-sensitizing acutance or antihalation dyes associated with said photothermographic medium providing an absorption maximum (&lgr;max) within 10 nm of the wavelength of maximum output of said narrow band source and an optical density of at least 0.05 at a wavelength (&lgr;max+50) nm.Type: GrantFiled: October 25, 1995Date of Patent: November 12, 2002Assignee: Eastman Kodak CompanyInventors: Michael L. Parkinson, Duncan McL A. Grieve
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Publication number: 20020164549Abstract: Photothermographic imaging materials having increased photospeed are provided by certain tellurium chemical sensitizers that are added during the formulation of a photothermographic emulsion.Type: ApplicationFiled: October 11, 2001Publication date: November 7, 2002Applicant: Eastman Kodak CompanyInventors: Doreen C. Lynch, Andrea L. Opatz, Steven M. Shor, Sharon M. Simpson, Brian C. Willett, Henry J. Gysling
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Publication number: 20020160283Abstract: The present invention is directed to a photothermographic element in which the density formed in a thermally processed photothermographic element is limited for the purpose of scanning the element prior to removal of silver halide, metallic silver, and/or any organic silver salts. In one embodiment of the invention, this is accomplished by employing limited quantities of sensitized silver halide in a photothermographic element.Type: ApplicationFiled: March 6, 2002Publication date: October 31, 2002Applicant: Eastman Kodak CompanyInventors: Richard P. Szajewski, David H. Levy
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Publication number: 20020160312Abstract: A method for producing a photoresist master adapted for use in the manufacture of an optical information medium is provided. This method has enabled formation of a fine pattern having a minimum width which is about half of the wavelength used for the exposure, and in this method, decrease in the pattern height has been suppressed and tapering of the pattern profile has been improved. In this method comprising the steps of applying a photoresist layer on a substrate, exposing the photoresist layer to a laser beam to form a latent image in the photoresist layer, and developing the latent image to form a protrusion/depression pattern to thereby produce the photoresist master, and in this method; a light absorbing layer is formed between the substrate and the photoresist layer and in contact with the photoresist layer, and the light absorbing layer exhibits light absorption at the wavelength of said laser beam.Type: ApplicationFiled: February 27, 2002Publication date: October 31, 2002Applicant: TDK CORPORATIONInventors: Hisaji Oyake, Hiroaki Takahata
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Patent number: 6461776Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.Type: GrantFiled: January 25, 2002Date of Patent: October 8, 2002Assignee: Hitachi, Ltd.Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
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Publication number: 20020136970Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.Type: ApplicationFiled: January 25, 2002Publication date: September 26, 2002Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
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Publication number: 20020132175Abstract: The present invention is directed to a method of scanning silver-halide-containing color photographic and photothermographic film. In particular, the present invention comprises record shifting by means by employing at least one infrared dye in a color unit of the film, thereby forming at least one image record in the infrared. This expedient leads to the formation of high quality images, especially when scanning photothermographic elements in which the silver halide, metallic silver, and/or any organic silver salts have not been removed.Type: ApplicationFiled: March 6, 2002Publication date: September 19, 2002Applicant: Eastman Kodak CompanyInventor: Richard P. Szajewski
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Patent number: 6451503Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.Type: GrantFiled: April 30, 1996Date of Patent: September 17, 2002Assignee: Shipley Company, L.L.C.Inventors: James W. Thackeray, George W. Orsula
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Patent number: 6451516Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one antihalation layer or a filter layer, wherein the antihalation or filer layer comprises an aqueous heat-bleachable composition comprising a 1-aminopyridinium filter dye having a methine linkage terminated by a substituted or unsubstituted heterocyclic nucleus of the type contained in cyanine dyes, which filter dye is in the presence of an effective amount of a thermal solvent.Type: GrantFiled: August 27, 2001Date of Patent: September 17, 2002Assignee: Eastman Kodak CompanyInventors: Mark E. Irving, Ramanuj Goswami
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Publication number: 20020123013Abstract: A silver halide photographic film element has been disclosed, said element comprising on a light-sensitive side of a transparent polyester support, and, in order, an electrically conductive subbing layer, an antihalation undercoat, a light-sensitive emulsion layer or multilayer arrangement, optionally including one or more intermediate, non-light-sensitive layers between emulsion layers in said multilayer arrangement, and a protective overcoat; and on a backing layer side opposite thereto, in order, a subbing layer containing a lubricant and a topcoat layer, characterized in that on the light-sensitive side of said element said subbing layer comprises an antistatic agent providing a substantially unchanged electrical resistivity of the said element before and after processing of said material, and said antihalation undercoat optionally comprises a high temperature boiling solvent; whereas on the backing layer side a friction coefficient of the backing layer versus stainless steel remains unchanged in the rangType: ApplicationFiled: October 1, 2001Publication date: September 5, 2002Inventors: Kris Viaene, Etienne Van Thillo, Hartwig Andries
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Patent number: 6444415Abstract: A thermally developable silver halide photographic light-sensitive material having a dye represented by formula (8), wherein X1 and X2 each represents an oxygen atom, a sulfur atom, a selenium atom, or a tellurium atom; R5 and R6 each represents a hydrogen atom or an alkyl group; R7 and R8 each represents a monovalent substituents, and plural R7 and plural R8 may form a ring structure with each other; m and n each represents an integer of 0 to 4.Type: GrantFiled: September 27, 2001Date of Patent: September 3, 2002Assignee: Konica CorporationInventors: Shinri Tanaka, Dai Ikemizu
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Patent number: 6426180Abstract: Disclosed is a color silver halide photographic element comprising a support bearing: (1) a light sensitive silver halide emulsion layer; (2) a nitrogen heterocycle with a minimum of three heteroatoms that does not react with oxidized developer, does not contain free thiol substituents, and has a C log P sufficient to increase the photographic speed of said element compared to the same element without the compound, said heterocycle compound located either in said light sensitive layer or in a layer adjacent to it; and (3) an ETARC, in or adjacent to said light sensitive silver halide emulsion layer, that releases, upon reaction with oxidized developer, an electron transfer agent having a C log P of at least 2.40. The invention provides improved light sensitivity.Type: GrantFiled: October 17, 2000Date of Patent: July 30, 2002Assignee: Eastman Kodak CompanyInventors: Joseph F. Bringley, James A. Friday, Stephen P. Singer, Marcello Vitale
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High speed photothermographic materials with combined chemical sensitizers and methods of using same
Patent number: 6423481Abstract: Photothermographic materials have increased photospeed provided by gold(III)-containing chemical sensitizers that are used combination with sulfur- and/or tellurium-containing chemical sensitizers. Increased photographic speed is achieved with minimal increase in Dmin. The gold(III)-containing chemical sensitizers are represented by the following Structure GOLD: Au(III)L′rYq GOLD wherein L′ represents the same or different ligands, each ligand comprising at least one heteroatom that is capable of forming a bond with gold, Y is an anion, r is an integer of from 1 to 8, and q is an integer of from 0 to 3.Type: GrantFiled: January 23, 2001Date of Patent: July 23, 2002Assignee: Eastman Kodak CompanyInventors: Sharon M. Simpson, David R. Whitcomb, Steven M. Shor -
Patent number: 6416942Abstract: There is disclosed a silver halide photographic light-sensitive material which comprises a support and provided thereon at least one light-sensitive silver halide emulsion layer and at least one hydrophilic colloidal layer comprising a solid particle dispersion of a water-insoluble photographically useful compound, said solid particle dispersion being a dispersion comprising both a water-insoluble photographically useful compound of the formula 1 and a specific polymer having a carboxyl group and an alkoxycarbonyl group: wherein A is an acidic nucleus, L1, L2 and L3 each are a methine group which may be substituted, R1 and R3 each are a hydrogen atom or a substituent (including an atom), R2 is a substituent (including an atom), n is 0 or 1, m is an integer of 0 to 4, when m is an integer of 2 to 4, R2 may be the same or different, X is an electron-withdrawing group having Hammett's substitution constant &sgr;m of 0.3 to 1.5.Type: GrantFiled: September 27, 2000Date of Patent: July 9, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Hiroki Sasaki, Masatoshi Nakanishi
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Patent number: 6413711Abstract: A photothermographic material is disclosed, comprising a support and a photosensitive layer containing an organic silver salt, a photosensitive silver halide and a binder, wherein the photosensitive layer or the support contains a dye represented by formula (1), and the photosensitive silver halide being spectrally sensitized with at least a sensitizing dye represented by formulas (2a) through (2d).Type: GrantFiled: September 5, 2000Date of Patent: July 2, 2002Assignee: Konica CorporationInventor: Soc Man Ho Kimura
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Patent number: 6410209Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.Type: GrantFiled: September 15, 1998Date of Patent: June 25, 2002Assignee: Shipley Company, L.L.C.Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
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Patent number: 6395463Abstract: The invention relates to a method of recording multiple images by providing an integral, lenticular, multilayer, color photographic element comprising a red light sensitive layer comprising a cyan dye forming coupler, a green light sensitive layer comprising a magenta dye forming coupler, a blue light sensitive layer comprising a yellow dye forming coupler, and an antihalation layer.Type: GrantFiled: May 26, 1999Date of Patent: May 28, 2002Assignee: Eastman Kodak CompanyInventor: James L. Edwards
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Patent number: 6391535Abstract: A silver halide photothermographic material is disclosed, comprising on a support an organic silver salt and a silver halide, wherein the support has thereon a sublayer containing an infrared absorbing compound exhibiting an absorption maximum at a wavelength of 700 to 900 nm.Type: GrantFiled: April 17, 2000Date of Patent: May 21, 2002Assignee: Konica CorporationInventors: Tadashi Arimoto, Takayuki Sasaki
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Patent number: 6376159Abstract: A (photo)thermographic recording material comprising a substantially colourless support and a (photo-addressable) thermosensitive element containing a substantially light-insensitive organic silver salt, an organic reducing agent for the substantially light-insensitive organic silver salt in thermal working relationship therewith (, photosensitive silver halide is catalytic association with the substantially light-insensitive organic silver salt) and a binder, characterized in that a blue pigment or dye having a maximum absorption wavelength of from 550 to 700 nm is present in the thermosensitive element and/or any other layer on either side of the support which provides a background for viewing in transmission images produced with the (photo) thermographic recording material; and a (photo)thermographic recording process therefor.Type: GrantFiled: October 25, 2000Date of Patent: April 23, 2002Assignee: Agfa-GevaertInventor: Hans Strijckers
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Patent number: 6376163Abstract: A UV or visible-light sensitive photobleachable dye composition substantially free of polymerizable monomer comprising a photobleachable dye and an N-oxyazinium compound, a photographic element containing such a photobleachable composition, and a method for bleaching a photographic element.Type: GrantFiled: February 22, 2000Date of Patent: April 23, 2002Assignee: Eastman Kodak CompanyInventors: Ramanuj Goswami, Samir Y. Farid, Robert J. Perry, Paul A. Zielinski, Ian R. Gould, Kevin W. Williams
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Patent number: 6368779Abstract: Photothermographic materials have increased photospeed provided by certain organic solvent-soluble thiourea compounds that can be represented by the following Structure I, II, or III: wherein in Structure I, R1, R2, R3 and R4 are independently alkyl, cycloalkyl, allyl, alkenyl, alkynyl, aryl or heterocyclic groups, or R1 and R2 taken together, R3 and R4 taken together, R1 and R3 taken together or R2 and R4 taken together, can form a 5- to 7-membered heterocyclic ring, in Structure II, R1, R2, R3, R4 and R5 are independently alkyl, cycloalkyl, allyl, alkenyl, alkynyl, aryl or heterocyclic groups, or R3 and R5 taken together, R4 and R5 taken together, R1 and R3 taken together or R2 and R4 taken together, can form a substituted or unsubstituted 5- to 7-membered heterocyclic ring, and in Structure III, R1, R2, R3, R4, R5, and R6 are independently alkyl, cycloalkyl, allyl, alkenyl, alkynyl, aryl or heterocyclic groups, or R3 and R6 taken together, R4 and R5 taken together, R1 and R3 taken togetheType: GrantFiled: September 21, 2000Date of Patent: April 9, 2002Assignee: Eastman Kodak CompanyInventors: Doreen C. Lynch, Sharon M. Simpson, Steven M. Shor, Brian C. Willett, Chaofeng Zou
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Patent number: 6368781Abstract: The invention relates to a photographic element comprising a support and a silve halide emulsion layer wherein the silver halide emulsion contains at least one absorber dye and at least one sensitizing dye. The wavelength of maximum absorbance of said absorber dye and the wavelength of maximum sensitivity of the emulsion provided by the spectral sensitizing dye are substantially the same. The emulsion is chemically sensitized with a stable and water soluble AuI) complex. This provides manufacturing improvements, improved detail and sharpness, improved dodging and burning and lower cost without an unwanted increase in heat sensitivity.Type: GrantFiled: October 20, 1999Date of Patent: April 9, 2002Assignee: Eastman Kodak CompanyInventors: Pamela M. Ferguson, Roger Lok, Alton L. Chitty, Norman R. Oneal
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Patent number: 6365333Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.Type: GrantFiled: July 17, 2001Date of Patent: April 2, 2002Assignee: Micron Technology, Inc.Inventors: Leonard Forbes, Kie Y. Ahn
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Patent number: 6355404Abstract: The invention relates to a display material comprising a base, said base comprising a polyester sheet comprising at least one voided polyester diffusion layer, at least one topside photosensitive silver halide layer on the topside of said base and at least one bottom side photosensitive layer on the bottom side of said base, below said at least one bottom side emulsion layer a tone enhancing layer, and below said tone enhancing layer an antihalation layer, wherein said display material has a light transmission of between 35 and 60 percent in the developed Dmin areas of the display material.Type: GrantFiled: December 6, 2000Date of Patent: March 12, 2002Assignee: Eastman Kodak CompanyInventors: Alphonse D. Camp, Peter T. Aylward, Robert P. Bourdelais, Thomas M. Laney, John L. Pawlak, Gary J. McSweeney
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Patent number: 6355400Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.Type: GrantFiled: May 7, 2001Date of Patent: March 12, 2002Assignee: Hitachi, Ltd.Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
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Patent number: 6355403Abstract: This invention relates to a photographic element comprising a base having a reflection surface on each side having a spectral transmission of less than 10% and at least one photosensitive silver halide containing layer on each side wherein said photographic element has a speed less than 50 ASA.Type: GrantFiled: January 28, 2000Date of Patent: March 12, 2002Assignee: Eastman Kodak CompanyInventors: Robert P. Bourdelais, Alphonse D. Camp, Peter T. Aylward
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Patent number: 6355405Abstract: Multilayer articles (including imaging elements) have improved adhesion between a polymeric support and film-forming polymer-containing layers disposed thereon. This improved adhesion is provided by including in the adhesion-promoting layer next to the support two or more polymers specific properties. At least one of the polymers adheres the layer to the support, and at least one other polymer is compatible or of the same class as the film-forming polymer in the upper layer. This adhesion-promoting layer can be provided as a very thin “carrier” layer during coating operations so that desired sensitometric effects and functional properties are obtained. Preferred imaging elements having such adhesion-promoting layers are photothermographic films.Type: GrantFiled: February 23, 2000Date of Patent: March 12, 2002Assignee: Eastman Kodak CompanyInventors: Thomas J. Ludemann, Gary E. LaBelle, Thomas C. Geisler, Jerry L. Warren, Anne E. Crump, Aparna V. Bhave
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Patent number: 6352819Abstract: High contrast thermographic and photothermographic materials comprise a barrier layer to prevent migration of diffusible by-products resulting from high temperature development. The barrier layer comprises a film-forming polymer(s) that reacts with or acts as a physical barrier to diffusible by-products resulting from development including formic acid, hydrazo compounds, azo compounds, diimide compounds, hydrazine, and water.Type: GrantFiled: December 1, 2000Date of Patent: March 5, 2002Assignee: Eastman Kodak CompanyInventors: Raymond J. Kenney, Paul G. Skoug, Takuzo Ishida, Lawrence B. Wallace
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Patent number: 6352822Abstract: The invention relates to a display material comprising a base said base comprising a polyolefin sheet comprising at least one voided polyolefin diffusion layer, at least one topside photosensitive silver halide layer on the topside of said base and at least one bottom side photosensitive layer on the bottom side of said base, below said bottom side emulsion a tone enhancing layer and below said tone enhancing layer an antihalation layer wherein said display material has a light transmission of between 35 and 60 percent in the developed Dmin areas of the display material.Type: GrantFiled: December 6, 2000Date of Patent: March 5, 2002Assignee: Eastman Kodak CompanyInventors: Alphonse D. Camp, Peter T. Aylward, Robert P. Bourdelais, John L. Pawlak, Gary J. McSweeney
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Patent number: 6350565Abstract: A color photographic element containing a support bearing: (a) a red record comprising, in order from the support, a less and a more red light sensitive silver halide emulsion layer, each having associated therewith at least one cyan dye-forming coupler; (b) further from the support a green record comprising, in order from the support, a less and a more green light sensitive silver halide emulsion layer, each having associated therewith at least one magenta dye-forming coupler, and (c) still further from the support, a blue record comprising in order from the support, a less and a more blue light sensitive silver halide emulsion layer, each having associated therewith at least one yellow dye-forming coupler; wherein: (d) there is located below and only below the most red light sensitive layer of the red record a relatively non-light sensitive “small 3-D emulsion layer” that is substantially free of red light absorbing dye.Type: GrantFiled: October 17, 2000Date of Patent: February 26, 2002Assignee: Eastman Kodak CompanyInventors: Joseph F. Bringley, James A. Friday, Marcello Vitale
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Patent number: 6350561Abstract: Thermographic and photothermographic materials comprise a surface barrier layer to provide physical protection and to prevent migration of diffusible imaging components and by-products resulting from high temperature development. The barrier layer comprises a film-forming acrylate or methacrylate polymer(s) that has a molecular weight of at least 8000 g/mole and comprises epoxy functionality and is capable of retarding diffusion of mobile chemicals such as fatty acids. This polymer is preferably present in admixture with at least one other film-forming polymer to provide a clear and scratch-resistance surface film.Type: GrantFiled: December 1, 2000Date of Patent: February 26, 2002Assignee: Eastman Kodak CompanyInventors: Anne M. Miller, Michelle L. Horch, Charles L. Bauer, David M. Teegarden
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Patent number: 6346361Abstract: A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.Type: GrantFiled: October 6, 1999Date of Patent: February 12, 2002Assignee: Clariant Finance (BVI) LimitedInventors: Jianhui Shan, Shuji Ding, Eleazar B. Gonzalez, Dinesh N. Khanna
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Patent number: 6344310Abstract: The invention relates to a photographic element consisting essentially of a transparent biaxially oriented polymer sheet, at least one emulsion adhering layer, and at least one light sensitive silver halide grain containing emulsion layer adhered to said emulsion adhering layer, wherein said polymer sheet is less than 76 micrometers.Type: GrantFiled: November 20, 1998Date of Patent: February 5, 2002Assignee: Eastman Kodak CompanyInventors: Robert P. Bourdelais, Peter T. Aylward, Thaddeus S. Gula, Alphonse D. Camp
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Patent number: 6329128Abstract: An infrared photosensitive element comprising: a support bearing an infrared radiation-sensitive silver halide material; and an antihalation layer comprising a basic antistatic agent, an acid having a pKa less than 4.2 in an amount equal to at least 1.0% mole equivalent of acid to 1 mole equivalent of amine in said antistatic agent, and sufficient antihalation dye to provide a transmission optical density at the wavelength of maximum absorbence of said dye of at least 0.2 after coating.Type: GrantFiled: May 1, 1995Date of Patent: December 11, 2001Assignee: Eastman Kodak CompanyInventors: Randall H. Helland, Charles W. Gomez, William D. Ramsden
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Patent number: 6326131Abstract: An imaging element is disclosed comprising a support, an imaging layer, and an outermost protective layer on at least one side of the support which comprises a lubricant and an additive which is immiscible with and more surface active than the lubricant, wherein the lubricant is present in an amount of at least 5 mg/m2 and the additive is present in an amount of at least 25 wt percent relative to that of the lubricant, the amount of additive being effective to increase the coefficient of friction for the outermost layer after coating and drying thereof relative to that obtained in the absence of the additive material. Imaging elements comprising highly lubricated protective outermost layers in accordance with the invention advantageously provide increased scratch and wear resistance, while the presence of an additive which is immiscible with and more surface active than the lubricant surprisingly has been found to increase the coefficient of friction to provide good manufacturability of the imaging element.Type: GrantFiled: August 31, 2000Date of Patent: December 4, 2001Assignee: Eastman Kodak CompanyInventors: Brian A. Schell, Mridula Nair
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Publication number: 20010046647Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.Type: ApplicationFiled: July 17, 2001Publication date: November 29, 2001Applicant: Micron Technology, Inc.Inventors: Leonard Forbes, Kie Y. Ahn
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Patent number: 6316179Abstract: An infrared sensitized photothermographic silver halide element comprising a support layer having on at least one surface thereof a photothermographic composition comprising a binder, a light insensitive silver source, a reducing agent for silver ion and infrared radiation sensitive preformed silver halide grains having number average particle size of <0.10 micron with at least 80% of all grains with ±0.05 microns of the average, in combination with an antihalation layer having an absorbance ratio of IR absorbance (before exposure)/visible absorbance (after processing) >30, and an IR absorbance of at least 0.3 within the range of 750-1400 and an optical density of less than 0.03 in the visible region.Type: GrantFiled: October 24, 2000Date of Patent: November 13, 2001Assignee: Eastman Kodak CompanyInventors: Steven M. Shor, James B. Philip, Jr.
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Patent number: 6300053Abstract: A photothermographic element has on a support a photo-sensitive layer, and a first non-photosensitive layer containing (1) a base-bleachable dye or a salt thereof and (2) a binder. The first non-photosensitive layer or a second non-photosensitive layer disposed adjacent thereto contains (3) a base precursor and (4) a melting point depressant. The dye (1) becomes more bleachable and the processed image becomes more water resistant.Type: GrantFiled: April 1, 1999Date of Patent: October 9, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Itsuo Fujiwara, Ichizo Toya, Masaki Noro
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Patent number: 6300047Abstract: The present invention relates to a support base for light-sensitive photographic elements. In particular, the present invention relates to a support base comprising a support having coated thereon at least two antihalation layers overcoated by a protective layer. The support base for light-sensitive photographic elements of the present invention presents an improved coating quality with a reduced formation of mottle, defined as an irregularly patterned defect due to the tendency of the coated layers to reproduce any deformation present on the support.Type: GrantFiled: May 23, 2000Date of Patent: October 9, 2001Inventors: Wilma Massucco, Domenico Marinelli, Piero Cavalleri
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Patent number: 6291148Abstract: The invention relates to an element consisting essentially of a photographic element comprising a base material having an upper surface comprising an oriented sheet, at least one photosensitive silver halide layer, and at least one sharpness enhancing agent above said photosensitive silver halide layer.Type: GrantFiled: January 28, 2000Date of Patent: September 18, 2001Assignee: Eastman Kodak CompanyInventors: Peter T. Aylward, Alphonse D. Camp, Robert P. Bourdelais, Gary J. McSweeney
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Patent number: 6277547Abstract: The invention relates to an element consisting essentially of a transparent polymer sheet, at least one emulsion adhering layer, and at least one light sensitive silver halide grain containing emulsion layer adhered to said emulsion adhering layer, wherein said polymer sheet is less than 40 &mgr;m in thickness.Type: GrantFiled: September 30, 1999Date of Patent: August 21, 2001Assignee: Eastman Kodak CompanyInventors: Robert P. Bourdelais, Peter T. Aylward, Alphonse D. Camp, Thaddeus S. Gula
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Patent number: 6277548Abstract: A motion picture film photographic element is disclosed comprising a support having on a front side thereof a subbing layer unit and one or more image-forming units comprising at least one light-sensitive silver halide emulsion layer coated over the subbing layer unit, wherein the layers coated on the front side of the support comprise in total from 5 to 30 mg/m2 of dispersed carbon particles, and the majority of the dispersed carbon particles is contained in the emulsion layer or layers of the one or more image forming units or in intercoat layers which may be present between two emulsion layers. The motion picture photographic film clement provides improved performance when marked by means of a laser beam.Type: GrantFiled: August 3, 2000Date of Patent: August 21, 2001Assignee: Eastman Kodak CompanyInventors: Gary N. Barber, Christopher J. Haller, Mary C. Brick
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Patent number: 6270931Abstract: A method of exposing an integral imaging element having: an integral lens sheet with opposed front and back surfaces; a light sensitive layer positioned behind the back surface; and an anti-halation layer between the light sensitive layer and the back surface; the method comprising the steps of: simultaneously exposing a major portion of the area of the light sensitive layer with light from behind the light sensitive layer, or simultaneously exposing the light sensitive layer to all of an integral image from behind the light sensitive layer.Type: GrantFiled: December 22, 1995Date of Patent: August 7, 2001Assignee: Eastman Kodak CompanyInventor: Roger Roy Morton
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Patent number: 6261751Abstract: An antireflective coating (ARC) or antireflective layer (ARL) is interposed between a photoresist layer and an underlying substrate. The ARC includes an optically absorptive polysilicon germanium or polysilicon first layer, deposited by low pressure chemical vapor deposition (LPCVD). An optically transmissive second layer is grown on the first layer by oxidizing it at low temperature. The low temperature oxidation accurately controls the thickness, and optical impedance, of the second layer. The optical impedances of the second and photoresist layers are matched for minimizing reflections and reducing photolithographic limitations such as swing effect and reflective notching. The low temperature oxidation is compatible with low thermal budget layers (e.g., aluminum or other metals), which are typically highly reflective at ultraviolet (UV) and deep ultraviolet (DUV) lithographic exposure wavelengths.Type: GrantFiled: August 21, 2000Date of Patent: July 17, 2001Assignee: Micron Technology, Inc.Inventors: Leonard Forbes, Kie Y. Ahn
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Patent number: 6261743Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.Type: GrantFiled: April 10, 1998Date of Patent: July 17, 2001Assignee: Shipley Company, L.L.C.Inventors: Edward K. Pavelchek, Manuel DoCanto
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Patent number: 6261753Abstract: The present invention relates to the use of dye-stuffs of the general formula I in which R1, R2 and R3 and M• are as defined in claim 1, as infra-red-absorbing agents in hydrophilic colloidal layers, for example in recording materials or for detection purposes, recording materials, for example photographic recording materials, which comprise such dyestuffs in hydrophilic colloidal layers, and new dyestuffs of the general formula I.Type: GrantFiled: March 12, 1998Date of Patent: July 17, 2001Assignee: Riedel-De Haen AktiengesellschaftInventors: Ralph Lonsky, Lutz Uwe Lehmann
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Patent number: 6261750Abstract: A silver halide color light-sensitive material contains at least one light-sensitive silver halide emulsion layer and at least one non-light-sensitive layer on a support, wherein at least one of the non-light-sensitive layers contains a silver halide emulsion having a previously fogged surface, and the non-light-sensitive layer containing the previously fogged emulsion and/or its adjacent layer contains a compound capable of releasing a photographically useful group or its precursor by a coupling reaction with the oxidized form of a developing agent, wherein the previously fogged emulsion is developed during color development to evenly form the oxidized form of a color developing agent, and the photographically useful group or its precursor is released non-imagewise by the coupling reaction.Type: GrantFiled: March 31, 2000Date of Patent: July 17, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Yoshio Ishii, Takayuki Ito, Fumitaka Ueda, Hiroyuki Yoneyama