Abstract: A antireflective film 50 is formed on a thermocouple 42 arranged in a processing vessel 1 of a heat treatment apparatus in order to improve the transient response characteristics of the thermocouple 42. In a typical embodiment, the thermocouple 42 is made by connecting a platinum wire 43A and a platinum-rhodium alloy wire 43B, and the antireflective film 50 is composed by stacking a silicon nitride layer 50C, silicon layer 50B and a silicon nitride layer 50A in that order.

Abstract: The invention provides a method for activating impurity element added to a semiconductor and performing gettering process in shirt time, and a thermal treatment equipment enabling to perform such the heat-treating.

Abstract: A baking apparatus for manufacturing a semiconductor device remarkably enhances the uniformity of the CD (Critical Dimension) of a wafer by creating a uniform temperature distribution. The apparatus includes a processing having an open upper part, a hot plate disposed in the chamber and on which a wafer is to be mounted, a cover covering the upper part of the chamber; and a thin film made of material having a low emissivity extending over the inner surface of the cover. The inventive structure prevents the emission of heat to the outside so that the temperature within the processing chamber can be rapidly stabilized.

Abstract: Fans circulate heated air which is introduced from nozzles defining discharge axes that are respectively directed generally parallel to, yet slightly toward, the rotational axes of the fans. The fans operate in first and second modes to respectively force flow in opposite first and second directions. Heated air is introduced from the nozzles at the high-pressure sides of the fans.

Abstract: A jig for heat treatment of a work capable of using for long period by eliminating or minimizing the deformation thereof due to thermal distortion and capable of efficiently performing the heat treatment of the work by reducing the amount of heat energy absorbed by the jig in a heat treating furnace, comprising an outer peripheral frame (2) formed of a plurality of members and a placing part (3) disposed in the outer peripheral frame (2) and formed of a plurality of members for placing the work (4), wherein the members are movably connected to each other, and the connection of the members forming the outer peripheral frame (2) to each other and the connection of these members to the members forming the placing part (3) are performed through extension intervals (5) capable of absorbing the extension of the members when the members are thermally expanded.

Abstract: A kiln has a control box pivotably coupled to an oven portion via a hinge at a lower end of the control box so that the control box can pivot about the hinge from a closed position adjacent the oven portion to an open position where an upper end of the control box is separated from the oven portion. The control box houses electronic controller components. A chimney portion is attached to the oven portion and is separated from the upper end of the control box when the control box is in the open position. The control box pivots about the hinge along a generally horizontal axis. A linkage is coupled between the control box and the oven portion to limit the pivotal movement range of the control box at the open position.

Abstract: A heat treatment apparatus for performing a heat treatment on one or more substrates includes a substrate support device holding the substrates, the substrate support device having a main body and a contact portion being in contact with a substrate. A surface of the main body is made of a material different from that of the contact portion, and at least a surface of the contact portion is made of either glassy carbon or graphite.

Abstract: A gas preheater for a CVI furnace designed for the densification of annular porous substrates arranged in a plurality of vertical annular stacks of substrates, comprising: a sleeve made of heat conductive material resting upon the bottom wall of a susceptor and delimiting a gas preheating chamber, with a gas inlet opening in the gas preheating chamber; a heat exchange assembly located in the gas preheating chamber; a gas distribution plate resting upon the sleeve, covering the gas preheating chamber and provided with a plurality of passages for preheated gas; a load supporting plate for supporting stacks of annular substrates and provided with a plurality of passages in communication with respective passages of the gas distribution plate and registration with internal volumes of respective stacks of annular substrates; and nozzles inserted in passages communicating the gas preheating zone with the internal volumes of respective stacks of annular substrates for adjusting the flows of preheated gas respectively

Abstract: Disclosed is an apparatus that suppresses changes in a temperature distribution in a wafer caused by changes in the light transmittance of a process tube of a lamp annealing furnace. A transmission type sensor including a light emitting section and a light receiving section is arranged so that a process tube is sandwiched between the light emitting section and the light receiving section. The transmission type sensor measures the light transmittance of the process tube, so that it becomes possible to determine when the process tube needs changing. Also, by using a plurality of transmission type sensors and performing feedback control of power of lamps according to measurement results of the transmission type sensors, it becomes possible to suppress changes in the temperature distribution in a wafer.

Abstract: A refractory vessel comprising a metal shell having a generally cylindrical portion and an upper hemispherical dome. A refractory liner has a cylindrical portion spaced inwardly from the cylindrical portion of the metal shell and a hemispherical portion spaced inwardly from the dome. The hemispherical portion has a plurality of layers of refractory brick forming successively higher and lesser diameter rings. At least a portion of the rings have mating keys and keyways to restrain the layers of bricks in a vertical direction.

Abstract: A process for installing a refractory burner block in a glass furnace crown, wherein the glass furnace crown comprises a second refractory material different than the burner block refractory, includes installing a refractory crown block in the furnace crown, wherein the crown block refractory is compatible with the burner block refractory and the second refractory material, wherein the crown block is provided with a hole for accepting the burner block; and disposing the burner block into the crown block hole in sealing engagement therewith.

Abstract: This invention is directed to a method for carrying out combustion in a furnace having porous walls with a large surface area comprising providing a combustion zone containing an atmosphere of furnace gases. A low velocity oxidant stream is injected through at least one oxidant injection side of the porous walls into the combustion zone and mixing furnace gases with the oxidant stream in a mixing zone within the combustion zone to produce an oxidant mixture. A fuel stream is injected through at least one fuel injection side adjacent to the oxidant injection side in the combustion zone. The oxidant mixture is mixed with the fuel stream to create a fuel-oxidant mixture.

Abstract: A one piece cell panel for a forced air furnace which is designed for ease of removal without the necessity of having to dismantle the furnace cabinet. The panel includes a substantially vertically disposed upper section which contains a plurality of cell inlets and cell outlets and an integral lower horizontal shelf which is disposed at a predetermined acute angle downward below the horizontal. The cell panel has a substantially rectangular front profile and an “L” shaped side profile.

Abstract: In a heat processing apparatus structured to heat a wafer on a hot plate, a black plate at least the rear face of which practically has a color with a JIS lightness of 0V to 4V is positioned above the hot plate. Moreover, cooling air is blown out from nozzles onto the rear face of the hot plate. Thus, the temperature of the hot plate can be cooled rapidly.

Abstract: A heater for heating a substrate in a supercritical fluid reactor includes a heater body having a heater chamber initially open to the interior of the reactor. The heater chamber is sized to match the substrate and includes a seal around its perimeter that seals against the perimeter of the substrate and forms a closed heater chamber with the backside of the substrate. A heating element, insulated from the heater body, preferably with pyrolytic graphite, is located in the heater chamber to heat the substrate from the backside. A clamp ring with a seal around its inner perimeter cooperates with the heater body to seal the substrate to the heater body. The heater is preferably spaced apart from the substrate, as well as the walls of the eater chamber and the insulator, to provide uniform heating by transferring heat through the supercritical fluid.

Abstract: In a heat processing apparatus for heating a wafer on a hot plate, a black plate having at least a rear face practically having a color with a JIS lightness of 0V to 4V is positioned above the hot plate. Moreover, cooling air is blown out from nozzles onto the rear face of the hot plate so that the temperature of the hot plate can be cooled rapidly.

Abstract: A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.

Abstract: Disclosed is an apparatus that suppresses changes in a temperature distribution in a wafer caused by changes in the light transmittance of a process tube of a lamp annealing furnace. A transmission type sensor including a light emitting section and a light receiving section is arranged so that a process tube is sandwiched between the light emitting section and the light receiving section. The transmission type sensor measures the light transmittance of the process tube, so that it becomes possible to determine when the process tube needs changing. Also, by using a plurality of transmission type sensors and performing feedback control of power of lamps according to measurement results of the transmission type sensors, it becomes possible to suppress changes in the temperature distribution in a wafer.

Abstract: In a substrate processing apparatus, processing units are stacked in a multistage manner around a transport robot arranged at the center of a processing area for forming a processing part. In a second hierarchy, rotary coating units are arranged through an indexer and a transport robot. In a fourth hierarchy located above the second hierarchy, rotary developing units are stacked above the rotary coating units respectively. Multistage thermal processing units and an edge exposure unit are horizontally arranged above an interface mechanism part. Thus, a substrate processing apparatus capable of reducing the area for setting the same is provided.

Abstract: An apparatus for heating a printed circuit board includes a conveyor (2) to transport a printed circuit board (1), and a heating chamber (3) through which the printed circuit board on the conveyor passes. The surrounding wall (9) of the heating chamber has vacuum layers (12) (13) for heat insulation, and a reinforcing rib (19) is fastened to the surrounding wall. A member for preventing collapse of the surrounding wall is inserted and secured in the vacuum layer in the surrounding wall. The member includes a stainless steel channel member (17) and a heat insulating plate (18) with a rectangular cross section. White cotton used as a member (20) for intercepting radiant heat is installed within the vacuum layer in the surrounding wall, and a radiant heat reflective layer (22) of aluminum foil, etc. is installed on the surface of the surrounding wall facing the heating chamber.

Abstract: A hot plate assembly includes a base plate, a lid and a housing positioned between the base plate and the lid. The housing, lid and base plate form a process chamber. An insulator is positioned adjacent to the base plate in the process chamber. An air gap is formed at least partially between a bottom surface of the insulator and a top surface of the base plate. A hot plate is positioned adjacent to the insulator in the process chamber. At least a first reflective member is positioned between the hot plate and the insulator.

Abstract: Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed within a heating chamber having an about uniform thermal profile therein to more uniformly heat the substrates.

Abstract: In a heat processing apparatus of a low-oxygen curing and cooling processing station, a plurality of blast ports are provided in a ring shutter along a thickness direction of a wafer and a heated inert gas is supplied into a heat processing chamber via the blast ports, so that both faces of the wafer can be heated while the inside of the heat processing chamber is exchanged for the inert gas. Accordingly, heat processing for the substrate can be efficiently performed in a short period of time.

Abstract: A vertical heat-processing apparatus includes a surrounding member, which surrounds a process chamber and a heater. The surrounding member forms a heating space around the process chamber. The heating space has zones juxtaposed in a vertical direction. Temperature sensors are arranged to detect temperatures respectively representing the zones. Supply pipes are arranged to respectively supply a cooling gas to the zones. The supply pipes are respectively provided with valves controlled by a controller. The controller adjusts opening degrees of the valves such that a flow velocity of the cooling gas in a first zone having a lower cooling rate becomes higher than a flow velocity of the cooling gas in a second zone having a higher cooling rate used as a reference.

Abstract: A modular furnace is fabricated from at least one module having a frame, a removable cover mounted to the frame, exterior cover panels on the frame, and an insulated case fastened to the interior of the module. A conveyor assembly extends through the module. A plurality of process zones, such as heating and cooling zones, are disposed within the module. Field replaceable universal blower assemblies are associated with each process zone. The motor shaft in each blower assembly is provided with a sealed bearing in the motor housing. Insulation within each module is held in place by gas permeable fabric covering large vent openings in cover panels to allow oxygen to diffuse out of the insulation rapidly upon start up.

Abstract: An unnecessary film is removed by cleaning gas flowing in a treatment vessel 8 for depositing a film on an object W to be processed such as a semiconductor wafer. In this case, the cleaning gas is preheated and activated by the gas heating mechanism 52 and the cleaning gas flows in the treatment vessel 8 in this state. By doing this, an unnecessary film in the treatment vessel made of quartz is removed effectively without damaging the treatment vessel.

Abstract: A flexible, relatively lightweight workpiece support tray includes a plurality of spacers juxtaposed between a plurality of lateral I-beams, the I-beams being held together through a plurality of rods. Each of the lateral I-beams has a recess for receiving a tab on each side of the spacers. Each end of the rods is provided with a split ring welded thereon to removably retain the assembly together. A pair of shoes is located on the bottom intended side of the tray, and a puller/pusher bar is attached to each end of the shoe for engaging the drive mechanism of the furnace. The invention uses articulating attachments, including includes a slide connector and T-connector spot welded into place, for joining one tray to another to obtain a floating feature.

Abstract: When an oxidation process for semiconductor wafers is carried out by a batch type furnace, the uniformity of the thickness of a film is intended to be improved so as to be capable of carrying out a low temperature process. In a system for feeding a mixed gas of hydrogen gas and water vapor into a reaction vessel to carry out a so-called wet oxidation, a ventilation resistance material is provided in an outside passage of a double-pipe passage for heating gas in an external combustion system, and a mixed gas of hydrogen gas and hydrogen chloride gas is passed through the ventilation resistance material to be heated to a process temperature or higher by means of the heater of the combustion system to previously produce a very small amount of water vapor to carry out a dry oxidation. When dinitrogen oxide gas is used for producing a nitrogen containing silicon oxide film, dinitrogen oxide gas is passed through the outside passage to be previously activated.

Abstract: A jig comprises: a main body; a retainer for retaining a block in which at least one row of sections to be sliders is aligned; a middle load application section coupled to a portion of the retainer located in the middle of the length thereof; end load application sections coupled to portions of the retainer near ends of the length thereof; middle couplers located between the middle load application section and each of the end load application sections, respectively, for coupling the main body to the retainer; and end couplers for coupling the main body to the ends of the length of the retainer. The length between the middle of the retainer and each of the ends thereof is greater than the length between the middle of the retainer and each of the end load application sections.

Abstract: Firing process and apparatus for uniformly heat-treating a substrate having a film-forming composition thereon, wherein the substrate is subjected to a first soaking step in which the substrate is held for a predetermined time in a first heating chamber whose temperature is maintained at a first value, so that the temperature within the substrate is held at the first value evenly throughout an entire mass of the substrate, and after feeding of the substrate into a second heating chamber whose temperature is maintained at a predetermined second value which is different from the first value by a predetermined difference, the substrate is subjected to a second soaking step in which the substrate is held for a second predetermined time in the second heating chamber, so that the temperature within the substrate is held at the second value evenly throughout the entire mass of the substrate.

Abstract: Refractory wall structure for a blast furnace, in particular for a metallurgical furnace, such as for example a blast furnace with a high process temperature during operation, which wall structure is subjected to a high thermal loading. The wall structure comprises a steel outer wall, a refractory lining consisting of one or more layers of a well heat-conducting material on the inside of the outer wall, and a cooler for cooling the refractory wall structure, whereby the wall structure also comprises a permanent, well heat-conducting metallic filling in a gap in the refractory wall structure, which filling has been molten inside the gap and then after solidifying forms a low heat resistance across the gap.

Abstract: A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.

Abstract: A substrate heater having a chamber, a heating element located in the chamber, and an elevator having a substrate holder. The holder can hold a plurality of planar substrates in a general spaced stacked configuration. The holder can be moved to allow substrates to be inserted and removed from various locations on the holder. In one embodiment the substrates are located very close to each other to accelerate the rate of heat transfer to newly inserted substrates. In another embodiment, the holder has an individual horizontal heater on the elevator for each substrate.

Abstract: An anti-sliding bar for furnace wall constructions of the type comprising: an open support structure wall and mat means of fibrous insulating material, including U,S,C or the like shaped sections interleaved to each other; anchoring means between the interleaved U,S,C or the like shaped sections, and tying means passing through the mat means, to hold the anchoring means attaching the mat means to the open support structure wall; the anti-sliding bar comprising: a rod supporting the mats, extending horizontally between the U, S,C or the like shaped sections, having: anti-sliding means, fastening tying means for supporting the bar to the mesh means.

Abstract: A vacuum heating furnace comprises a translucent container for retaining a heated object and a heating light source for heating a heated object retained in the translucent container. The translucent container has on its surface a tapered portion to receive transmitted light totally reflected on the inner surface of the translucent container at an angle smaller than a critical angle.

Abstract: A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.

Abstract: An industrial oven uses bi-directional expansion joints to accommodate lateral and longitudinal movement intersecting support beams of the oven's structural framework resulting from expansion of the support beams, the supported beams, and/or other oven components. The intersecting support beams may, for instance, comprise either roof purlins 1) and underlying roof trusses or 2) floor support members and underlying oven base support beams. Each bi-directional expansion joint includes a bracket permitting relative longitudinal and lateral movement between the support beams and the associated supported beams. The brackets preferably comprise L-shaped brackets each having 1) a vertical leg connected to the associated supported beam(s), 2) a horizontal leg connect to the associated support beam, and 3) expansion slots permitting lateral movement between the support beam and the bracket and longitudinal movement between the supported beam(s) and the bracket.

Abstract: Disclosed is a window construction for a heater, which generally has a frame and at least one panel fitted on the frame. The frame and the at least one panel are usually made of different materials having different expansion coefficients. An expansion compensator made of bimetallic material is provided to the window located between the frame and a distal portion of the at least one panel to otherwise contact the frame. The expansion compensator compensates the differential expansions occurring between the frame and the at least one panel as the heater temperature changes.

Abstract: An improved non-recovery coke oven floor constructed of a single layer of refractory bricks including, for each oven sole flue, a pair of trunnion bricks and a center bridge brick spanning the width of the flue, having lower brick surfaces in the form of an arch, and joined end-to-end by a tapered tongue-and-groove joint disposed approximately perpendicular to the direction of a compression load transmitted by the center bridge brick to the trunnion bricks.

Abstract: In an arrangement for sealing combustion-chamber bricks (8) which are force-cooled in a convective manner, the bricks (8) being arranged in at least two brick rows (6) in accordance with of an increasing combustion-space diameter and being put into supporting casings (7), and the cooling medium (12) flowing between brick (8) and supporting casing (7), and a gap (9) being present between the supporting casing (7) of the preceding brick row (6) and the respectively following brick row (6), which gap (9) is sealed by means of a seal (10), a plurality of springs (11) are firmly anchored to the supporting casing (7) in a distributed manner over the periphery, which springs (11) are connected to the seal (10) and press the seal (10) into the gap (9) between supporting casing (7) and brick (8) at least during the operation of the combustion chamber. The sealing effect is thereby increased without thermal stresses being introduced.

Abstract: A catalyst for the reduction of carbon dioxide which comprises employing a catalyst which contains at least one transition metal selected from the group consisting of Group VIII (e.g., Ni, Fe, Co, Ru, Rh) and Group VIa (e.g., Mo, W) in the Periodic Table on zinc oxide alone or on a composite containing zinc oxide and at least one metal oxide of a metal selected from the group consisting of Group IIIb (e.g., Al, Ga) and Group IVa (e.g, Ti, Zr) in the Periodic Table.

Abstract: A Deglor furnace includes heating elements each having a heater rod being surrounded by a protective tube. The protective tube is mounted on a ceiling of the Deglor furnace and is run through an opening in the ceiling into the interior of the Deglor furnace. Heat insulation of the ceiling which borders the opening is protected against corrosive gases from the interior by a shield.

Abstract: A refractory brick and system of bricks for constructing flue walls of a ring furnace. The brick and the bricks of the system have opposed sides and upper and lower surfaces when disposed in a vertical wall structure, with one of the surfaces having at least one crosswise groove while the other surface has a corresponding crosswise tongue for seating in the groove of an adjacent brick, the tongues and grooves terminating short of the ends or sides of the brick when the bricks are disposed in a vertical wall structure. The crosswise tongues and grooves have rounded configurations sized to mate with bricks having the same tongue and groove configurations when a plurality of such bricks are stacked one upon the other in constructing a vertical wall.

Abstract: A multi-panel spacer/shipping bracket for supportively spacing at least one panel located within a compartment, the bracket comprising: a base member; an attachment member extending therefrom and attached to the compartment; and a retention member extending from the base member, and further comprising an insertion member having a slot therein for retaining a panel, the slot defining an approach opening sized to receive the panel thereinto, and a spring member, positioned relative to the slot so as to operate to urge the panel against an interior vertical wall of the slot.

Abstract: A substrate heat treatment apparatus includes a heat treatment furnace of a flat configuration, and having a cavity in which a substrate is accommodated. The heat treatment furnace includes a gas supply unit at one side end face, an opening for communication between the cavity and the outside world, and a gas discharge unit in the vicinity of the opening for discharging gas from the cavity at the other side end face. The heat treatment furnace further includes a cover for shutting the opening allowing opening/closing thereof. In the gas exhaust unit, an exhaust chamber is formed on the other side end face along the opening with a partition wall between the opening and the exhaust chamber. An exhaust portion is formed in communication with the outside world in the exhaust chamber.

Abstract: An energy efficient wall panel for use together with other such panels to extend about selected peripheral portions of a thermal treatment chamber of a high temperature industrial furnace or the like includes a frame that supports an array of elongate cast refractory thermal insulating members 1) that extend side by side, 2) that have relatively wide flange portions that extend substantially contiguously to define a rigid, impact resistant inner surface that faces toward a thermal treatment chamber for absorbing, storing and re-radiating impingent heat energy back into the chamber, 3) that have relatively thin outer portions connected to the supporting frame, 4) that have central web portions that provide needed strength and rigidity while, at the same time, permitting only minimal conductive heat transfer therethrough, and 5) that have elongate, non-cast, fiber-type thermal insulating members compressively sandwiched between adjacent pairs of the cast refractory members for enhancing the panel's insulating c

Abstract: An air cleaning apparatus according to the present invention includes an apparatus body having a suction port through which air in a processing space is sucked and a discharge port through which the air sucked through the suction port is discharged into the processing space. A blower is provided in the apparatus body for sucking the air from the processing space into the apparatus body through the suction port and discharging the sucked air into the processing space through the discharge port. In addition an impurity gas removing device in the apparatus body is provided for removing impurity gases contained in the air sucked through the suction port and harmful to processing in the processing space, and a particle removing device is provided on the exhaust side of the impurity gas removing device for removing particles in the sucked air cleared of the impurity gases by impurity gas removing device.

Abstract: An apparatus and a method for electrically heating a refractory lined process vessel or reactor by directly passing current through an electrically conductive refractory lining using electrical heating assemblies incorporating a resilient, convoluted nickel conductor. When the heating assemblies are attached to the electrically conductive refractory lining, an impressed voltage causes current to flow between the heating assemblies causing the refractory lining to be heated resistively.

Abstract: A semiconductor processor including an enclosure with an access opening. A door assembly is supported for translational movement between aligned and displaced positions relative to the access opening. The door assembly has a main part, and an extension part which telescopically moves toward and away from the access opening. A bellows is provided between the main and extension parts. The closed door is sealed by a first face seal and a second expandable seal. A liquids trap is provided to prevent outward escape of liquids from the access opening. A drain removes liquid collected in the trap.

Abstract: A holder means for the partial thermal treatment in an oven, especially a cuum chamber oven that provides compressed gas quenching, of tools or workpieces, especially drill bits, that have a working portion and a portion that is to be clamped. The workpieces, which are guided by a base plate that is provided with holes, rest upright upon a bottom plate. The base plate is provided with a radiation shield on that side that faces the oven chamber. The upper surface of the radiation shield has a high emission factor for thermal radiation, and the radiation shield is disposed directly on the base plate.